DE602005012028D1 - Nichtflüchtige Halbleiterspeicheranordnung und Leseverfahren - Google Patents
Nichtflüchtige Halbleiterspeicheranordnung und LeseverfahrenInfo
- Publication number
- DE602005012028D1 DE602005012028D1 DE602005012028T DE602005012028T DE602005012028D1 DE 602005012028 D1 DE602005012028 D1 DE 602005012028D1 DE 602005012028 T DE602005012028 T DE 602005012028T DE 602005012028 T DE602005012028 T DE 602005012028T DE 602005012028 D1 DE602005012028 D1 DE 602005012028D1
- Authority
- DE
- Germany
- Prior art keywords
- memory device
- semiconductor memory
- volatile semiconductor
- reading method
- reading
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0007—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising metal oxide memory material, e.g. perovskites
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0023—Address circuits or decoders
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/004—Reading or sensing circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/30—Resistive cell, memory material aspects
- G11C2213/31—Material having complex metal oxide, e.g. perovskite structure
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/77—Array wherein the memory element being directly connected to the bit lines and word lines without any access device being used
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/79—Array wherein the access device being a transistor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Semiconductor Memories (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Read Only Memory (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004219810 | 2004-07-28 | ||
JP2005193329A JP4189395B2 (ja) | 2004-07-28 | 2005-07-01 | 不揮発性半導体記憶装置及び読み出し方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005012028D1 true DE602005012028D1 (de) | 2009-02-12 |
Family
ID=35311289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005012028T Active DE602005012028D1 (de) | 2004-07-28 | 2005-07-27 | Nichtflüchtige Halbleiterspeicheranordnung und Leseverfahren |
Country Status (6)
Country | Link |
---|---|
US (1) | US7535746B2 (de) |
EP (1) | EP1622163B1 (de) |
JP (1) | JP4189395B2 (de) |
KR (1) | KR100745516B1 (de) |
DE (1) | DE602005012028D1 (de) |
TW (1) | TWI277973B (de) |
Families Citing this family (61)
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US6962648B2 (en) * | 2003-09-15 | 2005-11-08 | Global Silicon Net Corp. | Back-biased face target sputtering |
US20060171200A1 (en) | 2004-02-06 | 2006-08-03 | Unity Semiconductor Corporation | Memory using mixed valence conductive oxides |
US7082052B2 (en) | 2004-02-06 | 2006-07-25 | Unity Semiconductor Corporation | Multi-resistive state element with reactive metal |
US20060081467A1 (en) * | 2004-10-15 | 2006-04-20 | Makoto Nagashima | Systems and methods for magnetron deposition |
US7425504B2 (en) * | 2004-10-15 | 2008-09-16 | 4D-S Pty Ltd. | Systems and methods for plasma etching |
US20060081466A1 (en) * | 2004-10-15 | 2006-04-20 | Makoto Nagashima | High uniformity 1-D multiple magnet magnetron source |
KR100576369B1 (ko) * | 2004-11-23 | 2006-05-03 | 삼성전자주식회사 | 전이 금속 산화막을 데이타 저장 물질막으로 채택하는비휘발성 기억소자의 프로그램 방법 |
US20130082232A1 (en) | 2011-09-30 | 2013-04-04 | Unity Semiconductor Corporation | Multi Layered Conductive Metal Oxide Structures And Methods For Facilitating Enhanced Performance Characteristics Of Two Terminal Memory Cells |
US8314024B2 (en) | 2008-12-19 | 2012-11-20 | Unity Semiconductor Corporation | Device fabrication |
US20070084717A1 (en) * | 2005-10-16 | 2007-04-19 | Makoto Nagashima | Back-biased face target sputtering based high density non-volatile caching data storage |
US20070084716A1 (en) * | 2005-10-16 | 2007-04-19 | Makoto Nagashima | Back-biased face target sputtering based high density non-volatile data storage |
