WO2009041685A1 - シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 - Google Patents
シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 Download PDFInfo
- Publication number
- WO2009041685A1 WO2009041685A1 PCT/JP2008/067653 JP2008067653W WO2009041685A1 WO 2009041685 A1 WO2009041685 A1 WO 2009041685A1 JP 2008067653 W JP2008067653 W JP 2008067653W WO 2009041685 A1 WO2009041685 A1 WO 2009041685A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- quartz glass
- crucible
- quartz
- semi
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/10—Melting processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/303,147 US8871026B2 (en) | 2007-09-28 | 2008-09-29 | Vitreous silica crucible for pulling single-crystal silicon and method of manufacturing the same |
EP08825825.6A EP2202335B1 (en) | 2007-09-28 | 2008-09-29 | Quartz glass crucible for pulling silicon single crystal and method for manufacturing the crucible |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007256156A JP5229778B2 (ja) | 2007-09-28 | 2007-09-28 | シリコン単結晶引き上げ用石英ガラスルツボの製造方法 |
JP2007-256156 | 2007-09-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009041685A1 true WO2009041685A1 (ja) | 2009-04-02 |
Family
ID=40511563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/067653 WO2009041685A1 (ja) | 2007-09-28 | 2008-09-29 | シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8871026B2 (ja) |
EP (1) | EP2202335B1 (ja) |
JP (1) | JP5229778B2 (ja) |
KR (1) | KR20100069532A (ja) |
TW (1) | TWI382002B (ja) |
WO (1) | WO2009041685A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019163192A (ja) * | 2018-03-20 | 2019-09-26 | 日本電気硝子株式会社 | 放射線検出用ガラスの製造方法 |
JP2020186145A (ja) * | 2019-05-13 | 2020-11-19 | 株式会社Sumco | シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法 |
JP2022093544A (ja) * | 2018-02-28 | 2022-06-23 | 株式会社Sumco | シリカガラスルツボ |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8240169B2 (en) * | 2009-01-08 | 2012-08-14 | Japan Super Quartz Corporation | Vitreous silica crucible manufacturing apparatus |
JP5397857B2 (ja) * | 2009-10-20 | 2014-01-22 | 株式会社Sumco | 石英ガラスルツボの製造方法および製造装置 |
JP5574534B2 (ja) | 2010-12-28 | 2014-08-20 | 株式会社Sumco | 複合ルツボ |
US20150086464A1 (en) * | 2012-01-27 | 2015-03-26 | Gtat Corporation | Method of producing monocrystalline silicon |
SG11201508512PA (en) * | 2013-05-23 | 2015-12-30 | Applied Materials Inc | A coated liner assembly for a semiconductor processing chamber |
JP6123001B2 (ja) * | 2016-05-31 | 2017-04-26 | 株式会社Sumco | シリカガラスルツボの評価方法、シリコン単結晶の製造方法 |
KR101829291B1 (ko) * | 2016-08-05 | 2018-02-19 | 에스케이실트론 주식회사 | 도가니 및 이를 포함하는 단결정 성장 장치 |
US20180086132A1 (en) * | 2016-09-26 | 2018-03-29 | Robert Moore | Storage Organizer |
CN108531980B (zh) * | 2018-05-29 | 2020-12-11 | 宁夏富乐德石英材料有限公司 | 改良石英坩埚及其制作方法 |
DE112019006417B4 (de) | 2018-12-27 | 2024-03-21 | Sumco Corporation | Quarzglastiegel und herstellungsverfahren für einen silicium-einkristall |
JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63145984A (ja) * | 1986-12-09 | 1988-06-18 | Toshiba Glass Co Ltd | 線量計用ガラス素子 |
JPH0753295A (ja) * | 1993-08-10 | 1995-02-28 | Toshiba Ceramics Co Ltd | 石英ガラスルツボ |
JP2004123508A (ja) * | 2002-08-01 | 2004-04-22 | Tosoh Corp | 石英ガラス部品及びその製造方法並びにそれを用いた装置 |
JP2004299927A (ja) * | 2003-03-28 | 2004-10-28 | Japan Siper Quarts Corp | 石英ガラスルツボ |
JP2004352580A (ja) * | 2003-05-30 | 2004-12-16 | Japan Siper Quarts Corp | シリコン単結晶引上用石英ガラスルツボとその引上方法 |
JP2005239533A (ja) * | 2004-08-06 | 2005-09-08 | Shinetsu Quartz Prod Co Ltd | シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法 |
