CN106371295A - 显影液的管理方法及装置 - Google Patents
显影液的管理方法及装置 Download PDFInfo
- Publication number
- CN106371295A CN106371295A CN201510994042.6A CN201510994042A CN106371295A CN 106371295 A CN106371295 A CN 106371295A CN 201510994042 A CN201510994042 A CN 201510994042A CN 106371295 A CN106371295 A CN 106371295A
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- CN
- China
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- developer solution
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- mentioned
- carbon dioxide
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015144971A JP6505534B2 (ja) | 2015-07-22 | 2015-07-22 | 現像液の管理方法及び装置 |
JP2015-144971 | 2015-07-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN106371295A true CN106371295A (zh) | 2017-02-01 |
Family
ID=57880865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510994042.6A Pending CN106371295A (zh) | 2015-07-22 | 2015-12-25 | 显影液的管理方法及装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6505534B2 (ja) |
KR (1) | KR20170011962A (ja) |
CN (1) | CN106371295A (ja) |
TW (2) | TWI676086B (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107300838A (zh) * | 2017-08-08 | 2017-10-27 | 武汉华星光电技术有限公司 | 显影液稀释*** |
CN108121174A (zh) * | 2017-12-20 | 2018-06-05 | 武汉华星光电半导体显示技术有限公司 | 显影设备及其显影液供应*** |
CN108957967A (zh) * | 2017-05-26 | 2018-12-07 | 株式会社平间理化研究所 | 显影液的浓度管理装置以及基板的显影处理*** |
CN109791374A (zh) * | 2017-08-23 | 2019-05-21 | 深圳市柔宇科技有限公司 | 显影液回收*** |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7137959B2 (ja) * | 2018-04-20 | 2022-09-15 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5223881A (en) * | 1991-08-07 | 1993-06-29 | Hirama Rika Kenkyujio Ltd. | Apparatus for controlling developing solution |
CN1373393A (zh) * | 2001-02-06 | 2002-10-09 | 长濑产业株式会社 | 显影液制造装置及显影液制造方法 |
CN1402087A (zh) * | 2001-08-16 | 2003-03-12 | 株式会社平间理化研究所 | 碱性加工液、加工液的配制方法及其装置以及加工液的供给方法及其装置 |
JP2004271974A (ja) * | 2003-03-10 | 2004-09-30 | Fuji Photo Film Co Ltd | 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法 |
JP2005070351A (ja) * | 2003-08-22 | 2005-03-17 | Nagase & Co Ltd | 現像液供給方法及び装置 |
CN101563654A (zh) * | 2006-11-30 | 2009-10-21 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
CN101641647A (zh) * | 2007-01-17 | 2010-02-03 | 索尼株式会社 | 显影液以及制备微细加工材料的方法 |
JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
US20110208495A1 (en) * | 2008-08-05 | 2011-08-25 | Fujitsu Limited | Method, system, and program for generating prediction model based on multiple regression analysis |
Family Cites Families (12)
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---|---|---|---|---|
CN1327888A (zh) * | 2000-06-09 | 2001-12-26 | 株式会社平间理化研究所 | 基板表面处理装置 |
JP2003131398A (ja) * | 2001-08-16 | 2003-05-09 | Hirama Rika Kenkyusho:Kk | アルカリ系加工液、加工液調整方法及び装置、並びに、加工液供給方法及び装置 |
JP3782374B2 (ja) * | 2002-07-19 | 2006-06-07 | 株式会社平間理化研究所 | レジスト剥離装置 |
US20040055621A1 (en) * | 2002-09-24 | 2004-03-25 | Air Products And Chemicals, Inc. | Processing of semiconductor components with dense processing fluids and ultrasonic energy |
JP4323946B2 (ja) * | 2003-12-19 | 2009-09-02 | キヤノン株式会社 | 露光装置 |
