CN202177885U - Indium tin oxide (ITO) gap bridge integrated capacitive touch screen - Google Patents
Indium tin oxide (ITO) gap bridge integrated capacitive touch screen Download PDFInfo
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- CN202177885U CN202177885U CN2011202975582U CN201120297558U CN202177885U CN 202177885 U CN202177885 U CN 202177885U CN 2011202975582 U CN2011202975582 U CN 2011202975582U CN 201120297558 U CN201120297558 U CN 201120297558U CN 202177885 U CN202177885 U CN 202177885U
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Abstract
The utility model discloses an indium tin oxide (ITO) gap bridge integrated capacitive touch screen, which comprises a transparent substrate, a black resin layer, an ITO gap bridge electrode, a first insulation layer, an ITO electrode, a metal electrode and a second insulation layer, wherein the black resin layer, the ITO gap bridge electrode, the first insulation layer, the ITO electrode, the metal electrode and the second insulation layer are sequentially stacked on the transparent substrate. The ITO electrode comprises a capacitive screen drive and an induction electrode and is provided with a regular graph structure. The capacitive screen drive and the induction electrode are located on the same layer face, independent and insulated from each other and perpendicularly designed. The transparent substrate comprises a window area and a non-window area, and the black resin layer is distributed in the display screen non-window area. Circuit wiring of the metal electrode is only in the black resin layer. The ITO gap bridge integrated capacitive touch screen reasonably designs the stacked structure of the capacitive touch screen and the ITO gap bridge mode, reduces the total thickness and the weight of the touch screen, and effectively improves light transmittance, work stability, reliability and touch sensitivity of the capacitive touch screen.
Description
Technical field
The utility model relates to the capacitance touch screen technical field, especially relates to a kind of integral type capacitance touch screen of passing a bridge and designing through ITO.
Background technology
Along with the development of electronics technology, the keyboard of mobile phone, digital camera, handheld device, vehicle-carrying DVD, MP3, instrument etc. or mouse are touched gradually to shield and substitute at present.The product of touch-screen is not very burning hot several years ago, and Along with people's is more and more for the contact of touch screen product, is also approved that speed of development was accelerated gradually in nearly 2 years by more people.Touch-screen is grown up rapidly, has not only evoked fierce more industry competition, has also promoted technological development indirectly, and the mode of operation of its multi-point touch has risen to a new height to the influence power of touch-screen product especially, is also paid close attention to by people gradually.
Touch-screen is mainly formed by touching detection part and touch screen controller, touches detection part and is installed in the indicator screen front, is used to detect user touch location, send touch screen controller after the reception; And the main effect of touch screen controller is to receive touch information from touch point detection device, and converts it to contact coordinate, gives CPU again, and its can receive simultaneously the order that CPU sends and carry out.
According to the principle of work of touch-screen medium with transmission information; Touch-screen can be divided into four kinds; Be respectively resistance-type, capacitor induction type, infrared-type and surface acoustic wave type, current what be widely used is resistive touch screen, and it utilizes pressure sensitive to carry out resistance control; Resistive touch screen is a kind of laminated film of multilayer, and its major part is a resistance film screen that cooperates very much with display surface.Resistance film screen be with one deck glass or duroplasts flat board as basic unit, the surface scribbles layer of transparent oxidized metal (transparent conductive resistance) ITO (tin indium oxide) conductive layer, is stamped the smooth anti-friction plastic layer of one deck outside surface cure process above again; Its inside surface also scribbles one deck ITO coating; Between them, have the transparent isolating points of many tiny (less than 1/1000 inches) to separate insulation to two conductive layers, when the finger touch screen, two conductive layers has just had contact in the position, touch point; Resistance changes; On X and Y both direction, produce signal, send touch screen controller, controller to detect this contact then and calculate (X; Y) position, the mode according to analog mouse operates again.
