WO2021035972A1 - Electromagnetic coupling polishing device and electromagnetic coupling polishing method for controlling abrasive grain state - Google Patents

Abstract

Provided are an electromagnetic coupling polishing device and an electromagnetic coupling polishing method for controlling an abrasive grain state, wherein the polishing device comprises a multi-layer drive input structure, an electric field disk structure for arranging an electromagnetic rheological polishing liquid (62), and a magnetic pole disk swing structure, wherein the magnetic pole disk swing structure is used for making the electromagnetic rheological polishing liquid (62) form a real-time abrasive update, self-sharpening and shape-recovered flexible polishing pad (66) under the action of the dynamic magnetic field, the electric field generated by the electric field disk structure is coupled with the magnetic field generated by the magnetic pole disk swing structure to improve the shear stress and viscosity of the flexible polishing pad (66); the magnetic pole disk swing structure is arranged on an eccentric transmission part, and the electric field disk structure is arranged on a main transmission part. The polishing device and the polishing method thereof enable efficient ultra-smooth machining of the surface of the workpiece.

Description

一种电磁耦合抛光设备及其电磁耦合控制磨粒状态的抛光方法Electromagnetic coupling polishing equipment and polishing method for electromagnetic coupling to control abrasive grain state 技术领域Technical field

本发明涉及抛光装置领域，更具体地，涉及一种电磁耦合抛光设备及其电磁耦合控制磨粒状态的抛光方法。The invention relates to the field of polishing devices, and more specifically, to an electromagnetic coupling polishing device and a polishing method for electromagnetic coupling to control the state of abrasive particles.

背景技术Background technique

信息科学技术在高速发展，半导体材料在微电子元器件领域的应用愈加广泛，同时对其使用性能提出了更高的要求，常见的半导体材料包括单晶硅、氧化铝、钛酸锶和单晶碳化硅等。一般半导体晶片制造要经过切片、研磨、抛光等工序，要达到良好的使用性能，一方面晶片的表面精度需要达到超光滑程度(粗糙度Ra达到1nm以下)，面型精度也有较高要求(面形精度达到0.5微米以下)，另一方面晶片尺寸的不断扩大也给超精密抛光加工带来更大的挑战。With the rapid development of information science and technology, the application of semiconductor materials in the field of microelectronic components has become more and more extensive, and higher requirements have been put forward for their performance. Common semiconductor materials include single crystal silicon, alumina, strontium titanate and single crystal Silicon carbide, etc. Generally, semiconductor wafer manufacturing needs to go through slicing, grinding, polishing and other processes to achieve good performance. On the one hand, the surface accuracy of the wafer needs to be ultra-smooth (roughness Ra below 1nm), and the surface accuracy also has higher requirements (surface The shape accuracy is less than 0.5 microns). On the other hand, the continuous expansion of wafer size also brings greater challenges to ultra-precision polishing.

现有国内外对大尺寸半导体晶片的加工装置主要是高效研磨、超精密抛光、化学机械抛光、磁流变抛光和基于端面磨床的磨抛加工等。其中磁流变抛光技术是应用磁流变流变效应产生半固着的柔性抛光头从事抛光加工的方法，相对其他抛光技术能够有效减少工件加工表面的细微裂纹和残余应力，国内外针对晶片的磁流变抛光方法包括有逐点扫描加工方法，但其加工效率较低，不能适应大面积晶片加工的效率要求；专利CN103192297B一种单晶碳化硅晶片的化学集群磁流变复合加工方法基于芬顿反应腐蚀单晶SiC反应、磁流变抛光原理、集群作用机理提出化学反应和机械加工的复合抛光方法，有效提高了一定尺寸单晶SiC的加工效率，但是此加工方法适应性弱，不能广泛应用于其他晶片材料的抛光加工，另一方面其磁极集群程度较低，仍可以进行优化；专利CN 103317413 B电磁自激震动电流变复合抛光方法及装置电磁自激震动电流变复合抛光方法及装置，此加工方法引入电磁自激振动实现电场发生装置的高速纵向往复运动，从而对由电流变效应产生的柔性磨头产生纵向作用，提高加工效率，但由于仍为单点抛光方法，不能适应大尺寸晶片加工的需求。The existing domestic and foreign processing equipment for large-size semiconductor wafers are mainly high-efficiency grinding, ultra-precision polishing, chemical mechanical polishing, magnetorheological polishing and grinding and polishing processing based on end grinders. Among them, the magnetorheological polishing technology is a method of polishing processing using a semi-fixed flexible polishing head that uses the magnetorheological rheological effect. Compared with other polishing technologies, it can effectively reduce the fine cracks and residual stress on the workpiece surface. Rheological polishing methods include point-by-point scanning processing methods, but their processing efficiency is low and cannot meet the efficiency requirements of large-area wafer processing; Patent CN103192297B is a chemical cluster magnetorheological composite processing method for single crystal silicon carbide wafers based on Fenton Reactive corrosion of single crystal SiC reaction, magnetorheological polishing principle, cluster action mechanism. A composite polishing method of chemical reaction and mechanical processing is proposed, which effectively improves the processing efficiency of a certain size of single crystal SiC, but this processing method has weak adaptability and cannot be widely used. For polishing processing of other wafer materials, on the other hand, the degree of magnetic pole clustering is low, which can still be optimized; Patent CN 103317413 B Electromagnetic self-excited vibration-electrorheological composite polishing method and device Electromagnetic self-excited vibration-electrorheological composite polishing method and device, This processing method introduces electromagnetic self-excited vibration to realize the high-speed longitudinal reciprocating movement of the electric field generator, thereby producing a longitudinal effect on the flexible grinding head produced by the electrorheological effect, and improving the processing efficiency. However, it is still a single-point polishing method and cannot be adapted to large sizes. The demand for wafer processing.

因此亟需一种能解决各类难加工、超硬脆材料的加工难题，保证工件表面不产生亚表面损伤和降低残余应力的加工设备，从而进一步适应满足半导体材 料晶片等的高效率超精密加工要求，提高加工的效率。Therefore, there is an urgent need for a processing equipment that can solve the processing problems of all kinds of difficult-to-process, super-hard and brittle materials, ensure that the surface of the workpiece does not produce sub-surface damage and reduce residual stress, so as to further adapt to meet the high-efficiency ultra-precision processing of semiconductor material wafers, etc. Requirements to improve processing efficiency.

发明内容Summary of the invention

本发明为克服上述现有技术的不足，提供一种电磁耦合抛光设备。In order to overcome the above shortcomings of the prior art, the present invention provides an electromagnetic coupling polishing equipment.

为解决上述技术问题，本发明采用的技术方案是：一种电磁耦合抛光设备,所述抛光设备包括多层驱动输入结构、用于装设电磁流变抛光液的电场盘结构以及磁极盘摆动结构，所述磁极盘摆动结构用于电磁流变抛光液在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫，所述电场盘结构产生的电场与所述磁极盘摆动结构产生的磁场相耦合以提高柔性抛光垫的剪切应力和粘度；其中所述多层驱动输入结构包括基座、设于所述基座上的偏心传动部分以及主传动部分，所述磁极盘摆动结构设于所述偏心传动部分上，所述电场盘结构设于所述主传动部分上。In order to solve the above technical problems, the technical solution adopted by the present invention is: an electromagnetic coupling polishing device, the polishing device includes a multi-layer drive input structure, an electric field disk structure for installing an electromagnetic rheological polishing liquid, and a magnetic pole disk swing structure The magnetic pole disk swing structure is used for the electromagnetic rheological polishing liquid to form a flexible polishing pad with real-time abrasive renewal and self-sharpening and shape recovery under the action of a dynamic magnetic field. The electric field generated by the electric field disk structure and the magnetic pole disk swing structure generate The magnetic field is coupled to improve the shear stress and viscosity of the flexible polishing pad; wherein the multi-layer drive input structure includes a base, an eccentric transmission part provided on the base, and a main transmission part, and the magnetic pole disk swing structure It is arranged on the eccentric transmission part, and the electric field disc structure is arranged on the main transmission part.

在本技术方案中，工件被夹持放置在电场盘结构中并位于电磁流变抛光液上方，在磁极盘摆动结构的作用下，电磁流变抛光液形成实时磨料更新自锐和形状恢复的柔性抛光垫；此外，电场盘结构产生的电场与磁极盘摆动结构产生的磁场相耦合以提高柔性抛光垫的剪切应力和粘度，从而实现对工件表面的高效超光滑加工。In this technical solution, the workpiece is clamped and placed in the electric field disc structure and located above the electromagnetic rheological polishing liquid. Under the action of the magnetic pole disc swing structure, the electromagnetic rheological polishing liquid forms the flexibility of real-time abrasive renewal, self-sharpening and shape recovery Polishing pad; in addition, the electric field generated by the electric field disk structure is coupled with the magnetic field generated by the magnetic pole disk swing structure to increase the shear stress and viscosity of the flexible polishing pad, thereby achieving efficient and ultra-smooth processing of the workpiece surface.

优选地，所述基座包括底板以及设于所述底板上的凸型底板，所述凸型底板底部设置有第一空腔结构，所述凸型底板的上端面设置有贯穿所述第一空腔结构的圆孔，所述圆孔中安装有定轴，所述定轴的一端与所述底板固定连接；所述偏心传动部分安装在所述定轴上，所述主传动部分安装在所述偏心传动部分上。在本技术方案中，定轴固定安装在底板上，偏心传动部分安装在定轴上且能够绕着定轴旋转运动；主传动部分活动安装在偏心传动部分上，且能够绕着偏心传动部分做旋转运动。Preferably, the base includes a bottom plate and a convex bottom plate provided on the bottom plate, the bottom of the convex bottom plate is provided with a first cavity structure, and the upper end surface of the convex bottom plate is provided with a first cavity structure penetrating through the A circular hole with a cavity structure, a fixed shaft is installed in the circular hole, and one end of the fixed shaft is fixedly connected to the bottom plate; the eccentric transmission part is installed on the fixed shaft, and the main transmission part is installed on the fixed shaft. The eccentric transmission part. In this technical solution, the fixed shaft is fixedly installed on the bottom plate, the eccentric transmission part is installed on the fixed shaft and can rotate around the fixed shaft; the main transmission part is movably installed on the eccentric transmission part, and can be made around the eccentric transmission part. Rotational movement.

优选地，所述偏心传动部分包括通过第一套筒、第一轴承安装在所述定轴上的空心偏心转轴、固定设于所述空心偏心转轴一端的第一从动带轮以及与所述第一从动带轮通过第一同步带相连的第一主动带轮，所述第一主动带轮与设于凸型底板上的第一驱动电机的主轴相连；所述第一主动带轮、第一从动带轮以及第一同步带均设于所述第一空腔结构中，所述磁极盘摆动结构固定安装在所述空心偏心转轴远离第一从动带轮的一端。在本技术方案中，为了使得空心偏心转轴与定轴活动连接，定轴上安装第一套筒与第一轴承，且第一轴承设置 有两组，两组第一轴承设置在套筒的上下两端，第一驱动电机带动第一主动带轮转动，第一主动带轮通过第一同步带带动第一从动带轮旋转，第一从动带轮带动与其固定相连的空心偏心转轴旋转，在空心偏心转轴旋转的过程中，空心偏心转轴带动与其固定相连的磁极盘摆动结构旋转，从而使得磁极盘摆动结构用于电磁流变抛光液在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫，从而对工件进行初步的抛光处理。Preferably, the eccentric transmission part includes a hollow eccentric rotating shaft mounted on the fixed shaft through a first sleeve, a first bearing, a first driven pulley fixedly arranged at one end of the hollow eccentric rotating shaft, and a contact with the hollow eccentric rotating shaft. The first driven pulley is a first driving pulley connected by a first timing belt, and the first driving pulley is connected to the main shaft of the first driving motor provided on the convex bottom plate; the first driving pulley, The first driven pulley and the first synchronous belt are both arranged in the first cavity structure, and the magnetic pole disk swing structure is fixedly installed at an end of the hollow eccentric rotating shaft away from the first driven pulley. In this technical solution, in order to movably connect the hollow eccentric rotating shaft and the fixed shaft, a first sleeve and a first bearing are installed on the fixed shaft, and there are two sets of first bearings, and the two sets of first bearings are arranged above and below the sleeve. At both ends, the first driving motor drives the first driving pulley to rotate, the first driving pulley drives the first driven pulley to rotate through the first timing belt, and the first driven pulley drives the hollow eccentric shaft fixedly connected to it to rotate, During the rotation of the hollow eccentric shaft, the hollow eccentric shaft drives the fixedly connected magnetic pole disk swing structure to rotate, so that the magnetic pole disk swing structure is used for the electromagnetic rheological polishing fluid to form real-time abrasives to update the self-sharpening and shape under the action of the dynamic magnetic field. The restored flexible polishing pad can perform preliminary polishing treatment on the workpiece.

