CN102096537A - Machining method of capacitive touch screen - Google Patents

Machining method of capacitive touch screen Download PDF

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Publication number
CN102096537A
CN102096537A CN 201110066869 CN201110066869A CN102096537A CN 102096537 A CN102096537 A CN 102096537A CN 201110066869 CN201110066869 CN 201110066869 CN 201110066869 A CN201110066869 A CN 201110066869A CN 102096537 A CN102096537 A CN 102096537A
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solute
touch screen
capacitive touch
job operation
shielding film
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CN 201110066869
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CN102096537B (en
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张晓辉
金弼
王战娥
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SHENZHEN CSG APPLIED TECHNOLOGY Co.,Ltd.
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SHENZHEN CSG DISPLAY DEVICES CO Ltd
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Abstract

The invention discloses a machining method of a capacitive touch screen. A water-soluble shielding film is formed at an electrode outer end region where an indium-tin oxide (ITO) electrode layer and a metal lead electrode layer are connected with a flexible circuit board, a silicon dioxide film is coated, and the shielding film and the silicon dioxide film covered on the shielding film are washed by washing liquor, so that the aim of locally covering the silicon dioxide film is fulfilled. The method is easy to operate. Compared with the conventional method for shielding by using a metal cover, the method has the advantages that: relative displacement of the metal cover and a substrate due to temperature change is avoided in a vacuum sputtering coating process, so that the substrate is prevented from being scratched, pattern accuracy is enhanced, and machining operation is convenient.

Description

The job operation of capacitive touch screen
[technical field]
The present invention relates to a kind of job operation of capacitive touch screen.
[background technology
Capacitive touch screen is widely used in various information as a kind of emerging information input mode and shows product, as touch-screen mobile phone, GPS navigation system etc.
The chief component of conventional condenser touch-screen is the metal lead wire electrode tunic that deposits on the ito transparent electrode film that deposits on substrate, the substrate, the substrate, the silicon dioxide film that covers ito transparent electrode and metal lead wire electrode layer and the transparent resin film that covers silicon dioxide film.Ito transparent electrode constitutes capacitive transducer, metal lead wire couples together directions X ito transparent electrode and flexible circuit board, the ITO electrode tip couples together Y direction ito transparent electrode and flexible circuit board, and silicon dioxide and resin molding are reliability and the permanance that strengthens touch screen device.Silicon dioxide film will cover protected ito transparent electrode and metal lead wire electrode layer; the electrode outer end region of ITO electrode layer and metal lead wire electrode layer is because of being connected with flexible circuit board; can not be covered by silicon dioxide film, need stop by some way in order to avoid covered by silicon dioxide film.
Traditional method is to adopt the local plated film of metal shadowing plate, adding metal before the vacuum sputtering applying silicon oxide covers on the substrate, the sheet metal that adopts hollow out is as metal cap, the metal cap contraposition is clung on the substrate, cover zone, metal lead wire electrode layer outer end, open wide the zone that needs applying silicon oxide.In this method, the thermal expansivity of metal cap and substrate is different, and temperature can change in the vacuum sputtering coating process, just has relative displacement between metal cap and the substrate, thereby can scratch substrate, reduces the pattern precision.
[summary of the invention]
Based on this, be necessary to provide a kind of job operation of avoiding scratching and guaranteeing the condenser type touch screen substrate of pattern precision.
A kind of job operation of capacitive touch screen comprises the steps:
Step 1, provide the substrate that deposits ITO electrode rete and metal lead wire electrode rete;
Step 2, will cover the electrode outer end region that is connected with flexible circuit board that liquid is uniformly coated on the ITO electrode layer and the metal lead wire electrode layer of described substrate, the oven dry back forms water miscible shielding film;
Step 3, the substrate surface formation silicon dioxide film that uses vacuum splashing and plating to obtain in step 2;
Step 4, the substrate that step 3 is obtained use washing lotion to soak or spray, remove described shielding film and cover silicon dioxide film on the described shielding film.
Preferably, in the step 2, the described liquid that covers comprises aqueous solvent, is dissolvable in water water and is used to form first solute of described shielding film and improves described second solute that covers the liquid character of surface;
The number percent that the gross mass of described first solute and described second solute accounts for solution quality is 5~30%;
Described first solute and the described second solute mass ratio are 1: 0.1~1: 1.
Preferably, described first solute is soluble ester or water-soluble sugar.
Preferably, described first solute is gallicin, alpha-lactose or beta lactose.
Preferably, described second solute is anionic surface active agent or non-ionics.
Preferably, described second solute is lauryl sodium sulfate, neopelex, NPE, polysorbas20, polysorbate40 or polysorbate60.
Preferably, to account for the number percent of solution quality be 10~20% to the gross mass of described first solute and described second solute;
Described first solute and the described second solute mass ratio are 1: 0.2~1: 0.8.
Preferably, adopt the mode of serigraphy, letterpress or inkjet printing that the described liquid that covers evenly is coated with in the step 2.
Preferably, in the step 2, described drying condition is 100~150 ℃ to be descended 10~20 minutes.
Preferably, in the step 4, described washing lotion is water or weakly alkaline solution.
The job operation of this capacitive touch screen forms water miscible shielding film by the electrode outer end region that is connected with flexible circuit board at ITO electrode layer and metal lead wire electrode layer, applying silica film more afterwards, again with washing lotion flush away shielding film and cover silicon dioxide film on the shielding film, to reach the local purpose that covers silicon dioxide film.This method is simple to operate, method with respect to tradition adopts metal cap to cover can not produce relative displacement owing to temperature variation makes between metal cap and the substrate, thereby avoid scratching substrate in the vacuum sputtering coating process, improve the pattern precision, make things convenient for process operation.
[description of drawings]
Fig. 1 is the process flow diagram of job operation of the capacitive touch screen of an embodiment;
Fig. 2 shows the synoptic diagram of the capacitive touch screen that process steps S10 obtains for Fig. 1.
[embodiment]
Be further described below in conjunction with the job operation of drawings and Examples capacitive touch screen.
The job operation of capacitive touch screen as shown in Figure 1 comprises the steps:
S10, provide the substrate that deposits ITO electrode rete and metal lead wire electrode rete
In conjunction with Fig. 2, ITO electrode layer 200 comprises directions X ITO electrode 210, Y direction ITO electrode 220 and the first electrode outer end 230 that is connected with flexible circuit board; The metal lead wire electrode layer comprises link 310 that links to each other with directions X ITO electrode layer 210 and the second electrode outer end 320 that is connected with flexible circuit board.The first electrode outer end 230 and the 320 common electrode outer ends of forming, the second electrode outer end.
Wherein, the first electrode outer end 230 and the second electrode outer end 320 can not be covered by silicon dioxide film.
S20, will cover the electrode outer end region that liquid is uniformly coated on described substrate behind S10, the oven dry back forms water miscible shielding film
Liquid is covered in preparation, adopts the mode of serigraphy, letterpress or inkjet printing to make to cover liquid to be uniformly coated on 230 zone and 320 zones, the second electrode outer end, the first electrode outer end, and the oven dry back forms water miscible shielding film.
Cover liquid and comprise aqueous solvent, be dissolvable in water water and be used to form first solute of described shielding film and improve described second solute that covers the liquid character of surface, the number percent that the gross mass of described first solute and described second solute accounts for solution quality is 5~30%.
In a preferred embodiment, the number percent that the gross mass of described first solute and described second solute accounts for solution quality is 10~20%, and the screening effect of the shielding film that form this moment is better, and conservation.
In the present embodiment, the number percent that the gross mass of described first solute and described second solute accounts for solution quality is 15%.
First solute and the second solute mass ratio can be 1: 0.1~1: 1.
In a preferred embodiment, first solute and the second solute mass ratio are 1: 0.2~1: 0.8, and the shielding film dispersion effect that form this moment is best.
In the present embodiment, first solute and the second solute mass ratio are 1: 0.2.
First solute is used to form and covers rete, first solute can be after solvent evaporation, in room temperature to 200 ℃, form even, stable solid rete, can select organism such as soluble ester or water-soluble sugar, concrete can enumerating as gallicin, alpha-lactose, beta lactose etc.
In the present embodiment, first solute is a beta lactose.
First solute adopts water soluble organic substance, and environmental protection is reliable.
Second solute plays and improves the effect of covering the liquid character of surface, makes that covering liquid can evenly cover the capacitance touch screen surfaces.
Second solute is typically chosen in anionic surface active agent or non-ionics, concrete can enumerating as lauryl sodium sulfate, neopelex, NPE, polysorbas20, polysorbate40, polysorbate60 etc.
In the present embodiment, second solute is a lauryl sodium sulfate.
Oven dry is to dry 10~20 minutes down at 100~150 ℃, makes the solvent evaporation of covering in the liquid, and the preliminary crystallization of first solute also forms even, stable solid rete.
In the present embodiment, oven dry is to dry 20 minutes down at 120 ℃.
S30, usefulness vacuum splashing and plating method form silicon dioxide film at described substrate surface behind S20
In the vacuum splashing and plating process, touch screen base material can vacuumize earlier and preheat, thereby makes further crystallization of first solute and film forming, and film surface has micron-sized micro-crack and roughness.Again at touch screen surface sputter silicon dioxide, the silicon dioxide on shielding film was discontinuous and tomography was arranged do not have the silicon dioxide on the shielding film zone then to form continuous, fine and close rete this moment subsequently.
General, the thickness of silicon dioxide film is 35~65nm; In the present embodiment, the thickness of silicon dioxide film is 50nm.
S40, remove shielding film and cover silicon dioxide film on the shielding film
The preparation washing lotion, the base material that S30 is obtained soaks or spray with washing lotion, silicon dioxide film on the shielding film is discontinuous and tomography arranged, make washing lotion can infiltrate and dissolve shielding film, thereby remove shielding film and cover silicon dioxide film on the shielding film, thereby do not have the silicon dioxide in shielding film zone owing to be that continuous and fine and close rete then can dissolvedly not remain.
Washing lotion can be dissolved first solute, thereby can dissolve shielding film.
After using washing lotion with the shielding film dissolving, the silicon dioxide film that covers on the shielding film comes off, the silicon dioxide film that directly overlays on directions X ITO electrode 210, Y direction ITO electrode 220 and the metal lead wire electrode layer 310 then can not come off, and reaches the local purpose that covers silicon dioxide film.
Washing lotion is water or weakly alkaline solution, and weakly alkaline solution generally can be selected NaHCO 3Solution, Na 2CO 3Solution, KOH solution etc.
In the present embodiment, washing lotion is 0.3% KOH solution.
The job operation of this capacitive touch screen is by forming water miscible shielding film in the electrode outer end, and applying silica film more afterwards is again with washing lotion flush away shielding film and cover silicon dioxide film on the shielding film, to reach the local purpose that covers silicon dioxide film.
This method is simple to operate, method with respect to tradition adopts metal cap to cover can not produce relative displacement owing to temperature variation makes between metal cap and the substrate, thereby avoid scratching substrate in the vacuum sputtering coating process, improve the pattern precision, make things convenient for process operation.
The above embodiment has only expressed one or more embodiments of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.

