CN101551592B - 图案描画装置及图案描画方法 - Google Patents

图案描画装置及图案描画方法 Download PDF

Info

Publication number: CN101551592B
Authority: CN; China
Prior art keywords: pattern; substrate; exposure intensity; data; radiation data
Prior art date: 2008-03-31
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CN2009100016973A

Other languages

English (en)

Chinese (zh)

Other versions

CN101551592A (zh

Inventor

吉冈正喜

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Dainippon Screen Manufacturing Co Ltd

Original Assignee

Dainippon Screen Manufacturing Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2008-03-31

Filing date

2009-01-15

Publication date

2012-02-01

2009-01-15 Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd

2009-10-07 Publication of CN101551592A publication Critical patent/CN101551592A/zh

2012-02-01 Application granted granted Critical

2012-02-01 Publication of CN101551592B publication Critical patent/CN101551592B/zh

Status Expired - Fee Related legal-status Critical Current

2029-01-15 Anticipated expiration legal-status Critical

Links

238000000034 method Methods 0.000 title claims abstract description 12
239000000758 substrate Substances 0.000 claims abstract description 143
230000005855 radiation Effects 0.000 claims abstract description 82
230000015572 biosynthetic process Effects 0.000 claims abstract description 16
238000003786 synthesis reaction Methods 0.000 claims abstract description 9
238000005286 illumination Methods 0.000 claims description 61
239000000463 material Substances 0.000 claims description 22
230000008859 change Effects 0.000 claims description 9
230000003760 hair shine Effects 0.000 claims description 5
241000278713 Theora Species 0.000 claims description 3
238000005516 engineering process Methods 0.000 abstract description 5
230000002194 synthesizing effect Effects 0.000 abstract 1
230000003287 optical effect Effects 0.000 description 32
230000007246 mechanism Effects 0.000 description 29
230000009471 action Effects 0.000 description 17
238000012545 processing Methods 0.000 description 14
230000006870 function Effects 0.000 description 10
238000010586 diagram Methods 0.000 description 8
238000003860 storage Methods 0.000 description 7
238000001179 sorption measurement Methods 0.000 description 6
230000008569 process Effects 0.000 description 5
238000011960 computer-aided design Methods 0.000 description 4
239000011521 glass Substances 0.000 description 4
230000001678 irradiating effect Effects 0.000 description 4
239000004973 liquid crystal related substance Substances 0.000 description 4
238000011161 development Methods 0.000 description 3
230000002093 peripheral effect Effects 0.000 description 3
238000004904 shortening Methods 0.000 description 3
230000007935 neutral effect Effects 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
230000008719 thickening Effects 0.000 description 2
206010070834 Sensitisation Diseases 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
238000013461 design Methods 0.000 description 1
238000001514 detection method Methods 0.000 description 1
239000000428 dust Substances 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
230000008676 import Effects 0.000 description 1
238000010884 ion-beam technique Methods 0.000 description 1
239000007788 liquid Substances 0.000 description 1
239000003550 marker Substances 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
230000000149 penetrating effect Effects 0.000 description 1
238000001259 photo etching Methods 0.000 description 1
238000000206 photolithography Methods 0.000 description 1
229920002120 photoresistant polymer Polymers 0.000 description 1
230000008313 sensitization Effects 0.000 description 1
230000008961 swelling Effects 0.000 description 1
238000012360 testing method Methods 0.000 description 1
230000001052 transient effect Effects 0.000 description 1

Images

Landscapes

Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

CN2009100016973A 2008-03-31 2009-01-15 图案描画装置及图案描画方法 Expired - Fee Related CN101551592B (zh)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP2008-089374		2008-03-31
JP2008089374A JP2009246069A (ja)	2008-03-31	2008-03-31	パターン描画装置およびパターン描画方法
JP2008089374		2008-03-31

Publications (2)

Publication Number	Publication Date
CN101551592A CN101551592A (zh)	2009-10-07
CN101551592B true CN101551592B (zh)	2012-02-01

Family

ID=41155892

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CN2009100016973A Expired - Fee Related CN101551592B (zh)	2008-03-31	2009-01-15	图案描画装置及图案描画方法