JP2007153625A (ja) * | 2005-11-30 | 2007-06-21 | Japan Siper Quarts Corp | 結晶化し易い石英ガラス部材とその用途 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3014311C2 (de) | 1980-04-15 | 1982-06-16 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Verfahren zur Herstellung von Quarzglastiegeln und Vorrichtung zur Durchführung dieses Verfahrens |
JPS61182952U (ja) * | 1985-04-27 | 1986-11-14 | ||
US4935046A (en) | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
JPH0729871B2 (ja) * | 1987-12-03 | 1995-04-05 | 信越半導体 株式会社 | 単結晶引き上げ用石英るつぼ |
JP3100836B2 (ja) | 1994-06-20 | 2000-10-23 | 信越石英株式会社 | 石英ガラスルツボとその製造方法 |
JP4285788B2 (ja) * | 1996-03-14 | 2009-06-24 | 信越石英株式会社 | 単結晶引き上げ用大口径石英るつぼの製造方法 |
JP3583604B2 (ja) | 1998-01-12 | 2004-11-04 | 東芝セラミックス株式会社 | 石英ガラスルツボとその製造方法 |
JP2000159593A (ja) * | 1998-11-24 | 2000-06-13 | Toshiba Ceramics Co Ltd | 石英ガラスるつぼの製造方法 |
JP4454059B2 (ja) | 1999-01-29 | 2010-04-21 | 信越石英株式会社 | シリコン単結晶引き上げ用大口径石英ガラスるつぼ |
US7118789B2 (en) | 2001-07-16 | 2006-10-10 | Heraeus Shin-Etsu America | Silica glass crucible |
US20030012899A1 (en) | 2001-07-16 | 2003-01-16 | Heraeus Shin-Etsu America | Doped silica glass crucible for making a silicon ingot |
JP2003095678A (ja) | 2001-07-16 | 2003-04-03 | Heraeus Shin-Etsu America | シリコン単結晶製造用ドープ石英ガラスルツボ及びその製造方法 |
US6641663B2 (en) | 2001-12-12 | 2003-11-04 | Heracus Shin-Estu America | Silica crucible with inner layer crystallizer and method |
KR100913116B1 (ko) | 2002-04-04 | 2009-08-19 | 토소가부시키가이샤 | 석영유리 용사부품 및 그 제조방법 |
JP4076416B2 (ja) | 2002-09-20 | 2008-04-16 | コバレントマテリアル株式会社 | 石英ルツボとその製造方法 |
-
2007
- 2007-09-28 JP JP2007256156A patent/JP5229778B2/ja active Active
-
2008
- 2008-09-29 US US12/303,147 patent/US8871026B2/en active Active
- 2008-09-29 WO PCT/JP2008/067653 patent/WO2009041685A1/ja active Application Filing
- 2008-09-29 KR KR1020087029178A patent/KR20100069532A/ko not_active Application Discontinuation
- 2008-09-29 EP EP08825825.6A patent/EP2202335B1/en active Active
- 2008-09-30 TW TW097137539A patent/TWI382002B/zh not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63145984A (ja) * | 1986-12-09 | 1988-06-18 | Toshiba Glass Co Ltd | 線量計用ガラス素子 |
JPH0753295A (ja) * | 1993-08-10 | 1995-02-28 | Toshiba Ceramics Co Ltd | 石英ガラスルツボ |
JP2004123508A (ja) * | 2002-08-01 | 2004-04-22 | Tosoh Corp | 石英ガラス部品及びその製造方法並びにそれを用いた装置 |
JP2004299927A (ja) * | 2003-03-28 | 2004-10-28 | Japan Siper Quarts Corp | 石英ガラスルツボ |
JP2004352580A (ja) * | 2003-05-30 | 2004-12-16 | Japan Siper Quarts Corp | シリコン単結晶引上用石英ガラスルツボとその引上方法 |
JP2005239533A (ja) * | 2004-08-06 | 2005-09-08 | Shinetsu Quartz Prod Co Ltd | シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法 |
JP2007153625A (ja) * | 2005-11-30 | 2007-06-21 | Japan Siper Quarts Corp | 結晶化し易い石英ガラス部材とその用途 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2202335A4 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022093544A (ja) * | 2018-02-28 | 2022-06-23 | 株式会社Sumco | シリカガラスルツボ |
JP7408057B2 (ja) | 2018-02-28 | 2024-01-05 | 株式会社Sumco | シリカガラスルツボ |
JP2019163192A (ja) * | 2018-03-20 | 2019-09-26 | 日本電気硝子株式会社 | 放射線検出用ガラスの製造方法 |
JP7022386B2 (ja) | 2018-03-20 | 2022-02-18 | 日本電気硝子株式会社 | 放射線検出用ガラスの製造方法 |
JP2020186145A (ja) * | 2019-05-13 | 2020-11-19 | 株式会社Sumco | シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法 |
JP7172844B2 (ja) | 2019-05-13 | 2022-11-16 | 株式会社Sumco | シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20100069532A (ko) | 2010-06-24 |
EP2202335A4 (en) | 2011-09-14 |
US8871026B2 (en) | 2014-10-28 |
EP2202335B1 (en) | 2017-03-22 |
JP5229778B2 (ja) | 2013-07-03 |
EP2202335A1 (en) | 2010-06-30 |
TW200922889A (en) | 2009-06-01 |
TWI382002B (zh) | 2013-01-11 |
US20100236473A1 (en) | 2010-09-23 |
JP2009084114A (ja) | 2009-04-23 |
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