WO2021035971A1 - Electromagnetic coupling device, polishing device having same, and electromagnetic rheological property measuring device - Google Patents

Electromagnetic coupling device, polishing device having same, and electromagnetic rheological property measuring device Download PDF

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Publication number
WO2021035971A1
WO2021035971A1 PCT/CN2019/117610 CN2019117610W WO2021035971A1 WO 2021035971 A1 WO2021035971 A1 WO 2021035971A1 CN 2019117610 W CN2019117610 W CN 2019117610W WO 2021035971 A1 WO2021035971 A1 WO 2021035971A1
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WIPO (PCT)
Prior art keywords
electrode
carbon brush
magnetic pole
electromagnetic
rotating
Prior art date
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PCT/CN2019/117610
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French (fr)
Chinese (zh)
Inventor
阎秋生
黄展亮
潘继生
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广东工业大学
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Publication of WO2021035971A1 publication Critical patent/WO2021035971A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N11/00—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties
    • G01N11/10—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material
    • G01N11/14—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material by using rotary bodies, e.g. vane
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/02—Permanent magnets [PM]
    • H01F7/0231—Magnetic circuits with PM for power or force generation
    • H01F7/0242—Magnetic drives, magnetic coupling devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N11/00—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties
    • G01N11/10—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material
    • G01N11/14—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material by using rotary bodies, e.g. vane
    • G01N2011/147—Magnetic coupling

Definitions

  • the present invention relates to the technical field of precision optical processing, and more specifically, to an electromagnetic coupling device, a polishing device having the same, and an electromagnetic rheological property measuring device.
  • the existing domestic and foreign processing equipment for large-size semiconductor wafers are mainly high-efficiency grinding, ultra-precision polishing, chemical mechanical polishing, magnetorheological polishing and grinding and polishing processing based on end grinders.
  • the magnetorheological polishing technology is a method of polishing with a semi-fixed flexible polishing head that uses the magnetorheological effect to produce a semi-fixed flexible polishing head. It is widely used because the relative polishing technology can effectively reduce the fine cracks and residual stress on the workpiece surface.
  • Chinese patent CN103192297B discloses a chemical cluster magnetorheological coupling processing method for single crystal silicon carbide wafers, which is based on Fenton reaction corrosion Single crystal SiC reaction, magnetorheological polishing principle, cluster action mechanism, proposed a chemical reaction and mechanical processing coupling polishing method, which effectively improves the processing efficiency of a certain size of single crystal SiC, but the processing method has weak adaptability and cannot be widely applied to other wafers The material is polished and the degree of magnetic pole clustering is low;
  • Chinese patent CN 103317413 B discloses an electromagnetic self-excited vibration electrorheological coupling polishing method and device, which introduces electromagnetic self-excited vibration to realize the high-speed longitudinal reciprocating movement of the electric field generating device, thereby It has a longitudinal effect on the flexible grinding head produced by the electrorheological effect and improves the processing efficiency.
  • the purpose of the present invention is to overcome the shortcomings of the prior art, and provide an electromagnetic coupling device, a polishing device having the same, and an electromagnetic rheological property measuring device, which can realize different forms of electromagnetic coupling fields, and aim at different forms of electromagnetic coupling fields.
  • the measurement of electromagnetic rheological properties provides a basis for the study of electromagnetic rheological chain control methods and electromagnetic rheological polishing methods.
  • An electromagnetic coupling device which includes a base, an electric field generating component, a magnetic field generating component, a first rotating component that drives the electric field generating component to rotate, a second rotating component that drives the magnetic field generating component to rotate, and an insulating rib arranged above the electric field generating component ,
  • the first rotating component is connected to the electric field generating component
  • the second rotating component is connected to the magnetic field generating component
  • the electric field generating component and the magnetic field generating component are both connected to the base
  • the electric field generating component is distributed inside the insulating rib The generated electric field and the magnetic field generated by the magnetic field generating component.
  • the electric field generating component and the electromagnetic generating component are matched in the insulating rib to form an electromagnetic coupling field.
  • the structure of differently formed permanent magnetic fields, different electric fields and different magnetic fields provide the equipment foundation for the research of electromagnetic rheological chain control methods and electromagnetic rheological polishing methods.
  • the electric field generating component includes an electrode group, an electrode chassis, an electrode disk shaft cylinder, a first carbon brush, a first carbon brush holder, a second carbon brush, a second carbon brush holder, a first conductive ring, and a second conductive ring.
  • ring :
  • the first carbon brush holder is fixedly installed on the electrode disk shaft cylinder, the first carbon brush is fixed to the first carbon brush holder, and a first conductive sheet is provided between the first carbon brush and the first carbon brush holder.
  • the first carbon brush is attached to the bottom of the electrode chassis and the first conductive ring is arranged between the first carbon brush and the electrode chassis;
  • the second carbon brush holder is fixedly installed on the electrode disk shaft cylinder, the second carbon brush is fixed to the second carbon brush holder, and a second conductive sheet is provided between the second carbon brush and the second carbon brush holder.
  • the second carbon brush is attached to the bottom of the electrode chassis and the second conductive ring is provided between the second carbon brush and the electrode chassis;
  • the first conductive ring is electrically connected to the positive electrode of the electrode group, the second conductive ring is electrically connected to the negative electrode of the electrode group, and the first conductive sheet and the second conductive sheet are connected to a DC high voltage power supply ;
  • the electrode group is embedded in the electrode chassis and the upper surface of the electrode chassis is provided with a wear-resistant insulating layer.
  • the electrical energy of the DC high voltage power supply is transferred to the positive electrode of the electrode group through the first conductive sheet, the first carbon brush, and the first conductive ring, and is transferred to the negative electrode of the electrode group through the second conductive sheet, the second carbon brush, and the second conductive ring.
  • an electric field is formed between the positive and negative electrodes of the electrode, and the form and intensity of the electric field are changed by changing the type of electrode group, the voltage and frequency of the DC high-voltage power supply.
  • the electrode chassis is mounted on the electrode disk shaft, the electrode disk shaft is arranged on the outer circumference of the electrode disk shaft cylinder, and a first bearing is provided between the electrode disk shaft and the electrode disk shaft cylinder, and the electrode disk shaft is connected to the outer circumference of the first bearing.
  • the first belt wheel is provided between the electrode disk shaft and the electrode disk shaft cylinder, and the electrode disk shaft is connected to the outer circumference of the first bearing.
  • the first rotating assembly includes a first motor and a first synchronous belt, the first motor is installed on the base, and the first synchronous belt is connected between the first motor and the first pulley.
  • the first motor works through the first synchronous belt to drive the first pulley to rotate, and the first pulley drives the rotating shaft of the electrode disk to rotate. Since there is a first bearing between the rotating shaft of the electrode disk and the shaft of the electrode disk, the rotating shaft of the electrode disk can be opposed to the electrode disk.
  • the shaft barrel rotates.
  • the magnetic field generating assembly includes a magnetic pole, a magnetic pole fixed shaft, a magnetic pole slider, and a magnetic pole guide.
  • the magnetic pole slider is mounted on one end of the magnetic pole fixed shaft, and the other end of the magnetic pole fixed shaft is provided with an inner hole for mounting the magnetic pole.
  • the magnetic pole slider is connected with the magnetic pole guide rail.
  • the magnetic pole guide is installed on the magnetic pole rotating cylinder, the outer periphery of the magnetic pole rotating cylinder is connected with a magnetic pole fixed shaft cylinder, the magnetic pole fixed shaft cylinder is connected with the base, and the magnetic pole rotating cylinder is connected with the magnetic pole fixed shaft cylinder.
  • the outer circumference of the second bearing and the magnetic pole rotating cylinder is connected with a second pulley.
  • the second rotating assembly includes a second motor and a second timing belt, the second motor is mounted on the base, and the second timing belt is connected between the second motor and the second pulley.
  • the second motor works through the second synchronous belt to drive the second pulley to rotate, and the second pulley drives the magnetic pole rotating drum to rotate. Since the magnetic pole rotating drum and the magnetic pole fixing shaft drum are connected with a second bearing, the magnetic pole rotating drum can be positioned relative to the magnetic poles.
  • the shaft barrel rotates; the present invention can adjust the relative position between the magnetic pole slider and the magnetic pole guide, so that the magnetic pole rotates with a certain eccentricity, so as to realize the conversion of the static magnetic field of the electrode chassis disk surface to the dynamic magnetic field.
  • the present invention also provides a polishing device, including a polishing rotating shaft, a clamp for clamping a workpiece, and the electromagnetic coupling device as described above.
  • the clamp is connected to the bottom of the polishing rotating shaft, and the insulating rib contains an electromagnetic current. Changing the polishing liquid, the bottom surface of the workpiece is arranged in contact with the electromagnetic rheological polishing liquid.
  • the clamp clamps the workpiece and rotates under the drive of the polishing rotating shaft, and relative movement occurs between the surface of the workpiece and the electro-magnetic rheological polishing liquid, thereby realizing high-efficiency and ultra-smooth processing of the surface of the workpiece.
  • the present invention also provides an electromagnetic rheological property measuring device, which includes the polishing device, a rotating force sensor and a signal transmitter as described above, the rotating force sensor is connected to one end of the polishing shaft, and the signal The transmitter is signal-connected with the rotation force measuring sensor, and the insulating rib outer cover is provided with an energy shielding cover.
  • the clamp clamps the workpiece and rotates under the driving of the polishing shaft, and the relative movement between the surface of the workpiece and the electromagnetic rheological polishing liquid can realize the high-efficiency and ultra-smooth processing of the surface of the workpiece.
  • the force sensor tests the polishing force, which is easy to monitor the polishing force during the polishing process and study the influence of the polishing force on the polishing effect.
  • the present invention also provides an electromagnetic rheological performance measuring device, which includes a measuring rotor, a torque meter and the electromagnetic coupling device as described above.
  • the measuring rotor is connected with the torque meter, and the insulating rib contains an electromagnetic rheological polishing liquid.
  • the end of the measuring rotor extends into the electro-magnetic rheological polishing liquid, and the outer cover of the insulating rib is provided with an energy shielding cover.
  • the electromagnetic rheological performance measuring device of the present invention measures the rotor protruding into the magnetorheological fluid, the torque of the rotor is measured by a torque meter, and the shear stress and viscosity of the electromagnetic rheological fluid are obtained by conversion.
  • the invention can be used to study the rheological properties of electromagnetic rheological fluids under the coupling action of different electric fields and different magnetic fields, and provides a data basis for the study of electromagnetic rheological chain control methods and electromagnetic rheological polishing methods.
  • the electromagnetic coupling device of the present invention can realize different forms of electric and magnetic coupling fields by changing the structure of the electric field generating part and the magnetic pole structure, and provides the equipment foundation for the research of the electromagnetic rheological chain control mode and the electromagnetic rheological polishing method; the electromagnetic of the present invention
  • the coupling device can be used for electromagnetic rheological polishing test, polishing force measurement of electromagnetic rheological polishing, and electromagnetic rheological fluid performance test. It establishes test conditions for studying the influence factors of electromagnetic rheological polishing, and promotes electromagnetic rheological polishing in the field of optical precision processing. The wide range of applications.
  • Figure 1 is a cross-sectional view of an electromagnetic coupling device according to the first embodiment
  • Figure 2 is a perspective view of the electromagnetic coupling device of the first embodiment
  • Fig. 3 is a partial detailed view of the electric field generating component of the electromagnetic coupling device of the first embodiment
  • FIG. 4 is an A-A cross-sectional view of the electric field generating component of the electromagnetic coupling device in FIG. 3;
  • Fig. 5 is an enlarged view of a part B of the electric field generating component of the electromagnetic coupling device in Fig. 4;
  • FIG. 6 is a schematic diagram of the structure of the concentric ring group electrode group of the electromagnetic coupling device according to the first embodiment
  • FIG. 7 is a schematic diagram of the structure of the strip electrode group of the electromagnetic coupling device according to the first embodiment
  • FIG. 8 is a schematic diagram of the structure of the dot matrix electrode group of the electromagnetic coupling device according to the first embodiment
  • FIG. 9 is a schematic diagram of the structure of the polishing device of the second embodiment.
  • FIG. 10 is a schematic diagram of the structure of the electromagnetic rheological property measuring device of the third embodiment.
  • FIG. 11 is a schematic diagram of the structure of the electromagnetic rheological property measurement device of the fourth embodiment.
