CN100520918C - 用于信息记录介质的玻璃基片及使用该基片的信息记录介质 - Google Patents
用于信息记录介质的玻璃基片及使用该基片的信息记录介质 Download PDFInfo
- Publication number
- CN100520918C CN100520918C CNB2004800325313A CN200480032531A CN100520918C CN 100520918 C CN100520918 C CN 100520918C CN B2004800325313 A CNB2004800325313 A CN B2004800325313A CN 200480032531 A CN200480032531 A CN 200480032531A CN 100520918 C CN100520918 C CN 100520918C
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- China
- Prior art keywords
- glass substrate
- glass
- information recording
- weight
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000011521 glass Substances 0.000 title claims abstract description 218
- 239000000758 substrate Substances 0.000 title claims description 149
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 239000004615 ingredient Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 7
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- -1 lanthanide metal oxide Chemical class 0.000 claims description 5
- 229910052744 lithium Inorganic materials 0.000 claims description 5
- 229910052700 potassium Inorganic materials 0.000 claims description 5
- 229910052708 sodium Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052788 barium Inorganic materials 0.000 claims description 4
- 229910052791 calcium Inorganic materials 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 229910052712 strontium Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000000126 substance Substances 0.000 abstract description 26
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- 229910052804 chromium Inorganic materials 0.000 description 6
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- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
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- 229910000943 NiAl Inorganic materials 0.000 description 3
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 3
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- 229910000838 Al alloy Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 2
- 229910001260 Pt alloy Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
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- 229910052742 iron Inorganic materials 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
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- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910002546 FeCo Inorganic materials 0.000 description 1
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- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 235000015076 Shorea robusta Nutrition 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
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- 238000013467 fragmentation Methods 0.000 description 1
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- 238000007654 immersion Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2531—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B7/2433—Metals or elements of Groups 13, 14, 15 or 16 of the Periodic Table, e.g. B, Si, Ge, As, Sb, Bi, Se or Te
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/254—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of protective topcoat layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/21—Circular sheet or circular blank
