CN101080801B - 扫描电子束照射装置 - Google Patents

扫描电子束照射装置 Download PDF

Info

Publication number
CN101080801B
CN101080801B CN2006800013062A CN200680001306A CN101080801B CN 101080801 B CN101080801 B CN 101080801B CN 2006800013062 A CN2006800013062 A CN 2006800013062A CN 200680001306 A CN200680001306 A CN 200680001306A CN 101080801 B CN101080801 B CN 101080801B
Authority
CN
China
Prior art keywords
symbol
electron beam
skew
scan
offset
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2006800013062A
Other languages
English (en)
Chinese (zh)
Other versions
CN101080801A (zh
Inventor
今井大辅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of CN101080801A publication Critical patent/CN101080801A/zh
Application granted granted Critical
Publication of CN101080801B publication Critical patent/CN101080801B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Radiation-Therapy Devices (AREA)
  • Electron Sources, Ion Sources (AREA)
CN2006800013062A 2005-02-02 2006-01-20 扫描电子束照射装置 Expired - Fee Related CN101080801B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP026721/2005 2005-02-02
JP2005026721 2005-02-02
PCT/JP2006/300804 WO2006082714A1 (ja) 2005-02-02 2006-01-20 走査ビーム照射装置

Publications (2)

Publication Number Publication Date
CN101080801A CN101080801A (zh) 2007-11-28
CN101080801B true CN101080801B (zh) 2010-06-23

Family

ID=36777103

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800013062A Expired - Fee Related CN101080801B (zh) 2005-02-02 2006-01-20 扫描电子束照射装置

Country Status (5)

Country Link
JP (1) JP4555909B2 (ja)
KR (1) KR100893283B1 (ja)
CN (1) CN101080801B (ja)
TW (1) TWI290430B (ja)
WO (1) WO2006082714A1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4855875B2 (ja) * 2006-09-06 2012-01-18 富士フイルム株式会社 電子ビーム描画装置及び電子ビームのずれ補償方法
JP5164355B2 (ja) * 2006-09-27 2013-03-21 株式会社日立ハイテクノロジーズ 荷電粒子ビームの走査方法及び荷電粒子線装置
CN102047130B (zh) * 2008-06-02 2013-09-04 株式会社岛津制作所 液晶阵列检查装置及拍摄范围的修正方法
US8410447B2 (en) * 2008-10-23 2013-04-02 Shimadzu Corporation Particle radiotherapy apparatus
JP5472690B2 (ja) * 2009-06-23 2014-04-16 株式会社島津製作所 走査ビーム照射装置
JP5788719B2 (ja) * 2011-06-09 2015-10-07 株式会社日立ハイテクノロジーズ ステージ装置およびステージ装置の制御方法
JP6643072B2 (ja) * 2015-12-10 2020-02-12 キヤノン株式会社 顕微鏡システムおよびその制御方法
CN109166781A (zh) * 2018-09-11 2019-01-08 镇江乐华电子科技有限公司 扫描透射电子显微成像方法和***
JP7238672B2 (ja) * 2019-07-25 2023-03-14 株式会社ニューフレアテクノロジー マルチビーム描画方法及びマルチビーム描画装置
CN111879494B (zh) * 2020-08-10 2022-05-17 中国空气动力研究与发展中心超高速空气动力研究所 基于电子束荧光的低密度风洞流场空间测点位置标定方法
CN112259469B (zh) * 2020-10-21 2022-10-18 上海华力集成电路制造有限公司 半导体器件关键尺寸量测方法及取得sem图像的方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940452A (ja) * 1982-08-30 1984-03-06 Fujitsu Ltd 電子ビ−ム装置
JP3238487B2 (ja) * 1991-11-14 2001-12-17 富士通株式会社 電子ビーム装置
JP4186464B2 (ja) * 2000-03-13 2008-11-26 株式会社日立製作所 荷電粒子ビーム走査式装置
JP4690586B2 (ja) * 2000-06-09 2011-06-01 株式会社アドバンテスト マスク、電子ビームの偏向量の校正方法、電子ビーム露光装置
JP3765988B2 (ja) * 2001-02-23 2006-04-12 株式会社日立製作所 電子線式外観検査装置
JP3349504B1 (ja) * 2001-08-03 2002-11-25 株式会社日立製作所 電子線描画装置および電子顕微鏡
JP2004356276A (ja) * 2003-05-28 2004-12-16 Riipuru:Kk 荷電粒子ビーム近接露光方法及び装置
JP3689097B2 (ja) * 2003-09-03 2005-08-31 株式会社東芝 荷電ビーム描画装置及び描画方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP平5-251315A 1993.09.28

Also Published As

Publication number Publication date
CN101080801A (zh) 2007-11-28
KR20070056142A (ko) 2007-05-31
TWI290430B (en) 2007-11-21
TW200633496A (en) 2006-09-16
JPWO2006082714A1 (ja) 2008-08-07
KR100893283B1 (ko) 2009-04-17
WO2006082714A1 (ja) 2006-08-10
JP4555909B2 (ja) 2010-10-06

Similar Documents

Publication Publication Date Title
CN101080801B (zh) 扫描电子束照射装置
CA2980201C (en) Methods, systems and devices relating to distortion correction in imaging devices
CN115280463A (zh) 晶片中检查体积的截面成像方法
JP5424144B2 (ja) ビジョン検査システム及びこれを用いた座標変換方法
TWI724827B (zh) 缺陷觀察裝置
JP5788719B2 (ja) ステージ装置およびステージ装置の制御方法
CN107516624A (zh) 一种样品位置校准方法和装置
CN108352283B (zh) Sem影像取得装置及sem影像取得方法
WO2006112242A1 (ja) 基板検査装置
JP5777967B2 (ja) 荷電粒子線装置及び計測方法
WO2016199439A1 (ja) 三次元計測装置
JP2001319609A (ja) 荷電粒子線装置
JP2014099568A (ja) 画像処理装置、自己組織化リソグラフィ技術によるパターン生成方法、及びコンピュータープログラム
WO2013011316A1 (en) X-ray imaging
CN101133473B (zh) 扫描束装置的资料处理方法
CN101242546A (zh) 影像校正***及方法
JP4253023B2 (ja) 荷電粒子線装置及び走査電子顕微鏡の制御装置
US20100200749A1 (en) Semiconductor Testing Method and Semiconductor Tester
Kangasrääsiö et al. Calibration of a flatbed scanner for traceable paper area measurement
CN104024837B (zh) 液晶阵列检查装置及液晶阵列检查装置的信号处理方法
JP2015007587A (ja) 試料観察装置用のテンプレート作成装置
Degenhardt et al. Correction method for 3D non-linear drift distortions in atomic force microscopy raster measurements
JP2011090528A (ja) 真空処理装置、グラフ線表示方法
US20080218193A1 (en) Semiconductor device evaluation method and apparatus using the same
JP2010199037A (ja) 荷電粒子ビーム装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100623

Termination date: 20170120