JP6372998B2 - 圧力式流量制御装置 - Google Patents
圧力式流量制御装置 Download PDFInfo
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- JP6372998B2 JP6372998B2 JP2013252167A JP2013252167A JP6372998B2 JP 6372998 B2 JP6372998 B2 JP 6372998B2 JP 2013252167 A JP2013252167 A JP 2013252167A JP 2013252167 A JP2013252167 A JP 2013252167A JP 6372998 B2 JP6372998 B2 JP 6372998B2
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- Prior art keywords
- pressure
- pressure detection
- control valve
- detection chamber
- orifice
- Prior art date
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- 239000012530 fluid Substances 0.000 claims description 66
- 238000001514 detection method Methods 0.000 claims description 51
- 230000002093 peripheral effect Effects 0.000 claims description 13
- 238000007789 sealing Methods 0.000 claims description 12
- 239000007789 gas Substances 0.000 description 20
- 239000002184 metal Substances 0.000 description 7
- 230000004044 response Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
- F16K31/007—Piezoelectric stacks
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K7/00—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves
- F16K7/12—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm
- F16K7/14—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Flow Control (AREA)
Description
2 流体入口
3 流体出口
4 流体通路
4a 第1通路部
4b 圧力検知室
4c 第2通路部
4f 第3通路部
5 本体
5d 凹部
CV 圧力制御用コントロール弁
CVa 金属製ダイヤフラム弁体
OL オリフィス
P1 圧力センサ
P1a 圧力検知面
16 リングガスケット
Claims (4)
- 流体入口と流体出口との間を連通する流体通路を設けた本体と、
該本体に固定されて前記流体通路を開閉する圧力制御用コントロール弁と、
前記圧力制御用コントロール弁の下流側の前記流体通路に介在させたオリフィスと、
前記本体に固定されて前記圧力制御用コントロール弁と前記オリフィスとの間の前記流体通路の内圧を検出する圧力センサと、を備え、
前記流体通路は、前記圧力制御用コントロール弁と前記圧力センサの圧力検知面上の圧力検知室とを接続する第1通路部と、該第1通路部と離間して前記圧力検知室と前記オリフィスとを接続する第2通路部とを備えることにより、前記圧力検知室を経由するように構成されており、
前記圧力センサは、前記圧力制御用コントロール弁の下方に配設されており、前記第1通路部は、前記圧力制御用コントロール弁の弁体の中心部から前記圧力検知室に垂下して、前記圧力検知室の端部に接続されるように構成されており、
前記第2通路部は、前記圧力検知室の前記第1通路部とは反対側の端部に接続され垂直上方に延びる垂直部と、前記垂直部から水平方向に延びる水平部とを含み、前記オリフィスは前記水平部の端部に配置されており、
前記第1通路部の径および前記第2通路部の径は、前記流体入口から前記圧力制御用コントロール弁の弁体の外周縁部と弁座との隙間に流体を流入させるために前記本体に設けられた流入側通路部の径よりも小さい、圧力式流量制御装置。 - 前記圧力センサは、前記本体の底面に形成された凹部にリングガスケットを介して挿着され、前記圧力検知室は、前記凹部の内底面と前記リングガスケットと前記圧力センサの圧力検知面とで囲まれており、前記リングガスケットは、両側のシール面が内周面側に偏って形成されていることを特徴とする請求項1に記載の圧力式流量制御装置。
- 前記リングガスケットは、両側のシール面、内周面、外周面、前記内周面と両側のシール面との間の内側テーパー面、及び、前記外周面と両側のシール面との間の外側テーパー面を備え、前記内側テーパー面が前記外側テーパー面より小さいことを特徴する請求項2に記載の圧力式流量制御装置。
- 前記圧力検知室において、前記凹部の内底面と前記圧力検知面との距離が0.13〜0.30mmである、請求項2または3に記載の圧力式流量制御装置。
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013252167A JP6372998B2 (ja) | 2013-12-05 | 2013-12-05 | 圧力式流量制御装置 |
