WO2019119594A1 - 显影设备及其显影液供应*** - Google Patents

显影设备及其显影液供应*** Download PDF

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Publication number
WO2019119594A1
WO2019119594A1 PCT/CN2018/073343 CN2018073343W WO2019119594A1 WO 2019119594 A1 WO2019119594 A1 WO 2019119594A1 CN 2018073343 W CN2018073343 W CN 2018073343W WO 2019119594 A1 WO2019119594 A1 WO 2019119594A1
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pipe
developer
switching valve
valve
pressure regulating
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PCT/CN2018/073343
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English (en)
French (fr)
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李培宏
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武汉华星光电半导体显示技术有限公司
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Publication of WO2019119594A1 publication Critical patent/WO2019119594A1/zh

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means

Definitions

  • the present invention relates to a production apparatus in a manufacturing process of a liquid crystal display, and more particularly to a developing apparatus and a developer supply system therefor.
  • TFT-LCD Thin Film Transistor-Liquid Crystal Display
  • the third stage is a liquid crystal display module assembled with a polarizer, a backlight and a panel.
  • the process of the array substrate and the color filter substrate includes a plurality of steps of exposure development, and it is required to use a developing device.
  • the process of developing a glass substrate mainly comprises: placing a glass substrate to be developed on a developing chamber, and then spraying the developing solution on the developing glass substrate by using a developing device (the developer) with a rocker with a nozzle moving up and down.
  • a developing device the developer
  • rocker with a nozzle moving up and down.
  • the concentration of the developer decreases after a period of time, and it is necessary to replenish the reservoir with a new developer to achieve the desired concentration for development.
  • a new developing solution is usually added while the developing process is being performed, and the new developing solution and the original developing solution are mixed in the liquid storage tank for a short time, and the mixing is uneven. Hazard, this will cause problems in the development pattern on the glass substrate that are difficult to maintain development uniformity, particularly line width uniformity (CD uniformity), especially for patterns with a small line width.
  • CD uniformity line width uniformity
  • the present invention provides a developing device and a developer supply system thereof, which can make the mixing of the developer more uniform and enhance the development process when a new developer is added. Quality.
  • a developer supply system for supplying a developer to a showerhead of a developing device wherein the developer supply system includes:
  • liquid storage container comprising a liquid inlet and a liquid outlet for storing the first developer
  • the first pipe is provided with a power pump, and the power pump delivers a first developer to the shower head through the first pipe ;
  • a third conduit connecting the first conduit and the second conduit for conveying a first developer to the second conduit such that the second developer and the first developer are in the second conduit After mixing, it is input to the liquid storage container.
  • the second pipe is provided with a first check valve allowing the second developer to flow to the liquid storage container, and the first check valve is located at the input of the second pipe on the second pipe And a second check valve disposed on the third pipe to allow the first developer to flow to the second pipe.
  • the first pipe is provided with a first switching valve
  • the second pipe is provided with a second switching valve
  • the third pipe is provided with a third switching valve
  • the second pipeline is provided with a first pressure regulating valve
  • the third pipeline is provided with a second pressure regulating valve
  • the first pipe is provided with a first on-off valve, the first on-off valve being located on the first pipe at an output end of the first pipe and the third pipe and the first pipe Between the connection nodes; the second pipe is provided with a second switching valve, the second switching valve is located before the first check valve in the flow direction of the second developer; the third pipe is A third switching valve is provided, the third switching valve being located before the second check valve in the flow direction of the first developing solution.
  • the first switching valve, the second switching valve and the third switching valve are respectively selected from a pneumatic switching valve or an electric switching valve.
  • the second pipeline is provided with a first pressure regulating valve, the first pressure regulating valve is located between the second switching valve and the first check valve; a pressure regulating valve, the second pressure regulating valve being located between the third switching valve and the second check valve.
  • the first pressure regulating valve and the second pressure regulating valve are respectively selected from a pneumatic pressure regulating valve or an electric pressure regulating valve.
  • liquid inlet is disposed at a top of the liquid storage container, and an output end of the second pipe extends from the liquid inlet into the liquid storage container and extends adjacent to the liquid storage container a bottom portion; the liquid outlet is disposed on a sidewall of the liquid storage container and located adjacent to a bottom of the liquid storage container.
