CN101558110A - 热稳定的可阳离子光固化组合物 - Google Patents
热稳定的可阳离子光固化组合物 Download PDFInfo
- Publication number
- CN101558110A CN101558110A CNA2007800384851A CN200780038485A CN101558110A CN 101558110 A CN101558110 A CN 101558110A CN A2007800384851 A CNA2007800384851 A CN A2007800384851A CN 200780038485 A CN200780038485 A CN 200780038485A CN 101558110 A CN101558110 A CN 101558110A
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- phenyl
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/02—Halogenated hydrocarbons
- C08K5/03—Halogenated hydrocarbons aromatic, e.g. C6H5-CH2-Cl
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/05—Alcohols; Metal alcoholates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Polymerisation Methods In General (AREA)
- Dental Preparations (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
样品-稳定剂 | 0天之后的粘度 | 84天(40℃)之后的粘度 |
无稳定剂 | 600mPas | 5000mPas |
2pph(99%沸石/1%硝酰稳定剂NO-1) | 600mPas | 790mPas |
2pph(95%沸石/5%酚抗氧化剂AO-1) | 600mPas | 840mPas |
2pph沸石 | 600mPas | 1200mPas |
1.50pph AO-1 | 600mPas | 2730mPas |
样品-稳定剂 | 0天之后的粘度 | 84天(40℃)之后的粘度 |
无稳定剂 | 540mPas | 3800mPas |
2pph(99%沸石/1%硝酰稳定剂NO-1) | 540mPas | 660mPas |
2pph沸石 | 540mPas | 670mPas |
Claims (16)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06122783.1 | 2006-10-24 | ||
EP06122783 | 2006-10-24 | ||
PCT/EP2007/060924 WO2008049743A1 (en) | 2006-10-24 | 2007-10-15 | Thermally stable cationic photocurable compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101558110A true CN101558110A (zh) | 2009-10-14 |
CN101558110B CN101558110B (zh) | 2012-06-13 |
Family
ID=37846122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007800384851A Active CN101558110B (zh) | 2006-10-24 | 2007-10-15 | 热稳定的可阳离子光固化组合物 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8084522B2 (zh) |
EP (1) | EP2076563B1 (zh) |
JP (2) | JP5523101B2 (zh) |
KR (1) | KR101435410B1 (zh) |
CN (1) | CN101558110B (zh) |
ES (1) | ES2603838T3 (zh) |
WO (1) | WO2008049743A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102666073A (zh) * | 2009-12-17 | 2012-09-12 | 帝斯曼知识产权资产管理有限公司 | 基于基材的加成法制造工艺 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2197840B1 (en) | 2007-10-10 | 2013-11-06 | Basf Se | Sulphonium salt initiators |
JP5498832B2 (ja) * | 2009-03-25 | 2014-05-21 | 電気化学工業株式会社 | エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体 |
US20110300367A1 (en) * | 2010-06-07 | 2011-12-08 | Ching-Kee Chien | Optical Fiber With Photoacid Coating |
CN103119080B (zh) * | 2010-09-24 | 2015-07-29 | 电气化学工业株式会社 | 能量射线固化性树脂组合物与使用该组合物的粘合剂及固化体 |
JP5832740B2 (ja) * | 2010-11-30 | 2015-12-16 | 株式会社ダイセル | 硬化性エポキシ樹脂組成物 |
EP2514800B2 (de) * | 2011-04-21 | 2018-03-07 | Merck Patent GmbH | Verbindungen und flüssigkristallines Medium |
WO2014017524A1 (ja) | 2012-07-26 | 2014-01-30 | 電気化学工業株式会社 | 樹脂組成物 |
