TWI786085B - Quantum dot dispersion, self-emission type photosensitive resin composition, color filter and image display device - Google Patents

Quantum dot dispersion, self-emission type photosensitive resin composition, color filter and image display device Download PDF

Info

Publication number
TWI786085B
TWI786085B TW107103484A TW107103484A TWI786085B TW I786085 B TWI786085 B TW I786085B TW 107103484 A TW107103484 A TW 107103484A TW 107103484 A TW107103484 A TW 107103484A TW I786085 B TWI786085 B TW I786085B
Authority
TW
Taiwan
Prior art keywords
ethyl ester
ester
acid ethyl
phenyl
cyclohexyl
Prior art date
Application number
TW107103484A
Other languages
Chinese (zh)
Other versions
TW201840823A (en
Inventor
金亨柱
金胄皓
王賢正
鄭盛旭
李宗洙
Original Assignee
南韓商東友精細化工有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南韓商東友精細化工有限公司 filed Critical 南韓商東友精細化工有限公司
Publication of TW201840823A publication Critical patent/TW201840823A/en
Application granted granted Critical
Publication of TWI786085B publication Critical patent/TWI786085B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Structural Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Luminescent Compositions (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The present invention provides a quantum dot dispersion comprising a quantum dot and a solvent, wherein the solvent comprises a compound that has an ester bond and at least one selected from the group consisting of C3-C10 cycloalkyl group, C2-C10 heterocycloalkyl group, C5-C10 aromatic group and C4-C10 heteroaromatic group, a self-emission type photosensitive resin composition comprising the same, a color filter formed by using the self-emission type photosensitive resin composition, and an image display device. The quantum dot dispersion according to the present invention has excellent dispersibility, while not using a solvent harmful to a human body, and thus, the color filter formed by using the self-emission type photosensitive resin composition comprising the same can exhibit excellent light emitting properties.

Description

量子點分散材料、自發光型光敏樹脂組合物、彩色 濾光片及影像顯示元件 Quantum dot dispersion material, self-luminous photosensitive resin composition, color Filters and image display components

本揭露書是有關於一種量子點分散材料(quantum dot dispersion)、自發光型光敏樹脂組合物(self-emission type photosensitive resin composition)、彩色濾光片(color filter)和影像顯示元件(image display device)，特別是一種不使用對人體有害的溶劑，分散性優異的量子點分散材料、自發光型光敏樹脂組合物、彩色濾光片和影像顯示元件。 This disclosure is about a quantum dot dispersion, a self-emission type photosensitive resin composition, a color filter and an image display device ), especially a quantum dot dispersion material with excellent dispersibility, a self-illuminating photosensitive resin composition, a color filter and an image display element without using a solvent harmful to the human body.

彩色濾光片是一種薄膜型態的光學組件，可以從白光中分離出紅色、綠色和藍色三種顏色的色光，藉以形成一個精細的單位像素。其中像素的尺寸範圍從大約幾十微米到幾百微米。在彩色濾光片的結構中，具有預設圖案的黑色矩陣層形成在透明基板上，用以遮蔽每個像素之間的邊界。在作為像素的部分中，用來構成多種顏色的三原色(典型為，紅色(R)、綠色(G)和藍色(B))會以預設的順序排列以形成每個像素的像素部分，並依序地堆疊起來。 A color filter is a thin-film optical component that separates red, green, and blue colors from white light to form a fine unit pixel. The size of the pixels ranges from about tens of microns to hundreds of microns. In the structure of the color filter, a black matrix layer with a predetermined pattern is formed on a transparent substrate to shield a boundary between each pixel. In the part serving as a pixel, three primary colors (typically, red (R), green (G) and blue (B)) used to make up various colors are arranged in a preset order to form the pixel part of each pixel, and stacked sequentially.

目前，用來實現彩色濾光片的方法之一，包括應用顏料分散方法，使用顏料分散型光敏樹脂來實現彩色濾光片。然而，光源所發出的光在穿過彩色濾光片的過程中，會有一部分被彩色濾光片所吸收，因而產生光效率(light efficiency)惡化的問題。且也會因為彩色濾光片中的顏料性質，而導致顏色再現性(color reproducibility)降低。 Currently, one of the methods for realizing color filters includes applying a pigment dispersion method, and using a pigment-dispersed photosensitive resin to realize color filters. However, when the light emitted by the light source passes through the color filter, part of it will be absorbed by the color filter, thus causing the problem of deterioration of light efficiency. Also, the color reproducibility is reduced due to the properties of the pigment in the color filter.

特別是，當彩色濾光片被使用在包括各種影像顯示元件的領域中時，其不僅被求要具備優異的圖案特性，還需要具備高色彩再現率、高亮度和高對比度等功能。為了解決這些問題，目前已有使用包含量子點的自發光型光敏樹脂組合物來製作彩色濾光片的方法被提出。 In particular, when color filters are used in fields including various image display elements, they are required not only to have excellent pattern characteristics but also to have functions such as high color reproduction rate, high brightness, and high contrast. In order to solve these problems, a method of manufacturing a color filter using a self-luminous photosensitive resin composition containing quantum dots has been proposed.

韓國編號第2006-0084668號公開專利案，是有關於一種量子點螢光體，其揭露了一種發光二極體，包括量子點以及用以承載位於其上方之量子點的固態基板，藉此來維持優異的發光效率。 Korean Publication No. 2006-0084668 is about a quantum dot phosphor, which discloses a light emitting diode, including quantum dots and a solid substrate for carrying the quantum dots on it, thereby to Maintain excellent luminous efficiency.

然而，在上述公開的專利案中，用來分散量子點螢光體的分散溶劑，是使用分散性優異的氯仿、甲苯、己烷等對人體有害的溶劑。上述的這些溶劑可能是具有揮發性有機化合物，或者可能會致癌或具有神經毒性，且有引起生殖功能異常的風險，因此需要嚴格控制操作者的操作環境。 However, in the above-mentioned published patents, the dispersing solvent used to disperse the quantum dot phosphor is a solvent harmful to the human body such as chloroform, toluene, and hexane with excellent dispersibility. The above-mentioned solvents may contain volatile organic compounds, or may be carcinogenic or neurotoxic, and have the risk of causing abnormal reproductive function, so it is necessary to strictly control the operating environment of the operator.

為了運用這些量子點，一般會藉由乾燥製程來去除對人體有害的溶劑；或者進行移除分散溶劑的製程，然後再使用不具揮發性，不會致癌和具有神經毒性，也沒有引起生殖功能異常風險的有機化合物作為溶劑，來代替被移除的分散溶劑。然而，在這些製程中，又會 產生量子效率惡化的問題，而導致所製作的彩色濾光片或影像顯示元件的發光特性劣化。 In order to use these quantum dots, the solvents that are harmful to the human body are generally removed through a drying process; or the process of removing the dispersion solvent is performed, and then used non-volatile, non-carcinogenic and neurotoxic, and does not cause reproductive abnormalities The hazardous organic compound acts as a solvent, replacing the removed dispersing solvent. However, in these processes, the The problem of deterioration of the quantum efficiency occurs, which leads to the deterioration of the luminescent characteristics of the produced color filter or image display element.

因此，有需要開發一種具有優異量子點分散性，並且不含對人體有害成分的量子點分散材料、具有優異發光特性的彩色濾光片或者應用上述彩色濾光片所製作的影像顯示元件。 Therefore, it is necessary to develop a quantum dot dispersion material with excellent quantum dot dispersibility and does not contain harmful components to the human body, a color filter with excellent luminescent properties, or an image display element made using the above color filter.

本發明的一個目的是提供一種具有優異分散性，且不使用對人體有害的溶劑的量子分散材料。 An object of the present invention is to provide a quantum dispersion material which has excellent dispersibility and does not use a solvent harmful to the human body.

本發明的另一個目的是提供具有量子分散特性的自發光型光敏樹脂組合物。 Another object of the present invention is to provide a self-illuminating photosensitive resin composition with quantum dispersion properties.

本發明的又一個目的是提供一種使用自發光型光敏樹脂組合物所形成的彩色濾光片。 Yet another object of the present invention is to provide a color filter formed using a self-illuminating photosensitive resin composition.

本發明的再一個目的是提供一種具有彩色濾光片的影像顯示元件。 Another object of the present invention is to provide an image display device with a color filter.

根據本發明的一方面，提供一種量子點分散材料，其包含量子點和溶劑，其中此種溶劑包含一種化合物，此化合物具有酯鍵(ester bond)以及選自於由C3-C10環烷基(cycloalkyl group)、C2-C10異質環烷基(heterocycloalkyl group)、C5-C10芳香基(aromatic group)和C4-C10異質芳香(heteroaromatic group)所組成之一族群中的至少一者。 According to one aspect of the present invention, there is provided a quantum dot dispersion material, which includes quantum dots and a solvent, wherein the solvent includes a compound that has an ester bond (ester bond) and is selected from the group consisting of C3-C10 cycloalkyl ( cycloalkyl group), C2-C10 heterocycloalkyl group (heterocycloalkyl group), C5-C10 aromatic group (aromatic group) and C4-C10 heterogeneous aromatic (heteroaromatic group) at least one of the group.

