ATE340244T1 - Nichtkorrosive reinigungszusammensetzung zur entfernung von plasmaätzrückständen - Google Patents
Nichtkorrosive reinigungszusammensetzung zur entfernung von plasmaätzrückständenInfo
- Publication number
- ATE340244T1 ATE340244T1 AT00984560T AT00984560T ATE340244T1 AT E340244 T1 ATE340244 T1 AT E340244T1 AT 00984560 T AT00984560 T AT 00984560T AT 00984560 T AT00984560 T AT 00984560T AT E340244 T1 ATE340244 T1 AT E340244T1
- Authority
- AT
- Austria
- Prior art keywords
- cleaning composition
- removal
- plasma etching
- etching residue
- corrosive cleaning
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 2
- 230000009972 noncorrosive effect Effects 0.000 title abstract 2
- 238000001020 plasma etching Methods 0.000 title 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 235000011114 ammonium hydroxide Nutrition 0.000 abstract 1
- 150000007514 bases Chemical class 0.000 abstract 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- -1 hydroxylammonium compound Chemical class 0.000 abstract 1
- 125000001453 quaternary ammonium group Chemical group 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
- H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Implements For Floors, Carpets, Furniture, Walls, And The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/439,469 US6413923B2 (en) | 1999-11-15 | 1999-11-15 | Non-corrosive cleaning composition for removing plasma etching residues |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE340244T1 true ATE340244T1 (de) | 2006-10-15 |
Family
ID=23744827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00984560T ATE340244T1 (de) | 1999-11-15 | 2000-10-20 | Nichtkorrosive reinigungszusammensetzung zur entfernung von plasmaätzrückständen |
Country Status (8)
Country | Link |
---|---|
US (3) | US6413923B2 (de) |
EP (1) | EP1230334B1 (de) |
JP (1) | JP3871257B2 (de) |
KR (1) | KR100736061B1 (de) |
AT (1) | ATE340244T1 (de) |
DE (1) | DE60030877T2 (de) |
TW (1) | TWI230733B (de) |
WO (1) | WO2001036578A1 (de) |
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-
1999
- 1999-11-15 US US09/439,469 patent/US6413923B2/en not_active Expired - Lifetime
-
2000
- 2000-10-20 AT AT00984560T patent/ATE340244T1/de not_active IP Right Cessation
- 2000-10-20 WO PCT/US2000/041301 patent/WO2001036578A1/en active IP Right Grant
- 2000-10-20 KR KR1020027006222A patent/KR100736061B1/ko active IP Right Grant
- 2000-10-20 JP JP2001539056A patent/JP3871257B2/ja not_active Expired - Fee Related
- 2000-10-20 DE DE60030877T patent/DE60030877T2/de not_active Expired - Lifetime
- 2000-10-20 EP EP00984560A patent/EP1230334B1/de not_active Expired - Lifetime
- 2000-11-22 TW TW089124045A patent/TWI230733B/zh not_active IP Right Cessation
-
2002
- 2002-05-10 US US10/143,082 patent/US7001874B2/en not_active Expired - Lifetime
-
2005
- 2005-12-16 US US11/305,794 patent/US7402552B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7001874B2 (en) | 2006-02-21 |
DE60030877T2 (de) | 2007-04-26 |
US20020132745A1 (en) | 2002-09-19 |
EP1230334A1 (de) | 2002-08-14 |
TWI230733B (en) | 2005-04-11 |
KR100736061B1 (ko) | 2007-07-06 |
WO2001036578A1 (en) | 2001-05-25 |
US6413923B2 (en) | 2002-07-02 |
JP3871257B2 (ja) | 2007-01-24 |
EP1230334B1 (de) | 2006-09-20 |
US20010001785A1 (en) | 2001-05-24 |
KR20020044593A (ko) | 2002-06-15 |
US7402552B2 (en) | 2008-07-22 |
JP2003515254A (ja) | 2003-04-22 |
DE60030877D1 (de) | 2006-11-02 |
EP1230334A4 (de) | 2004-08-11 |
US20060094614A1 (en) | 2006-05-04 |
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