WO2004005413A1 - Low sintering temperatures conductive nano-inks and a method for producing the same - Google Patents

Low sintering temperatures conductive nano-inks and a method for producing the same Download PDF

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Publication number
WO2004005413A1
WO2004005413A1 PCT/IL2003/000554 IL0300554W WO2004005413A1 WO 2004005413 A1 WO2004005413 A1 WO 2004005413A1 IL 0300554 W IL0300554 W IL 0300554W WO 2004005413 A1 WO2004005413 A1 WO 2004005413A1
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WO
WIPO (PCT)
Prior art keywords
metal
nano
conductive
powder
coated
Prior art date
Application number
PCT/IL2003/000554
Other languages
French (fr)
Inventor
Arkady Garbar
Fernando De La Vega
Einat Matzner
Chariana Sokolinsky
Valery Rosenband
Anatoly Kiselev
Original Assignee
Nanopowders Industries Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanopowders Industries Ltd. filed Critical Nanopowders Industries Ltd.
Priority to AU2003237578A priority Critical patent/AU2003237578A1/en
Priority to CN03815904XA priority patent/CN1671805B/en
Priority to JP2004519139A priority patent/JP2005531679A/en
Publication of WO2004005413A1 publication Critical patent/WO2004005413A1/en
Priority to IL16573604A priority patent/IL165736A0/en
Priority to US11/010,949 priority patent/US7601406B2/en
Priority to US11/010,947 priority patent/US7566360B2/en
Priority to US11/010,948 priority patent/US7736693B2/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/52Electrically conductive inks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • H05K1/095Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00Supplementary information concerning processes or compositions relating to powder metallurgy
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • H05K1/097Inks comprising nanoparticles and specially adapted for being sintered at low temperature
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing

Definitions

  • the present invention relates to low sintering temperatures conductive nano-inks and to a method for producing the same.
  • Metal nano-powder materials are single phase or multi-phase polycrystals, with particle size in the order of a few nanometers (typically 1-100) in at least one dimension. It is well acknowledged that wherein conventional polycrystalline materials grain boundaries account for less than 1% of the volume, in nano structured materials can occupy as much as 50%. Nano particles, specially metal nano particles have hence very special properties which are directly related to their dimensions and to the fact that a large ratio of the atoms in the particle are in the surface of the particle or at particle and grain boundaries. These properties include optical properties, diffusion properties, electrical properties like capacitance, impedance and resistance, catalytic activity and many others.
  • Nano-inks and nano-powders for coatings characterized by a significant electrical conductivity are useful, but not exclusively, for printing of electrical connections in circuits such as, antennas, smart tags, display panels, printed circuit boards, chips and others.
  • U.S. Pat. No. 6,395,214 to Kear et al. discloses another approach and presents a method for fabricating a nano-crystalline ceramic article at respectively low temperature yet by applying very high pressures.
  • their method comprises the steps of (i) synthesizing loosely-agglomerated ceramic nano-powder having a metastable structure; (if) forming the ceramic nano-powder into a compact; and than (Hi) sintering the ceramic nano-powder compact under a pressure of 3 GPa to 5.5 GPa and at a temperature no greater than about 0.6 times the melting temperature of the ceramic nano-powder to form the nano-crystalline article.
  • a useful and cost effective method for sintering nano-particles, and especially electrically conductive nano-ink powders at respectively low temperatures and at ambient pressure is thus a significant industrial need.
  • Fig.l The change of relative resistance for silver nano powders coated with surfactant (1) and washed from surfactant (2);
  • Fig. 2 Relative resistance dependence on temperature for the different particle size silver powders - and measured bulk silver in our measuring system
  • Fig. 3 Relative resistance dependence on temperature for the different particle size copper powders - and measured bulk copper in our measuring system.
  • Said method comprising inter alia the following four steps: (i) admixing metal nano powder in a solvent with at least one ingredient of the group selected from: binder, surfactant, additive, polymer, buffer, dispersant and/or coupling agent in the manner a homogenized solution is obtained; (if) applying the homogenized mixture obtained above on a surface to be coated; ( ) evaporating the solvent from said homogenized mixture; and lastly and most importantly, (iv) sintering the coated layer at temperature range of 50°C to 350°C, providing a conductive ink on top of said surface characterized by resistances between 0.005 ⁇ /square to 5 ⁇ /square.
  • Said sintering is preferably provided at ambient pressure (e.g., about atmospheric pressure).
  • the sintering step is provided at temperature of about 50°C. Alternatively or additionally, it is in the scope of the present invention wherein the sintering step is provided for 0.5 to 2 hours.
  • the present invention also relates to the aforementioned method, wherein the metal nano powder is selected from at least one of the group: metal nano powder; metal nano powder with metal colloids; metal nano powder with a metal reducible salt and/or organic metal complexes and/or organo-metal compounds which decompose to form conductive materials.
  • the concentration of the metal nano-powder in the admixed solution may be between 1% (wt) to 70% (wt). More specifically, the concentration of the metal nano powder in the admixed solution may be between 2% (wt) to 50% (wt).
  • the admixed solution comprising organic solvent or a mixture of organic solvents including UV and thermally curable monomers.
  • concentration of the organic solvent or the mixture of organic solvents in the admixed solution is between 20%) (wt) to 85%> (wt). Most specifically, said range is between 40% (wt) to 80% (wt).
  • the aforementioned solvent is preferably selected from at least one of the group of petroleum ether, hexane, heptanes, toluene, benzene, acrylates, dichloroethane, trichloroethylene, chloroform, dichloromethane, nitromethane, dibromomethane, cyclopentanone, cyclohexanone or any mixture thereof.
  • concentration of the aforementioned binder in the admixed solution is preferably between 0% (wt) to 5% (wt).
  • Said binder may be selected from ethyl cellulose and/or modified urea.
  • the surface to be coated is selected from ceramics, glass, either flexible or relatively non-flexible polymeric films or sheets, polyimides, kepton, polyethylene products, polypropylene, acrylate containing products, polymethyl metaacryalte, e.g., PMMA or Perspex, their co-polymers or any combination thereof, or any printable substrate.
  • the polymeric film comprising at least one of the group of polyesters, polyamides, polycarbonates, polyethylene, polypropylene, their copolymers or any combination thereof.
  • the method is additionally comprises of a step of treating the surface to be coated by a means of corona treatment and/or coating by primer.
  • a primer may be selected from at least one of the group of 3-aminopropyl triethoxy silane, phenyl trimethoxysilane, glycidyl trimethoxysilane, commercially available Tween products, Tween-80, neoalkoxy tri(dioctylpropylphosphato) titanate or any combination thereof.
  • the nano-powder comprising metal or a mixture of metals selected from silver, gold, platinum, palladium, nickel, cobalt, copper or any combination thereof or any other conductive metal.
  • said metal is admixed with metal colloids; metal nano powder with a metal reducible salt and/or organic metal complexes and/or organo-metal compounds which decompose to form conductive materials.
