DE60130901D1 - Herstellungsverfahren für optische dünnschicht - Google Patents

Herstellungsverfahren für optische dünnschicht

Info

Publication number
DE60130901D1
DE60130901D1 DE60130901T DE60130901T DE60130901D1 DE 60130901 D1 DE60130901 D1 DE 60130901D1 DE 60130901 T DE60130901 T DE 60130901T DE 60130901 T DE60130901 T DE 60130901T DE 60130901 D1 DE60130901 D1 DE 60130901D1
Authority
DE
Germany
Prior art keywords
production process
thin layer
optical thin
optical
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60130901T
Other languages
English (en)
Other versions
DE60130901T2 (de
Inventor
Hitoshi Ishizawa
Tsuyoshi Murata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE60130901D1 publication Critical patent/DE60130901D1/de
Application granted granted Critical
Publication of DE60130901T2 publication Critical patent/DE60130901T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/28—Other inorganic materials
    • C03C2217/284—Halides
    • C03C2217/285—Fluorides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/365—Coating different sides of a glass substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)
DE60130901T 2000-08-30 2001-08-30 Herstellungsverfahren für optische dünnschicht Expired - Lifetime DE60130901T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000260248 2000-08-30
JP2000260248 2000-08-30
PCT/JP2001/007457 WO2002018982A1 (fr) 2000-08-30 2001-08-30 Formation d'un film optique mince et element optique dote d'un tel film

Publications (2)

Publication Number Publication Date
DE60130901D1 true DE60130901D1 (de) 2007-11-22
DE60130901T2 DE60130901T2 (de) 2008-08-14

Family

ID=18748288

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60130901T Expired - Lifetime DE60130901T2 (de) 2000-08-30 2001-08-30 Herstellungsverfahren für optische dünnschicht

Country Status (6)

Country Link
US (1) US6870602B2 (de)
EP (1) EP1315005B1 (de)
JP (1) JP4457557B2 (de)
AU (1) AU2001282547A1 (de)
DE (1) DE60130901T2 (de)
WO (1) WO2002018982A1 (de)

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JP2004302113A (ja) * 2003-03-31 2004-10-28 Nikon Corp 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法
JP2004302112A (ja) * 2003-03-31 2004-10-28 Nikon Corp 光学薄膜、光学部材、光学系、及び投影露光装置、並びに光学薄膜の製造方法
JP2005031361A (ja) * 2003-07-11 2005-02-03 Konica Minolta Opto Inc 光学レンズ及び情報記録再生装置
US8149381B2 (en) 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
SG195534A1 (en) * 2003-08-26 2013-12-30 Nikon Corp Optical element and exposure device
JP2005114400A (ja) * 2003-10-03 2005-04-28 Nikon Corp 光学特性の計測方法、反射防止膜、光学系及び投影露光装置
US7034923B2 (en) * 2004-01-21 2006-04-25 Asml Netherlands B.V. Optical element, lithographic apparatus comprising such optical element and device manufacturing method
JP5201435B2 (ja) * 2004-03-30 2013-06-05 株式会社ニコン 光学系
JP4433390B2 (ja) * 2004-03-30 2010-03-17 株式会社ニコン 反射防止膜並びにこの反射防止膜を有する光学素子及び光学系
DE102004027842A1 (de) * 2004-06-08 2006-01-12 Institut für Neue Materialien Gemeinnützige GmbH Abrieb- und kratzfeste Beschichtungen mit niedriger Brechzahl auf einem Substrat
JP4858170B2 (ja) 2004-09-16 2012-01-18 株式会社ニコン 非晶質酸化珪素バインダを有するＭｇＦ２光学薄膜の製造方法
US8049964B2 (en) * 2005-06-14 2011-11-01 Carl Zeiss Smt Gmbh Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element
JP2007101799A (ja) * 2005-10-03 2007-04-19 Nippon Sheet Glass Co Ltd 透過型光学素子
JP5127136B2 (ja) * 2005-12-12 2013-01-23 ステラケミファ株式会社 フッ化物微粒子の分散液及びその製造方法
JP2007187994A (ja) * 2006-01-16 2007-07-26 Bridgestone Corp 反射防止膜及び光学フィルター
JPWO2008001675A1 (ja) 2006-06-27 2009-11-26 株式会社ニコン 光学多層薄膜、光学素子、及び光学多層薄膜の製造方法
EP2088454B1 (de) 2006-11-21 2018-09-19 Nikon Corporation Optisches glied und verfahren zu seiner herstellung
JP2008270564A (ja) * 2007-04-20 2008-11-06 Canon Inc 露光装置及びデバイス製造方法
US20110003143A1 (en) * 2008-02-25 2011-01-06 Central Glass Company, Limited Organosol Containing Magnesium Fluoride Hydroxide, and Manufacturing Method Therefor
JP5751759B2 (ja) 2009-04-06 2015-07-22 キヤノン株式会社 光学用膜の製造方法
EP2325675A2 (de) * 2009-07-30 2011-05-25 Canon Kabushiki Kaisha Verfahren zur Herstellung eines optischen Films, optischer Film und optische Komponente
JP5777278B2 (ja) * 2009-12-01 2015-09-09 キヤノン株式会社 光学素子の製造方法
JP5340252B2 (ja) 2010-11-17 2013-11-13 キヤノン株式会社 反射防止膜及びその製造方法
EP2734871B1 (de) 2011-07-21 2022-09-07 Canon Kabushiki Kaisha Optisches element und verfahren zu seiner herstellung
JP5878429B2 (ja) * 2012-05-29 2016-03-08 ステラケミファ株式会社 フッ化マグネシウム粒子、フッ化マグネシウム粒子の製造方法、フッ化マグネシウム粒子分散液、フッ化マグネシウム粒子分散液の製造方法、低屈折率層形成用組成物、低屈折率層形成用組成物の製造方法、低屈折率層付基材及び低屈折率層付基材の製造方法
EP2676938A1 (de) 2012-06-21 2013-12-25 Nanofluor GmbH Kalciumfluorid-Sol und davon abgeleitete, optisch aktive Oberflächenbeschichtungen
EP2708509A1 (de) 2012-09-18 2014-03-19 Nanofluor GmbH Verfahren zur Herstellung von Magnesiumfluorid-Sol-Lösungen aus Alkoholaten unter Zugabe von Kohlendioxid
EP2708510A1 (de) 2012-09-18 2014-03-19 Nanofluor GmbH Verfahren zur Herstellung von Magnesiumfluorid-Sol-Lösungen aus Alkoholaten unter Zugabe von Magnesiumsalzen
CN105026329B (zh) * 2012-12-31 2019-03-26 纳米氟化物有限公司 氟化镁溶胶和从氟化镁溶胶获得的光学活性表面涂层
JP2016038537A (ja) * 2014-08-11 2016-03-22 旭硝子株式会社 ワイヤグリッド型偏光子、光源モジュールおよび投射型表示装置
JP7275801B2 (ja) * 2018-04-25 2023-05-18 Ａｇｃ株式会社 ガラス基板
CN115172379A (zh) * 2021-04-21 2022-10-11 长江存储科技有限责任公司 三维存储器及其制备方法

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Also Published As

Publication number Publication date
EP1315005B1 (de) 2007-10-10
US6870602B2 (en) 2005-03-22
EP1315005A4 (de) 2005-09-14
EP1315005A1 (de) 2003-05-28
US20020191168A1 (en) 2002-12-19
JP4457557B2 (ja) 2010-04-28
DE60130901T2 (de) 2008-08-14
WO2002018982A1 (fr) 2002-03-07
AU2001282547A1 (en) 2002-03-13

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