CN110785706A - 感光性着色组合物、固化物、着色间隔物及图像显示装置 - Google Patents

感光性着色组合物、固化物、着色间隔物及图像显示装置 Download PDF

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Publication number
CN110785706A
CN110785706A CN201880041968.5A CN201880041968A CN110785706A CN 110785706 A CN110785706 A CN 110785706A CN 201880041968 A CN201880041968 A CN 201880041968A CN 110785706 A CN110785706 A CN 110785706A
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China
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pigment
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CN201880041968.5A
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English (en)
Chinese (zh)
Inventor
泽井良尚
裴丽华
伊藤敦哉
大津猛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Mitsubishi Kasei Corp
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Mitsubishi Kasei Corp
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Publication of CN110785706A publication Critical patent/CN110785706A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
CN201880041968.5A 2017-06-30 2018-06-29 感光性着色组合物、固化物、着色间隔物及图像显示装置 Pending CN110785706A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017129366 2017-06-30
JP2017-129366 2017-06-30
PCT/JP2018/024797 WO2019004427A1 (ja) 2017-06-30 2018-06-29 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置

Publications (1)

Publication Number Publication Date
CN110785706A true CN110785706A (zh) 2020-02-11

Family

ID=64741995

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880041968.5A Pending CN110785706A (zh) 2017-06-30 2018-06-29 感光性着色组合物、固化物、着色间隔物及图像显示装置

Country Status (5)

Country Link
JP (1) JP7351221B2 (ja)
KR (1) KR102582198B1 (ja)
CN (1) CN110785706A (ja)
TW (1) TWI768074B (ja)
WO (1) WO2019004427A1 (ja)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010085623A (ja) * 2008-09-30 2010-04-15 Fujifilm Corp 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
CN101809094A (zh) * 2007-09-27 2010-08-18 阪田油墨株式会社 颜料分散助剂、含有该颜料分散助剂的颜料分散物及其用途
CN104081280A (zh) * 2012-01-31 2014-10-01 三菱化学株式会社 着色感光性组合物、黑色光间隔物及滤色片
JP2015081932A (ja) * 2013-10-21 2015-04-27 富士フイルム株式会社 赤色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010223987A (ja) 2009-03-19 2010-10-07 Dnp Fine Chemicals Co Ltd カラーフィルター用赤色組成物及びそれを有するカラーフィルター
KR101266295B1 (ko) 2009-09-09 2013-05-23 제일모직주식회사 흑색 감광성 수지 조성물 및 이를 이용하여 형성된 차광층
KR101799492B1 (ko) 2011-08-04 2017-11-21 엘지디스플레이 주식회사 액정표시장치
KR101973750B1 (ko) 2013-03-29 2019-09-03 엘지디스플레이 주식회사 박막 트랜지스터 액정표시장치
JP6147143B2 (ja) * 2013-08-28 2017-06-14 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置
WO2016143878A1 (ja) * 2015-03-11 2016-09-15 三菱化学株式会社 着色スペーサー形成用感光性着色組成物、硬化物、着色スペーサー、画像表示装置
KR20170017447A (ko) 2015-08-07 2017-02-15 엘지디스플레이 주식회사 액정 표시 장치 및 그 제조 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101809094A (zh) * 2007-09-27 2010-08-18 阪田油墨株式会社 颜料分散助剂、含有该颜料分散助剂的颜料分散物及其用途
JP2010085623A (ja) * 2008-09-30 2010-04-15 Fujifilm Corp 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
CN104081280A (zh) * 2012-01-31 2014-10-01 三菱化学株式会社 着色感光性组合物、黑色光间隔物及滤色片
JP2015081932A (ja) * 2013-10-21 2015-04-27 富士フイルム株式会社 赤色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
WO2015060228A1 (ja) * 2013-10-21 2015-04-30 富士フイルム株式会社 赤色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置

Also Published As

Publication number Publication date
WO2019004427A1 (ja) 2019-01-03
KR20200023297A (ko) 2020-03-04
TW201905592A (zh) 2019-02-01
KR102582198B1 (ko) 2023-09-22
JPWO2019004427A1 (ja) 2020-04-30
TWI768074B (zh) 2022-06-21
JP7351221B2 (ja) 2023-09-27

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