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Magnetic Record Carriers (AREA)
- Glass Compositions (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP371514/2003 | 2003-10-31 | ||
JP2003371514 | 2003-10-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1875404A CN1875404A (zh) | 2006-12-06 |
CN100520918C true CN100520918C (zh) | 2009-07-29 |
Family
ID=34543957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004800325313A Expired - Fee Related CN100520918C (zh) | 2003-10-31 | 2004-10-08 | 用于信息记录介质的玻璃基片及使用该基片的信息记录介质 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7566673B2 (zh) |
JP (1) | JP4337821B2 (zh) |
KR (1) | KR100866175B1 (zh) |
CN (1) | CN100520918C (zh) |
WO (1) | WO2005043512A1 (zh) |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4530618B2 (ja) * | 2002-09-27 | 2010-08-25 | コニカミノルタオプト株式会社 | ガラス組成物及びガラス基板 |
TWI321752B (en) * | 2005-10-06 | 2010-03-11 | Quanta Comp Inc | Audio/video playing system |
US20070111042A1 (en) * | 2005-11-16 | 2007-05-17 | Seagate Technology Llc | Alkali-depleted glass & glass-based substrates for magnetic & magneto-optical recording media |
JP2007164901A (ja) * | 2005-12-14 | 2007-06-28 | Konica Minolta Opto Inc | 磁気記録媒体用ガラス基板、及び磁気記録媒体用ガラス基板の製造方法 |
JP2007217204A (ja) * | 2006-02-14 | 2007-08-30 | Konica Minolta Opto Inc | 磁気記録媒体用ガラス基板及びその製造方法 |
JP5083212B2 (ja) * | 2006-07-03 | 2012-11-28 | コニカミノルタアドバンストレイヤー株式会社 | ガラス基板の洗浄方法、製造方法およびそれを用いた磁気ディスク |
JPWO2008004469A1 (ja) * | 2006-07-03 | 2009-12-03 | コニカミノルタオプト株式会社 | ガラス基板の洗浄方法、製造方法およびそれを用いた磁気ディスク |
JP4623211B2 (ja) * | 2006-07-03 | 2011-02-02 | コニカミノルタオプト株式会社 | 情報記録媒体用ガラス基板の製造方法およびそれを用いる磁気ディスク |
WO2008004471A1 (fr) * | 2006-07-03 | 2008-01-10 | Konica Minolta Opto, Inc. | Procédé de fabrication d'un substrat de verre, disque magnétique et son procédé de fabrication |
CN102718401B (zh) * | 2006-10-10 | 2015-04-01 | 日本电气硝子株式会社 | 钢化玻璃基板 |
WO2008047609A1 (fr) * | 2006-10-16 | 2008-04-24 | Konica Minolta Opto, Inc. | Substrat de verre pour support d'enregistrement d'informations, support d'enregistrement magnétique, et procédé de fabrication d'un substrat de verre pour support d'enregistrement d'informations |
MY147533A (en) * | 2006-10-16 | 2012-12-31 | Konica Minolta Opto Inc | Magnetic recording medium substrate and manufacturing method thereof, and magnetic recording medium and manufaturing method thereof |
JP5191137B2 (ja) * | 2007-02-13 | 2013-04-24 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
MY182785A (en) * | 2007-09-28 | 2021-02-05 | Hoya Corp | Glass substrate for magnetic disk and manufacturing method of the same |
JP2009104703A (ja) * | 2007-10-23 | 2009-05-14 | Hoya Corp | 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法 |
KR20100091228A (ko) | 2007-11-29 | 2010-08-18 | 코닝 인코포레이티드 | 개선된 인성 및 내스크래치성을 갖는 유리 |
US8895165B2 (en) * | 2008-09-10 | 2014-11-25 | Hoya Corporation | Method of manufacturing a glass substrate for a magnetic disk, glass substrate for a magnetic disk, method of manufacturing a magnetic disk, and magnetic disk |
US9190096B2 (en) * | 2008-10-17 | 2015-11-17 | Hoya Corporation | Method for producing glass substrate and method for producing magnetic recording medium |