US15/034,002 US10372145B2 (en) | 2013-12-05 | 2014-11-25 | Pressure-type flow rate control device |
KR1020167003232A KR101902855B1 (ko) | 2013-12-05 | 2014-11-25 | 압력식 유량 제어 장치 |
KR1020187026983A KR102087645B1 (ko) | 2013-12-05 | 2014-11-25 | 압력식 유량 제어 장치 |
PCT/JP2014/005885 WO2015083343A1 (ja) | 2013-12-05 | 2014-11-25 | 圧力式流量制御装置 |
DE112014005572.7T DE112014005572T5 (de) | 2013-12-05 | 2014-11-25 | Vorrichtung zur druckabhängigen Durchflußregelung |
CN201480049537.5A CN105556411A (zh) | 2013-12-05 | 2014-11-25 | 压力式流量控制装置 |
TW105118225A TWI658351B (zh) | 2013-12-05 | 2014-12-01 | 壓力式流量控制裝置 |
TW103141600A TWI566067B (zh) | 2013-12-05 | 2014-12-01 | Pressure flow control device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013252167A JP6372998B2 (ja) | 2013-12-05 | 2013-12-05 | 圧力式流量制御装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018086041A Division JP6606221B2 (ja) | 2018-04-27 | 2018-04-27 | 圧力式流量制御装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015109022A JP2015109022A (ja) | 2015-06-11 |
JP2015109022A5 JP2015109022A5 (ja) | 2016-12-15 |
JP6372998B2 true JP6372998B2 (ja) | 2018-08-15 |
Family
ID=53273128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013252167A Active JP6372998B2 (ja) | 2013-12-05 | 2013-12-05 | 圧力式流量制御装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10372145B2 (ja) |
JP (1) | JP6372998B2 (ja) |
KR (2) | KR102087645B1 (ja) |
CN (1) | CN105556411A (ja) |
DE (1) | DE112014005572T5 (ja) |
TW (2) | TWI658351B (ja) |
WO (1) | WO2015083343A1 (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9904299B2 (en) * | 2015-04-08 | 2018-02-27 | Tokyo Electron Limited | Gas supply control method |
US10400906B2 (en) * | 2015-06-25 | 2019-09-03 | Illinois Tool Works Inc. | Piezo actuator type valve |
WO2017033745A1 (ja) * | 2015-08-24 | 2017-03-02 | 株式会社フジキン | 流体制御装置におけるシール部材の固定構造、継手および流体制御装置 |
US10884436B2 (en) | 2015-10-28 | 2021-01-05 | Fujikin Incorporated | Flow rate signal correction method and flow rate control device employing same |
CN108780332B (zh) * | 2016-02-29 | 2021-10-01 | 株式会社富士金 | 流量控制装置 |
US10665430B2 (en) * | 2016-07-11 | 2020-05-26 | Tokyo Electron Limited | Gas supply system, substrate processing system and gas supply method |
JP6786096B2 (ja) * | 2016-07-28 | 2020-11-18 | 株式会社フジキン | 圧力式流量制御装置 |
CN109791415A (zh) * | 2016-10-14 | 2019-05-21 | 株式会社富士金 | 流体控制装置 |
JP7245600B2 (ja) | 2016-12-15 | 2023-03-24 | 株式会社堀場エステック | 流量制御装置、及び、流量制御装置用プログラム |
US11054052B2 (en) * | 2016-12-26 | 2021-07-06 | Fujikin Incorporated | Piezoelectric-element-driven valve and flow rate control device |
CN106876304B (zh) * | 2017-02-24 | 2019-09-10 | 成都京东方光电科技有限公司 | 一种湿法刻蚀排气***及湿法刻蚀装置 |