在本發明的一個實施例中，上述溶劑可以包含選自於由下述化學式1和化學式2所表示的化合物所組成的一族群中的至少一種：

Figure 107103484-A0305-02-0006-1
In one embodiment of the present invention, the above-mentioned solvent may contain at least one selected from a group consisting of compounds represented by the following chemical formula 1 and chemical formula 2:
Figure 107103484-A0305-02-0006-1

Figure 107103484-A0305-02-0006-2
Figure 107103484-A0305-02-0006-2

其中，A是被選自於由C1-C10烷基(alkyl group)和鹵素(halogen)所組成之一群取代基中的至少一個所取代或未被取代的C3-C10環烷基、C2-C10異質環烷基、C5-C10芳香基或C4-C10異質芳香基；L是C1-C6亞烷基(alkylene group)或不存在，以及R為C1-C10烷基或C2-C10烯基(alkenyl group)。 Among them, A is C3-C10 cycloalkyl, C2-C10 substituted or unsubstituted by at least one of the substituents selected from the group consisting of C1-C10 alkyl (alkyl group) and halogen (halogen). Heterocycloalkyl, C5-C10 aryl or C4-C10 heteroaryl; L is C1-C6 alkylene group or absent, and R is C1-C10 alkyl or C2-C10 alkenyl (alkenyl group).

在本發明的一個實施例中，溶劑在20℃下可具有小於12.0的介電常數。 In one embodiment of the present invention, the solvent may have a dielectric constant of less than 12.0 at 20°C.

根據本發明的另一方面，提供了一種自發光型光敏樹脂組合物，其包含量子點分散材料，鹼溶性樹脂(alkali-soluble resin)，可光聚合化合物(photopolymerizable compound)和光聚合反應起始劑(photopolymerization initiator)。 According to another aspect of the present invention, a self-luminous photosensitive resin composition is provided, which includes a quantum dot dispersion material, an alkali-soluble resin (alkali-soluble resin), a photopolymerizable compound (photopolymerizable compound) and a photopolymerization initiator (photopolymerization initiator).

根據本發明的又一方面，提供了一種使用自發光型光敏樹脂組合物所形成的彩色濾光片。 According to still another aspect of the present invention, there is provided a color filter formed using a self-illuminating photosensitive resin composition.

根據本發明的再一方面，提供了一種具有上述彩色濾光片的影像顯示元件。 According to yet another aspect of the present invention, an image display element having the above-mentioned color filter is provided.

根據本發明所提供的量子點分散材料，不使用對人體有害的溶劑，同時具有優異的分散性。因此，使用包含此溶劑的自發光型光敏樹脂組合物所形成的彩色濾光片可以表現出優異的發光性質。 According to the quantum dot dispersion material provided by the present invention, no solvent harmful to human body is used, and at the same time, it has excellent dispersibility. Therefore, a color filter formed using the self-luminous photosensitive resin composition including the solvent can exhibit excellent luminous properties.

在下文中，將更詳細地描述本發明。 Hereinafter, the present invention will be described in more detail.

本發明的一個實施例是有關於一種量子點分散材料，其包含量子點以及溶劑，其中此種溶劑包含一種化合物，此化合物具有酯鍵以及選自於由C3-C10環烷基、C2-C10異質環烷基、C5-C10芳香基和C4-C10異質芳香基所組成之一族群中的至少一者。 An embodiment of the present invention relates to a quantum dot dispersion material, which includes quantum dots and a solvent, wherein the solvent includes a compound, the compound has an ester bond and is selected from the group consisting of C3-C10 cycloalkyl, C2-C10 At least one member of a group consisting of heterocycloalkyl, C5-C10 aryl and C4-C10 heteroaryl.

在本發明的一個實施例中，量子點可以是一種具有奈米尺寸(nano-sized)的半導體材料。原子形成分子，分子形成稱為分子團(cluster)的小分子聚集體(aggregate of small molecules)，進而形成奈米顆粒。當這些奈米粒子(顆粒)具有半導體性質時，它們就被稱為量子點。當量子點從外部接收能量並達到激發態時，它們會發射出與量子點的特定能帶隙對應的能量。 In one embodiment of the present invention, the quantum dot may be a nano-sized semiconductor material. Atoms form molecules, and molecules form aggregates of small molecules called clusters, which in turn form nanoparticles. When these nanoparticles (particles) have semiconducting properties, they are called quantum dots. When quantum dots receive energy from the outside and reach an excited state, they emit energy corresponding to the specific energy bandgap of the quantum dots.

使用包含量子點分散材料的自發光型光敏樹脂組合物所產生的彩色濾光片會包括複數個量子點，進而能夠藉由光照射而自發光(光致發光(photoluminescence))。 The color filter produced by using the self-illuminating photosensitive resin composition containing the quantum dot dispersion material will include a plurality of quantum dots, which can emit light (photoluminescence) by light irradiation.

在具有彩色濾光片的傳統影像顯示元件中，白光穿過彩色濾光片以實現顏色。在此期間，會有一部分光被彩色濾光片吸收，因而導致光效率降低。而當使用本發明所提供的自發光型光敏樹脂組合物所製造的彩色濾光片時，彩色濾光片藉由光源的光照而自發光，因此可以實現更優異的光效率。另外，由於所發出的光具有顏色，因此顏色再現性更優異。並且藉由光致發光所產生的光線，會往所有方向發射。因此，還具有可以改善視角的優點。 In conventional image display elements with color filters, white light passes through the color filters to achieve color. During this period, part of the light is absorbed by the color filter, resulting in reduced light efficiency. And when using the color filter manufactured by the self-illuminating photosensitive resin composition provided by the present invention, the color filter can emit light by itself when illuminated by a light source, so that more excellent light efficiency can be achieved. In addition, since the emitted light has color, color reproducibility is more excellent. And the light generated by photoluminescence will be emitted in all directions. Therefore, there is also an advantage that the viewing angle can be improved.

此處所述的量子點並未特別限定，只要是能夠藉由光激發光的顆粒，都可以作為量子點。例如，量子點可以選自於II-VI族半導體化合物；III-V族半導體化合物；IV-VI族半導體化合物；第IV族元素，或含有上述元素的化合物以及上述化合物或元素的任意組合。上述化合物或元素可以單獨使用或者兩種或更多種組合使用。 The quantum dots described here are not particularly limited, as long as they are particles that can be excited by light, they can be used as quantum dots. For example, quantum dots can be selected from group II-VI semiconductor compounds; group III-V semiconductor compounds; group IV-VI semiconductor compounds; group IV elements, or compounds containing the above elements and any combination of the above compounds or elements. The above compounds or elements may be used alone or in combination of two or more.

具體來說，II-VI族半導體化合物可以是選自於由硫化鎘(CdS)、硒化鎘(CdSe)、碲化鎘(CdTe)、硫化鋅(ZnS)、硒化鋅(ZnSe)、碲化鋅(ZnTe)、氧化鋅(ZnO)、硫化汞(HgS)、硒化汞(HgSe)、碲化汞(HgTe)及其混合物所組成的一族群中的二元化合物；選自於由硒硫化鎘(CdSeS)、硒碲化鎘(CdSeTe)、硫碲化鎘(CdSTe)、硒硫化鋅(ZnSeS)、硒碲化鋅(ZnSeTe)、硫 碲化鋅(ZnSTe)、硒硫化汞(HgSeS)、硒碲化汞(HgSeTe)、硫碲化汞(HgSTe)、鋅硫化鎘(CdZnS)、鋅硒化鎘(CdZnSe)、鋅碲化鎘(CdZnTe)，汞硫化鎘(CdHgS)、汞硒化鎘(CdHgSe)、汞碲化鎘(CdHgTe)、鋅硫化汞(HgZnS)、鋅硒化汞(HgZnSe)、鋅碲化汞(HgZnTe)及其混合物所組成的一族群中的三元化合物；以及選自於由硫化鎘鋅硒(CdZnSeS)、碲化鎘鋅硒(CdZnSeTe)、碲化鎘鋅硫(CdZnSTe)、硫化鎘汞硒(CdHgSeS)，碲化鎘汞硒(CdHgSeTe)、碲化鎘汞硫(CdHgSTe)、硫化汞鋅硒(HgZnSeS)、碲化汞鋅硒(HgZnSeTe)、碲化汞鋅硫(HgZnSTe)及其混合物所組成的一族群中的四元化合物，但不以此為限。 Specifically, the II-VI semiconductor compound can be selected from cadmium sulfide (CdS), cadmium selenide (CdSe), cadmium telluride (CdTe), zinc sulfide (ZnS), zinc selenide (ZnSe), tellurium Binary compounds of the group consisting of zinc oxide (ZnTe), zinc oxide (ZnO), mercury sulfide (HgS), mercury selenide (HgSe), mercury telluride (HgTe) and mixtures thereof; selected from the group consisting of selenium Cadmium sulfide (CdSeS), cadmium selenium telluride (CdSeTe), cadmium sulfur telluride (CdSTe), zinc selenium sulfide (ZnSeS), zinc selenium telluride (ZnSeTe), sulfur Zinc telluride (ZnSTe), mercury selenium sulfide (HgSeS), mercury selenium telluride (HgSeTe), mercury sulfur telluride (HgSTe), zinc cadmium sulfide (CdZnS), zinc cadmium selenide (CdZnSe), zinc cadmium telluride ( CdZnTe), mercury cadmium sulfide (CdHgS), mercury cadmium selenide (CdHgSe), mercury cadmium telluride (CdHgTe), zinc mercury sulfide (HgZnS), zinc mercury selenide (HgZnSe), zinc mercury telluride (HgZnTe) and Ternary compounds in a group consisting of mixtures; , cadmium mercury selenium telluride (CdHgSeTe), cadmium mercury sulfur telluride (CdHgSTe), mercury zinc selenium sulfide (HgZnSeS), mercury zinc selenium telluride (HgZnSeTe), mercury zinc sulfur telluride (HgZnSTe) and their mixtures A group of quaternary compounds, but not limited thereto.