Country Status (3)

Country	Link
JP (1)	JP2009246069A (ja)
CN (1)	CN101551592B (ja)
TW (1)	TW200941152A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP5470236B2 (ja) *	2010-12-22	2014-04-16	東京エレクトロン株式会社	局所露光方法及び局所露光装置
JP5325907B2 (ja) *	2011-02-22	2013-10-23	東京エレクトロン株式会社	局所露光装置
JP5852374B2 (ja) *	2011-09-07	2016-02-03	株式会社Ｓｃｒｅｅｎホールディングス	描画装置および描画方法
JP5975785B2 (ja) *	2012-08-14	2016-08-23	株式会社アドテックエンジニアリング	描画装置、露光描画装置、プログラム及び描画方法
JP2014066954A (ja) *	2012-09-27	2014-04-17	Dainippon Screen Mfg Co Ltd	描画装置、および、描画方法
KR102065107B1 (ko)	2013-05-20	2020-02-12	삼성디스플레이 주식회사	무마스크 노광 장치
JP7023601B2 (ja) *	2016-11-14	2022-02-22	株式会社アドテックエンジニアリング	ダイレクトイメージング露光装置及びダイレクトイメージング露光方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2894746B2 (ja) *	1989-11-08	1999-05-24	株式会社東芝	荷電ビーム描画方法
JPH06295858A (ja) *	1993-04-09	1994-10-21	Fujitsu Ltd	荷電粒子ビーム露光方法
JPH09293675A (ja) *	1996-04-24	1997-11-11	Nikon Corp	周辺露光装置
JP2001052984A (ja) *	1999-08-09	2001-02-23	Nikon Corp	周辺露光装置、周辺露光方法および露光システム
JP2005123586A (ja) *	2003-09-25	2005-05-12	Matsushita Electric Ind Co Ltd	投影装置および投影方法
JP2005116929A (ja) *	2003-10-10	2005-04-28	Fuji Photo Film Co Ltd	パターン製造システム
JP2005150600A (ja) *	2003-11-19	2005-06-09	Seiko Epson Corp	露光装置、半導体装置の製造方法および露光プログラム
KR20060121218A (ko) *	2003-12-22	2006-11-28	코닌클리즈케 필립스 일렉트로닉스 엔.브이.	프로그램 가능 리소그래픽 마스크와, 무 마스크 광학리소그래피 시스템과, 광학 리소그래픽 단계 수행 방법과,기판 라벨링 방법 및 장치 마스킹 방법
JP2006128194A (ja) *	2004-10-26	2006-05-18	Canon Inc	露光装置及びデバイス製造方法

2008
- 2008-03-31 JP JP2008089374A patent/JP2009246069A/ja not_active Abandoned
- 2008-12-24 TW TW97150468A patent/TW200941152A/zh unknown
2009
- 2009-01-15 CN CN2009100016973A patent/CN101551592B/zh not_active Expired - Fee Related

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2006-186125A 2006.07.13
JP特许第3005571B1 2000.01.31

Also Published As

Publication number	Publication date
TW200941152A (en)	2009-10-01
JP2009246069A (ja)	2009-10-22
CN101551592A (zh)	2009-10-07

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Legal Events

Date	Code	Title	Description
2009-10-07	C06	Publication
2009-10-07	PB01	Publication
2009-12-02	C10	Entry into substantive examination
2009-12-02	SE01	Entry into force of request for substantive examination
2012-02-01	C14	Grant of patent or utility model
2012-02-01	GR01	Patent grant
2015-04-01	C56	Change in the name or address of the patentee	Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD.
2015-04-01	CP01	Change in the name or title of a patent holder	Address after: Kyoto City, Kyoto, Japan Patentee after: DAINIPPON SCREEN MFG Address before: Kyoto City, Kyoto, Japan Patentee before: Dainippon Screen Mfg. Co., Ltd.
2020-01-03	CF01	Termination of patent right due to non-payment of annual fee
2020-01-03	CF01	Termination of patent right due to non-payment of annual fee	Granted publication date: 20120201 Termination date: 20190115