US11187346B2 (en) * | 2017-11-24 | 2021-11-30 | Fujikin Incorporated | Valve device, its control device, control methods using the same, fluid control device and semiconductor manufacturing apparatus |
WO2021005879A1 (ja) * | 2019-07-08 | 2021-01-14 | 株式会社堀場エステック | 流量制御装置、流量測定方法、及び、流量制御装置用プログラム |
US20230011244A1 (en) * | 2019-12-25 | 2023-01-12 | Fujikin Incorporated | Pressure control device |
US20230129479A1 (en) * | 2020-03-05 | 2023-04-27 | Fujikin Incorporated | Flow rate control device and flow rate control method |
JP2022029854A (ja) | 2020-08-05 | 2022-02-18 | 株式会社堀場エステック | 流量制御装置、流量制御方法、及び、流量制御プログラム |
KR20230069985A (ko) | 2021-03-11 | 2023-05-19 | 가부시키가이샤 후지킨 | 기화기 및 기화 공급 장치 |
JP7045738B1 (ja) * | 2021-03-23 | 2022-04-01 | 株式会社リンテック | 常時閉型流量制御バルブ |
KR20230000975A (ko) * | 2021-06-25 | 2023-01-03 | 가부시키가이샤 호리바 에스텍 | 유체 제어 장치, 유체 제어 시스템, 유체 제어 장치용 프로그램 및 유체 제어 방법 |
CN113977451B (zh) * | 2021-10-25 | 2023-08-25 | 长鑫存储技术有限公司 | 半导体设备的检测***及检测方法 |
Family Cites Families (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63115970A (ja) * | 1986-10-31 | 1988-05-20 | Motoyama Seisakusho:Kk | ダイヤフラム弁 |
JP3291161B2 (ja) | 1995-06-12 | 2002-06-10 | 株式会社フジキン | 圧力式流量制御装置 |
ZA974797B (en) * | 1996-05-31 | 1998-12-30 | Sastech Pty Ltd | Catalyst |
JP3580645B2 (ja) | 1996-08-12 | 2004-10-27 | 忠弘 大見 | 圧力式流量制御装置 |
US5851004A (en) * | 1996-10-16 | 1998-12-22 | Parker-Hannifin Corporation | High pressure actuated metal seated diaphragm valve |
JP3522535B2 (ja) | 1998-05-29 | 2004-04-26 | 忠弘 大見 | 圧力式流量制御装置を備えたガス供給設備 |
CN1128395C (zh) * | 1999-06-25 | 2003-11-19 | 富准精密工业(深圳)有限公司 | 散热装置扣件 |
JP3502807B2 (ja) | 2000-04-14 | 2004-03-02 | 長野計器株式会社 | 圧力センサ |
KR100426709B1 (ko) * | 2000-06-05 | 2004-04-14 | 가부시키가이샤 후지킨 | 오리피스 내장밸브 |
JP4102564B2 (ja) * | 2001-12-28 | 2008-06-18 | 忠弘 大見 | 改良型圧力式流量制御装置 |
JP4195819B2 (ja) * | 2003-01-17 | 2008-12-17 | 忠弘 大見 | 弗化水素ガスの流量制御方法及びこれに用いる弗化水素ガス用流量制御装置 |
JP2007525622A (ja) * | 2003-10-03 | 2007-09-06 | スワゲロック カンパニー | 流れ制御デバイスのためのダイヤフラムモニタリング |
JP4298476B2 (ja) * | 2003-11-14 | 2009-07-22 | 株式会社フジキン | 流体制御装置 |
JP4572139B2 (ja) | 2005-05-23 | 2010-10-27 | 株式会社フジキン | 改良型圧力式流量制御装置 |
JP4690827B2 (ja) * | 2005-08-26 | 2011-06-01 | 株式会社フジキン | ガスケット型オリフィス及びこれを用いた圧力式流量制御装置 |
JP4743763B2 (ja) * | 2006-01-18 | 2011-08-10 | 株式会社フジキン | 圧電素子駆動式金属ダイヤフラム型制御弁 |
JP4605790B2 (ja) * | 2006-06-27 | 2011-01-05 | 株式会社フジキン | 原料の気化供給装置及びこれに用いる圧力自動調整装置。 |
JP4971030B2 (ja) * | 2007-05-21 | 2012-07-11 | シーケーディ株式会社 | 流体制御弁 |
WO2009054848A1 (en) * | 2007-10-23 | 2009-04-30 | Brooks Instrument Llc | Pressure retaining sleeve |
KR101162546B1 (ko) | 2008-05-21 | 2012-07-05 | 가부시키가이샤 후지킨 | 압력식 유량 제어 장치를 이용한 유체의 비연속식 유량 스위칭 제어 방법 |
