WO2004065296A1 - 半導体超微粒子、蛍光体および発光デバイス - Google Patents
半導体超微粒子、蛍光体および発光デバイス Download PDFInfo
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- WO2004065296A1 WO2004065296A1 PCT/JP2004/000585 JP2004000585W WO2004065296A1 WO 2004065296 A1 WO2004065296 A1 WO 2004065296A1 JP 2004000585 W JP2004000585 W JP 2004000585W WO 2004065296 A1 WO2004065296 A1 WO 2004065296A1
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- WIPO (PCT)
- Prior art keywords
- ultrafine particles
- semiconductor
- phosphor
- particles
- group
- Prior art date
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- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
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- WCNWXPJNBDXRJQ-UHFFFAOYSA-L [Na+].[Na+].[O-]OOOOO[O-] Chemical compound [Na+].[Na+].[O-]OOOOO[O-] WCNWXPJNBDXRJQ-UHFFFAOYSA-L 0.000 description 1
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- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
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- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
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- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
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- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
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- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/88—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
- C09K11/881—Chalcogenides
- C09K11/883—Chalcogenides with zinc or cadmium
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133617—Illumination with ultraviolet light; Luminescent elements or materials associated to the cell
Definitions
- the present invention relates to ultrafine semiconductor particles, a phosphor, a method for producing the same, an illuminating device using the phosphor, and a display device.
- display devices and display devices such as displays, which are aggregates thereof, play an important role in mediating various devices and humans.
- the demand for high brightness and high definition of such a display element is unavoidable, and it is required that the display element be as thin and light as possible.
- phosphors with high luminous efficiency and high brightness are indispensable.
- such phosphors have wide applications as lighting materials. For this reason, research on these phosphors has been underway since the early 20th century and has a history of about 100 years.
- dyes and metal ions have been known as phosphors.
- the research is enormous and is constantly being improved today. This is because rare-earth ion-transition metal ions have the advantage that they are less susceptible to deterioration and aging with light irradiation than organic dyes.
- the transition of rare-earth ions or transition metal ions often has the property of forbidden transition, and thus the emission lifetime is about 1 millisecond.
- ultrafine semiconductor particles (not doped with transition metal ions or rare earth ions) subjected to surface treatment show high-efficiency light emission, and have attracted attention.
- the semiconductor ultrafine particles II-VI group compounds are typical, and the diameter is about several nanometers. These exhibit the so-called quantum size effect, and have the property that the band gap increases as the particle size decreases. For this reason, even when ultraviolet light of the same wavelength is irradiated, the emission color changes depending on the diameter, and the smaller the size of the beam, the shorter the wavelength of the light.
- ultrafine semiconductor particles have a large specific surface area due to their small particle size. Therefore, it is important to increase the luminous efficiency by performing surface treatment to reduce surface defects and suppress non-radiative deactivation. is there.
- a compound containing sulfur is suitably used.
- organic surfactants such as carbon and zinc sulfide are typical. Since ultrafine semiconductor particles whose surfaces are well coated with these compounds emit very bright light, recent studies have shown that the luminescence from each particle can be separately detected and separated. This is an excellent property that can never be achieved with rare earth and transition metal phosphors.
- semiconductor ultrafine particles have a great advantage that, when irradiated with light having a wavelength shorter than the band gap, that is, light of one wavelength having a high energy, various emission colors are exhibited according to the particle diameter.
- this phosphor has the advantage that the excitation wavelength can be freely selected, and the same material can emit light of the required wavelength by changing the particle size.
- Such semiconductor ultrafine particles are currently produced by a colloid method, and there are two types: those produced in an aqueous solution and those produced in a non-aqueous solvent.
- a tellurium dome with a fluorescence emission efficiency of about several percent is known as a typical one (Gao et al., Journal of Physics, Chemistry, Bee, Vol. 102, 8360 (1998)).
- the ultrafine particles produced by this method are stable for a while while being dispersed in water, but have the disadvantage that the luminous efficiency is lower than the ultrafine particles produced in a non-aqueous solvent described below.
- ultrafine particles produced by an aqueous solution method have a light emission efficiency of about 40% due to a method of decreasing the pH of a solution after the generation of the ultrafine particles or a method of etching by irradiation with light. It has been reported that it was produced (see Gabonick et al., Journal of Physical Chemistry, B., 106, 7177 (2002)). However, the ultrafine particles obtained by reducing the pH of the solution are unstable, and the luminous efficiency is reduced to less than half in air in about ⁇ days.
- the method of etching ultrafine particles by light irradiation takes about 5 days, and there is a disadvantage that the width of a light emitting spectrum is also widened because the particle size distribution of the produced particles is widened.
- the preparation method in a non-aqueous solvent there is a method of preparing ultrafine particles by pyrolyzing an organic metal. See Hendy et al., Journal of Physical Chemistry, pp. 101, 9463 (1997).) .
- ultrafine particles of cadmium selenide obtained by this method can obtain a luminous efficiency of more than 20%, and the obtained ultrafine particles are insoluble in water, but the surface of the organic particles has an ionizable organic molecule.
- the present invention has been made in view of the state of the art as described above, and its main object is to have a luminance superior to that of conventional phosphors such as rare-earth ions and transition metal ions, and to provide light resistance and aging.
- An object of the present invention is to provide a novel phosphor excellent in stability and the like.
- another object of the present invention is to provide an optical device such as a display device or a lighting device with high luminance using such a phosphor.
- the present inventor has made intensive studies to achieve the above-mentioned object.
- semiconductor ultrafine particles from an aqueous solution
- by appropriately setting conditions such as the amount of surfactant and the purity of water, water dispersibility is good and high luminous efficiency is obtained.
