JP5064222B2 - ある量の導電性材料を浮揚させる装置および方法 - Google Patents
ある量の導電性材料を浮揚させる装置および方法 Download PDFInfo
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- JP5064222B2 JP5064222B2 JP2007528625A JP2007528625A JP5064222B2 JP 5064222 B2 JP5064222 B2 JP 5064222B2 JP 2007528625 A JP2007528625 A JP 2007528625A JP 2007528625 A JP2007528625 A JP 2007528625A JP 5064222 B2 JP5064222 B2 JP 5064222B2
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- Prior art keywords
- coil
- coils
- conductive material
- evaporated
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/22—Furnaces without an endless core
- H05B6/32—Arrangements for simultaneous levitation and heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Induction Heating (AREA)
- Physical Vapour Deposition (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Furnace Details (AREA)
- Lubricants (AREA)
Description
Claims (10)
- ある量の導電性材料を浮揚させる装置であって、コイル中の変動する電流を使用して前記材料を浮揚状態に維持するためのコイルを備えてなり、前記装置が、第一コイルおよび第二コイルの2個のコイルを備えてなり、前記両方のコイルが、使用中に少なくとも10−3ミリバールの真空とするための真空チャンバー中に配置されており、両方のコイルが使用中に交流電磁場を発生させ、前記第一および第二コイルの交流電磁場が互いに反作用し、前記コイル同士が、前記コイルの中央線を変えるように一緒に回転および/または移動可能であり、非導電性材料のチューブが、使用の際に前記コイルと前記導電性材料との間に前記チューブが存在するように、前記コイルの内側に配置され、前記第一および第二コイルが、前記第一コイルと第二コイルとの間で浮揚状態に維持されている前記導電性材料が蒸発するように配置され、前記蒸発した材料が、前記非導電性材料のチューブの内側で、前記コイルの中央線の方向に沿って、被覆すべき基材に流れる、前記コイルが6の自由度で操作可能である、装置。
- 前記コイルが、すべて実質的に閉じたループである巻線を有する、請求項1に記載の装置。
- 前記コイルが、それぞれ個別の電流供給源を有する、請求項1または2に記載の装置。
- 前記コイル同士が、接続され、なおかつ同じ電流供給源を有する、請求項1または2に記載の装置。
- 前記コイル同士が、反対の方向で巻かれている、請求項4に記載の装置。
- 前記第一コイルが、実質的に前記第二コイルの上方に位置する、請求項1〜5のいずれか一項に記載の装置。
- 前記第一コイルが、前記第二コイルと同じ数の巻線またはそれより少ない巻線を有する、請求項6に記載の装置。
- 前記第一および第二コイルが、鏡像対称性の関係にある、請求項1〜7のいずれか一項に記載の装置。
- 請求項1〜8のいずれか一項に記載の装置を使用して、ある量の浮揚された導電性材料を発生する方法であって、前記2個のコイルにより発生した電磁場の間に前記導電性材料を捕獲し、前記コイル中の電流および周波数で加熱することにより蒸発させ、前記蒸発した導電性材料が、基材を被覆するために実質的に前記コイルの中央線に沿って方向付けられ、このとき前記コイル同士が6の自由度で一緒に操作されることで前記蒸発した導電性材料が方向付けられる、方法。
- 前記2個のコイル中の前記電磁場の強度が、前記電磁場中に捕獲された前記導電性材料が前記コイルの中央線に向かって押し進められるようなものである、請求項9に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/923,505 US7323229B2 (en) | 2002-02-21 | 2004-08-23 | Method and device for coating a substrate |
US10/923,505 | 2004-08-23 | ||
PCT/EP2005/005905 WO2006021245A1 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008515133A JP2008515133A (ja) | 2008-05-08 |
JP2008515133A5 JP2008515133A5 (ja) | 2012-06-28 |
JP5064222B2 true JP5064222B2 (ja) | 2012-10-31 |
Family
ID=34971215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007528625A Expired - Fee Related JP5064222B2 (ja) | 2004-08-23 | 2005-05-31 | ある量の導電性材料を浮揚させる装置および方法 |
Country Status (16)
Country | Link |
---|---|
EP (1) | EP1785010B1 (ja) |
JP (1) | JP5064222B2 (ja) |
KR (1) | KR101143067B1 (ja) |
CN (1) | CN101006751B (ja) |
AT (1) | ATE428290T1 (ja) |
AU (1) | AU2005276729B2 (ja) |
BR (1) | BRPI0514545A (ja) |