优选地，所述主传动部分包括通过第二套筒、第二轴承安装在所述空心偏心转轴上的空心转轴、固定设于所述空心转轴一端的第二从动带轮以及与所述第二从动带轮通过第二同步带相连的第二主动带轮，所述第二主动带轮与设于凸型底板上的第二驱动电机的主轴相连；所述第二主动带轮、第二从动带轮以及第二同步带均设于所述第一空腔结构中，所述空心转轴远离第二从动带轮的一端固定设置有具有敞口结构的旋转转接盘，所述旋转转接盘上设置有用于调节所述磁极盘摆动结构摆幅的磁极盘摆幅调节结构，所述旋转转接盘上设置有用于与所述电场盘结构相连接的紧固装置。在本技术方案中，为了使得空心转轴与空心偏心转轴活动连接，第二套筒与第二轴承分别安装在空心偏心转轴上，且第二轴承可以设置两组，两组第二轴承可分别设置在第二套筒的上下端面上。第二驱动电机带动第二主动带轮旋转，第二主动带轮通过第二同步带带动第二从动带轮旋转，第二从动带轮带动与其固定相连的空心转轴旋转，空心转轴带动固定安装其上的旋转转接盘旋转，由于旋转转接盘与电场盘通过紧固装置锁紧，旋转转接盘在转动的同时带动电场盘旋转。此外，旋转转接盘上设置的磁极盘摆幅调节结构可用于调节磁极盘摆动结构的摆幅，从而可以实现针对不同加工对象所需的磁场偏摆幅度，结构更加简单，保证了柔性抛光垫的磁性链在磁场盘偏摆时得到重新排布二次实现磨料的更新自锐和抛光垫的实施修复。Preferably, the main transmission part includes a hollow shaft mounted on the hollow eccentric shaft through a second sleeve, a second bearing, a second driven pulley fixedly arranged at one end of the hollow shaft, and a Two driven pulleys are connected by a second timing belt. The second driving pulley is connected to the main shaft of the second driving motor provided on the convex bottom plate; the second driving pulley, the first The two driven pulleys and the second timing belt are both arranged in the first cavity structure, and an end of the hollow shaft away from the second driven pulley is fixedly provided with a rotating adapter plate with an open structure. A magnetic pole disk swing adjustment structure for adjusting the swing amplitude of the magnetic pole disk swing structure is provided on the rotating adapter disk, and a fastening device for connecting with the electric field disk structure is provided on the rotating adapter disk. In this technical solution, in order to make the hollow shaft and the hollow eccentric shaft movably connected, the second sleeve and the second bearing are respectively installed on the hollow eccentric shaft, and the second bearing can be set in two groups, and the two sets of second bearings can be set separately On the upper and lower end faces of the second sleeve. The second driving motor drives the second driving pulley to rotate. The second driving pulley drives the second driven pulley to rotate through the second timing belt. The second driven pulley drives the hollow shaft fixedly connected to it to rotate, and the hollow shaft drives the fixed shaft. The rotating adapter plate mounted on it rotates. Because the rotating adapter plate and the electric field plate are locked by the fastening device, the rotating adapter plate rotates while driving the electric field plate to rotate. In addition, the swing amplitude adjustment structure of the magnetic pole disk set on the rotating adapter plate can be used to adjust the swing amplitude of the swing structure of the magnetic pole disk, so as to achieve the required magnetic field swing amplitude for different processing objects, the structure is simpler, and the flexible polishing pad is guaranteed When the magnetic field disc deflects, the magnetic chain is re-arranged twice to realize the renewal and self-sharpening of the abrasive and the implementation of the repair of the polishing pad.

优选地，磁极盘摆动结构包括螺纹连接在空心偏心转轴上的交叉滚子轴承以及与所述交叉滚子轴承固定连接的磁铁安装盘；所述磁铁安装盘上端面设置有圆槽，所述圆槽中设置有磁轭盘，所述磁轭盘上依次交替设置有第一环形磁铁组以及第二环形磁铁组,所述第一环形磁铁组与所述第二环形磁铁组之间设置有铝环组，所述磁铁安装盘的下端面与所述磁极盘摆幅调节结构相连接。在本技术方案中,第一环形磁铁组以及第二环形磁铁组的设置使得磁极盘摆动结构产生强度不一的磁场。在本技术方案中，空心偏心转轴、旋转转接盘、磁极 盘摆幅调节结构、磁极盘摆动结构构成曲柄摇杆关系，磁极盘摆动结构作为连杆在空心偏心转轴转动时保持往复平动。Preferably, the magnetic pole disk swing structure includes a cross roller bearing threadedly connected to the hollow eccentric shaft and a magnet mounting disk fixedly connected to the cross roller bearing; the upper end surface of the magnet mounting disk is provided with a circular groove, and the circle A yoke disc is arranged in the groove, and a first ring magnet group and a second ring magnet group are alternately arranged on the yoke disc, and aluminum is arranged between the first ring magnet group and the second ring magnet group. In the ring group, the lower end surface of the magnet mounting disk is connected with the swing adjustment structure of the magnetic pole disk. In this technical solution, the arrangement of the first ring magnet group and the second ring magnet group makes the magnetic pole disk swing structure generate magnetic fields with different strengths. In this technical solution, the hollow eccentric shaft, the rotating adapter disk, the magnetic pole disk swing adjustment structure, and the magnetic pole disk swing structure constitute a crank-rocker relationship, and the magnetic pole disk swing structure acts as a connecting rod to keep reciprocating translation when the hollow eccentric shaft rotates.

优选地，所述磁极盘摆幅调节结构包括设于磁铁安装盘下端面的第一阶梯孔、一端通过第四轴承安装于所述第一阶梯孔中的第一连接轴、设于旋转转接盘上端面的第二阶梯孔、一端通过轴承安装于所述第二阶梯孔中的第二连接轴以及用于调节第一连接轴与所述第二连接轴轴心距的调节装置；所述调节装置包括具有第二空腔结构的电机固定件、设于所述电机固定件上的第三驱动电机以及安装在所述第二空腔结构中的内圆偏心筒，所述第三驱动电机的输出轴伸入至所述第二空腔结构中并与所述内圆偏心筒相连接，所述第二连接轴的另一端通过第七轴承安装在内圆偏心筒的第二空腔结构中，所述第一连接轴的另一端与所述电机固定件固定连接。在本技术方案中，磁极盘摆幅调节结构中的调节装置调节第一连接轴与第二连接轴的间距，可以实现针对不同加工对象所需的磁场偏摆幅度，结构更加简单，也保证了柔性抛光点的磁性链在磁极盘摆动结构偏摆时得到重新排布二实现磨料的更新自锐和抛光垫的实施修复。Preferably, the magnetic pole plate swing adjustment structure includes a first stepped hole provided on the lower end surface of the magnet mounting plate, a first connecting shaft with one end installed in the first stepped hole through a fourth bearing, and a first connecting shaft provided on the rotation adapter. A second stepped hole on the upper end surface of the disc, a second connecting shaft with one end installed in the second stepped hole through a bearing, and an adjusting device for adjusting the axis distance between the first connecting shaft and the second connecting shaft; The adjusting device includes a motor fixing member having a second cavity structure, a third driving motor arranged on the motor fixing member, and an inner circular eccentric cylinder installed in the second cavity structure, the third driving motor The output shaft extends into the second cavity structure and is connected to the inner circular eccentric cylinder, and the other end of the second connecting shaft is installed in the second cavity structure of the inner circular eccentric cylinder through a seventh bearing Wherein, the other end of the first connecting shaft is fixedly connected with the motor fixing member. In this technical solution, the adjusting device in the magnetic pole plate swing adjusting structure adjusts the distance between the first connecting shaft and the second connecting shaft, which can realize the required magnetic field swing amplitude for different processing objects, the structure is simpler, and it also ensures The magnetic chain of the flexible polishing point is re-arranged when the swing structure of the magnetic pole plate is deflected. Second, the renewal and self-sharpening of the abrasive is realized and the polishing pad is repaired.

优选地，所述电场盘结构包括设于定轴上并位于所述磁铁安装盘上方的下绝缘盘以及设于所述下绝缘盘中的盘型电极，所述盘型电极上设置有若干环形凹槽，所述环形凹槽中设置有绝缘凹槽组，所述绝缘凹槽组中设置有环形电极组；所述下绝缘盘的上端面覆盖设置有上绝缘抛光盘；所述盘型电极外圆侧设置有盘面挡边；所述定轴为空心定轴，所述空心定轴上从上至下依次设置有第二导电滑环以及第一导电滑环，所述下绝缘盘中心并位于空心定轴侧设置有第一碳刷构件与第二碳刷构件，所述第一碳刷构件的一端与所述第一导电滑环电连接，所述第一碳刷构件的另一端与盘型电极电连接；所述第二碳刷构件的一端与所述第二导电滑环电连接，所述第二碳刷构件的另一端分别与对应的环形电极组电连接；所述第一导电滑环与所述第二导电滑环分别通过设于空心定轴中的导线连接在高压发生器上，所述紧固装置用于连接所述旋转转接盘与所述下绝缘盘。在本技术方案中，通过高压发生器为盘型电极以及环形电极组提供合适电压大小和频率的交直流电，相邻电极在下绝缘盘形成高压电场，产生的高压电场和磁极盘摆动结构产生的磁场对柔性抛光垫的耦合作用进一步提高柔性抛光垫的剪切应力和粘度，有利于对工件进行有效的抛光处理。Preferably, the electric field disc structure includes a lower insulating disc arranged on a fixed axis and above the magnet mounting disc, and a disc-shaped electrode arranged in the lower insulating disc, and a plurality of ring-shaped electrodes are arranged on the disc-shaped electrode. A groove, an insulating groove group is arranged in the annular groove, and a ring electrode group is arranged in the insulating groove group; the upper end surface of the lower insulating disc is covered with an upper insulating polishing disc; the disc-shaped electrode The outer circle side is provided with a disc surface rib; the fixed shaft is a hollow fixed shaft, and a second conductive slip ring and a first conductive slip ring are sequentially arranged on the hollow fixed shaft from top to bottom. The center of the lower insulating disk is parallel to A first carbon brush member and a second carbon brush member are provided on the side of the hollow fixed shaft. One end of the first carbon brush member is electrically connected to the first conductive slip ring, and the other end of the first carbon brush member is electrically connected to the first conductive slip ring. The disc electrode is electrically connected; one end of the second carbon brush member is electrically connected to the second conductive slip ring, and the other end of the second carbon brush member is electrically connected to the corresponding ring electrode group; the first The conductive slip ring and the second conductive slip ring are respectively connected to the high voltage generator through wires arranged in the hollow shaft, and the fastening device is used to connect the rotating adapter disk and the lower insulating disk. In this technical solution, a high-voltage generator is used to provide the disk electrode and the ring electrode group with AC and DC power of appropriate voltage and frequency. The adjacent electrodes form a high-voltage electric field on the lower insulating disk, the high-voltage electric field generated and the magnetic field generated by the swing structure of the magnetic pole disk The coupling effect on the flexible polishing pad further increases the shear stress and viscosity of the flexible polishing pad, which is beneficial to effective polishing treatment of the workpiece.

优选地，所述磁极盘摆幅调节结构为一个或多个，第二阶梯孔的半径等于 所述第一阶梯孔的半径，所述第二阶梯孔的半径大于空心偏心转轴的偏心距，所述调节装置调节第一连接轴与第二连接轴的轴心距的范围大于等于空心偏心转轴的偏心距。Preferably, there are one or more magnetic pole disc swing adjustment structures, the radius of the second stepped hole is equal to the radius of the first stepped hole, and the radius of the second stepped hole is greater than the eccentricity of the hollow eccentric shaft, so The adjusting device adjusts the range of the axial distance between the first connecting shaft and the second connecting shaft to be greater than or equal to the eccentric distance of the hollow eccentric rotating shaft.