- novel semiconductor ultrafine particles that can maintain high luminous efficiency for a long time even in a solution containing water in an open air atmosphere can be obtained.
- the ultrafine semiconductor particles obtained in this manner are converted into a glass matrix using a sol-gel method. It has been found that when dispersed in a glass, good dispersion and fluorescent performance can be maintained while glass is formed from the metal alkoxide, resulting in a phosphor having excellent performance. Was completed.
- the present invention provides the following semiconductor ultrafine particles, a phosphor, a method for producing the same, a lighting device using the phosphor, and a display device.
- Item 1 A semiconductor characterized by maintaining a photoluminescence luminescence efficiency of 50% or more when held in a water-dispersed state at 10 to 20 for 5 days in an open air atmosphere. Ultra fine particles.
- Item 2 The semiconductor ultrafine particles according to Item 1, which are ultrafine particles of a group I-VI semiconductor.
- Item 3 Water-soluble compounds containing Group II elements (about 0.001 to 0.05 mol / L) and surfactants (Group II contained in aqueous solution) Item 3.
- the semiconductor ultrafine particles according to Item 2 which are measured in a state of being dispersed in an aqueous solution of pH 10 to 12 containing about 1 to 1.5 mol per 1 mol of the element.
- Item 4 The semiconductor ultrafine particles according to Item 2, which are ultrafine particles of telluride force dome.
- Item 5. A phosphor obtained by dispersing the semiconductor ultrafine particles described in any one of Items 1 to 4 in a glass matrix formed by the Zolegel method.
- Item 6 A phosphor obtained by dispersing ultrafine semiconductor particles having a photoluminescence efficiency of 20% or more in glass matrix formed by a sol-gel method.
- Claim 7 The phosphor according to claim 6 concentration semiconductor ultrafine particles in the glass matrix is a 2 X 1 0- 6 ⁇ 2 ⁇ 1 0 one 4 moles Z l.
- Item 8 The phosphor according to any one of Items 5 to 7, wherein the glass matrix is formed by a sol-gel method using organoalkoxysilane as a raw material.
- Item 9 Any one of Items 5 to 8 in which semiconductor ultrafine particles having a reduction rate of photoluminescence luminescence efficiency of 20% or less when dispersed at room temperature for 8 months in an open air atmosphere are dispersed. Phosphor.
- Item 10 Any of Items 2 to 4 described above by introducing a Group VI element compound into an alkaline aqueous solution containing a water-soluble compound containing a Group II element and a surfactant dissolved in an inert atmosphere.
- the amount of the surfactant used is about 1 to about 1.5 moles per mole of the Group 11 element, and water used as the solvent is A method for producing ultrafine semiconductor particles, which is ultrapure water having a specific resistance of 18 8 ⁇ ⁇ cm or more and a total amount of organic compounds in water (TOO 5 ppb or less).
- Item 1 A dispersion of the semiconductor ultrafine particles described in any one of Items 1 to 4 is added to a sol solution containing a metal alkoxide, and a glass matrix is formed by hydrolysis and polycondensation reaction.
- Item 10 The method for producing a phosphor according to any one of Items 5 to 9, wherein
- Item 1 A method in which a dispersion liquid of the semiconductor ultrafine particles described in any one of Items 1 to 4 is added to a sol solution containing a metal alkoxide, and a glass matrix is formed by hydrolysis and polycondensation reaction.
- Item 11 The production method according to item 11, wherein a dispersion liquid of semiconductor ultrafine particles is added when the viscosity of the sol solution containing the metal alkoxide becomes 300 to 300 centipoise.
- Item 13 An illuminant comprising the phosphor described in any one of Items 5 to 9 and a light source that emits excitation light having a wavelength of 320 to 600 nm to excite the phosphor are provided. Light emitting device. BRIEF DESCRIPTION OF THE FIGURES
- FIG. 1 is a graph showing the relationship between the concentration ratio of thioglycolic acid (TGA) to cadmium ion and the photoluminescence luminous efficiency of an ultrafine particle dispersion solution for the semiconductor ultrafine particles obtained in Example 1.
- TGA concentration ratio of thioglycolic acid
- FIG. 2 is a drawing showing an absorption spectrum (a) and a light emission spectrum (b) of the phosphor glass produced in Example 2.
- FIG. 3 is a drawing schematically showing a display device using the phosphor of the present invention.
- FIG. 4 is a drawing schematically showing another example of a display device using the phosphor of the present invention.
- FIG. 5 is a drawing showing the emission spectrum of the phosphor glass prepared in Example 10 and the emission spectrum and absorption spectrum of the ultrafine particles in a solution state. Detailed description of the invention
- the semiconductor ultrafine particles of the present invention have a photoluminescence luminescence efficiency of 50% or more when kept at 10 to 20 ° C. for 5 days while being dispersed in water in an open air atmosphere. The value can be maintained.
- the luminous efficiency can be increased when dispersed in a glass matrix by a method described below.
- Semiconductor ultrafine particles having such characteristics are novel substances that cannot be obtained by conventional manufacturing methods, and are stable for a long time in a solution containing water, for example, in glass formed by a sol-gel method.
- the phosphor can be dispersed and supported at a high concentration, and has excellent mechanical properties, heat resistance, chemical stability, and the like, and can have a high luminous efficiency.
- the "light emission efficiency of photoluminescence of the semiconductor ultrafine particles” in the present specification the absorbed photon (Fuoton) number ([Phi Alpha) photons emitted by photoluminescence for (Fuoton) Number ( ⁇ ⁇ _) ( ⁇ ⁇ ⁇ ⁇ ).
- This luminous efficiency is a value used in the art in a standard manner, and is synonymous with “internal quantum yield”.