  • the aforementioned method may comprise the step of polymerizing a monomer in the presence of catalyst and/or oxidizing agent and/or reducing agent, in the manner a water miscible polymer is obtained in the homogenized solution.
  • the spreading of the homogenized mixture on a surface to be coated may be provided by a means selected from simple spreading; bar spreading, immersing; spin coating; doping and/or dipping.
  • the coating layer or layers provided by the spreading of the homogenized mixture on a surface to be coated may be characterized by a wet thickness of 1 to 200 microns.
  • the conductive nano-ink as defined above, printed or coated in a predetermined pattern, and to provide a self assembled conductive nano-ink.
  • the conductive nano-ink especially adapted for post treatment of surface; wherein said treatment is selected from scratch resistance, increasing adhesion or a combination thereof.
  • any conductive ink e.g., nano-powders characterized by resistances between 0.005 ⁇ /square to 5 ⁇ /square
  • metal nano-powders obtained by the method defined in any of the above.
  • a novel method of low temperature sintering useful for the production of conductive coatings and inks comprising metal nano-powders is hereby presented. It is according to the present invention that by coating a substrate with an ink, solution or paste that was previously dispersed, cost-effective nano conductive materials and/or conductive transparent coating are produced.
  • the term 'coating' is referring according to the present invention to any conductive layer produced in the manner of admixing metal nano powder in a solvent with at least one ingredient of the group: binder, surfactant, additive, polymer, buffer, dispersant and/or coupling agent in the manner a homogenized solution is obtained; and then sintering at respectively low temperatures of 50 to 300°C.
  • 'ink' is referring according to the present invention to any ink containing nano-powders of metal or metals, especially emulsion based compositions provided for coloring materials, or alternatively, to legend ink (marking ink) suitable for printing on printed circuit boards (PCB's).
  • the term 'ink' is referring according to the present invention to any conductive topical pattern produced in the manner of admixing metal nano powder in a solvent with at least one ingredient of the group: binder, additive, polymer, buffer, dispersant and/or coupling agent in the manner a homogenized solution is obtained; the solution can be admixed, but not essential, with water or water miscible solvent or mixture of water miscible solvents in the manner a W/O type emulsion is obtained; spreading or printing the homogenized mixture obtained above on said surface to be coated; evaporating the solvent from said homogenized mixture in the manner that a self-assembled network-like pattern is developed in situ or a printed pattern or a complete coverage is formed; and than sintering the network-like pattern at respectively low temperatures of 50 to 300°C so a conductive and nano-ink is obtained.
  • the inks can also especially be adapted for use in or on top of transparent substrates.
  • the aforementioned ink is adapted for coating, covering, immersing, dipping, and/or entrapping on top or into either solid or semi-solid matrix, or by means of any other suitable technique on such as glass or any polymer matrix, including flexible, semi-flexible or rigid materials.
  • the present invention discloses the novel properties of the nano metal powders and inks (i.e., conductive-polymers, as well as conductive metals, oxides characterized by D 50 ⁇ 60nm and D 0 ⁇ 100nm). Those properties enable the hereto-defined nano-powders to provide an industrial scale production of flexible electrical circuits on substrates such as polymer films and plastics.
  • nano sized particles and grains that have much larger surface area than bulk materials, characterized by special diffusion properties and can be processed so continuous conductive phase is produced at relative low temperatures and lower energy input.
  • nano metal powder or ink it is according to another embodiment of the present invention to coat a substrate with a nano metal powder or ink.
  • a solution or paste in which the nano metal powder were dispersed and sintered at low temperatures of about 50°C and preferably around 100°C to 220°C, in the manner conductive layers characterized by resistances between 0.005 ⁇ /square to 5 ⁇ /square are obtained
  • any type of substrates can be coated. More particularly, those substrates are selected, yet no limited to glass, poly-carbonate, polymer films or any combination thereof.
  • Silver powders of different sizes were produced through the procedure described in U.S. Pat. No. 5,476,535, which is hereto provided as a reference.
  • the powders are coated with organic materials and de-agglomerated.
  • the volume particle size distribution of these powders, measured in a Coulter Particle Size Analyzer LS 230, are presented in Table 1.
  • figure 1 presenting the change of relative resistance for silver nano powders coated with surfactant (1) and washed from surfactant (2).
  • figure 2 presenting the relative resistance dependence on temperature for the different particle size silver powders - and measured bulk silver in our measuring system.
  • Samples 1, 2 and 3 are nano silver powders; samples 4 and 5 are coarse silver powders with a particle size of over 2.5 ⁇ m (D 0 ). As can be seen nano silver powders achieve better conductivities at lower temperatures. A nano silver powder washed from its coating will give the same performance at even lower temperatures of about 100°C in comparison to around 220°C for the coated powder and over 700°C for coarse silver powders. Table 2: Electrical properties of silver powders
  • Table 3 Electrical properties of different particle size silver powders at different sintering temperatures.
  • Copper powders of different sizes were produced through the procedure described in U.S. Pat. No. 5,476,535, which is hereto provided as a reference.
  • the powders were coated with organic materials and de-agglomerated.
  • Nano metal powders in formulations are nano metal powders in formulations.
  • the formulations are inks or pastes, which facilitate the printing and/or coating process, were prepared according to the general procedures described bellow. Care has to be taken to achieve a good dispersion of the conductive additives (metal nano powders, salts and/or colloids).
  • ink/paste systems were tested. All three have been found to produce a conductive coating at low sintering temperatures.
  • the systems differ in the formulation concept, and main ingredients leading to the conductivity.
  • the main ingredients of the systems are: 1) metal nano powder, 2) metal nano powder with metal colloids, 3) metal nano powder with a metal reducible salt.
  • Admixing a binder e.g., ethyl cellulose), 13% (wt/wt) in a solvent (e.g., terpinol). Then, admixing a conductive nano powder metal (e.g., silver nano powder) (D90 ⁇ 0.1 ⁇ m); 50 parts by weight; terpinol 20 parts by weight, and a coupling agent such as isopropyl dioleic(dioctylphosphato)titanate, also know a the commercially available NDZ-101 KRTTS, 1 parts by weight, to some 25 parts by weight of the solution obtained above, by a means of a high rpm homogenizer.
  • a binder e.g., ethyl cellulose
  • a solvent e.g., terpinol
  • colloidal silver 12 parts by weight; a binder e.g., a binder which is an adhesion promoter, such as Polyvinyl Pyrrolidone (PVP), 2.5 parts by weight; water, 32 parts by weight by a means of an ultrasonic energy and or high rpm dispersing equipment.
  • a binder e.g., a binder which is an adhesion promoter, such as Polyvinyl Pyrrolidone (PVP), 2.5 parts by weight
  • water 32 parts by weight by a means of an ultrasonic energy and or high rpm dispersing equipment.
  • a conductive nano powder metal e.g., silver nano powder
  • solvent e.g., ethanol
  • a conductive nano powder metal e.g., silver nano powder
  • Table 5 Resistance data for nano metal powders ink formulations.

