CN1419466A - 升华精制的方法和装置 - Google Patents
升华精制的方法和装置 Download PDFInfo
- Publication number
- CN1419466A CN1419466A CN01807004A CN01807004A CN1419466A CN 1419466 A CN1419466 A CN 1419466A CN 01807004 A CN01807004 A CN 01807004A CN 01807004 A CN01807004 A CN 01807004A CN 1419466 A CN1419466 A CN 1419466A
- Authority
- CN
- China
- Prior art keywords
- unit
- sublimate
- electromagnetic induction
- temperature
- sublimation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D215/20—Oxygen atoms
- C07D215/24—Oxygen atoms attached in position 8
- C07D215/26—Alcohols; Ethers thereof
- C07D215/30—Metal salts; Chelates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/0011—Heating features
- B01D1/0017—Use of electrical or wave energy
- B01D1/0023—Induction heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D7/00—Sublimation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B63/00—Purification; Separation; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/82—Purification; Separation; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/82—Purification; Separation; Stabilisation; Use of additives
- C07C209/84—Purification
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/42—Separation; Purification; Stabilisation; Use of additives
- C07C51/43—Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/84—Separation, e.g. from tar; Purification
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP82195/00 | 2000-03-23 | ||
JP82195/2000 | 2000-03-23 | ||
JP2000082195 | 2000-03-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1419466A true CN1419466A (zh) | 2003-05-21 |
CN1256998C CN1256998C (zh) | 2006-05-24 |
Family
ID=18599027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB018070043A Expired - Lifetime CN1256998C (zh) | 2000-03-23 | 2001-03-19 | 升华精制的方法和装置 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6878183B2 (zh) |
EP (1) | EP1273330B1 (zh) |
JP (1) | JP4866527B2 (zh) |
KR (1) | KR100599428B1 (zh) |
CN (1) | CN1256998C (zh) |
AU (1) | AU2001241197A1 (zh) |
DE (1) | DE60132763T2 (zh) |
TW (1) | TWI233836B (zh) |
WO (1) | WO2001070364A1 (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102380224A (zh) * | 2011-11-25 | 2012-03-21 | 苏州华微特粉体技术有限公司 | 一种升华器 |
CN104926571A (zh) * | 2015-06-19 | 2015-09-23 | 中国工程物理研究院化工材料研究所 | 制备高纯度***的升华装置及方法 |
CN105481616A (zh) * | 2015-11-27 | 2016-04-13 | 中国工程物理研究院化工材料研究所 | ***颗粒表面包覆的装置及方法 |
US9937438B2 (en) | 2013-08-13 | 2018-04-10 | Merck Patent Gmbh | Method for vacuum purification |
CN109011679A (zh) * | 2018-09-30 | 2018-12-18 | 深圳普瑞材料技术有限公司 | 一种有机化合物升华提纯的收集装置 |
CN109414629A (zh) * | 2016-04-08 | 2019-03-01 | 株式会社半导体能源研究所 | 纯化方法及纯化装置 |
CN109821268A (zh) * | 2019-03-06 | 2019-05-31 | 泰州市惠利生物科技有限公司 | 一种5-甲基吡嗪-2-羧酸粗品的纯化方法 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100434273B1 (ko) * | 2001-06-29 | 2004-06-05 | 엘지전자 주식회사 | 유기물질의 정제방법 |
JP2004067527A (ja) * | 2002-08-02 | 2004-03-04 | Nippon Shokubai Co Ltd | 昇華性物質の回収方法 |