III-V族半導體化合物可以是選自於由氮化鎵(GaN)、磷化鎵(GaP)、砷化鎵(GaAs)、銻化鎵(GaSb)、氮化鋁(AlN)、磷化鋁(AlP)、砷化鋁(AlAs)、銻化鋁(AlSb)、氮化銦(InN)、磷化銦(InP)、砷化銦(InAs)、銻化銦(InSb)和其混合物所組成的一族群中的二元化合物；選自於由氮磷化鎵(GaNP)、氮砷化鎵(GaNAs)、氮銻化鎵(GaNSb)、磷砷化鎵(GaPAs)、磷銻化鎵(GaPSb)、氮磷化鋁(AlNP)、氮砷化鋁(AlNAs)、氮銻化鋁(AlNSb)、磷砷化鋁(AlPAs)、磷銻化鋁(AlPSb)、氮磷化銦(InNP)、氮砷化銦(InNAs)、磷銻化銦(InNSb)、磷砷化銦(InPAs)、磷銻化銦(InPSb)及其混合物所組成的一族群中的三元化合物；以及選自於由磷化鋁鎵氮(GaAlNP)、砷化鋁鎵氮(GaAlNAs)、銻化鋁鎵氮(GaAlNSb)、砷化鎵鋁磷(GaAlPAs)、 銻化鎵鋁磷(GaAlPSb)、磷化鎵銦氮(GaInNP)、砷化鎵銦氮(GaInNAs)、銻化鎵銦氮(GaInNSb)、砷化鎵銦磷(GaInPAs)、銻化鎵銦磷(GaInPSb)、磷化銦鋁氮(InAlNP)、砷化銦鋁氮(InAlNAs)、銻化銦鋁氮(InAlNSb)、砷化銦鋁磷(InAlPAs)、銻化銦鋁磷(InAlPSb)所組成的一族群中的四元化合物，但不以此為限。 Group III-V semiconductor compounds can be selected from gallium nitride (GaN), gallium phosphide (GaP), gallium arsenide (GaAs), gallium antimonide (GaSb), aluminum nitride (AlN), aluminum phosphide (AlP), aluminum arsenide (AlAs), aluminum antimonide (AlSb), indium nitride (InN), indium phosphide (InP), indium arsenide (InAs), indium antimonide (InSb) and their mixtures Binary compounds in a group of; selected from gallium nitrogen phosphide (GaNP), gallium arsenide nitride (GaNAs), gallium nitrogen antimonide (GaNSb), gallium arsenide phosphide (GaPAs), gallium antimonide phosphide ( GaPSb), Aluminum Nitrogen Phosphide (AlNP), Aluminum Nitrogen Arsenide (AlNAs), Aluminum Nitrogen Antimonide (AlNSb), Aluminum Phosphorous Arsenide (AlPAs), Aluminum Phosphorus Antimonide (AlPSb), Indium Nitrogen Phosphide (InNP) , indium arsenide nitrogen (InNAs), indium antimonide phosphorous (InNSb), indium phosphorous arsenide (InPAs), indium phosphorous antimonide (InPSb) and mixtures thereof; and ternary compounds selected from Aluminum Gallium Nitride (GaAlNP), Aluminum Gallium Arsenide Nitride (GaAlNAs), Aluminum Gallium Antimonide Nitride (GaAlNSb), Gallium Aluminum Arsenide Phosphide (GaAlPAs), Gallium Aluminum Antimonide Phosphide (GaAlPSb), Gallium Indium Phosphide Nitride (GaInNP), Gallium Indium Arsenide Nitrogen (GaInNAs), Gallium Indium Antimonide Nitrogen (GaInNSb), Gallium Indium Arsenide Phosphide (GaInPAs), Gallium Indium Antimonide Phosphide (GaInPSb), indium aluminum phosphide nitrogen (InAlNP), indium aluminum arsenide nitrogen (InAlNAs), indium antimonide aluminum nitrogen (InAlNSb), indium aluminum arsenide phosphide (InAlPAs), indium aluminum arsenide phosphide (InAlPSb) Quaternary compounds in a group of, but not limited to.

IV-VI族半導體化合物可以是選自於由硫化錫(SnS)、硒化錫(SnSe)、銻化錫(SnTe)、硫化鉛(PbS)、硒化鉛(PbSe)、碲化鉛(PbTe)及其混合物所組成的一族群中選出的二元化合物中的至少一種；選自於由硒硫化錫(SnSeS)、硒碲化錫(SnSeTe)、硫碲化錫(SnSTe)、硒硫化鉛(PbSeS)、碲化鉛硒(PbSeTe)、碲化鉛硫(PbSTe)、硫化錫鉛(SnPbS)、硒化錫鉛(SnPbSe)、碲化鉛錫(SnPbTe)及其混合物所組成的一族群中的三元化合物；和選自於由硫硒化錫鉛(SnPbSSe)、碲化錫鉛硒(SnPbSeTe)、硫碲化錫鉛(SnPbSTe)及其混合物所組成的一族群中的四元化合物，但不以此為限。 Group IV-VI semiconductor compounds can be selected from tin sulfide (SnS), tin selenide (SnSe), tin antimonide (SnTe), lead sulfide (PbS), lead selenide (PbSe), lead telluride (PbTe) ) and mixtures thereof, at least one binary compound selected from the group consisting of tin selenide sulfide (SnSeS), tin selenium telluride (SnSeTe), sulfur tin telluride (SnSTe), lead selenium sulfide (PbSeS), lead selenium telluride (PbSeTe), lead sulfur telluride (PbSTe), tin lead sulfide (SnPbS), tin lead selenide (SnPbSe), lead tin telluride (SnPbTe) and their mixtures and quaternary compounds selected from the group consisting of tin lead sulfur selenide (SnPbSSe), tin lead selenide telluride (SnPbSeTe), tin lead sulfur telluride (SnPbSTe) and mixtures thereof , but not limited to this.

IV族元素或含有上述元素的化合物可以是選自於由矽(Si)、鍺(Ge)及其混合物所組成的一族群中選出的元素；以及選自於氮化矽(SiC)、矽鍺(SiGe)及其混合物所組成的一族群中的二元化合物，但不以此為限。 Group IV elements or compounds containing the above elements may be elements selected from the group consisting of silicon (Si), germanium (Ge) and mixtures thereof; and elements selected from silicon nitride (SiC), silicon germanium Binary compounds in a group consisting of (SiGe) and mixtures thereof, but not limited thereto.

量子點可以具有均勻的單一結構、雙層結構，例如核-殼(core-shell)結構、梯度結構(gradient structure)等，或具有以上所述的混合結構。 Quantum dots can have a uniform single structure, a double-layer structure, such as a core-shell structure, a gradient structure, etc., or a mixed structure as described above.

具體而言，在核-殼雙層結構中，構成核和殼之每一者的材料，可以由上述不同的半導體化合物所構成。例如，核可以包括選自於由硒化鎘、硫化鎘、硫化鋅、硒化鋅、碲化鎘、硒碲化鎘、鋅硫化鎘、硒化鉛、硫化銀銦鋅(AgInZnS)和氧化鋅所組成的一族群中的至少一種材料，但是不以此為限。殼可以包括選自於由硒化鎘、硒化鋅、硫化鋅、碲化鋅、碲化鎘、硫化鉛、氧化鈦(TiO)、硒化鍶(SrSe)和硒化汞所組成的一族群中的至少一種材料，但不以此為限。 Specifically, in the core-shell double-layer structure, the materials constituting each of the core and the shell may be composed of the above-mentioned different semiconductor compounds. For example, the core may comprise a compound selected from the group consisting of cadmium selenide, cadmium sulfide, zinc sulfide, zinc selenide, cadmium telluride, cadmium selenium telluride, zinc cadmium sulfide, lead selenide, silver indium zinc sulfide (AgInZnS) and zinc oxide At least one material from a group consisting of, but not limited to. The shell may comprise cadmium selenide, zinc selenide, zinc sulfide, zinc telluride, cadmium telluride, lead sulfide, titanium oxide (TiO), strontium selenide (SrSe), and mercury selenide At least one of the materials, but not limited thereto.

量子點可以通過濕式化學製程(wet chemical process)、金屬有機化學氣相沉積(Metal Organic Chemical Vapor Deposition，MOCVD)或分子束磊晶(Molecular Beam Epitaxy，MBE)來合成，但不以此為限。 Quantum dots can be synthesized by wet chemical process, metal organic chemical vapor deposition (Metal Organic Chemical Vapor Deposition, MOCVD) or molecular beam epitaxy (Molecular Beam Epitaxy, MBE), but not limited thereto .

濕式化學製程是藉由將前趨物(precursor)材料加入有機溶劑中來成長顆粒的方法。當晶體成長時，有機溶劑自動協調並結合到量子點的晶體表面，來作為分散劑，進而控制晶體的生長。因此，可以通過比氣相沉積方法，例如金屬有機化學氣相沉積或分子束磊晶，更容易且更便宜的方法，來控制奈米顆粒的成長。故而，較佳是採用濕式化學製程來製造量子點。 The wet chemical process is a method of growing particles by adding precursor materials into organic solvents. When the crystal grows, the organic solvent automatically coordinates and binds to the crystal surface of the quantum dots as a dispersant, thereby controlling the growth of the crystal. Therefore, the growth of nanoparticles can be controlled by easier and cheaper methods than vapor deposition methods, such as metal-organic chemical vapor deposition or molecular beam epitaxy. Therefore, it is preferable to use a wet chemical process to manufacture quantum dots.