Abstract

The present invention discloses a novel and cost effective method for the production of conductive inks comprising metal nano-powders. The method comprising the four steps of (i) admixing metal nano powder in a solvent with at least one ingredient of the group selected from: binder, surfactant, additive, polymer, buffer, dispersant and/or coupling agent in the manner a homogenized solution is obtained; (ii) applying the homogenized mixture obtained above on a surface to be coated; (iii) evaporating the solvent from said homogenized mixture; and lastly (iv) sintering the coated layer at temperature range of 50°C to 300°C, providing a conductive ink on top of said surface characterized by resistances between 0.005 Ω/square to 5 Ω/square. The present invention also discloses conductive ink comprising metal nano-powders obtained by a process comprising inter alia the step of low temperature sintering at ambient pressure.

Description

LOW SINTERING TEMPERATURES CONDUCTIVE NANO-INKS AND A METHOD FOR PRODUCING THE SAME
FIELD OF THE INVENTION
The present invention relates to low sintering temperatures conductive nano-inks and to a method for producing the same.
BACKGROUND OF THE LNVNETION
Metal nano-powder materials are single phase or multi-phase polycrystals, with particle size in the order of a few nanometers (typically 1-100) in at least one dimension. It is well acknowledged that wherein conventional polycrystalline materials grain boundaries account for less than 1% of the volume, in nano structured materials can occupy as much as 50%. Nano particles, specially metal nano particles have hence very special properties which are directly related to their dimensions and to the fact that a large ratio of the atoms in the particle are in the surface of the particle or at particle and grain boundaries. These properties include optical properties, diffusion properties, electrical properties like capacitance, impedance and resistance, catalytic activity and many others.
These improved properties have a range of uses and applications; e.g. catalysts for chemical reactions, electrodes, fuel cells, medical devices, water cleaning technologies, electronic devices, coatings and more.
Nano-inks and nano-powders for coatings characterized by a significant electrical conductivity are useful, but not exclusively, for printing of electrical connections in circuits such as, antennas, smart tags, display panels, printed circuit boards, chips and others.
Literature presents few hints regarding the sintering step of nano-particles. Most of the art suggests sintering at respectively high temperature ranges. Hence, U.S. Pat. No. 6,582,651 to Cochran, Jr. et al. discloses a process for forming a shaped metallic article, comprising inter alia the steps of ( ) combining starting materials, the starting materials comprising a nonmetallic metal precursor nano-powder; (ii) forming the starting materials into a free standing, unsupported shape to produce a nonmetallic article of a certain geometry; (Hi) chemically converting the nonmetallic article to a metallic article with a reducing agent while substantially retaining the geometry of the nonmetallic article; and (iv) sintering the metallic article at 500°C to 1,450°C to form a more dense metallic article while substantially retaining the geometry of the nonmetallic article. Similarly, U.S. Pat. No. 5,147,446 to Pechnik et al., discloses a method for fabrication of dense compacts from nano-sized particles using high pressures and cryogenic temperatures, wherein the sintering step is applied in the temperature range of 1,000°C to 1,500°C.
U.S. Pat. No. 6,395,214 to Kear et al. discloses another approach and presents a method for fabricating a nano-crystalline ceramic article at respectively low temperature yet by applying very high pressures. Hence, their method comprises the steps of (i) synthesizing loosely-agglomerated ceramic nano-powder having a metastable structure; (if) forming the ceramic nano-powder into a compact; and than (Hi) sintering the ceramic nano-powder compact under a pressure of 3 GPa to 5.5 GPa and at a temperature no greater than about 0.6 times the melting temperature of the ceramic nano-powder to form the nano-crystalline article.
A useful and cost effective method for sintering nano-particles, and especially electrically conductive nano-ink powders at respectively low temperatures and at ambient pressure is thus a significant industrial need.
BRIEF DESCRIPTION OF THE INVENTION
In order to understand the invention and to see how it may be carried out in practice preferred embodiments will now be described, by way of non-limiting example only, with reference to the accompanying figures, in which:
Fig.l : The change of relative resistance for silver nano powders coated with surfactant (1) and washed from surfactant (2);
Fig. 2: Relative resistance dependence on temperature for the different particle size silver powders - and measured bulk silver in our measuring system; and Fig. 3: Relative resistance dependence on temperature for the different particle size copper powders - and measured bulk copper in our measuring system.
SUMMARY OF THE INVENTION
It is the main purpose of the present invention to provide useful and novel method for the production of conductive inks comprising metal nano-powders. Said method comprising inter alia the following four steps: (i) admixing metal nano powder in a solvent with at least one ingredient of the group selected from: binder, surfactant, additive, polymer, buffer, dispersant and/or coupling agent in the manner a homogenized solution is obtained; (if) applying the homogenized mixture obtained above on a surface to be coated; ( ) evaporating the solvent from said homogenized mixture; and lastly and most importantly, (iv) sintering the coated layer at temperature range of 50°C to 350°C, providing a conductive ink on top of said surface characterized by resistances between 0.005 Ω/square to 5 Ω/square. Said sintering is preferably provided at ambient pressure (e.g., about atmospheric pressure).
It is in the scope of the present invention wherein the sintering step is provided at temperature of about 50°C. Alternatively or additionally, it is in the scope of the present invention wherein the sintering step is provided for 0.5 to 2 hours.
The present invention also relates to the aforementioned method, wherein the metal nano powder is selected from at least one of the group: metal nano powder; metal nano powder with metal colloids; metal nano powder with a metal reducible salt and/or organic metal complexes and/or organo-metal compounds which decompose to form conductive materials. The concentration of the metal nano-powder in the admixed solution may be between 1% (wt) to 70% (wt). More specifically, the concentration of the metal nano powder in the admixed solution may be between 2% (wt) to 50% (wt).
The admixed solution comprising organic solvent or a mixture of organic solvents including UV and thermally curable monomers. Moreover, the concentration of the organic solvent or the mixture of organic solvents in the admixed solution is between 20%) (wt) to 85%> (wt). Most specifically, said range is between 40% (wt) to 80% (wt). The aforementioned solvent is preferably selected from at least one of the group of petroleum ether, hexane, heptanes, toluene, benzene, acrylates, dichloroethane, trichloroethylene, chloroform, dichloromethane, nitromethane, dibromomethane, cyclopentanone, cyclohexanone or any mixture thereof. The concentration of the aforementioned binder in the admixed solution is preferably between 0% (wt) to 5% (wt). Said binder may be selected from ethyl cellulose and/or modified urea.
It is further in the scope of the present invention wherein the surface to be coated is selected from ceramics, glass, either flexible or relatively non-flexible polymeric films or sheets, polyimides, kepton, polyethylene products, polypropylene, acrylate containing products, polymethyl metaacryalte, e.g., PMMA or Perspex, their co-polymers or any combination thereof, or any printable substrate.
More specifically, the polymeric film comprising at least one of the group of polyesters, polyamides, polycarbonates, polyethylene, polypropylene, their copolymers or any combination thereof.
It is also in the scope of the present invention wherein the method is additionally comprises of a step of treating the surface to be coated by a means of corona treatment and/or coating by primer. Such a primer may be selected from at least one of the group of 3-aminopropyl triethoxy silane, phenyl trimethoxysilane, glycidyl trimethoxysilane, commercially available Tween products, Tween-80, neoalkoxy tri(dioctylpropylphosphato) titanate or any combination thereof.
It is also in the scope of the present invention wherein the nano-powder comprising metal or a mixture of metals selected from silver, gold, platinum, palladium, nickel, cobalt, copper or any combination thereof or any other conductive metal. Additionally or alternatively, said metal is admixed with metal colloids; metal nano powder with a metal reducible salt and/or organic metal complexes and/or organo-metal compounds which decompose to form conductive materials.
The aforementioned method may comprise the step of polymerizing a monomer in the presence of catalyst and/or oxidizing agent and/or reducing agent, in the manner a water miscible polymer is obtained in the homogenized solution. The spreading of the homogenized mixture on a surface to be coated may be provided by a means selected from simple spreading; bar spreading, immersing; spin coating; doping and/or dipping. Moreover, the coating layer or layers provided by the spreading of the homogenized mixture on a surface to be coated may be characterized by a wet thickness of 1 to 200 microns.
It is still another object of the present invention to provide useful any conductive ink comprising metal nano-powders obtained by a process comprising inter alia the step of low temperature sintering at ambient pressure.
It is still in the scope of the present invention to provide the conductive nano-ink as defined above, printed or coated in a predetermined pattern, and to provide a self assembled conductive nano-ink. Particularly, it is in the scope of the present invention to provide the conductive nano-ink, especially adapted for post treatment of surface; wherein said treatment is selected from scratch resistance, increasing adhesion or a combination thereof.
It is a final object of the present invention to provide useful any conductive ink (e.g., nano-powders characterized by resistances between 0.005 Ω/square to 5 Ω/square) comprising metal nano-powders obtained by the method defined in any of the above.
DETAILED DESCRIPTION OF THE INVENTION
The following description is provided, along all chapters of the present invention, so as to enable any person skilled in the art to make use of said invention and sets forth the best modes contemplated by the inventor of carrying out this invention. Various modifications, however, will remain apparent to those skilled in the art, since the generic principles of the present invention have been defined specifically for low sintering temperatures conductive nano-inks and to a method for producing the same.
A novel method of low temperature sintering useful for the production of conductive coatings and inks comprising metal nano-powders (i.e., coatings or inks) is hereby presented. It is according to the present invention that by coating a substrate with an ink, solution or paste that was previously dispersed, cost-effective nano conductive materials and/or conductive transparent coating are produced.
