CN1773679A - 半导体衬底、半导体器件制造方法和半导体器件测试方法 - Google Patents
半导体衬底、半导体器件制造方法和半导体器件测试方法 Download PDFInfo
- Publication number
- CN1773679A CN1773679A CNA200510053055XA CN200510053055A CN1773679A CN 1773679 A CN1773679 A CN 1773679A CN A200510053055X A CNA200510053055X A CN A200510053055XA CN 200510053055 A CN200510053055 A CN 200510053055A CN 1773679 A CN1773679 A CN 1773679A
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- China
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- zone
- line
- semiconductor substrate
- semiconductor
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- E—FIXED CONSTRUCTIONS
- E05—LOCKS; KEYS; WINDOW OR DOOR FITTINGS; SAFES
- E05B—LOCKS; ACCESSORIES THEREFOR; HANDCUFFS
- E05B65/00—Locks or fastenings for special use
- E05B65/08—Locks or fastenings for special use for sliding wings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Semiconductor Integrated Circuits (AREA)
- Dicing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004328061A JP2006140294A (ja) | 2004-11-11 | 2004-11-11 | 半導体基板、半導体装置の製造方法及び半導体装置の試験方法 |
JP2004328061 | 2004-11-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1773679A true CN1773679A (zh) | 2006-05-17 |
CN100580884C CN100580884C (zh) | 2010-01-13 |
Family
ID=36315478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200510053055A Expired - Fee Related CN100580884C (zh) | 2004-11-11 | 2005-03-08 | 半导体衬底和半导体器件制造方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20060097356A1 (zh) |
JP (1) | JP2006140294A (zh) |
KR (1) | KR100662833B1 (zh) |
CN (1) | CN100580884C (zh) |
TW (1) | TWI261874B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101533229B (zh) * | 2008-03-10 | 2013-03-27 | 精工电子有限公司 | 用于投影曝光装置的标线以及使用它的曝光方法 |
CN113078072A (zh) * | 2021-04-12 | 2021-07-06 | 长春光华微电子设备工程中心有限公司 | 一种探针检测方法 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4377300B2 (ja) * | 2004-06-22 | 2009-12-02 | Necエレクトロニクス株式会社 | 半導体ウエハおよび半導体装置の製造方法 |
TWI385772B (zh) * | 2007-03-30 | 2013-02-11 | Ngk Spark Plug Co | 配線基板的製造方法 |
US8723332B2 (en) | 2007-06-11 | 2014-05-13 | Invensas Corporation | Electrically interconnected stacked die assemblies |
US7879537B1 (en) | 2007-08-27 | 2011-02-01 | Cadence Design Systems, Inc. | Reticle and technique for multiple and single patterning |
WO2009035849A2 (en) | 2007-09-10 | 2009-03-19 | Vertical Circuits, Inc. | Semiconductor die mount by conformal die coating |
KR101554761B1 (ko) | 2008-03-12 | 2015-09-21 | 인벤사스 코포레이션 | 지지부에 실장되는 전기적으로 인터커넥트된 다이 조립체 |
US9153517B2 (en) | 2008-05-20 | 2015-10-06 | Invensas Corporation | Electrical connector between die pad and z-interconnect for stacked die assemblies |
US7863159B2 (en) | 2008-06-19 | 2011-01-04 | Vertical Circuits, Inc. | Semiconductor die separation method |
JP5396835B2 (ja) * | 2008-11-28 | 2014-01-22 | 富士通セミコンダクター株式会社 | レチクルレイアウトデータ作成方法及びレチクルレイアウトデータ作成装置 |
KR101715426B1 (ko) | 2009-06-26 | 2017-03-10 | 인벤사스 코포레이션 | 지그재그 구조로 적층된 다이용 전기 인터커넥트 |
WO2011056668A2 (en) | 2009-10-27 | 2011-05-12 | Vertical Circuits, Inc. | Selective die electrical insulation additive process |
TWI544604B (zh) | 2009-11-04 | 2016-08-01 | 英維瑟斯公司 | 具有降低應力電互連的堆疊晶粒總成 |
KR101102001B1 (ko) * | 2010-03-26 | 2012-01-02 | 주식회사 하이닉스반도체 | 웨이퍼 형성 방법 |
CN103367324A (zh) * | 2012-04-01 | 2013-10-23 | 上海华虹Nec电子有限公司 | 用于半导体芯片的切割道 |
JP6013894B2 (ja) * | 2012-12-12 | 2016-10-25 | 株式会社ディスコ | レーザー加工装置 |
JP6248401B2 (ja) * | 2013-03-19 | 2017-12-20 | 富士電機株式会社 | 半導体装置の製造方法およびそれに用いられる露光マスク |
JP6184855B2 (ja) * | 2013-12-16 | 2017-08-23 | 株式会社ディスコ | パッケージ基板の分割方法 |
CN105448649B (zh) * | 2014-08-07 | 2018-03-23 | 无锡华润上华科技有限公司 | 一种曝光单元的排布方法 |
US9490195B1 (en) | 2015-07-17 | 2016-11-08 | Invensas Corporation | Wafer-level flipped die stacks with leadframes or metal foil interconnects |
US9871019B2 (en) | 2015-07-17 | 2018-01-16 | Invensas Corporation | Flipped die stack assemblies with leadframe interconnects |
US9825002B2 (en) | 2015-07-17 | 2017-11-21 | Invensas Corporation | Flipped die stack |