- the luminous efficiency is calculated by using a dye molecule whose luminous efficiency is known, and comparing the absorbance at the excitation light wavelength and the luminous efficiency between the dye molecule solution and the object to be measured.
- the absorbance at the excitation wavelength of the dye molecule solution and the object to be measured are matched and compared.
- “light emission efficiency of photoluminescence” may be abbreviated as “luminous efficiency”.
- the semiconductor ultrafine particles of the present invention a group I I-VI semiconductor exhibiting direct transition and emitting light in the visible region, for example, cadmium sulfide, zinc selenide, selenide force dommium, zinc telluride, telluride Cadmium and the like can be exemplified.
- These semiconductor ultrafine particles have the above-mentioned characteristics, that is, the luminescence efficiency of photoluminescence is 5 when the semiconductor ultrafine particles are kept at 10 to 20 days in an open air atmosphere in a state of being dispersed in water.
- Those having the property of maintaining 0% or more can be manufactured, for example, by the following method.
- a Group VI element conjugate in an inert atmosphere into a water-soluble aqueous solution in which a water-soluble compound containing a Group II element and a surfactant are dissolved under an inert atmosphere.
- a group VI element compound a gaseous compound can be used.
- the water-soluble compound containing a Group II element is preferably a perchlorate.
- the Group II element is cadmium
- cadmium perchlorate can be used.
- the surfactant those having a thiol group which is a hydrophobic group and a hydrophilic group are preferable.
- the hydrophilic group include an anionic group such as a hydroxyl group, a cationic group such as an amino group, a hydroxyl group, and the like.
- an anionic group such as a carboxyl group is preferable.
- Specific examples of the surfactant include thioglycolic acid, thioglycerol, and mercaptoethylamine.
- group VI element compound for example, a hydride of the group VI element can be used.
- group VI element is tellurium
- hydrogen telluride can be used.
- sodium hydrogen telluride obtained by reacting hydrogen telluride with sodium hydroxide as an aqueous solution.
- the amount of the surfactant used in the preparation of the ultrafine particles is set to a molar ratio of 1 to 1.1 with respect to the group II element contained in the aqueous solution. About 5 The amount of such surfactant used is compared to the amount of surfactant used in the conventionally known method for producing ultrafine particles from an aqueous solution (at a molar ratio to Group II element of 2.43). Although the amount is quite small, in the present invention, by using the surfactant in the above-described specific range, ultrafine particles having higher luminous efficiency than conventional semiconductor microfine particles can be obtained.
- the luminous efficiency of the obtained ultrafine particles tends to decrease. It is considered that this is because when the amount of the surfactant adsorbed on the surface of the ultrafine particles increases, the number of defects on the surface of the ultrafine particles increases. On the other hand, if the amount falls below the above range, the luminous efficiency also decreases. This is thought to be because if the amount of the surfactant used is too small, the ultrafine particles tend to aggregate.
- high-purity water is used as water used for producing ultrafine particles.
- the specific resistance is more than 18 ⁇ ⁇ cm and the total amount of organic compounds in water (TO C)
- ultrapure water of 5 ppb or less, preferably 3 ppb or less.
- the concentration of the water-soluble compound containing a Group II element in the aqueous solution is not particularly limited. If the concentration is too low, the reaction efficiency is poor, while if the concentration is too high, precipitation occurs. May occur. Therefore, a concentration of about 0.001 to 0.05 mol Z liter, more preferably about 0.01 to 0.02 mol Z liter, particularly about 0.01 to 0.08 mol Z liter It is preferable that
- the amount of the group VI element compound there is no particular limitation on the amount of the group VI element compound, but it is usually preferable that the group VI ion be about 0.3 to 1.5 mol per 1 mol of the group II ion, and 0.4 to 1.5 mol. More preferably, it is about 0.9 mol.
- the above reaction is usually carried out under an inert atmosphere by publishing a gaseous group VI element compound in an aqueous solution in which a water-soluble compound containing a group II element and a surfactant are dissolved, or a gaseous group VI element.
- the reaction can be carried out by reacting the compound with a sodium hydroxide solution to form an aqueous solution, and then injecting it into an aqueous solution in which a water-soluble compound containing a Group II element and a surfactant are dissolved using a syringe or the like.
- the inert atmosphere may be any gas atmosphere that does not participate in the reaction, and for example, an inert gas atmosphere such as an argon gas, a nitrogen gas, a helium gas or the like can be suitably used.
- an inert gas atmosphere such as an argon gas, a nitrogen gas, a helium gas or the like can be suitably used.
- the above reaction can be usually performed at room temperature (for example, about 10 to 30 C).
- the pH of the aqueous solution is preferably about 10 to 12, particularly preferably 10.5 to 11.5.
- the reaction is usually completed within about 10 minutes after the introduction of the group VI compound.
- a dispersion of semiconductor ultrafine particles is produced by the above method.
- the concentration of the ultrafine particles in the dispersion is appropriately selected depending on the reaction conditions, and is usually from 1 ⁇ 10 ⁇ 6 mol / l to 1.5 ⁇ 10 ⁇ 7 mol / l, but typically, 2 X 10- 6 moles / liter of 1.0X 10-7 mol / l approximately, and particularly about 3 X 10- 6 moles / liter.
- the particle size of the semiconductor ultrafine particles obtained by the above-described method is usually on the order of nanometers. After producing semiconductor ultrafine particles by the above-described method, reflux is performed. Thus, it is possible to control the particle size of the ultrafine particles, and it is possible to increase the particle size by increasing the reflux time.
- the emission color of the semiconductor ultrafine particles is determined by the particle size, and the smaller the particle size, the shorter the wavelength of the emitted light.
- the diameter of the semiconductor ultrafine particles is preferably about 2 to 10 nanometers.