JP5177864B2 (ja) * | 2008-06-04 | 2013-04-10 | 株式会社フジキン | 熱式質量流量調整器用自動圧力調整器 |
JP4977669B2 (ja) * | 2008-09-05 | 2012-07-18 | 忠弘 大見 | 差圧式流量計 |
DE102009006445B3 (de) * | 2009-01-28 | 2010-07-15 | Hydac Fluidtechnik Gmbh | Proportional-Druckregelventil |
JP5669384B2 (ja) * | 2009-12-01 | 2015-02-12 | 株式会社フジキン | 圧電駆動式バルブ及び圧電駆動式流量制御装置 |
WO2011067877A1 (ja) * | 2009-12-01 | 2011-06-09 | 株式会社フジキン | 圧力式流量制御装置 |
JP5508875B2 (ja) * | 2010-01-26 | 2014-06-04 | 株式会社フジキン | 流体制御器および流量制御装置 |
JP5501806B2 (ja) * | 2010-03-05 | 2014-05-28 | サーパス工業株式会社 | 圧力センサ、差圧式流量計及び流量コントローラ |
WO2012006626A2 (en) * | 2010-07-09 | 2012-01-12 | Entegris, Inc. | Flow controller |
JP5576991B2 (ja) * | 2011-09-30 | 2014-08-20 | 株式会社フジキン | ガス供給装置 |
JP5665793B2 (ja) * | 2012-04-26 | 2015-02-04 | 株式会社フジキン | 可変オリフィス型圧力制御式流量制御器 |
JP6216389B2 (ja) * | 2013-10-31 | 2017-10-18 | 株式会社フジキン | 圧力式流量制御装置 |
JP6321972B2 (ja) * | 2014-01-21 | 2018-05-09 | 株式会社フジキン | 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法 |
TWM489440U (en) * | 2014-06-27 | 2014-11-01 | Cheng-Yu Huang | Portable cylinder audio speaker |
JP6336345B2 (ja) * | 2014-06-30 | 2018-06-06 | 株式会社フジキン | ダイヤフラム弁、流体制御装置、半導体製造装置および半導体製造方法 |
JP6416529B2 (ja) * | 2014-07-23 | 2018-10-31 | 株式会社フジキン | 圧力式流量制御装置 |
JP6475441B2 (ja) * | 2014-09-01 | 2019-02-27 | 株式会社フジキン | 圧電素子駆動式バルブ及び圧電素子駆動式バルブを備えた流量制御装置 |
-
2013
- 2013-12-05 JP JP2013252167A patent/JP6372998B2/ja active Active
-
2014
- 2014-11-25 WO PCT/JP2014/005885 patent/WO2015083343A1/ja active Application Filing
- 2014-11-25 KR KR1020187026983A patent/KR102087645B1/ko active IP Right Grant
- 2014-11-25 DE DE112014005572.7T patent/DE112014005572T5/de not_active Withdrawn
- 2014-11-25 US US15/034,002 patent/US10372145B2/en active Active
- 2014-11-25 CN CN201480049537.5A patent/CN105556411A/zh active Pending
- 2014-11-25 KR KR1020167003232A patent/KR101902855B1/ko active IP Right Grant
- 2014-12-01 TW TW105118225A patent/TWI658351B/zh active
- 2014-12-01 TW TW103141600A patent/TWI566067B/zh active
Also Published As
Publication number | Publication date |
---|---|
TWI566067B (zh) | 2017-01-11 |
CN105556411A (zh) | 2016-05-04 |
TWI658351B (zh) | 2019-05-01 |
KR101902855B1 (ko) | 2018-10-01 |
WO2015083343A1 (ja) | 2015-06-11 |
KR20160028474A (ko) | 2016-03-11 |
KR102087645B1 (ko) | 2020-03-11 |
US10372145B2 (en) | 2019-08-06 |
KR20180108851A (ko) | 2018-10-04 |
DE112014005572T5 (de) | 2016-12-01 |
TW201535081A (zh) | 2015-09-16 |
JP2015109022A (ja) | 2015-06-11 |
TW201701095A (zh) | 2017-01-01 |
US20160349763A1 (en) | 2016-12-01 |
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