DE60036510D1 - EUV-lithographische Projektionsvorrichtung mit einem optischen Element mit Deckschicht - Google Patents
EUV-lithographische Projektionsvorrichtung mit einem optischen Element mit DeckschichtInfo
- Publication number
- DE60036510D1 DE60036510D1 DE60036510T DE60036510T DE60036510D1 DE 60036510 D1 DE60036510 D1 DE 60036510D1 DE 60036510 T DE60036510 T DE 60036510T DE 60036510 T DE60036510 T DE 60036510T DE 60036510 D1 DE60036510 D1 DE 60036510D1
- Authority
- DE
- Germany
- Prior art keywords
- optical element
- cover layer
- projection device
- lithographic projection
- euv lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Nanotechnology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- Optical Filters (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP99305283 | 1999-07-02 | ||
EP99305283 | 1999-07-02 | ||
EP99307932 | 1999-10-07 | ||
EP99307932 | 1999-10-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60036510D1 true DE60036510D1 (de) | 2007-11-08 |
DE60036510T2 DE60036510T2 (de) | 2008-06-19 |
Family
ID=26153524
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60036510T Expired - Lifetime DE60036510T2 (de) | 1999-07-02 | 2000-06-28 | EUV-lithographische Projektionsvorrichtung mit einem optischen Element mit Deckschicht |
DE60018328T Expired - Lifetime DE60018328T2 (de) | 1999-07-02 | 2000-06-28 | Mehrschichtiger Spiegel mit erhöhter Reflektivität für Extrem-Ultraviolett-Strahlung und lithographische Projektionsvorrichtung mit einem solchen Spiegel |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60018328T Expired - Lifetime DE60018328T2 (de) | 1999-07-02 | 2000-06-28 | Mehrschichtiger Spiegel mit erhöhter Reflektivität für Extrem-Ultraviolett-Strahlung und lithographische Projektionsvorrichtung mit einem solchen Spiegel |
Country Status (6)
Country | Link |
---|---|
US (4) | US6449086B1 (de) |
EP (3) | EP1065532B1 (de) |
JP (2) | JP4068285B2 (de) |
KR (2) | KR100589240B1 (de) |
DE (2) | DE60036510T2 (de) |
TW (2) | TWI267704B (de) |
Families Citing this family (154)
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US20070281109A1 (en) * | 2000-03-31 | 2007-12-06 | Carl Zeiss Smt Ag | Multilayer system with protecting layer system and production method |
DE10016008A1 (de) | 2000-03-31 | 2001-10-11 | Zeiss Carl | Villagensystem und dessen Herstellung |
US7261957B2 (en) | 2000-03-31 | 2007-08-28 | Carl Zeiss Smt Ag | Multilayer system with protecting layer system and production method |
JP5371162B2 (ja) * | 2000-10-13 | 2013-12-18 | 三星電子株式会社 | 反射型フォトマスク |
US6479830B1 (en) | 2000-11-01 | 2002-11-12 | Trw Inc. | Low-sputter-yield coating for hardware near laser-produced plasma |
US6576912B2 (en) * | 2001-01-03 | 2003-06-10 | Hugo M. Visser | Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window |
US6664554B2 (en) * | 2001-01-03 | 2003-12-16 | Euv Llc | Self-cleaning optic for extreme ultraviolet lithography |
JP2004519868A (ja) * | 2001-04-17 | 2004-07-02 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Euvに透明な境界構造 |
US7372056B2 (en) * | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
US7439530B2 (en) | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
US7378673B2 (en) * | 2005-02-25 | 2008-05-27 | Cymer, Inc. | Source material dispenser for EUV light source |
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US20030064161A1 (en) * | 2001-06-06 | 2003-04-03 | Malinowski Michael E. | Method for reducing carbon contamination of multilayer mirrors |
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KR100749897B1 (ko) * | 2001-07-03 | 2007-08-21 | 이유브이 리미티드 라이어빌러티 코포레이션 | 부동태 보호막 이중층 |
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DE50301645D1 (de) * | 2002-03-04 | 2005-12-22 | Fraunhofer Ges Forschung | Methode zur Auswahl der Schichtdicken eines reflektierenden Elements für elektromagnetische Strahlung im extremen ultravioletten Bereich |
US20050111083A1 (en) * | 2002-03-27 | 2005-05-26 | Yakshin Andrey E. | Optical broad band element and process for its production |
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DE10235255B4 (de) | 2002-08-01 | 2004-08-12 | Infineon Technologies Ag | Reflektierender Spiegel zur lithographischen Belichtung und Herstellungsverfahren |
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- 2000-06-28 US US09/605,651 patent/US6449086B1/en not_active Expired - Lifetime
- 2000-06-28 DE DE60036510T patent/DE60036510T2/de not_active Expired - Lifetime
- 2000-06-28 EP EP00305434A patent/EP1065532B1/de not_active Expired - Lifetime
- 2000-06-28 DE DE60018328T patent/DE60018328T2/de not_active Expired - Lifetime
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EP1801658B1 (de) | 2016-06-15 |
US6449086B1 (en) | 2002-09-10 |
EP1065532A3 (de) | 2003-03-19 |
JP2001059901A (ja) | 2001-03-06 |
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EP1801658A3 (de) | 2007-07-18 |
DE60018328D1 (de) | 2005-04-07 |
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EP1801658A2 (de) | 2007-06-27 |
EP1065568A3 (de) | 2003-03-19 |
KR20010066881A (ko) | 2001-07-11 |
KR100589240B1 (ko) | 2006-06-14 |
JP3652221B2 (ja) | 2005-05-25 |
US20030043456A1 (en) | 2003-03-06 |
TW561279B (en) | 2003-11-11 |
EP1065568A2 (de) | 2001-01-03 |
JP2001051106A (ja) | 2001-02-23 |
JP4068285B2 (ja) | 2008-03-26 |
EP1065568B1 (de) | 2007-09-26 |
US6738188B2 (en) | 2004-05-18 |
EP1065532A2 (de) | 2001-01-03 |
DE60018328T2 (de) | 2006-04-06 |
TWI267704B (en) | 2006-12-01 |
KR20010066880A (ko) | 2001-07-11 |
USRE42338E1 (en) | 2011-05-10 |
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