在本發明的一個實施例中，量子點可以進一步包括有機配位基團(organic ligand)。有機配位基團可以藉由將其結合到量子點的表面，而扮演穩定量子點的角色。此種有機配位基團，在本發明中並不限定，但可以是，例如包括具有5至20個碳原子的烷基羧酸(alkyl carboxylic acid)、烯基羧酸(alkenyl carboxylic acid)或炔基羧酸(alkynyl carboxylic acid)、硫醇(thiol)、磷酸(phosphoric acid)、吡啶(pyridine)、巰基醇(mercapto alcohol)、膦(phosphine)、膦氧化物(phosphine oxide)等。考慮要藉由有效保護量子點表面來提高穩定性，因此有機配位基團，較佳是包括選自於具有5至20個碳原子的烷基羧酸、烯基羧酸和炔基羧酸、硫醇和磷酸所組成的一族群中的至少一種。 In one embodiment of the present invention, the quantum dots may further include organic ligands. The organic coordinating group can play the role of stabilizing the quantum dots by binding them to the surface of the quantum dots. This kind of organic coordinating group is not limited in the present invention, but may be, for example, include alkyl carboxylic acid (alkyl carboxylic acid), alkenyl carboxylic acid (alkenyl carboxylic acid) or Alkynyl carboxylic acid, thiol, phosphoric acid, pyridine, mercapto alcohol, phosphine, phosphine oxide, etc. It is considered to improve stability by effectively protecting the surface of quantum dots, so the organic coordinating group preferably includes an alkyl carboxylic acid, an alkenyl carboxylic acid and an alkynyl carboxylic acid having 5 to 20 carbon atoms. At least one of a group consisting of , thiol and phosphoric acid.

相對於量子點的總表面積，有機配位基團可以覆蓋其5%或更高的表面。 Relative to the total surface area of a quantum dot, organic coordinating groups can cover 5% or more of its surface.

相對於每1摩爾量子點，有機配位基團的含量可以為0.1摩爾至10摩爾。 The content of the organic coordination group may be 0.1 to 10 moles per 1 mole of quantum dots.

相對於整體量子點分散材料的100重量百分比(%)，量子點的含量可以介於5重量百分比至70重量百分比之間，較佳係介於10重量百分比至65重量百分比之間，更佳係介於15重量百分比至60重量百分比之間。當量子點的含量包含在上述範圍內時，可以提供具有優異光敏性的自發光型光敏樹脂組合物。 Relative to 100 weight percent (%) of the overall quantum dot dispersion material, the content of quantum dots can be between 5 weight percent and 70 weight percent, preferably between 10 weight percent and 65 weight percent, more preferably Between 15% by weight and 60% by weight. When the content of the quantum dots is contained within the above range, a self-luminous photosensitive resin composition having excellent photosensitivity can be provided.

在本發明的一個實施例中，上述溶劑可以包含一種化合物，此化合物具有酯鍵以及選自於由C3-C10環烷基、C2-C10 異質環烷基、C5-C10芳香基和C4-C10異質芳香基所組成之一族群中的至少一者。 In one embodiment of the present invention, the above-mentioned solvent may contain a compound having an ester bond and being selected from the group consisting of C3-C10 cycloalkyl, C2-C10 At least one member of a group consisting of heterocycloalkyl, C5-C10 aryl and C4-C10 heteroaryl.

具體而言，上述溶劑可以包含選自於由下述化學式1和化學式2所表示的化合物所組成的一族群中的至少一種：

Figure 107103484-A0305-02-0013-4
Specifically, the above-mentioned solvent may contain at least one selected from a group consisting of compounds represented by the following chemical formula 1 and chemical formula 2:
Figure 107103484-A0305-02-0013-4

Figure 107103484-A0305-02-0013-3
Figure 107103484-A0305-02-0013-3

其中，A是被選自於由C1-C10烷基和鹵素所組成之一群取代基中的至少一個所取代或未被取代的C3-C10環烷基、C2-C10異質環烷基、C5-C10芳香基或C4-C10異質芳香基；L是C1-C6亞烷基或不存在，以及R為C1-C10烷基或C2-C10烯基。 Among them, A is a substituted or unsubstituted C3-C10 cycloalkyl, C2-C10 heterocycloalkyl, C5- C10 aryl or C4-C10 heteroaryl; L is C1-C6 alkylene or absent, and R is C1-C10 alkyl or C2-C10 alkenyl.

此處所使用的C1-C10烷基，是指由1至10個碳原子所構成的直鍊或支鏈一價烴基(monovalent hydrocarbon)，且其實施例可以包括甲基(methyl)、乙基(ethyl)、丙基(propyl)、丁基(butyl)、戊基(pentyl)、己基(hexyl)、庚基(heptyl)、辛基(octyl)和類似的官能基，但不以此為限。 The C1-C10 alkyl group used here refers to a linear or branched monovalent hydrocarbon group (monovalent hydrocarbon) composed of 1 to 10 carbon atoms, and examples thereof may include methyl, ethyl ( ethyl), propyl, butyl, pentyl, hexyl, heptyl, octyl and similar functional groups, but not limited thereto.

此處所使用的C3-C10環烷基，是指由3至10個碳原子組成的簡單或併合(fused)的環烴基(cyclic hydrocarbon)，其實施例可以包括：環丙基(cyclopropyl)、環丁基(cyclobutyl)、環戊基(cyclopentyl)、環己基(cyclohexyl)和類似的官能基，但不以此為限。 The C3-C10 cycloalkyl group used here refers to a simple or combined (fused) ring hydrocarbon group (cyclic hydrocarbon) composed of 3 to 10 carbon atoms, and its examples may include: cyclopropyl (cyclopropyl), ring Butyl (cyclobutyl), cyclopentyl (cyclopentyl), cyclohexyl (cyclohexyl) and similar functional groups, but not limited thereto.

此處所使用的C2-C10異質環烷基，是指由3至10個碳原子組成的簡單或併合的環烴中，至少有一個環碳(ring carbon)被氧(oxygen)、硫(sulfur)或氮(nitrogen)取代的官能基，其實施例可包括：四氫呋喃基(tetrahydrofuranyl)、四氫吡喃基(tetrahydropyranyl)、噻唑烷基(thiazolidinyl)、環氧乙烷基(oxiranyl)和類似的官能基，但不以此為限。 The C2-C10 heterocycloalkyl group used here refers to a simple or combined ring hydrocarbon composed of 3 to 10 carbon atoms, at least one ring carbon (ring carbon) is replaced by oxygen (oxygen), sulfur (sulfur) Or nitrogen (nitrogen) substituted functional groups, examples of which may include: tetrahydrofuranyl (tetrahydrofuranyl), tetrahydropyranyl (tetrahydropyranyl), thiazolidinyl (thiazolidinyl), oxiranyl (oxiranyl) and similar functional basis, but not limited thereto.

此處所使用的C5-C10芳香基，是指具有5元環(5-membered ring)至10元環的簡單或併合的環狀芳香烴基(cyclic aromatic hydrocarbon)，且其實施例可以包括：苯基(phenyl)、萘基(naphthyl)、環戊二烯基(cyclopentadienyl)、四氫萘基(tetrahydronaphthyl)和類似的官能基，但不以此為限。 The C5-C10 aromatic group used here refers to a simple or combined cyclic aromatic hydrocarbon group (cyclic aromatic hydrocarbon) having a 5-membered ring to a 10-membered ring, and examples thereof may include: phenyl (phenyl), naphthyl, cyclopentadienyl, tetrahydronaphthyl and similar functional groups, but not limited thereto.

此處所使用的C4-C10異質芳香基，是指其中具有5元環至10元環的簡單或併合環狀芳香烴基中的至少一個環碳被氧、硫或氮取代的官能基。且其實施例可以包括：吡啶基(pyridinyl)、呋喃基(furanyl)、噻吩基(thiophenyl)、吲哚基(indolyl)、喹啉基(quinolinyl)、咪唑啉基(imidazolinyl)、噁唑基(oxazolyl)、噻唑基(thiazolyl)和類似的官能基，但不以此為限。 The C4-C10 heterogeneous aromatic group used here refers to a functional group in which at least one ring carbon in a simple or combined cyclic aromatic hydrocarbon group having 5-10-membered rings is replaced by oxygen, sulfur or nitrogen. And its examples may include: pyridinyl (pyridinyl), furanyl (furanyl), thiophenyl (thiophenyl), indolyl (indolyl), quinolinyl (quinolinyl), imidazolinyl (imidazolinyl), oxazolyl ( oxazolyl), thiazolyl (thiazolyl) and similar functional groups, but not limited thereto.

此處所使用的C1-C6亞烷基，是指由1至6個碳原子所構成的直鍊或支鏈二價烴基(bivalent hydrocarbon)。且其實施例可以包括：亞甲基(methylene)、亞乙基(ethylene)、亞丙基(propylene)、亞丁基(butylene)、亞戊基(pentylene)和類似的官能基，但不以此為限。 The C1-C6 alkylene group used herein refers to a linear or branched bivalent hydrocarbon group composed of 1 to 6 carbon atoms. And its examples may include: methylene (methylene), ethylene (ethylene), propylene (propylene), butylene (butylene), pentylene (pentylene) and similar functional groups, but not in this limit.

此處所使用的C2-C10烯基，是指具有至少一個碳-碳雙鍵，由2至10個碳原子構成的直鍊或支鏈不飽和烴(unsaturated hydrocarbon)。且其實施例可以包括：乙烯基(ethylenyl)、丙烯基(propenyl)、丁烯基(butenyl)、戊烯基(pentenyl)、烯丙基(allyl)和類似的官能基，但不以此為限。 The C2-C10 alkenyl group used herein refers to a straight-chain or branched-chain unsaturated hydrocarbon (unsaturated hydrocarbon) having at least one carbon-carbon double bond and consisting of 2 to 10 carbon atoms. And examples thereof may include: vinyl (ethylenyl), propenyl (propenyl), butenyl (butenyl), pentenyl (pentenyl), allyl (allyl) and similar functional groups, but are not intended to be limit.