  • Figures 1 to 8 show an embodiment of the electromagnetic coupling device of the present invention, which includes a base 100, an electric field generating component 200, a magnetic field generating component 300, a first rotating component 400 that drives the electric field generating component 200 to rotate, and a driving magnetic field generating component
  • the second rotating component 500 rotated by 300 and the insulating rib 600 arranged above the electric field generating component 200, the first rotating component 400 is connected to the electric field generating component 200, the second rotating component 500 is connected to the magnetic field generating component 300, and the electric field generating component 200 ,
  • the magnetic field generating component 300 is connected to the base 100, and the electric field generated by the electric field generating component 200 and the magnetic field generated by the magnetic field generating component 300 are distributed inside the insulating rib 600.
  • the base 100 of this embodiment can be configured as a door-shaped structure, and a plurality of mounting holes 101 are provided at the bottom of the door-shaped structure for installation.
  • the electric field generating component 200 and the electromagnetic generating component cooperate to form an electromagnetic coupling field in the insulating rib 600.
  • the parameters of 300 generate differently formed permanent magnet dynamic fields, thereby forming different forms of electromagnetic coupling fields.
  • the electric field generating assembly 200 includes an electrode group 201, an electrode chassis 202, an electrode disk shaft cylinder 203, a first carbon brush 204, a first carbon brush holder 205, a second carbon brush 206, and a second carbon brush.
  • the first carbon brush holder 205 is fixedly installed on the electrode disk shaft cylinder 203, the first carbon brush 204 is fixed on the first carbon brush holder 205, and a first conductive sheet is provided between the first carbon brush 204 and the first carbon brush holder 205, The first carbon brush 204 is attached to the bottom of the electrode chassis 202 and the first conductive ring 208 is provided between the first carbon brush 204 and the electrode chassis 202;
  • the second carbon brush holder 207 is fixedly installed on the electrode disc shaft cylinder 203, the second carbon brush 206 is fixed on the second carbon brush holder 207, and a second conductive sheet is provided between the second carbon brush 206 and the second carbon brush holder 207, The second carbon brush 206 is attached to the bottom of the electrode chassis 202 and the second conductive ring 209 is provided between the second carbon brush 206 and the electrode chassis 202;
  • the first conductive ring 208 is electrically connected to the positive electrode 210 of the electrode group 201, and the second conductive ring 209 is electrically connected to the negative electrode 211 of the electrode group 201.
  • the first conductive sheet and the second conductive sheet are connected to a direct AC high voltage power supply;
  • the voltage range of the AC high-voltage power supply is 0-10kV, and the frequency range is 0Hz-50Hz.
  • the electrode group 201 is embedded in the electrode chassis 202 and the upper surface of the electrode chassis 202 is provided with a wear-resistant insulating layer 212, which prevents the electrode chassis 202 from being worn and prolongs the service life of the electrode chassis 202; wherein the thickness of the wear-resistant insulating layer 212 can be 0.3 It can be adjusted within the range of mm-1 mm, and the wear-resistant insulating layer 212 of this embodiment may be an alumina ceramic coating.
  • the electrode group 201 can be arranged in a variety of shapes according to the simulation needs of different coupled electromagnetic fields: like the heart ring group electrode group 201, the strip electrode group 201, and the dot matrix electrode group 201, respectively, as shown in the figure 6. As shown in Figure 7, Figure 8. However, it should be noted that the electrode group 201 of the present invention is not limited to the above-mentioned shape arrangement. In actual application, the position and number of the electrode group 201 can be adjusted according to requirements.
  • a long groove 213 is opened on the lower surface of the electrode chassis 202 at a position corresponding to the electrode group 201, and a wire is set in the long groove 213 to be welded to the electrode group 201, and adjacent electrodes are connected to opposite wires.
  • the ends are respectively welded to the first conductive ring 208 and the second conductive ring 209.
  • the lead wires of the first conductive sheet and the second conductive sheet are connected to the DC high-voltage power supply. This configuration can direct the voltage generated by the DC high-voltage power supply to the electrodes.
  • the positive and negative poles of group 201 can direct the voltage generated by the DC high-voltage power supply to the electrodes.
  • a shielding copper sheet 214 is arranged between the electrode assembly 201 and the magnetic field generating assembly 300 in this embodiment.
  • the bottom surface of the electrode chassis 202 can be respectively provided with the first conductive ring 208, the second conductive ring 209, and the shielding copper.
  • the piece 214 matches the positioning notch.
  • the first carbon brush 204 and the second carbon brush 206 of this embodiment are not symmetrical about the center line of the electrode chassis 202, and the first conductive ring 208 and the second conductive ring 208 are not symmetrical about the center line of the electrode chassis 202.
  • the two conductive rings 209 will not overlap.
  • the electrode chassis 202, the insulating rib 600, and the switching disk 210 of this embodiment are arranged concentrically.
  • the electrode chassis 202 can be made of alumina ceramics or zirconia ceramics, but not as a restriction, the electrode chassis 202 can also be made of other insulating materials; the electrode assembly 201 in this embodiment is made of pure It is made of copper, aluminum or stainless steel, but not as a restriction.
  • the electrode group 201 material can also be made of other conductive and non-magnetic materials.
  • the electrode chassis 202 of this embodiment is installed on the electrode disk shaft 215, and the electrode disk shaft 215 is provided on the electrode disk shaft cylinder.
  • a first bearing 216 is provided on the outer periphery of 203 and between the electrode disk rotating shaft 215 and the electrode disk shaft cylinder 203.
  • a first pulley 401 is connected to the outer periphery of the electrode disk rotating shaft 215; the first rotating assembly 400 includes a first motor 402 and a first timing belt 403.
  • the first motor 402 is installed on the base 100, and the first timing belt 403 is connected between the first motor 402 and the first pulley 401, as shown in FIG. 2.
  • the first pulley 401 can be driven to rotate by the transmission of the first pulley 401, and the electrode disk rotating shaft 215 drives the electrode disk to rotate.
  • the first carbon brush 204 is in the first conductive ring. 208.
  • the second carbon brush 206 slides on the second conductive ring 209.
  • the electrode disk shaft 215 is concentrically mounted on the outer circumference of the electrode disk shaft cylinder 203 through the first bearing 216, but the relative position of the electrode disk shaft 215 and the electrode disk shaft cylinder 203 is set in order to obtain a stable motion effect.
  • the preference is not as a restrictive provision.
  • the transmission between the first motor 402 and the electrode disk shaft 215 in this embodiment adopts a belt pulley transmission mode, but the present invention should not be limited to this, and a chain sprocket, gear transmission, etc. can also be used to drive
  • the first motor 402 drives the rotation form of the pole plate rotating shaft is not limited to a complete 360° rotation.
  • the working mode of the first rotation stopper 404 and the first motor 402 can be set to make the pole plate rotating shaft at a preset angle. Rotate within the range.
  • the magnetic field generating assembly 300 includes a magnetic pole 301, a magnetic pole fixed shaft 302, a magnetic pole slider 303, and a magnetic pole guide 304.
  • the magnetic pole slider 303 is mounted on one end of the magnetic pole fixed shaft 302, and the other end of the magnetic pole fixed shaft 302 is provided with The inner hole of the magnetic pole 301 is installed, and the magnetic pole slider 303 is connected to the magnetic pole guide 304.
  • the magnetic pole guide 304 is installed on the magnetic pole rotating cylinder 305, the outer periphery of the magnetic pole rotating cylinder 305 is connected with a magnetic pole fixing shaft cylinder 306, the magnetic pole fixing shaft cylinder 306 is connected with the base 100, and the magnetic pole rotating cylinder 305 and the magnetic pole fixing shaft cylinder 306 are connected with a first There are two bearings 307 and the outer circumference of the magnetic pole rotating cylinder 305 is connected with a second pulley 501; the second rotating assembly 500 includes a second motor 502 and a second timing belt 503, the second motor 502 is installed on the base 100, and the second timing belt 503 is connected Between the second motor 502 and the second pulley 501, as shown in FIG. 2.
  • the second pulley 501 can be driven to rotate by the transmission of the second pulley 501.
  • the magnetic pole rotating cylinder 305 rotates with the second pulley 501, and the magnetic pole 301 rotates, continuously changing the magnetic field to the insulation.
  • the action direction of the electromagnetic rheological fluid inside the rib 600 forces the structure chain in the formed electromagnetic rheological polishing pad to be continuously reorganized and updated, thereby achieving the purpose of uniform polishing.
  • the magnetic pole slider 303 and the magnetic pole guide 304 are provided, and the relative position between the magnetic pole slider 303 and the magnetic pole guide 304 can be adjusted to make the magnetic pole 301 rotate at a certain eccentricity to realize the static magnetic field of the electrode chassis 202 to the dynamic magnetic field. Transformation; the magnetic pole fixed shaft 302 is a hollow structure, and the wires connected to the direct AC high-voltage power supply in the electric field generating assembly 200 can be drawn from the inside of the hollow structure.
  • the transmission between the second motor 502 and the electrode disk shaft 215 in this embodiment adopts a belt pulley transmission mode, but the present invention should not be limited to this, and a chain sprocket, gear transmission, etc. can also be used to drive
  • the rotation form of the second motor 502 driving the pole plate shaft is not limited to a complete 360° rotation.
  • the working mode of the second rotation limiter 505 and the first motor 402 can be set to make the pole plate shaft at a preset angle. Rotate within the range.
  • the material of the magnetic pole 301 is neodymium iron boron
  • the magnetic field strength range is 1000GS-3000GS
  • the materials of the parts contacting or adjacent to the magnetic pole 301 are all non-magnetic materials, such as aluminum alloy, stainless steel, plastic, etc. .
  • This embodiment is an embodiment used as a polishing device 700 in the first embodiment, and includes a polishing shaft 701, a clamp 702 for clamping a workpiece, and the electromagnetic coupling device as before.
  • the clamp 702 is connected to the bottom of the polishing shaft 701, and the insulating rib 600
  • the electromagnetic rheological polishing liquid is contained inside, and the bottom surface of the workpiece is arranged in contact with the electromagnetic rheological polishing liquid, as shown in FIG. 9.
  • the fixture 702 is mounted on the lower part of the polishing shaft 701, the upper part of the polishing shaft 701 is connected with the milling machine spindle, the lower surface of the workpiece and the wear-resistant insulating layer 212 are kept level, and the lower surface of the workpiece is adjusted by the milling machine Z-axis up and down movement system
  • the distance between it and the wear-resistant insulating layer 212 is 0.5mm-3mm;
  • the electromagnetic rheological polishing liquid is configured according to the processing object.
  • the electromagnetic rheological polishing liquid includes 70wt% ⁇ 85wt% silicone oil with a viscosity of 50CS ⁇ 500CS, 10wt% ⁇ 30wt% micron Fe3O4 particles, 1wt% ⁇ 5wt% dispersant, 2wt% ⁇ 10wt% of micron-level polishing abrasive particles and a small amount of stabilized additives are mixed and fully stirred and then vibrated by ultrasonic for 10-30 minutes to form an electromagnetic rheological polishing liquid.
  • the electromagnetic rheological polishing liquid evenly on the insulating rib 600 of the polishing equipment, the electrode chassis 202 and the cavity of the wear-resistant insulating layer 212, and start the second motor 502.
  • the magnetic pole 301 is on the second belt and the second pulley 501. Driven by a certain eccentricity to rotate, the static magnetic field of the electrode chassis 202 is transformed into a dynamic magnetic field. Under the action of the dynamic magnetic field, the electro-magnetic rheological polishing liquid forms a flexible polishing pad with real-time abrasive renewal and self-sharpening and shape recovery;
  • the electrode group 201 is provided with AC and DC power of appropriate voltage and frequency through a direct AC high voltage power supply.
  • the adjacent electrodes form a high voltage electric field of 1000kV/mm ⁇ 5000kV/mm on the electrode chassis 202.
  • the electric field and magnetic field are flexible.
  • the coupling effect of the polishing pad further increases the shear stress and viscosity of the flexible polishing pad.
  • the shape of the different electrode groups 20121 can change the removal rate of the polishing pad at different positions, and then can achieve flattening polishing by optimizing the trajectory movement;
  • the speed is 60rpm ⁇ 1000rpm
  • the workpiece and the electromagnetic coupling flexible polishing head form a relative movement, and the surface of the workpiece can be processed efficiently and super smoothly.
  • this embodiment can perform precision optical processing through electromagnetic coupling fields, and can obtain a better polishing effect and a wide range of applications.
