UA89792C2 - Устройство и метод для приведения в состояние левитации некоторого количества проводникового материала - Google Patents
Устройство и метод для приведения в состояние левитации некоторого количества проводникового материалаInfo
- Publication number
- UA89792C2 UA89792C2 UAA200702502A UAA200702502A UA89792C2 UA 89792 C2 UA89792 C2 UA 89792C2 UA A200702502 A UAA200702502 A UA A200702502A UA A200702502 A UAA200702502 A UA A200702502A UA 89792 C2 UA89792 C2 UA 89792C2
- Authority
- UA
- Ukraine
- Prior art keywords
- conductive material
- amount
- coil
- levitation
- generating
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/22—Furnaces without an endless core
- H05B6/32—Arrangements for simultaneous levitation and heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Induction Heating (AREA)
- Physical Vapour Deposition (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Furnace Details (AREA)
- Lubricants (AREA)
Abstract
Устройство для приведения в состояние левитации некоторого количества проводникового материала состоит из двух катушек: первой катушки и второй катушки, которые во время использования генерируют переменное электромагнитное поле, причем переменные электромагнитные поля первой и второй катушек противодействуют друг другу. Катушки расположены таким образом, что проводниковый материал, который держат в состоянии левитации между первой катушкой и второй катушкой, испаряется.Способ генерирования некоторого количества проводникового материала в состоянии левитации включает захват проводникового материала между электромагнитными полями, созданными двумя катушками для испарения с помощью нагревания током и частотой в катушках, причем проводниковый материал, который испаряют, направляется в целом в
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/923,505 US7323229B2 (en) | 2002-02-21 | 2004-08-23 | Method and device for coating a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
UA89792C2 true UA89792C2 (ru) | 2010-03-10 |
Family
ID=34971215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UAA200702502A UA89792C2 (ru) | 2004-08-23 | 2005-05-31 | Устройство и метод для приведения в состояние левитации некоторого количества проводникового материала |
Country Status (16)
Country | Link |
---|---|
EP (1) | EP1785010B1 (ru) |
JP (1) | JP5064222B2 (ru) |
KR (1) | KR101143067B1 (ru) |
CN (1) | CN101006751B (ru) |
AT (1) | ATE428290T1 (ru) |
AU (1) | AU2005276729B2 (ru) |
BR (1) | BRPI0514545A (ru) |
CA (1) | CA2576541C (ru) |
DE (1) | DE602005013791D1 (ru) |
ES (1) | ES2324921T3 (ru) |
HK (1) | HK1109292A1 (ru) |
MX (1) | MX2007002191A (ru) |
PL (1) | PL1785010T3 (ru) |
RU (1) | RU2370921C2 (ru) |
UA (1) | UA89792C2 (ru) |
WO (1) | WO2006021245A1 (ru) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100961371B1 (ko) | 2007-12-28 | 2010-06-07 | 주식회사 포스코 | 실러 접착성 및 내식성이 우수한 아연계 합금도금강판과 그제조방법 |
DE102009042972A1 (de) | 2009-09-16 | 2011-03-24 | Technische Universität Ilmenau | Vorrichtung und Verfahren zum Manipulieren einer levitierten elektrisch leitfähigen Substanz |
KR101639812B1 (ko) * | 2009-09-29 | 2016-07-15 | 주식회사 포스코 | 소재의 부양 가열 장치 |
KR101639813B1 (ko) * | 2009-10-08 | 2016-07-15 | 주식회사 포스코 | 연속 코팅 장치 |
WO2012081738A1 (en) * | 2010-12-13 | 2012-06-21 | Posco | Continuous coating apparatus |
DE102011018675A1 (de) | 2011-04-18 | 2012-10-18 | Technische Universität Ilmenau | Vorrichtung und Verfahren zum aktiven Manipulieren einer elektrisch leitfähigen Substanz |
KR101359218B1 (ko) * | 2011-12-27 | 2014-02-06 | 주식회사 포스코 | 부양 가열장치 |
KR101365467B1 (ko) * | 2012-04-24 | 2014-02-24 | 한국표준과학연구원 | 박막 증착 장치 |
RU2522666C2 (ru) * | 2012-06-27 | 2014-07-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Юго-Западный государственный университет" (ЮЗГУ) | Устройство для левитации некоторого количества материала |
EP3124648B1 (de) * | 2015-07-31 | 2018-03-28 | Hilberg & Partner GmbH | Verdampfersystem sowie verdampfungsverfahren für die beschichtung eines bandförmigen substrats |