The ultimate principle of capacitive touch screen is to utilize the induction by current of human body to carry out work, and capacitive touch screen is two layers of compound glass screen, and the inside surface interlayer of glass screen scribbles ITO (tin indium oxide) conducting film (plated film electro-conductive glass); Outermost layer is a skim silicon soil glassivation, and the ITO coating is drawn four electrodes as workplace on four angles; When finger touch was on screen, because people's bulk electric field, user and touch screen surface formed a coupling capacitance; For high-frequency current, electric capacity is direct conductor, so finger siphons away a very little electric current from contact point; This electric current flows out the electrode from four jiaos of touch-screen respectively; And the electric current of these four electrodes of flowing through is directly proportional with the distance of pointing four jiaos, and controller draws touch point position through the accurate Calculation to these four current ratios.
In capacitive touch screen, projection-type capacitive touch screen is that current application is a kind of comparatively widely, has characteristics such as simple in structure, transmittance height.The touch sensible parts of projection-type capacitive touch screen are generally a plurality of column electrodes and the row electrode is staggered to form the induction matrix.Usually the design that adopts comprises the two sides that column electrode and row electrode is separately positioned on same transparency carrier, prevents short circuit to occur at intervening portion; Perhaps column electrode and row electrode are arranged on the homonymy of same transparency carrier; Be formed on the same conducting film (being generally the ITO conducting film); Separate through the mode that insulation course and frame conducting bridge are set at column electrode and the staggered position of row electrode; Column electrode and row electrode are separated and guarantee conducting on direction separately, can prevent effectively that it is in the intervening portion short circuit.
Usually the design proposal that adopts is: one of column electrode or row electrode are provided with on conducting film continuously; Then another electrode electrode with continuous setting on conducting film serves as to be arranged to some electrode blocks at interval; Position at cross-point is electrically connected adjacent electrode block through conducting bridge, thereby forms the continuous electrode on the other direction; Separate by insulation course between the electrode of conducting bridge and setting continuously, thereby effectively stop column electrode and row electrode in the cross-point short circuit.Usually the design proposal that adopts is: (1) stepped construction is followed successively by transparency carrier, first direction electrode, insulation course, conducting bridge; Perhaps (2) stepped construction is followed successively by transparency carrier, conducting bridge, insulation course, first direction electrode.
But can there be the defective of the not high and poor work stability of transmittance in the capacitive touch screen that adopts traditional design proposal; The capacitive touch screen transmittance of traditional design proposal is difficult to break through 80%; And during whole stressed flexural deformation; Occur at the interface easily separating, cause electrode to open circuit and touch inefficacy, touch sensible parts damages.
The utility model content
The purpose of the utility model is to provide a kind of ITO gap bridge integral type capacitance touch screen; Stepped construction and ITO bridge formation mode through to capacitance touch screen reasonably design; Reduce the touch-screen gross thickness, alleviated the weight of touch-screen, effectively improved the transmittance of capacitive touch screen; Job stability, reliability and touch sensitivity.
For realizing above-mentioned purpose, the utility model adopts following technical scheme:
A kind of ITO gap bridge integral type capacitance touch screen comprises transparency carrier, and the black resin layer, the ITO that stack gradually in transparency carrier cross bridge electrode, first insulation course, ITO electrode, metal electrode and second insulation course; Described ITO electrode comprises that capacitance plate drives (ITO electrode 1) and induction electrode (ITO electrode 2), has the regular figure structure; ITO electrode 1 and ITO electrode 2 are in same aspect, and be separate, mutually insulated, vertical design; Said transparency carrier comprises viewfinder area and non-viewfinder area, and black resin layer is distributed in the non-viewfinder area of display screen; Described metal electrode circuit wiring is only in the black resin zone, and viewfinder area does not have metal electrode.
Preferably: the chemically reinforced glass substrate that described transparency carrier is a thickness between 0.5 ~ 2.0 millimeter of thickness; Said ITO electrode regular texture is a rhombus, or bar shaped, or box-shaped, or snowflake type, or cross figures.