  • a portion between an input end of the second duct and a connection node of the second duct and the third duct has a first diameter
  • an output end of the second duct A portion between the connection node of the second conduit and the third conduit has a second diameter, the second diameter being greater than the first diameter
  • Another aspect of the present invention provides a developing apparatus including:
  • a showerhead disposed opposite the developing platform for spraying a developer onto the substrate to be developed
  • a developer supply system as described above for supplying a developer to the shower head for supplying a developer to the shower head.
  • a developer supply system wherein a third pipe is disposed between a first pipe that conveys a first developer (original developer) and a second pipe that injects a second developer (new developer)
  • a third pipe is disposed between a first pipe that conveys a first developer (original developer) and a second pipe that injects a second developer (new developer)
  • a second developer new developer
  • the new developer is replenished
  • the new developer and the original developer are sequentially subjected to the two-side mixing process, which increases the mixing time and space compared with the prior art, so that the developer The mixing is more uniform and improves the quality of the development process.
  • FIG. 1 is a schematic structural view of a developing device according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a developer supply system according to an embodiment of the present invention.
  • the present embodiment first provides a developing device including a developer supply system 1, a shower head 2, and a developing platform 3, as shown in FIG.
  • the developing platform 3 is configured to carry the substrate 4 to be developed; the shower head 2 is disposed above the developing platform 3 for spraying the developing solution to the substrate 4 to be developed; A liquid supply system 1 for supplying a developer to the shower head 2.
  • the developing platform 3 is disposed in a developing tank 5 for collecting a developing solution after developing the substrate 4, and, in order to recycle the developing solution, the developing tank 5 passes through a pipe (attached) Not shown in the drawing) is connected to the developer supply system 1, and the collected developer is returned to the developer supply system 1 for recycling.
  • the present embodiment provides a developer supply system 1.
  • the developer supply system 1 includes a liquid storage container 10, a first duct 20, a second duct 30, and a third duct 40.
  • the liquid storage container 10 includes a liquid inlet 11 for storing a first developer A, and a liquid outlet 12, wherein the first developer A refers to the developer
  • the original recycled solution in the supply system 1 is supplied.
  • the first pipe 20 is connected to the shower head 2 and the liquid outlet 12, and the first pipe 20 is provided with a power pump 21, and the power pump 21 passes the first developer A through the first A pipe feed 20 is sent to the shower head 2.
  • the second duct 30 is connected to the liquid inlet 11 for replenishing the liquid storage container 10 with a second developer B, where the second developer B is directed to the developer supply system 1 Inject new developer.
  • the third duct 40 communicates with the first duct 20 and the second duct 30 for conveying the first developer A to the second duct 30 to make the second developer B and the first developer A is mixed in the second duct 30 and then input to the liquid storage container 10.
  • the solid arrows in the first duct 20 indicate the flow direction of the first developer A
  • the dotted arrows in the second duct 30 indicate the flow direction of the second developer B
  • the third The solid arrows of the pipe 40 indicate the flow direction of the first developer A
  • the solid arrows and the dotted arrows in the second pipe 30 indicate the first developer A and the second developer B which are mixed with each other. Flow direction.
  • the second developer B and the first developer A are first mixed in the second pipe 30 for the first time.
  • the developer is again input into the liquid storage container 10 and mixed with the first developer A twice. Thereby, the mixing of the developer is more uniform, and the quality of the development process is improved.
  • the second duct 30 is provided with a first check valve 31 allowing the second developer B to flow to the liquid storage container 10, and the first check valve 31 is The second duct 30 is located between the input end 30a of the second duct 30 and the connection node 30b of the second duct 30 and the third duct 40.
  • the third duct 40 is provided with a second check valve 41 that allows the first developer A to flow to the second duct 30.
  • the first pipe 20 is provided with a first switching valve 22
  • the second pipe 30 is provided with a second switching valve 32
  • the third pipe 40 is provided with a third Switching valve 42. Controlling the corresponding states of the first pipe 20, the second pipe 30, and the third pipe 40 by controlling the on and off states of the first switching valve 22, the second switching valve 32, and the third switching valve 42 according to actual needs. The flow state of the developer.