US9508691B1 (en) | 2015-12-16 | 2016-11-29 | Invensas Corporation | Flipped die stacks with multiple rows of leadframe interconnects |
US10566310B2 (en) | 2016-04-11 | 2020-02-18 | Invensas Corporation | Microelectronic packages having stacked die and wire bond interconnects |
US9595511B1 (en) | 2016-05-12 | 2017-03-14 | Invensas Corporation | Microelectronic packages and assemblies with improved flyby signaling operation |
US9728524B1 (en) | 2016-06-30 | 2017-08-08 | Invensas Corporation | Enhanced density assembly having microelectronic packages mounted at substantial angle to board |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL177866C (nl) * | 1976-11-30 | 1985-12-02 | Mitsubishi Electric Corp | Werkwijze voor het vervaardigen van afzonderlijke halfgeleiderelementen, waarbij in een schijfvormig lichaam van halfgeleidermateriaal gevormde halfgeleiderelementen van elkaar worden gescheiden door het schijfvormige lichaam te breken. |
FR2771180B1 (fr) * | 1997-11-18 | 2000-01-07 | Samsung Electronics Co Ltd | Carte de controle pour tester une puce de circuit integre |
JP2000124158A (ja) * | 1998-10-13 | 2000-04-28 | Mitsubishi Electric Corp | 半導体ウェハ及び半導体装置 |
US6844218B2 (en) * | 2001-12-27 | 2005-01-18 | Texas Instruments Incorporated | Semiconductor wafer with grouped integrated circuit die having inter-die connections for group testing |
TW529097B (en) * | 2002-01-28 | 2003-04-21 | Amic Technology Taiwan Inc | Scribe lines for increasing wafer utilizable area |
US6570263B1 (en) * | 2002-06-06 | 2003-05-27 | Vate Technology Co., Ltd. | Structure of plated wire of fiducial marks for die-dicing package |
-
2004
- 2004-11-11 JP JP2004328061A patent/JP2006140294A/ja active Pending
-
2005
- 2005-02-23 US US11/062,488 patent/US20060097356A1/en not_active Abandoned
- 2005-02-24 TW TW094105589A patent/TWI261874B/zh not_active IP Right Cessation
- 2005-03-03 KR KR1020050017759A patent/KR100662833B1/ko not_active IP Right Cessation
- 2005-03-08 CN CN200510053055A patent/CN100580884C/zh not_active Expired - Fee Related
-
2008
- 2008-05-20 US US12/153,481 patent/US20080227226A1/en not_active Abandoned
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101533229B (zh) * | 2008-03-10 | 2013-03-27 | 精工电子有限公司 | 用于投影曝光装置的标线以及使用它的曝光方法 |
CN113078072A (zh) * | 2021-04-12 | 2021-07-06 | 长春光华微电子设备工程中心有限公司 | 一种探针检测方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20060044292A (ko) | 2006-05-16 |
US20080227226A1 (en) | 2008-09-18 |
TWI261874B (en) | 2006-09-11 |
CN100580884C (zh) | 2010-01-13 |
KR100662833B1 (ko) | 2006-12-28 |
US20060097356A1 (en) | 2006-05-11 |
TW200616059A (en) | 2006-05-16 |
JP2006140294A (ja) | 2006-06-01 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: FUJITSU MICROELECTRONICS CO., LTD. Free format text: FORMER OWNER: FUJITSU LIMITED Effective date: 20081107 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20081107 Address after: Tokyo, Japan Applicant after: FUJITSU MICROELECTRONICS Ltd. Address before: Kawasaki, Kanagawa, Japan Applicant before: Fujitsu Ltd. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: FUJITSU SEMICONDUCTOR CO., LTD. Free format text: FORMER NAME: FUJITSU MICROELECTRON CO., LTD. |
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CP01 | Change in the name or title of a patent holder |
Address after: Japan's Kanagawa Prefecture Yokohama Patentee after: FUJITSU MICROELECTRONICS Ltd. Address before: Japan's Kanagawa Prefecture Yokohama Patentee before: Fujitsu Microelectronics Ltd. |
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CP02 | Change in the address of a patent holder |
Address after: Japan's Kanagawa Prefecture Yokohama Patentee after: FUJITSU MICROELECTRONICS Ltd. Address before: Tokyo, Japan Patentee before: Fujitsu Microelectronics Ltd. |
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C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100113 Termination date: 20110308 |