The term 'coating' is referring according to the present invention to any conductive layer produced in the manner of admixing metal nano powder in a solvent with at least one ingredient of the group: binder, surfactant, additive, polymer, buffer, dispersant and/or coupling agent in the manner a homogenized solution is obtained; and then sintering at respectively low temperatures of 50 to 300°C.
The term 'ink' is referring according to the present invention to any ink containing nano-powders of metal or metals, especially emulsion based compositions provided for coloring materials, or alternatively, to legend ink (marking ink) suitable for printing on printed circuit boards (PCB's).
More specifically, the term 'ink' is referring according to the present invention to any conductive topical pattern produced in the manner of admixing metal nano powder in a solvent with at least one ingredient of the group: binder, additive, polymer, buffer, dispersant and/or coupling agent in the manner a homogenized solution is obtained; the solution can be admixed, but not essential, with water or water miscible solvent or mixture of water miscible solvents in the manner a W/O type emulsion is obtained; spreading or printing the homogenized mixture obtained above on said surface to be coated; evaporating the solvent from said homogenized mixture in the manner that a self-assembled network-like pattern is developed in situ or a printed pattern or a complete coverage is formed; and than sintering the network-like pattern at respectively low temperatures of 50 to 300°C so a conductive and nano-ink is obtained.
The inks (e.g., ink paste, inks, solutions, coatings) according to the present invention can also especially be adapted for use in or on top of transparent substrates. The aforementioned ink is adapted for coating, covering, immersing, dipping, and/or entrapping on top or into either solid or semi-solid matrix, or by means of any other suitable technique on such as glass or any polymer matrix, including flexible, semi-flexible or rigid materials.
The present invention discloses the novel properties of the nano metal powders and inks (i.e., conductive-polymers, as well as conductive metals, oxides characterized by D50<60nm and D 0<100nm). Those properties enable the hereto-defined nano-powders to provide an industrial scale production of flexible electrical circuits on substrates such as polymer films and plastics.
It is according to one embodiment of the present invention to provide nano sized particles and grains that have much larger surface area than bulk materials, characterized by special diffusion properties and can be processed so continuous conductive phase is produced at relative low temperatures and lower energy input.
It is according to another embodiment of the present invention to coat a substrate with a nano metal powder or ink. Alternatively, it is according to another embodiment of the present invention to coat a substrate with a solution or paste, in which the nano metal powder were dispersed and sintered at low temperatures of about 50°C and preferably around 100°C to 220°C, in the manner conductive layers characterized by resistances between 0.005 Ω/square to 5 Ω/square are obtained
These resistance values are comparable to resistivity values of between 2.1 TO" and 6.6T0"4 Ω cm. The lowest resistivity obtained is about only 1.5 times higher than bulk silver as measured in our system. While commercially available and literature cited technologies suggested to produce conductive layers require sintering temperatures over 300°C and usually near 900°C the present invention discloses a novel method of sintering at temperatures lower 250°C and/or lower the Tg or melting point of flexible materials such as plastics and polymers.
It is according to another embodiment of the present invention to provide useful printing techniques, selected from screen-printing, manual applicator and manual spreading, lithography, ink jet printing, screen printing, offset printing, fill and mill dispensing machine, spin coating and spray coating yet not limited to them.
Hence, according to yet another embodiment of the present invention almost any type of substrates can be coated. More particularly, those substrates are selected, yet no limited to glass, poly-carbonate, polymer films or any combination thereof.
Examples for formulations for each method are described bellow. These are only representative examples and are described hereby to demonstrate the wide range of possibilities this invention covers, by which we can use the special properties of nano metal powders. It is further acknowledged that the formulations of the hereto-described examples may similarly be made with different binders, solvents, metal powders, additives, polymers, buffers, surfactants, dispersants and/or coupling agents. Nevertheless, according to the present invention, nano powder metals and/or nano powder metal salts characterized by small particle size (D90 < 0.1 μm) which are conductive are especially preferred. Concentrations can be adjusted to control the viscosity and the resistance and transparency of the coated substrate.
It is the scope of the present invention wherein the Resistance is calculated by Ohms law, V = I * R; wherein the Resistivity - p equals R-(H-W/L), where H is the thickness of the powder layer, W is its width, and L is the length of the layer and further wherein Relative Resistance equals (RQ-R)/RO; Ro is the initial resistance of the sample.
EXAMPLE 1
Dry nano Silver metal powders
Silver powders of different sizes, including nano size powders, were produced through the procedure described in U.S. Pat. No. 5,476,535, which is hereto provided as a reference. The powders are coated with organic materials and de-agglomerated. The volume particle size distribution of these powders, measured in a Coulter Particle Size Analyzer LS 230, are presented in Table 1.
Table 1. Silver powders used in experiments
Sample Particle Size Distribution
Number D50 μm D90 μm
1 0.054 0.067
2 0.054 0.066
3 0.052 0.063
4 0.246 2.851
5 3.2 8
The electrical resistances of these powders were measured as a function of the sintering process, see Tab. 2 and Tab. 3.
Reference is made now to figure 1 , presenting the change of relative resistance for silver nano powders coated with surfactant (1) and washed from surfactant (2). Reference is made now to figure 2, presenting the relative resistance dependence on temperature for the different particle size silver powders - and measured bulk silver in our measuring system.
Samples 1, 2 and 3 are nano silver powders; samples 4 and 5 are coarse silver powders with a particle size of over 2.5 μm (D 0). As can be seen nano silver powders achieve better conductivities at lower temperatures. A nano silver powder washed from its coating will give the same performance at even lower temperatures of about 100°C in comparison to around 220°C for the coated powder and over 700°C for coarse silver powders. Table 2: Electrical properties of silver powders
Sample 1 (coated with surfactant) Sample 2 (washed from surfactant)
Resistance Resistivity Temperature Resistance Resistivity Temperature R, Ω p, Ω*cm °C R, Ω p, Ω*cm °C 1300 7.60 236 0.1065 1.24E-3 62
131 0.76 270 0.0166 1.94E-4 127
Table 3: Electrical properties of different particle size silver powders at different sintering temperatures.
T = 120 °C T = 220 °C
Sample Number
Resistance Resistivity Resistance Resistivity
R, Ω p, Ω*cm R, Ω p, Ω*cm
2 0.0203 2.40E-4 0.0034 3.98E-5
4 0.1600 1.20E-3 0.0860 6.61E-4
5 0.4620 3.24E-3 0.4200 2.95E-3
Bulk Silver* 0.0040 1.95E-5 0.0045 2.14E-5 bulk silver measured under same conditions and set-up.
EXAMPLE 2
Dry nano Copper metal powders
Copper powders of different sizes, including nano size powders were produced through the procedure described in U.S. Pat. No. 5,476,535, which is hereto provided as a reference. The powders were coated with organic materials and de-agglomerated.
The volume particle size distribution of these powders, measured in a Coulter Particle
Size Analyzer LS 230, are presented in Table 4.
Table 4. Copper powders used in experiments
Sample Particle Size Distribution Surface area Number D50 μm Mean μm m2/g AS0873 0.073 0.181 7.2
ASX0871 0.35 0.317 6.0
ASX13-1 3.4 3.4 1.3 The electrical resistances of these powders were measured as a function of the sintering process. Reference is made hence to Fig. 3, presenting the relative resistance dependence on temperature for the different particle size copper powders - and measured bulk copper in our measuring system.
EXAMPLE 3
Nano metal powders in formulations.
The formulations are inks or pastes, which facilitate the printing and/or coating process, were prepared according to the general procedures described bellow. Care has to be taken to achieve a good dispersion of the conductive additives (metal nano powders, salts and/or colloids).
Three ink/paste systems were tested. All three have been found to produce a conductive coating at low sintering temperatures. The systems differ in the formulation concept, and main ingredients leading to the conductivity. The main ingredients of the systems are: 1) metal nano powder, 2) metal nano powder with metal colloids, 3) metal nano powder with a metal reducible salt.
Examples for formulations for each method are described bellow. Resistance results for these systems are presented in Tab. 5.
System 1 (described above) formulation; POO 10
Admixing a binder (e.g., ethyl cellulose), 13% (wt/wt) in a solvent (e.g., terpinol). Then, admixing a conductive nano powder metal (e.g., silver nano powder) (D90 < 0.1 μm); 50 parts by weight; terpinol 20 parts by weight, and a coupling agent such as isopropyl dioleic(dioctylphosphato)titanate, also know a the commercially available NDZ-101 KRTTS, 1 parts by weight, to some 25 parts by weight of the solution obtained above, by a means of a high rpm homogenizer.
System 2 (described above) formulation; C121
Intensively admixing colloidal silver, 12 parts by weight; a binder e.g., a binder which is an adhesion promoter, such as Polyvinyl Pyrrolidone (PVP), 2.5 parts by weight; water, 32 parts by weight by a means of an ultrasonic energy and or high rpm dispersing equipment. Then, admixing a conductive nano powder metal (e.g., silver nano powder) (D 0 < 0.1 μm), 14 parts by weight; solvent (e.g., ethanol), 39.5 parts by weight by a means of a high φm homogenizer. Finally admixing the second mixture to the first mixture while mixing and stirring thoroughly.
System 3 (described above) formulation; CU6
Admixing silver formate salt, 1 parts by weight; a dispersant, e.g., trioctylphoshine oxide (TOPO), 2 parts by weight; and a solvent (e.g., ethyl acetate), 80 parts by weight at about 60°C until all components dissolve. Then, admixing a conductive nano powder metal (e.g., silver nano powder) (D90 < 0.1 μm), 17 parts by weight to the obtained brown solution by a means of a high φm homogenizer.
Table 5: Resistance data for nano metal powders ink formulations.
System Formulation Resistance Resistivity Sintering Temperature,
Ω/square Ω cm °C
1 P0010 0.7 2.84E-4 120
1 POO 10 0.05 2.03E-5 300
3 C116 2.8 6.72E-5 120
3 C116 1.17 2.93E-5 300
2 C121 0.255 3.09E-4 100
Bulk Silver* 0.004 1.95E-5 120
Bulk Silver* 0.0045 2.14E-5 220
Bulk silver measured under same conditions and set-up.