  • the first switching valve 22 is located on the first pipe 20 at the output end 20a of the first pipe 20 and the connection node 20b of the third pipe 40 and the first pipe 20
  • the second on-off valve 32 is located before the first check valve 31 in the flow direction of the second developer B; in the flow direction of the first developer A, the third on-off valve 42 Located before the second check valve 41.
  • the second pipe 30 is provided with a first pressure regulating valve 33
  • the third pipe 40 is provided with a second pressure regulating valve 43.
  • the first pressure regulating valve 33 is configured to adjust a flow pressure of a corresponding developer in the second duct 30, and the second pressure regulating valve 43 is configured to adjust a flow of a corresponding developer in the third duct 40. pressure.
  • the first pressure regulating valve 33 is located between the second switching valve 32 and the first check valve 31, and the second pressure regulating valve 43 is located at the third switching valve 42. Between the second check valve 41 and the second check valve 41.
  • the first on-off valve 22, the second on-off valve 32, and the third on-off valve 42 are respectively selected from a pneumatic on-off valve or an electric on-off valve.
  • the first pressure regulating valve 33 and the second pressure regulating valve 43 are respectively selected from a pneumatic pressure regulating valve or an electric pressure regulating valve.
  • the liquid inlet 11 is disposed at the top 10a of the liquid storage container 10, and the output end 30c of the second pipe 30 is fed from the liquid
  • the mouth 11 extends into the liquid storage container 10, and the output end 30c of the second duct 30 needs to extend below the liquid level of the first developer A stored in the liquid storage container 10.
  • the liquid outlet 12 is disposed on the side wall 10c of the liquid storage container 10 and is located adjacent to the bottom portion 10b of the liquid storage container 10.
  • the liquid outlet 12 is disposed on the side wall 10c
  • the liquid inlet 11 is disposed on the top portion 10a of the liquid storage container 10 and adjacent to the other side wall opposite to the side wall 10c.
  • the output end 30c of the second duct 30 extends to be adjacent to the bottom portion 10b of the liquid storage container 10, at which time the connection node 30b of the second duct 30 is connected to the output end 30c.
  • the length between the two is large, and the space for the first mixing of the second developer B and the first developer A is increased, and the uniformity of mixing is improved.
  • connection node 30b and the input end 30a has a first diameter
  • a portion between the connection node 30b to the output end 30c has a second diameter
  • the second diameter is larger than the second diameter A diameter, thereby increasing the space in which the second developer B and the first developer A are mixed for the first time, further improves the uniformity of mixing.
  • the developing device and the developer supply system thereof are the first pipe for conveying the first developer (original developer) and the second developer for injecting the second developer (new developer)
  • a third pipe is disposed between the two pipes.
  • the second developer is injected, a part of the first developer is guided from the third pipe to the second pipe and the second developer is mixed for the first time, and the mixed solution is re-inputted.