- the reflux time is controlled to be constant, and the standard deviation of the dispersion of the particle size distribution is 20% or less, preferably 15% or less with respect to the average value of the particle size. It may be adjusted as follows. If the standard deviation of the dispersion of the particle size distribution exceeds 20%, various types of light emission are mixed, and it becomes difficult to obtain the color tone required for the display material, which is not preferable.
- the dispersion liquid of the semiconductor ultrafine particles obtained in this way includes, in addition to the target semiconductor ultrafine particles, usually the elemental ions used as the raw material, surfactants, and fine clusters smaller than 1 nanometer. Is included.
- the ultrafine particles can be directly dispersed in a glass matrix to obtain a phosphor by a method described later. Further, the ultrafine particles contained in the dispersion liquid are separated into ultrafine particles having similar particle diameters to obtain ultrafine particles having a narrow particle size range.
- a method of separating into ultrafine particles having a similar particle size for example, a method in which ultra-fine particles having a larger particle size are sequentially precipitated by utilizing the fact that the solubility becomes lower as the particle size of the ultra-fine particles increases, and a method such as centrifugation is used. Can be adopted. At this time, if alcohol is added to the dispersion liquid of the ultrafine particles, the solubility of the ultrafine particles is reduced. Therefore, alcohol is added little by little to the dispersion liquid, so that ultrafine particles having a large particle size are precipitated in order. It is possible to purify ultrafine particles having similar particle diameters.
- the ultrafine particles When the ultrafine particles thus purified are redispersed in water to form a dispersion (or an aqueous solution), the ultrafine particles have high luminous efficiency.
- the dispersion is stable to a certain degree as it is, but by further adding a water-soluble compound containing a Group II element and a surfactant to the dispersion, the stability of the dispersion is improved, Prevents light emission Efficiency can be maintained.
- the type of the group II element compound, the concentration of the compound, the amount of the surfactant, the pH of the dispersion, and the like are adjusted to the same ranges as those of the aqueous solution used for preparing the II-VI semiconductor ultrafine particles described above. (Hereinafter, also referred to as “preparation solution”).
- the preparation liquid include a water-soluble compound containing a Group II element which is a raw material of a group III-VI semiconductor ultrafine particle (about 0.001 to 0.05 mol Z liter, preferably 0.01 mol Z liter). About 0.02 mol Z liter, more preferably about 0.013 to 0.018 mol Z liter), and a surfactant (at a molar ratio of 0 to the group II element contained in the aqueous solution).
- An aqueous solution containing about pH 5 to 5, preferably about 1 to 1.5, and having a pH of about 0 to 12 (preferably about 10.5 to 11.5) is suitable.
- the components such as the water-soluble compound containing a Group 11 element and the surfactant shown here are added directly to an aqueous dispersion (aqueous solution) in which ultrafine particles are redispersed in water, and have the same composition as the above-mentioned preparation liquid.
- an aqueous dispersion (aqueous solution) having the following formula is prepared in advance, and the ultrafine particles are added to the preparation solution, or the preparation solution having a higher concentration is reconstituted with water. It may be added to a dispersed aqueous dispersion (aqueous solution) to prepare a preparation having the above concentration.
- the ultrafine particles in the dispersion were purified, redispersed in water, a water-soluble compound containing a group II element, and a surfactant were added, and the pH was adjusted.
- a phosphor having particularly high luminous efficiency can be obtained by dispersing the ultrafine particles in a glass matrix by a method described later.
- the semiconductor ultrafine particles obtained by the above method have good water dispersibility and high luminous efficiency, and can maintain high luminous efficiency for a long time even in a solution containing water in an open air atmosphere.
- the ultrafine particles are dispersed in the above aqueous solution and kept at 10 to 20 ° C for 5 days in an open air atmosphere, the luminous efficiency of photoluminescence of 50% or more is improved. Can be maintained.
- the ultrafine particles when the ultrafine particles are dispersed in a glass matrix using the sol-gel method, the ultrafine particles can maintain good dispersibility and fluorescent performance in the process of forming glass from the metal alkoxide. It is possible to obtain a phosphor having excellent performance.
- the ultrafine particles are dispersed in a glass matrix using a sol-gel method.
- the method and the resulting phosphor will be described.
- a glass matrix formed by a sol-gel method is used as a matrix in which the semiconductor ultrafine particles are dispersed.
- the sol-gel method a known method of forming a glassy solid matrix by hydrolyzing and condensation polymerizing a metal alkoxide in a solution state at a temperature near room temperature can be used.
- the semiconductor ultrafine particles of the present invention have good water dispersibility and high luminous efficiency, and maintain high luminous efficiency for a long time even in a solution containing water in an open air atmosphere. Can be. Therefore, when the semiconductor ultrafine particles are dispersed in the glass matrix using the sol-gel method, the ultrafine particles can maintain good dispersibility and fluorescent performance while the glass is formed from the metal alkoxide. Thus, a phosphor having excellent performance can be obtained.
- the formed glass matrix is superior to polymer matrix in mechanical properties, heat resistance, chemical stability, etc., and has little change over time, making it a highly durable, high-performance phosphor.
- organoalkoxysilanes are a group of compounds called organoalkoxysilanes as the metal alkoxide.
- the organoalkoxysilane is a compound having a skeleton structure containing silicon, in which at least one of the four bonds of the silicon is bonded to a carbon atom.
- Examples of the functional group X include a group containing a vinyl group, a group containing an epoxy group, an aminoalkyl group, an acryloylalkyl group, a methacryloylalkyl group, a mercaptoalkyl group, and a phenyl group.
- Examples of the group containing an epoxy group for example, CC0- (CH 2) r 0C 3 H 6 - (CC0 represents an epoxy group, k is 1 to an integer of 6) include groups represented by. k is 1 to 4, especially 1 or 2 Is preferred.