Claims

1. A method for the production of conductive inks comprising metal nano-powders, said method comprising; i. admixing metal nano powder in a solvent with at least one ingredient of the group selected from: binder, surfactant, additive, polymer, buffer, dispersant and/or coupling agent in the manner a homogenized solution is obtained; ii. applying the homogenized mixture obtained above on a surface to be coated; iii. evaporating the solvent from said homogenized mixture; and, iv. sintering the coated layer at temperature range of 50°C to 300°C, providing a conductive ink on top of said surface characterized by resistances between 0.005 Ω/square to 5 Ω/square.
2. The method according to claim 1, wherein the sintering step is provided at temperature of about 50°C.
3. The method according to claims 1 or 2, wherein the sintering step is provided for
0.5 to 2 hours.
4. The method according to claim 1, wherein the metal nano powder is selected from at least one of the group: metal nano powder; metal nano powder with metal colloids; metal nano powder with a metal reducible salt and/or organic metal complexes and/or organo-metal compounds which decompose to form conductive materials.
5. The method according to claim 4, wherein the concentration of the metal nano powder in the admixed solution is between 1% (wt) to 70% (wt).
6. The method according to claim 4, wherein the concentration of the metal nano powder in the admixed solution is between 2%> (wt) to 50% (wt).
7. The method according to claim 1, wherein the admixed solution comprising organic solvent or a mixture of organic solvents.
8. The method according to claim 1, wherein the admixed solution comprising organic solvent or a mixture of organic solvents, and UV and thermally curable monomers.
9. The method according to claim 1, wherein the concentration of the organic solvent or the mixture of organic solvents in the admixed solution is between 20% (wt) to 85% (wt).
10. The method according to claim 1, wherein the concentration of the organic solvent or the mixture of organic solvents in the admixed solution is between 40%) (wt) to 80% (wt).
11. The method according to claim 1, wherein the solvent is selected from at least one of the group of petroleum ether, hexane, heptanes, acrylates, toluene, benzene, dichloroethane, trichloroethylene, chloroform, dichloromethane, nitromethane, dibromomethane, cyclopentanone, cyclohexanone or any mixture thereof
12. The method according to claim 1, wherein the concentration of the binder in the admixed solution is between 0% (wt) to 5%> (wt).
13. The method according to claim 1, wherein the binder is selected from ethyl cellulose and/or modified urea.
14. The method according to claim 1, wherein the surface to be coated is selected from glass, either flexible or relatively non-flexible polymeric films or sheets, polyethylene products, polypropylene, acrylate containing products, PMMA, their co-polymers or any combination thereof.
15. The method according to claim 13, wherein the polymeric film comprising at least one of the group of polyesters, polyamides, polycarbonates, polyethylene, polypropylene, their copolymers or any combination thereof.
16. The method according to claim 1, additionally comprising the step of treating the surface to be coated by a means of corona treatment and/or coating by primer.
17. The method according to claim 15, wherein the primer is selected from at least one of the group of 3-aminopropyl triethoxy silane, phenyl trimethoxysilane, glycidyl trimethoxysilane, commercially available Tween products, Tween-80, neoalkoxy tri(dioctylpropylphosphato) titanate or any combination thereof.
18. The method according to claim 1 wherein the nano-powder comprising metal or a mixture of metals selected from silver, gold, platinum, palladium, nickel, cobalt, copper or any combination thereof.
19. The method according to claim 1 wherein the nano-powder comprising metal is admixed with metal colloids; metal nano powder with a metal reducible salt and/or organic metal complexes and/or organo-metal compounds which decompose to form conductive materials.
20. The method according to claim 1, comprising the step of polymerizing a monomer in the presence of catalyst and/or oxidizing agent and/or reducing agent, in the manner a water miscible polymer is obtained in the homogenized solution.
21. The method according to claim 1, wherein the spreading of the homogenized mixture on a surface to be coated is provided by a means selected from simple spreading; bar spreading, immersing; spin coating; doping and/or dipping.
22. The method according to claim 20, wherein the coating layer or layers provided by the spreading of the homogenized mixture on a surface to be coated is characterized by a wet thickness of 1 to 200 microns.
23. The method according to claim 1 , wherein the sintering step is provided at ambient pressure.
24. The method according to claim 1, additionally comprising a step of washing the powder before sintering so a lower temperature is required for the onset of the conductivity.
25. Conductive nano-ink comprising metal nano-powders obtained by a process comprising inter alia the step of low temperature sintering at ambient pressure.
26. Conductive nano-ink comprising metal nano-powders obtained by the method defined in claims 1 to 24.
27. The conductive nano-ink according to claim 25, printed or coated in a predetermined pattern.
28. A self assembled conductive nano-ink according to claim 25.
29. The conductive nano-ink according to claim 25, especially adapted for post treatment of surface; wherein said treatment is selected from scratch resistance, increasing adhesion or a combination thereof.
PCT/IL2003/000554 2002-06-13 2003-07-03 Low sintering temperatures conductive nano-inks and a method for producing the same WO2004005413A1 (en)