  • the second developer is mixed with the first developer in the liquid storage container. Therefore, in the system, when the new developer is replenished, the new developer and the original developer are sequentially subjected to the two-side mixing process, which increases the mixing time and space compared with the prior art, so that the developer The mixing is more uniform and improves the quality of the development process.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

一种显影设备及其显影液供应***(1),其中,显影液供应***(1)包括:储液容器(10),包括进液口(11)和出液口(12),用于储存第一显影液(A);第一管道(20),连接喷淋头(2)和出液口(12),第一管道(20)上设置有动力泵(21),动力泵(21)将第一显影液(A)通过第一管道(20)输送至喷淋头(2);第二管道(30),连接到进液口(11),用于向储液容器(10)补充第二显影液(B);第三管道(40),连通第一管道(20)和第二管道(30),用于将第一显影液(A)输送至第二管道(30),以使第二显影液(B)与第一显影液(A)在第二管道(30)中混合后再输入到储液容器(10)。显影液供应***(1)可以提高新补给的显影液与原有显影液相互混合的均匀性,提升显影工艺的品质。

Description

显影设备及其显影液供应*** 技术领域
本发明涉及液晶显示器制造过程中的生产设备,具体涉及一种显影设备及其显影液供应***。
背景技术
薄膜晶体管液晶显示器(TFT-LCD,Thin Film Transistor-Liquid Crystal Display)工艺可分为三大流程,第一段为阵列基板及彩膜基板的工艺,第二段为配向、液晶填充与封合面板工艺;第三段则为偏光片、背光片与面板组装的液晶显示模块。其中,阵列基板和彩膜基板的工艺中包含多个曝光显影的步骤,需要使用到显影设备。
液晶显示器行业中,对玻璃基板进行显影的工艺主要包括:将待显影玻璃基板放置于显影腔,进而采用显影机(Developer)的带有喷头的摇杆上下移动的方式对待显影玻璃基板喷洒显影液,实现对待显影玻璃基板的显影。其中,为了节约显影液消耗量,需要循环使用显影液,因此显影设备中通常是设置有可以使得显影液循环利用的显影液供应***。
随着显影工艺的进行,循环一段时间后显影液浓度降低,此时需要向储液槽中补充新的显影液以达到显影所需浓度。为了避免设备停止运转以提高生成效率,通常是在进行显影工艺的同时补充新的显影液,新的显影液和原有的显影液在储液槽中混合的时间较短,存在混合不均匀的隐患,这将会导致玻璃基板上的显影图案发生难以维持显影均匀性、特别是线宽度均匀性(CD均匀性)的问题,尤其是对于线宽较小的图案。
发明内容
鉴于现有技术存在的不足,本发明提供了一种显影设备及其显影液供应***,在补充新的显影液时,所述显影液供应***可以使得显影液的混合更加均匀,提升了显影工艺的品质。
为了达到上述的目的,本发明采用了如下的技术方案:
一种显影液供应***,用于向显影设备的喷淋头供应显影液,其中,所述显影液供应***包括:
储液容器,包括进液口和出液口,用于储存第一显影液;
第一管道,连接所述喷淋头和所述出液口,所述第一管道上设置有动力泵,所述动力泵将第一显影液通过所述第一管道输送至所述喷淋头;
第二管道,连接到所述进液口,用于向所述储液容器补充第二显影液;
第三管道,连通所述第一管道和所述第二管道,用于将第一显影液输送至所述第二管道,以使第二显影液与第一显影液在所述第二管道中混合后再输入到所述储液容器。
其中,所述第二管道上设置有允许第二显影液流向所述储液容器的第一逆止阀,所述第一逆止阀在所述第二管道上位于所述第二管道的输入端和所述第二管道与所述第三管道的连接节点之间;所述第三管道上设置有允许第一显影液流向所述第二管道的第二逆止阀。
其中,所述第一管道上设置有第一开关阀,所述第二管道上设置有第二开关阀,所述第三管道上设置有第三开关阀。
