TWI290430B - Scanning electron beam device - Google Patents

Scanning electron beam device Download PDF

Info

Publication number
TWI290430B
TWI290430B TW094146676A TW94146676A TWI290430B TW I290430 B TWI290430 B TW I290430B TW 094146676 A TW094146676 A TW 094146676A TW 94146676 A TW94146676 A TW 94146676A TW I290430 B TWI290430 B TW I290430B
Authority
TW
Taiwan
Prior art keywords
electron beam
offset
symbol
axis direction
scanning
Prior art date
Application number
TW094146676A
Other languages
English (en)
Chinese (zh)
Other versions
TW200633496A (en
Inventor
Daisuke Imai
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of TW200633496A publication Critical patent/TW200633496A/zh
Application granted granted Critical
Publication of TWI290430B publication Critical patent/TWI290430B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Radiation-Therapy Devices (AREA)
  • Electron Sources, Ion Sources (AREA)
TW094146676A 2005-02-02 2005-12-27 Scanning electron beam device TWI290430B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005026721 2005-02-02

Publications (2)

Publication Number Publication Date
TW200633496A TW200633496A (en) 2006-09-16
TWI290430B true TWI290430B (en) 2007-11-21

Family

ID=36777103

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094146676A TWI290430B (en) 2005-02-02 2005-12-27 Scanning electron beam device

Country Status (5)

Country Link
JP (1) JP4555909B2 (ja)
KR (1) KR100893283B1 (ja)
CN (1) CN101080801B (ja)
TW (1) TWI290430B (ja)
WO (1) WO2006082714A1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4855875B2 (ja) * 2006-09-06 2012-01-18 富士フイルム株式会社 電子ビーム描画装置及び電子ビームのずれ補償方法
JP5164355B2 (ja) * 2006-09-27 2013-03-21 株式会社日立ハイテクノロジーズ 荷電粒子ビームの走査方法及び荷電粒子線装置
CN102047130B (zh) * 2008-06-02 2013-09-04 株式会社岛津制作所 液晶阵列检查装置及拍摄范围的修正方法
US8410447B2 (en) * 2008-10-23 2013-04-02 Shimadzu Corporation Particle radiotherapy apparatus
JP5472690B2 (ja) * 2009-06-23 2014-04-16 株式会社島津製作所 走査ビーム照射装置
JP5788719B2 (ja) * 2011-06-09 2015-10-07 株式会社日立ハイテクノロジーズ ステージ装置およびステージ装置の制御方法
JP6643072B2 (ja) * 2015-12-10 2020-02-12 キヤノン株式会社 顕微鏡システムおよびその制御方法
CN109166781A (zh) * 2018-09-11 2019-01-08 镇江乐华电子科技有限公司 扫描透射电子显微成像方法和***
JP7238672B2 (ja) * 2019-07-25 2023-03-14 株式会社ニューフレアテクノロジー マルチビーム描画方法及びマルチビーム描画装置
CN111879494B (zh) * 2020-08-10 2022-05-17 中国空气动力研究与发展中心超高速空气动力研究所 基于电子束荧光的低密度风洞流场空间测点位置标定方法
CN112259469B (zh) * 2020-10-21 2022-10-18 上海华力集成电路制造有限公司 半导体器件关键尺寸量测方法及取得sem图像的方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940452A (ja) * 1982-08-30 1984-03-06 Fujitsu Ltd 電子ビ−ム装置
JP3238487B2 (ja) * 1991-11-14 2001-12-17 富士通株式会社 電子ビーム装置
JP4186464B2 (ja) * 2000-03-13 2008-11-26 株式会社日立製作所 荷電粒子ビーム走査式装置
JP4690586B2 (ja) * 2000-06-09 2011-06-01 株式会社アドバンテスト マスク、電子ビームの偏向量の校正方法、電子ビーム露光装置
JP3765988B2 (ja) * 2001-02-23 2006-04-12 株式会社日立製作所 電子線式外観検査装置
JP3349504B1 (ja) * 2001-08-03 2002-11-25 株式会社日立製作所 電子線描画装置および電子顕微鏡
JP2004356276A (ja) * 2003-05-28 2004-12-16 Riipuru:Kk 荷電粒子ビーム近接露光方法及び装置
JP3689097B2 (ja) * 2003-09-03 2005-08-31 株式会社東芝 荷電ビーム描画装置及び描画方法

Also Published As

Publication number Publication date
CN101080801A (zh) 2007-11-28
KR20070056142A (ko) 2007-05-31
TW200633496A (en) 2006-09-16
JPWO2006082714A1 (ja) 2008-08-07
KR100893283B1 (ko) 2009-04-17
WO2006082714A1 (ja) 2006-08-10
CN101080801B (zh) 2010-06-23
JP4555909B2 (ja) 2010-10-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees