TWI814695B - 聚醯亞胺系凡立水、使用該聚醯亞胺系凡立水之聚醯亞胺系膜片之製造方法、以及聚醯亞胺系膜片 - Google Patents
聚醯亞胺系凡立水、使用該聚醯亞胺系凡立水之聚醯亞胺系膜片之製造方法、以及聚醯亞胺系膜片 Download PDFInfo
- Publication number
- TWI814695B TWI814695B TW105123206A TW105123206A TWI814695B TW I814695 B TWI814695 B TW I814695B TW 105123206 A TW105123206 A TW 105123206A TW 105123206 A TW105123206 A TW 105123206A TW I814695 B TWI814695 B TW I814695B
- Authority
- TW
- Taiwan
- Prior art keywords
- polyimide
- film
- water
- mass
- patent application
- Prior art date
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 275
- 239000004642 Polyimide Substances 0.000 title claims abstract description 195
- 238000000034 method Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000002966 varnish Substances 0.000 title abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 79
- 239000002904 solvent Substances 0.000 claims abstract description 28
- 238000002834 transmittance Methods 0.000 claims abstract description 18
- 229920000642 polymer Polymers 0.000 claims abstract description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 33
- 229910052731 fluorine Inorganic materials 0.000 claims description 30
- 239000011248 coating agent Substances 0.000 claims description 18
- 238000000576 coating method Methods 0.000 claims description 18
- 238000001035 drying Methods 0.000 claims description 17
- 125000001153 fluoro group Chemical group F* 0.000 claims description 13
- 239000000377 silicon dioxide Substances 0.000 claims description 13
- 239000002245 particle Substances 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 125000003277 amino group Chemical group 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 9
- 238000002156 mixing Methods 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 150000002466 imines Chemical class 0.000 claims description 2
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 claims description 2
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 claims description 2
- 235000012141 vanillin Nutrition 0.000 claims description 2
- 238000005452 bending Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 70
- -1 acyl imine Chemical class 0.000 description 52
- 125000000962 organic group Chemical group 0.000 description 29
- 239000011737 fluorine Substances 0.000 description 25
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 24
- 239000012528 membrane Substances 0.000 description 21
- 125000001424 substituent group Chemical group 0.000 description 20
- 239000010954 inorganic particle Substances 0.000 description 19
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 18
- 125000003118 aryl group Chemical group 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 16
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 11
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 11
- 125000001931 aliphatic group Chemical group 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 125000004122 cyclic group Chemical group 0.000 description 10
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 10
- 150000004985 diamines Chemical class 0.000 description 9
- 229960002428 fentanyl Drugs 0.000 description 9
- IVLVTNPOHDFFCJ-UHFFFAOYSA-N fentanyl citrate Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O.C=1C=CC=CC=1N(C(=O)CC)C(CC1)CCN1CCC1=CC=CC=C1 IVLVTNPOHDFFCJ-UHFFFAOYSA-N 0.000 description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 9
