WO2013023489A1 - Metal crossover single-body capacitive touch screen and manufacturing method - Google Patents

Metal crossover single-body capacitive touch screen and manufacturing method Download PDF

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Publication number
WO2013023489A1
WO2013023489A1 PCT/CN2012/077335 CN2012077335W WO2013023489A1 WO 2013023489 A1 WO2013023489 A1 WO 2013023489A1 CN 2012077335 W CN2012077335 W CN 2012077335W WO 2013023489 A1 WO2013023489 A1 WO 2013023489A1
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WO
WIPO (PCT)
Prior art keywords
thickness
metal
electrode
angstroms
transparent substrate
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PCT/CN2012/077335
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French (fr)
Chinese (zh)
Inventor
曹晓星
李晗
何伦贤
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深圳市宝明科技股份有限公司
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Publication of WO2013023489A1 publication Critical patent/WO2013023489A1/en

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Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes

Definitions

  • the present invention relates to the field of capacitive touch screen technologies, and in particular, to an integrated capacitive touch screen designed by a metal bridge and a method of manufacturing the same. Background technique
  • touch screens With the development of electronic technology, keyboards or mice for mobile phones, digital cameras, handheld game consoles, car DVDs, MP3s, instrumentation, etc. are gradually being replaced by touch screens.
  • the products of touch screens were not very hot a few years ago, and with the increasing contact with touch screen products, they have been recognized by more people in the past two years, and the speed of development has gradually accelerated.
  • the rapid growth of the touch screen has not only stimulated more intense industry competition, but also indirectly promoted the development of technology. Its multi-touch operation method has increased the influence of touch screen products to a new height, and has gradually been adopted by people. Concerned.
  • the touch screen is mainly composed of a touch detecting component and a touch screen controller.
  • the touch detecting component is installed in front of the display screen for detecting the touch position of the user, and is sent to the touch screen controller after receiving; and the main function of the touch screen controller is to receive from the touch point detecting device. Touch the information, convert it to the contact coordinates, and send it to the CPU. It can also receive commands from the CPU and execute them.
  • the touch screen can be divided into four types: resistive type, capacitive sensing type, infrared type and surface acoustic wave type.
  • resistive type capacitive sensing type
  • infrared type infrared type
  • surface acoustic wave type Currently, a resistive touch screen is widely used, which uses pressure sensing. Resistively controlled; Resistive touch screen is a multi-layer composite film, the main part of which is a resistive film screen that fits perfectly with the display surface.
  • the resistive film screen is a layer of glass or hard plastic plate as a base layer coated with a transparent oxidized metal (transparent conductive resistor) ITO (Indium Tin Oxide) conductive layer, which is covered with an outer surface hardened smooth anti-scratch
  • ITO Indium Tin Oxide
  • the plastic layer, its inner surface is also coated with an ITO coating, there are many small between them (less than 1 / 1000)
  • the transparent isolation point of the inch separates the two conductive layers from each other.
  • the controller detects this contact and calculates the position of (X, Y), and then operates according to the way of simulating the mouse.
  • the basic principle of the capacitive touch screen is to use the current sensing of the human body.
  • the capacitive touch screen is a two-layer composite glass screen, and the inner surface of the glass screen is coated with ⁇ .
  • the outermost layer is a thin layer of bauxite glass protective layer, ITO coating as the working surface, four electrodes are led out at the four corners, when the finger touches the screen, Due to the human body electric field, the user and the touch screen surface form a coupling capacitor.
  • the capacitor is a direct conductor, so the finger sucks a small current from the contact point, and this current flows out from the electrodes on the four corners of the touch screen. And the current flowing through the four electrodes is proportional to the distance from the finger to the four corners.
  • the controller calculates the position of the touch point by accurately calculating the ratio of the four currents.
  • the projected capacitive touch screen is a widely used one, which has the characteristics of simple structure and high light transmittance.
  • the touch sensing component of the projected capacitive touch screen generally has a plurality of row electrodes and column electrodes staggered to form an inductive matrix.
  • the commonly used design method includes disposing the row electrode and the column electrode on both sides of the same transparent substrate to prevent short circuit at the staggered position; or disposing the row electrode and the column electrode on the same side of the same transparent substrate to form the same conductive film ( Generally, it is an ITO conductive film), and the row electrode and the column electrode are separated by an insulating layer and a conductive bridge is disposed at a position where the row electrode and the column electrode are staggered, and the row electrode and the column electrode are separated to ensure conduction in respective directions, which is effective. Prevent it from shorting in the staggered position.
  • a commonly adopted design is: one of the row electrodes or the column electrodes is continuously disposed on the conductive film, and the other electrode is disposed on the conductive film at intervals of electrodes arranged in a plurality of electrode blocks, and the conductive bridge is disposed at the position of the staggered point.
  • the adjacent electrode blocks are electrically connected to form a continuous electrode in the other direction; the conductive bridge is separated from the continuously disposed electrodes by an insulating layer, thereby effectively preventing the row electrode and the column electrode from being short-circuited at the staggered point.
  • the plan is: (1) the laminated structure is a transparent substrate, a first direction electrode, an insulating layer, and a conductive bridge; or (2) the laminated structure is a transparent substrate, a conductive bridge, an insulating layer, and a first direction electrode.
  • the capacitive touch screen adopting the traditional design scheme may have the defects of low light transmittance and poor working stability.
  • the transmittance of the capacitive touch screen of the conventional design scheme is difficult to break through 80%, and the whole force is bent and deformed easily. Separation occurs at the interface, causing the electrode to open the touch to fail and the touch sensing component to be damaged.
  • One of the objectives of the present invention is to provide a metal bridge-integrated capacitive touch screen, which can effectively improve the reliability and stability of the capacitive touch screen by rationally designing the laminated structure of the capacitive touch screen and the metal bridge conduction mode. And touch sensitivity.
  • the present invention adopts the following technical solutions:
  • a metal bridge-integrated capacitive touch screen comprising a transparent substrate, a black resin layer laminated on the transparent substrate, an electrode, a first insulating layer, a metal electrode, and a metal bridge and a second insulating layer; wherein the ITO electrode comprises The capacitive screen drive (ITO electrode 1) and the sensing electrode (ITO electrode 2) have a regular pattern structure; the ITO electrode 1 and the ITO electrode 2 are on the same level, independent of each other, insulated from each other, and vertically designed; the transparent substrate includes a window area and In the non-window area, the black resin layer is distributed in the non-window area of the display.
  • the metallized metal film layer is a sandwich structure of MoNb, AlNd, MoNb, and the thickness is 50 angstroms to 500 angstroms: 500 angstroms to 3,000 angstroms: 50 angstroms to 500 angstroms, of which MoNb alloy
  • the mass ratio of Mo and Nb in the material is 85 ⁇ 95: 5 ⁇ 15, and the mass ratio of A1 and Nd in AlNd alloy material is 95 ⁇ 98: 2-5
  • the selection of metal materials can also be composed of silver alloy or copper alloy, and the composition is proportional. Combined.
  • the metal film coating is vacuum magnetron sputtering.
  • the transparent substrate is a chemically strengthened glass substrate having a thickness of between 0.5 and 2.0 mm; the regular structure of the ITO electrode is a diamond, a strip, a square, a snowflake, or a cross.
  • the black resin region has a trapezoidal structure with an intermediate thickness of 0.3 um to 5 um, an edge bevel angle of 6 to 60 degrees, and a gentle angle.
  • the purpose is that the ITO electrode (the driving line ITO electrode 1 and the sensing line ITO electrode 2) pass through the slope.
  • the ITO electrode is not broken due to a large difference in thickness.
  • the black resin layer can effectively block the layer of the non-visible area, and can block the visible objects under the product such as the metal wire.
  • the metal electrode and the metal bridge bridge the ITO electrode signal to the bonding region of the flexible circuit board, and the metal bridge is turned on, so that the ITO electrode is turned on in a certain direction through the metal bridge, and has a regular pattern structure.
  • the first insulating layer is such that the ITO electrode in one direction is insulated from the metal bridge electrode and does not conduct each other.
  • the second insulating layer protects the metal electrode from the metal bridge electrode from being insulated from the air.
  • a second object of the present invention is to provide a method for manufacturing a metal bridge-integrated capacitive touch screen, which adopts the following technical solutions:
  • the black resin layer is uniformly coated on the transparent substrate by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 um, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the desired black resin area the black resin area has a trapezoidal structure with an intermediate thickness of 0.3um ⁇ 5um, the edge bevel angle is between 6 ⁇ 60 degrees, and the angle is gentle.
  • the purpose is ITO electrode (drive line ITO electrode 1 and induction line)
  • the ITO electrode 2 does not break due to a large difference in thickness when passing through the slope.
  • the black resin area is a non-window area of the display screen, and the purpose is to block the metal electrode;
  • a transparent substrate forming a black resin layer which is formed on the glass substrate by ITO plating Formed into a transparent and uniform thickness of the IT0 film, the thickness of which is 50A ⁇ 2000A (face resistance is 10-430 ohms);
  • the ITO coated transparent substrate is coated with a uniform thickness of a positive photoresist material on the surface of the ITO, and the photoresist coating thickness is lum ⁇ 5um;
  • the final thickness is 50 ⁇ 2000A (face resistance is 10 ⁇ 430 ohms) and regular ITO pattern or electrode;
  • the ITO electrode comprises a capacitive screen drive (ITO electrode 1) and a sensing electrode (ITO electrode 2) having a regular pattern structure; the ITO electrode 1 and the ITO electrode 2 are on the same level, independent of each other, insulated from each other, and vertically designed;
  • the ITO electrode 1 is electrically connected by a metal bridge electrode, the metal bridge electrode is climbed through the bottom to the top of the first insulating layer, and then descends from the top to the bottom of the first insulating layer, so that the ITO electrode 1 is connected.