在本發明的一個實施例中，A可以是被鹵素取代或未被取代的環戊基、環己基、四氫呋喃基、四氫吡喃基、苯基、環戊二烯基或呋喃基；L可以是C1-C6亞烷基或不存在；R可以是C1-C10烷基或C2-C10烯基。 In one embodiment of the present invention, A can be cyclopentyl, cyclohexyl, tetrahydrofuryl, tetrahydropyranyl, phenyl, cyclopentadienyl or furyl substituted or unsubstituted by halogen; L can be is C1-C6 alkylene or absent; R can be C1-C10 alkyl or C2-C10 alkenyl.

化學式1所表示的化合物的實施例，可以包括：苯基-乙酸乙酯(phenyl-acetic acid ethyl ester)、3-苯基-丙酸甲酯(3-phenyl-propionic acid methyl ester)、3-苯基-丙酸乙酯(3-phenyl-propionic acid ethyl ester)、4-苯基-丁酸乙酯(4-phenyl-butyric acid ethyl ester)、5-苯基-戊酸乙酯、(5-phenyl-pentanoic acid ethyl ester)、6-苯基-己酸乙酯(6-phenyl-hexanoic acid ethyl ester)、4-苯基-丁酸丙酯(4-phenyl-butyric acid propyl ester)、4-(4-氯-苯基)-丁酸乙酯 (4-(4-chloro-phenyl)-butyric acid ethyl ester)、4-(3,4-二氯-苯基)-丁酸乙酯(4-(3,4-dichloro-phenyl)-butyric acid ethyl ester)、3-環戊-1,3-二烯基-丙酸甲酯(3-cyclopenta-1,3-dienyl-propionic acid methyl ester)、4-環戊-1,3-二烯基-丁酸乙酯(4-cyclopenta-1,3-dienyl-butyric acid ethyl ester)、5-環戊-1,3-二烯基-戊酸乙酯(5-cyclopenta-1,3-dienyl-pentanoic acid ethyl ester)、6-環戊-1,3-二烯基-己酸乙酯(6-cyclopenta-1,3-dienyl-hexanoic acid ethyl ester)、4-環戊-1,3-二烯基-丁酸丙酯(4-cyclopenta-1,3-dienyl-butyric acid propyl ester)、3-呋喃-2-基-丙酸甲酯(3-furan-2-yl-propionic acid methyl ester)、4-呋喃-2-基-丁酸乙酯(4-furan-2-yl-butyric acid ethyl ester)、5-呋喃-2-基-戊酸乙酯(5-furan-2-yl-pentanoic acid ethyl ester)、6-呋喃-2-基-己酸乙酯(6-furan-2-yl-hexanoic acid ethyl ester)、4-呋喃-2-基-丁酸丙酯(4-furan-2-yl-butyric acid propyl ester)、呋喃-2-羧酸丙酯(furan-2-carboxylic acid propyl ester)、呋喃-2-羧酸丁酯(furan-2-carboxylic acid butyl ester)、3-環戊基-丙酸甲酯(3-cyclopentyl-propionic acid methyl ester)、4-環戊基丁酸乙酯(4-cyclopentyl-butyric acid ethyl ester)，5-環戊基戊酸乙酯(5-cyclopentyl-pentanoic acid ethyl ester)、6-環戊基-己酸乙酯(6-cyclopentyl-hexanoic acid ethyl ester)、4-環戊基丁酸丙酯(4-cyclopentyl-butyric acid propyl ester)、環戊烷羧酸異丁酯(cyclopentanecarboxylic acid isobutyl ester)、環戊烷羧酸戊酯(cyclopentanecarboxylic acid pentyl ester)、3-(四氫呋喃-3-基)-丙酸甲酯(3-(tetrahydro-furan-3-yl)-propionic acid methyl ester)、4-(四氫呋喃-3-基)-丁酸乙酯(4-(tetrahydro-furan-3-yl)-butyric acid ethyl ester)、5-(四氫呋喃-3-基)-戊酸乙酯(5-(tetrahydro-furan-3-yl)-pentanoic acid ethyl ester)、6-(四氫-呋喃-3-基)-己酸乙酯(6-(tetrahydro-furan-3-yl)-hexanoic acid ethyl ester)、4-(四氫-呋喃-3-基)-丁酸丙酯(4-(tetrahydro-furan-3-yl)-butyric acid propyl ester)、四氫呋喃-3-羧酸丙酯(tetrahydro-furan-3-carboxylic acid propyl ester)、四氫呋喃-3-羧酸丁酯(tetrahydro-furan-3-carboxylic acid butyl ester)、3-(四氫-呋喃-2-基)-丙酸甲酯(3-(tetrahydro-furan-2-yl)-propionic acid methyl ester)、4-(四氫呋喃-2-基)-丁酸乙酯(4-(tetrahydro-furan-2-yl)-butyric acid ethyl ester)、5-(四氫呋喃-2-基)-戊酸乙酯(5-(tetrahydro-furan-2-yl)-pentanoic acid ethyl ester)、6-(四氫呋喃-2-基)-己酸乙酯(6-(tetrahydro-furan-2-yl)-hexanoic acid ethyl ester)、4-(四氫-呋喃-2-基)-丁酸丙酯(4-(tetrahydro-furan-2-yl)-butyric acid propyl ester)、四氫呋喃-2-羧酸2-乙基己酯 (tetrahydro-furan-2-carboxylic acid 2-ethyl-hexyl ester)、環己基-乙酸乙酯(cyclohexyl-acetic acid ethyl ester)、3-環己基-丙酸甲酯(3-cyclohexyl-propionic acid methyl ester)、4-環己基丁酸乙酯(4-cyclohexyl-butyric acid ethyl ester)、5-環己基-戊酸乙酯(5-cyclohexyl-pentanoic acid ethyl ester)、6-環己基-己酸乙酯(6-cyclohexyl-hexanoic acid ethyl ester)、4-環己基-丁酸丙酯(4-cyclohexyl-butyric acid propyl ester)、環己烷羧酸丙酯(cyclohexanecarboxylic acid propyl ester)、環己烷羧酸己酯(cyclohexanecarboxylic acid hexyl ester)、環己基-乙酸烯丙基酯(cyclohexyl-acetic acid allyl ester)、3-(四氫-吡喃-2-基)-丙酸甲酯(3-(tetrahydro-pyran-2-yl)-propionic acid methyl ester)、4-(四氫-吡喃-2-基)-丁酸乙酯(4-(tetrahydro-pyran-2-yl)-butyric acid ethyl ester)、5-(四氫-吡喃-2-基)-戊酸乙酯(5-(tetrahydro-pyran-2-yl)-pentanoic acid ethyl ester)、6-(四氫-吡喃-2-基)-己酸乙酯(6-(tetrahydro-pyran-2-yl)-hexanoic acid ethyl ester)、4-(四氫-吡喃-2-基)-丁酸丙酯(4-(tetrahydro-pyran-2-yl)-butyric acid propyl ester)、四氫-吡喃-2-羧酸丙酯(tetrahydro-pyran-2-carboxylic acid propyl ester)、四氫-吡喃-2-羧酸丁酯(tetrahydro-pyran-2-carboxylic acid butyl ester)、3-(四氫-吡喃-3-基)-丙酸甲酯(3-(tetrahydro-pyran-3-yl)-propionic acid methyl ester)、 4-(四氫-吡喃-3-基)-丁酸乙酯(4-(tetrahydro-pyran-3-yl)-butyric acid ethyl ester)、5-(四氫-吡喃-2-基)-戊酸乙酯(5-(tetrahydro-pyran-2-yl)-pentanoic acid ethyl ester)、6-(四氫-吡喃-3-基)-己酸乙酯(6-(tetrahydro-pyran-3-yl)-hexanoic acid ethyl ester)、4-(四氫-吡喃-3-基)-丁酸丙酯(4-(tetrahydro-pyran-3-yl)-butyric acid propyl ester)、四氫-吡喃-3-羧酸異丁酯(tetrahydro-pyran-3-carboxylic acid isobutyl ester)、四氫-吡喃-3-羧酸戊酯(tetrahydro-pyran-3-carboxylic acid pentyl ester)、3-(四氫-吡喃-4-基)-丙酸甲酯(3-(tetrahydro-pyran-4-yl)-propionic acid methyl ester)、4-(四氫-吡喃-4-基)-丁酸乙酯(4-(tetrahydro-pyran-4-yl)-butyric acid ethyl ester)、5-(四氫-吡喃-4-基)-戊酸乙酯(5-(tetrahydro-pyran-4-yl)-pentanoic acid ethyl ester)、6-(四氫-吡喃-4-基)-己酸乙酯(6-(tetrahydro-pyran-4-yl)-hexanoic acid ethyl ester)、4-(四氫-吡喃-4-基)-丁酸丙酯(4-(tetrahydro-pyran-4-yl)-butyric acid propyl ester)、四氫-吡喃-4-羧酸丁酯(tetrahydro-pyran-4-carboxylic acid butyl ester)和四氫吡喃-4-羧酸丙酯(tetrahydro-pyran-4-carboxylic acid propyl ester)等。 The embodiment of the compound represented by chemical formula 1 may include: phenyl-acetic acid ethyl ester (phenyl-acetic acid ethyl ester), 3-phenyl-propionic acid methyl ester (3-phenyl-propionic acid methyl ester), 3- Phenyl-propionic acid ethyl ester (3-phenyl-propionic acid ethyl ester), 4-phenyl-butyric acid ethyl ester (4-phenyl-butyric acid ethyl ester), 5-phenyl-pentanoic acid ethyl ester, (5 -phenyl-pentanoic acid ethyl ester), 6-phenyl-hexanoic acid ethyl ester, 4-phenyl-butyric acid propyl ester, 4 -(4-Chloro-phenyl)-butyric acid ethyl ester (4-(4-chloro-phenyl)-butyric acid ethyl ester), 4-(3,4-dichloro-phenyl)-butyric acid ethyl ester (4-(3,4-dichloro-phenyl)-butyric acid ethyl ester), 3-cyclopenta-1,3-dienyl-propionic acid methyl ester (3-cyclopenta-1,3-dienyl-propionic acid methyl ester), 4-cyclopenta-1,3-dienyl - Butyric acid ethyl ester (4-cyclopenta-1,3-dienyl-butyric