Described black resin layer can effectively block the figure layer of non-visible area, can shading, and the visible of blocking product belows such as metal wire.ITO gap bridge electrode comprises that the bridge electrode 1 of crossing of display screen viewfinder area crosses bridge electrode 2 with the black resin layer edge, and both have the regular figure structure; Cross the drive wire (ITO electrode about 1 ends) or the line of induction (ITO electrode 2 upper and lower sides--demonstration among the-Tu) that bridge electrode 1 connects conducting ITO electrode; Crossing bridge electrode 2 connects the drive wire (ITO electrode 1) or the line of induction (ITO electrode 2) of conducted metal electrodes and ITO electrode and prevents that the drive wire (ITO electrode 1) of ITO electrode or the line of induction (ITO electrode 2) from rupturing at place, black resin layer slope.First insulation course makes ITO electrode 1 and ITO electrode 2 be in insulation status, not conducting mutually.The FPC nation of ITO electrode signal conducting decides the zone passage metal electrode and realizes.The second dielectric protection layer metal electrode and ITO lead make it and air insulation.Utility model
The metallic diaphragm of metal coating is MoNb; AlNd; MoNb piles up the sandwich structure that forms; Thickness is in 50 Ethylmercurichlorendimides ~ 500 Ethylmercurichlorendimides: 500 Ethylmercurichlorendimides ~ 3000 Ethylmercurichlorendimides: 50 Ethylmercurichlorendimides ~ 500 Ethylmercurichlorendimide ratios collocation, and wherein Mo and Nb mass ratio are 85 ~ 95:5 ~ 15 in the MoNb alloy material, Al and Nd mass ratio are 95 ~ 98:2 ~ 5 in the AlNd alloy material.。The metal material type selecting also can be made up of silver alloy or aldary, and composition combines by a certain percentage.The metallic diaphragm plated film is the vacuum magnetic control sputter.
The utility model compared with prior art has following advantage and beneficial effect:
The utility model is through reasonably being provided with stepped construction; On the layer of transparent substrate, accomplish touch function signal electrode and black resin overlayer, optimize range upon range of ITO gap bridge electrode layer etc. in proper order and the mode of pattern, significantly promoted the yield of product; Reduce cost, promote product reliability.In the utility model,
Between substrate thickness 0.5mm ~ 2.0mm, has thin thickness, advantages such as light weight; Through appropriate design, make transmitance to reach more than 90% to each layer.
The project organization that the utility model adopts ITO to pass a bridge makes touch-screen can't see metal gap bridge point in the window area, viewing area, has significantly promoted the product transmitance.
Description of drawings
Fig. 1 is the structural representation of the described ITO gap bridge of the utility model capacitance touch screen;
Fig. 2 is the described glass substrate structural representation of the utility model embodiment;
Fig. 3 is local structure for amplifying synoptic diagram for ITO passes a bridge;
Fig. 4 is an ITO gap bridge cross-sectional view;
Fig. 5 is black resin edge ITO and metal electrode cross-sectional view;
Fig. 6 is the cross-sectional view of the described ITO gap bridge of the utility model electric capacity integral type touch-screen.
Embodiment
Below in conjunction with specific embodiment the utility model is done further explain.
Like Fig. 1 and shown in Figure 2; Described ITO gap bridge capacitance touch screen; Comprise the chemically reinforced glass substrate 11 of thickness between 0.5mm ~ 2.0mm, stack gradually in black resin layer 12, the ITO of glass substrate and cross bridge electrode 13, first insulation course 14, ITO electrode 15, metal electrode 16 and second insulation course 17; Described ITO crosses bridge electrode and the black resin layer overlapping edges electrode excessively that bridge electrode 13 comprises the display screen vision area, has the regular figure structure, can be rhombus, or bar shaped, or box-shaped, or snowflake type, or cross figures.
Glass substrate comprises viewfinder area 21 and non-viewfinder area 22, and black resin layer 12 is distributed in the non-viewfinder area 22 of display screen.
Described black resin layer can effectively block the figure layer of non-visible area, can shading, and the visible of blocking product belows such as metal wire.