本发明还提供一种电磁耦合抛光设备的电磁耦合控制磨粒状态的抛光方法，主要包括以下步骤：The present invention also provides a polishing method for electromagnetic coupling of an electromagnetic coupling polishing device to control the state of abrasive particles, which mainly includes the following steps:

S1：针对加工对象的特点，选择合适的第一环形磁铁组与第二环形磁铁组的半径组合、对第一环形磁铁与第二环形磁铁组进行轴向充磁且充磁方向相同或相反，将第一环形磁铁组与第二环形磁铁组安装在磁轭盘内，根据磁铁盘偏摆幅度的需求，启动第三驱动电机调整所述磁极盘摆幅调节结构中第一连接轴与第二连接轴的中心距；由于柔性抛光垫的链串随磁场线分布；充磁方向相同，盘面磁场线都是垂直向上；充磁方向相反，则磁场线在两个磁极之间成桥状；S1: According to the characteristics of the processing object, select the appropriate radius combination of the first ring magnet group and the second ring magnet group, and perform axial magnetization on the first ring magnet and the second ring magnet group with the same or opposite magnetization directions. The first ring magnet group and the second ring magnet group are installed in the yoke disk, and the third drive motor is started to adjust the first connecting shaft and the second connecting shaft in the swing adjustment structure of the magnetic pole disk according to the demand of the swing amplitude of the magnet disk. The center distance of the connecting shaft; because the chains of the flexible polishing pad are distributed with the magnetic field lines; the magnetizing direction is the same, the magnetic field lines of the disk surface are all vertical upwards; the magnetizing direction is opposite, the magnetic field lines form a bridge between the two magnetic poles;

S2：将工件安装在工具头上，工件下表面与抛光设备上绝缘抛光盘面保持端面水平，通过上下提升结构调整工件下表面和上绝缘抛光盘面间距为0.5mm-5mm；S2: Install the workpiece on the tool head, keep the end surface level between the lower surface of the workpiece and the insulating polishing disk surface of the polishing equipment, and adjust the distance between the lower surface of the workpiece and the upper insulating polishing disk to 0.5mm-5mm through the up and down lifting structure;

S3：根据加工对象配置电磁流变抛光液，其组分包括20％-50％粘度为50CS-500CS的硅油、30％-70％微米级Fe3O4粒子、1％-5％分散剂、2％-15％微米级抛光磨粒及少量稳定添加剂，将各组分混合后充分搅拌后通过超声波震动10-30分钟，形成电磁流变抛光液；S3: Configure electromagnetic rheological polishing liquid according to the processing object. Its components include 20%-50% silicone oil with a viscosity of 50CS-500CS, 30%-70% micron-sized Fe3O4 particles, 1%-5% dispersant, 2%- 15% micron-level polishing abrasive particles and a small amount of stabilized additives, after mixing the components, fully stir and vibrate through ultrasonic for 10-30 minutes to form an electromagnetic rheological polishing liquid;

S4：将电磁流变抛光液均匀倒在抛光设备的上绝缘抛光盘内，启动第一驱动电机，空心偏心转轴在第一同步带和第一从动带轮的带动下旋转，迫使以空心偏心转轴作为曲柄转动，磁极盘摆幅调节结构作为摇杆摆动，磁铁安装盘作为连杆做平面往复运动，旋转转接盘保持相对静止状态，实现磁极端面的静态磁场向动态磁场转变，电磁流变抛光液在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫；S4: Pour the electro-magnetic rheological polishing liquid evenly into the upper insulating polishing disk of the polishing equipment, start the first drive motor, and the hollow eccentric shaft is driven by the first timing belt and the first driven pulley to rotate, forcing the hollow eccentricity The shaft rotates as a crank, the swing adjustment structure of the magnetic pole plate swings as a rocker, and the magnet mounting plate acts as a connecting rod to make a plane reciprocating motion. The rotating adapter plate remains relatively static, realizing the conversion of the static magnetic field on the magnetic pole surface to the dynamic magnetic field, and electromagnetic flow The variable polishing liquid forms a flexible polishing pad with real-time abrasive renewal and self-sharpening and shape recovery under the action of a dynamic magnetic field;

S5：根据加工对象的特征，通过高压发生器为盘型电极和环形电极组提供合适电压大小和频率的交直流电，相邻电极在绝缘盘面形成1000kV/mm-5000kV/mm的高压电场，电场和磁场对柔性抛光垫的耦合作用进一步提高柔性抛光垫的剪切应力和粘度；S5: According to the characteristics of the object to be processed, a high-voltage generator is used to provide the disk electrode and ring electrode group with AC and DC of appropriate voltage and frequency. The adjacent electrodes form a high-voltage electric field of 1000kV/mm-5000kV/mm on the surface of the insulating disk. The coupling effect of the magnetic field on the flexible polishing pad further increases the shear stress and viscosity of the flexible polishing pad;

S6:启动第二驱动电机，同时带动上绝缘抛光盘和磁铁安装盘绕空心转轴高速旋转，驱动柔性抛光垫高速旋转和低速摆动，实现工件表面的高效超光滑加工。S6: Start the second drive motor, and at the same time drive the upper insulating polishing disk and the magnet mounting coil to rotate at high speed around the hollow shaft, and drive the flexible polishing pad to rotate at high speed and swing at low speed to achieve efficient and ultra-smooth processing of the surface of the workpiece.

优选地，根据加工对象特点，配置电磁流变抛光液，为盘型电极和环形电 极组接通相同高压电位并为导电材料工件夹具通入低压电位，使电磁流变抛光液在高压电场作用下形成较厚的电磁流变柔性抛光垫，或分别为盘型电极和环形电极组通电形成高压电位差，使用绝缘材料工件夹具，使电磁流变抛光液在高压电场作用下形成较扁平的电磁流变柔性抛光垫，在不加入磁场的作用下，启动第二驱动电机可实现工件表面的电流变超光滑平面加工。Preferably, according to the characteristics of the processing object, an electromagnetic rheological polishing liquid is configured to connect the disk electrode and the ring electrode group to the same high voltage potential and to apply a low voltage potential to the conductive material workpiece fixture, so that the electromagnetic rheological polishing liquid is under the action of a high-voltage electric field. Form a thicker electromagnetic rheological flexible polishing pad, or electrify the disk electrode and the ring electrode group to form a high-voltage potential difference, and use insulating material workpiece fixtures to make the electromagnetic rheological polishing liquid form a relatively flat electromagnetic current under the action of a high-voltage electric field. The flexible polishing pad can realize the ultra-smooth surface machining of the workpiece surface by starting the second driving motor without adding a magnetic field.

与现有技术相比，有益效果是：Compared with the prior art, the beneficial effects are:

本发明提出了一种电磁耦合抛光设备，通过对盘型电极、环形电极组接入不同的电压大小、频率或改变节电的方式能有效地控制电场盘结构产生的电场和磁极盘摆动结构产生的磁场的耦合方式，可以有效地提升柔性抛光垫的粘度、剪切应力甚至形装，进而从物理去除上提升柔性抛光垫对加工对象的去除率。The present invention proposes an electromagnetic coupling polishing equipment, which can effectively control the electric field generated by the electric field disk structure and the generation of the magnetic pole disk swing structure by connecting the disk electrode and the ring electrode group with different voltage sizes and frequencies or changing the power saving method. The coupling mode of the magnetic field can effectively increase the viscosity, shear stress and even the shape of the flexible polishing pad, thereby increasing the removal rate of the flexible polishing pad to the processed object from the physical removal.

本发明优化了磁极的布置结构，用永磁环组够成磁场的发生结构，使盘面布满环状磁场，而通过空心偏心转轴、旋转转接盘、磁极盘摆幅调节结构、磁极摆动结构构成曲柄摇杆关系，磁极摆动结构作为连杆在空心偏心转轴转动时保持往复平动。The invention optimizes the arrangement structure of the magnetic poles, the permanent magnet ring group is used to form a magnetic field generating structure, so that the disk surface is covered with a ring-shaped magnetic field, and the hollow eccentric rotating shaft, the rotating adapter disk, the magnetic pole disk swing adjustment structure, and the magnetic pole swing structure A crank-rocker relationship is formed, and the magnetic pole swing structure is used as a connecting rod to maintain reciprocating translation when the hollow eccentric shaft rotates.

本发明通过调整磁极盘摆幅调节结构中第一连接轴和第二连接轴的间距，可以实现针对不同加工对象所需的磁场偏摆幅度，结构更加简单，也保证了柔性抛光垫的磁性链在磁场盘偏摆时得到重新排布二实现磨料的更新自锐和抛光垫的实施修复。By adjusting the distance between the first connecting shaft and the second connecting shaft in the magnetic pole disk swing adjustment structure, the invention can realize the required magnetic field swing amplitude for different processing objects, the structure is simpler, and the magnetic chain of the flexible polishing pad is also ensured Re-arrangement is obtained when the magnetic disk is deflected, and the renewal and self-sharpening of the abrasive is realized and the polishing pad is repaired.

本发明为盘型电极、环形电极组提供高压电，导线穿过空心定轴配合第一碳刷构件以及第二碳刷构件为盘型电极、环形电极组供电，在提供电压的同时保证了设备的安全性；本发明配制的电磁流变抛光液为硅油基电介质，加工性能好，适合大直径晶片的平面高效超光滑均匀抛光加工。The present invention provides high-voltage electricity for the disk-shaped electrode and the ring electrode group. The wire passes through the hollow fixed shaft to cooperate with the first carbon brush member and the second carbon brush member to supply power to the disk-shaped electrode and the ring electrode group. The safety of the equipment; the electromagnetic rheological polishing liquid prepared by the present invention is a silicon oil-based dielectric, has good processing performance, and is suitable for high-efficiency, ultra-smooth, and uniform polishing of large-diameter wafers.

附图说明Description of the drawings

图1为本发明中电磁耦合抛光设备中沿定轴轴线与空心转轴的轴线的剖面图；Figure 1 is a cross-sectional view along the axis of the fixed shaft and the axis of the hollow shaft in the electromagnetic coupling polishing equipment of the present invention;

图2为本发明一种电磁耦合抛光设备的加工方法原理图；Figure 2 is a schematic diagram of a processing method of an electromagnetic coupling polishing equipment of the present invention;

图3为本发明一种电磁耦合抛光设备中磁极盘摆幅调节结构局部放大示意图；3 is a partial enlarged schematic diagram of the swing adjustment structure of the magnetic pole disk in an electromagnetic coupling polishing equipment of the present invention;

图4为本发明一种电磁耦合抛光设备的运动示意图；4 is a schematic diagram of the movement of an electromagnetic coupling polishing equipment of the present invention;

图5为图1中沿A-A剖视图(电场结构)；Fig. 5 is a sectional view taken along A-A in Fig. 1 (electric field structure);

图6为图1中沿B-B剖视图(磁场结构)；Fig. 6 is a sectional view taken along B-B in Fig. 1 (magnetic field structure);

图7为本发明一种电磁耦合抛光设备的一种单工位具体加工实施方式示意图；FIG. 7 is a schematic diagram of a specific processing embodiment of a single station of an electromagnetic coupling polishing device of the present invention;

图8为本发明一种电磁耦合抛光设备的一种多工位具体加工实施方式示意图；FIG. 8 is a schematic diagram of a multi-station specific processing embodiment of an electromagnetic coupling polishing device of the present invention;

其中，1定轴，2第一轴承，3第一套筒，4空心偏心转轴，5第一从动带轮，6第二轴承，7第二轴承，8第一同步带，9第一轴承压盖，10第一主动带轮，11第一驱动电机，12第一电机安装板，13凸型底座，14底板，15空心转轴，16第二从动带轮，17第三轴承，18第三套筒，19圆柱座，20第二同步带，21第二主动带轮，22第二电机安装板，23第二驱动电机，24旋转转接盘，25磁铁安装盘，26磁轭盘，27第一环形磁铁组，28第二环形磁铁组，29铝环组，30盘面挡边，31下绝缘盘，32绝缘凹槽组，33盘型电极，34环形电极组，35上绝缘抛光盘，36交叉滚子轴承，37第二轴承压盖，38第一导线，39第一轴承压盖，40第一碳刷构件，41第二碳刷构件，42封盖，43第二导线，44快夹装置，45第四轴承，46第四轴承压盖，47第一连接轴，48第三驱动电机，49电机固定件，50内圆偏心筒，51第五轴承，52第六轴承，53第五轴承压盖，54第二连接轴，55第六轴承压盖，56第七轴承，57端盖，58调平螺栓，59工件夹具，60工件，61工件转轴，62电磁流变抛光液，63机架，64转轴固定架，65提升部件，66柔性抛光垫，67电场线，68磁场线，69步进电机转动，70空心偏心轴旋转，71磁极盘摆幅调节结构摆动，72磁场盘往复运动，73抛光盘转动，74空心偏心转轴的偏心轴；75第一空腔结构、76敞口结构、77磁极盘摆幅调节结构、78第一阶梯孔、79第二阶梯孔、80第一电环环、81第二电滑环。Among them, 1 fixed shaft, 2 first bearing, 3 first sleeve, 4 hollow eccentric shaft, 5 first driven pulley, 6 second bearing, 7 second bearing, 8 first timing belt, 9 first bearing Gland, 10 first driving pulley, 11 first driving motor, 12 first motor mounting plate, 13 convex base, 14 bottom plate, 15 hollow shaft, 16 second driven pulley, 17 third bearing, 18 Three sleeves, 19 cylindrical seat, 20 second timing belt, 21 second driving pulley, 22 second motor mounting plate, 23 second drive motor, 24 rotating adapter plate, 25 magnet mounting plate, 26 yoke plate, 27 first ring magnet group, 28 second ring magnet group, 29 aluminum ring group, 30 disk face ribs, 31 lower insulating disc, 32 insulating groove group, 33 disc electrode, 34 ring electrode group, 35 upper insulating polishing disc , 36 crossed roller bearings, 37 second bearing gland, 38 first wire, 39 first bearing gland, 40 first carbon brush member, 41 second carbon brush member, 42 cover, 43 second wire, 44 Quick clamping device, 45 fourth bearing, 46 fourth bearing gland, 47 first connecting shaft, 48 third drive motor, 49 motor fixing part, 50 inner circle eccentric cylinder, 51 fifth bearing, 52 sixth bearing, 53 Fifth bearing gland, 54 second connecting shaft, 55 sixth bearing gland, 56 seventh bearing, 57 end cap, 58 leveling bolt, 59 workpiece fixture, 60 workpiece, 61 workpiece shaft, 62 electromagnetic rheological polishing liquid , 63 racks, 64 rotating shaft holders, 65 lifting parts, 66 flexible polishing pads, 67 electric field lines, 68 magnetic field lines, 69 stepper motor rotation, 70 hollow eccentric shaft rotation, 71 magnetic pole plate swing adjustment structure swing, 72 magnetic field Disc reciprocating movement, 73 polishing disc rotation, 74 hollow eccentric shaft eccentric shaft; 75 first cavity structure, 76 open structure, 77 pole disc swing adjustment structure, 78 first step hole, 79 second step hole, 80 First electric ring ring, 81 second electric slip ring.

