TWI830897B - 感光性樹脂組成物、使所述感光性樹脂組成物硬化而成的硬化膜、及具有所述硬化膜的顯示裝置 - Google Patents

感光性樹脂組成物、使所述感光性樹脂組成物硬化而成的硬化膜、及具有所述硬化膜的顯示裝置 Download PDF

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Publication number: TWI830897B
Authority: TW; Taiwan
Prior art keywords: group; mass; resin composition; photosensitive resin; acid
Prior art date: 2019-04-12

Application number

TW109111913A

Other languages

English (en)

Chinese (zh)

Other versions

TW202105061A (zh

Inventor

今野高志

新名将司

三浦慧

Original Assignee

日商日鐵化學材料股份有限公司

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2019-04-12

Filing date

2020-04-09

Publication date

2024-02-01

2020-04-09 Application filed by 日商日鐵化學材料股份有限公司 filed Critical 日商日鐵化學材料股份有限公司

2021-02-01 Publication of TW202105061A publication Critical patent/TW202105061A/zh

2024-02-01 Application granted granted Critical

2024-02-01 Publication of TWI830897B publication Critical patent/TWI830897B/zh

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239000011347 resin Substances 0.000 claims abstract description 68
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239000003999 initiator Substances 0.000 claims abstract description 11
239000000178 monomer Substances 0.000 claims abstract description 8
125000004432 carbon atom Chemical group C* 0.000 claims description 64
239000007787 solid Substances 0.000 claims description 36
239000000463 material Substances 0.000 claims description 23
125000002947 alkylene group Chemical group 0.000 claims description 21
125000000217 alkyl group Chemical group 0.000 claims description 19
238000004040 coloring Methods 0.000 claims description 19
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125000001424 substituent group Chemical group 0.000 claims description 19
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125000003118 aryl group Chemical group 0.000 claims description 10
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
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125000002877 alkyl aryl group Chemical group 0.000 claims description 8
125000003710 aryl alkyl group Chemical group 0.000 claims description 8
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125000003545 alkoxy group Chemical group 0.000 claims description 7
125000001316 cycloalkyl alkyl group Chemical group 0.000 claims description 7
125000005843 halogen group Chemical group 0.000 claims description 7
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JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
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VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
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BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
CMLWFCUAXGSMBB-UHFFFAOYSA-N tris(2,6-dimethoxyphenyl)phosphane Chemical compound COC1=CC=CC(OC)=C1P(C=1C(=CC=CC=1OC)OC)C1=C(OC)C=CC=C1OC CMLWFCUAXGSMBB-UHFFFAOYSA-N 0.000 description 1
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Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
General Physics & Mathematics (AREA)
Medicinal Chemistry (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Structural Engineering (AREA)
Architecture (AREA)
Engineering & Computer Science (AREA)
Optics & Photonics (AREA)
Materials For Photolithography (AREA)
Optical Filters (AREA)
Liquid Crystal (AREA)
Macromonomer-Based Addition Polymer (AREA)

TW109111913A 2019-04-12 2020-04-09 感光性樹脂組成物、使所述感光性樹脂組成物硬化而成的硬化膜、及具有所述硬化膜的顯示裝置 TWI830897B (zh)

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JP2019076339		2019-04-12

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JP (1)	JP2020173433A (ja)
KR (1)	KR20200120536A (ja)
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TW (1)	TWI830897B (ja)

Citations (3)

* Cited by examiner, † Cited by third party
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TW200836008A (en) *	2006-11-30	2008-09-01	Nippon Steel Chemical Co	Alkali soluble resin, process for producing the same, photosensitive resin composition containing the same, cured product, and color filter
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