JP6560985B2 (ja) | 2014-01-23 | 2019-08-14 | デンカ株式会社 | 樹脂組成物 |
US10604659B2 (en) | 2015-06-08 | 2020-03-31 | Dsm Ip Assets B.V. | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication |
EP3567428B1 (en) | 2015-10-01 | 2021-06-23 | DSM IP Assets B.V. | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication |
KR101941649B1 (ko) | 2017-11-24 | 2019-01-23 | 주식회사 엘지화학 | 편광판 및 이를 포함하는 화상 표시 장치 |
TW202108567A (zh) | 2019-05-17 | 2021-03-01 | 日商住友化學股份有限公司 | 鹽、淬滅劑、抗蝕劑組成物及抗蝕劑圖案的製造方法 |
JP2021181431A (ja) * | 2020-05-15 | 2021-11-25 | 住友化学株式会社 | カルボン酸塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法 |
Family Cites Families (23)
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DE3641014A1 (de) | 1986-12-19 | 1988-06-16 | Wolfen Filmfab Veb | Fotopolymerisierbares material |
JP2699188B2 (ja) * | 1988-03-15 | 1998-01-19 | 三新化学工業株式会社 | カチオン重合性組成物、重合触媒および重合方法 |
JPH0735917A (ja) * | 1993-07-23 | 1995-02-07 | Toray Ind Inc | カラーフィルタの製造方法 |
DE19627469A1 (de) * | 1995-07-12 | 1997-01-16 | Sanyo Chemical Ind Ltd | Epoxidharzvernetzungsmittel und Ein-Komponenten-Epoxidharzzusammensetzung |
TW460509B (en) | 1996-07-12 | 2001-10-21 | Ciba Sc Holding Ag | Curing process for cationically photocurable formulations |
WO1999005216A1 (fr) | 1997-07-28 | 1999-02-04 | Kaneka Corporation | Composition polymerisable |
US5973020A (en) | 1998-01-06 | 1999-10-26 | Rhodia Inc. | Photoinitiator composition including hindered amine stabilizer |
DE19927949A1 (de) * | 1999-06-18 | 2000-12-21 | Delo Industrieklebstoffe Gmbh | Kationisch härtende Masse, ihre Verwendung sowie Verfahren zur Herstellung gehärteter Polymermassen |
SG98433A1 (en) * | 1999-12-21 | 2003-09-19 | Ciba Sc Holding Ag | Iodonium salts as latent acid donors |
DE60233234D1 (en) * | 2001-07-19 | 2009-09-17 | Lamberti Spa | Sulfoniumsalze als photoinitiatoren für strahlungshärtbare systeme |
GB0204467D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
JP2004051656A (ja) | 2002-07-16 | 2004-02-19 | Konica Minolta Holdings Inc | 画像形成方法、印刷物及び記録装置 |
WO2005070989A2 (en) | 2004-01-27 | 2005-08-04 | Ciba Specialty Chemicals Holding Inc. | Thermally stable cationic photocurable compositions |
US20090192265A1 (en) | 2004-03-30 | 2009-07-30 | Nobuhiro Hasegawa | Curable composition |
JP4421938B2 (ja) * | 2004-05-10 | 2010-02-24 | 日東電工株式会社 | 紫外線硬化型樹脂組成物 |
JP4331644B2 (ja) * | 2004-05-10 | 2009-09-16 | 日東電工株式会社 | 紫外線硬化型樹脂組成物 |
JP2006008740A (ja) * | 2004-06-22 | 2006-01-12 | Nitto Denko Corp | 紫外線硬化型樹脂組成物 |
JP2006124636A (ja) * | 2004-06-28 | 2006-05-18 | Konica Minolta Medical & Graphic Inc | 活性光線硬化型組成物、活性光線硬化型インクジェットインク、該活性光線硬化型インクジェットインクを用いた画像形成方法及びインクジェット記録装置 |
WO2006045713A1 (en) * | 2004-10-25 | 2006-05-04 | Ciba Specialty Chemicals Holding Inc. | Functionalized nanoparticles |
JP4644050B2 (ja) * | 2005-02-04 | 2011-03-02 | 積水化学工業株式会社 | 光デバイスの製造方法及び光デバイス |