WO2005108372A1 (en) * | 2004-04-05 | 2005-11-17 | Albemarle Corporation | Process to make metal complexes with volatile liquid metal compounds |
KR100582663B1 (ko) * | 2004-07-21 | 2006-05-23 | 제일모직주식회사 | 유기물질의 승화정제방법 |
US20060263279A1 (en) * | 2005-04-28 | 2006-11-23 | Laurencin Cato T | Adjustable path sublimator system and related method of use |
KR100674680B1 (ko) * | 2005-05-18 | 2007-01-25 | (주)루디스 | 고체 재료 연속 고순도 정제장치 |
US20060289289A1 (en) * | 2005-06-23 | 2006-12-28 | Christian Kloc | Purification of organic compositions by sublimation |
KR100754902B1 (ko) * | 2005-12-09 | 2007-09-04 | (주) 디오브이 | 유기전계 발광재료의 정제방법 |
JP2007246424A (ja) * | 2006-03-15 | 2007-09-27 | National Institute Of Advanced Industrial & Technology | 有機材料の精製方法 |
KR101296430B1 (ko) * | 2006-06-15 | 2013-08-13 | 엘지디스플레이 주식회사 | 수직형 승화 정제 장치 및 방법 |
US20090246077A1 (en) * | 2008-03-31 | 2009-10-01 | Ufc Corporation | Container assembly for sublimation |
US9312037B2 (en) * | 2011-09-29 | 2016-04-12 | Uchicago Argonne, Llc | Methods for producing Cu-67 radioisotope with use of a ceramic capsule for medical applications |
JP2013116879A (ja) * | 2011-10-31 | 2013-06-13 | Idemitsu Kosan Co Ltd | 有機材料の精製装置及び有機材料の精製方法 |
KR20130096370A (ko) * | 2012-02-22 | 2013-08-30 | 삼성디스플레이 주식회사 | 유기물 정제장치 |
KR101337336B1 (ko) * | 2012-03-13 | 2013-12-12 | 주식회사 피브이디 | 독립적인 가열부를 구비한 유기물 승화 정제장치 |
KR101309010B1 (ko) * | 2013-02-26 | 2013-09-17 | 희성소재 (주) | 승화 정제 장치 |
JP6111171B2 (ja) * | 2013-09-02 | 2017-04-05 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
KR101580838B1 (ko) * | 2014-02-10 | 2015-12-30 | 희성소재(주) | 저온 승화 정제 장치 |
CN106030847B (zh) * | 2014-02-14 | 2018-12-11 | 伊尔索勒德株式会社 | 利用离子性液体的有机材料提纯方法及提纯装置 |
JP6586293B2 (ja) * | 2015-05-26 | 2019-10-02 | 高周波熱錬株式会社 | マグネシウムの精製方法及びマグネシウム精製装置 |
JP2019111507A (ja) * | 2017-12-26 | 2019-07-11 | 株式会社 エイエルエステクノロジー | 精製装置 |
US11168394B2 (en) | 2018-03-14 | 2021-11-09 | CeeVeeTech, LLC | Method and apparatus for making a vapor of precise concentration by sublimation |
CN108299516A (zh) * | 2018-04-03 | 2018-07-20 | 江西佳因光电材料有限公司 | 一种超高纯茂金属源的升华提纯装置及其提纯超高纯茂金属源的方法 |
JP6432874B1 (ja) * | 2018-06-26 | 2018-12-05 | 株式会社奥本研究所 | 精製装置 |
RU201951U1 (ru) * | 2020-09-16 | 2021-01-22 | Федеральное государственное бюджетное образовательное учреждение высшего образования «Российский химико-технологический университет имени Д.И. Менделеева» (РХТУ им. Д.И. Менделеева) | Реактор для очистки веществ методом вакуумной сублимации |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB510196A (en) | 1937-03-27 | 1939-07-28 | Magnesium Elektron Ltd | Improved apparatus for the thermal production of magnesium |
GB536821A (en) | 1939-11-24 | 1941-05-28 | John Hugo Rutherford | Improvements in or relating to the recovery of magnesium from alloys |
GB552234A (en) | 1942-02-03 | 1943-03-29 | Int Alloys Ltd | Apparatus for use in distilling metals by electric induction heating |