CA (1) | CA2576541C (ja) |
DE (1) | DE602005013791D1 (ja) |
ES (1) | ES2324921T3 (ja) |
HK (1) | HK1109292A1 (ja) |
MX (1) | MX2007002191A (ja) |
PL (1) | PL1785010T3 (ja) |
RU (1) | RU2370921C2 (ja) |
UA (1) | UA89792C2 (ja) |
WO (1) | WO2006021245A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100961371B1 (ko) | 2007-12-28 | 2010-06-07 | 주식회사 포스코 | 실러 접착성 및 내식성이 우수한 아연계 합금도금강판과 그제조방법 |
DE102009042972A1 (de) | 2009-09-16 | 2011-03-24 | Technische Universität Ilmenau | Vorrichtung und Verfahren zum Manipulieren einer levitierten elektrisch leitfähigen Substanz |
KR101639812B1 (ko) * | 2009-09-29 | 2016-07-15 | 주식회사 포스코 | 소재의 부양 가열 장치 |
KR101639813B1 (ko) * | 2009-10-08 | 2016-07-15 | 주식회사 포스코 | 연속 코팅 장치 |
WO2012081738A1 (en) * | 2010-12-13 | 2012-06-21 | Posco | Continuous coating apparatus |
DE102011018675A1 (de) | 2011-04-18 | 2012-10-18 | Technische Universität Ilmenau | Vorrichtung und Verfahren zum aktiven Manipulieren einer elektrisch leitfähigen Substanz |
KR101359218B1 (ko) * | 2011-12-27 | 2014-02-06 | 주식회사 포스코 | 부양 가열장치 |
KR101365467B1 (ko) * | 2012-04-24 | 2014-02-24 | 한국표준과학연구원 | 박막 증착 장치 |
RU2522666C2 (ru) * | 2012-06-27 | 2014-07-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Юго-Западный государственный университет" (ЮЗГУ) | Устройство для левитации некоторого количества материала |
EP3124648B1 (de) * | 2015-07-31 | 2018-03-28 | Hilberg & Partner GmbH | Verdampfersystem sowie verdampfungsverfahren für die beschichtung eines bandförmigen substrats |
RU2693852C2 (ru) * | 2017-11-07 | 2019-07-05 | Федеральное государственное бюджетное образовательное учреждение высшего образования " Юго-Западный государственный университет" (ЮЗГУ) | Устройство для левитации некоторого количества материала |
PL233811B1 (pl) * | 2017-12-11 | 2019-11-29 | Politechnika Slaska Im Wincent | Urzadzenie do wieloskalowego topienia lewitacyjnego |
DE102018117302A1 (de) * | 2018-07-17 | 2020-01-23 | Ald Vacuum Technologies Gmbh | Schwebeschmelzverfahren mit einem ringförmigen Element |
KR20200076389A (ko) | 2018-12-19 | 2020-06-29 | 주식회사 포스코 | Pvd 도금 공정에서의 도금층 제어 장치 및 방법 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686864A (en) * | 1951-01-17 | 1954-08-17 | Westinghouse Electric Corp | Magnetic levitation and heating of conductive materials |
US2957064A (en) * | 1958-09-30 | 1960-10-18 | Westinghouse Electric Corp | Stabilizing of levitation melting |
BE655473A (ja) * | 1963-11-21 | 1900-01-01 | ||
JPS621863A (ja) * | 1985-06-28 | 1987-01-07 | Ishikawajima Harima Heavy Ind Co Ltd | 金属蒸発装置 |
JPH0781181B2 (ja) * | 1986-07-10 | 1995-08-30 | 石川島播磨重工業株式会社 | 成膜装置 |
DE3833255A1 (de) * | 1988-09-30 | 1990-04-05 | Deutsche Forsch Luft Raumfahrt | Vorrichtung zum behaelterlosen positionieren und schmelzen von elektrisch leitenden materialien |