其中,所述第二管道上设置有第一调压阀,所述第三管道上设置有第二调压阀。
其中,所述第一管道上设置有第一开关阀,所述第一开关阀在所述第一管道上位于所述第一管道的输出端和所述第三管道与所述第一管道的连接节点之间;所述第二管道上设置有第二开关阀,在第二显影液的流动方向上,所述第二开关阀位于所述第一逆止阀之前;所述第三管道上设置有第三开关阀,在第一显影液的流动方向上,所述第三开关阀位于所述第二逆止阀之前。
其中,所述第一开关阀、第二开关阀和第三开关阀分别选自气动开关阀或电动开关阀。
其中,所述第二管道上设置有第一调压阀,所述第一调压阀位于所述第二开关阀和所述第一逆止阀之间;所述第三管道上设置有第二调压阀,所述第二调压阀位于所述第三开关阀和所述第二逆止阀之间。
其中,所述第一调压阀和第二调压阀分别选自气动调压阀或电动调压阀。
其中,所述进液口设置于所述储液容器的顶部,所述第二管道的输出端从所述进液口伸入到所述储液容器中并延伸至邻近于所述储液容器的底部;所述出液口设置于所述储液容器的侧壁上且位于邻近于所述储液容器的底部。
其中,所述第二管道中,所述第二管道的输入端和所述第二管道与所述第三管道的连接节点之间的部分具有第一直径,述第二管道的输出端和所述第二管道与所述第三管道的连接节点之间的部分具有第二直径,所述第二直径大于所述第一直径。
本发明的另一方面是提供一种显影设备,其包括:
显影平台,用于承载待显影的基板;
喷淋头,设置于所述显影平台的相对上方,用于向所述待显影的基板喷洒显影液;
如上所述的显影液供应***,用于向所述喷淋头供应显影液。
本发明实施例提供的显影液供应***,通过在输送第一显影液(原有显影液)的第一管道和注入第二显影液(新的显影液)的第二管道之间设置第三管道,在注入第二显影液时,将一部分第一显影液从第三管道导向第二管道与第二显影液进行第一次混合,以上混合后的显影液再输入到储液容器中与第一显影液进行二次混合。由此,该***中,在补充新的显影液时,新的显影液与原有的显影液依次经过两侧混合过程,与现有技术相比,增加了混合的时间和空间,使得显影液的混合更加均匀,提升了显影工艺的品质。
附图说明
图1是本发明实施例提供的显影设备的结构示意图;
图2是本发明实施例提供的显影液供应***的结构示意图。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚,下面结合附图对本发明的具体实施方式进行详细说明。这些优选实施方式的示例在附图中进行了例示。附图中所示和根据附图描述的本发明的实施方式仅仅是示例性的,并且本发明并不限于这些实施方式。
在此,还需要说明的是,为了避免因不必要的细节而模糊了本发明,在附图中仅仅示出了与根据本发明的方案密切相关的结构和/或处理步骤,而省略了与本发明关系不大的其他细节。
本实施例首先提供了一种显影设备,如图1所示,所述显影设备包括显影液供应***1、喷淋头2和显影平台3。其中,所述显影平台3用于承载待显影的基板4;所述喷淋头2设置于所述显影平台3的相对上方,用于向所述待显影的基板4喷洒显影液;所述显影液供应***1,用于向所述喷淋头2供应显影液。
通常地,所述显影平台3设置于显影槽5中,所述显影槽5用于收集对基板4进行显影后的显影液,并且,为了循环利用显影液,所述显影槽5通过管道(附图中未示出)连接至所述显影液供应***1,将收集的显影液回流至所述显影液供应***1循环利用。
随着显影工艺的进行,循环一段时间后显影液浓度降低,此时需要向显影液供应***1补充新的显影液以达到显影所需浓度。为了使得补充的显影液与原有的显影液能够更加充分且均匀地混合,本实施例提供了一种显影液供应***1。如图2所示,所述显影液供应***1包括储液容器10、第一管道20、第二管道30和第三管道40。
其中,所述储液容器10包括进液口11和出液口12,所述储液容器10用于储存第一显影液A,在此,所述第一显影液A是指所述显影液供应***1中原有的经过循环利用的显影液。所述第一管道20连接所述喷淋头2和所述出液口12,所述第一管道20上设置有动力泵21,所述动力泵21将第一显影液A通过所述第一管道输20送至所述喷淋头2。所述第二管道30连接到所述进液口11,用于向所述储液容器10补充第二显影液B,在此,所述第二显影液B是指向所述显影液供应***1注入的新的显影液。所述第三管道40连通所述第一管道20和所述第二管道30,用于将第一显影液A输送至所述第二管道30,以使第二显影液B与第一显影液A在所述第二管道30中混合后再输入到所述储液容器10。