- the aminoalkyl group e.g., H 2 C m H 2m - (m is an integer of 1 to 6) include the groups Ru indicated by.
- m is preferably from 2 to 4, particularly preferably 3.
- Examples of the mercaptoalkyl group include a group represented by HSC q H 2q- (where q is an integer of 1 to 10).
- Q is preferably 2 to 4, particularly preferably 3.
- a group represented by straight-chain HS (CH 2 ) q — (where Q is an integer of 2 to 4) is preferable, and mercaptopyl pyrtrimethoxysilane (MPS) is particularly preferable.
- a glass network structure ((-O-Si-) 1> 1) is formed by a usual sol-gel reaction of hydrolysis and condensation polymerization of an alkoxy group, while the functional group represented by X above is It is thought that it stabilizes by forming a bond with the ultrafine particle surface.
- a trialkoxysilane having an aminoalkyl group as a functional group is used as the organoalkoxysilane.
- the dispersibility of the ultrafine particles can be increased because the surfactant has a good affinity between the lipoxyl group and the amino group of the surfactant adsorbed on the surface of the semiconductor ultrafine particles.
- a water-soluble carbodiimide such as triethyl-3- (3-dimethylaminopropyl) carbodiimide (WSC)
- WSC water-soluble carbodiimide
- the carbodiimide has a function of dehydrating and condensing an amine with a carboxylic acid group, and by using this, the surfactant on the surface of the ultrafine particles is chemically bonded to the glass matrix to further improve the dispersibility. be able to.
- the amount of carbodiimide used is based on an aqueous dispersion (aqueous solution) obtained by redispersing purified ultrafine particles in water. It is preferably about 0.5 to 8 times, more preferably about 2 to 4 times, the number of moles of the hydroxyl group in the surfactant added.
- a method of forming a glass matrix by a sol-gel method using the above-described organoalkoxysilane a known method can be appropriately applied.
- the above-mentioned organoalkoxysilane; an alcohol compound such as ethanol, methanol, propanol, and butanol; and water for example, a molar ratio of about 1: 1 to 60: 1 to 20 respectively
- a catalyst such as hydrochloric acid, acetic acid, nitric acid, and ammonia.
- the organoalkoxysilane is an organoalkoxysilane containing an amino group such as aminopropyltriethoxysilane
- the reaction proceeds without adding a catalyst.
- a glass matrix can be formed by adding an aqueous dispersion of the above semiconductor ultrafine particles to the sol solution and causing hydrolysis and polycondensation reaction at room temperature to about 10.
- the addition of a surfactant as necessary in the sol solution to a 1 0 _ 5 to 1 0 _ 3 concentration of approximately mol l Good.
- the surfactant it is preferable to use a surfactant having both a thiol group and a hydrophilic group, such as thioglycerol, thioglycolic acid, and mercaptoethylamine.
- the addition amount of the aqueous dispersion of the semiconductor ultrafine particles to the sol solution is prepared by concentration of the semiconductor ultrafine particles in the glass matrix definitive the optical member 2 X 1 0- 6 ⁇ 2 X 1 0 one 4 mol / liters extent, preferably to formulate such that the 1 X 1 0 one 5 ⁇ 2 X 1 0- 4 mol Z liters about liking, for obtaining a phosphor of high brightness with this range.
- the above-mentioned solution may further contain other alkoxides for the purpose of increasing the crystallinity of the glass matrix, increasing the dispersibility of the desired substance, increasing the hardness, and further reducing inferiority.
- alkoxides for the purpose of increasing the crystallinity of the glass matrix, increasing the dispersibility of the desired substance, increasing the hardness, and further reducing inferiority.
- tetraalkoxysilane tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, etc.
- tetraalkoxytitanium titanium tetraisopropoxide, etc.
- trialkoxyaluminum aluminum isopropoxide, etc.
- a dispersion of semiconductor ultrafine particles is not added from the start of the reaction of the sol solution, but the viscosity of the sol solution is passed after a certain time has elapsed after the sol-gel reaction has started. It is preferred to add it after the temperature has risen to a certain viscosity. According to such a method, it is possible to obtain a phosphor in which ultrafine particles are uniformly dispersed immediately in a solution without being aggregated, and immobilized in a glass matrix as it is, and the ultrafine particles are uniformly dispersed. it can.
- deterioration of the surface of the semiconductor microparticles is minimized, and coagulation does not occur even if the dispersion concentration of the semiconductor ultrafine particles in the glass matrix is increased to a high concentration of about 2 ⁇ 10-4 mDa. Therefore, a phosphor containing semiconductor ultrafine particles having a luminous efficiency of 20% or more in a glass matrix can be obtained. Further, high luminous efficiency of 30% or more and 40% or more can be achieved.
- luminance of the semiconductor ultra-fine particles is, 2 ⁇ 1 0- 6 ⁇ 2 ⁇ 1 0 - 4 mol, is preferably about rate torr, 1 X 1 0 _ 5 and more preferably to 2 chi 1 0 about one 4 mol / l.
- the viscosity of the sol solution at the time of adding the semiconductor ultrafine particles differs depending on the amount of the added semiconductor ultrafine particles and the like.However, the viscosity is such that the added ultrafine particles can be maintained in a uniform dispersion state without aggregation. Any viscosity may be used. Usually, the viscosity of the sol solution may be about 300 to 3000 centipoise, preferably about 300 to 1500 centipoise, and more preferably about 700 to 1200 centipoise. One centipoise is one millipascal second when expressed in SI units.
- the sol solution usually solidifies in about one week at room temperature and becomes transparent.
- a bright and scattering-free glass phosphor can be obtained.
