KR102582198B1 - 감광성 착색 조성물, 경화물, 착색 스페이서, 및 화상 표시 장치 - Google Patents
감광성 착색 조성물, 경화물, 착색 스페이서, 및 화상 표시 장치 Download PDFInfo
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- KR102582198B1 KR102582198B1 KR1020197037918A KR20197037918A KR102582198B1 KR 102582198 B1 KR102582198 B1 KR 102582198B1 KR 1020197037918 A KR1020197037918 A KR 1020197037918A KR 20197037918 A KR20197037918 A KR 20197037918A KR 102582198 B1 KR102582198 B1 KR 102582198B1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Structural Engineering (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2017-129366 | 2017-06-30 | ||
JP2017129366 | 2017-06-30 | ||
PCT/JP2018/024797 WO2019004427A1 (ja) | 2017-06-30 | 2018-06-29 | 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20200023297A KR20200023297A (ko) | 2020-03-04 |
KR102582198B1 true KR102582198B1 (ko) | 2023-09-22 |
Family
ID=64741995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020197037918A KR102582198B1 (ko) | 2017-06-30 | 2018-06-29 | 감광성 착색 조성물, 경화물, 착색 스페이서, 및 화상 표시 장치 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7351221B2 (ja) |
KR (1) | KR102582198B1 (ja) |
CN (1) | CN110785706A (ja) |
TW (1) | TWI768074B (ja) |
WO (1) | WO2019004427A1 (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009041312A1 (ja) | 2007-09-27 | 2009-04-02 | Sakata Inx Corp. | 顔料分散助剤、それを含有する顔料分散物及びその用途 |
JP2010085623A (ja) * | 2008-09-30 | 2010-04-15 | Fujifilm Corp | 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
JP2010223987A (ja) | 2009-03-19 | 2010-10-07 | Dnp Fine Chemicals Co Ltd | カラーフィルター用赤色組成物及びそれを有するカラーフィルター |
JP2015081932A (ja) | 2013-10-21 | 2015-04-27 | 富士フイルム株式会社 | 赤色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101266295B1 (ko) | 2009-09-09 | 2013-05-23 | 제일모직주식회사 | 흑색 감광성 수지 조성물 및 이를 이용하여 형성된 차광층 |
KR101799492B1 (ko) | 2011-08-04 | 2017-11-21 | 엘지디스플레이 주식회사 | 액정표시장치 |
CN104081280B (zh) * | 2012-01-31 | 2019-05-31 | 三菱化学株式会社 | 着色感光性组合物、黑色光间隔物及滤色片 |
KR101973750B1 (ko) | 2013-03-29 | 2019-09-03 | 엘지디스플레이 주식회사 | 박막 트랜지스터 액정표시장치 |
JP6147143B2 (ja) * | 2013-08-28 | 2017-06-14 | 富士フイルム株式会社 | 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置 |
WO2016143878A1 (ja) * | 2015-03-11 | 2016-09-15 | 三菱化学株式会社 | 着色スペーサー形成用感光性着色組成物、硬化物、着色スペーサー、画像表示装置 |
KR20170017447A (ko) | 2015-08-07 | 2017-02-15 | 엘지디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
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2018
- 2018-06-29 KR KR1020197037918A patent/KR102582198B1/ko active IP Right Grant
- 2018-06-29 CN CN201880041968.5A patent/CN110785706A/zh active Pending
- 2018-06-29 JP JP2019527057A patent/JP7351221B2/ja active Active
- 2018-06-29 TW TW107122683A patent/TWI768074B/zh active
- 2018-06-29 WO PCT/JP2018/024797 patent/WO2019004427A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009041312A1 (ja) | 2007-09-27 | 2009-04-02 | Sakata Inx Corp. | 顔料分散助剤、それを含有する顔料分散物及びその用途 |
JP2010085623A (ja) * | 2008-09-30 | 2010-04-15 | Fujifilm Corp | 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
JP2010223987A (ja) | 2009-03-19 | 2010-10-07 | Dnp Fine Chemicals Co Ltd | カラーフィルター用赤色組成物及びそれを有するカラーフィルター |
JP2015081932A (ja) | 2013-10-21 | 2015-04-27 | 富士フイルム株式会社 | 赤色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
Also Published As
Publication number | Publication date |
---|---|
CN110785706A (zh) | 2020-02-11 |
WO2019004427A1 (ja) | 2019-01-03 |
KR20200023297A (ko) | 2020-03-04 |
TW201905592A (zh) | 2019-02-01 |
JPWO2019004427A1 (ja) | 2020-04-30 |
TWI768074B (zh) | 2022-06-21 |
JP7351221B2 (ja) | 2023-09-27 |
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