acid ethyl ester), 5-cyclopenta-1,3-dienyl-valeric acid ethyl ester (5-cyclopenta-1,3-dienyl- pentanoic acid ethyl ester), 6-cyclopenta-1,3-dienyl-hexanoic acid ethyl ester (6-cyclopenta-1,3-dienyl-hexanoic acid ethyl ester), 4-cyclopenta-1,3-di 4-cyclopenta-1,3-dienyl-butyric acid propyl ester, 3-furan-2-yl-propionic acid methyl ester , 4-furan-2-yl-butyric acid ethyl ester (4-furan-2-yl-butyric acid ethyl ester), 5-furan-2-yl-pentanoic acid ethyl ester (5-furan-2-yl-pentanoic acid acid ethyl ester), 6-furan-2-yl-hexanoic acid ethyl ester (6-furan-2-yl-hexanoic acid ethyl ester), 4-furan-2-yl-butyric acid propyl ester (4-furan-2 -yl-butyric acid propyl ester), furan-2-carboxylic acid propyl ester (furan-2-carboxylic acid propyl ester), furan-2-carboxylic acid butyl ester (furan-2-carboxylic acid butyl ester), 3-ring Pentyl-propionic acid methyl ester (3-cyclopentyl-propionic acid methyl ester), 4-cyclopentyl-butyric acid ethyl ester (4-cyclopentyl-butyric acid ethyl ester), 5-cyclopentyl-propionic acid ethyl ester (5- cyclopentyl-pentanoic acid ethyl ester), 6-cyclopentyl-hexanoic acid ethyl ester (6-c yclopentyl-hexanoic acid ethyl ester), 4-cyclopentyl-butyric acid propyl ester (4-cyclopentyl-butyric acid propyl ester), cyclopentanecarboxylic acid isobutyl ester (cyclopentanecarboxylic acid isobutyl ester), cyclopentanecarboxylic acid pentyl ester (cyclopentanecarboxylic acid pentyl ester), 3-(tetrahydrofuran-3-yl)-propionic acid methyl ester (3- (tetrahydro-furan-3-yl)-propionic acid methyl ester), 4-(tetrahydrofuran-3-yl)-butyric acid ethyl ester (4-(tetrahydro-furan-3-yl)-butyric acid ethyl ester), 5 -(tetrahydrofuran-3-yl)-pentanoic acid ethyl ester (5-(tetrahydro-furan-3-yl)-pentanoic acid ethyl ester), 6-(tetrahydro-furan-3-yl)-hexanoic acid ethyl ester ( 6-(tetrahydro-furan-3-yl)-hexanoic acid ethyl ester), 4-(tetrahydro-furan-3-yl)-butyric acid propyl ester (4-(tetrahydro-furan-3-yl)-butyric acid propyl ester), tetrahydro-furan-3-carboxylic acid propyl ester (tetrahydro-furan-3-carboxylic acid propyl ester), tetrahydro-furan-3-carboxylic acid butyl ester (tetrahydro-furan-3-carboxylic acid butyl ester), 3-(tetrahydrofuran-3-carboxylic acid butyl ester), Hydrogen-furan-2-yl)-propionic acid methyl ester (3-(tetrahydro-furan-2-yl)-propionic acid methyl ester), 4-(tetrahydrofuran-2-yl)-butyric acid ethyl ester (4-( tetrahydro-furan-2-yl)-butyric acid ethyl ester), 5-(tetrahydrofuran-2-yl)-pentanoic acid ethyl ester (5-(tetrahydro-furan-2-yl)-pentanoic acid ethyl ester), 6- (tetrahydrofuran-2-yl)-hexanoic acid ethyl ester (6-(tetrahydro-furan-2-yl)-hexanoic acid ethyl ester), 4-(tetrahydro-furan-2-yl)-butyric acid propyl ester (4 -(tetrahydro-furan-2-yl)-butyric acid propyl ester), tetrahydrofuran-2-carboxylate 2-ethylhexyl ester (tetrahydro-furan-2-carboxylic acid 2-ethyl-hexyl ester), cyclohexyl-acetic acid ethyl ester (cyclohexyl-acetic acid ethyl ester), 3-cyclohexyl-propionic acid methyl ester (3-cyclohexyl-propionic acid methyl ester ), 4-cyclohexyl-butyric acid ethyl ester, 5-cyclohexyl-pentanoic acid ethyl ester, 6-cyclohexyl-hexanoic acid ethyl ester (6-cyclohexyl-hexanoic acid ethyl ester), 4-cyclohexyl-butyric acid propyl ester, cyclohexanecarboxylic acid propyl ester, cyclohexanecarboxylic acid Hexyl ester (cyclohexanecarboxylic acid hexyl ester), cyclohexyl-acetic acid allyl ester (cyclohexyl-acetic acid allyl ester), 3-(tetrahydro-pyran-2-yl)-propionic acid methyl ester (3-(tetrahydro- pyran-2-yl)-propionic acid methyl ester), 4-(tetrahydro-pyran-2-yl)-butyric acid ethyl ester (4-(tetrahydro-pyran-2-yl)-butyric acid ethyl ester), 5-(tetrahydro-pyran-2-yl)-pentanoic acid ethyl ester (5-(tetrahydro-pyran-2-yl)-pentanoic acid ethyl ester), 6-(tetrahydro-pyran-2-yl) -Ethyl hexanoate (6-(tetrahydro-pyran-2-yl)-hexanoic acid ethyl ester), 4-(tetrahydro-pyran-2-yl)-propyl butyrate (4-(tetrahydro-pyran- 2-yl)-butyric acid propyl ester), tetrahydro-pyran-2-carboxylic acid propyl ester (tetrahydro-pyran-2-carboxylic acid propyl ester), tetrahydro-pyran-2-carboxylic acid butyl ester (tetrahydro -pyran-2-carboxylic acid butyl ester), 3-(tetrahydro-pyran-3-yl) - Methyl propionate (3-(tetrahydro-pyran-3-yl)-propionic acid methyl ester), 4-(tetrahydro-pyran-3-yl)-butyric acid ethyl ester (4-(tetrahydro-pyran-3-yl)-butyric acid ethyl ester), 5-(tetrahydro-pyran-2-yl) -Ethyl pentanoate (5-(tetrahydro-pyran-2-yl)-pentanoic acid ethyl ester), 6-(tetrahydro-pyran-3-yl)-ethyl hexanoate (6-(tetrahydro-pyran- 3-yl)-hexanoic acid ethyl ester), 4-(tetrahydro-pyran-3-yl)-butyric acid propyl ester (4-(tetrahydro-pyran-3-yl)-butyric acid propyl ester), tetrahydro -pyran-3-carboxylic acid isobutyl ester (tetrahydro-pyran-3-carboxylic acid isobutyl ester), tetrahydro-pyran-3-carboxylic acid pentyl ester (tetrahydro-pyran-3-carboxylic acid pentyl ester), 3 -(tetrahydro-pyran-4-yl)-propionic acid methyl ester (3-(tetrahydro-pyran-4-yl)-propionic acid methyl ester), 4-(tetrahydro-pyran-4-yl)- Butyric acid ethyl ester (4-(tetrahydro-pyran-4-yl)-butyric acid ethyl ester), 5-(tetrahydro-pyran-4-yl)-pentanoic acid ethyl ester (5-(tetrahydro-pyran-4 -yl)-pentanoic acid ethyl ester), 6-(tetrahydro-pyran-4-yl)-hexanoic acid ethyl ester (6-(tetrahydro-pyran-4-yl)-hexanoic acid ethyl ester), 4-( Tetrahydro-pyran-4-yl)-butyric acid propyl ester (4-(tetrahydro-pyran-4-yl)-butyric acid propyl ester), tetrahydro-pyran-4-carboxylic acid butyl ester (tetrahydro-pyran-4-carboxylic acid butyl ester) -4-carboxylic acid butyl ester) and tetrahydro-pyran-4-carboxylic acid propyl ester (tetrahydro-pyran-4-carboxylic acid propyl ester), etc.