具体实施方式detailed description

附图仅用于示例性说明，不能理解为对本专利的限制；为了更好说明本实施例，附图某些部件会有省略、放大或缩小，并不代表实际产品的尺寸；对于本领域技术人员来说，附图中某些公知结构及其说明可能省略是可以理解的。附图中描述位置关系仅用于示例性说明，不能理解为对本专利的限制。The attached drawings are only for illustrative purposes and cannot be understood as a limitation of this patent; in order to better illustrate this embodiment, some parts of the attached drawings may be omitted, enlarged or reduced, and do not represent the size of the actual product; For the personnel, it is understandable that some well-known structures in the drawings and their descriptions may be omitted. The positional relationship described in the drawings is only for illustrative purposes and cannot be understood as a limitation of the patent.

本发明实施例的附图中相同或相似的标号对应相同或相似的部件；在本发明的描述中，需要理解的是，若有术语“上”、“下”、“左”、“右”“长”“短” 等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此附图中描述位置关系的用语仅用于示例性说明，不能理解为对本专利的限制，对于本领域的普通技术人员而言，可以根据具体情况理解上述术语的具体含义。The same or similar reference numerals in the drawings of the embodiments of the present invention correspond to the same or similar components; in the description of the present invention, it should be understood that if there are the terms "upper", "lower", "left", and "right" The orientation or positional relationship indicated by "long", "short", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific The position, the structure and operation in a specific position, so the terms describing the positional relationship in the drawings are only used for exemplary description, and cannot be understood as a limitation of the patent. For those of ordinary skill in the art, it can be understood according to the specific situation. The specific meaning of the above terms.

下面通过具体实施例，并结合附图，对本发明的技术方案作进一步的具体描述：The technical scheme of the present invention will be further described in detail through specific embodiments in conjunction with the accompanying drawings:

实施例1Example 1

如图1至图6所示，一种电磁耦合抛光设备包括多层驱动输入结构、用于装设电磁流变抛光液的电场盘结构以及磁极盘摆动结构，磁极盘摆动结构用于电磁流变抛光液62在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫66，电场盘结构产生的电场与磁极盘摆动结构产生的磁场相耦合以提高柔性抛光垫66的剪切应力和粘度；其中多层驱动输入结构包括基座、设于基座上的偏心传动部分以及主传动部分，磁极盘摆动结构设于偏心传动部分上，电场盘结构设于主传动部分上。工件被夹持放置在电场盘结构中并位于电磁流变抛光液上方，在磁极盘摆动结构的作用下，电磁流变抛光液62形成实时磨料更新自锐和形状恢复的柔性抛光垫；此外，电场盘结构产生的电场与磁极盘摆动结构产生的磁场相耦合以提高柔性抛光垫的剪切应力和粘度，从而实现对工件表面的高效超光滑加工。As shown in Figures 1 to 6, an electromagnetic coupling polishing device includes a multi-layer drive input structure, an electric field disk structure for installing an electromagnetic rheological polishing liquid, and a magnetic pole disk swing structure. The magnetic pole disk swing structure is used for electromagnetic rheology. The polishing fluid 62 forms a flexible polishing pad 66 with real-time abrasive renewal and self-sharpening and shape recovery under the action of a dynamic magnetic field. The electric field generated by the electric field disk structure is coupled with the magnetic field generated by the magnetic pole disk swing structure to increase the shear stress of the flexible polishing pad 66 And viscosity; wherein the multi-layer drive input structure includes a base, an eccentric transmission part arranged on the base, and a main transmission part, the magnetic pole disc swing structure is arranged on the eccentric transmission part, and the electric field disc structure is arranged on the main transmission part. The workpiece is clamped and placed in the electric field disc structure and above the electromagnetic rheological polishing liquid. Under the action of the magnetic pole disc swing structure, the electromagnetic rheological polishing liquid 62 forms a flexible polishing pad with real-time abrasive renewal, self-sharpening and shape recovery; in addition, The electric field generated by the electric field disc structure is coupled with the magnetic field generated by the magnetic pole disc swing structure to increase the shear stress and viscosity of the flexible polishing pad, thereby realizing efficient and ultra-smooth processing of the surface of the workpiece.

其中，基座包括底板14以及设于底板14上的凸型底板13，凸型底板13底部设置有第一空腔结构75，凸型底板13的上端面设置有贯穿第一空腔结构75的圆孔，圆孔中安装有定轴1，定轴1的一端与底板14固定连接；偏心传动部分安装在定轴上，主传动部分安装在偏心传动部分上。定轴1固定安装在底板14上，偏心传动部分安装在定轴1上且能够绕着定轴1旋转运动；主传动部分活动安装在偏心传动部分上，且能够绕着偏心传动部分做旋转运动。Wherein, the base includes a bottom plate 14 and a convex bottom plate 13 arranged on the bottom plate 14. A first cavity structure 75 is provided at the bottom of the convex bottom plate 13 and a first cavity structure 75 is provided on the upper end surface of the convex bottom plate 13 A round hole, a fixed shaft 1 is installed in the round hole, one end of the fixed shaft 1 is fixedly connected with the bottom plate 14; the eccentric transmission part is installed on the fixed shaft, and the main transmission part is installed on the eccentric transmission part. The fixed shaft 1 is fixedly installed on the bottom plate 14. The eccentric transmission part is installed on the fixed shaft 1 and can rotate around the fixed shaft 1; the main transmission part is movably installed on the eccentric transmission part and can rotate around the eccentric transmission part .

另外，偏心传动部分包括通过第一套筒3、第一轴承2安装在定轴1上的空心偏心转轴4、固定设于空心偏心转轴4一端的第一从动带轮5以及与第一从动带轮5通过第一同步带8相连的第一主动带轮10，第一主动带轮10与设于凸型底板13上的第一驱动电机11的主轴相连；第一主动带轮10、第一从动带轮5以及第一同步带8均设于第一空腔结构75中，磁极盘摆动结构固定安装 在空心偏心转轴4远离第一从动带轮5的一端。为了使得空心偏心转轴4与定轴1活动连接，定轴1上安装第一套筒3与第一轴承2，且第一轴承2设置有两组，两组第一轴承2设置在第一套筒3的上下两端，第一驱动电机11带动第一主动带轮10转动，第一主动带轮10通过第一同步带8带动第一从动带轮5旋转，第一从动带轮5带动与其固定相连的空心偏心转轴4旋转，在空心偏心转轴4旋转的过程中，空心偏心转轴4带动与其固定相连的磁极盘摆动结构旋转，从而使得磁极盘摆动结构用于电磁流变抛光液在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫，从而对工件进行初步的抛光处理。需要说明的是，第一驱动电机11通过第一驱动电机安装板12安装在凸型底板13上，且第一驱动电机11安装在定轴1的左侧；此外，第一套筒3与定轴1同心安装，上方的第一轴承2通过第一轴承压盖39、螺钉与空心偏心转轴4固定相连。In addition, the eccentric transmission part includes a hollow eccentric shaft 4 mounted on the fixed shaft 1 through a first sleeve 3, a first bearing 2, a first driven pulley 5 fixedly arranged at one end of the hollow eccentric shaft 4, and a first driven pulley 5 The driving pulley 5 is a first driving pulley 10 connected by a first timing belt 8. The first driving pulley 10 is connected to the main shaft of the first driving motor 11 provided on the convex bottom plate 13; the first driving pulley 10, The first driven pulley 5 and the first synchronous belt 8 are both arranged in the first cavity structure 75, and the magnetic pole disk swing structure is fixedly installed on the end of the hollow eccentric rotating shaft 4 away from the first driven pulley 5. In order to movably connect the hollow eccentric rotating shaft 4 and the fixed shaft 1, a first sleeve 3 and a first bearing 2 are installed on the fixed shaft 1, and the first bearing 2 is provided with two sets, and the two sets of first bearings 2 are provided in the first set. At the upper and lower ends of the cylinder 3, the first driving motor 11 drives the first driving pulley 10 to rotate, the first driving pulley 10 drives the first driven pulley 5 to rotate through the first timing belt 8, and the first driven pulley 5 Drives the hollow eccentric shaft 4 fixedly connected to it to rotate. During the rotation of the hollow eccentric shaft 4, the hollow eccentric shaft 4 drives the magnetic pole disk swing structure fixedly connected to it to rotate, so that the magnetic pole disk swing structure is used for the electromagnetic rheological polishing liquid. Under the action of the dynamic magnetic field, a flexible polishing pad with real-time abrasive renewal and self-sharpening and shape recovery is formed, so as to perform preliminary polishing treatment on the workpiece. It should be noted that the first drive motor 11 is mounted on the convex bottom plate 13 through the first drive motor mounting plate 12, and the first drive motor 11 is mounted on the left side of the fixed shaft 1; in addition, the first sleeve 3 and the fixed shaft The shaft 1 is installed concentrically, and the upper first bearing 2 is fixedly connected to the hollow eccentric rotating shaft 4 through a first bearing gland 39 and a screw.

其中，主传动部分包括通过第二套筒7、第二轴承6安装在空心偏心转轴4上的空心转轴15、固定设于空心转轴15一端的第二从动带轮16以及与第二从动带轮16通过第二同步带20相连的第二主动带轮21，第二主动带轮21与设于凸型底板13上的第二驱动电机23的主轴相连；第二主动带轮21、第二从动带轮16以及第二同步带20均设于第一空腔结构75中，空心转轴15远离第二从动带轮16的一端固定设置有具有敞口结构76的旋转转接盘24，旋转转接盘24上设置有用于调节磁极盘摆动结构摆幅的磁极盘摆幅调节结构77，旋转转接盘24上设置有用于与电场盘结构相连接的紧固装置44。为了使得空心转轴15与空心偏心转轴4活动连接，第二套筒7与第二轴承6分别安装在空心偏心转轴15上，且第二轴承6可以设置两组，两组第二轴承6可分别设置在第二套筒7的上下端面上。第二驱动电机23带动第二主动带轮21旋转，第二主动带轮21通过第二同步带20带动第二从动带轮16旋转，第二从动带轮16带动与其固定相连的空心转轴15旋转，空心转轴15带动固定安装其上的旋转转接盘24旋转，由于旋转转接盘24与电场盘通过紧固装置44锁紧，旋转转接盘24在转动的同时带动电场盘结构旋转。此外，旋转转接盘24上设置的磁极盘摆幅调节结构77可用于调节磁极盘摆动结构的摆幅，从而可以实现针对不同加工对象所需的磁场偏摆幅度，结构更加简单，保证了柔性抛光垫的磁性链在磁场盘偏摆时得到重新排布二次实现磨料的更新自锐和抛光垫的实施修复。需要说明的是， 上方的第二轴承6通过第二轴承压盖37、螺钉结构与空心转轴15固定相连；第二套筒7与空心偏心转轴4同心安装，空心转轴15的外圆侧设置通过第三套筒18、两组第三轴承17安装有圆柱座19，圆柱座19通过螺钉结构与凸型底座13固定连接，上方的第三轴承17通过第三轴承压盖9、螺钉与圆柱座19固定相连；圆柱座19为偏心传动部分以及主传动部分起到固定的作用，保持了整个设备的稳定性。为了使得第二驱动电机23布局得更加合理，第二驱动电机23通过第二驱动电机安装板22设置在定轴1的右侧，由于第一驱动电机11设置在定轴1的左侧，第二驱动电机23设置在定轴1的右侧，第一驱动电机11与第二驱动电机23分别设置在定轴1的两侧，有利于保证整个设备的结构强度。Among them, the main transmission part includes a hollow shaft 15 mounted on the hollow eccentric shaft 4 through a second sleeve 7, a second bearing 6, a second driven pulley 16 fixed at one end of the hollow shaft 15 and a second driven pulley 16 The pulley 16 is connected to the second driving pulley 21 through the second timing belt 20. The second driving pulley 21 is connected to the main shaft of the second driving motor 23 provided on the convex bottom plate 13; The two driven pulleys 16 and the second timing belt 20 are both set in the first cavity structure 75, and the hollow shaft 15 is fixedly provided with a rotating adapter plate 24 having an open structure 76 at one end of the hollow shaft 15 away from the second driven pulley 16 The rotating adapter plate 24 is provided with a magnetic pole disk swing adjustment structure 77 for adjusting the swing amplitude of the magnetic pole disk swing structure, and the rotating adapter plate 24 is provided with a fastening device 44 for connecting with the electric field disk structure. In order to make the hollow shaft 15 and the hollow eccentric shaft 4 movably connected, the second sleeve 7 and the second bearing 6 are respectively installed on the hollow eccentric shaft 15, and the second bearing 6 can be provided in two groups, and the two groups of the second bearings 6 can be separately installed. They are arranged on the upper and lower end surfaces of the second sleeve 7. The second driving motor 23 drives the second driving pulley 21 to rotate, the second driving pulley 21 drives the second driven pulley 16 to rotate through the second timing belt 20, and the second driven pulley 16 drives the hollow shaft fixedly connected to it. When 15 rotates, the hollow shaft 15 drives the rotating adapter disk 24 fixedly mounted on it to rotate. Since the rotating adapter disk 24 and the electric field disk are locked by the fastening device 44, the rotating adapter disk 24 rotates while driving the electric field disk structure to rotate . In addition, the magnetic pole disk swing adjustment structure 77 provided on the rotating adapter disk 24 can be used to adjust the swing amplitude of the magnetic pole disk swing structure, so as to achieve the required magnetic field swing amplitude for different processing objects, the structure is simpler, and flexibility is ensured The magnetic chains of the polishing pad are re-arranged when the magnetic field disk is deflected to realize the renewal and self-sharpening of the abrasive and the restoration of the polishing pad. It should be noted that the upper second bearing 6 is fixedly connected to the hollow shaft 15 through the second bearing gland 37 and the screw structure; the second sleeve 7 is installed concentrically with the hollow eccentric shaft 4, and the outer circle side of the hollow shaft 15 is arranged to pass through The third sleeve 18 and the two sets of third bearings 17 are equipped with a cylindrical seat 19, the cylindrical seat 19 is fixedly connected to the convex base 13 through a screw structure, and the upper third bearing 17 is passed through the third bearing gland 9, screws and the cylindrical seat 19 is fixed and connected; the cylindrical seat 19 plays a fixed role for the eccentric transmission part and the main transmission part, maintaining the stability of the entire equipment. In order to make the layout of the second drive motor 23 more reasonable, the second drive motor 23 is arranged on the right side of the fixed shaft 1 through the second drive motor mounting plate 22. Since the first drive motor 11 is arranged on the left side of the fixed shaft 1, the first drive motor 11 is arranged on the left side of the fixed shaft 1. The second driving motor 23 is arranged on the right side of the fixed shaft 1, and the first driving motor 11 and the second driving motor 23 are respectively arranged on both sides of the fixed shaft 1, which helps to ensure the structural strength of the entire device.