Fig. 3 to shown in Figure 6 for the partial structurtes enlarged diagram or the cross-sectional view of the said ITO gap bridge of present embodiment capacitance touch screen: ITO cross bridge electrode 43 comprise the display screen viewfinder area cross bridge electrode 1 and bridge electrode 2 is crossed at black resin layer 51 edges; Both have the regular figure structure; Can be rhombus, or bar shaped, or box-shaped; Or snowflake type, or cross figures; Cross drive wire (ITO electrode about 1 ends) 42 or the line of induction (ITO electrode 2 upper and lower sides--demonstration among the-Tu) 46 that bridge electrode 1 connects conducting ITO electrode 15; Crossing bridge electrode 2 connects drive wire (the ITO electrode 1) 42 or the line of induction (ITO electrode 2) 46 of conducted metal electrodes 52 and ITO electrode and prevents that drive wire (the ITO electrode 1) 42 of ITO electrode or the line of induction (ITO electrode 2) 46 from rupturing at place, black resin layer 51 slopes.First insulation course 45 makes the drive wire (ITO electrode 1) 42 of ITO electrode be in insulation status, not conducting mutually with the line of induction (ITO electrode 2) 46.The FPC nation of ITO electrode signal conducting decides the zone passage metal electrode and realizes.Second insulation course, 44 protection metal electrodes 52 and ITO lead make it and air insulation.
Its preparation technology is following:
Black resin is uniformly coated on the transparency carrier 41 (11) through the rotary coating mode or the formula coating method of scraping, and coating thickness is 0.3um ~ 5um, and is roasting in advance through well heater, and exposure is developed, and makes it to form required black resin zone; The black resin zone is trapezium structure; Interior thickness is 0.3um ~ 5um; Its bevel angle is that angle is mild between 6 ~ 60 degree, and purpose is that ITO electrode (drive wire ITO electrode 1 with line of induction ITO electrode 2) can be owing to difference in thickness causes the ITO lead rupture greatly during through the slope.The black resin zone is the non-viewfinder area of display screen, and purpose is for blocking metal electrode; Said black resin be photonasty protective seam photoresist (commodity by Taiwan forever photochemistry produced EK410); It is a kind of black negativity photoresist; Principal ingredient is: acrylic resin, epoxy resin, negative photosensitive agent; Acetate propylene glycol monomethyl ether ester and black pigment, concrete ratio is a resene: acetate propylene glycol monomethyl ether ester: black pigment and negative photosensitive agent=15 ~ 30:60 ~ 80:1 ~ 10.
In advance roasting temperature and time scope is: 60 degree ~ 150 degree, and 50 seconds to 200 seconds, exposure energy adopted 100mj to 500mj, and it is alkaline solution that developer solution adopts Na system or Ka, and the temperature of development adopts 20 ~ 40 degree constant temperature operations.It is roasting firmly to pass through black resin layer again, and condition is 200 to spend to 300 degree, and the time is half an hour to 3 hour, and through behind the above-mentioned processing procedure, finally forming thickness is 0.3um ~ 5um, the black resin layer 51 (12) of figure rule.
ITO crosses the formation of bridge electrode: transparent glass substrate is carried out chemical enhanced, pass through the ITO plated film again, make on glass substrate, to form layer of transparent and the uniform ITO rete of thickness, its thickness is 50 Ethylmercurichlorendimides ~ 2000 Ethylmercurichlorendimides (face resistance is 10 ~ 430 ohm); The ITO material is made up of In2O3 and SnO2, and its mass ratio is 85 ~ 95:5 ~ 15.The mode of ITO plated film has the vacuum magnetic control sputter, chemical vapour deposition technique, hot vapor deposition, collosol and gel.
Through the transparent glass substrate of ITO plated film, at the uniform positivity photoresist of its ITO surface coated one layer thickness, the photoresistance coating thickness is 1um ~ 5um; Positivity photoresist major component is acetate propylene glycol monomethyl ether ester, epoxy resin and a photosensitive material.The photoresistance coating thickness is 1um ~ 5um.Coating photoresist mode has roller coating, spin coating, modes such as blade coating.