  • This embodiment is an electromagnetic rheological performance measuring device 800 using the polishing device 700 of the second embodiment for testing the mechanical properties of the electromagnetic coupling polishing device 700, as shown in FIG. 10, including the polishing device 700 of the second embodiment, rotating The force sensor 801 and the signal transmitter 802, the rotary force sensor 801 is connected to one end of the polished shaft 701, the signal transmitter 802 is connected to the rotary force sensor 801 for signals, the insulating rib 600 is covered with an energy shield 803 .
  • the electromagnetic rheological property measuring device 800 is installed on a precision vertical CNC milling machine, and the workpiece is installed on a fixture 702, which is installed on the lower section of the polishing shaft 701.
  • the upper section of the polishing shaft 701 is connected to the milling machine spindle.
  • the milling machine spindle is rotated to measure the force
  • the sensor 801 is connected, the signal transmitter 802 is fixed on the milling machine, the lower surface of the workpiece and the wear-resistant insulating layer 212 keep the end face level, the energy shielding cover 803 is concentric with the insulating rib 600 and is fixed on the energy shielding cover 803. Between the electric field generating component and the dynamometer;
  • the electromagnetic rheological polishing liquid is configured according to the processing object.
  • the electromagnetic rheological polishing liquid includes 70wt% ⁇ 85wt% silicone oil with a viscosity of 50CS ⁇ 500CS, 10wt% ⁇ 30wt% micron Fe3O4 particles, 1wt% ⁇ 5wt% dispersant, 2wt% ⁇ 10wt% micron-grade polishing abrasive particles and a small amount of stabilized additives, the components are mixed and fully stirred and then ultrasonically vibrated for 10-30 minutes to form an electromagnetic rheological polishing liquid, and the electromagnetic rheological polishing liquid is evenly poured on the insulating block of the polishing equipment Inside the cavity of the edge 600, the electrode chassis 202, and the wear-resistant insulating layer 212;
  • Adjust the magnetic field structure and parameters, electric field structure and parameters, and processing parameters of the milling machine start the milling machine spindle, start the rotating force sensor 801, set the collection time to 30s, 60s, 120s for the positive pressure signal and torque signal, force measurement process
  • the distance between the lower surface of the workpiece and the wear-resistant insulating layer 212 is adjusted to 0.1 mm to 3 mm through the Z-axis up and down movement system of the milling machine.
  • this embodiment can study the influence of the rotation speed of the polishing device 700 on the polishing effect, and provide a research basis for obtaining better surface processing effects of precision optical materials.
  • the electromagnetic rheological performance measuring device 800 using the electromagnetic coupling device of the first embodiment is used to test the rheological performance of the electromagnetic rheological polishing liquid. It includes measuring the rotor 804, the torque meter 805, and as in the first embodiment.
  • the measuring rotor 804 is connected with the torque meter 805.
  • the insulating rib 600 contains electromagnetic rheological polishing liquid. The end of the measuring rotor 804 extends into the electromagnetic rheological polishing liquid.
  • the insulating rib 600 is covered with Energy shield 803.
  • the test device is installed on a precision vertical CNC milling machine.
  • An insulating rib 600 is installed on the upper surface of the electrode chassis 202.
  • the measuring rotor 804 is concentrically arranged in the inner hole of the insulating rib 600.
  • the measuring rotor 804 is connected to the main shaft of the machine tool through a torque meter 805.
  • the shield is concentric with the insulating rib 600 and is fixed between the electric field generating assembly 200 and the torque meter 805, and the first rotation limiter 404 and the second rotation limiter 505 are not installed;
  • the two speeds are the same, it is a static magnetic field.
  • the electromagnetic rheological fluid is subjected to a dynamic magnetic field;
  • the rheological properties of electrorheological polishing liquids of different compositions in electromagnetic coupling fields of different magnetic fields and electric fields can be studied, which provides a research foundation for obtaining better surface processing effects of precision optical materials.

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The present invention relates to the technical field of precise optical processing, and more particularly to an electromagnetic coupling device, a polishing device with same, and an electromagnetic rheological property measuring device. The electromagnetic coupling device comprises a base, an electric field generation assembly, a magnetic field generation assembly, a first rotating assembly, a second rotating assembly and an insulating flange provided above the electric field generation assembly, wherein the first rotating assembly is connected to the electric field generation assembly; the second rotating assembly is connected to the magnetic field generation assembly; the electric field generation assembly and the magnetic field generation assembly are both connected to the base; and an electric field generated by the electric field generation assembly and a magnetic field generated by the magnetic field generation assembly are distributed in the insulating flange. According to the present invention, by changing the structure of an electric field generation part and the structure of a magnetic pole, different forms of electric and magnetic coupling fields are achieved, and a device basis is provided for research on an electromagnetic rheological chain control means and an electromagnetic rheological polishing means; and the device is applied to an electromagnetic rheological polishing experiment and an electromagnetic rheological property test, such that wide applications for electromagnetic rheological polishing are promoted in the field of optical precision processing.

Description

电磁耦合装置及具有其的抛光装置、电磁流变性能测量装置Electromagnetic coupling device, polishing device having the same, and electromagnetic rheological property measuring device 技术领域Technical field
本发明涉及精密光学加工的技术领域，更具体地，涉及电磁耦合装置及具有其的抛光装置、电磁流变性能测量装置。The present invention relates to the technical field of precision optical processing, and more specifically, to an electromagnetic coupling device, a polishing device having the same, and an electromagnetic rheological property measuring device.
背景技术Background technique
信息科学技术在高速发展，半导体材料在微电子元器件领域的应用愈加广泛，同时对其使用性能提出了更高的要求，常见的半导体材料包括单晶硅、蓝宝石和单晶碳化硅等。一般半导体晶片制造要经过切片、研磨、抛光等工序，要达到良好的使用性能，一方面晶片的表面精度需要达到超光滑程度(粗糙度Ra达到1nm以下)，面型精度也有较高要求(面形精度达到0.5微米以下)，另一方面晶片尺寸的不断扩大也给超精密抛光加工带来更大的挑战。现有国内外对大尺寸半导体晶片的加工装置主要是高效研磨、超精密抛光、化学机械抛光、磁流变抛光和基于端面磨床的磨抛加工等。其中，磁流变抛光技术是应用磁流变流变效应产生半固着的柔性抛光头从事抛光加工的方法，因相对抛光技术能够有效减少工件加工表面的细微裂纹和残余应力而得到广泛应用。With the rapid development of information science and technology, the application of semiconductor materials in the field of microelectronic components has become more and more extensive, and higher requirements have been put forward for their performance. Common semiconductor materials include single crystal silicon, sapphire, and single crystal silicon carbide. Generally, semiconductor wafer manufacturing needs to go through slicing, grinding, polishing and other processes to achieve good performance. On the one hand, the surface accuracy of the wafer needs to be ultra-smooth (roughness Ra below 1nm), and the surface accuracy also has higher requirements (surface The shape accuracy is less than 0.5 microns). On the other hand, the continuous expansion of wafer size also brings greater challenges to ultra-precision polishing. The existing domestic and foreign processing equipment for large-size semiconductor wafers are mainly high-efficiency grinding, ultra-precision polishing, chemical mechanical polishing, magnetorheological polishing and grinding and polishing processing based on end grinders. Among them, the magnetorheological polishing technology is a method of polishing with a semi-fixed flexible polishing head that uses the magnetorheological effect to produce a semi-fixed flexible polishing head. It is widely used because the relative polishing technology can effectively reduce the fine cracks and residual stress on the workpiece surface.
尽管电磁耦合式抛光装置陆续被开发出来，但或多或少存在一定的缺陷，如：中国专利CN103192297B公开了一种单晶碳化硅晶片的化学集群磁流变耦合加工方法，基于芬顿反应腐蚀单晶SiC反应、磁流变抛光原理、集群作用机理提出化学反应和机械加工的耦合抛光方法，有效提高了一定尺寸单晶SiC的加工效率，但是加工方法适应性弱，不能广泛应用于其他晶片材料的抛光加工，且其磁极集群程度较低；中国专利CN 103317413 B公开了一种电磁自激震动电流变耦合抛光方法及装置，引入电磁自激振动实现电场发生装置的高速纵向往复运动，从而对由电流变效应产生的柔性磨头产生纵向作用，提高加工效率，但由于采用的是单点抛光方法，不能适应大尺寸晶片加工的需求。影响电磁耦合式抛光装置性能的因素很多，而目前尚未有有效的抛光质量影响因素的试验装置，阻碍了电磁流变在光学精密加工领域的应用。Although electromagnetic coupling polishing devices have been developed one after another, there are more or less certain defects. For example: Chinese patent CN103192297B discloses a chemical cluster magnetorheological coupling processing method for single crystal silicon carbide wafers, which is based on Fenton reaction corrosion Single crystal SiC reaction, magnetorheological polishing principle, cluster action mechanism, proposed a chemical reaction and mechanical processing coupling polishing method, which effectively improves the processing efficiency of a certain size of single crystal SiC, but the processing method has weak adaptability and cannot be widely applied to other wafers The material is polished and the degree of magnetic pole clustering is low; Chinese patent CN 103317413 B discloses an electromagnetic self-excited vibration electrorheological coupling polishing method and device, which introduces electromagnetic self-excited vibration to realize the high-speed longitudinal reciprocating movement of the electric field generating device, thereby It has a longitudinal effect on the flexible grinding head produced by the electrorheological effect and improves the processing efficiency. However, because the single-point polishing method is adopted, it cannot meet the needs of processing large-size wafers. There are many factors that affect the performance of the electromagnetic coupling polishing device, and there is no effective test device for the factors affecting the polishing quality, which hinders the application of electromagnetic rheology in the field of optical precision processing.
发明内容Summary of the invention
本发明的目的在于克服现有技术的不足，提供一种电磁耦合装置及具有其的抛光装置、电磁流变性能测量装置，可实现不同形式的电磁耦合场，且针对不同 形式的电磁耦合场对电磁流变性能进行测量，为电磁流变链串控制方式和电磁流变抛光方式的研究提供了基础。The purpose of the present invention is to overcome the shortcomings of the prior art, and provide an electromagnetic coupling device, a polishing device having the same, and an electromagnetic rheological property measuring device, which can realize different forms of electromagnetic coupling fields, and aim at different forms of electromagnetic coupling fields. The measurement of electromagnetic rheological properties provides a basis for the study of electromagnetic rheological chain control methods and electromagnetic rheological polishing methods.
为解决上述技术问题，本发明采用的技术方案是：In order to solve the above technical problems, the technical solutions adopted by the present invention are:
提供一种电磁耦合装置，包括底座、电场发生组件、磁场发生组件、驱动电场发生组件转动的第一旋转组件、驱动磁场发生组件转动的第二旋转组件以及设于电场发生组件上方的绝缘挡边，所述第一旋转组件与电场发生组件连接，所述第二旋转组件与磁场发生组件连接，所述电场发生组件、磁场发生组件均与底座连接，所述绝缘挡边内部分布有电场发生组件产生的电场以及磁场发生组件产生的磁场。An electromagnetic coupling device is provided, which includes a base, an electric field generating component, a magnetic field generating component, a first rotating component that drives the electric field generating component to rotate, a second rotating component that drives the magnetic field generating component to rotate, and an insulating rib arranged above the electric field generating component , The first rotating component is connected to the electric field generating component, the second rotating component is connected to the magnetic field generating component, the electric field generating component and the magnetic field generating component are both connected to the base, and the electric field generating component is distributed inside the insulating rib The generated electric field and the magnetic field generated by the magnetic field generating component.
本发明的电磁耦合装置，电场发生组件、电磁发生组件配合在绝缘挡边内形成电磁耦合场，通过改变电场发生组件的参数生成不同分布结构、不同大小的电场，通过改变磁场发生组件的参数生成不同形成的永磁动场，不同电场和不同磁场的结构为电磁流变链串控制方式和电磁流变抛光方式的研究提供设备基础。In the electromagnetic coupling device of the present invention, the electric field generating component and the electromagnetic generating component are matched in the insulating rib to form an electromagnetic coupling field. By changing the parameters of the electric field generating component to generate electric fields with different distribution structures and different sizes, and generating by changing the parameters of the magnetic field generating component The structure of differently formed permanent magnetic fields, different electric fields and different magnetic fields provide the equipment foundation for the research of electromagnetic rheological chain control methods and electromagnetic rheological polishing methods.