  • the ITO electrode 1 forms a driving path; the conduction of the ITO electrode 2 is the self-ITO communication, and the ITO electrode 2 forms an inductive path.
  • the transparent substrate after the ITO electrode is coated with a uniform thickness of the negative photoresist material on the surface of the ITO film, and the photoresist coating thickness is 0.5 um ⁇ 3 um;
  • a thickness of 0.5 ⁇ 3um and a regular insulating layer pattern (such as a rectangle, a square, a diamond, an ellipse, etc.) are formed;
  • the metal-coated transparent substrate is coated with a uniform thickness of a positive photoresist material on the metal surface, and the photoresist coating thickness is lum ⁇ 5um;
  • the final thickness is 500 ⁇ 4000A and regular metal patterns (such as rectangular, square, diamond, elliptical, etc.) or electrodes;
  • the metallized metal film layer is a sandwich of MoNb, AlNd, and MoNb. Structure, thickness from 50 angstroms to 500 angstroms: 500 angstroms to 3,000 angstroms: 50 angstroms to 500 angstroms, of which Mo and Nb mass ratios in MoNb alloy materials are 85 ⁇ 95: 5 ⁇ 15, AlNd The mass ratio of A1 and Nd in the alloy material is 95 ⁇ 98: 2 ⁇ 5. .
  • the selection of the metal material can also be composed of a silver alloy or a copper alloy, and the components are combined in a certain ratio.
  • the metal film coating is vacuum magnetron sputtering.
  • a thin layer of negative photoresist material is coated on the surface of the metal film, and the thickness of the photoresist coating is 0.5 um ⁇ 3 um;
  • the photoresist is pre-baked, exposed, developed, and finally formed into a thickness of 0.5 to 3 um and a regular insulating layer pattern.
  • the transparent substrate is a chemically strengthened glass substrate having a thickness of between 0.5 mm and 2.0 mm;
  • the ITO is composed of In203 and Sn02, and the mass ratio thereof is 85 to 95: 5 to 15.
  • the ITO coating method can be vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, or sol gel.
  • the main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and positive photosensitive agent (trade name is TR400 produced by Taiwan New Materials Co., Ltd.);
  • the main component of negative photoresist material is acetic acid Propylene glycol monomethyl ether ester, acrylic resin, epoxy resin and negative photosensitive agent (trade name: Taiwan Daxing Co., Ltd. POC A46) coated photoresist materials are roller coating, spin coating, scraping and other methods.
  • the present invention has the following advantages and beneficial effects:
  • the invention realizes the reasonable arrangement of the laminated structure, completes the touch function signal electrode and the black resin covering layer on a transparent substrate, optimizes the order and pattern of the laminated metal bridge electrode layer, and greatly improves the yield of the product. Reduce costs and increase product reliability.
  • the thickness of the substrate is between 0.5mm and 2.0mm, and has the advantages of thin thickness and light weight; and the reasonable design of each layer makes the product reliability stable and the product yield is high.
  • FIG. 1 is a schematic structural view of a metal bridge capacitive touch screen according to the present invention
  • FIG. 2 is a schematic structural view of a glass substrate according to an embodiment of the present invention
  • FIG. 3 is a schematic view showing a partial enlarged structure of a metal bridge
  • Figure 4 is a schematic view showing the structure of a metal bridge
  • Fig. 5 is a cross-sectional view showing the structure of a metal bridge-capacitor integrated touch panel according to the present invention. detailed description
  • the metal bridge capacitive touch panel includes a chemically strengthened glass substrate 11 having a thickness of between 0.5 mm and 2.0 mm, and a black resin layer 12 and an ITO electrode 13 which are sequentially laminated on the transparent substrate.
  • the ITO electrode comprises a capacitive screen driving and sensing electrode, having a regular pattern structure; the capacitive screen driving and the sensing electrode are on the same level, independent of each other , insulated from each other, vertical design.
  • the transparent substrate includes a window area and a non-window area, and the black resin layer is distributed in the non-window area of the display screen.
  • the black resin layer effectively blocks the layers in the non-visible area, and can be shielded from visible objects under the product such as wires and wires.
  • the ITO electrode 13 includes a driving line (ITO electrode 1) 42 and a sensing line ( ⁇ electrode 2) 43;
  • the metal electrode and the metal bridge 46 electrically connect the ⁇ electrode signal to the flexible circuit board area, and the metal bridge is turned on, so that the ⁇ electrode is turned on in a certain direction through the metal bridge, and has a regular pattern structure.
  • the first insulating layer 45 is configured to insulate the electrode in one direction from the metal bridge electrode and not to conduct each other.
  • the second insulating layer 44 protects the protective metal electrode and the metal bridge electrode 46 from being insulated from the air.
  • the preparation process is as follows:
  • the black resin layer is uniformly coated on the transparent substrate by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 um, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the black resin is uniformly coated on the transparent glass substrate 41 ( 11 ) by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 ⁇ m, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the purpose is ITO electrode (drive line ITO electrode 1 and induction line ITO) When the electrode 2) passes through the slope, the ITO electrode is not broken due to the large difference in thickness.
  • the black resin area is a non-window area of the display screen, and the purpose is to block the metal electrode;
  • the pre-bake temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, the exposure energy is from 100 to 100 mj, the developer is Na or Ka alkaline solution, and the development temperature is kept at a constant temperature of 20 to 40 degrees.
  • the conditions are from 200 to 300 degrees, and the time is from half an hour to three hours.
  • a black resin layer 51 having a regular thickness of 0.3 um to 5 um is formed.
  • a transparent substrate forming a black resin layer is formed by ITO coating to form a transparent and uniform thickness ITO film layer on the glass substrate, the thickness of which is 50-2000 angstroms (face resistance is 10 ⁇ 430 ohms); In203 and Sn02, the mass ratio is 85 ⁇ 95: 5 ⁇ 15.
  • ITO coating methods include vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, and sol gel.
  • the ITO coated glass substrate is coated with a uniform thickness on the ITO surface.
  • Positive photoresist material the main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and photosensitive material; the photoresist coating thickness is lum ⁇ 5um. Coating photoresist materials are by roller coating, spin coating, and scraping.
  • the product is pre-baked, exposed, developed, etched, and stripped with a photoresist to form a thickness of 50 to 2000 angstroms (face resistance of 10 to 430 ohms) and a regular ITO pattern or electrode.
  • the pre-baking temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, the exposure energy is from lOOmj to 500mj, the developer is Na-based or Ka-based alkaline solution, and the developing temperature is operated at a constant temperature of 20 to 40 degrees.
  • the ITO etching solution is a mixture of hydrochloric acid and nitric acid in a certain ratio, so that the pH of the acid falls between 1 and 3, and the etching temperature is between 40 and 50 degrees.
  • the photo-resist film solution is prepared by mixing dimethyl sulfoxide and ethanolamine in a certain ratio, the percentage is 70%: 30%, and the release temperature is between 40 and 80 degrees.
  • the ITO electrode comprises a capacitive screen drive (ITO electrode 1) and a sensing electrode (ITO electrode 2) having a regular pattern structure; the ITO electrode 1 and the ITO electrode 2 are on the same level, independent of each other, insulated from each other, and vertically designed.
  • the ITO electrode 1 is electrically connected by a metal bridge electrode, the metal bridge electrode is climbed through the bottom to the top of the first insulating layer, and then descends from the top to the bottom of the first insulating layer, so that the ITO electrode 1 is connected.
  • the ITO electrode 1 forms a driving path; the conduction of the ITO electrode 2 is the self-ITO communication, and the ITO electrode 2 forms an inductive path.
  • a transparent substrate after passing through the ITO electrode is coated with a uniform thickness of a negative photoresist material on the surface of the ITO film.
  • the main component of the negative photoresist material is propylene glycol monomethyl ether acetate, acrylic resin, epoxy resin and negative Sexy light agent, photoresist coating thickness is 0.5um ⁇ 3um; coating negative photoresist material by spin coating, scraping and other methods.
  • the product is pre-baked, exposed, and developed through a photoresist to form a pattern of a thickness of 0.5 to 3 um and a regular insulating layer.
  • Pre-bake temperature and time range: 60 degrees to 150 degrees, 50 seconds to 200 seconds, exposure energy from lOOmj to 500mj, developer The Na-based or Ka-based alkaline solution is used, and the development temperature is kept at a constant temperature of 20 to 40 degrees.
  • the condition is 200 to 300 degrees, and the time is half an hour to 3 hours.
  • the insulating layer 1 having a thickness of 0.5 um to 3 um and having a regular pattern is finally formed.
  • the transparent substrate forming the insulating layer is subjected to metal plating to form a metal film layer having a uniform thickness on the glass substrate, and has a thickness of 500 angstroms to 4,000 angstroms.
  • the metal film material is a sandwich structure composed of MoNb, AlNd, MoNb, and the thickness is in the range of 50 angstroms to 500 angstroms: 500 angstroms to 3,000 angstroms: 50 angstroms to 500 angstroms, wherein MoNb alloy materials are used.
  • the mass ratio of Mo to Nb is 85 ⁇ 95: 5-15, and the mass ratio of A1 and Nd in AlNd alloy material is 95 ⁇ 98: 2 ⁇ 5.
  • the selection of the metal material may also be composed of a silver alloy or a copper alloy, and the components are combined in a certain ratio.
  • the metal coating is vacuum magnetron sputtering.
  • the metal-coated glass substrate is coated with a uniform thickness of a positive photoresist material on the metal surface.
  • the main component of the photoresist material is propylene glycol monomethyl ether acetate, epoxy resin, and a positive photosensitive agent.
  • the photoresist coating thickness is lum ⁇ 5um.
  • Coating photoresist materials are by roller coating, spin coating, and scraping. After the above process, the product is pre-baked, exposed, developed, etched, and stripped with photoresist to form a thickness of 500 ⁇ 4000A and a regular metal pattern or electrode.