Claims (10)

1. the job operation of a capacitive touch screen is characterized in that, comprises the steps:
Step 1, provide the substrate that deposits ITO electrode rete and metal lead wire electrode rete;
Step 2, will cover the electrode outer end region that is connected with flexible circuit board that liquid is uniformly coated on the ITO electrode layer and the metal lead wire electrode layer of described substrate, the oven dry back forms water miscible shielding film;
Step 3, the substrate surface formation silicon dioxide film that uses vacuum splashing and plating to obtain in step 2;
Step 4, the substrate that step 3 is obtained use washing lotion to soak or spray, remove described shielding film and cover silicon dioxide film on the described shielding film.
2. the job operation of capacitive touch screen as claimed in claim 1, it is characterized in that, in the step 2, the described liquid that covers comprises aqueous solvent, is dissolvable in water first solute that is used to form described shielding film of water and improves described second solute that covers the liquid character of surface;
The number percent that the gross mass of described first solute and described second solute accounts for solution quality is 5~30%;
Described first solute and the described second solute mass ratio are 1: 0.1~1: 1.
3. the job operation of capacitive touch screen as claimed in claim 2 is characterized in that, described first solute is soluble ester or water-soluble sugar.
4. the job operation of capacitive touch screen as claimed in claim 3 is characterized in that, described first solute is gallicin, alpha-lactose or beta lactose.
5. the job operation of capacitive touch screen as claimed in claim 2 is characterized in that, described second solute is anionic surface active agent or non-ionics.
6. the job operation of capacitive touch screen as claimed in claim 5 is characterized in that, described second solute is lauryl sodium sulfate, neopelex, NPE, polysorbas20, polysorbate40 or polysorbate60.
7. as the job operation of each described capacitive touch screen in the claim 2~6, it is characterized in that,
The number percent that the gross mass of described first solute and described second solute accounts for solution quality is 10~20%;
Described first solute and the described second solute mass ratio are 1: 0.2~1: 0.8.
8. the job operation of capacitive touch screen as claimed in claim 1 is characterized in that, adopts the mode of serigraphy, letterpress or inkjet printing that the described liquid that covers evenly is coated with in the step 2.
9. the job operation of capacitive touch screen as claimed in claim 1 is characterized in that, in the step 2, described drying condition is 100~150 ℃ to be descended 10~20 minutes.
10. the job operation of condenser type touch screen substrate as claimed in claim 1 is characterized in that, in the step 4, described washing lotion is water or weakly alkaline solution.
CN 201110066869 2011-03-18 2011-03-18 Machining method of capacitive touch screen Active CN102096537B (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102566846A (en) * 2012-01-19 2012-07-11 深圳秋田微电子有限公司 Protection type metal wire of capacitance touch screen
CN102662547A (en) * 2012-04-09 2012-09-12 天津美泰真空技术有限公司 Production method for capacitive touch screen glass cover plate without metal wires in view area
WO2013023493A1 (en) * 2011-08-16 2013-02-21 深圳市宝明科技股份有限公司 Ito through hole capacitive touch screen and manufacturing method therefor
WO2013023489A1 (en) * 2011-08-16 2013-02-21 深圳市宝明科技股份有限公司 Metal crossover single-body capacitive touch screen and manufacturing method
WO2013023492A1 (en) * 2011-08-16 2013-02-21 深圳市宝明科技股份有限公司 Ito crossover capacitive touch screen and manufacturing method
CN103294309A (en) * 2013-05-09 2013-09-11 晟光科技股份有限公司 Manufacture method of black frame of OGS (one glass solution) touch screen
CN107329637A (en) * 2017-06-14 2017-11-07 合肥市惠科精密模具有限公司 A kind of AMOLE method for processing display screen