进一步地，所述电场发生组件包括电极组、电极底盘、电极盘轴筒、第一碳刷、第一碳刷架、第二碳刷、第二碳刷架、第一导电环以及第二导电环：Further, the electric field generating component includes an electrode group, an electrode chassis, an electrode disk shaft cylinder, a first carbon brush, a first carbon brush holder, a second carbon brush, a second carbon brush holder, a first conductive ring, and a second conductive ring. ring:
所述第一碳刷架固定安装于电极盘轴筒、所述第一碳刷固定于第一碳刷架且第一碳刷和第一碳刷架之间设有第一导电片，所述第一碳刷贴设于电极底盘的底部且第一导电环设于第一碳刷与电极底盘之间；The first carbon brush holder is fixedly installed on the electrode disk shaft cylinder, the first carbon brush is fixed to the first carbon brush holder, and a first conductive sheet is provided between the first carbon brush and the first carbon brush holder. The first carbon brush is attached to the bottom of the electrode chassis and the first conductive ring is arranged between the first carbon brush and the electrode chassis;
所述第二碳刷架固定安装于电极盘轴筒、所述第二碳刷固定于第二碳刷架且第二碳刷和第二碳刷架之间设有第二导电片，所述第二碳刷贴设于电极底盘的底部且第二导电环设于第二碳刷与电极底盘之间；The second carbon brush holder is fixedly installed on the electrode disk shaft cylinder, the second carbon brush is fixed to the second carbon brush holder, and a second conductive sheet is provided between the second carbon brush and the second carbon brush holder. The second carbon brush is attached to the bottom of the electrode chassis and the second conductive ring is provided between the second carbon brush and the electrode chassis;
所述第一导电环与所述电极组的正极电连接，所述第二导电环与所述电极组的负极电连接，所述第一导电片、第二导电片与直交流高压电源接通；The first conductive ring is electrically connected to the positive electrode of the electrode group, the second conductive ring is electrically connected to the negative electrode of the electrode group, and the first conductive sheet and the second conductive sheet are connected to a DC high voltage power supply ；
所述电极组嵌设于电极底盘且电极底盘的上表面设有耐磨绝缘层。The electrode group is embedded in the electrode chassis and the upper surface of the electrode chassis is provided with a wear-resistant insulating layer.
直交流高压电源的电能通过第一导电片、第一碳刷、第一导电环传递到电极组的正极，通过第二导电片、第二碳刷、第二导电环传递到电极组的负极，从而在电极的正负极之间形成电场，通过改变电极组的种类、直交流高压电源电压大小和频率改变电场的形式和电场强度。The electrical energy of the DC high voltage power supply is transferred to the positive electrode of the electrode group through the first conductive sheet, the first carbon brush, and the first conductive ring, and is transferred to the negative electrode of the electrode group through the second conductive sheet, the second carbon brush, and the second conductive ring. Thereby, an electric field is formed between the positive and negative electrodes of the electrode, and the form and intensity of the electric field are changed by changing the type of electrode group, the voltage and frequency of the DC high-voltage power supply.
进一步地，所述电极底盘安装于电极盘转轴，所述电极盘转轴设于电极盘轴筒外周且电极盘转轴与电极盘轴筒之间设有第一轴承，所述电极盘转轴外周连接 有第一带轮。Further, the electrode chassis is mounted on the electrode disk shaft, the electrode disk shaft is arranged on the outer circumference of the electrode disk shaft cylinder, and a first bearing is provided between the electrode disk shaft and the electrode disk shaft cylinder, and the electrode disk shaft is connected to the outer circumference of the first bearing. The first belt wheel.
进一步地，所述第一旋转组件包括第一电机以及第一同步带，所述第一电机安装于底座，所述第一同步带连接于第一电机和第一带轮之间。第一电机工作通过第一同步带带动第一带轮转动，第一带轮带动电极盘转轴转动，由于电极盘转轴与电极盘轴筒之间设有第一轴承，电极盘转轴可相对电极盘轴筒旋转。Further, the first rotating assembly includes a first motor and a first synchronous belt, the first motor is installed on the base, and the first synchronous belt is connected between the first motor and the first pulley. The first motor works through the first synchronous belt to drive the first pulley to rotate, and the first pulley drives the rotating shaft of the electrode disk to rotate. Since there is a first bearing between the rotating shaft of the electrode disk and the shaft of the electrode disk, the rotating shaft of the electrode disk can be opposed to the electrode disk. The shaft barrel rotates.
进一步地，所述磁场发生组件包括磁极、磁极固定轴、磁极滑块以及磁极导轨，所述磁极滑块安装于磁极固定轴的一端，磁极固定轴的另一端设有安装磁极的内孔，所述磁极滑块与磁极导轨连接。Further, the magnetic field generating assembly includes a magnetic pole, a magnetic pole fixed shaft, a magnetic pole slider, and a magnetic pole guide. The magnetic pole slider is mounted on one end of the magnetic pole fixed shaft, and the other end of the magnetic pole fixed shaft is provided with an inner hole for mounting the magnetic pole. The magnetic pole slider is connected with the magnetic pole guide rail.
进一步地，所述磁极导轨安装于磁极旋转筒，所述磁极旋转筒外周连接有磁极定轴筒，所述磁极定轴筒与底座连接，所述磁极旋转筒与磁极定轴筒之间连接有第二轴承且磁极旋转筒的外周连接有第二带轮。Further, the magnetic pole guide is installed on the magnetic pole rotating cylinder, the outer periphery of the magnetic pole rotating cylinder is connected with a magnetic pole fixed shaft cylinder, the magnetic pole fixed shaft cylinder is connected with the base, and the magnetic pole rotating cylinder is connected with the magnetic pole fixed shaft cylinder. The outer circumference of the second bearing and the magnetic pole rotating cylinder is connected with a second pulley.
进一步地，所述第二旋转组件包括第二电机以及第二同步带，所述第二电机安装于底座，所述第二同步带连接于第二电机与第二带轮之间。第二电机工作通过第二同步带带动第二带轮转动，第二带轮带动磁极旋转筒转动，由于磁极旋转筒与磁极定轴筒之间连接有第二轴承，磁极旋转筒可相对磁极定轴筒旋转；本发明可通过调整磁极滑块与磁极导轨之间的相对位置，使得磁极以一定的偏心距旋转，实现电极底盘盘面的静态磁场向动态磁场转变。Further, the second rotating assembly includes a second motor and a second timing belt, the second motor is mounted on the base, and the second timing belt is connected between the second motor and the second pulley. The second motor works through the second synchronous belt to drive the second pulley to rotate, and the second pulley drives the magnetic pole rotating drum to rotate. Since the magnetic pole rotating drum and the magnetic pole fixing shaft drum are connected with a second bearing, the magnetic pole rotating drum can be positioned relative to the magnetic poles. The shaft barrel rotates; the present invention can adjust the relative position between the magnetic pole slider and the magnetic pole guide, so that the magnetic pole rotates with a certain eccentricity, so as to realize the conversion of the static magnetic field of the electrode chassis disk surface to the dynamic magnetic field.
本发明还提供了一种抛光装置，包括抛光转轴、用于夹持工件的夹具以及如前所述的电磁耦合装置，所述夹具连接于抛光转轴底部，所述绝缘挡边内部盛装有电磁流变抛光液，所述工件底面与电磁流变抛光液接触设置。The present invention also provides a polishing device, including a polishing rotating shaft, a clamp for clamping a workpiece, and the electromagnetic coupling device as described above. The clamp is connected to the bottom of the polishing rotating shaft, and the insulating rib contains an electromagnetic current. Changing the polishing liquid, the bottom surface of the workpiece is arranged in contact with the electromagnetic rheological polishing liquid.
本发明的抛光装置，夹具夹持工件并在抛光转轴的带动下旋转，工件表面与电磁流变抛光液之间发生相对运动，实现工件表面的高效超光滑加工。In the polishing device of the present invention, the clamp clamps the workpiece and rotates under the drive of the polishing rotating shaft, and relative movement occurs between the surface of the workpiece and the electro-magnetic rheological polishing liquid, thereby realizing high-efficiency and ultra-smooth processing of the surface of the workpiece.
本发明还提供了一种电磁流变性能测量装置，包括如前所述的抛光装置、旋转测力感应器以及信号传送器，所述旋转测力感应器连接于抛光转轴的一端，所述信号传送器与旋转测力感应器信号连接，所述绝缘挡边外罩设有能量屏蔽罩。The present invention also provides an electromagnetic rheological property measuring device, which includes the polishing device, a rotating force sensor and a signal transmitter as described above, the rotating force sensor is connected to one end of the polishing shaft, and the signal The transmitter is signal-connected with the rotation force measuring sensor, and the insulating rib outer cover is provided with an energy shielding cover.
本发明的电磁流变性能测量装置，夹具夹持工件并在抛光转轴的带动下旋转，工件表面与电磁流变抛光液之间发生相对运动，实现工件表面的高效超光滑加工，同时通过旋转测力感应器测试抛光力的大小，易于实现对抛光过程抛光力的监测以及研究抛光力大小对抛光效果的影响。In the electromagnetic rheological property measuring device of the present invention, the clamp clamps the workpiece and rotates under the driving of the polishing shaft, and the relative movement between the surface of the workpiece and the electromagnetic rheological polishing liquid can realize the high-efficiency and ultra-smooth processing of the surface of the workpiece. The force sensor tests the polishing force, which is easy to monitor the polishing force during the polishing process and study the influence of the polishing force on the polishing effect.
本发明还提供了一种电磁流变性能测量装置，包括测量转子、扭矩仪以及如 前所述的电磁耦合装置，测量转子与扭矩仪连接，所述绝缘挡边内部盛装有电磁流变抛光液，所述测量转子的端部伸入至电磁流变抛光液中，所述绝缘挡边外罩设有能量屏蔽罩。The present invention also provides an electromagnetic rheological performance measuring device, which includes a measuring rotor, a torque meter and the electromagnetic coupling device as described above. The measuring rotor is connected with the torque meter, and the insulating rib contains an electromagnetic rheological polishing liquid. , The end of the measuring rotor extends into the electro-magnetic rheological polishing liquid, and the outer cover of the insulating rib is provided with an energy shielding cover.
本发明的电磁流变性能测量装置，测量转子伸入至磁流变液中，通过扭矩仪测试测量转子的扭矩，并换算得到电磁流变液的剪切应力和粘度。本发明可用于研究电磁流变液在不同电场及不同磁场耦合作用下的流变性能，为电磁流变链串控制方式和电磁流变抛光方式的研究提供数据基础。The electromagnetic rheological performance measuring device of the present invention measures the rotor protruding into the magnetorheological fluid, the torque of the rotor is measured by a torque meter, and the shear stress and viscosity of the electromagnetic rheological fluid are obtained by conversion. The invention can be used to study the rheological properties of electromagnetic rheological fluids under the coupling action of different electric fields and different magnetic fields, and provides a data basis for the study of electromagnetic rheological chain control methods and electromagnetic rheological polishing methods.
与现有技术相比，本发明的有益效果是：Compared with the prior art, the beneficial effects of the present invention are:
本发明的电磁耦合装置可以通过改变电场发生部分结构和磁极结构实现不同形式的电、磁耦合场，为电磁流变链串控制方式和电磁流变抛光方式的研究提供设备基础；本发明的电磁耦合装置可用于进行电磁流变抛光试验、电磁流变抛光的抛光力测量以及电磁流变液性能测试，为研究电磁流变抛光影响因素创立了试验条件，促进电磁流变抛光在光学精密加工领域的广泛应用。The electromagnetic coupling device of the present invention can realize different forms of electric and magnetic coupling fields by changing the structure of the electric field generating part and the magnetic pole structure, and provides the equipment foundation for the research of the electromagnetic rheological chain control mode and the electromagnetic rheological polishing method; the electromagnetic of the present invention The coupling device can be used for electromagnetic rheological polishing test, polishing force measurement of electromagnetic rheological polishing, and electromagnetic rheological fluid performance test. It establishes test conditions for studying the influence factors of electromagnetic rheological polishing, and promotes electromagnetic rheological polishing in the field of optical precision processing. The wide range of applications.