另外，磁极盘摆动结构4包括螺纹连接在空心偏心转轴4上的交叉滚子轴承36以及与交叉滚子轴承36固定连接的磁铁安装盘25；磁铁安装盘25上端面设置有圆槽，圆槽中设置有磁轭盘26，磁轭盘26上依次交替设置有第一环形磁铁组27以及第二环形磁铁组28,第一环形磁铁组27与第二环形磁铁组28之间设置有铝环组29，磁铁安装盘25的下端面与磁极盘摆幅调节结构77相连接。第一环形磁铁组27以及第二环形磁铁组28的设置使得磁极盘摆动结构产生强度不一的磁场。空心偏心转轴7、旋转转接盘24、磁极盘摆幅调节结构77、磁极盘摆动结构构成曲柄摇杆关系，磁极盘摆动结构作为连杆在空心偏心转轴4转动时保持往复平动。需要说明的是，第一环形磁铁组27、第二环形磁铁组28采用钕铁硼材料，其磁场强度范围为2000GS至6000GS，两组环形磁铁与铝环组29交替排列安装在磁轭盘面上，其截面为矩形，第一环形磁铁铁27与第二磁铁组28的直径以相同公差从圆心往外圆侧递增，第一环形磁铁铁27与第二磁铁组28的充磁方向沿轴向相反或相同，磁铁安装盘25的材料为铝合金或其他非磁性材料，磁轭盘26的材料为电工纯铁DT4或其他导磁材料。需要说明的是，磁铁存在边缘磁场效应，第一环形磁铁铁27与第二磁铁组28采用隔开的方式进行分布，有效地在抛光盘面形成更多的边缘磁场，增大了盘面的磁场强度，各环组的直径按同一公差递增保证磁场有规律地均匀分布在抛光盘面，相对于整块磁场形成的磁场，其磁场更均匀，相对于点阵磁极的磁场其磁场分布面积更大。In addition, the magnetic pole disk swing structure 4 includes a cross roller bearing 36 threadedly connected to the hollow eccentric shaft 4 and a magnet mounting disk 25 fixedly connected to the cross roller bearing 36; the upper end surface of the magnet mounting disk 25 is provided with a circular groove. A yoke disc 26 is arranged in the yoke disc 26, and a first ring magnet group 27 and a second ring magnet group 28 are alternately arranged on the yoke disc 26, and an aluminum ring is arranged between the first ring magnet group 27 and the second ring magnet group 28 In group 29, the lower end surface of the magnet mounting plate 25 is connected with the swing adjustment structure 77 of the magnetic pole plate. The arrangement of the first ring magnet group 27 and the second ring magnet group 28 makes the magnetic pole disk swing structure generate magnetic fields with different strengths. The hollow eccentric shaft 7, the rotating adapter plate 24, the magnetic pole disk swing adjustment structure 77, and the magnetic pole disk swing structure constitute a crank-rocker relationship. The magnetic pole disk swing structure acts as a connecting rod to keep reciprocating translation when the hollow eccentric shaft 4 rotates. It should be noted that the first ring magnet group 27 and the second ring magnet group 28 are made of neodymium iron boron material, and the magnetic field strength ranges from 2000GS to 6000GS. The two groups of ring magnets and the aluminum ring group 29 are alternately arranged on the yoke disk surface. , Its cross-section is rectangular, the diameters of the first ring magnet iron 27 and the second magnet group 28 increase from the center of the circle to the outer circle side with the same tolerance, and the magnetizing directions of the first ring magnet iron 27 and the second magnet group 28 are opposite in the axial direction Or the same, the material of the magnet mounting plate 25 is aluminum alloy or other non-magnetic materials, and the material of the yoke plate 26 is electrical pure iron DT4 or other magnetically conductive materials. It should be noted that the magnet has a fringe magnetic field effect. The first ring magnet iron 27 and the second magnet group 28 are distributed in a separated manner, which effectively forms more fringe magnetic fields on the polishing disk surface and increases the magnetic field strength of the disk surface. , The diameter of each ring group is increased according to the same tolerance to ensure that the magnetic field is regularly and evenly distributed on the surface of the polishing disk. Compared with the magnetic field formed by the whole magnetic field, the magnetic field is more uniform, and the magnetic field distribution area is larger relative to the magnetic field of the lattice pole.

其中，磁极盘摆幅调节结构77包括设于磁铁安装盘25下端面的第一阶梯孔78、一端通过第四轴承45安装于第一阶梯孔78中的第一连接轴47、设于旋 转转接盘24上端面的第二阶梯孔79、一端通过第七轴承56安装于第二阶梯孔79中的第二连接轴54以及用于调节第一连接轴47与第二连接轴54轴心距的调节装置；调节装置包括具有第二空腔结构的电机固定件79、设于电机固定件49上的第三驱动电机48以及安装在第二空腔结构中的内圆偏心筒50，第三驱动电机48的输出轴伸入至第二空腔结构中并与内圆偏心筒50相连接，第二连接轴54的另一端通过第六轴承52安装在内圆偏心筒50的第二空腔结构中，第一连接轴47的另一端与电机固定件49固定连接。磁极盘摆幅调节结构77中的调节装置调节第一连接轴47与第二连接轴54的间距，可以实现针对不同加工对象所需的磁场偏摆幅度，结构更加简单，也保证了柔性抛光点的磁性链在磁极盘摆动结构偏摆时得到重新排布二实现磨料的更新自锐和抛光垫的实施修复。需要说明的是，第一连接轴47通过第四轴承45安装在第一阶梯孔78中，并通过第四轴承压盖46、螺钉结构与磁铁安装盘25进行固定；第二连接轴54通过第七轴承56安装在第二阶梯孔79中，并通过第七轴承压盖55、螺钉结构与旋转转接盘24进行固定；内圆偏心筒50通过第五轴承51与第二空腔结构相连接，在第二空腔结构的开口处设置有第五轴承压盖53，第五轴承压盖53通过螺钉结构与电机固定件49固定相连；第二阶梯孔79的开口处设置有第七轴承压盖55，第七轴承压盖55通过螺钉结构与旋转转接盘24固定相连。为了使得调节装置的安装拆卸，第二阶梯孔79可以设置在旋转转接盘24中的端盖57上，通过端盖57与旋转转接盘24之间的螺钉连接，便于整个磁极盘摆幅调节结构的拆卸、安装。Among them, the magnetic pole plate swing adjustment structure 77 includes a first stepped hole 78 provided on the lower end surface of the magnet mounting plate 25, a first connecting shaft 47 with one end mounted in the first stepped hole 78 through a fourth bearing 45, and a The second stepped hole 79 on the upper end surface of the receiving plate 24, the second connecting shaft 54 whose one end is installed in the second stepped hole 79 through the seventh bearing 56 and the axis distance between the first connecting shaft 47 and the second connecting shaft 54 The adjustment device; the adjustment device includes a motor fixing member 79 with a second cavity structure, a third drive motor 48 arranged on the motor fixing member 49 and an inner circular eccentric cylinder 50 installed in the second cavity structure, the third The output shaft of the driving motor 48 extends into the second cavity structure and is connected to the inner circular eccentric cylinder 50, and the other end of the second connecting shaft 54 is installed in the second cavity of the inner circular eccentric cylinder 50 through the sixth bearing 52 In the structure, the other end of the first connecting shaft 47 is fixedly connected to the motor fixing member 49. The adjustment device in the magnetic pole disc swing adjustment structure 77 adjusts the distance between the first connecting shaft 47 and the second connecting shaft 54, which can achieve the required magnetic field swing amplitude for different processing objects, the structure is simpler, and the flexible polishing point is also guaranteed The magnetic chain of the magnetic pole plate is re-arranged when the swing structure of the magnetic pole plate is deflected. Second, the renewal and self-sharpening of the abrasive material is realized and the polishing pad is implemented and repaired. It should be noted that the first connecting shaft 47 is installed in the first stepped hole 78 through the fourth bearing 45, and is fixed by the fourth bearing gland 46, the screw structure and the magnet mounting plate 25; the second connecting shaft 54 is The seven bearing 56 is installed in the second stepped hole 79 and fixed by the seventh bearing gland 55, the screw structure and the rotating adapter plate 24; the inner circular eccentric cylinder 50 is connected to the second cavity structure through the fifth bearing 51 A fifth bearing gland 53 is provided at the opening of the second cavity structure, and the fifth bearing gland 53 is fixedly connected to the motor fixing member 49 by a screw structure; the opening of the second stepped hole 79 is provided with a seventh bearing pressure The cover 55 and the seventh bearing gland 55 are fixedly connected to the rotating adapter plate 24 through a screw structure. In order to facilitate the installation and disassembly of the adjusting device, the second step hole 79 can be provided on the end cover 57 in the rotating adapter plate 24, and the end cover 57 and the rotating adapter plate 24 are connected by screws to facilitate the swing of the entire magnetic pole plate. Removal and installation of adjustment structure.