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical class CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 125000005647 linker group Chemical group 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- KSSNXJHPEFVKHY-UHFFFAOYSA-N phenol;hydrate Chemical compound O.OC1=CC=CC=C1 KSSNXJHPEFVKHY-UHFFFAOYSA-N 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000011164 primary particle Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 241000251468 Actinopterygii Species 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 150000004703 alkoxides Chemical class 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- MCPTUMJSKDUTAQ-UHFFFAOYSA-N vanadium;hydrate Chemical compound O.[V] MCPTUMJSKDUTAQ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 238000003109 Karl Fischer titration Methods 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 125000002015 acyclic group Chemical group 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 125000002877 alkyl aryl group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 125000001072 heteroaryl group Chemical group 0.000 description 2
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- GEWWCWZGHNIUBW-UHFFFAOYSA-N 1-(4-nitrophenyl)propan-2-one Chemical compound CC(=O)CC1=CC=C([N+]([O-])=O)C=C1 GEWWCWZGHNIUBW-UHFFFAOYSA-N 0.000 description 1
- BTOVVHWKPVSLBI-UHFFFAOYSA-N 2-methylprop-1-enylbenzene Chemical compound CC(C)=CC1=CC=CC=C1 BTOVVHWKPVSLBI-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- MHABMANUFPZXEB-UHFFFAOYSA-N O-demethyl-aloesaponarin I Natural products O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=C(O)C(C(O)=O)=C2C MHABMANUFPZXEB-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 235000013832 Valeriana officinalis Nutrition 0.000 description 1
- 244000126014 Valeriana officinalis Species 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 235000016788 valerian Nutrition 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Moulding By Coating Moulds (AREA)
- Polarising Elements (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015145210 | 2015-07-22 | ||
JP2015-145210 | 2015-07-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201708395A TW201708395A (zh) | 2017-03-01 |
TWI814695B true TWI814695B (zh) | 2023-09-11 |
Family
ID=57834370
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105123206A TWI814695B (zh) | 2015-07-22 | 2016-07-22 | 聚醯亞胺系凡立水、使用該聚醯亞胺系凡立水之聚醯亞胺系膜片之製造方法、以及聚醯亞胺系膜片 |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP6904903B2 (ko) |
KR (1) | KR102560059B1 (ko) |
CN (1) | CN107683308A (ko) |
TW (1) | TWI814695B (ko) |
WO (1) | WO2017014286A1 (ko) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110475810B (zh) * | 2017-04-05 | 2022-12-20 | 住友化学株式会社 | 聚酰亚胺系膜及显示装置 |
JP6987633B2 (ja) * | 2017-12-20 | 2022-01-05 | 住友化学株式会社 | タッチセンサーパネル用透明フィルム基材及びそれを用いたタッチセンサーパネル |
KR20210005607A (ko) * | 2018-03-28 | 2021-01-14 | 스미또모 가가꾸 가부시키가이샤 | 투명 폴리이미드계 고분자와 용매를 포함하는 바니시 |
JP7361479B2 (ja) * | 2018-03-28 | 2023-10-16 | 住友化学株式会社 | 透明ポリイミド系高分子を含む光学フィルム |
JP6530125B1 (ja) * | 2018-04-27 | 2019-06-12 | 住友化学株式会社 | 光学フィルム |
JP2019195997A (ja) * | 2018-05-08 | 2019-11-14 | 住友化学株式会社 | 積層体およびその製造方法 |
JP7375318B2 (ja) * | 2018-05-16 | 2023-11-08 | 東レ株式会社 | ポリイミド前駆体樹脂組成物、ポリイミド樹脂組成物およびその膜状物、それを含む積層体、ならびにフレキシブルデバイス |
JP7512902B2 (ja) | 2019-02-04 | 2024-07-09 | 三菱瓦斯化学株式会社 | 無色透明ポリイミドフィルム |
JP2020186369A (ja) * | 2019-05-10 | 2020-11-19 | 住友化学株式会社 | ワニス、光学フィルム及び光学フィルムの製造方法 |
JP7131728B1 (ja) | 2022-03-30 | 2022-09-06 | 日産化学株式会社 | 蒸着マスク |
KR102679178B1 (ko) * | 2022-06-29 | 2024-06-27 | 피아이첨단소재 주식회사 | 자기 윤활성 폴리이미드 바니쉬 및 이로부터 제조되는 폴리이미드 피복물 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009215412A (ja) * | 2008-03-10 | 2009-09-24 | New Japan Chem Co Ltd | ポリイミド樹脂組成物及びその成形体 |
JP2010180262A (ja) * | 2009-02-03 | 2010-08-19 | Toray Ind Inc | 樹脂組成物の製造方法 |
JP2012233083A (ja) * | 2011-04-28 | 2012-11-29 | Mitsubishi Chemicals Corp | デバイス製造方法 |