Roasting in advance through photoresistance through product after the above-mentioned processing procedure, exposure is developed, and the photoresistance film is taken off in etching, and finally forming thickness is 50 ~ 2000 Ethylmercurichlorendimides (face resistance is 10 ~ 430 ohm) and regular ITO pattern or electrode.In advance roasting temperature and time scope is: 60 degree ~ 150 degree, and 50 seconds to 200 seconds, exposure energy adopted 100mj to 500mj, and it is alkaline solution that developer solution adopts Na system or Ka, and the temperature of development adopts 20 ~ 40 degree constant temperature operations.The soup that the ITO etching solution adopts hydrochloric acid and nitric acid to mix by a certain percentage drops between 1 ~ 3 its sour pH value, etch temperature operation between 40 ~ 50 degree.Take off photoresistance film liquid and adopt dimethyl sulfoxide and monoethanolamine to mix according to a certain percentage, number percent is 70%:30%, the operation between 40 ~ 80 degree of demoulding temperature.
The formation of first insulation course:
Process ITO crosses the transparent glass substrate behind the bridge electrode; Be coated with the uniform negativity photoresist of a layer thickness at its ITO face, negativity photoresist major component is an acetate propylene glycol monomethyl ether ester, the acrylic resin; Epoxy resin and negative photosensitive agent, photoresistance coating thickness are 0.5um ~ 3um; Coating negativity photoresist mode has spin coating, modes such as blade coating.
Roasting in advance through photoresistance through product after the above-mentioned processing procedure, exposure is developed, and finally forming thickness is the insulating layer pattern of 0.5 ~ 3um and rule.In advance roasting temperature and time scope is: 60 degree ~ 150 degree, and 50 seconds to 200 seconds, exposure energy adopted 100mj to 500mj, and it is alkaline solution that developer solution adopts Na system or Ka, and the temperature of development adopts 20 ~ 40 degree constant temperature operations.It is roasting firmly to pass through insulation course again, and condition is 200 to spend to 300 degree, and the time is half an hour to 3 hour, and through behind the above-mentioned processing procedure, finally forming thickness is 0.5um ~ 3um, the insulation course 1 of figure rule.
The formation of ITO electrode layer:
Form the transparent glass substrate of first insulation course, pass through the ITO plated film once more, make on glass substrate, to form layer of transparent and the uniform ITO rete of thickness, its thickness is 50 Ethylmercurichlorendimides ~ 2000 Ethylmercurichlorendimides (face resistance is 10 ~ 430 ohm); The ITO material is made up of In2O3 and SnO2, and its mass ratio is 85 ~ 95:5 ~ 15.The mode of ITO plated film has the vacuum magnetic control sputter, chemical vapour deposition technique, hot vapor deposition, collosol and gel.
Through the glass substrate of ITO plated film, at the uniform positivity photoresist of its ITO surface coated one layer thickness, positivity photoresist major component is an acetate propylene glycol monomethyl ether ester, epoxy resin and photosensitive material; The photoresistance coating thickness is 1um ~ 5um.Coating photoresist mode has roller coating, spin coating, modes such as blade coating.
Roasting in advance through photoresistance through product after the above-mentioned processing procedure, exposure is developed, and the photoresistance film is taken off in etching, and finally forming thickness is 50 ~ 2000 Ethylmercurichlorendimides (face resistance is 10 ~ 430 ohm) and regular ITO pattern or electrode.In advance roasting temperature and time scope is: 60 degree ~ 150 degree, and 50 seconds to 200 seconds, exposure energy adopted 100mj to 500mj, and it is alkaline solution that developer solution adopts Na system or Ka, and the temperature of development adopts 20 ~ 40 degree constant temperature operations.The soup that the ITO etching solution adopts hydrochloric acid and nitric acid to mix by a certain percentage drops between 1 ~ 3 its sour pH value, etch temperature operation between 40 ~ 50 degree.Take off photoresistance film liquid and adopt dimethyl sulfoxide and monoethanolamine to mix according to a certain percentage, number percent is 70%:30%, the operation between 40 ~ 80 degree of demoulding temperature.