  • the pre-baking temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, and the exposure energy is from lOOmj to 500mj.
  • the developer is made of Na-based or Ka-based alkaline solution, and the temperature of the development is operated at a constant temperature of 20 to 40 degrees.
  • the metal etching solution is a mixture of phosphoric acid, acetic acid and nitric acid in a certain ratio, and the etching temperature is between 40 and 50 degrees.
  • the photo-resist film solution is prepared by mixing dimethyl sulfoxide and ethanolamine in a certain ratio, the percentage is 70%: 30%, and the film removal temperature is between 40 and 80 degrees.
  • the glass substrate after passing through the metal electrode is coated with a uniform thickness of the negative photoresist material on the surface of the metal film.
  • the main component of the negative photoresist material is propylene glycol monomethyl ether acetate, acrylic resin, epoxy resin and negative photosensitive agent; the photoresist coating thickness is 0.5um ⁇ 3um. Coating negative photoresist
  • the material method is spin coating, scraping and the like.
  • the product is pre-baked, exposed, and developed by photoresist, and finally forms a pattern of a thickness of 0.5 to 3 um and a regular insulating layer.
  • the pre-baking temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, the exposure energy is from 100 to 100 mj, the developer is Na-based or Ka-based alkaline solution, and the developing temperature is operated at a constant temperature of 20 to 40 degrees.
  • the condition is 200 to 300 degrees, and the time is 0.5 hours to 3 hours.
  • a second insulating layer having a thickness of 0.5 um to 3 um and a regular pattern is finally formed.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

Disclosed are a metal crossover single-body capacitive touch screen and a manufacturing method therefor. The metal crossover capacitive touch screen comprises a transparent substrate, and, sequentially stacked on the transparent substrate, a black resin layer, an ITO electrode, a first insulation layer, a metal electrode, a metal crossover, and a second insulation layer. The ITO electrode comprises a capacitive screen driver and a sensing electrode, and is provided with a patterned graphic structure. The capacitive screen driver and the sensing electrode are on a same layer, and are mutually independent, mutually insulated, and vertical in design. The transparent substrate comprises a window region and a non-window region. The black resin layer is distributed on the non-window region of a display screen. The present uses for the capacitive touch screen the stacked structure and a crossover conduction scheme to perform a logical design, thus allows for the capacitive touch screen effectively improved reliability, operational stability, and sensitivity to touch.

Description

金属过桥一体式电容触摸屏及制造方法 技术领域  Metal bridge integrated capacitive touch screen and manufacturing method thereof
本发明涉及电容触摸屏技术领域，尤其是涉及一种通过金属过桥 设计的一体式电容触摸屏及其制造方法。 背景技术  The present invention relates to the field of capacitive touch screen technologies, and in particular, to an integrated capacitive touch screen designed by a metal bridge and a method of manufacturing the same. Background technique
随着电子科技的发展， 目前手机、 数码相机、 掌上游戏机、 车 载 DVD、 MP3、 仪表仪器等的键盘或鼠标逐渐被触摸屏替代。 触摸 屏的产品在几年前并不是十分火热，而随着人们对于触屏产品的接触 越来越多， 近两年也被更多人所认可， 发展速度逐渐加快。触摸屏迅 速的成长， 不仅激起了更加激烈的行业竞争， 也间接推动了技术的发 展，其多点触控的操作方式更是把触摸屏产品的影响力提升到了一个 新的高度， 也逐渐被人们所关注起来。  With the development of electronic technology, keyboards or mice for mobile phones, digital cameras, handheld game consoles, car DVDs, MP3s, instrumentation, etc. are gradually being replaced by touch screens. The products of touch screens were not very hot a few years ago, and with the increasing contact with touch screen products, they have been recognized by more people in the past two years, and the speed of development has gradually accelerated. The rapid growth of the touch screen has not only stimulated more intense industry competition, but also indirectly promoted the development of technology. Its multi-touch operation method has increased the influence of touch screen products to a new height, and has gradually been adopted by people. Concerned.
触摸屏主要由触摸检测部件和触摸屏控制器组成， 触摸检测部 件安装在显示器屏幕前面， 用于检测用户触摸位置， 接收后送触摸屏 控制器；而触摸屏控制器的主要作用是从触摸点检测装置上接收触摸 信息， 并将它转换成触点坐标， 再送给 CPU, 它同时能接收 CPU发 来的命令并加以执行。  The touch screen is mainly composed of a touch detecting component and a touch screen controller. The touch detecting component is installed in front of the display screen for detecting the touch position of the user, and is sent to the touch screen controller after receiving; and the main function of the touch screen controller is to receive from the touch point detecting device. Touch the information, convert it to the contact coordinates, and send it to the CPU. It can also receive commands from the CPU and execute them.
按照触摸屏的工作原理和传输信息的介质， 触摸屏可分为四种， 分别为电阻式、 电容感应式、 红外线式以及表面声波式， 当前被广泛 使用的是电阻式触摸屏， 它是利用压力感应进行电阻控制的； 电阻式 触摸屏是一种多层的复合薄膜，它的主要部分是一块与显示器表面非 常配合的电阻薄膜屏。电阻薄膜屏是以一层玻璃或硬塑料平板作为基 层， 表面涂有一层透明氧化金属（透明的导电电阻） ITO (氧化铟锡） 导电层， 上面再盖有一层外表面硬化处理光滑防擦的塑料层， 它的内 表面也涂有一层 ITO涂层， 在它们之间有许多细小的 （小于 1/1000 英寸）的透明隔离点把两层导电层隔开绝缘， 当手指触摸屏幕时， 两 层导电层在触摸点位置就有了接触， 电阻发生变化， 在 X和 Y两个 方向上产生信号， 然后送触摸屏控制器， 控制器侦测到这一接触并计 算出 （X, Y) 的位置， 再根据模拟鼠标的方式运作。 According to the working principle of the touch screen and the medium for transmitting information, the touch screen can be divided into four types: resistive type, capacitive sensing type, infrared type and surface acoustic wave type. Currently, a resistive touch screen is widely used, which uses pressure sensing. Resistively controlled; Resistive touch screen is a multi-layer composite film, the main part of which is a resistive film screen that fits perfectly with the display surface. The resistive film screen is a layer of glass or hard plastic plate as a base layer coated with a transparent oxidized metal (transparent conductive resistor) ITO (Indium Tin Oxide) conductive layer, which is covered with an outer surface hardened smooth anti-scratch The plastic layer, its inner surface is also coated with an ITO coating, there are many small between them (less than 1 / 1000) The transparent isolation point of the inch separates the two conductive layers from each other. When the finger touches the screen, the two conductive layers have contact at the touch point, the resistance changes, and signals are generated in both X and Y directions. Sending the touch screen controller, the controller detects this contact and calculates the position of (X, Y), and then operates according to the way of simulating the mouse.
电容式触摸屏的基本原理是利用人体的电流感应进行工作的， 电容式触摸屏是一块二层复合玻璃屏，玻璃屏的内表面夹层涂有 ιτο The basic principle of the capacitive touch screen is to use the current sensing of the human body. The capacitive touch screen is a two-layer composite glass screen, and the inner surface of the glass screen is coated with ιτο.
(氧化铟锡）导电膜（镀膜导电玻璃） ， 最外层是一薄层矽土玻璃保 护层， ITO涂层作为工作面， 四个角上引出四个电极， 当手指触摸在 屏幕上时， 由于人体电场， 用户和触摸屏表面形成一个耦合电容， 对 于高频电流来说， 电容是直接导体， 于是手指从接触点吸走一个很小 的电流， 这个电流分别从触摸屏的四角上的电极中流出， 并且流经这 四个电极的电流与手指到四角的距离成正比，控制器通过对这四个电 流比例的精确计算， 得出触摸点的位置。 (Indium Tin Oxide) conductive film (coated conductive glass), the outermost layer is a thin layer of bauxite glass protective layer, ITO coating as the working surface, four electrodes are led out at the four corners, when the finger touches the screen, Due to the human body electric field, the user and the touch screen surface form a coupling capacitor. For high-frequency current, the capacitor is a direct conductor, so the finger sucks a small current from the contact point, and this current flows out from the electrodes on the four corners of the touch screen. And the current flowing through the four electrodes is proportional to the distance from the finger to the four corners. The controller calculates the position of the touch point by accurately calculating the ratio of the four currents.
在电容式触摸屏中， 投射式电容触摸屏是当前应用较为广泛的 一种， 具有结构简单， 透光率高等特点。 投射式电容触摸屏的触摸感 应部件一般为多个行电极和列电极交错形成感应矩阵。通常采用的设 计方式包括将行电极和列电极分别设置在同一透明基板的两面，防止 在交错位置出现短路；或者将行电极和列电极设置在同一透明基板的 同侧， 形成于同一导电膜（通常为 ITO导电膜）上， 在行电极和列电 极交错的位置通过设置绝缘层并架导电桥的方式隔开，将行电极和列 电极隔开并保证在各自的方向上导通，可以有效的防止其在交错位置 短路。  In the capacitive touch screen, the projected capacitive touch screen is a widely used one, which has the characteristics of simple structure and high light transmittance. The touch sensing component of the projected capacitive touch screen generally has a plurality of row electrodes and column electrodes staggered to form an inductive matrix. The commonly used design method includes disposing the row electrode and the column electrode on both sides of the same transparent substrate to prevent short circuit at the staggered position; or disposing the row electrode and the column electrode on the same side of the same transparent substrate to form the same conductive film ( Generally, it is an ITO conductive film), and the row electrode and the column electrode are separated by an insulating layer and a conductive bridge is disposed at a position where the row electrode and the column electrode are staggered, and the row electrode and the column electrode are separated to ensure conduction in respective directions, which is effective. Prevent it from shorting in the staggered position.