另外，电场盘结构包括设于定轴上并位于磁铁安装盘25上方的下绝缘盘31以及设于下绝缘盘31中的盘型电极33，盘型电极33上设置有若干环形凹槽，环形凹槽中设置有绝缘凹槽组32，绝缘凹槽组32中设置有环形电极组34；下绝缘盘31的上端面覆盖设置有上绝缘抛光盘35；盘型电极33外圆侧设置有盘面挡边30；定轴1为空心定轴，空心定轴上从上至下依次设置有第二导电滑环81以及第一导电滑环80，下绝缘盘31中心并位于空心定轴侧设置有第一碳刷构件40与第二碳刷构件41，第一碳刷构件40的一端与第一导电滑环80电连接，第一碳刷构件40的另一端通过第一导线38与盘型电极33电连接；第二碳刷构件41的一端与第二导电滑环81电连接，第二碳刷构件41的另一端通过第二导线43分别与对应的环形电极组34电连接；第一导电滑环80与第二导电滑 环81分别通过设于空心定轴中的导线连接在高压发生器上，紧固装置44用于连接旋转转接盘24与下绝缘盘31。通过高压发生器为盘型电极33以及环形电极34组提供合适电压大小和频率的交直流电，相邻电极在下绝缘盘31形成高压电场，产生的高压电场和磁极盘摆动结构产生的磁场对柔性抛光垫的耦合作用进一步提高柔性抛光垫的剪切应力和粘度，有利于对工件进行有效的抛光处理。需要说明的是，上绝缘抛光盘35的材料为钢化玻璃或者耐磨绝缘陶瓷，下绝缘盘31的材料为高强度绝缘陶瓷材料；环形电极组34和盘型电极33材料采用铜，其上沿半径方向均开有直线小槽，直线小槽安装关系为共线，第二导线43通过小槽与环形电极组34焊接，其末端连接第二碳刷构件41，第二碳刷构件41与第二导电滑环81电连接，第二导电滑环81通过空心定轴1的中空空间引出导线与高压发生器的一端相连；第一导线38通过小槽与盘型电极33焊接，其末端连接第一碳刷构件40，第一碳刷构件40与第一导电滑环80电连接，第一导电滑环80通过定轴1的中空空间引出导线与高压发生器的另一端电连接。高压发生器的输入电压为高压电，范围为0kv至10kv，频率从直流到20kHz。上绝缘抛光盘35中部通过螺纹连接方式安装封盖42，其连接位置设置密封胶圈；盘面挡边30与上绝缘抛光盘35的连接处做密封处理。此外，紧固装置安装在旋转转接盘与下绝缘盘的外缘侧，紧固装置44可以为如图所示的快夹装置，通过操作快夹装置的操作手柄，将旋转转接盘24与下绝缘盘31固定在一起；除了快夹装置外也可以通过分别在旋转转接盘24、下绝缘盘31的外圆侧设置通孔结构，在通孔结构中设置螺栓，利用螺栓将旋转转接盘与下绝缘盘连接在一起。In addition, the electric field disc structure includes a lower insulating disc 31 arranged on the fixed axis and above the magnet mounting disc 25, and a disc electrode 33 arranged in the lower insulating disc 31. The disc electrode 33 is provided with a number of annular grooves. An insulating groove group 32 is arranged in the groove, and a ring electrode group 34 is arranged in the insulating groove group 32; the upper end surface of the lower insulating disc 31 is covered with an upper insulating polishing disc 35; the outer circumference of the disc electrode 33 is provided with a disc surface Rib 30; fixed shaft 1 is a hollow fixed shaft, the hollow fixed shaft is provided with a second conductive slip ring 81 and a first conductive slip ring 80 from top to bottom, the center of the lower insulating disk 31 and located on the side of the hollow fixed shaft is provided with The first carbon brush member 40 and the second carbon brush member 41, one end of the first carbon brush member 40 is electrically connected to the first conductive slip ring 80, and the other end of the first carbon brush member 40 is connected to the disc electrode through the first wire 38 33 is electrically connected; one end of the second carbon brush member 41 is electrically connected to the second conductive slip ring 81, and the other end of the second carbon brush member 41 is electrically connected to the corresponding ring electrode group 34 through the second wire 43; The slip ring 80 and the second conductive slip ring 81 are respectively connected to the high voltage generator through wires arranged in the hollow shaft, and the fastening device 44 is used to connect the rotating adapter disc 24 and the lower insulating disc 31. The high-voltage generator provides the disk electrode 33 and the ring electrode 34 group with AC and DC power of suitable voltage and frequency. The adjacent electrodes form a high-voltage electric field on the lower insulating disk 31, and the high-voltage electric field and the magnetic field generated by the swing structure of the magnetic pole disk are effective for flexible polishing. The coupling effect of the pad further increases the shear stress and viscosity of the flexible polishing pad, which is beneficial to the effective polishing treatment of the workpiece. It should be noted that the material of the upper insulating polishing disc 35 is tempered glass or wear-resistant insulating ceramic, and the material of the lower insulating disc 31 is high-strength insulating ceramic material; the ring electrode group 34 and the disc electrode 33 are made of copper, and the upper edge There are straight small grooves in the radial direction, and the installation relationship of the straight small grooves is collinear. The second wire 43 is welded to the ring electrode group 34 through the small groove, and its end is connected to the second carbon brush member 41. The two conductive slip rings 81 are electrically connected. The second conductive slip ring 81 is connected to one end of the high voltage generator through a lead wire drawn out from the hollow space of the hollow shaft 1; the first lead 38 is welded to the disc electrode 33 through a small groove, and its end is connected to the first lead A carbon brush member 40, the first carbon brush member 40 is electrically connected to the first conductive slip ring 80, and the first conductive slip ring 80 is electrically connected to the other end of the high voltage generator through a lead wire drawn out of the hollow space of the fixed shaft 1. The input voltage of the high voltage generator is high voltage, the range is 0kv to 10kv, and the frequency is from DC to 20kHz. The middle part of the upper insulating polishing disc 35 is installed with a cover 42 through a screw connection, and a sealing rubber ring is arranged at the connection position; the connection between the disc surface rib 30 and the upper insulating polishing disc 35 is sealed. In addition, the fastening device is installed on the outer edge side of the rotating adapter plate and the lower insulating plate. The fastening device 44 can be a quick clamping device as shown in the figure. By operating the operating handle of the quick clamping device, the rotating adapter plate 24 It is fixed together with the lower insulating disc 31; in addition to the quick clamping device, a through hole structure can be arranged on the outer circumference of the rotating adapter disc 24 and the lower insulating disc 31 respectively, and bolts are arranged in the through hole structure, and the rotation The adapter plate and the lower insulating plate are connected together.

其中，磁极盘摆幅调节结构为一个或多个，第二阶梯孔79的半径等于第一阶梯孔78的半径，第二阶梯孔79的半径大于空心偏心转轴4的偏心距，调节装置调节第一连接轴47与第二连接轴54的轴心距的范围大于等于空心偏心转轴4的偏心距。磁极盘摆幅调节结构77的数量为1个或多个，其安装所需的旋转转接盘24的第二阶梯孔79与磁铁安装盘25上的第一阶梯孔78数量一致，阵列排布规律相同。Among them, there are one or more magnetic pole disc swing adjustment structures. The radius of the second stepped hole 79 is equal to the radius of the first stepped hole 78. The radius of the second stepped hole 79 is greater than the eccentricity of the hollow eccentric shaft 4. The adjusting device adjusts the first stepped hole. The range of the axial distance between a connecting shaft 47 and the second connecting shaft 54 is greater than or equal to the eccentric distance of the hollow eccentric rotating shaft 4. The number of the magnetic pole plate swing adjustment structure 77 is one or more, and the number of the second step holes 79 of the rotating adapter plate 24 required for its installation is the same as the number of the first step holes 78 on the magnet mounting plate 25, arranged in an array The law is the same.

实施例2Example 2

如图7所示，本发明还提供一种电磁耦合抛光设备的电磁耦合控制磨粒状态的抛光方法，主要包括以下步骤：As shown in FIG. 7, the present invention also provides a polishing method for electromagnetic coupling of an electromagnetic coupling polishing device to control the state of abrasive particles, which mainly includes the following steps:

1)针对4英寸的蓝宝石晶片的特点，选择界面宽10mm、高8mm的第一环形磁铁组27、第二环形磁铁组28组合在磁耦合抛光设备磁铁安装盘25内，磁极环充磁方向为沿轴向，同向布置，磁场强度4000GS，根据磁极盘偏摆幅度的需求，启动第三驱动电机48调整磁极盘摆幅调节结构77中第一连接轴47与第二连接轴54的中心距为10mm，空心偏心轴4偏心距为5mm；1) In view of the characteristics of the 4-inch sapphire wafer, select the first ring magnet group 27 and the second ring magnet group 28 with an interface width of 10mm and a height of 8mm to be combined in the magnet mounting plate 25 of the magnetic coupling polishing equipment. The magnetizing direction of the magnetic pole ring is Along the axial direction, the same direction is arranged, the magnetic field strength is 4000 GS, according to the demand of the yaw amplitude of the magnetic pole disk, the third drive motor 48 is started to adjust the center distance between the first connecting shaft 47 and the second connecting shaft 54 in the magnetic pole disk swing adjustment structure 77 10mm, the eccentricity of the hollow eccentric shaft 4 is 5mm;

2)将4英寸蓝宝石晶片安装在工件夹具59上，工件夹具59选用绝缘材料，工件60下表面与抛光设备上绝缘抛光盘面35保持端面水平，通过上下提升结构调整工件60下表面和上绝缘抛光盘面35间距为1mm；2) Mount the 4-inch sapphire wafer on the workpiece holder 59. The workpiece holder 59 is made of insulating material. The lower surface of the workpiece 60 and the insulating polishing disc surface 35 of the polishing equipment are kept at the end surface level. The lower surface and the upper insulating polishing of the workpiece 60 are adjusted by the up and down lifting structure. The spacing of the disk surface 35 is 1mm;

3)根据加工对象配置电磁流变抛光液62，配置电磁流变液62，其组分包括35％硅油、57％微米级Fe3O4粒子、3％甘油、3％微米级金刚石磨粒及少量稳定添加剂，将各组分混合后充分搅拌后通过超声波震动10-30分钟，形成电磁流变抛光液；3) According to the processing object, configure the electromagnetic rheological polishing fluid 62, configure the electromagnetic rheological fluid 62, its components include 35% silicone oil, 57% micron Fe3O4 particles, 3% glycerol, 3% micron diamond abrasive grains and a small amount of stabilizing additives , After mixing the components, fully stir and vibrate through ultrasonic for 10-30 minutes to form an electromagnetic rheological polishing liquid;

4)将电磁流变抛光液62均匀倒在抛光设备的上绝缘抛光盘内35，启动第一驱动电机11，空心偏心轴4在第一同步带8和第一从动带轮5的带动下旋转，迫使以空心偏心轴4作为曲柄转动，磁极盘摆幅调节结构77作为摇杆摆动，磁铁安装盘25作为连杆做平面往复运动，旋转转接盘24保持相对静止，实现第一环形磁铁组27、第二环形磁铁组28端面的静态磁场向动态磁场转变，电磁流变抛光液62在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫66，调节第一驱动电机11转速，磁铁安装盘25往复运动速度为10次/min；4) Pour the electromagnetic rheological polishing liquid 62 evenly into the upper insulating polishing disk 35 of the polishing equipment, start the first drive motor 11, and the hollow eccentric shaft 4 is driven by the first timing belt 8 and the first driven pulley 5. Rotation forces the hollow eccentric shaft 4 as a crank to rotate, the magnetic pole disc swing adjustment structure 77 acts as a rocker to swing, the magnet mounting disc 25 acts as a connecting rod for plane reciprocating motion, and the rotating adapter disc 24 remains relatively stationary to realize the first ring magnet Group 27. The static magnetic field on the end face of the second ring magnet group 28 transforms into a dynamic magnetic field. Under the action of the dynamic magnetic field, the electro-magnetic rheological polishing liquid 62 forms a flexible polishing pad 66 with real-time abrasive renewal, self-sharpening and shape recovery, and the first drive motor is adjusted. 11 speed, the reciprocating speed of the magnet mounting plate 25 is 10 times/min;

5)根据加工对象的特征，通过高压发生器为盘型电极33和环形电极组34分别连接高压直流电正负极，相邻电极在绝缘盘面形成3000kV/mm的高压电67，如图2所示，电场线68和磁场线67在抛光盘面互相垂直，对柔性抛光垫66的耦合作用进一步提高柔性抛光垫66的剪切应力和粘度，进而提高对蓝宝石晶片的加工效率；5) According to the characteristics of the object to be processed, the disc electrode 33 and the ring electrode group 34 are respectively connected to the positive and negative electrodes of the high voltage direct current through the high voltage generator. The adjacent electrodes form a high voltage 67 of 3000kV/mm on the insulating disc surface, as shown in Figure 2. As shown, the electric field lines 68 and the magnetic field lines 67 are perpendicular to each other on the polishing disk surface, and the coupling effect on the flexible polishing pad 66 further increases the shear stress and viscosity of the flexible polishing pad 66, thereby improving the processing efficiency of the sapphire wafer;

6)启动第二驱动电机23，调节上绝缘抛光盘为350rpm，上绝缘抛光盘35和磁铁安装盘25绕空心转轴15高速旋转，调节工件主轴61转速为250rpm，整体设备加工运动如图4，加工60分钟，完成单片蓝宝石晶片表面的高效超光滑加工，获得Ra0.3nm的超光滑平面。6) Start the second driving motor 23, adjust the upper insulating polishing disc to 350rpm, the upper insulating polishing disc 35 and the magnet mounting disc 25 rotate at a high speed around the hollow shaft 15, adjust the rotation speed of the workpiece spindle 61 to 250rpm, and the overall equipment processing movement is shown in Figure 4. After 60 minutes of processing, the high-efficiency and ultra-smooth processing of the surface of a single sapphire wafer is completed, and an ultra-smooth surface of Ra0.3nm is obtained.

