CN106371295A - 显影液的管理方法及装置 - Google Patents

显影液的管理方法及装置 Download PDF

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Publication number
CN106371295A
CN106371295A CN201510994042.6A CN201510994042A CN106371295A CN 106371295 A CN106371295 A CN 106371295A CN 201510994042 A CN201510994042 A CN 201510994042A CN 106371295 A CN106371295 A CN 106371295A
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CN
China
Prior art keywords
developer solution
concentration
mentioned
carbon dioxide
value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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CN201510994042.6A
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English (en)
Chinese (zh)
Inventor
中川俊元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hirama Rika Kenkyusho Ltd
Hirama Laboratories Co Ltd
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Hirama Rika Kenkyusho Ltd
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Application filed by Hirama Rika Kenkyusho Ltd filed Critical Hirama Rika Kenkyusho Ltd
Publication of CN106371295A publication Critical patent/CN106371295A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201510994042.6A 2015-07-22 2015-12-25 显影液的管理方法及装置 Pending CN106371295A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015144971A JP6505534B2 (ja) 2015-07-22 2015-07-22 現像液の管理方法及び装置
JP2015-144971 2015-07-22

Publications (1)

Publication Number Publication Date
CN106371295A true CN106371295A (zh) 2017-02-01

Family

ID=57880865

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510994042.6A Pending CN106371295A (zh) 2015-07-22 2015-12-25 显影液的管理方法及装置

Country Status (4)

Country Link
JP (1) JP6505534B2 (ja)
KR (1) KR20170011962A (ja)
CN (1) CN106371295A (ja)
TW (2) TWI676086B (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107300838A (zh) * 2017-08-08 2017-10-27 武汉华星光电技术有限公司 显影液稀释***
CN108121174A (zh) * 2017-12-20 2018-06-05 武汉华星光电半导体显示技术有限公司 显影设备及其显影液供应***
CN108957967A (zh) * 2017-05-26 2018-12-07 株式会社平间理化研究所 显影液的浓度管理装置以及基板的显影处理***
CN109791374A (zh) * 2017-08-23 2019-05-21 深圳市柔宇科技有限公司 显影液回收***

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7137959B2 (ja) * 2018-04-20 2022-09-15 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置

Citations (9)

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US5223881A (en) * 1991-08-07 1993-06-29 Hirama Rika Kenkyujio Ltd. Apparatus for controlling developing solution
CN1373393A (zh) * 2001-02-06 2002-10-09 长濑产业株式会社 显影液制造装置及显影液制造方法
CN1402087A (zh) * 2001-08-16 2003-03-12 株式会社平间理化研究所 碱性加工液、加工液的配制方法及其装置以及加工液的供给方法及其装置
JP2004271974A (ja) * 2003-03-10 2004-09-30 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法
JP2005070351A (ja) * 2003-08-22 2005-03-17 Nagase & Co Ltd 現像液供給方法及び装置
CN101563654A (zh) * 2006-11-30 2009-10-21 三菱化学工程株式会社 显影液的浓度调节方法、调制装置和显影液
CN101641647A (zh) * 2007-01-17 2010-02-03 索尼株式会社 显影液以及制备微细加工材料的方法
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法
US20110208495A1 (en) * 2008-08-05 2011-08-25 Fujitsu Limited Method, system, and program for generating prediction model based on multiple regression analysis

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CN1327888A (zh) * 2000-06-09 2001-12-26 株式会社平间理化研究所 基板表面处理装置
JP2003131398A (ja) * 2001-08-16 2003-05-09 Hirama Rika Kenkyusho:Kk アルカリ系加工液、加工液調整方法及び装置、並びに、加工液供給方法及び装置
JP3782374B2 (ja) * 2002-07-19 2006-06-07 株式会社平間理化研究所 レジスト剥離装置
US20040055621A1 (en) * 2002-09-24 2004-03-25 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy
JP4323946B2 (ja) * 2003-12-19 2009-09-02 キヤノン株式会社 露光装置
US7580111B2 (en) * 2004-05-21 2009-08-25 Jsr Corporation Liquid for immersion exposure and immersion exposure method
JP4649158B2 (ja) * 2004-09-30 2011-03-09 富士フイルム株式会社 ホログラム記録方法
JP2006285132A (ja) * 2005-04-05 2006-10-19 Konica Minolta Medical & Graphic Inc 感光性平版印刷版の処理方法
US20080156356A1 (en) * 2006-12-05 2008-07-03 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
US20100086880A1 (en) * 2007-01-17 2010-04-08 Sony Corporation Developing solution and method for production of finely patterned material
JP6721157B2 (ja) * 2015-07-22 2020-07-08 株式会社平間理化研究所 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置
JP6713658B2 (ja) * 2015-07-22 2020-06-24 株式会社平間理化研究所 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5223881A (en) * 1991-08-07 1993-06-29 Hirama Rika Kenkyujio Ltd. Apparatus for controlling developing solution
CN1373393A (zh) * 2001-02-06 2002-10-09 长濑产业株式会社 显影液制造装置及显影液制造方法
CN1402087A (zh) * 2001-08-16 2003-03-12 株式会社平间理化研究所 碱性加工液、加工液的配制方法及其装置以及加工液的供给方法及其装置
JP2004271974A (ja) * 2003-03-10 2004-09-30 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法
JP2005070351A (ja) * 2003-08-22 2005-03-17 Nagase & Co Ltd 現像液供給方法及び装置
CN101563654A (zh) * 2006-11-30 2009-10-21 三菱化学工程株式会社 显影液的浓度调节方法、调制装置和显影液
CN101641647A (zh) * 2007-01-17 2010-02-03 索尼株式会社 显影液以及制备微细加工材料的方法
US20110208495A1 (en) * 2008-08-05 2011-08-25 Fujitsu Limited Method, system, and program for generating prediction model based on multiple regression analysis
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108957967A (zh) * 2017-05-26 2018-12-07 株式会社平间理化研究所 显影液的浓度管理装置以及基板的显影处理***
CN107300838A (zh) * 2017-08-08 2017-10-27 武汉华星光电技术有限公司 显影液稀释***
CN109791374A (zh) * 2017-08-23 2019-05-21 深圳市柔宇科技有限公司 显影液回收***
CN109791374B (zh) * 2017-08-23 2022-05-17 深圳市柔宇科技股份有限公司 显影液回收***
CN108121174A (zh) * 2017-12-20 2018-06-05 武汉华星光电半导体显示技术有限公司 显影设备及其显影液供应***
WO2019119594A1 (zh) * 2017-12-20 2019-06-27 武汉华星光电半导体显示技术有限公司 显影设备及其显影液供应***

Also Published As

Publication number Publication date
TWI676086B (zh) 2019-11-01
KR20170011962A (ko) 2017-02-02
TWI695236B (zh) 2020-06-01
TW201944181A (zh) 2019-11-16
JP2017028091A (ja) 2017-02-02
JP6505534B2 (ja) 2019-04-24
TW201704901A (zh) 2017-02-01

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Application publication date: 20170201