- the method of adding the semiconductor ultrafine particles after the viscosity of the solution increases after a certain time has elapsed after the start of the sol-gel reaction, deterioration of the semiconductor ultrafine particles dispersed in the glass matrix is suppressed. Therefore, it is not only the case where semiconductor ultrafine particles that can maintain a luminescence efficiency of about 50% or more when kept at 10 to 2 O for 5 days in a state of being dispersed in water are used. Even when using semiconductor ultrafine particles having a photoluminescence luminous efficiency of about 30% below, the phosphor of the present invention, that is, a semiconductor having a photoluminescence luminous efficiency of 20% or more in a glass matrix, is used. A phosphor in which ultrafine particles are dispersed can be manufactured.
- the glass network structure develops and the hardness increases, so that good quality glass is obtained.
- the hardness of the obtained phosphor is different depending on its use.For example, if the Pickers hardness is about 20 or more, preferably about 30 to 200, and more preferably about 40 to 100, Good.
- Vickers hardness is the hardness defined by the ratio of the load and the surface area of the depression when a diamond indenter with a regular pyramid (136 ° facing angle) is pressed into the sample. With units of When the Vickers hardness is 100, it is 980 megapascals in SI unit of pressure.
- the luminous efficiency of the semiconductor ultrafine particles in the fluorescent glass refers to the fluorescence with respect to the photon (photon) number ( ⁇ ⁇ ) of the excitation light absorbed by the semiconductor ultrafine particles in the fluorescent glass. Defined as the ratio ( ⁇ / ⁇ ⁇ ) of the number of photons (photons) ( ⁇ ) emitted as photoluminescence from the ultrafine particles in the glass.
- dye molecules whose luminosity and luminous efficiency are known This is a value calculated by preparing a glass cell containing a solution and a glass to be measured having the same thickness, and comparing the absorbance and the luminous efficiency of the dye molecule solution with the measured object. .
- the phosphor of the present invention can be manufactured by the above method.
- the phosphor can be used after being shaped into an arbitrary shape according to the purpose of use.
- a sol-like reaction solution in which semiconductor ultrafine particles are dispersed in a sol-gel method is spin-coated or dip-coated.
- Such a phosphor thin film can be used, for example, for setting a color tone by installing it on a mirror or a lens.
- the phosphor of the present invention formed by the above-described method basically exhibits glass properties as a whole, and has excellent properties such as mechanical properties, heat resistance, and chemical stability. is there. Further, since the semiconductor ultrafine particles included in the phosphor are shielded from the external atmosphere, they have excellent light resistance and extremely good stability over time. In particular, the phosphor of the present invention has high temporal stability. For example, stable semiconductor ultra-fine particles with a decrease rate of 25% or less in photoluminescence emission efficiency dispersed in a glass matrix when held at room temperature for 8 months in an open atmosphere Phosphors can be manufactured. Further, a phosphor containing the ultrafine particles having the reduction rate of 20% or less and 18% or less can be produced. Here, room temperature means about 10 to 30. Further, the ratio of decrease in luminous efficiency and: means the ratio of decrease in luminous efficiency of the phosphor after holding for 8 months to the luminous efficiency immediately after production of the phosphor of the present invention. The measurement method specifically follows Example 11.
- the phosphor obtained by the above method is high in brightness and shows various colored light when irradiated with light of a single wavelength, and it can be effectively used as a light emitting device such as lighting or display element in place of the conventional phosphor. Available.
- examples of uses of the phosphor of the present invention will be described.
- An illuminating device using the phosphor of the present invention includes a luminous body made of the phosphor and a light source for exciting the phosphor.
- the semiconductor ultrafine particles dispersed in the phosphor of the present invention also absorb all light having a short wavelength even in the band gap, and emit light corresponding to the energy of the band gap with the same luminous efficiency regardless of the excitation light wavelength. For this reason, it can be designed to absorb light having a wavelength necessary for excitation within a wavelength of 320 to 600 nanometers and emit light of a desired wavelength.
- a mercury lamp with a wavelength of 365 nm (more precisely, for example, a center wavelength of 365.08 nm, called a mercury i-ray) is mentioned. I can do it.
- the mercury lamp is suitable for emitting strong light.
- ultraviolet-blue LEDs (wavelength 370, 382, 455, 470 nm, etc.) using gallium nitride, indium gallium nitride, etc., and blue-green to yellow LEDs (wavelengths 503, 505, 525, 590 Nanometers). These are inferior in intensity to mercury lamps but emit little heat, so they are convenient for preventing the deterioration of ultrafine particles, and are very inexpensive on the market, which is very advantageous for cost reduction. is there.
- Illumination devices using such an excitation light source include lighting for taking ordinary light, lighting as a liquid crystal pack light such as a cold cathode fluorescent lamp, and a liquid crystal projector for presentation using a 7J silver lamp. It can be used as a light source for applications. Further, it is possible to use this phosphor as a laser medium. Furthermore, by absorbing and emitting luminescence such as green and yellow emitted from the ultrafine particles to the ultrafine particles emitting red light, an effect of further adjusting the color tone can be realized.
- a display element made of the phosphor of the present invention is formed on a substrate, and the intensity of the display element is increased in accordance with an information signal.
- An excitation light source may be provided so that light can be emitted by modulating light.
- the excitation light source it is necessary to select light with a wavelength that does not absorb the matrix. If the wavelength is less than 320 nanometers, matrix absorption often occurs.For example, use a light source with a wavelength of about 320 to 600 nanometers, such as a mercury lamp, LED, or solid-state laser. It is preferable to do so.
- the excitation light When ultraviolet light is used as the excitation light, it is necessary to form a display element that emits red, green, and blue light.For example, when a blue light emitting diode is used as the excitation light source, the excitation light is used as blue light emission. Therefore, a display element which emits red and green light can be formed.