附图说明Description of the drawings
图1为实施例一电磁耦合装置的剖视图；Figure 1 is a cross-sectional view of an electromagnetic coupling device according to the first embodiment;
图2为实施例一电磁耦合装置的立体图；Figure 2 is a perspective view of the electromagnetic coupling device of the first embodiment;
图3为实施例一电磁耦合装置的电场发生组件的部分细节图；Fig. 3 is a partial detailed view of the electric field generating component of the electromagnetic coupling device of the first embodiment;
图4为图3中电磁耦合装置的电场发生组件的A-A截面剖视图；4 is an A-A cross-sectional view of the electric field generating component of the electromagnetic coupling device in FIG. 3;
图5为图4中电磁耦合装置的电场发生组件的局部B的放大图；Fig. 5 is an enlarged view of a part B of the electric field generating component of the electromagnetic coupling device in Fig. 4;
图6为实施例一电磁耦合装置的同心环组电极组的结构示意图；6 is a schematic diagram of the structure of the concentric ring group electrode group of the electromagnetic coupling device according to the first embodiment;
图7为实施例一电磁耦合装置的条型组电极组的结构示意图；FIG. 7 is a schematic diagram of the structure of the strip electrode group of the electromagnetic coupling device according to the first embodiment; FIG.
图8为实施例一电磁耦合装置的点阵型电极组的结构示意图；8 is a schematic diagram of the structure of the dot matrix electrode group of the electromagnetic coupling device according to the first embodiment;
图9为实施例二抛光装置的结构示意图；9 is a schematic diagram of the structure of the polishing device of the second embodiment;
图10为实施例三电磁流变性能测量装置的结构示意图；FIG. 10 is a schematic diagram of the structure of the electromagnetic rheological property measuring device of the third embodiment;
图11为实施例四电磁流变性能测量装置的结构示意图；11 is a schematic diagram of the structure of the electromagnetic rheological property measurement device of the fourth embodiment;
附图中：100-底座；101-安装孔；200-电场发生组件；201-电极组；202-电极底盘；203-电极盘轴筒；204-第一碳刷；205-第一碳刷架；206-第二碳刷；207-第二碳刷架；208-第一导电环；209-第二导电环；210-正极；211-负极；212-耐磨绝缘层；213-长槽；214-屏蔽铜片；215-电极盘转轴；216-第一轴承；217-转换盘；300-磁场发生组件；301-磁极；302-磁极固定轴；303-磁极滑块；304-磁极 导轨；305-磁极旋转筒；306-磁极定轴筒；307-第二轴承；400-第一旋转组件；401-第一带轮；402-第一电机；403-第一同步带；404-第一旋转限位器；500-第二旋转组件；501-第二带轮；502-第二电机；503-第二同步带；505-第二旋转限位器；600-绝缘挡边；700-抛光装置；701-抛光转轴；702-夹具；800-电磁流变性能测量装置；801-旋转测力感应器；802-信号传送器；803-能量屏蔽罩；804-测量转子；805-扭矩仪。In the drawings: 100-base; 101-mounting hole; 200-electric field generating component; 201-electrode group; 202-electrode chassis; 203-electrode disk shaft cylinder; 204-first carbon brush; 205-first carbon brush holder 206-second carbon brush; 207-second carbon brush holder; 208-first conductive ring; 209-second conductive ring; 210-positive electrode; 211-negative electrode; 212-wear-resistant insulating layer; 213-long groove; 214-shielding copper sheet; 215-electrode disk shaft; 216-first bearing; 217-conversion disk; 300-magnetic field generating assembly; 301-magnetic pole; 302-magnetic pole fixed shaft; 303-magnetic pole slider; 304-magnetic pole guide; 305-magnetic pole rotating cylinder; 306-magnetic pole fixed shaft cylinder; 307-second bearing; 400-first rotating assembly; 401-first pulley; 402-first motor; 403-first synchronous belt; 404-first Rotation stopper; 500-second rotating component; 501-second pulley; 502-second motor; 503-second timing belt; 505-second rotation stopper; 600-insulation ribs; 700-polishing Device; 701-polished rotating shaft; 702-fixture; 800-electromagnetic rheological property measuring device; 801-rotating force sensor; 802-signal transmitter; 803-energy shielding cover; 804-measurement rotor; 805-torque meter.
具体实施方式detailed description
下面结合具体实施方式对本发明作进一步的说明。其中，附图仅用于示例性说明，表示的仅是示意图，而非实物图，不能理解为对本专利的限制；为了更好地说明本发明的实施例，附图某些部件会有省略、放大或缩小，并不代表实际产品的尺寸；对本领域技术人员来说，附图中某些公知结构及其说明可能省略是可以理解的。The present invention will be further described below in conjunction with specific embodiments. Among them, the drawings are only used for exemplary description, and they are only schematic diagrams rather than physical drawings, and cannot be understood as a limitation of this patent; in order to better illustrate the embodiments of the present invention, some parts of the drawings may be omitted, Enlargement or reduction does not represent the size of the actual product; for those skilled in the art, it is understandable that some well-known structures in the drawings and their descriptions may be omitted.
本发明实施例的附图中相同或相似的标号对应相同或相似的部件；在本发明的描述中，需要理解的是，若有术语“上”、“下”、“左”、“右”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此附图中描述位置关系的用语仅用于示例性说明，不能理解为对本专利的限制，对于本领域的普通技术人员而言，可以根据具体情况理解上述术语的具体含义。The same or similar reference numerals in the drawings of the embodiments of the present invention correspond to the same or similar components; in the description of the present invention, it should be understood that if there are the terms "upper", "lower", "left", and "right" The orientation or positional relationship of other indications is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation or a specific orientation. The azimuth structure and operation, therefore, the terms describing the positional relationship in the drawings are only for exemplary description, and cannot be understood as a limitation of the patent. For those of ordinary skill in the art, the specific meaning of the above terms can be understood according to the specific circumstances.
实施例一Example one
如图1至图8所示为本发明的电磁耦合装置的实施例，包括底座100、电场发生组件200、磁场发生组件300、驱动电场发生组件200转动的第一旋转组件400、驱动磁场发生组件300转动的第二旋转组件500以及设于电场发生组件200上方的绝缘挡边600，第一旋转组件400与电场发生组件200连接，第二旋转组件500与磁场发生组件300连接，电场发生组件200、磁场发生组件300均与底座100连接，绝缘挡边600内部分布有电场发生组件200产生的电场以及磁场发生组件300产生的磁场。为了便于本实施例的电磁耦合装置的安装于组装，本实施例的底座100可设置为门型结构，并在门型结构的底部设置多个安装孔101用以安装。本实施例在实施时，电场发生组件200、电磁发生组件配合在绝缘挡边600内形成电磁耦合场，通过改变电场发生组件200的参数生成不同分布结构、 不同大小的电场，通过改变磁场发生组件300的参数生成不同形成的永磁动场，从而形成不同形式的电磁耦合场。Figures 1 to 8 show an embodiment of the electromagnetic coupling device of the present invention, which includes a base 100, an electric field generating component 200, a magnetic field generating component 300, a first rotating component 400 that drives the electric field generating component 200 to rotate, and a driving magnetic field generating component The second rotating component 500 rotated by 300 and the insulating rib 600 arranged above the electric field generating component 200, the first rotating component 400 is connected to the electric field generating component 200, the second rotating component 500 is connected to the magnetic field generating component 300, and the electric field generating component 200 , The magnetic field generating component 300 is connected to the base 100, and the electric field generated by the electric field generating component 200 and the magnetic field generated by the magnetic field generating component 300 are distributed inside the insulating rib 600. In order to facilitate the installation and assembly of the electromagnetic coupling device of this embodiment, the base 100 of this embodiment can be configured as a door-shaped structure, and a plurality of mounting holes 101 are provided at the bottom of the door-shaped structure for installation. In the implementation of this embodiment, the electric field generating component 200 and the electromagnetic generating component cooperate to form an electromagnetic coupling field in the insulating rib 600. By changing the parameters of the electric field generating component 200, different distribution structures and electric fields of different sizes are generated, and by changing the magnetic field generating component The parameters of 300 generate differently formed permanent magnet dynamic fields, thereby forming different forms of electromagnetic coupling fields.
如图3至图5所示，电场发生组件200包括电极组201、电极底盘202、电极盘轴筒203、第一碳刷204、第一碳刷架205、第二碳刷206、第二碳刷架207、第一导电环208以及第二导电环209：As shown in FIGS. 3 to 5, the electric field generating assembly 200 includes an electrode group 201, an electrode chassis 202, an electrode disk shaft cylinder 203, a first carbon brush 204, a first carbon brush holder 205, a second carbon brush 206, and a second carbon brush. Brush holder 207, first conductive ring 208, and second conductive ring 209:
第一碳刷架205固定安装于电极盘轴筒203、第一碳刷204固定于第一碳刷架205且第一碳刷204和第一碳刷架205之间设有第一导电片，第一碳刷204贴设于电极底盘202的底部且第一导电环208设于第一碳刷204与电极底盘202之间；The first carbon brush holder 205 is fixedly installed on the electrode disk shaft cylinder 203, the first carbon brush 204 is fixed on the first carbon brush holder 205, and a first conductive sheet is provided between the first carbon brush 204 and the first carbon brush holder 205, The first carbon brush 204 is attached to the bottom of the electrode chassis 202 and the first conductive ring 208 is provided between the first carbon brush 204 and the electrode chassis 202;
第二碳刷架207固定安装于电极盘轴筒203、第二碳刷206固定于第二碳刷架207且第二碳刷206和第二碳刷架207之间设有第二导电片，第二碳刷206贴设于电极底盘202的底部且第二导电环209设于第二碳刷206与电极底盘202之间；The second carbon brush holder 207 is fixedly installed on the electrode disc shaft cylinder 203, the second carbon brush 206 is fixed on the second carbon brush holder 207, and a second conductive sheet is provided between the second carbon brush 206 and the second carbon brush holder 207, The second carbon brush 206 is attached to the bottom of the electrode chassis 202 and the second conductive ring 209 is provided between the second carbon brush 206 and the electrode chassis 202;
第一导电环208与电极组201的正极210电连接，第二导电环209与电极组201的负极211电连接，第一导电片、第二导电片与直交流高压电源接通；其中，直交流高压电源的电压范围为0～10kV，频率范围为0Hz～50Hz。The first conductive ring 208 is electrically connected to the positive electrode 210 of the electrode group 201, and the second conductive ring 209 is electrically connected to the negative electrode 211 of the electrode group 201. The first conductive sheet and the second conductive sheet are connected to a direct AC high voltage power supply; The voltage range of the AC high-voltage power supply is 0-10kV, and the frequency range is 0Hz-50Hz.
电极组201嵌设于电极底盘202且电极底盘202的上表面设有耐磨绝缘层212，防止电极底盘202磨损，延长电极底盘202的使用寿命；其中，耐磨绝缘层212的厚度可在0.3mm～1mm的范围内进行调整，本实施例的耐磨绝缘层212可采用氧化铝陶瓷涂层。The electrode group 201 is embedded in the electrode chassis 202 and the upper surface of the electrode chassis 202 is provided with a wear-resistant insulating layer 212, which prevents the electrode chassis 202 from being worn and prolongs the service life of the electrode chassis 202; wherein the thickness of the wear-resistant insulating layer 212 can be 0.3 It can be adjusted within the range of mm-1 mm, and the wear-resistant insulating layer 212 of this embodiment may be an alumina ceramic coating.
本实施例中电极组201可根据不同的耦合电磁场的模拟需要可设置为多种形状排布方式：如同心环组电极组201、条型组电极组201、点阵型电极组201，分别如图6、图7、图8所示。但需要说明的是，本发明的电极组201并不限于上述形状排布方式，在实际应用时，电极组201的位置、数量均可根据需求进行调整。In this embodiment, the electrode group 201 can be arranged in a variety of shapes according to the simulation needs of different coupled electromagnetic fields: like the heart ring group electrode group 201, the strip electrode group 201, and the dot matrix electrode group 201, respectively, as shown in the figure 6. As shown in Figure 7, Figure 8. However, it should be noted that the electrode group 201 of the present invention is not limited to the above-mentioned shape arrangement. In actual application, the position and number of the electrode group 201 can be adjusted according to requirements.