DE3836239A1 (de) * | 1988-10-25 | 1990-04-26 | Deutsche Forsch Luft Raumfahrt | Vorrichtung zum behaelterlosen positionieren und schmelzen von elektrisch leitenden materialien |
JPH0797680A (ja) * | 1993-09-30 | 1995-04-11 | Kao Corp | 薄膜形成装置 |
JP3129076B2 (ja) * | 1994-03-02 | 2001-01-29 | 富士電機株式会社 | 浮揚溶解装置とその出湯方法 |
JPH07252639A (ja) * | 1994-03-15 | 1995-10-03 | Kao Corp | 金属薄膜体の製造方法 |
JPH08104981A (ja) * | 1994-10-05 | 1996-04-23 | Sumitomo Electric Ind Ltd | Pvd装置 |
JPH08199345A (ja) * | 1995-01-30 | 1996-08-06 | Mitsubishi Electric Corp | 成膜装置及び成膜方法 |
NL1020059C2 (nl) * | 2002-02-21 | 2003-08-25 | Corus Technology B V | Werkwijze en inrichting voor het bekleden van een substraat. |
JP4156885B2 (ja) * | 2002-09-11 | 2008-09-24 | 株式会社アルバック | 薄膜形成装置 |
-
2005
- 2005-05-31 AU AU2005276729A patent/AU2005276729B2/en not_active Ceased
- 2005-05-31 MX MX2007002191A patent/MX2007002191A/es active IP Right Grant
- 2005-05-31 WO PCT/EP2005/005905 patent/WO2006021245A1/en active Application Filing
- 2005-05-31 PL PL05754666T patent/PL1785010T3/pl unknown
- 2005-05-31 UA UAA200702502A patent/UA89792C2/ru unknown
- 2005-05-31 DE DE602005013791T patent/DE602005013791D1/de active Active
- 2005-05-31 ES ES05754666T patent/ES2324921T3/es active Active
- 2005-05-31 KR KR1020077006446A patent/KR101143067B1/ko active IP Right Grant
- 2005-05-31 BR BRPI0514545-7A patent/BRPI0514545A/pt not_active IP Right Cessation
- 2005-05-31 EP EP05754666A patent/EP1785010B1/en not_active Not-in-force
- 2005-05-31 CA CA2576541A patent/CA2576541C/en not_active Expired - Fee Related
- 2005-05-31 JP JP2007528625A patent/JP5064222B2/ja not_active Expired - Fee Related
- 2005-05-31 CN CN2005800280853A patent/CN101006751B/zh not_active Expired - Fee Related
- 2005-05-31 AT AT05754666T patent/ATE428290T1/de active
- 2005-05-31 RU RU2007110642/09A patent/RU2370921C2/ru not_active IP Right Cessation
-
2007
- 2007-12-31 HK HK07114323.2A patent/HK1109292A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
BRPI0514545A (pt) | 2008-06-17 |
MX2007002191A (es) | 2007-05-08 |
CA2576541C (en) | 2012-01-10 |
KR101143067B1 (ko) | 2012-05-08 |
WO2006021245A1 (en) | 2006-03-02 |
KR20070067097A (ko) | 2007-06-27 |
EP1785010A1 (en) | 2007-05-16 |
JP2008515133A (ja) | 2008-05-08 |
RU2007110642A (ru) | 2008-09-27 |
HK1109292A1 (en) | 2008-05-30 |
UA89792C2 (ru) | 2010-03-10 |
RU2370921C2 (ru) | 2009-10-20 |
CN101006751A (zh) | 2007-07-25 |
EP1785010B1 (en) | 2009-04-08 |
CA2576541A1 (en) | 2006-03-02 |
DE602005013791D1 (de) | 2009-05-20 |
AU2005276729A1 (en) | 2006-03-02 |
AU2005276729B2 (en) | 2010-08-26 |
CN101006751B (zh) | 2011-04-27 |
ES2324921T3 (es) | 2009-08-19 |
PL1785010T3 (pl) | 2009-08-31 |
ATE428290T1 (de) | 2009-04-15 |
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