如图2中,所述第一管道20中的实线箭头表示第一显影液A的流动方向,所述第二管道30中的虚线箭头表示第二显影液B的流动方向,所述第三管道40的实线箭头表示第一显影液A的流动方向,所述第二管道30中的相互交叉的实线箭头和虚线箭头表示相互混合后的第一显影液A和第二显影液B的流动方向。
参阅图2,以上提供的显影液供应***1,在补充第二显影液B时,第二显 影液B和第一显影液A首先是在第二管道30中进行第一次混合,以上混合后的显影液再输入到储液容器10中与第一显影液A进行二次混合。由此使得显影液的混合更加均匀,提升了显影工艺的品质。
具体地,如图2所示,所述第二管道30上设置有允许第二显影液B流向所述储液容器10的第一逆止阀31,所述第一逆止阀31在所述第二管道30上位于所述第二管道30的输入端30a和所述第二管道30与所述第三管道40的连接节点30b之间。所述第三管道40上设置有允许第一显影液A流向所述第二管道30的第二逆止阀41。
进一步地,如图2所示,所述第一管道20上设置有第一开关阀22,所述第二管道30上设置有第二开关阀32,所述第三管道40上设置有第三开关阀42。根据实际需要,通过控制所述第一开关阀22、第二开关阀32和第三开关阀42的通断状态,控制所述第一管道20、第二管道30和第三管道40中相应的显影液的流动状态。在本实施例中,所述第一开关阀22在所述第一管道20上位于所述第一管道20的输出端20a和所述第三管道40与所述第一管道20的连接节点20b之间;在第二显影液B的流动方向上,所述第二开关阀32位于所述第一逆止阀31之前;在第一显影液A的流动方向上,所述第三开关阀42位于所述第二逆止阀41之前。
进一步地,如图2所示,所述第二管道30上设置有第一调压阀33,所述第三管道40上设置有第二调压阀43。所述第一调压阀33用于调节所述第二管道30中相应的显影液的流动压力,所述第二调压阀43用于调节所述第三管道40中相应的显影液的流动压力。在本实施例中,所述第一调压阀33位于所述第二开关阀32和所述第一逆止阀31之间,所述第二调压阀43位于所述第三开关阀42和所述第二逆止阀41之间。
其中,所述第一开关阀22、第二开关阀32和第三开关阀42分别选自气动开关阀或电动开关阀。所述第一调压阀33和第二调压阀43分别选自气动调压阀或电动调压阀。
进一步地,如图2所示,所述储液容器10中,所述进液口11设置于所述储液容器10的顶部10a,所述第二管道30的输出端30c从所述进液口11伸入到所述储液容器10中,并且所述第二管道30的输出端30c需要延伸至所述储液容器10中储存的第一显影液A的液面以下。所述出液口12设置于所述储液容器10的侧壁10c上且位于邻近于所述储液容器10的底部10b。在优选的方案 中,所述出液口12设置于侧壁10c上,所述进液口11设置于所述储液容器10的顶部10a并且邻近于与侧壁10c先对的另一个侧壁,此时所述第二管道30的输出端30c与所述出液口12在水平方向上的距离较大,可以使得显影液的混合更加充分。
进一步地,如图2所示,所述第二管道30的输出端30c延伸至邻近于所述储液容器10的底部10b,此时所述第二管道30的连接节点30b到输出端30c之间的长度较大,增加了第二显影液B和第一显影液A进行第一次混合的空间,提高混合的均匀性。更进一步地,所述第二管道30中,连接节点30b到输入端30a之间的部分具有第一直径,连接节点30b到输出端30c之间的部分具有第二直径,并且第二直径大于第一直径,由此增加了第二显影液B和第一显影液A进行第一次混合的空间,进一步提高了混合的均匀性。
综上所述,本发明实施例提供的显影设备及其显影液供应***,在输送第一显影液(原有显影液)的第一管道和注入第二显影液(新的显影液)的第二管道之间设置第三管道,当注入第二显影液时,将一部分第一显影液从第三管道导向第二管道与第二显影液进行第一次混合,以上混合后的显影液再输入到储液容器中与第一显影液进行二次混合。由此,该***中,在补充新的显影液时,新的显影液与原有的显影液依次经过两侧混合过程,与现有技术相比,增加了混合的时间和空间,使得显影液的混合更加均匀,提升了显影工艺的品质。
需要说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下,由语句“包括一个……”限定的要素,并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。
以上所述仅是本申请的具体实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本申请的保护范围。

Claims (20)