化學式2所表示的化合物的實施例，可以包括：乙酸芐酯(acetic acid benzyl ester)、丙酸苯乙酯(propionic acid phenethyl ester)、丙酸3-苯基-丙酯(propionic acid 3-phenyl-propyl ester)、丙酸4-苯基-丁酯(propionic acid 4-phenyl-butyl ester)、丁酸苯乙酯(butyric acid phenethyl ester)、丙酸2-(4-氯-苯基)-乙酯(propionic acid 2-(4-chloro-phenyl)-ethyl ester)、丙酸2-(3,4-二氯-苯基)-乙酯(propionic acid 2-(3,4-dichloro-phenyl)-ethyl ester)、乙酸環戊-1,3-二烯基甲酯(acetic acid cyclopenta-1,3-dienyl methyl ester)、丙酸2-環戊-1,3-二烯基-乙酯(propionic acid 2-cyclopenta-1,3-dienyl-ethyl ester)、丙酸3-環戊-1,3-二烯基-丙酯(propionic acid 3-cyclopenta-1,3-dienyl-propyl ester)、丙酸4-環戊-1,3-二烯基-丁酯(propionic acid 4-cyclopenta-1,3-dienyl-butyl ester)、丁酸2-環戊-1,3-二烯基-乙酯(butyric acid 2-cyclopenta-1,3-dienyl-ethyl ester)、乙酸呋喃-2-基甲酯(acetic acid furan-2-ylmethyl ester)、丙酸2-呋喃-2-基-乙酯(propionic acid 2-furan-2-yl-ethyl ester)、丙酸3-呋喃-2-基-丙酯(propionic acid 3-furan-2-yl-propyl ester)、丙酸4-呋喃-2-基-丁酯(propionic acid 4-furan-2-yl-butyl ester)、丁酸2-呋喃-2-基-乙酯(butyric acid 2-furan-2-yl-ethyl ester)、乙酸環戊基甲基酯(acetic acid cyclopentyl methyl ester)、丙酸2-環戊基-乙酯(propionic acid 2-cyclopentyl-ethyl ester)、丙酸3-環戊基-丙酯(propionic acid 3-cyclopentyl-propyl ester)、丙酸4-環戊基-丁酯(propionic acid 4-cyclopentyl-butyl ester)、丁酸2-環戊基-乙酯(butyric acid 2-cyclopentyl-ethyl ester)、乙酸四氫呋喃-3-基甲酯(acetic acid tetrahydro-furan-3-ylmethyl ester)、丙酸2-(四氫-呋喃-3-基)乙酯(propionic acid 2-(tetrahydro-furan-3-yl)-ethyl ester)、丙酸3-(四氫呋喃-3-基)-丙基酯(propionic acid 3-(tetrahydro-furan-3-yl)-propyl ester)、丙酸4-(四氫呋喃-3-基)-丁基酯(propionic acid 4-(tetrahydro-furan-3-yl)-butyl ester)、丁酸2-(四氫-呋喃-3-基)-乙酯(butyric acid 2-(tetrahydro-furan-3-yl)-ethyl ester)、乙酸四氫呋喃-2-基甲酯(acetic acid tetrahydro-furan-2-ylmethyl ester)、丙酸2-(四氫呋喃-2-基)-乙酯(propionic acid 2-(tetrahydro-furan-2-yl)-ethyl ester)、丙酸3-(四氫-呋喃-2-基)-丙基酯(propionic acid 3-(tetrahydro-furan-2-yl)-propyl ester)、丙酸4-(四氫-呋喃-2-基)-丁基酯(propionic acid 4-(tetrahydro-furan-2-yl)-butyl ester)、丁酸2-(四氫呋喃-2-基)-乙酯(butyric acid 2-(tetrahydro-furan-2-yl)-ethyl ester)、乙酸環己基甲酯(acetic acid cyclohexyl methyl ester)、丙酸2-環己基-乙酯(propionic acid 2-cyclohexyl-ethyl ester)、丙酸3-環己基-丙酯(propionic acid 3-cyclohexyl-propyl ester)、丙酸4-環己基-丁酯 (propionic acid 4-cyclohexyl-butyl ester)、丁酸2-環己基-乙酯(butyric acid 2-cyclohexyl-ethyl ester)、丁-3-烯酸環己基甲酯(but-3-enoic acid cyclohexyl methyl ester)、乙酸四氫-吡喃-2-基甲基酯(acetic acid tetrahydro-pyran-2-ylmethyl ester)、丙酸2-(四氫-吡喃-2-基)-乙酯(propionic acid 2-(tetrahydro-pyran-2-yl)-ethyl ester)、丙酸3-(四氫-吡喃-2-基)-丙酯(propionic acid 3-(tetrahydro-pyran-2-yl)-propyl ester)、丙酸4-(四氫-吡喃-2-基)-丁酯(propionic acid 4-(tetrahydro-pyran-2-yl)-butyl ester)、丁酸2-(四氫-吡喃-2-基)-乙酯(butyric acid 2-(tetrahydro-pyran-2-yl)-ethyl ester)、乙酸四氫-吡喃-3-基甲基酯(acetic acid tetrahydro-pyran-3-ylmethyl ester)、丙酸2(四氫-吡喃-3-基)-乙酯(propionic acid 2-(tetrahydro-pyran-3-yl)-ethyl ester)、丙酸3-(四氫-吡喃-2-基)-丙酯(propionic acid 3-(tetrahydro-pyran-2-yl)-propyl ester)、丙酸4-(四氫-吡喃-3-基)-丁酯(propionic acid 4-(tetrahydro-pyran-3-yl)-butyl ester)、丁酸2-(四氫-吡喃-3-基)-乙酯(butyric acid 2-(tetrahydro-pyran-3-yl)-ethyl ester)、乙酸四氫-吡喃-4-基甲酯(acetic acid tetrahydro-pyran-4-ylmethyl ester)、丙酸2-(四氫-吡喃-4-基)-乙酯(propionic acid 2-(tetrahydro-pyran-4-yl)-ethyl ester)、丙酸3-(四氫-吡喃-4-基)-丙酯(propionic acid 3-(tetrahydro-pyran-4-yl)-propyl ester)、丙酸4-(四氫-吡喃-4-基)-丁酯(propionic acid 4-(tetrahydro-pyran-4-yl)-butyl ester)和丁酸2-(四氫-吡喃-4-基)-乙酯(butyric acid 2-(tetrahydro-pyran-4-yl)-ethyl ester)等。 The embodiment of the compound represented by chemical formula 2 may include: acetic acid benzyl ester (acetic acid benzyl ester), propionic acid phenylethyl ester (propionic acid phenethyl ester), propionic acid 3-phenyl-propyl ester (propionic acid 3-phenyl -propyl ester), propionic acid 4-phenyl-butyl ester (propionic acid 4-phenyl-butyl ester), butyric acid phenethyl ester, propionic acid 2-(4-chloro-phenyl)- Ethyl ester (propionic acid 2-(4-chloro-phenyl)-ethyl ester), propionic acid 2-(3,4-dichloro-phenyl)-ethyl ester (propionic acid 2-(3,4-dichloro-phenyl) )-ethyl ester), acetic acid cyclopenta-1,3-dienyl methyl ester, 2-cyclopenta-1,3-dienyl-ethyl propionate (propionic acid 2-cyclopenta-1,3-dienyl-ethyl ester), propionic acid 3-cyclopenta-1,3-dienyl-propyl ester (propionic acid 3-cyclopenta-1,3-dienyl-propyl ester) , propionic acid 4-cyclopenta-1,3-dienyl-butyl ester (propionic acid 4-cyclopenta-1,3-dienyl-butyl ester), butyric acid 2-cyclopenta-1,3-dienyl- Butyric acid 2-cyclopenta-1,3-dienyl-ethyl ester, acetic acid furan-2-ylmethyl ester, 2-furan-2-yl-ethyl propionate (propionic acid 2-furan-2-yl-ethyl ester), propionic acid 3-furan-2-yl-propyl ester (propionic acid 3-furan-2-yl-propyl ester), propionic acid 4-furan-2- propionic acid 4-furan-2-yl-butyl ester, butyric acid 2-furan-2-yl-ethyl ester, cyclopentyl acetate Methyl ester (acetic acid cyclopentyl met hyl ester), 2-cyclopentyl-ethyl propionate (propionic acid 2-cyclopentyl-ethyl ester), propionic acid 3-cyclopentyl-propyl ester, propionic acid 4-cyclopentyl-butyl ester, Butyric acid 2-cyclopentyl-ethyl ester, acetic acid tetrahydro-furan-3-ylmethyl ester, propionic acid 2-(tetrahydro- Furan-3-yl) ethyl ester (propionic acid 2-(tetrahydro-furan-3-yl)-ethyl ester), propionic acid 3-(tetrahydro-furan-3-yl)-propyl ester (propionic acid 3-(tetrahydro- furan-3-yl)-propyl ester), propionic acid 4-(tetrahydro-furan-3-yl)-butyl ester), butyric acid 2-( Tetrahydro-furan-3-yl)-ethyl ester (butyric acid 2-(tetrahydro-furan-3-yl)-ethyl ester), acetic acid tetrahydro-furan-2-ylmethyl ester ), propionic acid 2-(tetrahydro-furan-2-yl)-ethyl ester (propionic acid 2-(tetrahydro-furan-2-yl)-ethyl ester), propionic acid 3-(tetrahydro-furan-2-yl)- Propionic acid 3-(tetrahydro-furan-2-yl)-propyl ester, propionic acid 4-(tetrahydro-furan-2-yl)-butyl ester (propionic acid 4-(tetrahydro-furan- 2-yl)-butyl ester), 2-(tetrahydrofuran-2-yl)-ethyl ester (butyric acid 2-(tetrahydro-furan-2-yl)-ethyl ester), cyclohexyl methyl acetate (acetic acid cyclohexyl methyl ester), 2-cyclohexyl-ethyl propionate (propionic acid 2-cyclohexyl-ethyl ester), 3-cyclohexyl-propyl propionate (propio nic acid 3-cyclohexyl-propyl ester), 4-cyclohexyl-butyl propionate (propionic acid 4-cyclohexyl-butyl ester), butyric acid 2-cyclohexyl-ethyl ester, but-3-enoic acid cyclohexyl methyl ester ester), acetic acid tetrahydro-pyran-2-ylmethyl ester, propionic acid 2-(tetrahydro-pyran-2-yl)-ethyl ester (propionic acid 2-(tetrahydro-pyran-2-yl)-ethyl ester), propionic acid 3-(tetrahydro-pyran-2-yl)-propyl ester (propionic acid 3-(tetrahydro-pyran-2-yl)-propyl ester), propionic acid 4-(tetrahydro-pyran-2-yl)-butyl ester (propionic acid 4-(tetrahydro-pyran-2-yl)-butyl ester), butyric acid 2-(tetrahydro-pyran -2-yl)-ethyl ester (butyric acid 2-(tetrahydro-pyran-2-yl)-ethyl ester), acetic acid tetrahydro-pyran-3-ylmethyl ester (acetic acid tetrahydro-pyran-3-ylmethyl ester), propionic acid 2-(tetrahydro-pyran-3-yl)-ethyl ester, propionic acid 2-(tetrahydro-pyran-3-yl)-ethyl ester, propionic acid 3-(tetrahydro-pyran- 2-yl)-propyl ester (propionic acid 3-(tetrahydro-pyran-2-yl)-propyl ester), propionic acid 4-(tetrahydro-pyran-3-yl)-butyl ester (propionic acid 4-( tetrahydro-pyran-3-yl)-butyl ester), butyric acid 2-(tetrahydro-pyran-3-yl)-ethyl ester), Acetic acid tetrahydro-pyran-4-ylmethyl ester (acetic acid tetrahydro-pyran-4-ylmethyl ester), propionic acid 2-(tetrahydro-pyran-4-yl)-ethyl ester (propionic acid 2-(tetrahydro -pyran-4-yl)-ethyl ester), propionic acid 3-(tetrahydro-pyran-4-yl) -Propionic acid 3-(tetrahydro-pyran-4-yl)-propyl ester), propionic acid 4-(tetrahydro-pyran-4-yl)-butyl ester (propionic acid 4-(tetrahydro-pyran-4-yl)-butyl ester) and butyric acid 2-(tetrahydro-pyran-4-yl) -4-yl)-ethyl ester (butyric acid 2-(tetrahydro-pyran-4-yl)-ethyl ester), etc.