为了便于电极组201的安装，在电极底盘202的下表面与电极组201对应的位置开设有长槽213，在长槽213内设置导线与电极组201焊接，相邻电极接相反的导线，导线末端分别与第一导电环208、第二导电环209焊接，第一导电片、第二导电片引出导线与直交流高压电源接通，如此设置便可将直交流高压电源产生的电压导向至电极组201的正负极。In order to facilitate the installation of the electrode group 201, a long groove 213 is opened on the lower surface of the electrode chassis 202 at a position corresponding to the electrode group 201, and a wire is set in the long groove 213 to be welded to the electrode group 201, and adjacent electrodes are connected to opposite wires. The ends are respectively welded to the first conductive ring 208 and the second conductive ring 209. The lead wires of the first conductive sheet and the second conductive sheet are connected to the DC high-voltage power supply. This configuration can direct the voltage generated by the DC high-voltage power supply to the electrodes. The positive and negative poles of group 201.
为了避免电极盘轴筒203、磁场发生组件300等对电极组201通入高压电后产生的电场产生影响，本实施例在电极组201和磁场发生组件300之间设置有屏蔽铜片214。In order to prevent the electrode disk shaft cylinder 203 and the magnetic field generating assembly 300 from affecting the electric field generated after the electrode assembly 201 is connected to high voltage, a shielding copper sheet 214 is arranged between the electrode assembly 201 and the magnetic field generating assembly 300 in this embodiment.
为了便于第一导电环208、第二导电环209、屏蔽铜片214的安装与定位，本实施例可在电极底盘202的底面分别设置与第一导电环208、第二导电环209、屏蔽铜片214匹配的定位槽口。In order to facilitate the installation and positioning of the first conductive ring 208, the second conductive ring 209, and the shielding copper sheet 214, in this embodiment, the bottom surface of the electrode chassis 202 can be respectively provided with the first conductive ring 208, the second conductive ring 209, and the shielding copper. The piece 214 matches the positioning notch.
为了避免第一导电环208、第二导电环209之间的干涉，本实施例的第一碳刷204、第二碳刷206并非关于电极底盘202中心线对称，且第一导电环208和第二导电环209不会发生重合。而为了保证电磁耦合装置运动的平稳性，本实施例的电极底盘202、绝缘挡边600、转换盘210同心设置。In order to avoid interference between the first conductive ring 208 and the second conductive ring 209, the first carbon brush 204 and the second carbon brush 206 of this embodiment are not symmetrical about the center line of the electrode chassis 202, and the first conductive ring 208 and the second conductive ring 208 are not symmetrical about the center line of the electrode chassis 202. The two conductive rings 209 will not overlap. In order to ensure the stability of the movement of the electromagnetic coupling device, the electrode chassis 202, the insulating rib 600, and the switching disk 210 of this embodiment are arranged concentrically.
在本实施例中，电极底盘202可采用氧化铝陶瓷、氧化锆陶瓷制成，但不作为限制性规定，电极底盘202还可采用其他绝缘材料制得；本实施例的电极组201材料采用纯铜、铝或不锈钢材料制得，但不作为限制性规定，电极组201材料还可采用其他导电不导磁材料制得。In this embodiment, the electrode chassis 202 can be made of alumina ceramics or zirconia ceramics, but not as a restriction, the electrode chassis 202 can also be made of other insulating materials; the electrode assembly 201 in this embodiment is made of pure It is made of copper, aluminum or stainless steel, but not as a restriction. The electrode group 201 material can also be made of other conductive and non-magnetic materials.
为了实现电场对电磁流变液内粒子作用方向改变和电磁流变液的转动以达到抛光的目的，本实施例的电极底盘202安装于电极盘转轴215，电极盘转轴215设于电极盘轴筒203外周且电极盘转轴215与电极盘轴筒203之间设有第一轴承216，电极盘转轴215外周连接有第一带轮401；第一旋转组件400包括第一电机402以及第一同步带403，第一电机402安装于底座100，第一同步带403连接于第一电机402和第一带轮401之间，如图2所示。如此设置，当第一电机402工作时，通过第一带轮401的传动便可带动第一带轮401转动，电极盘转轴215带动电极盘旋转，同时，第一碳刷204在第一导电环208、第二碳刷206在第二导电环209上滑动。In order to realize the change of the direction of action of the electric field on the particles in the electromagnetic rheological fluid and the rotation of the electromagnetic rheological fluid to achieve the purpose of polishing, the electrode chassis 202 of this embodiment is installed on the electrode disk shaft 215, and the electrode disk shaft 215 is provided on the electrode disk shaft cylinder. A first bearing 216 is provided on the outer periphery of 203 and between the electrode disk rotating shaft 215 and the electrode disk shaft cylinder 203. A first pulley 401 is connected to the outer periphery of the electrode disk rotating shaft 215; the first rotating assembly 400 includes a first motor 402 and a first timing belt 403. The first motor 402 is installed on the base 100, and the first timing belt 403 is connected between the first motor 402 and the first pulley 401, as shown in FIG. 2. With this arrangement, when the first motor 402 is working, the first pulley 401 can be driven to rotate by the transmission of the first pulley 401, and the electrode disk rotating shaft 215 drives the electrode disk to rotate. At the same time, the first carbon brush 204 is in the first conductive ring. 208. The second carbon brush 206 slides on the second conductive ring 209.
本实施例中，电极盘转轴215通过第一轴承216同心安装在电极盘轴筒203的外周，但电极盘转轴215与电极盘轴筒203相对位置的设置是为了获得稳定的运动效果而做出的优选，并不作为限制性的规定。In this embodiment, the electrode disk shaft 215 is concentrically mounted on the outer circumference of the electrode disk shaft cylinder 203 through the first bearing 216, but the relative position of the electrode disk shaft 215 and the electrode disk shaft cylinder 203 is set in order to obtain a stable motion effect. The preference is not as a restrictive provision.
另需要说明的是，本实施例第一电机402与电极盘转轴215之间的传动采用皮带带轮的传动方式，但本发明不应限于此，还可采用链条链轮、齿轮传动等能够带动电极盘转轴215转动的传动方式。本实施例第一电机402带动极盘转轴的转动形式也不限于完整的360°旋转，可通过在设置第一旋转限位器404和第一 电机402的工作方式使得极盘转轴在预设角度范围内进行旋转。It should also be noted that the transmission between the first motor 402 and the electrode disk shaft 215 in this embodiment adopts a belt pulley transmission mode, but the present invention should not be limited to this, and a chain sprocket, gear transmission, etc. can also be used to drive The transmission mode of the rotation of the electrode disk shaft 215. In this embodiment, the first motor 402 drives the rotation form of the pole plate rotating shaft is not limited to a complete 360° rotation. The working mode of the first rotation stopper 404 and the first motor 402 can be set to make the pole plate rotating shaft at a preset angle. Rotate within the range.
如图1所示，磁场发生组件300包括磁极301、磁极固定轴302、磁极滑块303以及磁极导轨304，磁极滑块303安装于磁极固定轴302的一端，磁极固定轴302的另一端设有安装磁极301的内孔，磁极滑块303与磁极导轨304连接。其中，磁极导轨304安装于磁极旋转筒305，磁极旋转筒305外周连接有磁极定轴筒306，磁极定轴筒306与底座100连接，磁极旋转筒305与磁极定轴筒306之间连接有第二轴承307且磁极旋转筒305的外周连接有第二带轮501；第二旋转组件500包括第二电机502以及第二同步带503，第二电机502安装于底座100，第二同步带503连接于第二电机502与第二带轮501之间，如图2所示。如此设置，当第二电机502工作时，通过第二带轮501的传动便可带动第二带轮501转动，磁极旋转筒305跟随第二带轮501转动，磁极301旋转，不断改变磁场对绝缘挡边600内部电磁流变液的作用方向，迫使形成的电磁流变抛光垫内结构链串不断重组更新，从而实现均匀抛光的目的。As shown in Figure 1, the magnetic field generating assembly 300 includes a magnetic pole 301, a magnetic pole fixed shaft 302, a magnetic pole slider 303, and a magnetic pole guide 304. The magnetic pole slider 303 is mounted on one end of the magnetic pole fixed shaft 302, and the other end of the magnetic pole fixed shaft 302 is provided with The inner hole of the magnetic pole 301 is installed, and the magnetic pole slider 303 is connected to the magnetic pole guide 304. Among them, the magnetic pole guide 304 is installed on the magnetic pole rotating cylinder 305, the outer periphery of the magnetic pole rotating cylinder 305 is connected with a magnetic pole fixing shaft cylinder 306, the magnetic pole fixing shaft cylinder 306 is connected with the base 100, and the magnetic pole rotating cylinder 305 and the magnetic pole fixing shaft cylinder 306 are connected with a first There are two bearings 307 and the outer circumference of the magnetic pole rotating cylinder 305 is connected with a second pulley 501; the second rotating assembly 500 includes a second motor 502 and a second timing belt 503, the second motor 502 is installed on the base 100, and the second timing belt 503 is connected Between the second motor 502 and the second pulley 501, as shown in FIG. 2. With this arrangement, when the second motor 502 is working, the second pulley 501 can be driven to rotate by the transmission of the second pulley 501. The magnetic pole rotating cylinder 305 rotates with the second pulley 501, and the magnetic pole 301 rotates, continuously changing the magnetic field to the insulation. The action direction of the electromagnetic rheological fluid inside the rib 600 forces the structure chain in the formed electromagnetic rheological polishing pad to be continuously reorganized and updated, thereby achieving the purpose of uniform polishing.
其中，设置磁极滑块303和磁极导轨304，可通过调整磁极滑块303与磁极导轨304之间的相对位置，使得磁极301以一定的偏心距旋转，实现电极底盘202盘面的静态磁场向动态磁场转变；磁极固定轴302为中空结构，电场发生组件200中与直交流高压电源接通的导线可从该中空结构的内部引出。Wherein, the magnetic pole slider 303 and the magnetic pole guide 304 are provided, and the relative position between the magnetic pole slider 303 and the magnetic pole guide 304 can be adjusted to make the magnetic pole 301 rotate at a certain eccentricity to realize the static magnetic field of the electrode chassis 202 to the dynamic magnetic field. Transformation; the magnetic pole fixed shaft 302 is a hollow structure, and the wires connected to the direct AC high-voltage power supply in the electric field generating assembly 200 can be drawn from the inside of the hollow structure.
另需要说明的是，本实施例第二电机502与电极盘转轴215之间的传动采用皮带带轮的传动方式，但本发明不应限于此，还可采用链条链轮、齿轮传动等能够带动电极盘转轴215转动的传动方式。本实施例第二电机502带动极盘转轴的转动形式也不限于完整的360°旋转，可通过在设置第二旋转限位器505和第一电机402的工作方式使得极盘转轴在预设角度范围内进行旋转。It should also be noted that the transmission between the second motor 502 and the electrode disk shaft 215 in this embodiment adopts a belt pulley transmission mode, but the present invention should not be limited to this, and a chain sprocket, gear transmission, etc. can also be used to drive The transmission mode of the rotation of the electrode disk shaft 215. In this embodiment, the rotation form of the second motor 502 driving the pole plate shaft is not limited to a complete 360° rotation. The working mode of the second rotation limiter 505 and the first motor 402 can be set to make the pole plate shaft at a preset angle. Rotate within the range.
在本实施例中，磁极301的材料为钕铁硼，磁场强度范围为1000GS-3000GS，而与磁极301接触或相邻的零件材料均采用非导磁材料，如铝合金、不锈钢、塑料等材料。In this embodiment, the material of the magnetic pole 301 is neodymium iron boron, the magnetic field strength range is 1000GS-3000GS, and the materials of the parts contacting or adjacent to the magnetic pole 301 are all non-magnetic materials, such as aluminum alloy, stainless steel, plastic, etc. .
实施例二Example two
本实施例为实施例一用作抛光装置700的实施例，包括抛光转轴701、用于夹持工件的夹具702以及如前的电磁耦合装置，夹具702连接于抛光转轴701底部，绝缘挡边600内部盛装有电磁流变抛光液，工件底面与电磁流变抛光液接触设置，如图9所示。This embodiment is an embodiment used as a polishing device 700 in the first embodiment, and includes a polishing shaft 701, a clamp 702 for clamping a workpiece, and the electromagnetic coupling device as before. The clamp 702 is connected to the bottom of the polishing shaft 701, and the insulating rib 600 The electromagnetic rheological polishing liquid is contained inside, and the bottom surface of the workpiece is arranged in contact with the electromagnetic rheological polishing liquid, as shown in FIG. 9.