US7366040B2 (en) * | 2005-10-28 | 2008-04-29 | Elite Semicondutor Memory Technology, Inc. | Method of reducing settling time in flash memories and improved flash memory |
JP4901763B2 (ja) * | 2006-02-02 | 2012-03-21 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US8395199B2 (en) * | 2006-03-25 | 2013-03-12 | 4D-S Pty Ltd. | Systems and methods for fabricating self-aligned memory cell |
US7606075B2 (en) * | 2006-04-19 | 2009-10-20 | Micron Technology, Inc. | Read operation for NAND memory |
US8896045B2 (en) * | 2006-04-19 | 2014-11-25 | Infineon Technologies Ag | Integrated circuit including sidewall spacer |
US20080011603A1 (en) * | 2006-07-14 | 2008-01-17 | Makoto Nagashima | Ultra high vacuum deposition of PCMO material |
US7932548B2 (en) | 2006-07-14 | 2011-04-26 | 4D-S Pty Ltd. | Systems and methods for fabricating self-aligned memory cell |
US8454810B2 (en) * | 2006-07-14 | 2013-06-04 | 4D-S Pty Ltd. | Dual hexagonal shaped plasma source |
JP2008033788A (ja) * | 2006-07-31 | 2008-02-14 | Matsushita Electric Ind Co Ltd | 不揮発性記憶装置、データ記憶システム、およびデータ記憶方法 |
US8003972B2 (en) | 2006-08-30 | 2011-08-23 | Micron Technology, Inc. | Bottom electrode geometry for phase change memory |
US8308915B2 (en) | 2006-09-14 | 2012-11-13 | 4D-S Pty Ltd. | Systems and methods for magnetron deposition |
KR101258983B1 (ko) | 2006-09-19 | 2013-04-29 | 삼성전자주식회사 | 가변저항 소자를 이용한 반도체 메모리 장치 및 그 동작방법 |
KR100819099B1 (ko) * | 2006-10-02 | 2008-04-03 | 삼성전자주식회사 | 가변저항 반도체 메모리 장치 |
KR101133832B1 (ko) * | 2006-11-08 | 2012-04-06 | 시메트릭스 주식회사 | 저항 스위칭 집적 회로 메모리, 저항 스위칭 메모리의 형성 방법 및 비휘발성 저항 스위칭 집적 회로 메모리의 제조 방법 |
US7852662B2 (en) * | 2007-04-24 | 2010-12-14 | Magic Technologies, Inc. | Spin-torque MRAM: spin-RAM, array |
US7701791B2 (en) * | 2007-07-26 | 2010-04-20 | Unity Semiconductor Corporation | Low read current architecture for memory |
US8737151B2 (en) | 2007-07-26 | 2014-05-27 | Unity Semiconductor Corporation | Low read current architecture for memory |
JP5159224B2 (ja) * | 2007-09-21 | 2013-03-06 | 株式会社東芝 | 抵抗変化メモリ装置 |
JP2009117003A (ja) | 2007-11-09 | 2009-05-28 | Toshiba Corp | 不揮発性メモリ装置のデータ読み出し方法 |
US8194433B2 (en) * | 2008-02-20 | 2012-06-05 | Ovonyx, Inc. | Method and apparatus for accessing a bidirectional memory |
US7952928B2 (en) * | 2008-05-27 | 2011-05-31 | Sandisk Il Ltd. | Increasing read throughput in non-volatile memory |
JP5268481B2 (ja) * | 2008-07-31 | 2013-08-21 | 株式会社東芝 | 不揮発性半導体記憶装置 |
US8553444B2 (en) | 2008-08-20 | 2013-10-08 | Panasonic Corporation | Variable resistance nonvolatile storage device and method of forming memory cell |
US8159858B2 (en) * | 2008-12-19 | 2012-04-17 | Unity Semiconductor Corporation | Signal margin improvement for read operations in a cross-point memory array |
CN102084429B (zh) | 2009-04-10 | 2013-12-25 | 松下电器产业株式会社 | 非易失性存储元件的驱动方法和非易失性存储装置 |
JP5347806B2 (ja) * | 2009-07-29 | 2013-11-20 | ソニー株式会社 | 抵抗変化型メモリデバイスおよびその動作方法 |
CN103367452B (zh) * | 2009-09-11 | 2015-11-25 | 中芯国际集成电路制造(上海)有限公司 | 绿色晶体管、电阻随机存储器及其驱动方法 |
US8638636B2 (en) * | 2009-09-21 | 2014-01-28 | Macronix International Co., Ltd. | Word line decoder circuit apparatus and method |
KR101094918B1 (ko) * | 2009-12-23 | 2011-12-15 | 주식회사 하이닉스반도체 | 글로벌 비트 라인을 구비한 상변화 메모리 장치 및 그 구동방법 |
JP2011138571A (ja) * | 2009-12-26 | 2011-07-14 | Elpida Memory Inc | 不揮発性半導体メモリ装置及び不揮発性半導体メモリ装置の制御方法 |
US9450177B2 (en) * | 2010-03-10 | 2016-09-20 | Tohoku University | Magnetoresistive element and magnetic memory |
JP5725735B2 (ja) | 2010-06-04 | 2015-05-27 | 株式会社日立製作所 | 磁気抵抗効果素子及び磁気メモリ |
US8934293B1 (en) * | 2010-06-29 | 2015-01-13 | Contour Semiconductor, Inc. | Means and method for operating a resistive array |