通常采用的设计方案为： 行电极或者列电极之一在导电膜上连 续设置，则另一个电极在导电膜上以连续设置的电极为间隔设置成若 干电极块， 在交错点的位置通过导电桥将相邻的电极块电连接， 从而 形成另一方向上的连续电极；导电桥与连续设置的电极之间由绝缘层 分隔， 从而有效的阻止行电极和列电极在交错点短路。通常采用的设 计方案为： （1 ) 层叠结构依次为透明基板、 第一方向电极、 绝缘层、 导电桥； 或者 （2) 层叠结构依次为透明基板、 导电桥、 绝缘层、 第 一方向电极。 A commonly adopted design is: one of the row electrodes or the column electrodes is continuously disposed on the conductive film, and the other electrode is disposed on the conductive film at intervals of electrodes arranged in a plurality of electrode blocks, and the conductive bridge is disposed at the position of the staggered point. The adjacent electrode blocks are electrically connected to form a continuous electrode in the other direction; the conductive bridge is separated from the continuously disposed electrodes by an insulating layer, thereby effectively preventing the row electrode and the column electrode from being short-circuited at the staggered point. Usually used The plan is: (1) the laminated structure is a transparent substrate, a first direction electrode, an insulating layer, and a conductive bridge; or (2) the laminated structure is a transparent substrate, a conductive bridge, an insulating layer, and a first direction electrode.
但采用传统的设计方案的电容式触摸屏会存在透光率不高以及 工作稳定性差的缺陷，传统的设计方案的电容式触摸屏透光率很难突 破 80%, 且整体受力弯曲变形时， 容易在界面出现分离， 导致电极断 路触摸失效， 触摸感应部件损坏。 发明内容  However, the capacitive touch screen adopting the traditional design scheme may have the defects of low light transmittance and poor working stability. The transmittance of the capacitive touch screen of the conventional design scheme is difficult to break through 80%, and the whole force is bent and deformed easily. Separation occurs at the interface, causing the electrode to open the touch to fail and the touch sensing component to be damaged. Summary of the invention
本发明的目的之一在于提供一种金属过桥一体式电容触摸屏， 通过对电容触摸屏的层叠结构以及金属架桥导通方式进行合理的设 计，有效的提高电容式触摸屏的可靠性，工作稳定性以及触摸灵敏度。  One of the objectives of the present invention is to provide a metal bridge-integrated capacitive touch screen, which can effectively improve the reliability and stability of the capacitive touch screen by rationally designing the laminated structure of the capacitive touch screen and the metal bridge conduction mode. And touch sensitivity.
为实现上述目的， 本发明采用如下技术方案：  To achieve the above object, the present invention adopts the following technical solutions:
一种金属过桥一体式电容触摸屏， 包括透明基板， 依次层叠于透 明基板的黑色树脂层、 ιτο电极、 第一绝缘层、 金属电极及金属过桥 和第二绝缘层； 所述的 ITO电极包括电容屏驱动 (ITO电极 1)和感应 电极 (ITO电极 2)， 具有规则图形结构； ITO电极 1与 ITO电极 2在 同一层面， 相互独立， 相互绝缘， 垂直设计； 所述透明基板包括视窗 区和非视窗区， 黑色树脂层分布在显示屏非视窗区。  A metal bridge-integrated capacitive touch screen comprising a transparent substrate, a black resin layer laminated on the transparent substrate, an electrode, a first insulating layer, a metal electrode, and a metal bridge and a second insulating layer; wherein the ITO electrode comprises The capacitive screen drive (ITO electrode 1) and the sensing electrode (ITO electrode 2) have a regular pattern structure; the ITO electrode 1 and the ITO electrode 2 are on the same level, independent of each other, insulated from each other, and vertically designed; the transparent substrate includes a window area and In the non-window area, the black resin layer is distributed in the non-window area of the display.
金属镀膜的金属膜层为 MoNb, AlNd, MoNb堆积而成的三明治 结构， 厚度按 50埃米 ~500埃米: 500埃米 ~3000埃米: 50埃米 ~500埃 米比例搭配，其中 MoNb合金材料中 Mo和 Nb质量比为 85~95： 5~15， AlNd合金材料中 A1和 Nd质量比为 95~98： 2-5 金属材料选型也可 由银合金或铜合金组成， 成分按一定比例组合而成。金属膜层镀膜为 真空磁控溅镀。  The metallized metal film layer is a sandwich structure of MoNb, AlNd, MoNb, and the thickness is 50 angstroms to 500 angstroms: 500 angstroms to 3,000 angstroms: 50 angstroms to 500 angstroms, of which MoNb alloy The mass ratio of Mo and Nb in the material is 85~95: 5~15, and the mass ratio of A1 and Nd in AlNd alloy material is 95~98: 2-5 The selection of metal materials can also be composed of silver alloy or copper alloy, and the composition is proportional. Combined. The metal film coating is vacuum magnetron sputtering.
优选的是： 所述的透明基板为厚度在厚度 0.5~2.0毫米之间的化学强化玻璃 基板； 所述 ITO电极规则结构为菱形， 或条形， 或方块形， 或雪花 型， 或十字型等图形。 Preferably: The transparent substrate is a chemically strengthened glass substrate having a thickness of between 0.5 and 2.0 mm; the regular structure of the ITO electrode is a diamond, a strip, a square, a snowflake, or a cross.
黑色树脂区域呈梯形结构， 中间厚度为 0.3um~5um，其边缘斜角 为 6~60度之间， 角度平缓， 目的为 ITO电极 (驱动线 ITO电极 1和 感应线 ITO电极 2)通过斜坡时不会由于厚度差异大导致 ITO电极断 裂。所述的黑色树脂层可有效遮挡非可视区的图层， 可以遮光， 金属 线等产品下方的可见物。 金属电极及金属过桥， 使 ITO电极信号导 通到柔性线路板邦定区域， 金属过桥为导通功能， 使 ITO电极某一 方向通过金属过桥导通， 具有规则图形结构。 第一绝缘层使使 ITO 某一方向电极与金属过桥电极处于绝缘状况， 互不导通。第二绝缘层 保护保护金属电极与金属过桥电极， 使之与空气绝缘。  The black resin region has a trapezoidal structure with an intermediate thickness of 0.3 um to 5 um, an edge bevel angle of 6 to 60 degrees, and a gentle angle. The purpose is that the ITO electrode (the driving line ITO electrode 1 and the sensing line ITO electrode 2) pass through the slope. The ITO electrode is not broken due to a large difference in thickness. The black resin layer can effectively block the layer of the non-visible area, and can block the visible objects under the product such as the metal wire. The metal electrode and the metal bridge bridge the ITO electrode signal to the bonding region of the flexible circuit board, and the metal bridge is turned on, so that the ITO electrode is turned on in a certain direction through the metal bridge, and has a regular pattern structure. The first insulating layer is such that the ITO electrode in one direction is insulated from the metal bridge electrode and does not conduct each other. The second insulating layer protects the metal electrode from the metal bridge electrode from being insulated from the air.
本发明的目的之二在于提供一种金属过桥一体式电容触摸屏的 制造方法， 采用如下技术方案：  A second object of the present invention is to provide a method for manufacturing a metal bridge-integrated capacitive touch screen, which adopts the following technical solutions:
黑色树脂层的形成：将黑色树脂经过旋转涂布方式或刮式涂布方 式均匀涂布在透明基板上，涂布厚度为 0.3um~5um，经过加热器预烤， 曝光， 显影， 使之形成所需的黑色树脂区域； 黑色树脂区域呈梯形结 构， 中间厚度为 0.3um~5um， 其边缘斜角为 6~60度之间， 角度平缓， 目的为 ITO电极 (驱动线 ITO电极 1和感应线 ITO电极 2)通过斜坡时 不会由于厚度差异大导致 ITO电极断裂。黑色树脂区域为显示屏非视 窗区，目的为遮挡金属电极；所述黑色树脂是感光性保护层光阻剂（商 品为台湾永光化学所生产 EK410), 是一种黑色负性光阻材料， 主要 成分为： 亚克力树脂， 环氧树脂， 负性感光剂， 乙酸丙二醇单甲基醚 酯及黑色颜料， 具体比例为树脂类： 乙酸丙二醇单甲基醚酯： 黑色颜 料及负性感光剂 =15~30： 60-80： 1~10。  The formation of the black resin layer: the black resin is uniformly coated on the transparent substrate by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 um, and is pre-baked, exposed, and developed by a heater to form a black resin. The desired black resin area; the black resin area has a trapezoidal structure with an intermediate thickness of 0.3um~5um, the edge bevel angle is between 6~60 degrees, and the angle is gentle. The purpose is ITO electrode (drive line ITO electrode 1 and induction line) The ITO electrode 2) does not break due to a large difference in thickness when passing through the slope. The black resin area is a non-window area of the display screen, and the purpose is to block the metal electrode; the black resin is a photosensitive protective layer photoresist (commercially produced by Taiwan Everlight Chemical Institute EK410), which is a black negative photoresist material, mainly Ingredients: Acrylic resin, epoxy resin, negative light agent, propylene glycol monomethyl ether acetate and black pigment, the specific proportion is resin: propylene glycol monomethyl ether acetate: black pigment and negative light agent = 15~ 30: 60-80: 1~10.