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CN03815904XA CN1671805B (en) 2002-07-03 2003-07-03 Low sintering temperatures conductive nano-inks and a method for producing the same
JP2004519139A JP2005531679A (en) 2002-07-03 2003-07-03 Low temperature sintered conductive nano ink and method for producing the same
IL16573604A IL165736A0 (en) 2002-07-03 2004-12-13 Low sintering temperatures conductive nano-inks and a method for producing the same
US11/010,949 US7601406B2 (en) 2002-06-13 2004-12-13 Nano-powder-based coating and ink compositions
US11/010,947 US7566360B2 (en) 2002-06-13 2004-12-13 Nano-powder-based coating and ink compositions
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US11/010,947 Continuation-In-Part US7566360B2 (en) 2002-06-13 2004-12-13 Nano-powder-based coating and ink compositions
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Cited By (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005229109A (en) * 2004-02-10 2005-08-25 E I Du Pont De Nemours & Co Thick-film ink composite possible to be printed in ink jet, and method therefor
WO2006049776A2 (en) * 2004-10-29 2006-05-11 Hewlett-Packard Development Company, L.P. Ink-jet printing of coupling agents for trace or circuit deposition templating
JP2006152203A (en) * 2004-12-01 2006-06-15 Mitsui Mining & Smelting Co Ltd Ito ink
WO2006070747A1 (en) * 2004-12-27 2006-07-06 Mitsui Mining & Smelting Co., Ltd. Conductive ink
WO2006076611A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Production of metal nanoparticles
WO2006076603A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Printable electrical conductors
EP1716578A2 (en) * 2004-02-18 2006-11-02 Virginia Tech Intellectual Properties, Inc. Nanoscale metal paste for interconnect and method of use
GB2411406B (en) * 2003-01-10 2006-12-06 Qinetiq Nanomaterials Ltd Ink jet deposition of nanoparticles
JP2006332051A (en) * 2005-05-23 2006-12-07 Samsung Electro-Mechanics Co Ltd Conductive ink, preparation method thereof and conductive board
WO2007038950A1 (en) 2005-09-28 2007-04-12 Stichting Dutch Polymer Institute Method for generation of metal surface structures and apparatus therefor
KR100726591B1 (en) * 2005-12-22 2007-06-12 재단법인 포항산업과학연구원 Method for preparing of ni nano powder for inorganic conducting ink
KR100726592B1 (en) * 2005-12-23 2007-06-12 재단법인 포항산업과학연구원 Manufacturing method of nano copper powder for an inorganic matter conductivity ink
EP1835512A1 (en) * 2004-10-08 2007-09-19 Mitsui Mining & Smelting Co., Ltd. Conductive ink
WO2007128015A2 (en) * 2006-05-04 2007-11-15 At & S Austria Technologie & Systemtechnik Aktiengesellschaft Method for producing at least one conductive element of a printed-circuit board, printed-circuit board and use of this method
EP1896634A2 (en) * 2005-06-10 2008-03-12 Cima Nano Tech Israel Ltd Enhanced transparent conductive coatings and methods for making them
WO2009052120A1 (en) * 2007-10-15 2009-04-23 Nanoink, Inc. Lithography of nanoparticle based inks
EP2074055A1 (en) * 2006-09-29 2009-07-01 LG Chem, Ltd. Ink for ink jet printing and method for preparing metal nanoparticles used therein
US20090269505A1 (en) * 2008-01-31 2009-10-29 Industrial Technology Research Institute Method for manufacturing a substrate with surface structure by employing photothermal effect
KR100951697B1 (en) 2009-10-30 2010-04-07 주식회사 연안테크놀로지 Ink including nano silver particle for selective metal plating and manufacturing method thereof
US7722786B2 (en) 2007-02-23 2010-05-25 Henkel Ag & Co. Kgaa Conductive materials
EP2194764A1 (en) 2008-12-04 2010-06-09 Stichting Dutch Polymer Institute Method for generation of electrically conducting surface structures, apparatus therefor and use
EP2207407A1 (en) 2009-01-13 2010-07-14 Stichting Dutch Polymer Institute Method for generation of electrically conducting surface structures, device and use
EP2251389A1 (en) * 2005-08-12 2010-11-17 Cambrios Technologies Corporation Nanowire ink
CN101597440B (en) * 2008-06-05 2011-07-27 富葵精密组件(深圳)有限公司 Printing ink, method using printing ink to manufacture electric conduction line and circuit board therewith
US8167393B2 (en) 2005-01-14 2012-05-01 Cabot Corporation Printable electronic features on non-uniform substrate and processes for making same
US20120114927A1 (en) * 2010-11-03 2012-05-10 Oscar Khaselev Sintering materials and attachment methods using same
US8257795B2 (en) 2004-02-18 2012-09-04 Virginia Tech Intellectual Properties, Inc. Nanoscale metal paste for interconnect and method of use
US8383014B2 (en) 2010-06-15 2013-02-26 Cabot Corporation Metal nanoparticle compositions
WO2013036519A1 (en) * 2011-09-06 2013-03-14 Henkel Corporation Conductive material and process
US8404160B2 (en) 2007-05-18 2013-03-26 Applied Nanotech Holdings, Inc. Metallic ink
US8422197B2 (en) 2009-07-15 2013-04-16 Applied Nanotech Holdings, Inc. Applying optical energy to nanoparticles to produce a specified nanostructure
US8506849B2 (en) 2008-03-05 2013-08-13 Applied Nanotech Holdings, Inc. Additives and modifiers for solvent- and water-based metallic conductive inks
US8632700B2 (en) 2008-02-26 2014-01-21 Cambrios Technologies Corporation Methods and compositions for ink jet deposition of conductive features
CN103525199A (en) * 2013-10-24 2014-01-22 北京印刷学院 Preparation method for heating-post-treatment-free nanometer copper printing ink
US8647979B2 (en) 2009-03-27 2014-02-11 Applied Nanotech Holdings, Inc. Buffer layer to enhance photo and/or laser sintering
US8659158B2 (en) 2006-08-16 2014-02-25 Funai Electric Co., Ltd. Thermally inkjettable acrylic dielectric ink formulation and process
EP2753667A1 (en) * 2011-09-06 2014-07-16 Henkel IP & Holding GmbH Conductive material and process
WO2014120093A1 (en) * 2013-01-31 2014-08-07 Agency For Science, Technology And Research Electrically conductive ink composition and method of preparation thereof
US9145503B2 (en) 2010-12-02 2015-09-29 Korea Institute Of Machinery And Materials Low temperature sintering conductive metal film and preparation method thereof
USRE45802E1 (en) 2005-07-28 2015-11-17 High Voltage Graphics, Inc. Flocked articles having noncompatible insert and porous film
US9193214B2 (en) 2012-10-12 2015-11-24 High Voltage Graphics, Inc. Flexible heat sealable decorative articles and method for making the same
KR101610790B1 (en) 2008-07-02 2016-04-12 어플라이드 나노테크 홀딩스, 인크. Metallic pastes and inks
US9730333B2 (en) 2008-05-15 2017-08-08 Applied Nanotech Holdings, Inc. Photo-curing process for metallic inks
US10301496B2 (en) 2013-08-16 2019-05-28 Henkel IP & Holding GmbH Submicron silver particle ink compositions, process and applications
US10384936B2 (en) 2002-12-09 2019-08-20 University Of Washington Methods of nanostructure formation and shape selection
US10981231B2 (en) 2006-02-01 2021-04-20 University Of Washington Methods for production of silver nanostructures
CN113831864A (en) * 2021-11-11 2021-12-24 苏州诺菲纳米科技有限公司 Single-layer nano silver wire strippable conductive adhesive and preparation method thereof
US11212916B2 (en) 2018-05-08 2021-12-28 W. L. Gore & Associates, Inc. Flexible printed circuits for dermal applications
US11330711B2 (en) 2018-05-08 2022-05-10 W. L. Gore & Associates, Inc. Flexible and durable printed circuits on stretchable and non-stretchable substrates
US11412609B2 (en) 2018-05-08 2022-08-09 W. L. Gore & Associates, Inc. Flexible and stretchable printed circuits on stretchable substrates
US11535017B2 (en) 2017-04-04 2022-12-27 W. L. Gore & Associates Gmbh Dielectric composite with reinforced elastomer and integrate electrode

