TW200941152A - Pattern drawing apparatus and pattern drawing method - Google Patents

Pattern drawing apparatus and pattern drawing method Download PDF

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Publication number
TW200941152A
TW200941152A TW97150468A TW97150468A TW200941152A TW 200941152 A TW200941152 A TW 200941152A TW 97150468 A TW97150468 A TW 97150468A TW 97150468 A TW97150468 A TW 97150468A TW 200941152 A TW200941152 A TW 200941152A
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TW
Taiwan
Prior art keywords
irradiation
substrate
pattern
area
illumination
Prior art date
Application number
TW97150468A
Other languages
English (en)
Chinese (zh)
Inventor
Masaki Yoshioka
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200941152A publication Critical patent/TW200941152A/zh

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW97150468A 2008-03-31 2008-12-24 Pattern drawing apparatus and pattern drawing method TW200941152A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008089374A JP2009246069A (ja) 2008-03-31 2008-03-31 パターン描画装置およびパターン描画方法

Publications (1)

Publication Number Publication Date
TW200941152A true TW200941152A (en) 2009-10-01

Family

ID=41155892

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97150468A TW200941152A (en) 2008-03-31 2008-12-24 Pattern drawing apparatus and pattern drawing method

Country Status (3)

Country Link
JP (1) JP2009246069A (ja)
CN (1) CN101551592B (ja)
TW (1) TW200941152A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI470376B (zh) * 2011-09-07 2015-01-21 Screen Holdings Co Ltd 描繪裝置及描繪方法
TWI495959B (zh) * 2010-12-22 2015-08-11 Tokyo Electron Ltd 局部曝光方法及局部曝光裝置
TWI588625B (zh) * 2012-08-14 2017-06-21 亞得科技工程有限公司 描繪裝置、曝光描繪裝置、描繪方法以及記錄媒體

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5325907B2 (ja) * 2011-02-22 2013-10-23 東京エレクトロン株式会社 局所露光装置
JP2014066954A (ja) * 2012-09-27 2014-04-17 Dainippon Screen Mfg Co Ltd 描画装置、および、描画方法
KR102065107B1 (ko) 2013-05-20 2020-02-12 삼성디스플레이 주식회사 무마스크 노광 장치
JP7023601B2 (ja) * 2016-11-14 2022-02-22 株式会社アドテックエンジニアリング ダイレクトイメージング露光装置及びダイレクトイメージング露光方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2894746B2 (ja) * 1989-11-08 1999-05-24 株式会社東芝 荷電ビーム描画方法
JPH06295858A (ja) * 1993-04-09 1994-10-21 Fujitsu Ltd 荷電粒子ビーム露光方法
JPH09293675A (ja) * 1996-04-24 1997-11-11 Nikon Corp 周辺露光装置
JP2001052984A (ja) * 1999-08-09 2001-02-23 Nikon Corp 周辺露光装置、周辺露光方法および露光システム
JP2005123586A (ja) * 2003-09-25 2005-05-12 Matsushita Electric Ind Co Ltd 投影装置および投影方法
JP2005116929A (ja) * 2003-10-10 2005-04-28 Fuji Photo Film Co Ltd パターン製造システム
JP2005150600A (ja) * 2003-11-19 2005-06-09 Seiko Epson Corp 露光装置、半導体装置の製造方法および露光プログラム
KR20060121218A (ko) * 2003-12-22 2006-11-28 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 프로그램 가능 리소그래픽 마스크와, 무 마스크 광학리소그래피 시스템과, 광학 리소그래픽 단계 수행 방법과,기판 라벨링 방법 및 장치 마스킹 방법
JP2006128194A (ja) * 2004-10-26 2006-05-18 Canon Inc 露光装置及びデバイス製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI495959B (zh) * 2010-12-22 2015-08-11 Tokyo Electron Ltd 局部曝光方法及局部曝光裝置
TWI470376B (zh) * 2011-09-07 2015-01-21 Screen Holdings Co Ltd 描繪裝置及描繪方法
TWI588625B (zh) * 2012-08-14 2017-06-21 亞得科技工程有限公司 描繪裝置、曝光描繪裝置、描繪方法以及記錄媒體

Also Published As

Publication number Publication date
CN101551592B (zh) 2012-02-01
JP2009246069A (ja) 2009-10-22
CN101551592A (zh) 2009-10-07

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