实施例3Example 3

如图8所示，与实施例2的区别包括：其一，本发明的一种电磁耦合抛光设备内部结构中部安装磁极，其二为使用单一电场对2英寸的石英玻璃进行抛光加工；As shown in Figure 8, the differences from Embodiment 2 include: First, an electromagnetic coupling polishing device of the present invention is equipped with a magnetic pole in the middle of the internal structure, and the second is polishing a 2-inch quartz glass using a single electric field;

一种电磁耦合抛光设备的电磁耦合控制磨粒状态的抛光方法，主要包括以下步骤：A polishing method for electromagnetic coupling of an electromagnetic coupling polishing equipment to control the state of abrasive grains mainly includes the following steps:

1)将多片2英寸的石英玻璃安装在工件夹具59上，工件夹具59选用铝合金材料，工件下表面与抛光设备上绝缘抛光盘面35保持端面水平，通过上下提升结构调整工件60下表面和上绝缘抛光盘面35间距为0.5mm；1) Mount multiple pieces of 2-inch quartz glass on the workpiece fixture 59. The workpiece fixture 59 is made of aluminum alloy. The lower surface of the workpiece and the insulating polishing disc surface 35 on the polishing equipment are kept level. The lower surface and the lower surface of the workpiece 60 are adjusted by the up and down lifting structure. The distance between the upper insulating polishing disc surface 35 is 0.5mm;

2)根据加工对象配置电磁流变抛光液62，其组分包括42％硅油、50％微米级Fe3O4粒子、3％甘油、4％微米级氧化铈磨粒及少量稳定添加剂，将各组分混合后充分搅拌后通过超声波震动10-30分钟，形成电磁流变抛光液62；2) Configure electromagnetic rheological polishing liquid 62 according to the processing object. Its components include 42% silicone oil, 50% micron Fe3O4 particles, 3% glycerin, 4% micron cerium oxide abrasive grains and a small amount of stabilizing additives. Mix the components After fully stirring, it is vibrated by ultrasonic for 10-30 minutes to form an electromagnetic rheological polishing liquid 62;

4)将电流变抛光液62均匀倒在上绝缘抛光盘内35，再根据石英玻璃的加工特点，盘型电极33和环形电极组34连接高压交流发生器的其中一个电极，铝合金工件夹具59连接另一个电极，绝缘盘面和工件表面件形成5000kV/mm的高压交流电场67，交流电频率为0.8HZ，此时电场线68垂直于盘面，电流变抛光液62在高压电厂下形成柔性抛光垫66；4) Pour the electrorheological polishing liquid 62 evenly into the upper insulating polishing disk 35, and then according to the processing characteristics of quartz glass, the disk electrode 33 and the ring electrode group 34 are connected to one of the electrodes of the high voltage AC generator, and the aluminum alloy workpiece fixture 59 Connecting to another electrode, the insulating disk surface and the surface of the workpiece form a high-voltage AC electric field 67 of 5000kV/mm, and the AC frequency is 0.8HZ. At this time, the electric field line 68 is perpendicular to the disk surface, and the electrorheological polishing fluid 62 forms a flexible polishing pad 66 under the high-voltage power plant. ；

4)启动第二驱动电机23，调节上绝缘抛光盘为400rpm，上绝缘抛光盘35和磁铁安装盘25绕空心转轴15高速旋转，调节各工件主轴61转速为300rpm，加工30分钟，完成对多篇2英寸石英玻璃表面的高效超光滑加工，获得Ra0.3nm的超光滑平面。4) Start the second drive motor 23, adjust the upper insulating polishing disk to 400rpm, the upper insulating polishing disk 35 and the magnet mounting disk 25 to rotate around the hollow shaft 15 at high speed, adjust the rotation speed of each workpiece spindle 61 to 300rpm, processing for 30 minutes, complete the multi The high-efficiency ultra-smooth processing of the surface of 2 inches of quartz glass can obtain an ultra-smooth surface of Ra0.3nm.

综上所述，采用本发明提供的一种集束式动态磁场磁流变抛光装置能获得工件表面一致性好且无表面和亚表面损伤的高质量工件，适合光电子、微电子基片和光学元件的平面高效率超光滑均匀抛光加工。同时，本装置使用过程中可以实现静态磁场与动态磁场加工、电场加工、电磁耦合加工、一点及多点加工等多种加工方式，同时也适合用于研究光学材料的材料去除机理和亚表面损伤检测等试验。In summary, the use of a clustered dynamic magnetic field magnetorheological polishing device provided by the present invention can obtain high-quality workpieces with good surface consistency and no surface and sub-surface damage, which is suitable for optoelectronics, microelectronics substrates and optical components The flat surface is high-efficiency, super-smooth and uniformly polished. At the same time, the device can realize static magnetic field and dynamic magnetic field processing, electric field processing, electromagnetic coupling processing, one-point and multi-point processing and other processing methods during use. It is also suitable for studying the material removal mechanism and sub-surface damage of optical materials. Testing and other tests.

显然，本发明的上述实施例仅仅是为清楚地说明本发明所作的举例，而并非是对本发明的实施方式的限定。对于所属领域的普通技术人员来说，在上述说明的基础上还可以做出其它不同形式的变化或变动。这里无需也无法对所有的实施方式予以穷举。凡在本发明的精神和原则之内所作的任何修改、等同替 换和改进等，均应包含在本发明权利要求的保护范围之内。Obviously, the above-mentioned embodiments of the present invention are merely examples to clearly illustrate the present invention, and are not intended to limit the implementation of the present invention. For those of ordinary skill in the art, other changes or modifications in different forms can be made on the basis of the above description. It is unnecessary and impossible to list all the implementation methods here. Any modification, equivalent replacement and improvement made within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims (10)

1. 一种电磁耦合抛光设备,其特征在于:所述抛光设备包括多层驱动输入结构、用于装设电磁流变抛光液(62)的电场盘结构以及磁极盘摆动结构，所述磁极盘摆动结构用于电磁流变抛光液(62)在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫(66)，所述电场盘结构产生的电场与所述磁极盘摆动结构产生的磁场相耦合以提高柔性抛光垫(66)的剪切应力和粘度；其中所述多层驱动输入结构包括基座、设于所述基座上的偏心传动部分以及主传动部分，所述磁极盘摆动结构设于所述偏心传动部分上，所述电场盘结构设于所述主传动部分上。An electromagnetic coupling polishing device, characterized in that: the polishing device includes a multi-layer drive input structure, an electric field disk structure for installing an electromagnetic rheological polishing liquid (62), and a magnetic pole disk swing structure, the magnetic pole disk swing structure The electro-magnetic rheological polishing liquid (62) is used to form a real-time abrasive renewal and self-sharpening and shape recovery flexible polishing pad (66) under the action of a dynamic magnetic field. The electric field generated by the electric field disk structure and the magnetic pole disk swing structure generated The magnetic field is coupled to increase the shear stress and viscosity of the flexible polishing pad (66); wherein the multi-layer drive input structure includes a base, an eccentric transmission part provided on the base, and a main transmission part, the magnetic pole plate The swing structure is arranged on the eccentric transmission part, and the electric field disc structure is arranged on the main transmission part.
2. 根据权利要求1所述的一种电磁耦合抛光设备，其特征在于：所述基座包括底板(14)以及设于所述底板(14)上的凸型底板(13)，所述凸型底板(13)底部设置有第一空腔结构(75)，所述凸型底板(13)的上端面设置有贯穿所述第一空腔结构(75)的圆孔，所述圆孔中安装有定轴(1)，所述定轴(1)的一端与所述底板(14)固定连接；所述偏心传动部分安装在所述定轴(1)上，所述主传动部分安装在所述偏心传动部分上。The electromagnetic coupling polishing equipment according to claim 1, wherein the base includes a bottom plate (14) and a convex bottom plate (13) provided on the bottom plate (14), and the convex bottom plate (13) A first cavity structure (75) is provided at the bottom, a circular hole penetrating through the first cavity structure (75) is provided on the upper end surface of the convex bottom plate (13), and a circular hole is installed in the circular hole. Fixed shaft (1), one end of the fixed shaft (1) is fixedly connected to the bottom plate (14); the eccentric transmission part is installed on the fixed shaft (1), and the main transmission part is installed on the On the eccentric transmission part.
3. 根据权利要求2所述的一种电磁耦合抛光设备，其特征在于：所述偏心传动部分包括通过第一套筒(3)、第一轴承(2)安装在所述定轴(1)上的空心偏心转轴(4)、固定设于所述空心偏心转轴(4)一端的第一从动带轮(5)以及与所述第一从动带轮(5)通过第一同步带(8)相连的第一主动带轮(10)，所述第一主动带轮(10)与设于凸型底板(13)上的第一驱动电机(11)的主轴相连；所述第一主动带轮(10)、第一从动带轮(5)以及第一同步带(8)均设于所述第一空腔结构(75)中，所述磁极盘摆动结构固定安装在所述空心偏心转轴(4)远离第一从动带轮(5)的一端。The electromagnetic coupling polishing equipment according to claim 2, characterized in that: the eccentric transmission part comprises a first sleeve (3) and a first bearing (2) mounted on the fixed shaft (1) The hollow eccentric rotating shaft (4), the first driven pulley (5) fixedly arranged at one end of the hollow eccentric rotating shaft (4), and the first driven pulley (5) passing through the first timing belt (8) The connected first driving pulley (10), the first driving pulley (10) is connected to the main shaft of the first driving motor (11) provided on the convex bottom plate (13); the first driving pulley (10). The first driven pulley (5) and the first timing belt (8) are all arranged in the first cavity structure (75), and the magnetic pole disk swing structure is fixedly installed on the hollow eccentric shaft (4) One end away from the first driven pulley (5).
4. 根据权利要求3所述的一种电磁耦合抛光设备，其特征在于：所述主传动部分包括通过第二套筒(7)、第二轴承(6)安装在所述空心偏心转轴(4)上的空心转轴(15)、固定设于所述空心转轴(15)一端的第二从动带轮(16)以及与所述第二从动带轮(16)通过第二同步带(20)相连的第二主动带轮(21)，所述第二主动带轮(21)与设于凸型底板(13)上的第二驱动电机(23)的主轴相连；所述第二主动带轮(21)、第二从动带轮(16)以及第二同步带(20) 均设于所述第一空腔结构(75)中，所述空心转轴(15)远离第二从动带轮(16)的一端固定设置有具有敞口结构(76)的旋转转接盘(24)，所述旋转转接盘(24)上设置有用于调节所述磁极盘摆动结构摆幅的磁极盘摆幅调节结构(77)，所述旋转转接盘(24)上设置有用于与所述电场盘结构相连接的紧固装置(44)。The electromagnetic coupling polishing equipment according to claim 3, characterized in that: the main transmission part includes a second sleeve (7) and a second bearing (6) mounted on the hollow eccentric shaft (4) The hollow shaft (15), the second driven pulley (16) fixed at one end of the hollow shaft (15), and the second driven pulley (16) are connected by a second timing belt (20) The second driving pulley (21), the second driving pulley (21) is connected to the main shaft of the second driving motor (23) provided on the convex bottom plate (13); the second driving pulley ( 21), the second driven pulley (16) and the second timing belt (20) are all arranged in the first cavity structure (75), and the hollow shaft (15) is far away from the second driven pulley ( One end of 16) is fixedly provided with a rotating adapter plate (24) with an open structure (76), and the rotating adapter plate (24) is provided with a magnetic pole disk swing for adjusting the swing of the magnetic pole disk swing structure The adjusting structure (77), the rotating adapter plate (24) is provided with a fastening device (44) for connecting with the electric field plate structure.
5. 根据权利要求4所述的一种电磁耦合抛光设备，其特征在于：磁极盘摆动结构包括螺纹连接在空心偏心转轴(4)上的交叉滚子轴承(36)以及与所述交叉滚子轴承(36)固定连接的磁铁安装盘(25)；所述磁铁安装盘(25)上端面设置有圆槽，所述圆槽中设置有磁轭盘(26)，所述磁轭盘(26)上依次交替设置有第一环形磁铁组(27)以及第二环形磁铁组(28),所述第一环形磁铁组(27)与所述第二环形磁铁组(28)之间设置有铝环组(29)，所述磁铁安装盘(25)的下端面与所述磁极盘摆幅调节结构(77)相连接。An electromagnetic coupling polishing device according to claim 4, characterized in that: the magnetic pole disc swing structure comprises a cross roller bearing (36) threadedly connected to the hollow eccentric shaft (4) and the cross roller bearing ( 36) A fixedly connected magnet mounting plate (25); the upper end surface of the magnet mounting plate (25) is provided with a circular groove, and a yoke disk (26) is provided in the circular groove, and the yoke disk (26) is A first ring magnet group (27) and a second ring magnet group (28) are alternately arranged in sequence, and an aluminum ring group is arranged between the first ring magnet group (27) and the second ring magnet group (28) (29), the lower end surface of the magnet mounting plate (25) is connected with the magnetic pole plate swing adjustment structure (77).
6. 根据权利要求5所述的一种电磁耦合抛光设备，其特征在于：所述磁极盘摆幅调节结构(77)包括设于磁铁安装盘(25)下端面的第一阶梯孔(78)、一端通过第四轴承(45)安装于所述第一阶梯孔(78)中的第一连接轴(47)、设于旋转转接盘(24)上端面的第二阶梯孔(79)、一端通过第七轴承(56)安装于所述第二阶梯孔(79)中的第二连接轴(54)以及用于调节第一连接轴(47)与所述第二连接轴(54)轴心距的调节装置；所述调节装置包括具有第二空腔结构(82)的电机固定件(49)、设于所述电机固定件(49)上的第三驱动电机(48)以及安装在所述第二空腔结构中的内圆偏心筒(50)，所述第三驱动电机(48)的输出轴伸入至所述第二空腔结构(82)中并与所述内圆偏心筒(50)相连接，所述第二连接轴(54)的另一端通过第六轴承(52)安装在内圆偏心筒(50)的第二空腔结构(82)中，所述第一连接轴(47)的另一端与所述电机固定件(49)固定连接。The electromagnetic coupling polishing equipment according to claim 5, wherein the magnetic pole plate swing adjustment structure (77) comprises a first step hole (78) provided on the lower end surface of the magnet mounting plate (25), and one end The first connecting shaft (47) installed in the first stepped hole (78) through the fourth bearing (45), the second stepped hole (79) provided on the upper end surface of the rotating adapter plate (24), one end passes through The seventh bearing (56) is installed in the second connecting shaft (54) in the second stepped hole (79) and is used to adjust the axis distance between the first connecting shaft (47) and the second connecting shaft (54) The adjustment device; the adjustment device includes a motor fixing member (49) with a second cavity structure (82), a third drive motor (48) arranged on the motor fixing member (49) and installed on the The inner circular eccentric cylinder (50) in the second cavity structure, the output shaft of the third drive motor (48) extends into the second cavity structure (82) and is connected to the inner circular eccentric cylinder ( 50) are connected, the other end of the second connecting shaft (54) is installed in the second cavity structure (82) of the inner circular eccentric cylinder (50) through the sixth bearing (52), and the first connecting shaft The other end of (47) is fixedly connected with the motor fixing member (49).
7. 根据权利要求5所述的一种电磁耦合抛光设备，其特征在于：所述电场盘结构包括设于定轴(1)上并位于所述磁铁安装盘(25)上方的下绝缘盘(31)以及设于所述下绝缘盘(31)中的盘型电极(33)，所述盘型电极(33)上设置有若干环形凹槽，所述环形凹槽中设置有绝缘凹槽组(32)，所述绝缘凹槽组(32)中设置有环形电极组(34)；所述下绝缘盘(31)的上端面覆盖设置有上绝缘抛光盘(35)；所述盘型电极(33)外圆侧设置有盘面挡边(30)；所述定轴(1)为空心定轴，所述空心定轴上从上至下依次设置有第二导电滑环(81)以及第 一导电滑环(80)，所述下绝缘盘(31)中心并位于空心定轴侧设置有第一碳刷构件(40)与第二碳刷构件(41)，所述第一碳刷构件(40)的一端与所述第一导电滑环(80)电连接，所述第一碳刷构件(40)的另一端与盘型电极(33)电连接；所述第二碳刷构件(41)的一端与所述第二导电滑环(81)电连接，所述第二碳刷构件(41)的另一端分别与对应的环形电极组(34)电连接；所述第一导电滑环(80)与所述第二导电滑环(81)分别通过设于空心定轴中的导线连接在高压发生器上，所述紧固装置(44)用于连接所述旋转转接盘(24)与所述下绝缘盘(31)。The electromagnetic coupling polishing equipment according to claim 5, characterized in that: the electric field disc structure comprises a lower insulating disc (31) arranged on the fixed shaft (1) and located above the magnet mounting disc (25) And a disc electrode (33) arranged in the lower insulating disc (31), the disc electrode (33) is provided with a number of annular grooves, and the annular groove is provided with an insulating groove group (32) ), the insulating groove group (32) is provided with a ring electrode group (34); the upper end surface of the lower insulating disc (31) is covered with an upper insulating polishing disc (35); the disc electrode (33) ) The outer circle side is provided with a disc surface rib (30); the fixed shaft (1) is a hollow fixed shaft, and a second conductive slip ring (81) and a first conductive slip ring (81) and a first conductive slip ring are sequentially arranged on the hollow fixed shaft from top to bottom. The slip ring (80), the center of the lower insulating disk (31) and the side of the hollow fixed shaft are provided with a first carbon brush member (40) and a second carbon brush member (41), the first carbon brush member (40) ) Is electrically connected to the first conductive slip ring (80), and the other end of the first carbon brush member (40) is electrically connected to the disc electrode (33); the second carbon brush member (41) One end of the second carbon brush member (41) is electrically connected to the second conductive slip ring (81), and the other end of the second carbon brush member (41) is electrically connected to the corresponding ring electrode group (34); the first conductive slip ring ( 80) and the second conductive slip ring (81) are respectively connected to the high voltage generator through wires arranged in the hollow shaft, and the fastening device (44) is used to connect the rotating adapter plate (24) With the lower insulating disc (31).
8. 根据权利要求6所述的一种电磁耦合抛光设备，其特征在于：所述磁极盘摆幅调节结构(77)为一个或多个，第二阶梯孔(77)的半径等于所述第一阶梯孔(78)的半径，所述第二阶梯孔(77)的半径大于空心偏心转轴(4)的偏心距，所述调节装置调节第一连接轴(47)与第二连接轴(54)的轴心距的范围大于等于空心偏心转轴(5)的偏心距。The electromagnetic coupling polishing equipment according to claim 6, characterized in that there are one or more magnetic pole disc swing adjustment structures (77), and the radius of the second step hole (77) is equal to that of the first step The radius of the hole (78), the radius of the second stepped hole (77) is greater than the eccentricity of the hollow eccentric shaft (4), and the adjusting device adjusts the distance between the first connecting shaft (47) and the second connecting shaft (54). The range of the axis distance is greater than or equal to the eccentricity of the hollow eccentric rotating shaft (5).
9. 一种电磁耦合抛光设备的电磁耦合控制磨粒状态的抛光方法，其特征在于，包括以下步骤：A polishing method for electromagnetic coupling of an electromagnetic coupling polishing equipment to control the state of abrasive grains is characterized in that it comprises the following steps:

