CN114574832A - 成膜装置以及脚手架单元 - Google Patents

成膜装置以及脚手架单元 Download PDF

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Publication number
CN114574832A
CN114574832A CN202111373132.5A CN202111373132A CN114574832A CN 114574832 A CN114574832 A CN 114574832A CN 202111373132 A CN202111373132 A CN 202111373132A CN 114574832 A CN114574832 A CN 114574832A
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CN
China
Prior art keywords
unit
scaffold
source unit
film
film formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202111373132.5A
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English (en)
Chinese (zh)
Inventor
涩谷孝史
加势翔也
佐藤功康
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Tokki Corp
Original Assignee
Canon Tokki Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Tokki Corp filed Critical Canon Tokki Corp
Publication of CN114574832A publication Critical patent/CN114574832A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A40/00—Adaptation technologies in agriculture, forestry, livestock or agroalimentary production
    • Y02A40/10—Adaptation technologies in agriculture, forestry, livestock or agroalimentary production in agriculture
    • Y02A40/25—Greenhouse technology, e.g. cooling systems therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN202111373132.5A 2020-11-30 2021-11-19 成膜装置以及脚手架单元 Pending CN114574832A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020198681A JP7177130B2 (ja) 2020-11-30 2020-11-30 成膜装置及び足場ユニット
JP2020-198681 2020-11-30

Publications (1)

Publication Number Publication Date
CN114574832A true CN114574832A (zh) 2022-06-03

Family

ID=81770334

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111373132.5A Pending CN114574832A (zh) 2020-11-30 2021-11-19 成膜装置以及脚手架单元

Country Status (2)

Country Link
JP (1) JP7177130B2 (ja)
CN (1) CN114574832A (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003081560A (ja) * 2001-09-11 2003-03-19 Toshiba Elevator Co Ltd エレベータ
CN201065753Y (zh) * 2007-07-03 2008-05-28 魏峰 折叠式抽油机高空作业安全平台
TW201346050A (zh) * 2012-02-06 2013-11-16 Tokyo Electron Ltd 成膜裝置及成膜方法
JP2016014174A (ja) * 2014-07-02 2016-01-28 株式会社アルバック 成膜装置及び成膜装置のメンテナンス方法
CN108689356A (zh) * 2018-06-14 2018-10-23 中国空气动力研究与发展中心超高速空气动力研究所 一种具有自锁功能的多连杆结构
CN109217175A (zh) * 2018-10-25 2019-01-15 河北晋昌电力工程有限公司 一种平台装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030010288A1 (en) 2001-02-08 2003-01-16 Shunpei Yamazaki Film formation apparatus and film formation method
JP4557710B2 (ja) 2004-12-24 2010-10-06 株式会社ユーテック 成膜装置及び蒸着装置
JP4800149B2 (ja) * 2006-08-17 2011-10-26 東京エレクトロン株式会社 半導体製造装置
JP5350692B2 (ja) * 2008-07-03 2013-11-27 東京エレクトロン株式会社 基板処理装置及びそれに用いられる支持フレーム
JP5449878B2 (ja) * 2009-06-19 2014-03-19 大日本スクリーン製造株式会社 基板処理装置
JP2011107521A (ja) 2009-11-19 2011-06-02 Miyagi Nikon Precision Co Ltd 搬送装置のメンテナンス方法
KR20130069037A (ko) 2011-12-16 2013-06-26 삼성디스플레이 주식회사 유기층 증착 장치, 이를 이용한 유기 발광 표시 장치의 제조 방법 및 유기 발광 표시 장치
JP2013162068A (ja) 2012-02-08 2013-08-19 Tokyo Electron Ltd 基板処理装置
JP7259281B2 (ja) * 2018-11-21 2023-04-18 東京エレクトロン株式会社 基板処理装置、基板処理システム及び基板処理方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003081560A (ja) * 2001-09-11 2003-03-19 Toshiba Elevator Co Ltd エレベータ
CN201065753Y (zh) * 2007-07-03 2008-05-28 魏峰 折叠式抽油机高空作业安全平台
TW201346050A (zh) * 2012-02-06 2013-11-16 Tokyo Electron Ltd 成膜裝置及成膜方法
JP2016014174A (ja) * 2014-07-02 2016-01-28 株式会社アルバック 成膜装置及び成膜装置のメンテナンス方法
CN108689356A (zh) * 2018-06-14 2018-10-23 中国空气动力研究与发展中心超高速空气动力研究所 一种具有自锁功能的多连杆结构
CN109217175A (zh) * 2018-10-25 2019-01-15 河北晋昌电力工程有限公司 一种平台装置

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Publication number Publication date
JP7177130B2 (ja) 2022-11-22
JP2022086584A (ja) 2022-06-09
KR20220076322A (ko) 2022-06-08

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