JP2006257257A (ja) * | 2005-03-17 | 2006-09-28 | Sumitomo Chemical Co Ltd | 硬化性樹脂組成物および該組成物を用いて形成される保護膜 |
WO2006107748A1 (en) * | 2005-04-04 | 2006-10-12 | National Starch And Chemical Investment Holding Corporation | Radiation-curable desiccant-filled adhesive/sealant |
US7687119B2 (en) * | 2005-04-04 | 2010-03-30 | Henkel Ag & Co. Kgaa | Radiation-curable desiccant-filled adhesive/sealant |
-
2007
- 2007-10-15 JP JP2009533784A patent/JP5523101B2/ja active Active
- 2007-10-15 KR KR1020097010573A patent/KR101435410B1/ko active IP Right Grant
- 2007-10-15 WO PCT/EP2007/060924 patent/WO2008049743A1/en active Application Filing
- 2007-10-15 EP EP07821291.7A patent/EP2076563B1/en active Active
- 2007-10-15 ES ES07821291.7T patent/ES2603838T3/es active Active
- 2007-10-15 US US12/445,756 patent/US8084522B2/en active Active
- 2007-10-15 CN CN2007800384851A patent/CN101558110B/zh active Active
-
2013
- 2013-08-16 JP JP2013169104A patent/JP2013241622A/ja not_active Withdrawn
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102666073A (zh) * | 2009-12-17 | 2012-09-12 | 帝斯曼知识产权资产管理有限公司 | 基于基材的加成法制造工艺 |
CN102934026A (zh) * | 2009-12-17 | 2013-02-13 | 帝斯曼知识产权资产管理有限公司 | 用于加成法制造的可led固化的液体树脂组合物 |
CN102666073B (zh) * | 2009-12-17 | 2015-07-22 | 帝斯曼知识产权资产管理有限公司 | 基于基材的加成法制造工艺 |
CN102934026B (zh) * | 2009-12-17 | 2016-08-03 | 帝斯曼知识产权资产管理有限公司 | 用于加成法制造的可led固化的液体树脂组合物 |
CN106125509A (zh) * | 2009-12-17 | 2016-11-16 | 帝斯曼知识产权资产管理有限公司 | 用于加成法制造的可led固化的液体树脂组合物 |
CN106125509B (zh) * | 2009-12-17 | 2019-12-17 | 帝斯曼知识产权资产管理有限公司 | 用于加成法制造的可led固化的液体树脂组合物 |
Also Published As
Publication number | Publication date |
---|---|
JP2010507696A (ja) | 2010-03-11 |
US20100304284A1 (en) | 2010-12-02 |
US8084522B2 (en) | 2011-12-27 |
CN101558110B (zh) | 2012-06-13 |
JP5523101B2 (ja) | 2014-06-18 |
EP2076563B1 (en) | 2016-08-17 |
WO2008049743A1 (en) | 2008-05-02 |
EP2076563A1 (en) | 2009-07-08 |
ES2603838T3 (es) | 2017-03-01 |
JP2013241622A (ja) | 2013-12-05 |
KR20090082251A (ko) | 2009-07-29 |
KR101435410B1 (ko) | 2014-08-29 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Basel, Switzerland Patentee after: BASF Ag AG Address before: Basel, Switzerland Patentee before: BASF Special Chemicals Holding Co.,Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20180309 Address after: Wahl Holland Patentee after: IGM Group B.V. Address before: Rhine, Ludwigshafen, Germany Patentee before: BASF SE Effective date of registration: 20180309 Address after: Rhine, Ludwigshafen, Germany Patentee after: BASF SE Address before: Basel, Switzerland Patentee before: BASF Ag AG Effective date of registration: 20180309 Address after: Basel, Switzerland Patentee after: BASF Special Chemicals Holding Co.,Ltd. Address before: Basel, Switzerland Patentee before: CIBA HOLDING Inc. |