ITO电极层的形成：  Formation of ITO electrode layer:
形成黑色树脂层的透明基板，经过 ITO镀膜，使在玻璃基板上形 成一层透明及厚度均匀的 IT0膜层， 其厚度为 50A~2000A (面电阻为 10-430欧姆)； a transparent substrate forming a black resin layer, which is formed on the glass substrate by ITO plating Formed into a transparent and uniform thickness of the IT0 film, the thickness of which is 50A ~ 2000A (face resistance is 10-430 ohms);
经过 ITO镀膜的透明基板， 在其 ITO表面涂布一层厚度均匀的 正性光阻材料， 光阻涂布厚度为 lum~5um;  The ITO coated transparent substrate is coated with a uniform thickness of a positive photoresist material on the surface of the ITO, and the photoresist coating thickness is lum~5um;
经过光阻预烤， 曝光， 显影， 蚀刻， 脱光阻膜， 最终形成厚度为 50~2000A (面电阻为 10~430欧姆)及规则 ITO图案或电极；  After photoresist pre-baking, exposure, development, etching, and photoresist removal, the final thickness is 50~2000A (face resistance is 10~430 ohms) and regular ITO pattern or electrode;
所述的 ITO电极包括电容屏驱动 (ITO电极 1)和感应电极 (ITO电 极 2)， 具有规则图形结构； ITO电极 1与 ITO电极 2在同一层面， 相互独立， 相互绝缘， 垂直设计；  The ITO electrode comprises a capacitive screen drive (ITO electrode 1) and a sensing electrode (ITO electrode 2) having a regular pattern structure; the ITO electrode 1 and the ITO electrode 2 are on the same level, independent of each other, insulated from each other, and vertically designed;
ITO电极 1导通是通过金属过桥电极上下搭接，金属过桥电极通 过第一绝缘层的底部到顶部的爬升，再从第一绝缘层的顶部到底部的 下降， 连接 ITO电极 1， 使得 ITO电极 1形成驱动通路； ITO电极 2 的导通是自身 ITO相通， 使 ITO电极 2形成感应通路。  The ITO electrode 1 is electrically connected by a metal bridge electrode, the metal bridge electrode is climbed through the bottom to the top of the first insulating layer, and then descends from the top to the bottom of the first insulating layer, so that the ITO electrode 1 is connected. The ITO electrode 1 forms a driving path; the conduction of the ITO electrode 2 is the self-ITO communication, and the ITO electrode 2 forms an inductive path.
第一绝缘层的形成：  Formation of the first insulating layer:
经过 ITO电极后的透明基板， 在其 ITO膜面涂布一层厚度均匀 的负性光阻材料， 光阻涂布厚度为 0.5um~3um;  The transparent substrate after the ITO electrode is coated with a uniform thickness of the negative photoresist material on the surface of the ITO film, and the photoresist coating thickness is 0.5 um~3 um;
经过光阻预烤， 曝光， 显影， 最终形成厚度为 0.5~3um和规则的 绝缘层图案 （如长方形， 正方形， 菱形， 椭圆形等图案）；  After pre-baking, exposure, and development by photoresist, a thickness of 0.5~3um and a regular insulating layer pattern (such as a rectangle, a square, a diamond, an ellipse, etc.) are formed;
金属电极层及金属过桥的形成：  Metal electrode layer and metal bridge formation:
形成第一绝缘层的透明基板， 经过金属镀膜， 使之在透明基板上 形成一层厚度均匀的金属膜层， 其厚度为 500A~4000A;  Forming a transparent substrate of the first insulating layer, and forming a metal film layer having a uniform thickness on the transparent substrate through a metal plating film, the thickness of which is 500A~4000A;
经过金属镀膜的透明基板，在其金属表面涂布一层厚度均匀的正 性光阻材料， 光阻涂布厚度为 lum~5um;  The metal-coated transparent substrate is coated with a uniform thickness of a positive photoresist material on the metal surface, and the photoresist coating thickness is lum~5um;
经过光阻预烤， 曝光， 显影， 蚀刻， 脱光阻膜， 最终形成厚度为 500~4000A及规则金属图案（如长方形， 正方形， 菱形， 椭圆形等图 案） 或电极；  After photoresist pre-baking, exposure, development, etching, and photoresist removal, the final thickness is 500~4000A and regular metal patterns (such as rectangular, square, diamond, elliptical, etc.) or electrodes;
金属镀膜的金属膜层为 MoNb, AlNd, MoNb堆积而成的三明治 结构， 厚度按 50埃米 ~500埃米: 500埃米 ~3000埃米: 50埃米 ~500埃 米比例搭配，其中 MoNb合金材料中 Mo和 Nb质量比为 85~95： 5~15， AlNd合金材料中 A1和 Nd质量比为 95~98： 2~5。。 金属材料选型也 可由银合金或铜合金组成， 成分按一定比例组合而成。金属膜层镀膜 为真空磁控溅镀。 The metallized metal film layer is a sandwich of MoNb, AlNd, and MoNb. Structure, thickness from 50 angstroms to 500 angstroms: 500 angstroms to 3,000 angstroms: 50 angstroms to 500 angstroms, of which Mo and Nb mass ratios in MoNb alloy materials are 85~95: 5~15, AlNd The mass ratio of A1 and Nd in the alloy material is 95~98: 2~5. . The selection of the metal material can also be composed of a silver alloy or a copper alloy, and the components are combined in a certain ratio. The metal film coating is vacuum magnetron sputtering.
第二绝缘层的形成：  Formation of the second insulating layer:
经过金属电极后的透明基板，在其金属膜面涂布一层厚度均匀的 负性光阻材料， 光阻涂布厚度为 0.5um~3um;  After passing through the transparent substrate of the metal electrode, a thin layer of negative photoresist material is coated on the surface of the metal film, and the thickness of the photoresist coating is 0.5 um~3 um;
经过光阻预烤， 曝光， 显影， 最终形成厚度为 0.5~3um和规则的 绝缘层图案。  The photoresist is pre-baked, exposed, developed, and finally formed into a thickness of 0.5 to 3 um and a regular insulating layer pattern.
优选的： 所述的透明基板为厚度在 0.5mm~2.0mm之间的化学强 化玻璃基板；  Preferably, the transparent substrate is a chemically strengthened glass substrate having a thickness of between 0.5 mm and 2.0 mm;
所述的 ITO由 In203和 Sn02组成， 其质量比为 85~95： 5~15。 The ITO is composed of In203 and Sn02, and the mass ratio thereof is 85 to 95: 5 to 15.
ITO镀膜的方式可以采用真空磁控溅镀， 化学气相沉积法， 热蒸镀， 溶胶凝胶。 The ITO coating method can be vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, or sol gel.
所述的正性光阻材料主成分为乙酸丙二醇单甲基醚酯，环氧树脂 及正性感光剂 （商品名为台湾新应材公司生产的 TR400); 负性光阻 材料主成分为乙酸丙二醇单甲基醚酯， 亚克力树脂， 环氧树脂及负性 感光剂（商品名为台湾达兴公司生产 POC A46)涂布光阻材料方式有 滚涂， 旋涂， 刮涂等方式。  The main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and positive photosensitive agent (trade name is TR400 produced by Taiwan New Materials Co., Ltd.); the main component of negative photoresist material is acetic acid Propylene glycol monomethyl ether ester, acrylic resin, epoxy resin and negative photosensitive agent (trade name: Taiwan Daxing Co., Ltd. POC A46) coated photoresist materials are roller coating, spin coating, scraping and other methods.
本发明与现有技术相比， 具有如下优点和有益效果：  Compared with the prior art, the present invention has the following advantages and beneficial effects:
本发明通过对层叠结构进行合理的设置， 在一层透明基板上完 成触摸功能信号电极和黑色树脂覆盖层，优化层叠金属过桥电极层等 顺序和图案的方式， 大幅提升了产品的良率， 降低成本， 提升产品可 靠性。 本发明中基板厚度 0.5mm~2.0mm之间， 具有厚度薄， 质量轻 等优势；通过对各层的合理设计，使得产品可靠性稳定，产品良率高。 附图说明 The invention realizes the reasonable arrangement of the laminated structure, completes the touch function signal electrode and the black resin covering layer on a transparent substrate, optimizes the order and pattern of the laminated metal bridge electrode layer, and greatly improves the yield of the product. Reduce costs and increase product reliability. In the invention, the thickness of the substrate is between 0.5mm and 2.0mm, and has the advantages of thin thickness and light weight; and the reasonable design of each layer makes the product reliability stable and the product yield is high. DRAWINGS
图 1为本发明所述的金属过桥电容触摸屏的结构示意图； 图 2为本发明实施例所述的玻璃基板结构示意图；  1 is a schematic structural view of a metal bridge capacitive touch screen according to the present invention; FIG. 2 is a schematic structural view of a glass substrate according to an embodiment of the present invention;
图 3为金属过桥局部放大结构示意图；  3 is a schematic view showing a partial enlarged structure of a metal bridge;
图 4为金属过桥剖面结构示意图；  Figure 4 is a schematic view showing the structure of a metal bridge;
图 5 为本发明所述的金属过桥电容一体式触摸屏的剖面结构示 意图。 具体实施方式  Fig. 5 is a cross-sectional view showing the structure of a metal bridge-capacitor integrated touch panel according to the present invention. detailed description
下面结合具体实施例对本发明作进一步详细说明。  The present invention will be further described in detail below in conjunction with specific embodiments.
如图 1及图 2所示， 所述的金属过桥电容触摸屏， 包括厚度在 0.5mm~2.0mm之间的化学强化玻璃基板 11， 依次层叠于透明基板的 黑色树脂层 12、 ITO电极 13、 第一绝缘层 14、 金属电极及金属过桥 15和第二绝缘层 16; 所述的 ITO电极包括电容屏驱动和感应电极， 具有规则图形结构； 电容屏驱动与感应电极在同一层面， 相互独立， 相互绝缘， 垂直设计。透明基板包括视窗区和非视窗区， 黑色树脂层 分布在显示屏非视窗区。  As shown in FIG. 1 and FIG. 2, the metal bridge capacitive touch panel includes a chemically strengthened glass substrate 11 having a thickness of between 0.5 mm and 2.0 mm, and a black resin layer 12 and an ITO electrode 13 which are sequentially laminated on the transparent substrate. a first insulating layer 14, a metal electrode and a metal bridge 15 and a second insulating layer 16; the ITO electrode comprises a capacitive screen driving and sensing electrode, having a regular pattern structure; the capacitive screen driving and the sensing electrode are on the same level, independent of each other , insulated from each other, vertical design. The transparent substrate includes a window area and a non-window area, and the black resin layer is distributed in the non-window area of the display screen.