本实施例实施时，具体按以下步骤进行：When this embodiment is implemented, the specific steps are as follows:
将抛光装置700安装在精密立式数控铣床上，如图9所示，针对加工对象的特点，在磁极301底部加装垫片或调整垫片厚度控制工件表面的磁场强度为1000GS～3000GS，通过调整磁极导轨304和磁极滑块303的相对位置控制磁极301的旋转偏心距为0mm～5mm，根据是否需要限位需要安装第一旋转限位器404和第二旋转限位器505来分别控制电极底盘202和磁极301的转动限位，选择电极组201的结构和尺寸；Install the polishing device 700 on a precision vertical CNC milling machine. As shown in Figure 9, according to the characteristics of the processing object, add a gasket at the bottom of the magnetic pole 301 or adjust the thickness of the gasket to control the magnetic field intensity on the surface of the workpiece to 1000GS～3000GS. Adjust the relative position of the magnetic pole guide 304 and the magnetic pole slider 303 to control the rotation eccentricity of the magnetic pole 301 from 0mm to 5mm. According to the need to limit the position, install the first rotation limiter 404 and the second rotation limiter 505 to control the electrodes respectively The rotation limit of the chassis 202 and the magnetic pole 301, select the structure and size of the electrode group 201;
将工件安装在夹具702，夹具702安装在抛光转轴701的下段，抛光转轴701上段与铣床主轴连接，工件下表面与耐磨绝缘层212保持端面水平，通过铣床Z轴上下运动***调整工件下表面和耐磨绝缘层212之间间距为0.5mm～3mm；Install the workpiece on the fixture 702, the fixture 702 is mounted on the lower part of the polishing shaft 701, the upper part of the polishing shaft 701 is connected with the milling machine spindle, the lower surface of the workpiece and the wear-resistant insulating layer 212 are kept level, and the lower surface of the workpiece is adjusted by the milling machine Z-axis up and down movement system The distance between it and the wear-resistant insulating layer 212 is 0.5mm-3mm;
根据加工对象配置电磁流变抛光液，电磁流变抛光液包括70wt％～85wt％粘度为50CS～500CS的硅油、10wt％～30wt％微米级Fe3O4粒子、1wt％～5wt％分散剂、2wt％～10wt％微米级抛光磨粒及少量稳定添加剂，将各组分混合后充分搅拌后通过超声波震动10～30分钟，形成电磁流变抛光液。The electromagnetic rheological polishing liquid is configured according to the processing object. The electromagnetic rheological polishing liquid includes 70wt%～85wt% silicone oil with a viscosity of 50CS～500CS, 10wt%～30wt% micron Fe3O4 particles, 1wt%～5wt% dispersant, 2wt%～ 10wt% of micron-level polishing abrasive particles and a small amount of stabilized additives are mixed and fully stirred and then vibrated by ultrasonic for 10-30 minutes to form an electromagnetic rheological polishing liquid.
将电磁流变抛光液均匀倒在抛光设备的绝缘挡边600、电极底盘202以及耐磨绝缘层212的空腔内，启动第二电机502，磁极301在第二皮带和第二带轮501的带动下以一定的偏心距旋转，实现电极底盘202盘面的静态磁场向动态磁场转变，电磁流变抛光液在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫；Pour the electromagnetic rheological polishing liquid evenly on the insulating rib 600 of the polishing equipment, the electrode chassis 202 and the cavity of the wear-resistant insulating layer 212, and start the second motor 502. The magnetic pole 301 is on the second belt and the second pulley 501. Driven by a certain eccentricity to rotate, the static magnetic field of the electrode chassis 202 is transformed into a dynamic magnetic field. Under the action of the dynamic magnetic field, the electro-magnetic rheological polishing liquid forms a flexible polishing pad with real-time abrasive renewal and self-sharpening and shape recovery;
根据加工对象的特征，通过直交流高压电源为电极组201提供合适电压大小和频率的交直流电，相邻电极在电极底盘202盘面形成1000kV/mm～5000kV/mm的高压电场，电场和磁场对柔性抛光垫的耦合作用进一步提高柔性抛光垫的剪切应力和粘度，同时不同的电极组20121的形状能够使抛光垫不同位置的去除率产生变化，进而可以通过优化轨迹运动，实现平坦化抛光；According to the characteristics of the object to be processed, the electrode group 201 is provided with AC and DC power of appropriate voltage and frequency through a direct AC high voltage power supply. The adjacent electrodes form a high voltage electric field of 1000kV/mm～5000kV/mm on the electrode chassis 202. The electric field and magnetic field are flexible. The coupling effect of the polishing pad further increases the shear stress and viscosity of the flexible polishing pad. At the same time, the shape of the different electrode groups 20121 can change the removal rate of the polishing pad at different positions, and then can achieve flattening polishing by optimizing the trajectory movement;
启动铣床主轴，转速为60rpm～1000rpm，工件与电磁耦合柔性抛光头形成相对运动，实现工件表面的高效超光滑加工。Start the milling machine spindle, the speed is 60rpm～1000rpm, the workpiece and the electromagnetic coupling flexible polishing head form a relative movement, and the surface of the workpiece can be processed efficiently and super smoothly.
经过以上步骤，本实施例可通过电磁耦合场进行精密光学加工，能够获取较好的抛光效果和广泛的适用范围。After the above steps, this embodiment can perform precision optical processing through electromagnetic coupling fields, and can obtain a better polishing effect and a wide range of applications.
实施例三Example three
本实施例为应用实施例二的抛光装置700的电磁流变性能测量装置800，用 于电磁耦合抛光装置700的力学性能测试，如图10所示，包括如实施例二的抛光装置700、旋转测力感应器801以及信号传送器802，旋转测力感应器801连接于抛光转轴701的一端，信号传送器802与旋转测力感应器801信号连接，绝缘挡边600外罩设有能量屏蔽罩803。This embodiment is an electromagnetic rheological performance measuring device 800 using the polishing device 700 of the second embodiment for testing the mechanical properties of the electromagnetic coupling polishing device 700, as shown in FIG. 10, including the polishing device 700 of the second embodiment, rotating The force sensor 801 and the signal transmitter 802, the rotary force sensor 801 is connected to one end of the polished shaft 701, the signal transmitter 802 is connected to the rotary force sensor 801 for signals, the insulating rib 600 is covered with an energy shield 803 .
本实施例实施时，具体按以下步骤进行：When this embodiment is implemented, the specific steps are as follows:
将电磁流变性能测量装置800安装在精密立式数控铣床上，将工件安装在夹具702，夹具702安装在抛光转轴701的下段，抛光转轴701上段与铣床主轴连接，铣床主轴通过通过旋转测力感应器801连接，信号传送器802固定在铣床上，工件下表面与耐磨绝缘层212保持端面水平，能量屏蔽罩803与绝缘挡边600同心且通过能量屏蔽罩803，能量屏蔽罩803固定在电场发生部件与测力仪之间；The electromagnetic rheological property measuring device 800 is installed on a precision vertical CNC milling machine, and the workpiece is installed on a fixture 702, which is installed on the lower section of the polishing shaft 701. The upper section of the polishing shaft 701 is connected to the milling machine spindle. The milling machine spindle is rotated to measure the force The sensor 801 is connected, the signal transmitter 802 is fixed on the milling machine, the lower surface of the workpiece and the wear-resistant insulating layer 212 keep the end face level, the energy shielding cover 803 is concentric with the insulating rib 600 and is fixed on the energy shielding cover 803. Between the electric field generating component and the dynamometer;
根据加工对象配置电磁流变抛光液，电磁流变抛光液包括70wt％～85wt％粘度为50CS～500CS的硅油、10wt％～30wt％微米级Fe3O4粒子、1wt％～5wt％分散剂、2wt％～10wt％微米级抛光磨粒及少量稳定添加剂，将各组分混合后充分搅拌后通过超声波震动10～30分钟，形成电磁流变抛光液，将电磁流变抛光液均匀倒在抛光设备的绝缘挡边600、电极底盘202以及耐磨绝缘层212的空腔内；The electromagnetic rheological polishing liquid is configured according to the processing object. The electromagnetic rheological polishing liquid includes 70wt%～85wt% silicone oil with a viscosity of 50CS～500CS, 10wt%～30wt% micron Fe3O4 particles, 1wt%～5wt% dispersant, 2wt%～ 10wt% micron-grade polishing abrasive particles and a small amount of stabilized additives, the components are mixed and fully stirred and then ultrasonically vibrated for 10-30 minutes to form an electromagnetic rheological polishing liquid, and the electromagnetic rheological polishing liquid is evenly poured on the insulating block of the polishing equipment Inside the cavity of the edge 600, the electrode chassis 202, and the wear-resistant insulating layer 212;
调整磁场结构及参数、电场结构及参数、以及铣床加工工艺参数；启动铣床主轴，启动旋转测力感应器801，设置采集时间为30s、60s、120s内的正压力信号以及扭矩信号，测力过程中，通过铣床Z轴上下运动***调整工件下表面和耐磨绝缘层212间距为0.1mm～3mm，测力结束，铣床主轴停止。Adjust the magnetic field structure and parameters, electric field structure and parameters, and processing parameters of the milling machine; start the milling machine spindle, start the rotating force sensor 801, set the collection time to 30s, 60s, 120s for the positive pressure signal and torque signal, force measurement process In the middle, the distance between the lower surface of the workpiece and the wear-resistant insulating layer 212 is adjusted to 0.1 mm to 3 mm through the Z-axis up and down movement system of the milling machine. After the force measurement is completed, the milling machine spindle stops.
经过以上步骤，本实施例可研究抛光装置700的转速对抛光效果的影响，为获取更好的精密光学材料表面加工效果提供研究基础。After the above steps, this embodiment can study the influence of the rotation speed of the polishing device 700 on the polishing effect, and provide a research basis for obtaining better surface processing effects of precision optical materials.
实施例四Example four
如图11所示为应用实施例一的电磁耦合装置的电磁流变性能测量装置800，用于电磁流变抛光液的流变性能的测试，包括测量转子804、扭矩仪805以及如实施例一的电磁耦合装置，测量转子804与扭矩仪805连接，绝缘挡边600内部盛装有电磁流变抛光液，测量转子804的端部伸入至电磁流变抛光液中，绝缘挡边600外罩设有能量屏蔽罩803。As shown in FIG. 11, the electromagnetic rheological performance measuring device 800 using the electromagnetic coupling device of the first embodiment is used to test the rheological performance of the electromagnetic rheological polishing liquid. It includes measuring the rotor 804, the torque meter 805, and as in the first embodiment. The measuring rotor 804 is connected with the torque meter 805. The insulating rib 600 contains electromagnetic rheological polishing liquid. The end of the measuring rotor 804 extends into the electromagnetic rheological polishing liquid. The insulating rib 600 is covered with Energy shield 803.
本实施例实施时，具体按以下步骤进行：When this embodiment is implemented, the specific steps are as follows:
试验装置安装在精密立式数控铣床上，电极底盘202上表面安装绝缘挡边600，测量转子804同心设置在绝缘挡边600的内孔中，测量转子804通过扭矩 仪805连接机床主轴，能场屏蔽罩与绝缘挡边600同心且固定在电场发生组件200与扭矩仪805之间，不安装第一旋转限位器404和第二旋转限位器505；The test device is installed on a precision vertical CNC milling machine. An insulating rib 600 is installed on the upper surface of the electrode chassis 202. The measuring rotor 804 is concentrically arranged in the inner hole of the insulating rib 600. The measuring rotor 804 is connected to the main shaft of the machine tool through a torque meter 805. The shield is concentric with the insulating rib 600 and is fixed between the electric field generating assembly 200 and the torque meter 805, and the first rotation limiter 404 and the second rotation limiter 505 are not installed;
配置不同组分和组分比例的少量电磁流变抛光液，并置于测量转子804与耐磨绝缘层212的间隙内；Configure a small amount of electromagnetic rheological polishing liquid with different components and component ratios, and place them in the gap between the measuring rotor 804 and the wear-resistant insulating layer 212;
调整磁场结构及参数、电磁结构参数；Adjust the magnetic field structure and parameters, electromagnetic structure parameters;
通过铣床Z轴上下运动***调整工件下表面和耐磨绝缘层212间距为1mm，锁紧铣床主轴，启动扭矩仪805，设置采集时间为60S内的扭矩信号，启动第一电机402、第二电机502实现电极底盘202旋转和磁极301旋转，转速为60rpm～200rpm，当两者转速相同时为静磁场，两者转速不等时，电磁流变液受到动磁场作用；Adjust the distance between the lower surface of the workpiece and the wear-resistant insulating layer 212 by the milling machine's Z-axis up and down movement system to 1mm, lock the milling machine spindle, start the torque meter 805, set the acquisition time to the torque signal within 60S, start the first motor 402, the second motor 502 realizes the rotation of the electrode chassis 202 and the magnetic pole 301 at a speed of 60rpm～200rpm. When the two speeds are the same, it is a static magnetic field. When the two speeds are not equal, the electromagnetic rheological fluid is subjected to a dynamic magnetic field;
测力结束，主轴停止，关闭直交流高压电源；根据获得的扭矩通过公式换算得出电磁流变抛光液的剪切应力和粘度。After the force measurement is over, the spindle stops, and the direct AC high-voltage power supply is turned off; the shear stress and viscosity of the electro-magnetic rheological polishing liquid are obtained by formula conversion according to the obtained torque.