JP2014118463A (ja) * | 2012-12-14 | 2014-06-30 | Mitsubishi Chemicals Corp | ポリイミド樹脂成型体及びフィルム |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5734127A (en) * | 1980-08-07 | 1982-02-24 | Ube Ind Ltd | Production of polyimide solution |
JP5011893B2 (ja) * | 2005-10-19 | 2012-08-29 | 日立化成工業株式会社 | 樹脂組成物、該樹脂組成物の製造方法、及び該樹脂組成物を含む被膜形成材料 |
JP5666076B2 (ja) * | 2006-09-19 | 2015-02-12 | 和光純薬工業株式会社 | ビシクロ[2.2.2]オクタン−2,3,5,6−テトラカルボン酸二無水物、その製造方法、当該ビシクロ[2.2.2]オクタン−2,3,5,6−テトラカルボン酸二無水物から得られるポリイミド及びその利用 |
EP2090609A4 (en) * | 2006-11-13 | 2012-08-01 | Ube Industries | METHOD FOR PRODUCING A POLYAMIDE ACID SOLUTION AND POLYAMIDE ACID SOLUTION |
KR101292886B1 (ko) * | 2009-09-29 | 2013-08-02 | 코오롱인더스트리 주식회사 | 내용제성이 개선된 무색투명한 폴리이미드 필름 |
TWI434883B (zh) | 2009-11-27 | 2014-04-21 | Ind Tech Res Inst | 有機/無機混成材料及其製造方法 |
KR101328838B1 (ko) * | 2010-03-30 | 2013-11-13 | 코오롱인더스트리 주식회사 | 폴리이미드 필름 |
JP2011221390A (ja) * | 2010-04-13 | 2011-11-04 | Toyobo Co Ltd | ポジ型感光性ポリイミド樹脂組成物 |
KR101543478B1 (ko) * | 2010-12-31 | 2015-08-10 | 코오롱인더스트리 주식회사 | 투명 폴리이미드 필름 및 그 제조방법 |
JP5789844B2 (ja) | 2011-11-30 | 2015-10-07 | 国立大学法人 千葉大学 | ポリカルバゾール誘導体含有組成物及び該組成物からなる透明導電体 |
KR102193808B1 (ko) | 2012-01-10 | 2020-12-22 | 미쯔비시 케미컬 주식회사 | 코팅용 조성물, 다공질막, 광 산란막 및 유기 전계 발광 소자 |
EP2867276B1 (en) * | 2012-06-29 | 2018-04-18 | Kolon Industries, Inc. | Polyimide and polyimide film comprising the same |
JP5478701B2 (ja) * | 2012-11-30 | 2014-04-23 | 新日鉄住金化学株式会社 | ポリイミドフィルム |
KR101992525B1 (ko) * | 2014-07-17 | 2019-06-24 | 아사히 가세이 가부시키가이샤 | 수지 전구체 및 그것을 함유하는 수지 조성물, 폴리이미드 수지막, 수지 필름 및 그 제조 방법 |
-
2016
- 2016-07-21 WO PCT/JP2016/071453 patent/WO2017014286A1/ja active Application Filing
- 2016-07-21 KR KR1020187003829A patent/KR102560059B1/ko active IP Right Grant
- 2016-07-21 JP JP2017529939A patent/JP6904903B2/ja active Active
- 2016-07-21 CN CN201680034893.9A patent/CN107683308A/zh active Pending
- 2016-07-22 TW TW105123206A patent/TWI814695B/zh active
-
2021
- 2021-03-04 JP JP2021034756A patent/JP6920568B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009215412A (ja) * | 2008-03-10 | 2009-09-24 | New Japan Chem Co Ltd | ポリイミド樹脂組成物及びその成形体 |
JP2010180262A (ja) * | 2009-02-03 | 2010-08-19 | Toray Ind Inc | 樹脂組成物の製造方法 |
JP2012233083A (ja) * | 2011-04-28 | 2012-11-29 | Mitsubishi Chemicals Corp | デバイス製造方法 |
JP2014118463A (ja) * | 2012-12-14 | 2014-06-30 | Mitsubishi Chemicals Corp | ポリイミド樹脂成型体及びフィルム |
Also Published As
Publication number | Publication date |
---|---|
JP6920568B2 (ja) | 2021-08-18 |
JPWO2017014286A1 (ja) | 2018-05-17 |
JP2021103308A (ja) | 2021-07-15 |
KR20180033208A (ko) | 2018-04-02 |
TW201708395A (zh) | 2017-03-01 |
WO2017014286A1 (ja) | 2017-01-26 |
CN107683308A (zh) | 2018-02-09 |
JP6904903B2 (ja) | 2021-07-21 |
KR102560059B1 (ko) | 2023-07-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI814695B (zh) | 聚醯亞胺系凡立水、使用該聚醯亞胺系凡立水之聚醯亞胺系膜片之製造方法、以及聚醯亞胺系膜片 | |
JP6940581B2 (ja) | ポリイミド系フィルム | |
JP6893604B2 (ja) | ポリイミド系フィルム、及びポリイミド系フィルムの製造方法 | |
TW201710234A (zh) | 二胺及其利用 | |
JP2020183538A (ja) | フレキシブル基板用ポリシルセスキノキサン樹脂組成物{poly silsesquinoxane resin composition for flexible substrate} | |
JP2020033540A (ja) | シルセスキオキサン含有ポリイミド | |
WO2020246466A1 (ja) | ポリイミド樹脂およびその製造方法、ならびにポリイミドフィルムおよびその製造方法 | |
TWI725496B (zh) | 交聯劑化合物、包括其的光敏組成物以及使用其的光敏材料 | |
KR20140049382A (ko) | 폴리이미드 필름 및 이의 제조방법 | |
WO2016136597A1 (ja) | ポリイミド積層体の製造方法およびその利用 | |
TWI746831B (zh) | 聚醯亞胺系膜及顯示裝置 | |
TWI780283B (zh) | 觸控感測器面板用透明膜基材及使用其之觸控感測器面板 | |
JP7094296B2 (ja) | ポリイミド樹脂およびその製造方法、ポリイミド溶液、ならびにポリイミドフィルムおよびその製造方法 | |
JP4396139B2 (ja) | シルセスキオキサン骨格を有するポリマーおよびその薄膜の形成方法 | |
TWI825772B (zh) | 聚醯亞胺類樹脂膜、顯示元件基底以及使用其之光學元件 |