黑色树脂层可有效遮挡非可视区的图层， 可以遮光， 金属线等产 品下方的可见物。  The black resin layer effectively blocks the layers in the non-visible area, and can be shielded from visible objects under the product such as wires and wires.
图 3至图 5所示为本实施例所述 ITO过桥电容触摸屏的局部结构 放大示意图或者剖面结构示意图： ITO电极 13包括驱动线 （ITO电 极 1 ) 42和感应线（ΙΤΟ电极 2)43; 金属电极及金属过桥 46， 使 ΙΤΟ 电极信号导通到柔性线路板区域， 金属过桥为导通功能， 使 ΙΤΟ电 极某一方向通过金属过桥导通， 具有规则图形结构。 第一绝缘层 45 使使 ΙΤΟ某一方向电极与金属过桥电极处于绝缘状况， 互不导通。 第二绝缘层 44保护保护金属电极及金属过桥电极 46， 使之与空气绝 缘。 其制备工艺如下： 3 to FIG. 5 is a schematic partial or enlarged cross-sectional view showing the structure of the ITO bridge capacitance touch screen of the present embodiment: the ITO electrode 13 includes a driving line (ITO electrode 1) 42 and a sensing line (ΙΤΟ electrode 2) 43; The metal electrode and the metal bridge 46 electrically connect the 电极 electrode signal to the flexible circuit board area, and the metal bridge is turned on, so that the ΙΤΟ electrode is turned on in a certain direction through the metal bridge, and has a regular pattern structure. The first insulating layer 45 is configured to insulate the electrode in one direction from the metal bridge electrode and not to conduct each other. The second insulating layer 44 protects the protective metal electrode and the metal bridge electrode 46 from being insulated from the air. The preparation process is as follows:
黑色树脂层的形成：将黑色树脂经过旋转涂布方式或刮式涂布方 式均匀涂布在透明基板上，涂布厚度为 0.3um~5um，经过加热器预烤， 曝光， 显影， 使之形成所需的黑色树脂区域；  The formation of the black resin layer: the black resin is uniformly coated on the transparent substrate by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 um, and is pre-baked, exposed, and developed by a heater to form a black resin. The desired black resin area;
将黑色树脂经过旋转涂布方式或刮式涂布方式均匀涂布在透明 玻璃基板 41 ( 11 ) 上， 涂布厚度为 0.3um~5um， 经过加热器预烤， 曝光， 显影， 使之形成所需的黑色树脂区域； 黑色树脂区域呈梯形结 构， 中间厚度为 0.3um~5um， 其边缘斜角为 6~60度之间， 角度平缓， 目的为 ITO电极 (驱动线 ITO电极 1和感应线 ITO电极 2)通过斜坡时 不会由于厚度差异大导致 ITO电极断裂。黑色树脂区域为显示屏非视 窗区，目的为遮挡金属电极；所述黑色树脂是感光性保护层光阻剂（商 品为台湾永光化学所生产 EK410), 是一种黑色负性光阻材料， 主要 成分为:亚克力树脂， 环氧树脂， 负性感光剂， 乙酸丙二醇单甲基醚 酯及黑色颜料， 具体比例为树脂类： 乙酸丙二醇单甲基醚酯： 黑色颜 料及负性感光剂 =15~30： 60-80： 1~10。  The black resin is uniformly coated on the transparent glass substrate 41 ( 11 ) by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 μm, and is pre-baked, exposed, and developed by a heater to form a black resin. Black resin area required; black resin area has a trapezoidal structure, the intermediate thickness is 0.3um~5um, the edge bevel angle is between 6~60 degrees, and the angle is gentle. The purpose is ITO electrode (drive line ITO electrode 1 and induction line ITO) When the electrode 2) passes through the slope, the ITO electrode is not broken due to the large difference in thickness. The black resin area is a non-window area of the display screen, and the purpose is to block the metal electrode; the black resin is a photosensitive protective layer photoresist (commercially produced by Taiwan Everlight Chemical Institute EK410), which is a black negative photoresist material, mainly Ingredients: Acrylic resin, epoxy resin, negative light agent, propylene glycol monomethyl ether acetate and black pigment, the specific proportion is resin: propylene glycol monomethyl ether acetate: black pigment and negative light agent = 15~ 30: 60-80: 1~10.
预烤温度及时间范围为: 60度~150度， 50秒到 200秒， 曝光能量 采用 lOOmj到 500mj， 显影液采用 Na系或 Ka系碱性溶液， 显影之 温度采用 20~40 度恒温作业。 再经过黑色树脂层硬烤， 条件为 200 度到 300度， 时间为半小时到 3小时， 经过上述制程后， 最终形成厚 度为 0.3um~5um， 图形规则的黑色树脂层 51。  The pre-bake temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, the exposure energy is from 100 to 100 mj, the developer is Na or Ka alkaline solution, and the development temperature is kept at a constant temperature of 20 to 40 degrees. After hard baking through a black resin layer, the conditions are from 200 to 300 degrees, and the time is from half an hour to three hours. After the above process, a black resin layer 51 having a regular thickness of 0.3 um to 5 um is formed.
ITO电极层的形成：  Formation of ITO electrode layer:
形成黑色树脂层的透明基板，经过 ITO镀膜，使在玻璃基板上形 成一层透明及厚度均匀的 ITO膜层， 其厚度为 50~2000埃米 (面电阻 为 10~430欧姆)； ITO材料由 In203和 Sn02组成，其质量比为 85~95： 5~15。 ITO镀膜的方式有真空磁控溅镀， 化学气相沉积法， 热蒸镀， 溶胶凝胶。  A transparent substrate forming a black resin layer is formed by ITO coating to form a transparent and uniform thickness ITO film layer on the glass substrate, the thickness of which is 50-2000 angstroms (face resistance is 10~430 ohms); In203 and Sn02, the mass ratio is 85~95: 5~15. ITO coating methods include vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, and sol gel.
经过 ITO镀膜的玻璃基板， 在其 ITO表面涂布一层厚度均匀的 正性光阻材料， 正性光阻材料主成分为乙酸丙二醇单甲基醚酯， 环氧 树脂及感光材料； 光阻涂布厚度为 lum~5um。 涂布光阻材料方式有 滚涂， 旋涂， 刮涂等方式。 The ITO coated glass substrate is coated with a uniform thickness on the ITO surface. Positive photoresist material, the main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and photosensitive material; the photoresist coating thickness is lum~5um. Coating photoresist materials are by roller coating, spin coating, and scraping.
经过上述制程之后产品经过光阻预烤， 曝光， 显影， 蚀刻， 脱光 阻膜， 最终形成厚度为 50~2000埃米 (面电阻为 10~430欧姆)及规则 ITO图案或电极。 预烤温度及时间范围为: 60度~150度， 50秒到 200 秒， 曝光能量采用 lOOmj到 500mj， 显影液采用 Na系或 Ka系碱性 溶液， 显影之温度采用 20~40度恒温作业。 ITO蚀刻液采用盐酸及硝 酸按一定比例混合而成的药液， 使其酸的 PH值落在 1~3之间， 蚀刻 温度在 40~50度之间作业。脱光阻膜液采用二甲亚砜和乙醇胺按一定 的比例混合而成， 百分比为 70%: 30%, 脱膜温度在 40~80度之间作 业。  After the above process, the product is pre-baked, exposed, developed, etched, and stripped with a photoresist to form a thickness of 50 to 2000 angstroms (face resistance of 10 to 430 ohms) and a regular ITO pattern or electrode. The pre-baking temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, the exposure energy is from lOOmj to 500mj, the developer is Na-based or Ka-based alkaline solution, and the developing temperature is operated at a constant temperature of 20 to 40 degrees. The ITO etching solution is a mixture of hydrochloric acid and nitric acid in a certain ratio, so that the pH of the acid falls between 1 and 3, and the etching temperature is between 40 and 50 degrees. The photo-resist film solution is prepared by mixing dimethyl sulfoxide and ethanolamine in a certain ratio, the percentage is 70%: 30%, and the release temperature is between 40 and 80 degrees.
所述的 ITO电极包括电容屏驱动 (ITO电极 1)和感应电极 (ITO电 极 2)， 具有规则图形结构； ITO电极 1与 ITO电极 2在同一层面， 相互独立， 相互绝缘， 垂直设计。  The ITO electrode comprises a capacitive screen drive (ITO electrode 1) and a sensing electrode (ITO electrode 2) having a regular pattern structure; the ITO electrode 1 and the ITO electrode 2 are on the same level, independent of each other, insulated from each other, and vertically designed.
ITO电极 1导通是通过金属过桥电极上下搭接，金属过桥电极通 过第一绝缘层的底部到顶部的爬升，再从第一绝缘层的顶部到底部的 下降， 连接 ITO电极 1， 使得 ITO电极 1形成驱动通路； ITO电极 2 的导通是自身 ITO相通， 使 ITO电极 2形成感应通路。  The ITO electrode 1 is electrically connected by a metal bridge electrode, the metal bridge electrode is climbed through the bottom to the top of the first insulating layer, and then descends from the top to the bottom of the first insulating layer, so that the ITO electrode 1 is connected. The ITO electrode 1 forms a driving path; the conduction of the ITO electrode 2 is the self-ITO communication, and the ITO electrode 2 forms an inductive path.
