CN112534307B - 防反射膜、光学元件及防反射膜的成膜方法 - Google Patents

防反射膜、光学元件及防反射膜的成膜方法 Download PDF

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Publication number
CN112534307B
CN112534307B CN201980027116.5A CN201980027116A CN112534307B CN 112534307 B CN112534307 B CN 112534307B CN 201980027116 A CN201980027116 A CN 201980027116A CN 112534307 B CN112534307 B CN 112534307B
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film
optical
optical element
antireflection film
optical surface
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CN201980027116.5A
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Chinese (zh)
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CN112534307A (zh
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涩谷穣
川俣和生
桥本涼
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Tamron Co Ltd
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Tamron Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
CN201980027116.5A 2018-08-20 2019-08-09 防反射膜、光学元件及防反射膜的成膜方法 Active CN112534307B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018154155A JP7237489B2 (ja) 2018-08-20 2018-08-20 反射防止膜、光学素子及び反射防止膜の成膜方法
JP2018-154155 2018-08-20
PCT/JP2019/031593 WO2020039976A1 (ja) 2018-08-20 2019-08-09 反射防止膜、光学素子及び反射防止膜の成膜方法

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CN112534307A CN112534307A (zh) 2021-03-19
CN112534307B true CN112534307B (zh) 2022-09-27

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JP (1) JP7237489B2 (ja)
CN (1) CN112534307B (ja)
WO (1) WO2020039976A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7349798B2 (ja) * 2019-03-06 2023-09-25 株式会社タムロン 反射防止膜、光学素子及び反射防止膜の成膜方法
CN114133226B (zh) * 2021-12-30 2022-11-08 苏州晶生新材料有限公司 一种光学镀层基材及使用方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03255401A (ja) * 1990-03-06 1991-11-14 Olympus Optical Co Ltd プラスチック基板へのＭｇＦ↓２膜成膜方法
JP2004098420A (ja) * 2002-09-09 2004-04-02 Dainippon Printing Co Ltd 透明積層フィルム、偏光板、液晶表示素子及び液晶表示装置
JP2006091600A (ja) * 2004-09-27 2006-04-06 Konica Minolta Opto Inc レンズへの膜形成方法及び装置
JP2011150154A (ja) * 2010-01-22 2011-08-04 Showa Shinku:Kk 薄膜、及び、薄膜の形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5588135B2 (ja) * 2009-08-10 2014-09-10 ホーヤ レンズ マニュファクチャリング フィリピン インク 光学物品の製造方法
JP2011048228A (ja) * 2009-08-28 2011-03-10 Seiko Epson Corp 光学物品およびその製造方法
JP2016080857A (ja) * 2014-10-16 2016-05-16 リコーイメージング株式会社 反射防止膜、それを用いた光学部材、及び光学機器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03255401A (ja) * 1990-03-06 1991-11-14 Olympus Optical Co Ltd プラスチック基板へのＭｇＦ↓２膜成膜方法
JP2004098420A (ja) * 2002-09-09 2004-04-02 Dainippon Printing Co Ltd 透明積層フィルム、偏光板、液晶表示素子及び液晶表示装置
JP2006091600A (ja) * 2004-09-27 2006-04-06 Konica Minolta Opto Inc レンズへの膜形成方法及び装置
JP2011150154A (ja) * 2010-01-22 2011-08-04 Showa Shinku:Kk 薄膜、及び、薄膜の形成方法

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JP2020030237A (ja) 2020-02-27
WO2020039976A1 (ja) 2020-02-27
JP7237489B2 (ja) 2023-03-13
CN112534307A (zh) 2021-03-19

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