DE3750275T3 - Lackzusammensetzung und -anwendung. - Google Patents

Lackzusammensetzung und -anwendung.

Info

Publication number
DE3750275T3
DE3750275T3 DE3750275T DE3750275T DE3750275T3 DE 3750275 T3 DE3750275 T3 DE 3750275T3 DE 3750275 T DE3750275 T DE 3750275T DE 3750275 T DE3750275 T DE 3750275T DE 3750275 T3 DE3750275 T3 DE 3750275T3
Authority
DE
Germany
Prior art keywords
application
lacquer composition
lacquer
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3750275T
Other languages
English (en)
Other versions
DE3750275T2 (de
DE3750275D1 (de
Inventor
James Vincent Crivello
Michael Joseph O'brien
Julia Lam Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu MicroSi Inc
Original Assignee
MicroSi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25671759&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3750275(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by MicroSi Inc filed Critical MicroSi Inc
Publication of DE3750275D1 publication Critical patent/DE3750275D1/de
Publication of DE3750275T2 publication Critical patent/DE3750275T2/de
Application granted granted Critical
Publication of DE3750275T3 publication Critical patent/DE3750275T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE3750275T 1986-06-13 1987-06-03 Lackzusammensetzung und -anwendung. Expired - Lifetime DE3750275T3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87391486A 1986-06-13 1986-06-13
CA000561112A CA1332119C (en) 1986-06-13 1988-03-10 Resist compositions and use

Publications (3)

Publication Number Publication Date
DE3750275D1 DE3750275D1 (de) 1994-09-01
DE3750275T2 DE3750275T2 (de) 1995-03-09
DE3750275T3 true DE3750275T3 (de) 1998-10-01

Family

ID=25671759

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3750275T Expired - Lifetime DE3750275T3 (de) 1986-06-13 1987-06-03 Lackzusammensetzung und -anwendung.

Country Status (5)

Country Link
EP (1) EP0249139B2 (de)
JP (1) JP2714378B2 (de)
KR (1) KR950007226B1 (de)
CA (1) CA1332119C (de)
DE (1) DE3750275T3 (de)

Families Citing this family (156)

* Cited by examiner, † Cited by third party
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JP2006225476A (ja) 2005-02-16 2006-08-31 Shin Etsu Chem Co Ltd ポジ型レジスト材料及びパターン形成方法
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US7629106B2 (en) 2005-11-16 2009-12-08 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process using the same
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JP4784760B2 (ja) 2006-10-20 2011-10-05 信越化学工業株式会社 レジスト材料及びパターン形成方法
KR20120066924A (ko) 2010-12-15 2012-06-25 제일모직주식회사 오르토-니트로벤질 에스테르 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물
US11681220B2 (en) * 2020-03-05 2023-06-20 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
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EP0249139A3 (en) 1989-10-25
EP0249139B1 (de) 1994-07-27
EP0249139B2 (de) 1998-03-11
JPS6327829A (ja) 1988-02-05
DE3750275T2 (de) 1995-03-09
DE3750275D1 (de) 1994-09-01
JP2714378B2 (ja) 1998-02-16
KR950007226B1 (ko) 1995-07-04
KR880000494A (ko) 1988-03-26
CA1332119C (en) 1994-09-27
EP0249139A2 (de) 1987-12-16

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