第一绝缘层的形成：  Formation of the first insulating layer:
经过 ITO电极后的透明基板， 在其 ITO膜面涂布一层厚度均匀 的负性光阻材料， 负性光阻材料主成分为乙酸丙二醇单甲基醚酯， 亚 克力树脂， 环氧树脂及负性感光剂， 光阻涂布厚度为 0.5um~3um; 涂 布负性光阻材料方式有旋涂， 刮涂等方式。  A transparent substrate after passing through the ITO electrode is coated with a uniform thickness of a negative photoresist material on the surface of the ITO film. The main component of the negative photoresist material is propylene glycol monomethyl ether acetate, acrylic resin, epoxy resin and negative Sexy light agent, photoresist coating thickness is 0.5um~3um; coating negative photoresist material by spin coating, scraping and other methods.
经过上述制程之后产品经过光阻预烤， 曝光， 显影， 最终形成厚 度为 0.5~3um和规则的绝缘层图案。 预烤温度及时间范围为: 60 度 ~150度， 50秒到 200秒， 曝光能量采用 lOOmj到 500mj， 显影液采 用 Na系或 Ka系碱性溶液， 显影之温度采用 20~40度恒温作业。 再 经过绝缘层硬烤， 条件为 200度到 300度， 时间为半小时到 3小时， 经过上述制程后，最终形成厚度为 0.5um~3um，图形规则的绝缘层 1。 After the above process, the product is pre-baked, exposed, and developed through a photoresist to form a pattern of a thickness of 0.5 to 3 um and a regular insulating layer. Pre-bake temperature and time range: 60 degrees to 150 degrees, 50 seconds to 200 seconds, exposure energy from lOOmj to 500mj, developer The Na-based or Ka-based alkaline solution is used, and the development temperature is kept at a constant temperature of 20 to 40 degrees. After hard baking through the insulating layer, the condition is 200 to 300 degrees, and the time is half an hour to 3 hours. After the above process, the insulating layer 1 having a thickness of 0.5 um to 3 um and having a regular pattern is finally formed.
金属电极层及金属过桥的形成：  Metal electrode layer and metal bridge formation:
形成绝缘层的透明基板， 再经过金属镀膜， 使在玻璃基板上形成 一层厚度均匀的金属膜层， 其厚度为 500埃米 ~4000埃米。 金属膜层 材料为 MoNb, AlNd, MoNb堆积而成的三明治结构， 厚度按 50埃 米~500埃米: 500埃米 ~3000埃米: 50埃米 ~500埃米比例搭配， 其中 MoNb合金材料中 Mo和 Nb质量比为 85~95： 5-15 , AlNd合金材料 中 A1和 Nd质量比为 95~98： 2~5。 金属材料选型也可由银合金或铜 合金组成， 成分按一定比例组合而成。 金属镀膜为真空磁控溅镀。  The transparent substrate forming the insulating layer is subjected to metal plating to form a metal film layer having a uniform thickness on the glass substrate, and has a thickness of 500 angstroms to 4,000 angstroms. The metal film material is a sandwich structure composed of MoNb, AlNd, MoNb, and the thickness is in the range of 50 angstroms to 500 angstroms: 500 angstroms to 3,000 angstroms: 50 angstroms to 500 angstroms, wherein MoNb alloy materials are used. The mass ratio of Mo to Nb is 85~95: 5-15, and the mass ratio of A1 and Nd in AlNd alloy material is 95~98: 2~5. The selection of the metal material may also be composed of a silver alloy or a copper alloy, and the components are combined in a certain ratio. The metal coating is vacuum magnetron sputtering.
经过金属镀膜的玻璃基板，在其金属表面涂布一层厚度均匀的正 性光阻材料， 光阻材料主成分为乙酸丙二醇单甲基醚酯， 环氧树脂， 正性感光剂。 光阻涂布厚度为 lum~5um。 涂布光阻材料方式有滚涂， 旋涂， 刮涂等方式。 经过上述制程之后产品经过光阻预烤， 曝光， 显 影， 蚀刻， 脱光阻膜， 最终形成厚度为 500~4000A及规则金属图案 或电极。预烤温度及时间范围为: 60度~150度， 50秒到 200秒， 曝光 能量采用 lOOmj到 500mj， 显影液采用 Na系或 Ka系碱性溶液， 显 影之温度采用 20~40度恒温作业。金属蚀刻液采用磷酸、醋酸及硝酸 按一定比例混合而成的药液，蚀刻温度在 40~50度之间作业。脱光阻 膜液采用二甲亚砜和乙醇胺按一定的比例混合而成， 百分比为 70%: 30% , 脱膜温度在 40~80度之间作业。  The metal-coated glass substrate is coated with a uniform thickness of a positive photoresist material on the metal surface. The main component of the photoresist material is propylene glycol monomethyl ether acetate, epoxy resin, and a positive photosensitive agent. The photoresist coating thickness is lum~5um. Coating photoresist materials are by roller coating, spin coating, and scraping. After the above process, the product is pre-baked, exposed, developed, etched, and stripped with photoresist to form a thickness of 500~4000A and a regular metal pattern or electrode. The pre-baking temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, and the exposure energy is from lOOmj to 500mj. The developer is made of Na-based or Ka-based alkaline solution, and the temperature of the development is operated at a constant temperature of 20 to 40 degrees. The metal etching solution is a mixture of phosphoric acid, acetic acid and nitric acid in a certain ratio, and the etching temperature is between 40 and 50 degrees. The photo-resist film solution is prepared by mixing dimethyl sulfoxide and ethanolamine in a certain ratio, the percentage is 70%: 30%, and the film removal temperature is between 40 and 80 degrees.
第二绝缘层的形成：  Formation of the second insulating layer:
经过金属电极后的玻璃基板，在其金属膜面涂布一层厚度均匀的 负性光阻材料，  The glass substrate after passing through the metal electrode is coated with a uniform thickness of the negative photoresist material on the surface of the metal film.
负性光阻材料主成分为乙酸丙二醇单甲基醚酯， 亚克力树脂， 环 氧树脂及负性感光剂；光阻涂布厚度为 0.5um~3um。涂布负性光阻材 料方式有旋涂， 刮涂等方式。 The main component of the negative photoresist material is propylene glycol monomethyl ether acetate, acrylic resin, epoxy resin and negative photosensitive agent; the photoresist coating thickness is 0.5um~3um. Coating negative photoresist The material method is spin coating, scraping and the like.
经过上述制程之后产品经过光阻预烤， 曝光， 显影， 最终形成厚 度为 0.5~3um和规则的绝缘层图案。 预烤温度及时间范围为: 60 度 ~150度， 50秒到 200秒， 曝光能量采用 lOOmj到 500mj， 显影液采 用 Na系或 Ka系碱性溶液， 显影之温度采用 20~40度恒温作业。 再 经过绝缘层硬烤，条件为 200度到 300度，时间为 0.5小时到 3小时， 经过上述制程后，最终形成厚度为 0.5um~3um， 图形规则的第二绝缘 层。  After the above process, the product is pre-baked, exposed, and developed by photoresist, and finally forms a pattern of a thickness of 0.5 to 3 um and a regular insulating layer. The pre-baking temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, the exposure energy is from 100 to 100 mj, the developer is Na-based or Ka-based alkaline solution, and the developing temperature is operated at a constant temperature of 20 to 40 degrees. After hard baking through the insulating layer, the condition is 200 to 300 degrees, and the time is 0.5 hours to 3 hours. After the above process, a second insulating layer having a thickness of 0.5 um to 3 um and a regular pattern is finally formed.
以上内容是结合具体的优选实施方式对本发明所作的进一步详 细说明， 不能认定本发明的具体实施只局限于这些说明。对于本发明 所属技术领域的普通技术人员来说， 在不脱离本发明构思的前提下， 还可以做出若干简单推演或替换， 都应当视为属于本发明的保护范 围。  The above is a further detailed description of the present invention in connection with the specific preferred embodiments, and the specific embodiments of the present invention are not limited to the description. It will be apparent to those skilled in the art that the present invention may be practiced without departing from the spirit and scope of the invention.

Claims

权利要求书 Claim
1、 一^1金属过桥一体式电容触摸屏， 包括透明基板， 依次层 叠于透明基板的黑色树脂层、 ιτο电极、 第一绝缘层、 金属电极及金 属过桥和第二绝缘层； 所述的 ITO电极包括电容屏驱动和感应电极， 具有规则图形结构； 电容屏驱动与感应电极在同一层面， 相互独立， 相互绝缘， 垂直设计； 所述透明基板包括视窗区和非视窗区， 黑色树 脂层分布在显示屏非视窗区。 1, a metal bridge ^ integrated capacitive touch screen comprising a transparent substrate, a black resin layer sequentially laminated on a transparent substrate, ιτο electrode, a first insulating layer, a metal electrode and a second insulating layer and a metal bridge; the The ITO electrode comprises a capacitive screen driving and sensing electrode having a regular pattern structure; the capacitive screen driving is on the same level as the sensing electrode, independent of each other, insulated from each other, and vertically designed; the transparent substrate comprises a window area and a non-window area, and the black resin layer is distributed. In the non-window area of the display.
2、如权利要求 1所述的金属过桥一体式电容触摸屏， 其特征是: 所述的透明基板为厚度在 0.5mm~2.0mm的化学强化玻璃基板； 所述 ITO电极规则结构为菱形， 或条形， 或方块形， 或雪花型， 或十字型。  The metal bridge-integrated capacitive touch panel of claim 1 , wherein: the transparent substrate is a chemically strengthened glass substrate having a thickness of 0.5 mm to 2.0 mm; and the regular structure of the ITO electrode is a diamond shape, or Strip, or square, or snowflake, or cross.