US8341976B2 (en) | 2009-02-19 | 2013-01-01 | Corning Incorporated | Method of separating strengthened glass |
US8206789B2 (en) * | 2009-11-03 | 2012-06-26 | Wd Media, Inc. | Glass substrates and methods of annealing the same |
JP4752966B2 (ja) * | 2009-12-08 | 2011-08-17 | 旭硝子株式会社 | データ記憶媒体用ガラス基板の製造方法及びガラス基板 |
JP4760975B2 (ja) * | 2009-12-22 | 2011-08-31 | 旭硝子株式会社 | データ記憶媒体用ガラス基板の製造方法及びガラス基板 |
DE102010009584B4 (de) | 2010-02-26 | 2015-01-08 | Schott Ag | Chemisch vorgespanntes Glas, Verfahren zu seiner Herstellung sowie Verwendung desselben |
JP5700623B2 (ja) * | 2010-05-31 | 2015-04-15 | Hoya株式会社 | ガラス基板 |
WO2012001914A1 (ja) * | 2010-06-30 | 2012-01-05 | コニカミノルタオプト株式会社 | 情報記録媒体用ガラス基板 |
US8316668B1 (en) | 2010-09-23 | 2012-11-27 | Wd Media, Inc. | Composite magnetic recording medium |
JP5714892B2 (ja) * | 2010-12-28 | 2015-05-07 | Hoya株式会社 | ガラス基板の製造方法 |
US20140011035A1 (en) * | 2011-03-31 | 2014-01-09 | Nippon Sheet Glass Company, Limited | Glass composition suitable for chemical strengthening and chemically strengthened glass article |
JP2012232882A (ja) * | 2011-04-18 | 2012-11-29 | Asahi Glass Co Ltd | 化学強化ガラスの製造方法および化学強化用ガラス |
US8834962B2 (en) | 2011-06-03 | 2014-09-16 | WD Media, LLC | Methods for improving the strength of glass substrates |
CN102352143B (zh) * | 2011-06-29 | 2013-10-02 | 济南大学 | 降低铂铑合金漏板损耗的玻璃涂层及涂膜工艺 |
US8893527B1 (en) | 2011-07-21 | 2014-11-25 | WD Media, LLC | Single surface annealing of glass disks |
US20130136909A1 (en) | 2011-11-30 | 2013-05-30 | John Christopher Mauro | Colored alkali aluminosilicate glass articles |
TWI592382B (zh) * | 2012-05-30 | 2017-07-21 | 宸鴻科技控股有限公司 | 硬質基板、觸控面板及硬質基板的處理方法 |
WO2014084096A1 (ja) * | 2012-11-30 | 2014-06-05 | 旭硝子株式会社 | 強化ガラスおよびその製造方法 |
JP6261399B2 (ja) * | 2014-03-17 | 2018-01-17 | 株式会社神戸製鋼所 | 磁気記録媒体用アルミニウム基板 |
US9670088B2 (en) | 2014-05-20 | 2017-06-06 | Corning Incorporated | Scratch resistant glass and method of making |
US11097974B2 (en) | 2014-07-31 | 2021-08-24 | Corning Incorporated | Thermally strengthened consumer electronic glass and related systems and methods |
CN107873021A (zh) | 2015-02-27 | 2018-04-03 | 康宁股份有限公司 | 用于玻璃的低温化学强化工艺 |
WO2017123573A2 (en) | 2016-01-12 | 2017-07-20 | Corning Incorporated | Thin thermally and chemically strengthened glass-based articles |
CN110217983B (zh) * | 2016-01-21 | 2022-09-06 | Agc株式会社 | 化学强化玻璃以及化学强化玻璃的制造方法 |
KR102161536B1 (ko) | 2016-01-21 | 2020-10-05 | 에이지씨 가부시키가이샤 | 화학 강화 유리 및 화학 강화용 유리 |
US11795102B2 (en) * | 2016-01-26 | 2023-10-24 | Corning Incorporated | Non-contact coated glass and related coating system and method |
JP6574740B2 (ja) * | 2016-07-08 | 2019-09-11 | 昭和電工株式会社 | 磁気記録媒体用基板およびハードディスクドライブ |
US10427972B2 (en) * | 2016-07-21 | 2019-10-01 | Corning Incorporated | Transparent silicate glasses with high fracture toughness |
JP7040456B2 (ja) * | 2016-10-18 | 2022-03-23 | Agc株式会社 | 化学強化用ガラス、化学強化ガラスおよび化学強化ガラスの製造方法 |
CN108101358B (zh) * | 2017-12-15 | 2021-05-18 | 成都光明光电股份有限公司 | 玻璃组合物 |
WO2019226485A1 (en) | 2018-05-22 | 2019-11-28 | Corning Incorporated | Low temperature moldable sheet forming glass compositions |
EP3894364A2 (en) | 2018-12-12 | 2021-10-20 | Corning Incorporated | Ion-exchangeable lithium-containing aluminosilicate glasses |