- the display element is formed as a spot in a minute region on the substrate.
- a method similar to that used in the inkjet printer described in Japanese Patent Application Laid-Open No. 2002-121935 is used for producing the phosphor.
- the sol solution (glass precursor solution) before vitrification is sprayed onto the substrate from multiple nozzles.
- the method of staking is advantageous.
- each spot is formed as a spot in a minute area having a diameter of 200 ⁇ m or less, and is an aggregate of these minute areas.
- the sol solution used in this case may be any solution that can be sprayed from a nozzle among the solutions used when producing the phosphor glass by the sol-gel method described above.
- the reaction may be further advanced. Thereafter, if necessary, heat treatment is performed at about 80 to 200 ° C. for about 0.5 to 5 hours, whereby the glass precursor is sufficiently vitrified to obtain a good display element.
- the substrate include commonly used substrates such as a glass substrate such as a quartz glass substrate, a borosilicate glass substrate, and a soda-lime glass substrate, and a polymer substrate such as a polyacrylonitrile substrate and a polymethylmethacrylate substrate. It is.
- a glass substrate can be suitably used because good adhesive strength with the phosphor can be obtained.
- the method of irradiating light by modulating the intensity according to the information signal includes the method of directly modulating the intensity of the excitation light source according to the information signal, and ON / OFF and intensity modulation of the light using a polarizer and liquid crystal molecules.
- a method can be used.
- liquid crystal molecules one having appropriately set optical anisotropy and dielectric anisotropy may be prepared and combined with a polarizer.
- Ultra-fine particles of force-dominated telluride which is a group II-VI semiconductor, were prepared by improving the method described in Gao et al., Journal of Physical Chemistry, Vol. 102, p. 8360 (1998).
- the value of the luminous efficiency of the ultrafine particles was determined by comparing the luminous efficiency (absorption coefficient X concentration X optical path length) and the quinine molecule sulfuric acid aqueous solution (sulfuric acid concentration 1 mol / liter) whose luminous efficiency is known.
- the luminous efficiency of the ultrafine particles in the dispersion was 70%.
- the pH was set to about 11 by adding sodium heptaoxide the surface state of the microparticles was maintained, and the luminous efficiency was maintained at 50% or more for 5 days or more.
- Example 2 The mixture was stirred, and 10 milliliters of this mixture was collected and placed in a fluororesin shear having a diameter of 5 cm.
- the stirrer was taken out of the glass precursor liquid, and the sol-gel reaction was further advanced. After 7 days, the solution had completely solidified into a clear glass. At this time, the concentration of the ultrafine particles in the glass was about lxlO— 5 mornoliters.
- Figure 2 shows the light absorption and emission spectra of the glass (phosphor) in which the ultrafine particles are dispersed. From these results, it can be seen that The luminous efficiency of the photoluminescence of the fine particles was estimated to be 28%.
- Example 2 The glass produced in Example 2 was heated at 10 Ot in an argon atmosphere for 2 hours. At this time, the temperature was raised and lowered at a rate of 0.5 ° C / min, and care was taken not to crack the glass. This heat treatment reduced the weight by about 5%. The luminous efficiency of the ultrafine particles in the obtained cured glass maintained the luminous efficiency of the ultrafine particles in the glass of Example 2.
- the Vickers hardness is approximately 50 (490 megapascals in SI units). I understood.
- the glass before the heat treatment was so soft that no indentations were formed and the hardness could not be measured.
- the heat treatment allowed the dehydration condensation reaction to proceed, thereby improving the quality of the glass.
- Example 2 when the solution in which the ultrafine particles were dispersed was mixed, the viscosity once decreased, and as the reaction proceeded, the viscosity increased again.
- this solution became about 1000 centipoise, it was applied to a reflector of a high-pressure mercury lamp with a brush, left at room temperature overnight, and then heated at 80 for 2 hours.
- the reflector formed with the phosphor thin film containing the semiconductor ultrafine particles in this way was able to efficiently convert the ultraviolet light with a wavelength of 365 nm emitted from the Takasho mercury lamp into red light.
- 441, 547, and 570 nanometers of light contained in the light from the light source were simultaneously absorbed by this phosphor glass and converted to red light.
- a borosilicate glass substrate was prepared by etching with hydrofluoric acid and having a letter-shaped groove having a depth of about 0.5 mm. Thereafter, when the viscosity of the glass precursor liquid to which the ultrafine particles being produced in Example 2 was added reached about 700 centipoise, the glass precursor liquid was poured into the groove. This was left at room temperature overnight, and then heat-treated at 6 to 5 hours to allow the sol-gel reaction to proceed. As a result, a phosphor glass that emits light in a character shape on a glass substrate has been manufactured. This phosphor glass was in tight contact with the glass substrate, and it was better to pour it in three times to improve the adhesion to the glass substrate.
- the prepared solution had a concentration substantially the same as the concentration of each raw material at the start of production of ultrafine particles, and contained cadmium ions (0.013 mol / liter) and TGA (0.020 mol Z liter). H was adjusted to 11.4 with sodium hydroxide.
- glass phosphor prepared to minimum 1X10- 5 mol / l, obtained by dispersing ultrafine particles in a concentration of up to 2 xl0- 4 mol l was done.
- the luminous efficiencies of the ultrafine particles in this glass were 36%, 25%, 26%, 20%, and 21% in order from the top of Table 1. In other words, the luminous efficiencies of the photoluminescence were all 20% or more.
- the wavelength of the excitation light at this time was 400 nanometers.