Described ITO electrode comprises that capacitance plate drives (ITO electrode 1) and induction electrode (ITO electrode 2), has the regular figure structure; ITO electrode 1 and ITO electrode 2 are in same aspect, and be separate, mutually insulated, vertical design.
The formation of metal electrode layer:
Form the glass substrate of ITO electrode layer, pass through metal coating again, make on glass substrate, to form a layer thickness even metal rete, its thickness is 500 Ethylmercurichlorendimides ~ 4000 Ethylmercurichlorendimides.The metallic diaphragm material is MoNb; AlNd; MoNb piles up the sandwich structure that forms; Thickness is in 50 Ethylmercurichlorendimides ~ 500 Ethylmercurichlorendimides: 500 Ethylmercurichlorendimides ~ 3000 Ethylmercurichlorendimides: 50 Ethylmercurichlorendimides ~ 500 Ethylmercurichlorendimide ratios collocation, and wherein Mo and Nb mass ratio are 85 ~ 95:5 ~ 15 in the MoNb alloy material, Al and Nd mass ratio are 95 ~ 98:2 ~ 5 in the AlNd alloy material.The metal material type selecting also can be made up of silver alloy or aldary, and composition combines by a certain percentage.Metal coating is the vacuum magnetic control sputter.
Glass substrate through metal coating is coated with the uniform positivity photoresist of a layer thickness in its metal surface, positivity photoresist major component is an acetate propylene glycol monomethyl ether ester, epoxy resin and photosensitive material; The photoresistance coating thickness is 1um ~ 5um.Coating photoresist mode has roller coating, spin coating, modes such as blade coating.Roasting in advance through photoresistance through product after the above-mentioned processing procedure, exposure is developed, and the photoresistance film is taken off in etching, and finally forming thickness is 500 ~ 4000 Ethylmercurichlorendimides and regular metal pattern or electrode.In advance roasting temperature and time scope is: 60 degree ~ 150 degree, and 50 seconds to 200 seconds, exposure energy adopted 100mj to 500mj, and it is alkaline solution that developer solution adopts Na system or Ka, and the temperature of development adopts 20 ~ 40 degree constant temperature operations.The soup that metal etch liquid adopts phosphoric acid, acetic acid and nitric acid to mix by a certain percentage, etch temperature operation between 40 ~ 50 degree.Take off photoresistance film liquid and adopt dimethyl sulfoxide and monoethanolamine to mix according to a certain percentage, number percent is 70%:30%, the operation between 40 ~ 80 degree of demoulding temperature.
Described metal electrode circuit wiring is only in the black resin zone, and viewfinder area does not have metal electrode.
The formation of second insulation course:
Through the glass substrate behind the metal electrode; Be coated with the uniform negativity photoresist of a layer thickness at its metal face; Negativity photoresist major component is an acetate propylene glycol monomethyl ether ester, acrylic resin, epoxy resin and negative photosensitive agent (commodity Taiwan Da Xing company by name produces POC A46); The photoresistance coating thickness is 0.5um ~ 3um.Coating negativity photoresist mode has spin coating, modes such as blade coating.
Roasting in advance through photoresistance through product after the above-mentioned processing procedure, exposure is developed, and finally forming thickness is the insulating layer pattern of 0.5 ~ 3um and rule.In advance roasting temperature and time scope is: 60 degree ~ 150 degree, and 50 seconds to 200 seconds, exposure energy adopted 100mj to 500mj, and it is alkaline solution that developer solution adopts Na system or Ka, and the temperature of development adopts 20 ~ 40 degree constant temperature operations.It is roasting firmly to pass through insulation course again, and condition is 200 to spend to 300 degree, and the time is 0.5 hour to 3 hours, and through behind the above-mentioned processing procedure, finally forming thickness is 0.5um ~ 3um, second insulation course of figure rule.