WO2012102734A1 (en) * | 2011-01-28 | 2012-08-02 | Hewlett-Packard Development Company, L.P. | Methods, systems and apparatus for resistive memory |
DE102011012738B3 (de) * | 2011-02-24 | 2012-02-02 | Forschungszentrum Jülich GmbH | Verfahren zum nichtdestruktiven Auslesen resistiver Speicherelemente und Speicherelement |
US8482955B2 (en) * | 2011-02-25 | 2013-07-09 | Micron Technology, Inc. | Resistive memory sensing methods and devices |
WO2012120401A1 (en) * | 2011-03-10 | 2012-09-13 | International Business Machines Corporation | Cell-state determination in phase-change memory |
JP5404683B2 (ja) | 2011-03-23 | 2014-02-05 | 株式会社東芝 | 抵抗変化メモリ |
US10333064B2 (en) * | 2011-04-13 | 2019-06-25 | Micron Technology, Inc. | Vertical memory cell for high-density memory |
EP2751807A4 (de) * | 2011-09-02 | 2015-02-18 | Hewlett Packard Development Co | Vorrichtung zur speicherung von daten und verfahren zum lesen von speicherzellen |
JP5763004B2 (ja) * | 2012-03-26 | 2015-08-12 | 株式会社東芝 | 不揮発性半導体記憶装置 |
WO2014100024A1 (en) * | 2012-12-18 | 2014-06-26 | The Regents Of The University Of Michigan | Resistive memory structure for single or multi-bit data storage |
KR102115427B1 (ko) * | 2013-02-28 | 2020-05-28 | 에스케이하이닉스 주식회사 | 반도체 장치, 프로세서, 시스템 및 반도체 장치의 동작 방법 |
US9343133B1 (en) * | 2014-10-27 | 2016-05-17 | Micron Technology, Inc. | Apparatuses and methods for setting a signal in variable resistance memory |
US10074421B2 (en) * | 2015-03-03 | 2018-09-11 | Nec Corporation | Crossbar switch type memory circuit, look-up table circuit, and programming method |
US9997239B1 (en) * | 2017-05-02 | 2018-06-12 | Everspin Technologies, Inc. | Word line overdrive in memory and method therefor |
US10074436B1 (en) * | 2017-06-13 | 2018-09-11 | Winbound Electronics Corp. | Memory device and data reading method thereof |
KR102401183B1 (ko) * | 2017-12-05 | 2022-05-24 | 삼성전자주식회사 | 메모리 장치 및 그 동작 방법 |
WO2019191393A1 (en) * | 2018-03-28 | 2019-10-03 | University Of Cincinnati | Systems and methods for gated-insulator reconfigurable non-volatile memory devices |
JP2020149736A (ja) * | 2019-03-11 | 2020-09-17 | キオクシア株式会社 | 半導体記憶装置 |
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DE102004041330B3 (de) * | 2004-08-26 | 2006-03-16 | Infineon Technologies Ag | Speicherschaltung mit ein Widerstandsspeicherelement aufweisenden Speicherzellen |
JP2006099866A (ja) * | 2004-09-29 | 2006-04-13 | Sony Corp | 記憶装置及び半導体装置 |
JP2006185477A (ja) * | 2004-12-27 | 2006-07-13 | Fujitsu Ltd | 磁気メモリ装置並びにその読み出し方法及び書き込み方法 |
US7289351B1 (en) * | 2005-06-24 | 2007-10-30 | Spansion Llc | Method of programming a resistive memory device |
US7233520B2 (en) * | 2005-07-08 | 2007-06-19 | Micron Technology, Inc. | Process for erasing chalcogenide variable resistance memory bits |
-
2005
- 2005-07-01 JP JP2005193329A patent/JP4189395B2/ja active Active
- 2005-07-20 KR KR1020050065632A patent/KR100745516B1/ko active IP Right Grant
- 2005-07-27 EP EP05254692A patent/EP1622163B1/de active Active
- 2005-07-27 DE DE602005012028T patent/DE602005012028D1/de active Active
- 2005-07-27 US US11/191,900 patent/US7535746B2/en active Active
- 2005-07-28 TW TW094125604A patent/TWI277973B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP1622163B1 (de) | 2008-12-31 |
JP2006066052A (ja) | 2006-03-09 |
KR100745516B1 (ko) | 2007-08-02 |
EP1622163A1 (de) | 2006-02-01 |
TWI277973B (en) | 2007-04-01 |
JP4189395B2 (ja) | 2008-12-03 |
KR20060053918A (ko) | 2006-05-22 |
US7535746B2 (en) | 2009-05-19 |
US20060023497A1 (en) | 2006-02-02 |
TW200620276A (en) | 2006-06-16 |
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Legal Events
Date | Code | Title | Description |
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8364 | No opposition during term of opposition |