NL244298A (zh) | 1959-10-13 | |||
GB1279208A (en) * | 1970-03-24 | 1972-06-28 | Standard Telephones Cables Ltd | Method of and apparatus for producing fine powder |
JP2583306B2 (ja) * | 1989-02-10 | 1997-02-19 | 日本電信電話株式会社 | 試薬の精製装置とその精製方法 |
JPH03143506A (ja) * | 1989-10-27 | 1991-06-19 | Nippon Telegr & Teleph Corp <Ntt> | 精製装置及び精製方法 |
DE69223288T2 (de) * | 1991-07-09 | 1998-03-19 | Inst Francais Du Petrol | Destillations-Reaktor und seine Verwendung für Gleichgewichts-Reaktionen |
JPH0543203A (ja) * | 1991-08-13 | 1993-02-23 | Mitsui Toatsu Chem Inc | 塩酸蒸留装置 |
JPH05331564A (ja) * | 1991-08-29 | 1993-12-14 | Ogihara:Kk | 誘導加熱式真空蒸発回収方法およびその装置 |
US5131634A (en) * | 1991-10-07 | 1992-07-21 | Westinghouse Electric Corp. | Sublimer-reactor system with weighing means |
JPH06263438A (ja) | 1993-03-09 | 1994-09-20 | Mitsubishi Petrochem Co Ltd | 高純度無水塩化アルミニウムの製造方法 |
JP3246060B2 (ja) * | 1993-04-14 | 2002-01-15 | 日本電信電話株式会社 | フッ化物原料の精製方法 |
JPH0724205A (ja) | 1993-07-05 | 1995-01-27 | Mitsubishi Cable Ind Ltd | 昇華方法 |
JP3070829B2 (ja) | 1996-08-13 | 2000-07-31 | 株式会社瀬田技研 | 電磁誘導加熱による分離装置及び分離方法 |
JP4795502B2 (ja) * | 1998-09-25 | 2011-10-19 | 新日鐵化学株式会社 | 昇華精製方法及び装置 |
TW585895B (en) * | 1999-09-02 | 2004-05-01 | Nippon Steel Chemical Co | Organic EL material |
-
2001
- 2001-03-19 AU AU2001241197A patent/AU2001241197A1/en not_active Abandoned
- 2001-03-19 DE DE60132763T patent/DE60132763T2/de not_active Expired - Lifetime
- 2001-03-19 EP EP01912491A patent/EP1273330B1/en not_active Expired - Lifetime
- 2001-03-19 KR KR1020027012548A patent/KR100599428B1/ko active IP Right Grant
- 2001-03-19 WO PCT/JP2001/002173 patent/WO2001070364A1/ja active IP Right Grant
- 2001-03-19 JP JP2001568551A patent/JP4866527B2/ja not_active Expired - Lifetime
- 2001-03-19 US US10/239,064 patent/US6878183B2/en not_active Expired - Lifetime
- 2001-03-19 CN CNB018070043A patent/CN1256998C/zh not_active Expired - Lifetime
- 2001-03-22 TW TW090106791A patent/TWI233836B/zh not_active IP Right Cessation
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102380224A (zh) * | 2011-11-25 | 2012-03-21 | 苏州华微特粉体技术有限公司 | 一种升华器 |
US9937438B2 (en) | 2013-08-13 | 2018-04-10 | Merck Patent Gmbh | Method for vacuum purification |
CN104926571A (zh) * | 2015-06-19 | 2015-09-23 | 中国工程物理研究院化工材料研究所 | 制备高纯度***的升华装置及方法 |
CN105481616A (zh) * | 2015-11-27 | 2016-04-13 | 中国工程物理研究院化工材料研究所 | ***颗粒表面包覆的装置及方法 |
CN105481616B (zh) * | 2015-11-27 | 2018-04-27 | 中国工程物理研究院化工材料研究所 | ***颗粒表面包覆的装置及方法 |
CN109414629A (zh) * | 2016-04-08 | 2019-03-01 | 株式会社半导体能源研究所 | 纯化方法及纯化装置 |
CN109414629B (zh) * | 2016-04-08 | 2021-06-29 | 株式会社半导体能源研究所 | 纯化方法及纯化装置 |
US11090577B2 (en) | 2016-04-08 | 2021-08-17 | Semiconductor Energy Laboratory Co., Ltd. | Purification method and purification apparatus |
CN109011679A (zh) * | 2018-09-30 | 2018-12-18 | 深圳普瑞材料技术有限公司 | 一种有机化合物升华提纯的收集装置 |
CN109011679B (zh) * | 2018-09-30 | 2024-05-31 | 深圳普瑞材料技术有限公司 | 一种有机化合物升华提纯的收集装置 |