- ultrafine particles can be chemically bonded to a glass matrix formed from 3-aminopropyltrimethoxysilane, which is a compound having an amino group, by adding a carbodiimide which is a dehydration condensing agent. It was effective in preventing the aggregation of fine particles and protecting the surface condition.
- a red-emitting phosphor was produced.
- a green-emitting phosphor exhibiting a luminous efficiency of 20% or more could be produced by the same method.
- a glass precursor liquid to which ultrafine particles being produced in Example 2 were added and having a viscosity of about 350 centipoise was used, and the glass precursor liquid was used in Example 3 of Japanese Patent Application Laid-Open No. 2002-219935.
- a phosphor was prepared according to the method described. By heating the nozzle attached to the solution sump, fine droplets of the glass precursor solution were ejected from the tip onto the substrate, and the substrate was left at room temperature overnight. Thereafter, heat treatment was performed at 100 ° C. for 2 hours to allow the sol-gel reaction to proceed, thereby producing a phosphor composed of a large number of minute regions having a diameter of about 100 ⁇ m on the substrate.
- Cadmium telluride ultrafine particles emit red or green light depending on the particle size By exciting with a large number of blue LEDs (Audio Q, wavelength 470 nanometers), it was possible to obtain light of any color.
- a display device having the structure shown in Fig. 3 was fabricated.
- This display device is of the same type as that used for ordinary liquid crystal displays.
- a light diffusion plate, a polarizer, a transparent electrode, an alignment film, a liquid crystal cell, and an analyzer are arranged on a support substrate, and the book is placed on top of this.
- This is a structure in which a glass substrate to which the glass phosphor of the present invention is bonded is arranged.
- a black matrix was placed between the glass phosphors to reduce light leakage, and a surface protection substrate was placed on top of it.
- a glass phosphor that emits red light (610 nanometers) and a green light that emits green light (540 nanometers) are used. Since light passes through, blue light can be emitted.
- excitation is achieved by placing a glass in which silica glass spheres with a diameter of about 100 nanometers are dispersed instead of semiconductor ultrafine particles. Light can be diffused. In the display device having this structure, the blue light traveled the same way as the red and green lights. Furthermore, in the display device shown in FIG. 4, the excitation light and the fluorescent light emitted by the excitation light could be efficiently guided to the upper surface by providing the reflecting mirror on the supporting substrate.
- Example 8 In the current liquid crystal display, a combination of a white light source and red, green, and blue filters is used instead of the combination of the blue light source and the phosphor glass in this embodiment. In this method, most of the light is always absorbed and energy is lost. In contrast, the device of Example 8 can directly obtain the required colors, thus achieving energy efficiency. It has the advantage that it emits light in all directions and has a wide viewing angle. In addition, it was possible to obtain blue light emission by using ultrafine dominate selenide particles by using ultraviolet light emitting LEDs instead of blue light sources as excitation light sources.
- the luminous efficiency of the ultrafine particles in the phosphor was 39%.
- the emission peak wavelength was 644.0 nm
- the full width at half maximum of the emission spectrum was 57.8 nm.
- the luminous efficiency is 32%
- the luminescent peak wavelength is 644.5 nm
- the luminescent spectrum is The full width at half maximum. That is, the rate of decrease in luminous efficiency was 18%.
- the semiconductor ultrafine particles of the present invention have excellent water dispersibility and high luminous efficiency, and can maintain high luminous efficiency for a long time in a solution containing water in an open air atmosphere. It has characteristics.
- the ultra-fine particles can maintain good dispersibility and fluorescent performance while the glass is formed from the metal alkoxide.
- a phosphor having excellent performance can be obtained.
- the semiconductor ultrafine particles are dispersed at a high concentration while maintaining high luminous efficiency.
- a phosphor having light emitting performance can be obtained.
- the phosphor obtained in this manner basically exhibits the properties of glass as a whole, and has excellent mechanical properties, heat resistance, chemical stability, and the like.
- the semiconductor ultrafine particles are shielded from the external atmosphere, and therefore have excellent light resistance and extremely good stability over time.
- the phosphor exhibits various colors of light when irradiated with light of a single wavelength having a high luminance, and is used for various purposes such as lighting and display elements in place of the conventional phosphor. : C that can be used effectively
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- Luminescent Compositions (AREA)
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Abstract
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JP2005508124A JP4555966B2 (ja) | 2003-01-24 | 2004-01-23 | 半導体超微粒子、蛍光体および発光デバイス |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002211935A (ja) * | 2001-01-16 | 2002-07-31 | National Institute Of Advanced Industrial & Technology | 超微粒子分散ガラス及びこれを用いた表示素子 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020110180A1 (en) * | 2001-02-09 | 2002-08-15 | Barney Alfred A. | Temperature-sensing composition |
US7226953B1 (en) * | 2003-11-17 | 2007-06-05 | Los Alamos National Security, Llc | Nanocrystal/sol-gel nanocomposites |
-
2003
- 2003-11-21 JP JP2003391685A patent/JP2005105244A/ja active Pending
-
2004
- 2004-01-23 JP JP2005508124A patent/JP4555966B2/ja not_active Expired - Lifetime
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Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002211935A (ja) * | 2001-01-16 | 2002-07-31 | National Institute Of Advanced Industrial & Technology | 超微粒子分散ガラス及びこれを用いた表示素子 |
Non-Patent Citations (1)
Title |
---|
GAO M, ET AL: "Strongly photoluminescent CdTe nanocrystals by proper surface modification", J. PHYS. CHEM. B, vol. 102, no. 43, 22 October 1998 (1998-10-22), pages 8360 - 8363, XP000886329 * |
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US8287758B2 (en) | 2012-10-16 |
JP4555966B2 (ja) | 2010-10-06 |
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JPWO2004065296A1 (ja) | 2006-05-18 |
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