   S1：针对加工对象的特点，选择合适的第一环形磁铁组(27)与第二环形磁铁组(28)的半径组合、对第一环形磁铁(27)与第二环形磁铁组(28)进行轴向充磁且充磁方向相同或相反，将第一环形磁铁组(27)与第二环形磁铁组(28)安装在磁轭盘(26)内，根据磁铁盘(25)偏摆幅度的需求，启动第三驱动电机(48)调整所述磁极盘摆幅调节结构(77)中第一连接轴(47)与第二连接轴(54)的中心距；S1: According to the characteristics of the processing object, select the appropriate radius combination of the first ring magnet group (27) and the second ring magnet group (28), and perform the first ring magnet (27) and the second ring magnet group (28) Axial magnetization and the magnetization direction is the same or opposite, the first ring magnet group (27) and the second ring magnet group (28) are installed in the yoke disk (26), according to the magnet disk (25) deflection amplitude If required, start the third drive motor (48) to adjust the center distance between the first connecting shaft (47) and the second connecting shaft (54) in the magnetic pole disk swing adjustment structure (77);

   S2：将工件(60)安装在工具头上，工件下表面与抛光设备上绝缘抛光盘面(35)保持端面水平，通过上下提升结构调整工件(60)下表面和上绝缘抛光盘面(35)间距为0.5mm-5mm；S2: Install the workpiece (60) on the tool head, keep the end surface level between the lower surface of the workpiece and the insulating polishing disc surface (35) of the polishing equipment, and adjust the distance between the lower surface of the workpiece (60) and the upper insulating polishing disc surface (35) through the up and down lifting structure 0.5mm-5mm;

   S3：根据加工对象配置电磁流变抛光液(62)，其组分包括20％-50％粘度为50CS-500CS的硅油、30％-70％微米级Fe3O4粒子、1％-5％分散剂、2％-15％微米级抛光磨粒及少量稳定添加剂，将各组分混合后充分搅拌后通过超声波震动10-30分钟，形成电磁流变抛光液；S3: Configure the electromagnetic rheological polishing liquid (62) according to the processing object. Its components include 20%-50% silicone oil with a viscosity of 50CS-500CS, 30%-70% micron-sized Fe3O4 particles, 1%-5% dispersant, 2%-15% micron-level polishing abrasive grains and a small amount of stable additives, after mixing the components, fully stir and vibrate through ultrasonic for 10-30 minutes to form an electromagnetic rheological polishing liquid;

   S4：将电磁流变抛光液(62)均匀倒在抛光设备的上绝缘抛光盘内(35)，启动第一驱动电机(11)，空心偏心转轴(4)在第一同步带(8)和第一从动带轮(5) 的带动下旋转，迫使以空心偏心转轴(4)作为曲柄转动，磁极盘摆幅调节结构(77)作为摇杆摆动，磁铁安装盘(25)作为连杆做平面往复运动，旋转转接盘(24)保持静止，实现磁极(27、28)端面的静态磁场向动态磁场转变(68)，电磁流变抛光液(62)在动态磁场的作用下形成实时磨料更新自锐和形状恢复的柔性抛光垫(66)；S4: Pour the electro-magnetic rheological polishing liquid (62) evenly into the upper insulating polishing disc (35) of the polishing equipment, start the first drive motor (11), and the hollow eccentric rotating shaft (4) is connected to the first synchronous belt (8) and Driven by the first driven pulley (5) to rotate, forcing the hollow eccentric shaft (4) as a crank to rotate, the magnetic pole disc swing adjustment structure (77) is used as a rocker to swing, and the magnet mounting plate (25) is used as a connecting rod. The plane reciprocates, the rotating adapter plate (24) remains stationary, and the static magnetic field on the end faces of the magnetic poles (27, 28) is transformed into a dynamic magnetic field (68). The electro-magnetic rheological polishing liquid (62) forms a real-time abrasive under the action of the dynamic magnetic field. Renew the flexible polishing pad with self-sharpening and shape recovery (66);

   S5：根据加工对象的特征，通过高压发生器为盘面电极(33)和环形电极组(34)提供合适电压大小和频率的交直流电，相邻电极在绝缘盘面形成1000kV/mm-5000kV/mm的高压电场(67)，电场和磁场对柔性抛光垫(66)的耦合作用进一步提高柔性抛光垫(66)的剪切应力和粘度；S5: According to the characteristics of the object to be processed, the disk surface electrode (33) and the ring electrode group (34) are provided with AC and DC power of appropriate voltage and frequency through the high voltage generator, and adjacent electrodes form 1000kV/mm-5000kV/mm on the insulating disk surface. The coupling effect of the high-voltage electric field (67), electric field and magnetic field on the flexible polishing pad (66) further increases the shear stress and viscosity of the flexible polishing pad (66);

   S6:启动第二驱动电机(23)，同时带动上绝缘抛光盘(35)和磁铁安装盘(25)绕空心转轴(15)高速旋转，驱动柔性抛光垫(66)高速旋转和低速摆动，实现工件(60)表面的高效超光滑加工。S6: Start the second drive motor (23), and drive the upper insulating polishing disc (35) and the magnet mounting disc (25) to rotate at high speed around the hollow shaft (15), and drive the flexible polishing pad (66) to rotate at high speed and swing at low speed to achieve Efficient and ultra-smooth machining of the surface of the workpiece (60).
10. 根据权利要求9所述的一种电磁耦合抛光设备的电磁耦合控制磨粒状态的抛光方法，其特征在于，根据加工对象特点，配置电磁流变抛光液(62)，为盘型电极(33)和环形电极组(34)接通相同高压电位并为导电材料工件夹具(59)通入低压电位，使电磁流变抛光液(62)在高压电场作用下形成较厚的柔性抛光垫(66)，或分别为盘型电极(33)和环形电极组(34)通电形成高压电位差，使用绝缘材料工件夹具(59)，使电磁流变抛光液(62)在高压电场(67)作用下形成较扁平的柔性抛光垫(66)，在不加入磁场的作用下，启动第二驱动电机(23)可实现工件(60)表面的电流变超光滑平面加工。The polishing method for electromagnetic coupling control of abrasive grain state of electromagnetic coupling polishing equipment according to claim 9, characterized in that, according to the characteristics of the processing object, an electromagnetic rheological polishing liquid (62) is configured, which is a disk electrode (33) Connect the same high voltage potential with the ring electrode group (34) and pass the low voltage potential to the conductive material workpiece fixture (59), so that the electromagnetic rheological polishing liquid (62) forms a thicker flexible polishing pad (66) under the action of the high voltage electric field , Or respectively energize the disk electrode (33) and the ring electrode group (34) to form a high voltage potential difference, use the insulating material workpiece fixture (59) to make the electromagnetic rheological polishing liquid (62) form under the action of the high voltage electric field (67) For the relatively flat flexible polishing pad (66), without adding a magnetic field, the second driving motor (23) can be activated to realize the ultra-smooth flat machining of the surface of the workpiece (60).

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