  1. 一种显影液供应***,用于向显影设备的喷淋头供应显影液,其中,所述显影液供应***包括:
    储液容器,包括进液口和出液口,用于储存第一显影液;
    第一管道,连接所述喷淋头和所述出液口,所述第一管道上设置有动力泵,所述动力泵将第一显影液通过所述第一管道输送至所述喷淋头;
    第二管道,连接到所述进液口,用于向所述储液容器补充第二显影液;
    第三管道,连通所述第一管道和所述第二管道,用于将第一显影液输送至所述第二管道,以使第二显影液与第一显影液在所述第二管道中混合后再输入到所述储液容器。
  2. 根据权利要求1所述的显影液供应***,其中,所述第二管道上设置有允许第二显影液流向所述储液容器的第一逆止阀,所述第一逆止阀在所述第二管道上位于所述第二管道的输入端和所述第二管道与所述第三管道的连接节点之间;所述第三管道上设置有允许第一显影液流向所述第二管道的第二逆止阀。
  3. 根据权利要求1所述的显影液供应***,其中,所述第一管道上设置有第一开关阀,所述第二管道上设置有第二开关阀,所述第三管道上设置有第三开关阀。
  4. 根据权利要求1所述的显影液供应***,其中,所述第二管道上设置有第一调压阀,所述第三管道上设置有第二调压阀。
  5. 根据权利要求2所述的显影液供应***,其中,所述第一管道上设置有第一开关阀,所述第一开关阀在所述第一管道上位于所述第一管道的输出端和所述第三管道与所述第一管道的连接节点之间;所述第二管道上设置有第二开关阀,在第二显影液的流动方向上,所述第二开关阀位于所述第一逆止阀之前;所述第三管道上设置有第三开关阀,在第一显影液的流动方向上,所述第三开关阀位于所述第二逆止阀之前。
  6. 根据权利要求5所述的显影液供应***,其中,所述第一开关阀、第二开关阀和第三开关阀分别选自气动开关阀或电动开关阀。
  7. 根据权利要求5所述的显影液供应***,其中,所述第二管道上设置有第一调压阀,所述第一调压阀位于所述第二开关阀和所述第一逆止阀之间;所述第三管道上设置有第二调压阀,所述第二调压阀位于所述第三开关阀和所述第二逆止阀之间。
  8. 根据权利要求7所述的显影液供应***,其中,所述第一调压阀和第二调压阀分别选自气动调压阀或电动调压阀。
  9. 根据权利要求1所述的显影液供应***,其中,所述进液口设置于所述储液容器的顶部,所述第二管道的输出端从所述进液口伸入到所述储液容器中并延伸至邻近于所述储液容器的底部;所述出液口设置于所述储液容器的侧壁上且位于邻近于所述储液容器的底部。
  10. 根据权利要求9所述的显影液供应***,其中,所述第二管道中,所述第二管道的输入端和所述第二管道与所述第三管道的连接节点之间的部分具有第一直径,述第二管道的输出端和所述第二管道与所述第三管道的连接节点之间的部分具有第二直径,所述第二直径大于所述第一直径。
  11. 一种显影设备,其包括:
    显影平台,用于承载待显影的基板;
    喷淋头,设置于显影平台的相对上方,用于向待显影的基板喷洒显影液;
    显影液供应***,用于向喷淋头供应显影液;其中,所述显影液供应***包括:
    储液容器,包括进液口和出液口,用于储存第一显影液;
    第一管道,连接所述喷淋头和所述出液口,所述第一管道上设置有动力泵,所述动力泵将第一显影液通过所述第一管道输送至所述喷淋头;
    第二管道,连接到所述进液口,用于向所述储液容器补充第二显影液;
    第三管道,连通所述第一管道和所述第二管道,用于将第一显影液输送至所述第二管道,以使第二显影液与第一显影液在所述第二管道中混合后再输入到所述储液容器。
  12. 根据权利要求11所述的显影设备,其中,所述第二管道上设置有允许第二显影液流向所述储液容器的第一逆止阀,所述第一逆止阀在所述第二管道 上位于所述第二管道的输入端和所述第二管道与所述第三管道的连接节点之间;所述第三管道上设置有允许第一显影液流向所述第二管道的第二逆止阀。
  13. 根据权利要求11所述的显影设备,其中,所述第一管道上设置有第一开关阀,所述第二管道上设置有第二开关阀,所述第三管道上设置有第三开关阀。
  14. 根据权利要求11所述的显影设备,其中,所述第二管道上设置有第一调压阀,所述第三管道上设置有第二调压阀。
  15. 根据权利要求12所述的显影设备,其中,所述第一管道上设置有第一开关阀,所述第一开关阀在所述第一管道上位于所述第一管道的输出端和所述第三管道与所述第一管道的连接节点之间;所述第二管道上设置有第二开关阀,在第二显影液的流动方向上,所述第二开关阀位于所述第一逆止阀之前;所述第三管道上设置有第三开关阀,在第一显影液的流动方向上,所述第三开关阀位于所述第二逆止阀之前。