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4721677B2 (en) * 2004-09-06 2011-07-13 株式会社秀峰 Printing or coating image creation method and printing or coating image body thereby
JP5096735B2 (en) 2006-12-05 2012-12-12 Jx日鉱日石エネルギー株式会社 Wire grid polarizer and method for manufacturing the same, and retardation film and liquid crystal display device using the same
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US8308993B2 (en) * 2008-01-30 2012-11-13 Basf Se Conductive inks
JP2010012714A (en) * 2008-07-04 2010-01-21 Toda Kogyo Corp Method for manufacturing functional thin-film, functional thin-film, method for manufacturing functional thin-film laminated base material, and functional thin-film laminated base material
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CN101805538B (en) * 2010-04-08 2014-05-07 中国科学院宁波材料技术与工程研究所 Lower-temperature sintered conductive ink
WO2012103285A2 (en) * 2011-01-29 2012-08-02 Pchem Associates, Inc. Methods and systems for generating a substantially transparent and conductive substrate
CN102522342A (en) * 2011-12-27 2012-06-27 日月光半导体制造股份有限公司 Semiconductor structure and method for manufacturing same
WO2014028754A1 (en) * 2012-08-16 2014-02-20 Cima Nanotech Israel Ltd. Emulsions for preparing transparent conductive coatings
US10040960B2 (en) * 2012-09-28 2018-08-07 Toppan Forms Co., Ltd. Silver ink composition, conductor and communication device
CN103627255B (en) * 2013-05-06 2015-05-20 苏州冷石纳米材料科技有限公司 Nano-silver conductive ink and conductive film prepared by employing same
KR102490064B1 (en) * 2020-11-27 2023-01-19 한국전자기술연구원 A Conductive Ink Composition and a Conductive Substrate using the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0977212A2 (en) * 1998-07-31 2000-02-02 International Business Machines Corporation Method for producing nanoparticles of transition metals
WO2001030520A1 (en) * 1999-10-22 2001-05-03 Chrysalis Technologies Incorporated Nanosized intermetallic powders
US6379745B1 (en) * 1997-02-20 2002-04-30 Parelec, Inc. Low temperature method and compositions for producing electrical conductors

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2837910B2 (en) * 1990-03-01 1998-12-16 チタン工業株式会社 Method for producing noble metal fine particles using emulsion type liquid film method
JPH0821254B2 (en) * 1991-02-22 1996-03-04 旭化成工業株式会社 Copper alloy composition, molded product, paste and adhesive printed using the same
JP2955985B2 (en) * 1994-08-31 1999-10-04 ナノパウダース インダストリーズ(イスラエル)リミテッド Method for producing high-purity ultrafine metal powder
WO1998037133A1 (en) * 1997-02-20 1998-08-27 Partnerships Limited, Inc. Low temperature method and compositions for producing electrical conductors
JP3266066B2 (en) * 1997-09-05 2002-03-18 三菱マテリアル株式会社 Composition for forming conductive film containing fine metal particles with excellent storage stability
JP3646784B2 (en) * 2000-03-31 2005-05-11 セイコーエプソン株式会社 Thin film pattern manufacturing method and microstructure
JP2001325831A (en) * 2000-05-12 2001-11-22 Bando Chem Ind Ltd Metal colloid solution, conductive ink, conductive coating and conductive coating forming base film
US6734029B2 (en) * 2000-06-30 2004-05-11 Seiko Epson Corporation Method for forming conductive film pattern, and electro-optical device and electronic apparatus
JP5008216B2 (en) * 2000-10-13 2012-08-22 株式会社アルバック Inkjet ink manufacturing method
JP4355436B2 (en) * 2000-10-25 2009-11-04 森村ケミカル株式会社 Method for forming wiring pattern, method for manufacturing circuit board, and method for manufacturing translucent body having light-shielding pattern formed thereon

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6379745B1 (en) * 1997-02-20 2002-04-30 Parelec, Inc. Low temperature method and compositions for producing electrical conductors
EP0977212A2 (en) * 1998-07-31 2000-02-02 International Business Machines Corporation Method for producing nanoparticles of transition metals
WO2001030520A1 (en) * 1999-10-22 2001-05-03 Chrysalis Technologies Incorporated Nanosized intermetallic powders