经过以上步骤，便可研究不同组成的电流流变抛光液在不同磁场形式、电场形式的电磁耦合场中的流变性能，为获取更好的精密光学材料表面加工效果提供研究基础。After the above steps, the rheological properties of electrorheological polishing liquids of different compositions in electromagnetic coupling fields of different magnetic fields and electric fields can be studied, which provides a research foundation for obtaining better surface processing effects of precision optical materials.
显然，本发明的上述实施例仅仅是为清楚地说明本发明所作的举例，而并非是对本发明的实施方式的限定。对于所属领域的普通技术人员来说，在上述说明的基础上还可以做出其它不同形式的变化或变动。这里无需也无法对所有的实施方式予以穷举。凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明权利要求的保护范围之内。Obviously, the above-mentioned embodiments of the present invention are merely examples to clearly illustrate the present invention, and are not intended to limit the implementation of the present invention. For those of ordinary skill in the art, other changes or modifications in different forms can be made on the basis of the above description. It is unnecessary and impossible to list all the implementation methods here. Any modification, equivalent replacement and improvement made within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims (10)

  1. 电磁耦合装置，其特征在于，包括底座(100)、电场发生组件(200)、磁场发生组件(300)、驱动电场发生组件(200)转动的第一旋转组件(400)、驱动磁场发生组件(300)转动的第二旋转组件(500)以及设于电场发生组件(200)上方的绝缘挡边(600)，所述第一旋转组件(400)与电场发生组件(200)连接，所述第二旋转组件(500)与磁场发生组件(300)连接，所述电场发生组件(200)、磁场发生组件(300)均与底座(100)连接，所述绝缘挡边(600)内部分布有电场发生组件(200)产生的电场以及磁场发生组件(300)产生的磁场。The electromagnetic coupling device is characterized by comprising a base (100), an electric field generating component (200), a magnetic field generating component (300), a first rotating component (400) for driving the electric field generating component (200) to rotate, and a driving magnetic field generating component ( 300) A rotating second rotating component (500) and an insulating rib (600) arranged above the electric field generating component (200), the first rotating component (400) is connected to the electric field generating component (200), and the first rotating component (400) is connected to the electric field generating component (200), and the first rotating component (400) is connected to the electric field generating component (200). The two rotating components (500) are connected to the magnetic field generating component (300), the electric field generating component (200) and the magnetic field generating component (300) are both connected to the base (100), and an electric field is distributed inside the insulating rib (600) The electric field generated by the generating component (200) and the magnetic field generated by the magnetic field generating component (300).
  2. 根据权利要求1所述的电磁耦合装置，其特征在于，所述电场发生组件(200)包括电极组(201)、电极底盘(202)、电极盘轴筒(203)、第一碳刷(204)、第一碳刷架(205)、第二碳刷(206)、第二碳刷架(207)、第一导电环(208)以及第二导电环(209)：The electromagnetic coupling device according to claim 1, wherein the electric field generating component (200) comprises an electrode group (201), an electrode chassis (202), an electrode disk shaft cylinder (203), and a first carbon brush (204) ), the first carbon brush holder (205), the second carbon brush (206), the second carbon brush holder (207), the first conductive ring (208), and the second conductive ring (209):
    所述第一碳刷架(205)固定安装于电极盘轴筒(203)、所述第一碳刷(204)固定于第一碳刷架(205)且第一碳刷(204)和第一碳刷架(205)之间设有第一导电片，所述第一碳刷(204)贴设于电极底盘(202)的底部且第一导电环(208)设于第一碳刷(204)与电极底盘(202)之间；The first carbon brush holder (205) is fixedly installed on the electrode disc shaft cylinder (203), the first carbon brush (204) is fixed on the first carbon brush holder (205), and the first carbon brush (204) and the first carbon brush (204) are fixed to the first carbon brush holder (205). A first conductive sheet is provided between a carbon brush holder (205), the first carbon brush (204) is attached to the bottom of the electrode chassis (202), and the first conductive ring (208) is provided on the first carbon brush ( 204) and the electrode chassis (202);
    所述第二碳刷架(207)固定安装于电极盘轴筒(203)、所述第二碳刷(206)固定于第二碳刷架(207)且第二碳刷(206)和第二碳刷架(207)之间设有第二导电片，所述第二碳刷(206)贴设于电极底盘(202)的底部且第二导电环(209)设于第二碳刷(206)与电极底盘(202)之间；The second carbon brush holder (207) is fixedly installed on the electrode disc shaft cylinder (203), the second carbon brush (206) is fixed on the second carbon brush holder (207), and the second carbon brush (206) and the second carbon brush (206) are fixed to the second carbon brush holder (207). A second conductive sheet is provided between the two carbon brush holders (207), the second carbon brush (206) is attached to the bottom of the electrode chassis (202), and the second conductive ring (209) is provided on the second carbon brush ( 206) and the electrode chassis (202);
    所述第一导电环(208)与所述电极组(201)的正极(210)电连接，所述第二导电环(209)与所述电极组(201)的负极(211)电连接，所述第一导电片、第二导电片与直交流高压电源接通；The first conductive ring (208) is electrically connected with the positive electrode (210) of the electrode group (201), and the second conductive ring (209) is electrically connected with the negative electrode (211) of the electrode group (201), The first conductive sheet and the second conductive sheet are connected to a direct AC high-voltage power supply;
    所述电极组(201)嵌设于电极底盘(202)且电极底盘(202)的上表面设有耐磨绝缘层(212)。The electrode group (201) is embedded in the electrode chassis (202), and the upper surface of the electrode chassis (202) is provided with a wear-resistant insulating layer (212).
  3. 根据权利要求2所述的电磁耦合装置，其特征在于，所述电极底盘(202)安装于电极盘转轴(215)，所述电极盘转轴(215)设于电极盘轴筒(203)外周且电极盘转轴(215)与电极盘轴筒(203)之间设有第一轴承(216)，所述电极盘转轴(215)外周连接有第一带轮(401)。The electromagnetic coupling device according to claim 2, wherein the electrode chassis (202) is mounted on the electrode disk shaft (215), and the electrode disk shaft (215) is provided on the outer periphery of the electrode disk shaft cylinder (203) and A first bearing (216) is provided between the electrode disk rotating shaft (215) and the electrode disk shaft cylinder (203), and a first pulley (401) is connected to the outer circumference of the electrode disk rotating shaft (215).
  4. 根据权利要求3所述的电磁耦合装置，其特征在于，所述第一旋转组件 (400)包括第一电机(402)以及第一同步带(403)，所述第一电机(402)安装于底座(100)，所述第一同步带(403)连接于第一电机(402)和第一带轮(401)之间。The electromagnetic coupling device according to claim 3, wherein the first rotating component (400) comprises a first motor (402) and a first timing belt (403), and the first motor (402) is mounted on On the base (100), the first timing belt (403) is connected between the first motor (402) and the first pulley (401).
  5. 根据权利要求1至4任一项所述的电磁耦合装置，其特征在于，所述磁场发生组件(300)包括磁极(301)、磁极固定轴(302)、磁极滑块(303)以及磁极导轨(304)，所述磁极滑块(303)安装于磁极固定轴(302)的一端，磁极固定轴(302)的另一端设有安装磁极(301)的内孔，所述磁极滑块(303)与磁极导轨(304)连接。The electromagnetic coupling device according to any one of claims 1 to 4, wherein the magnetic field generating component (300) comprises a magnetic pole (301), a magnetic pole fixed shaft (302), a magnetic pole slider (303) and a magnetic pole guide (304), the magnetic pole slider (303) is mounted on one end of the magnetic pole fixed shaft (302), the other end of the magnetic pole fixed shaft (302) is provided with an inner hole for mounting the magnetic pole (301), the magnetic pole slider (303) ) Is connected to the magnetic pole guide (304).
  6. 根据权利要求5所述的电磁耦合装置，其特征在于，所述磁极导轨(304)安装于磁极旋转筒(305)，所述磁极旋转筒(305)外周连接有磁极定轴筒(306)，所述磁极定轴筒(306)与底座(100)连接，所述磁极旋转筒(305)与磁极定轴筒(306)之间连接有第二轴承(307)且磁极旋转筒(305)的外周连接有第二带轮(501)。The electromagnetic coupling device according to claim 5, wherein the magnetic pole guide (304) is mounted on a magnetic pole rotating cylinder (305), and a magnetic pole fixing shaft cylinder (306) is connected to the outer circumference of the magnetic pole rotating cylinder (305), The magnetic pole fixed shaft cylinder (306) is connected to the base (100), the magnetic pole rotating cylinder (305) and the magnetic pole fixed shaft cylinder (306) are connected with a second bearing (307) and the magnetic pole rotating cylinder (305) A second pulley (501) is connected to the outer circumference.
  7. 根据权利要求6所述的电磁耦合装置，其特征在于，所述第二旋转组件(500)包括第二电机(502)以及第二同步带(503)，所述第二电机(502)安装于底座(100)，所述第二同步带(503)连接于第二电机(502)与第二带轮(501)之间。The electromagnetic coupling device according to claim 6, characterized in that the second rotating assembly (500) comprises a second motor (502) and a second timing belt (503), and the second motor (502) is mounted on In the base (100), the second timing belt (503) is connected between the second motor (502) and the second pulley (501).
  8. 一种抛光装置，其特征在于，包括抛光转轴(701)、用于夹持工件的夹具(702)以及如权利要求1至7任一项所述的电磁耦合装置，所述夹具(702)连接于抛光转轴(701)底部，所述绝缘挡边(600)内部盛装有电磁流变抛光液，所述工件底面与电磁流变抛光液接触设置。A polishing device, characterized by comprising a polishing rotating shaft (701), a clamp (702) for clamping a workpiece, and the electromagnetic coupling device according to any one of claims 1 to 7, and the clamp (702) is connected At the bottom of the polishing shaft (701), the insulating rib (600) is filled with electromagnetic rheological polishing liquid, and the bottom surface of the workpiece is arranged in contact with the electromagnetic rheological polishing liquid.
  9. 一种电磁流变性能测量装置，其特征在于，包括如权利要求8所述的抛光装置、旋转测力感应器(801)以及信号传送器(802)，所述旋转测力感应器(801)连接于抛光转轴(701)的一端，所述信号传送器(802)与旋转测力感应器(801)信号连接，所述绝缘挡边(600)外罩设有能量屏蔽罩(803)。An electromagnetic rheological property measuring device, which is characterized by comprising the polishing device according to claim 8, a rotating force sensor (801) and a signal transmitter (802), the rotating force sensor (801) Connected to one end of the polishing rotating shaft (701), the signal transmitter (802) is signally connected with the rotating force sensor (801), and the insulating rib (600) is covered with an energy shielding cover (803).
  10. 一种电磁流变性能测量装置，其特征在于，包括测量转子(804)、扭矩仪(805)以及如权利要求1至7任一项所述的电磁耦合装置，测量转子(804)与扭矩仪(805)连接，所述绝缘挡边(600)内部盛装有电磁流变抛光液，所述测量转子(804)的端部伸入至电磁流变抛光液中，所述绝缘挡边(600)外罩设有能量屏蔽罩(803)。An electromagnetic rheological property measuring device, characterized by comprising a measuring rotor (804), a torque meter (805) and the electromagnetic coupling device according to any one of claims 1 to 7, the measuring rotor (804) and the torque meter (805) connection, the insulating rib (600) contains electromagnetic rheological polishing liquid inside, the end of the measuring rotor (804) extends into the electromagnetic rheological polishing liquid, the insulating rib (600) The outer cover is provided with an energy shielding cover (803).
PCT/CN2019/117610 2019-08-29 2019-11-12 Electromagnetic coupling device, polishing device having same, and electromagnetic rheological property measuring device WO2021035971A1 (en)

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