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101410779A (en) * 2006-06-12 2009-04-15 夏普株式会社 Touch panel, display device and touch panel manufacturing method
CN101464761A (en) * 2009-01-05 2009-06-24 中国南玻集团股份有限公司 Condenser type touch screen
CN101853114A (en) * 2010-05-18 2010-10-06 程抒一 Capacitive touch screen with electrodes and manufacturing method thereof
CN201654748U (en) * 2010-04-23 2010-11-24 新应材股份有限公司 Capacitor type touch panel

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101410779A (en) * 2006-06-12 2009-04-15 夏普株式会社 Touch panel, display device and touch panel manufacturing method
CN101464761A (en) * 2009-01-05 2009-06-24 中国南玻集团股份有限公司 Condenser type touch screen
CN201654748U (en) * 2010-04-23 2010-11-24 新应材股份有限公司 Capacitor type touch panel
CN101853114A (en) * 2010-05-18 2010-10-06 程抒一 Capacitive touch screen with electrodes and manufacturing method thereof

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013023493A1 (en) * 2011-08-16 2013-02-21 深圳市宝明科技股份有限公司 Ito through hole capacitive touch screen and manufacturing method therefor
WO2013023489A1 (en) * 2011-08-16 2013-02-21 深圳市宝明科技股份有限公司 Metal crossover single-body capacitive touch screen and manufacturing method
WO2013023492A1 (en) * 2011-08-16 2013-02-21 深圳市宝明科技股份有限公司 Ito crossover capacitive touch screen and manufacturing method
CN102566846A (en) * 2012-01-19 2012-07-11 深圳秋田微电子有限公司 Protection type metal wire of capacitance touch screen
CN102566846B (en) * 2012-01-19 2015-04-22 深圳秋田微电子有限公司 Protection type metal wire of capacitance touch screen
CN102662547A (en) * 2012-04-09 2012-09-12 天津美泰真空技术有限公司 Production method for capacitive touch screen glass cover plate without metal wires in view area
CN103294309A (en) * 2013-05-09 2013-09-11 晟光科技股份有限公司 Manufacture method of black frame of OGS (one glass solution) touch screen
CN103294309B (en) * 2013-05-09 2017-09-26 晟光科技股份有限公司 A kind of preparation method of OGS touch screen dark border
CN107329637A (en) * 2017-06-14 2017-11-07 合肥市惠科精密模具有限公司 A kind of AMOLE method for processing display screen

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Effective date of registration: 20210707

Address after: 518000 Shekou Industrial six road, Nanshan District, Shenzhen, Guangdong

Patentee after: SHENZHEN CSG APPLIED TECHNOLOGY Co.,Ltd.

Address before: 518000 south glass industrial building, No.33, Yanshan Road, Shekou, Nanshan District, Shenzhen City, Guangdong Province

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