US7580111B2 (en) * | 2004-05-21 | 2009-08-25 | Jsr Corporation | Liquid for immersion exposure and immersion exposure method |
JP4649158B2 (ja) * | 2004-09-30 | 2011-03-09 | 富士フイルム株式会社 | ホログラム記録方法 |
JP2006285132A (ja) * | 2005-04-05 | 2006-10-19 | Konica Minolta Medical & Graphic Inc | 感光性平版印刷版の処理方法 |
US20080156356A1 (en) * | 2006-12-05 | 2008-07-03 | Nikon Corporation | Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method |
US20100086880A1 (en) * | 2007-01-17 | 2010-04-08 | Sony Corporation | Developing solution and method for production of finely patterned material |
JP6721157B2 (ja) * | 2015-07-22 | 2020-07-08 | 株式会社平間理化研究所 | 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置 |
JP6713658B2 (ja) * | 2015-07-22 | 2020-06-24 | 株式会社平間理化研究所 | 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法 |
-
2015
- 2015-07-22 JP JP2015144971A patent/JP6505534B2/ja not_active Expired - Fee Related
- 2015-12-17 KR KR1020150181207A patent/KR20170011962A/ko not_active Application Discontinuation
- 2015-12-23 TW TW104143286A patent/TWI676086B/zh not_active IP Right Cessation
- 2015-12-23 TW TW108131471A patent/TWI695236B/zh not_active IP Right Cessation
- 2015-12-25 CN CN201510994042.6A patent/CN106371295A/zh active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5223881A (en) * | 1991-08-07 | 1993-06-29 | Hirama Rika Kenkyujio Ltd. | Apparatus for controlling developing solution |
CN1373393A (zh) * | 2001-02-06 | 2002-10-09 | 长濑产业株式会社 | 显影液制造装置及显影液制造方法 |
CN1402087A (zh) * | 2001-08-16 | 2003-03-12 | 株式会社平间理化研究所 | 碱性加工液、加工液的配制方法及其装置以及加工液的供给方法及其装置 |
JP2004271974A (ja) * | 2003-03-10 | 2004-09-30 | Fuji Photo Film Co Ltd | 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法 |
JP2005070351A (ja) * | 2003-08-22 | 2005-03-17 | Nagase & Co Ltd | 現像液供給方法及び装置 |
CN101563654A (zh) * | 2006-11-30 | 2009-10-21 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
CN101641647A (zh) * | 2007-01-17 | 2010-02-03 | 索尼株式会社 | 显影液以及制备微细加工材料的方法 |
US20110208495A1 (en) * | 2008-08-05 | 2011-08-25 | Fujitsu Limited | Method, system, and program for generating prediction model based on multiple regression analysis |
JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108957967A (zh) * | 2017-05-26 | 2018-12-07 | 株式会社平间理化研究所 | 显影液的浓度管理装置以及基板的显影处理*** |
CN107300838A (zh) * | 2017-08-08 | 2017-10-27 | 武汉华星光电技术有限公司 | 显影液稀释*** |
CN109791374A (zh) * | 2017-08-23 | 2019-05-21 | 深圳市柔宇科技有限公司 | 显影液回收*** |
CN109791374B (zh) * | 2017-08-23 | 2022-05-17 | 深圳市柔宇科技股份有限公司 | 显影液回收*** |
CN108121174A (zh) * | 2017-12-20 | 2018-06-05 | 武汉华星光电半导体显示技术有限公司 | 显影设备及其显影液供应*** |
WO2019119594A1 (zh) * | 2017-12-20 | 2019-06-27 | 武汉华星光电半导体显示技术有限公司 | 显影设备及其显影液供应*** |
Also Published As
Publication number | Publication date |
---|---|
TWI676086B (zh) | 2019-11-01 |
KR20170011962A (ko) | 2017-02-02 |
TWI695236B (zh) | 2020-06-01 |
TW201944181A (zh) | 2019-11-16 |
JP2017028091A (ja) | 2017-02-02 |
JP6505534B2 (ja) | 2019-04-24 |
TW201704901A (zh) | 2017-02-01 |
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PB01 | Publication | ||
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WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170201 |