Above content is the further explain that combines concrete preferred implementation that the utility model is done, and can not assert that the practical implementation of the utility model is confined to these explanations.For the those of ordinary skill of technical field under the utility model, under the prerequisite that does not break away from the utility model design, can also make some simple deduction or replace, all should be regarded as belonging to the protection domain of the utility model.
Claims (4)
1. ITO gap bridge integral type capacitance touch screen, it is characterized in that: comprise transparency carrier, the black resin layer, the ITO that stack gradually in transparency carrier cross bridge electrode, first insulation course, ITO electrode, metal electrode and second insulation course; Described ITO electrode comprises that capacitance plate drives and induction electrode, has the regular figure structure; Capacitance plate driving and induction electrode are in same aspect, and be separate, mutually insulated, vertical design; Said transparency carrier comprises viewfinder area and non-viewfinder area, and black resin layer is distributed in the non-viewfinder area of display screen; Described metal electrode circuit wiring is only at the black resin layer region.
2. ITO gap bridge integral type capacitance touch screen as claimed in claim 1 is characterized in that: described transparency carrier is the chemically reinforced glass substrate of thickness at 0.5mm～2.0mm; Said ITO electrode regular texture is a rhombus, or bar shaped, or box-shaped, or snowflake type, or cross.
3. ITO gap bridge integral type capacitance touch screen as claimed in claim 2, it is characterized in that: described black resin layer thickness is 0.3um～5um; ITO gap bridge thickness of electrode is 50 Ethylmercurichlorendimides～2000 Ethylmercurichlorendimides; The thickness of first insulation course is 0.5～3um; The ITO electrode layers thickness is 50～2000 Ethylmercurichlorendimides; The thickness of metal electrode layer is 500～4000 Ethylmercurichlorendimides; Second thickness of insulating layer is 0.5～3um.
4. ITO gap bridge integral type capacitance touch screen as claimed in claim 3; It is characterized in that: the metallic diaphragm of described metal coating is MoNb; AlNd; MoNb piles up the sandwich structure form, and three's thickness is by 50 Ethylmercurichlorendimides～500 Ethylmercurichlorendimides: 500 Ethylmercurichlorendimides～3000 Ethylmercurichlorendimides: 50 Ethylmercurichlorendimides～500 Ethylmercurichlorendimide ratios are arranged in pairs or groups.
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| CN2011202975582U CN202177885U (en) | 2011-08-16 | 2011-08-16 | Indium tin oxide (ITO) gap bridge integrated capacitive touch screen |
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| CN2011202975582U CN202177885U (en) | 2011-08-16 | 2011-08-16 | Indium tin oxide (ITO) gap bridge integrated capacitive touch screen |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013117130A1 (en) * | 2012-02-09 | 2013-08-15 | 深圳市宝明科技股份有限公司 | Non-lapping integrated capacitive touch screen without metal electrode layer and manufacturing method thereof |
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2011
- 2011-08-16 CN CN2011202975582U patent/CN202177885U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013117130A1 (en) * | 2012-02-09 | 2013-08-15 | 深圳市宝明科技股份有限公司 | Non-lapping integrated capacitive touch screen without metal electrode layer and manufacturing method thereof |
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Owner name: HUIZHOU BAOMING PRECISION INDUSTRY CO., LTD. Free format text: FORMER OWNER: SHENZHEN BAOMING TECHNOLOGY CO., LTD. Effective date: 20120424 |
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Effective date of registration: 20120424 Address after: 516000 Comprehensive Industrial Park, Western Dayawan, Guangdong, Huizhou Patentee after: Huizhou Baoming Seiko Co., Ltd. Address before: 518000, District, Guangdong City, Baoan District Province, Guanlan Road, Niu Tai Lake paddy Industry Park, B District Patentee before: Shenzhen Baoming Technology Co., Ltd. |
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