RU2693852C2 (ru) * | 2017-11-07 | 2019-07-05 | Федеральное государственное бюджетное образовательное учреждение высшего образования " Юго-Западный государственный университет" (ЮЗГУ) | Устройство для левитации некоторого количества материала |
PL233811B1 (pl) * | 2017-12-11 | 2019-11-29 | Politechnika Slaska Im Wincent | Urzadzenie do wieloskalowego topienia lewitacyjnego |
DE102018117302A1 (de) * | 2018-07-17 | 2020-01-23 | Ald Vacuum Technologies Gmbh | Schwebeschmelzverfahren mit einem ringförmigen Element |
KR20200076389A (ko) | 2018-12-19 | 2020-06-29 | 주식회사 포스코 | Pvd 도금 공정에서의 도금층 제어 장치 및 방법 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686864A (en) * | 1951-01-17 | 1954-08-17 | Westinghouse Electric Corp | Magnetic levitation and heating of conductive materials |
US2957064A (en) * | 1958-09-30 | 1960-10-18 | Westinghouse Electric Corp | Stabilizing of levitation melting |
BE655473A (ru) * | 1963-11-21 | 1900-01-01 | ||
JPS621863A (ja) * | 1985-06-28 | 1987-01-07 | Ishikawajima Harima Heavy Ind Co Ltd | 金属蒸発装置 |
JPH0781181B2 (ja) * | 1986-07-10 | 1995-08-30 | 石川島播磨重工業株式会社 | 成膜装置 |
DE3833255A1 (de) * | 1988-09-30 | 1990-04-05 | Deutsche Forsch Luft Raumfahrt | Vorrichtung zum behaelterlosen positionieren und schmelzen von elektrisch leitenden materialien |
DE3836239A1 (de) * | 1988-10-25 | 1990-04-26 | Deutsche Forsch Luft Raumfahrt | Vorrichtung zum behaelterlosen positionieren und schmelzen von elektrisch leitenden materialien |
JPH0797680A (ja) * | 1993-09-30 | 1995-04-11 | Kao Corp | 薄膜形成装置 |
JP3129076B2 (ja) * | 1994-03-02 | 2001-01-29 | 富士電機株式会社 | 浮揚溶解装置とその出湯方法 |
JPH07252639A (ja) * | 1994-03-15 | 1995-10-03 | Kao Corp | 金属薄膜体の製造方法 |
JPH08104981A (ja) * | 1994-10-05 | 1996-04-23 | Sumitomo Electric Ind Ltd | Pvd装置 |
JPH08199345A (ja) * | 1995-01-30 | 1996-08-06 | Mitsubishi Electric Corp | 成膜装置及び成膜方法 |
NL1020059C2 (nl) * | 2002-02-21 | 2003-08-25 | Corus Technology B V | Werkwijze en inrichting voor het bekleden van een substraat. |
JP4156885B2 (ja) * | 2002-09-11 | 2008-09-24 | 株式会社アルバック | 薄膜形成装置 |
-
2005
- 2005-05-31 AU AU2005276729A patent/AU2005276729B2/en not_active Ceased
- 2005-05-31 MX MX2007002191A patent/MX2007002191A/es active IP Right Grant
- 2005-05-31 WO PCT/EP2005/005905 patent/WO2006021245A1/en active Application Filing
- 2005-05-31 PL PL05754666T patent/PL1785010T3/pl unknown
- 2005-05-31 UA UAA200702502A patent/UA89792C2/ru unknown
- 2005-05-31 DE DE602005013791T patent/DE602005013791D1/de active Active
- 2005-05-31 ES ES05754666T patent/ES2324921T3/es active Active
- 2005-05-31 KR KR1020077006446A patent/KR101143067B1/ko active IP Right Grant
- 2005-05-31 BR BRPI0514545-7A patent/BRPI0514545A/pt not_active IP Right Cessation
- 2005-05-31 EP EP05754666A patent/EP1785010B1/en not_active Not-in-force
- 2005-05-31 CA CA2576541A patent/CA2576541C/en not_active Expired - Fee Related
- 2005-05-31 JP JP2007528625A patent/JP5064222B2/ja not_active Expired - Fee Related
- 2005-05-31 CN CN2005800280853A patent/CN101006751B/zh not_active Expired - Fee Related
- 2005-05-31 AT AT05754666T patent/ATE428290T1/de active
- 2005-05-31 RU RU2007110642/09A patent/RU2370921C2/ru not_active IP Right Cessation
-
2007
- 2007-12-31 HK HK07114323.2A patent/HK1109292A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
BRPI0514545A (pt) | 2008-06-17 |
MX2007002191A (es) | 2007-05-08 |
CA2576541C (en) | 2012-01-10 |
KR101143067B1 (ko) | 2012-05-08 |
WO2006021245A1 (en) | 2006-03-02 |
KR20070067097A (ko) | 2007-06-27 |
EP1785010A1 (en) | 2007-05-16 |
JP2008515133A (ja) | 2008-05-08 |
RU2007110642A (ru) | 2008-09-27 |
HK1109292A1 (en) | 2008-05-30 |
RU2370921C2 (ru) | 2009-10-20 |
CN101006751A (zh) | 2007-07-25 |
JP5064222B2 (ja) | 2012-10-31 |
EP1785010B1 (en) | 2009-04-08 |
CA2576541A1 (en) | 2006-03-02 |
DE602005013791D1 (de) | 2009-05-20 |
AU2005276729A1 (en) | 2006-03-02 |
AU2005276729B2 (en) | 2010-08-26 |
CN101006751B (zh) | 2011-04-27 |
ES2324921T3 (es) | 2009-08-19 |
PL1785010T3 (pl) | 2009-08-31 |
ATE428290T1 (de) | 2009-04-15 |
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