CN109821268A (zh) * | 2019-03-06 | 2019-05-31 | 泰州市惠利生物科技有限公司 | 一种5-甲基吡嗪-2-羧酸粗品的纯化方法 |
CN109821268B (zh) * | 2019-03-06 | 2021-06-22 | 江苏惠利生物科技有限公司 | 一种5-甲基吡嗪-2-羧酸粗品的纯化方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI233836B (en) | 2005-06-11 |
DE60132763T2 (de) | 2009-02-12 |
WO2001070364A1 (fr) | 2001-09-27 |
US20030030193A1 (en) | 2003-02-13 |
KR20020082490A (ko) | 2002-10-31 |
EP1273330A4 (en) | 2003-06-04 |
KR100599428B1 (ko) | 2006-07-12 |
CN1256998C (zh) | 2006-05-24 |
EP1273330B1 (en) | 2008-02-13 |
AU2001241197A1 (en) | 2001-10-03 |
DE60132763D1 (de) | 2008-03-27 |
US6878183B2 (en) | 2005-04-12 |
JP4866527B2 (ja) | 2012-02-01 |
EP1273330A1 (en) | 2003-01-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1256998C (zh) | 升华精制的方法和装置 | |
US10391418B2 (en) | Apparatus for vacuum purification | |
JP6659434B2 (ja) | 高純度6塩化タングステンとその製造方法 | |
JP4795502B2 (ja) | 昇華精製方法及び装置 | |
CN108085518B (zh) | 一种真空蒸馏设备及超高纯铟的制备方法 | |
EP1335032B1 (en) | Vacuum distillation method and apparatus for enhanced purification of high-purity metals like indium | |
EP1288163B1 (en) | Purified silicon production system | |
EP0529593B1 (en) | A glass carbon coated graphite chuck for use in producing polycrystalline silicon | |
WO2016008312A1 (zh) | 有机固体材料的新型纯化方法 | |
Piszczek et al. | Characterization of silver trimethylacetate complexes with tertiary phosphines as CVD precursors of thin silver films | |
CN1250766C (zh) | 制造复合材料的方法以及该方法制造的复合材料 | |
JP4722403B2 (ja) | シリコン精製装置及びシリコン精製方法 | |
JPH06108175A (ja) | 粗亜鉛の精製方法およびその装置 | |
JPH0798980B2 (ja) | 蒸留精製方法 | |
EP1749111A1 (en) | Gas impervious electrodes for carbothermic reduction furnace | |
CN103964439B (zh) | 一种磨料级SiC颗粒表面纯净化处理方法 | |
WO2002053250A1 (fr) | Procede et dispositif de purification et distillation pour materiaux organiques a point de fusion eleve | |
RU2199608C2 (ru) | Способ получения углеродосодержащих покрытий | |
CN104926571A (zh) | 制备高纯度***的升华装置及方法 | |
JP2004131299A (ja) | 精製シリコンの製造装置 | |
JP2015054289A (ja) | 昇華精製装置および昇華精製方法 | |
CN117735557A (zh) | 二碘硅烷的提纯方法 | |
JPS6345105A (ja) | 窒化アルミニウム微粒子の製造方法 | |
CN1762789A (zh) | 一种在原位形成纳米结构的方法和装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: NIPPON STEEL + SUMITOMO METAL CORPORATION Free format text: FORMER NAME: NIPPON SEEL CHEMICAL CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: Nippon Steel Chemical Co. Patentee after: Osaka Yuka Ind Co., Ltd. Address before: Tokyo, Japan Patentee before: Nippon Seel Chemical Co., Ltd. Patentee before: Osaka Yuka Ind Co., Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190212 Address after: Tokyo, Japan Co-patentee after: Osaka Yuka Ind Co., Ltd. Patentee after: Nippon Iron Chemical Materials Co., Ltd. Address before: Tokyo, Japan Co-patentee before: Osaka Yuka Ind Co., Ltd. Patentee before: Nippon Steel Chemical Co. |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20060524 |