CN114514115B (zh) | 2019-08-06 | 2023-09-01 | 康宁股份有限公司 | 具有用于阻止裂纹的埋入式应力尖峰的玻璃层压体及其制造方法 |
WO2023149384A1 (ja) * | 2022-02-02 | 2023-08-10 | Agc株式会社 | ガラス、化学強化ガラスおよびカバーガラス |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE618737A (zh) * | 1961-06-12 | |||
KR100402511B1 (ko) * | 1994-10-13 | 2004-03-20 | 쌩-고벵 글래스 프랑스 | 강화된유리기판및이를포함하는경질자기디스크 |
US5476821A (en) | 1994-11-01 | 1995-12-19 | Corning Incorporated | High modulus glass-ceramics containing fine grained spinel-type crystals |
US5674790A (en) * | 1995-12-15 | 1997-10-07 | Corning Incorporated | Strengthening glass by ion exchange |
US5691256A (en) * | 1995-12-28 | 1997-11-25 | Yamamura Glass Co., Ltd. | Glass composition for magnetic disk substrates and magnetic disk substrate |
FR2744440B1 (fr) * | 1996-02-07 | 1998-03-20 | Saint Gobain Vitrage | Procede de traitement de substrats en verre |
US6030537A (en) | 1996-08-02 | 2000-02-29 | Engelhard Corporation | Method for removing arsenic from aqueous systems containing competing ions |
MY118378A (en) | 1997-06-05 | 2004-10-30 | Hoya Corp | Information recording substrate and information recording medium prepared from the substrate. |
DE19802919C1 (de) * | 1998-01-27 | 1999-10-07 | Schott Glas | Verwendung von Gläsern als Festplattensubstrate |
GB2335423A (en) * | 1998-03-20 | 1999-09-22 | Pilkington Plc | Chemically toughenable glass |
SG77697A1 (en) | 1998-06-30 | 2001-01-16 | Hoya Corp | Substrate for information recording medium and method of producing it and information recording medium comprising the substrate |
JP3078281B2 (ja) | 1998-06-30 | 2000-08-21 | ホーヤ株式会社 | 情報記録媒体用基板の製造方法及び情報記録媒体 |
JP2972830B1 (ja) | 1998-08-31 | 1999-11-08 | 株式会社三井金属プレシジョン | 磁気記録媒体用ガラス基板の製造方法 |
JP2000207730A (ja) | 1999-01-12 | 2000-07-28 | Ishizuka Glass Co Ltd | 磁気記録媒体用ガラス基板 |
JP3995902B2 (ja) * | 2001-05-31 | 2007-10-24 | Hoya株式会社 | 情報記録媒体用ガラス基板及びそれを用いた磁気情報記録媒体 |
JP4185266B2 (ja) * | 2001-07-25 | 2008-11-26 | Hoya株式会社 | 情報記録媒体用基板の製造方法 |
US7197897B2 (en) * | 2002-04-04 | 2007-04-03 | Hitachi Global Storage Technologies Netherlands B.V. | Chemical strengthening process for disks used in disk drive data storage devices |
JP4282273B2 (ja) * | 2002-06-07 | 2009-06-17 | コニカミノルタオプト株式会社 | ガラス基板 |
JP4530618B2 (ja) * | 2002-09-27 | 2010-08-25 | コニカミノルタオプト株式会社 | ガラス組成物及びガラス基板 |
JP4726399B2 (ja) * | 2003-05-29 | 2011-07-20 | コニカミノルタオプト株式会社 | ガラス基板 |
JP4039381B2 (ja) * | 2004-03-25 | 2008-01-30 | コニカミノルタオプト株式会社 | ガラス組成物を用いた情報記録媒体用ガラス基板及びこれを用いた情報記録媒体 |
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- 2004-10-08 JP JP2005515105A patent/JP4337821B2/ja not_active Expired - Fee Related
- 2004-10-08 KR KR1020067008153A patent/KR100866175B1/ko not_active IP Right Cessation
- 2004-10-08 CN CNB2004800325313A patent/CN100520918C/zh not_active Expired - Fee Related
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WO2005043512A1 (ja) | 2005-05-12 |
CN1875404A (zh) | 2006-12-06 |
US20050096210A1 (en) | 2005-05-05 |
JP4337821B2 (ja) | 2009-09-30 |
JPWO2005043512A1 (ja) | 2007-05-10 |
US7566673B2 (en) | 2009-07-28 |
KR20060084449A (ko) | 2006-07-24 |
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