Cited By (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10384936B2 (en) 2002-12-09 2019-08-20 University Of Washington Methods of nanostructure formation and shape selection
US11471939B2 (en) 2002-12-09 2022-10-18 University Of Washington Methods of nanostructure formation and shape selection
GB2411406B (en) * 2003-01-10 2006-12-06 Qinetiq Nanomaterials Ltd Ink jet deposition of nanoparticles
JP2005229109A (en) * 2004-02-10 2005-08-25 E I Du Pont De Nemours & Co Thick-film ink composite possible to be printed in ink jet, and method therefor
EP1716578A4 (en) * 2004-02-18 2009-11-11 Virginia Tech Intell Prop Nanoscale metal paste for interconnect and method of use
EP1716578A2 (en) * 2004-02-18 2006-11-02 Virginia Tech Intellectual Properties, Inc. Nanoscale metal paste for interconnect and method of use
US8257795B2 (en) 2004-02-18 2012-09-04 Virginia Tech Intellectual Properties, Inc. Nanoscale metal paste for interconnect and method of use
EP1835512A1 (en) * 2004-10-08 2007-09-19 Mitsui Mining & Smelting Co., Ltd. Conductive ink
EP1835512A4 (en) * 2004-10-08 2008-02-20 Mitsui Mining & Smelting Co Conductive ink
WO2006049776A3 (en) * 2004-10-29 2006-07-13 Hewlett Packard Development Co Ink-jet printing of coupling agents for trace or circuit deposition templating
WO2006049776A2 (en) * 2004-10-29 2006-05-11 Hewlett-Packard Development Company, L.P. Ink-jet printing of coupling agents for trace or circuit deposition templating
JP2006152203A (en) * 2004-12-01 2006-06-15 Mitsui Mining & Smelting Co Ltd Ito ink
WO2006070747A1 (en) * 2004-12-27 2006-07-06 Mitsui Mining & Smelting Co., Ltd. Conductive ink
US8043535B2 (en) 2004-12-27 2011-10-25 Mitsui Mining & Smelting Co., Ltd. Conductive ink
WO2006076611A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Production of metal nanoparticles
US8167393B2 (en) 2005-01-14 2012-05-01 Cabot Corporation Printable electronic features on non-uniform substrate and processes for making same
WO2006076611A3 (en) * 2005-01-14 2007-03-01 Cabot Corp Production of metal nanoparticles
WO2006076603A3 (en) * 2005-01-14 2006-11-16 Cabot Corp Printable electrical conductors
US7749299B2 (en) 2005-01-14 2010-07-06 Cabot Corporation Production of metal nanoparticles
WO2006076603A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Printable electrical conductors
US8668848B2 (en) 2005-01-14 2014-03-11 Cabot Corporation Metal nanoparticle compositions for reflective features
JP4562688B2 (en) * 2005-05-23 2010-10-13 サムソン エレクトロ−メカニックス カンパニーリミテッド. Conductive ink, method for producing the same, and conductive substrate
JP2006332051A (en) * 2005-05-23 2006-12-07 Samsung Electro-Mechanics Co Ltd Conductive ink, preparation method thereof and conductive board
EP1896634A2 (en) * 2005-06-10 2008-03-12 Cima Nano Tech Israel Ltd Enhanced transparent conductive coatings and methods for making them
EP1896634A4 (en) * 2005-06-10 2012-01-04 Cima Nano Tech Israel Ltd Enhanced transparent conductive coatings and methods for making them
US8105472B2 (en) 2005-06-10 2012-01-31 Cima Nanotech Israel Ltd. Enhanced transparent conductive coatings and methods for making them
USRE45802E1 (en) 2005-07-28 2015-11-17 High Voltage Graphics, Inc. Flocked articles having noncompatible insert and porous film
US8618531B2 (en) 2005-08-12 2013-12-31 Cambrios Technologies Corporation Transparent conductors comprising metal nanowires
CN102250506A (en) * 2005-08-12 2011-11-23 凯博瑞奥斯技术公司 Nanowires-based transparent conductors
EP2251389A1 (en) * 2005-08-12 2010-11-17 Cambrios Technologies Corporation Nanowire ink
US9899123B2 (en) 2005-08-12 2018-02-20 Jonathan S. Alden Nanowires-based transparent conductors
US8865027B2 (en) 2005-08-12 2014-10-21 Cambrios Technologies Corporation Nanowires-based transparent conductors
US8049333B2 (en) 2005-08-12 2011-11-01 Cambrios Technologies Corporation Transparent conductors comprising metal nanowires
WO2007038950A1 (en) 2005-09-28 2007-04-12 Stichting Dutch Polymer Institute Method for generation of metal surface structures and apparatus therefor
KR100726591B1 (en) * 2005-12-22 2007-06-12 재단법인 포항산업과학연구원 Method for preparing of ni nano powder for inorganic conducting ink
KR100726592B1 (en) * 2005-12-23 2007-06-12 재단법인 포항산업과학연구원 Manufacturing method of nano copper powder for an inorganic matter conductivity ink
US10981231B2 (en) 2006-02-01 2021-04-20 University Of Washington Methods for production of silver nanostructures
WO2007128015A3 (en) * 2006-05-04 2008-03-27 Austria Tech & System Tech Method for producing at least one conductive element of a printed-circuit board, printed-circuit board and use of this method
WO2007128015A2 (en) * 2006-05-04 2007-11-15 At & S Austria Technologie & Systemtechnik Aktiengesellschaft Method for producing at least one conductive element of a printed-circuit board, printed-circuit board and use of this method
US8659158B2 (en) 2006-08-16 2014-02-25 Funai Electric Co., Ltd. Thermally inkjettable acrylic dielectric ink formulation and process
US11708503B2 (en) 2006-08-16 2023-07-25 Funai Electric Holdings Co., Ltd. Thermally inkjettable acrylic dielectric ink formulation and process
US10703922B2 (en) 2006-08-16 2020-07-07 Funai Electric Co., Ltd. Thermally inkjettable acrylic dielectric ink formulation and process
EP2074055A4 (en) * 2006-09-29 2011-03-23 Lg Chemical Ltd Ink for ink jet printing and method for preparing metal nanoparticles used therein
EP2074055A1 (en) * 2006-09-29 2009-07-01 LG Chem, Ltd. Ink for ink jet printing and method for preparing metal nanoparticles used therein
US7722786B2 (en) 2007-02-23 2010-05-25 Henkel Ag & Co. Kgaa Conductive materials
US8404160B2 (en) 2007-05-18 2013-03-26 Applied Nanotech Holdings, Inc. Metallic ink
WO2009052120A1 (en) * 2007-10-15 2009-04-23 Nanoink, Inc. Lithography of nanoparticle based inks
US20090269505A1 (en) * 2008-01-31 2009-10-29 Industrial Technology Research Institute Method for manufacturing a substrate with surface structure by employing photothermal effect
US8632700B2 (en) 2008-02-26 2014-01-21 Cambrios Technologies Corporation Methods and compositions for ink jet deposition of conductive features
US8815126B2 (en) 2008-02-26 2014-08-26 Cambrios Technologies Corporation Method and composition for screen printing of conductive features
US8506849B2 (en) 2008-03-05 2013-08-13 Applied Nanotech Holdings, Inc. Additives and modifiers for solvent- and water-based metallic conductive inks
US9730333B2 (en) 2008-05-15 2017-08-08 Applied Nanotech Holdings, Inc. Photo-curing process for metallic inks
CN101597440B (en) * 2008-06-05 2011-07-27 富葵精密组件(深圳)有限公司 Printing ink, method using printing ink to manufacture electric conduction line and circuit board therewith
KR101610790B1 (en) 2008-07-02 2016-04-12 어플라이드 나노테크 홀딩스, 인크. Metallic pastes and inks
WO2010063481A1 (en) * 2008-12-04 2010-06-10 Stichting Dutch Polymer Institute Method for generation of electrically conducting surface structures, apparatus therefor and use
EP2194764A1 (en) 2008-12-04 2010-06-09 Stichting Dutch Polymer Institute Method for generation of electrically conducting surface structures, apparatus therefor and use
WO2010081677A1 (en) 2009-01-13 2010-07-22 Stichting Dutch Polymer Institute Method for generation of electrically conducting surface structures, device and use
EP2207407A1 (en) 2009-01-13 2010-07-14 Stichting Dutch Polymer Institute Method for generation of electrically conducting surface structures, device and use
US8647979B2 (en) 2009-03-27 2014-02-11 Applied Nanotech Holdings, Inc. Buffer layer to enhance photo and/or laser sintering
US9131610B2 (en) 2009-03-27 2015-09-08 Pen Inc. Buffer layer for sintering
US8422197B2 (en) 2009-07-15 2013-04-16 Applied Nanotech Holdings, Inc. Applying optical energy to nanoparticles to produce a specified nanostructure
KR100951697B1 (en) 2009-10-30 2010-04-07 주식회사 연안테크놀로지 Ink including nano silver particle for selective metal plating and manufacturing method thereof
US8383014B2 (en) 2010-06-15 2013-02-26 Cabot Corporation Metal nanoparticle compositions
US10535628B2 (en) * 2010-11-03 2020-01-14 Alpha Assembly Solutions Inc. Sintering materials and attachment methods using same
US20120114927A1 (en) * 2010-11-03 2012-05-10 Oscar Khaselev Sintering materials and attachment methods using same
US9145503B2 (en) 2010-12-02 2015-09-29 Korea Institute Of Machinery And Materials Low temperature sintering conductive metal film and preparation method thereof
WO2013036519A1 (en) * 2011-09-06 2013-03-14 Henkel Corporation Conductive material and process
EP2753667A4 (en) * 2011-09-06 2015-04-29 Henkel IP & Holding GmbH Conductive material and process
EP2753667A1 (en) * 2011-09-06 2014-07-16 Henkel IP & Holding GmbH Conductive material and process
US10999933B2 (en) 2011-09-06 2021-05-04 Henkel IP & Holding GmbH Conductive material and process
US9193214B2 (en) 2012-10-12 2015-11-24 High Voltage Graphics, Inc. Flexible heat sealable decorative articles and method for making the same
WO2014120093A1 (en) * 2013-01-31 2014-08-07 Agency For Science, Technology And Research Electrically conductive ink composition and method of preparation thereof
US10301496B2 (en) 2013-08-16 2019-05-28 Henkel IP & Holding GmbH Submicron silver particle ink compositions, process and applications
CN103525199A (en) * 2013-10-24 2014-01-22 北京印刷学院 Preparation method for heating-post-treatment-free nanometer copper printing ink
US11535017B2 (en) 2017-04-04 2022-12-27 W. L. Gore & Associates Gmbh Dielectric composite with reinforced elastomer and integrate electrode
US11330711B2 (en) 2018-05-08 2022-05-10 W. L. Gore & Associates, Inc. Flexible and durable printed circuits on stretchable and non-stretchable substrates
US11412609B2 (en) 2018-05-08 2022-08-09 W. L. Gore & Associates, Inc. Flexible and stretchable printed circuits on stretchable substrates
US11212916B2 (en) 2018-05-08 2021-12-28 W. L. Gore & Associates, Inc. Flexible printed circuits for dermal applications
CN113831864A (en) * 2021-11-11 2021-12-24 苏州诺菲纳米科技有限公司 Single-layer nano silver wire strippable conductive adhesive and preparation method thereof

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