3、如权利要求 2所述的金属过桥一体式电容触摸屏， 其特征是: 所述的黑色树脂层厚度为 0.3um~5um; ITO电极层厚度为 50~2000埃 米的厚度为 0.5~3um; 金属电极及金属过桥厚度为 500埃米 ~4000埃 米； 第二绝缘层厚度为 0.5~3um。 3. The metal bridge-integrated capacitive touch screen of claim 2, wherein: the black resin layer has a thickness of 0.3 um to 5 um ; and the ITO electrode layer has a thickness of 50 to 2000 angstroms and has a thickness of 0.5 to 3 um. The thickness of the metal electrode and the metal bridge is 500 angstroms to 4000 angstroms; the thickness of the second insulating layer is 0.5 ～3 um.
4、如权利要求 3所述的金属过桥一体式电容触摸屏， 其特征是: 所述的金属镀膜的金属膜层为 MoNb, AlNd, MoNb堆积而成的 三明治结构， 三者厚度按 50埃米 ~500埃米: 500埃米 ~3000埃米: 50 埃米 ~500埃米比例搭配，其中 MoNb合金材料中 Mo和 Nb质量比为 85-95： 5-15, AlNd合金材料中 A1和 Nd质量比为 95~98： 2-5  4. The metal bridge-integrated capacitive touch panel of claim 3, wherein: the metallized metal film layer is a sandwich structure formed by stacking MoNb, AlNd, and MoNb, and the thickness of the three layers is 50 angstroms. ~500 emimeters: 500 angstroms to 3000 angstroms: 50 angstroms to 500 angstroms, in which the mass ratio of Mo and Nb in MoNb alloy material is 85-95: 5-15, the mass of A1 and Nd in AlNd alloy materials The ratio is 95~98: 2-5
5、如权利要求 4所述的金属过桥一体式电容触摸屏， 其特征是: 所述的 ITO包括 In203和 Sn02， 其质量比为 85~95： 5~15。 The metal bridge-integrated capacitive touch panel of claim 4, wherein: ITO comprises In203 and Sn02, and the mass ratio is 85~95: 5~15.
6、 一种制备金属过桥一体式电容触摸屏的方法， 包括步骤： 黑色树脂层的形成：将黑色树脂经过旋转涂布方式或刮式涂布方 式均匀涂布在透明基板上，涂布厚度为 0.3um~5um，经过加热器预烤， 曝光， 显影， 使之形成所需之黑色树脂区域； 6. A method for preparing a metal bridge-integrated capacitive touch screen, comprising the steps of: forming a black resin layer: uniformly coating a black resin on a transparent substrate by spin coating or scraping, and coating thickness is 0.3um~5um, pre-baked, exposed, and developed by a heater to form a desired black resin region;
所述黑色树脂是感光性保护层光阻剂，所述光阻剂包括亚克力树 脂， 环氧树脂， 负性感光剂， 乙酸丙二醇单甲基醚酯及黑色颜料； 其 比例为树脂类： 乙酸丙二醇单甲基醚酯： 黑色颜料及负性感光剂 权利要求书 The black resin is a photosensitive protective layer photoresist, and the photoresist includes acrylic resin, epoxy resin, negative photosensitive agent, propylene glycol monomethyl ether acetate and black pigment; the ratio is resin: propylene glycol acetate Monomethyl ether ester: black pigment and negative light agent Claim
=15-30： 60-80： 1-10；  =15-30: 60-80: 1-10;
ITO电极层的形成：  Formation of ITO electrode layer:
形成黑色树脂层的透明基板，经过 ΙΤΟ镀膜，使在玻璃基板上形 成一层透明及厚度均匀的 ΙΤΟ膜层， 其厚度为 50~2000埃米；  The transparent substrate forming the black resin layer is subjected to a ruthenium plating film to form a transparent and uniform thickness ruthenium film layer on the glass substrate, and the thickness thereof is 50 to 2000 angstroms;
经过 ΙΤΟ镀膜的透明基板， 在其 ΙΤΟ表面涂布一层厚度均匀的 正性光阻材料， 光阻涂布厚度为 lum~5um;  After a transparent substrate coated with ruthenium, a uniform thickness of a positive photoresist material is applied on the surface of the ruthenium, and the thickness of the photoresist coating is lum~5um;
经过光阻预烤， 曝光， 显影， 蚀刻， 脱光阻膜， 最终形成厚度为 50~2000A (面电阻为 10~430欧姆)及规则 ITO图案或电极；  After photoresist pre-baking, exposure, development, etching, and photoresist removal, the final thickness is 50~2000A (face resistance is 10~430 ohms) and regular ITO pattern or electrode;
所述的 ITO电极包括 ITO电极 1ITO电极 2，具有规则图形结构； ITO电极 1与 ITO电极 2在同一层面， 相互独立， 相互绝缘， 垂直设 计；  The ITO electrode comprises an ITO electrode 1 and an ITO electrode 2 having a regular pattern structure; the ITO electrode 1 and the ITO electrode 2 are on the same level, independent of each other, insulated from each other, and vertically designed;
第一绝缘层的形成：  Formation of the first insulating layer:
经过金属过桥电极后的透明基板，在其 ITO膜面涂布一层厚度均 匀的负性光阻材料， 光阻涂布厚度为 0.5um~3um;  The transparent substrate after passing through the metal bridge electrode is coated with a uniform thickness of the negative photoresist material on the surface of the ITO film, and the photoresist coating thickness is 0.5 um~3 um;
经过光阻预烤， 曝光， 显影， 最终形成厚度为 0.5~3um和规则的 绝缘层图案；  Pre-baked, exposed, and developed by photoresist, and finally formed a pattern of insulation layer with a thickness of 0.5~3um and regular;
金属电极层及金属过桥的形成：  Metal electrode layer and metal bridge formation:
形成绝缘层的透明基板， 经过金属镀膜， 使之在透明基板上形成 一层厚度均匀的金属膜层， 其厚度为 500~4000埃米；  a transparent substrate forming an insulating layer, which is subjected to a metal plating film to form a metal film layer having a uniform thickness on the transparent substrate, and has a thickness of 500 to 4000 angstroms;
经过金属镀膜的透明基板，在其金属表面涂布一层厚度均匀的正 性光阻材料， 光阻涂布厚度为 lum~5um;  The metal-coated transparent substrate is coated with a uniform thickness of a positive photoresist material on the metal surface, and the photoresist coating thickness is lum~5um;
经过光阻预烤， 曝光， 显影， 蚀刻， 脱光阻膜， 最终形成厚度为 500-4000埃米及规则金属图案或电极；  Pre-baked, exposed, developed, etched, and stripped with photoresist to form a thickness of 500-4000 angstroms and a regular metal pattern or electrode;
第二绝缘层的形成：  Formation of the second insulating layer:
经过金属电极后的透明基板，在其金属膜面涂布一层厚度均匀的 负性光阻材料， 光阻涂布厚度为 0.5um~3um;  After passing through the transparent substrate of the metal electrode, a thin layer of negative photoresist material is coated on the surface of the metal film, and the thickness of the photoresist coating is 0.5 um~3 um;
经过光阻预烤， 曝光， 显影， 最终形成厚度为 0.5~3um和规则的 权利要求书 Pre-baked, exposed, developed, and finally formed to a thickness of 0.5~3um and regular Claim
绝缘层图案。 Insulation pattern.
7、如权利要求 6所述的制备金属过桥一体式电容触摸屏的方法， 其特征是： 所述的透明基板为厚度在 0.5~2.0毫米的化学强化玻璃基 板； 所述的 ITO包括 In203和 Sn02， 其质量比为 85~95： 5~15。  The method for preparing a metal bridge-integrated capacitive touch screen according to claim 6, wherein: the transparent substrate is a chemically strengthened glass substrate having a thickness of 0.5 to 2.0 mm; and the ITO comprises In203 and Sn02. The mass ratio is 85~95: 5~15.
8、 如权利要求 7所述的制备金属过桥一体式电容触摸屏的方 法， 其特征是：  8. The method of preparing a metal bridge-integrated capacitive touch screen according to claim 7, wherein:
所述的正性光阻材料主成分为乙酸丙二醇单甲基醚酯，环氧树脂 及正性感光剂； 负性光阻材料主成分为乙酸丙二醇单甲基醚酯， 亚克 力树脂， 环氧树脂及负性感光剂。  The main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and positive photosensitive agent; the main component of the negative photoresist material is propylene glycol monomethyl ether acetate, acrylic resin, epoxy resin And negative photosensitizers.
9、 如权利要求 8所述的制备金属过桥一体式电容触摸屏的方 法， 其特征是：  9. The method of preparing a metal bridge-integrated capacitive touch screen according to claim 8, wherein:
所述的金属镀膜的金属膜层为 MoNb, AlNd, MoNb堆积而成的 三明治结构，其厚度按 50埃米 ~500埃米: 500埃米 ~3000埃米: 50埃米 -500埃米比例搭配， 其中 MoNb合金材料中 Mo和 Nb质量比为 85-95： 5-15, AlNd合金材料中 A1和 Nd质量比为 95~98： 2-5  The metal film of the metal coating is a sandwich structure of MoNb, AlNd, MoNb, and the thickness thereof is 50 angstroms to 500 angstroms: 500 angstroms to 3,000 angstroms: 50 angstroms to 500 angstroms. , in MoNb alloy material, the mass ratio of Mo and Nb is 85-95: 5-15, and the mass ratio of A1 and Nd in AlNd alloy material is 95~98: 2-5
10、 如权利要求 9所述的制备金属过桥一体式电容触摸屏的 方法， 其特征是： 所述的 ITO镀膜的方式为真空磁控溅镀， 或者为化 学气相沉积法， 或者为热蒸镀， 或者为溶胶凝胶。  The method for preparing a metal bridge-integrated capacitive touch screen according to claim 9, wherein: the ITO coating is performed by vacuum magnetron sputtering, or by chemical vapor deposition, or by thermal evaporation. , or a sol gel.
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