  16. 根据权利要求15所述的显影设备,其中,所述第一开关阀、第二开关阀和第三开关阀分别选自气动开关阀或电动开关阀。
  17. 根据权利要求15所述的显影设备,其中,所述第二管道上设置有第一调压阀,所述第一调压阀位于所述第二开关阀和所述第一逆止阀之间;所述第三管道上设置有第二调压阀,所述第二调压阀位于所述第三开关阀和所述第二逆止阀之间。
  18. 根据权利要求17所述的显影设备,其中,所述第一调压阀和第二调压阀分别选自气动调压阀或电动调压阀。
  19. 根据权利要求11所述的显影设备,其中,所述进液口设置于所述储液容器的顶部,所述第二管道的输出端从所述进液口伸入到所述储液容器中并延伸至邻近于所述储液容器的底部;所述出液口设置于所述储液容器的侧壁上且位于邻近于所述储液容器的底部。
  20. 根据权利要求19所述的显影设备,其中,所述第二管道中,所述第二管道的输入端和所述第二管道与所述第三管道的连接节点之间的部分具有第一直径,述第二管道的输出端和所述第二管道与所述第三管道的连接节点之间的部分具有第二直径,所述第二直径大于所述第一直径。
PCT/CN2018/073343 2017-12-20 2018-01-19 显影设备及其显影液供应*** WO2019119594A1 (zh)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010001335A (ko) * 1999-06-03 2001-01-05 윤종용 습식 전자사진방식 프린터의 현상액 공급장치
CN201311548Y (zh) * 2008-04-30 2009-09-16 深超光电(深圳)有限公司 显影制程设备
CN203549395U (zh) * 2013-11-13 2014-04-16 上海华力微电子有限公司 化学液供给装置
CN105938313A (zh) * 2015-03-05 2016-09-14 富士施乐株式会社 液体显影剂供给装置和图像形成装置
CN106371295A (zh) * 2015-07-22 2017-02-01 株式会社平间理化研究所 显影液的管理方法及装置
CN206684478U (zh) * 2017-05-04 2017-11-28 上海和辉光电有限公司 溢流显影液回收利用***

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH579418A5 (en) * 1974-06-12 1976-09-15 Sicpa Int Sa Pumping and mixing liquids with single pump - using three way valves and jet mixer with rotating arms
JP2007054779A (ja) * 2005-08-26 2007-03-08 Tokyo Ohka Kogyo Co Ltd 流体混合方法
CN201795282U (zh) * 2010-01-13 2011-04-13 贵阳铝镁设计研究院 多相混合液体的输送管道连接结构
CN202293045U (zh) * 2011-10-18 2012-07-04 三一重工股份有限公司 一种搅拌站及其液体添加剂计量装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010001335A (ko) * 1999-06-03 2001-01-05 윤종용 습식 전자사진방식 프린터의 현상액 공급장치
CN201311548Y (zh) * 2008-04-30 2009-09-16 深超光电(深圳)有限公司 显影制程设备
CN203549395U (zh) * 2013-11-13 2014-04-16 上海华力微电子有限公司 化学液供给装置
CN105938313A (zh) * 2015-03-05 2016-09-14 富士施乐株式会社 液体显影剂供给装置和图像形成装置
CN106371295A (zh) * 2015-07-22 2017-02-01 株式会社平间理化研究所 显影液的管理方法及装置
CN206684478U (zh) * 2017-05-04 2017-11-28 上海和辉光电有限公司 溢流显影液回收利用***

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