上述溶劑可以單獨使用或者兩種以上組合使用。 The above solvents may be used alone or in combination of two or more.

在20℃下，溶劑可以具有小於12.0的介電常數，較佳小於10，更佳小於6。例如，溶劑在20℃下，可以具有介於2.0至5.5之間的介電常數。當溶劑具有小於12.0的介電常數時，其能夠使量子點在分散期間均勻分散，而不形成量子點聚集，並且可以表現出優異的光致發光效率。 The solvent may have a dielectric constant of less than 12.0, preferably less than 10, more preferably less than 6 at 20°C. For example, the solvent may have a dielectric constant between 2.0 and 5.5 at 20°C. When the solvent has a dielectric constant of less than 12.0, it can uniformly disperse quantum dots during dispersion without forming quantum dot aggregation, and can exhibit excellent photoluminescence efficiency.

相對於量子點分散材料總重量的100重量百分比，溶劑的含量可以介於5重量百分比至95重量百分比之間，較佳係介於20重量百分比至90重量百分比之間，更佳係介於30重量百分比至80重量百分比之間。當溶劑的含量小於5重量百分比時，可能會出現分散性變差的問題，並且當含量超過95重量百分比時，則可能會出現難以控制樹脂組合物之固體含量的問題。 Relative to 100% by weight of the total weight of the quantum dot dispersion material, the content of the solvent can be between 5% by weight and 95% by weight, preferably between 20% by weight and 90% by weight, and more preferably between 30% by weight Between weight percent and 80 weight percent. When the content of the solvent is less than 5% by weight, there may be a problem of poor dispersibility, and when the content exceeds 95% by weight, it may be difficult to control the solid content of the resin composition.

在本發明的一個實施例中，量子點分散材料可以進一步包含一種分散劑(dispersing agent)。 In one embodiment of the present invention, the quantum dot dispersion material may further include a dispersing agent.

當用於自發光型光敏樹脂組合物中時，此分散劑可用來抑制量子點因為極性差異所產生的去黏聚(deagglomeration)和沉澱現象，並且在製作彩色濾光片的過程中，賦予其作為量子點的保護層的作用。 When used in a self-illuminating photosensitive resin composition, this dispersant can be used to suppress the deagglomeration and precipitation of quantum dots due to polarity differences, and in the process of making color filters, give it Function as a protective layer for quantum dots.

分散劑，可以使用磷酸酯類(phosphate ester-based)分散劑、氨基甲酸酯類(urethane-based)分散劑、丙烯酸類(acrylic)分散劑等，來作為樹脂組合物的分散劑。具體而言，分散劑的市售品包括DISPER BYK-103、DISPER BYK-110、DISPER BYK-111、DISPER BYK-2000、DISPER BYK-2001、DISPER BYK-2070、DISPER BYK-2150、DISPER BYK-160、DISPER BYK-161、DISPER BYK-162、DISPER BYK-163、DISPER BYK-164、DISPER BYK-166等(以上為商品名，其係由BYK Chemie公司所生產的產品)。 As the dispersant, a phosphate ester-based dispersant, a urethane-based dispersant, an acrylic dispersant, etc. can be used as the dispersant of the resin composition. Specifically, commercially available dispersants include DISPER BYK-103, DISPER BYK-110, DISPER BYK-111, DISPER BYK-2000, DISPER BYK-2001, DISPER BYK-2070, DISPER BYK-2150, DISPER BYK-160 , DISPER BYK-161, DISPER BYK-162, DISPER BYK-163, DISPER BYK-164, DISPER BYK-166, etc. (the above are trade names, which are products produced by BYK Chemie).

相對於100重量份之量子點分散材料固體成分的總重量，分散劑的含量可以為1至300重量份，較佳為3至250重量份，更佳為5至200重量份。當分散劑含量包含在上述範圍內時，由於分散劑具有優異的量子點去黏聚效果，並且能夠抑制由本發明所述之量子點分散材料和自發光型光敏樹脂組成分的極性差所引起的沉澱現象，並且可以在彩色濾光片的製作過程中，賦予其作為量子點的保護層的作用。 The content of the dispersant can be 1 to 300 parts by weight, preferably 3 to 250 parts by weight, more preferably 5 to 200 parts by weight relative to 100 parts by weight of the total weight of the solid content of the quantum dot dispersion material. When the dispersant content is included in the above range, because the dispersant has excellent quantum dot deagglomeration effect, and can suppress the polarity difference caused by the quantum dot dispersion material and self-luminous photosensitive resin composition of the present invention. Precipitation phenomenon, and can be endowed with the role of a protective layer for quantum dots in the production process of color filters.

當分散劑的含量小於上述範圍時，量子點的去黏聚效果可能會稍微降低。而當分散劑的含量超過上述範圍時，包含有量子點分散材料的自發光型光敏樹脂組合物的顯影性質(developing property)可能會稍微變差。因此，分散劑的含量較佳係包含在上述範圍之內。 When the content of the dispersant is less than the above range, the deagglomeration effect of the quantum dots may be slightly reduced. However, when the content of the dispersant exceeds the above range, the developing property of the self-luminous photosensitive resin composition containing the quantum dot dispersion material may be slightly deteriorated. Therefore, the content of the dispersant is preferably contained within the above range.

本發明的一個實施例係有關於包含量子點分散材料(A)、鹼溶性樹脂(B)、可光聚合化合物(C)和光聚合反應起始劑(D)的自發光型光敏樹脂組合物。 One embodiment of the present invention relates to a self-illuminating photosensitive resin composition comprising a quantum dot dispersion material (A), an alkali-soluble resin (B), a photopolymerizable compound (C) and a photopolymerization initiator (D).

量子點分散材料(A) Quantum dot dispersed material (A)

在本發明的一個實施例中，是使用上述量子點分散材料作為量子點分散材料(A)。 In one embodiment of the present invention, the above-mentioned quantum dot dispersed material is used as the quantum dot dispersed material (A).

相對於自發光型光敏樹脂組合物的總重量的100重量百分比，量子點分散材料的含量可以介於3重量百分比至80重量百分比之間。較佳介於5重量百分比至70重量百分比之間，更佳係介於10重量百分比至60重量百分比之間。當量子點分散材料的含量包含在上述範圍內時，可以製作出具有優異發光特性的彩色濾光片。當量子點分散材料的含量小於上述範圍時，彩色濾光片的發光性能可能會稍微變差。當量子點分散材料的含量超過上述範圍時，由於其他組成分的含量相對減少，圖案的形成可能較困難，且製程可靠性也可能降低。因此，較佳還是要包含位於上述含量範圍之內的量子點分散材料。 Relative to 100% by weight of the total weight of the self-illuminating photosensitive resin composition, the content of the quantum dot dispersion material may be between 3% by weight and 80% by weight. It is preferably between 5% by weight and 70% by weight, more preferably between 10% by weight and 60% by weight. When the content of the quantum dot dispersion material is included in the above range, a color filter with excellent luminescent properties can be produced. When the content of the quantum dot dispersion material is less than the above range, the luminous performance of the color filter may be slightly deteriorated. When the content of the quantum dot dispersion material exceeds the above range, due to the relative reduction of the content of other components, the formation of the pattern may be difficult, and the reliability of the process may also be reduced. Therefore, it is preferable to include the quantum dot dispersion material within the above content range.

鹼溶性樹脂(B) Alkali-soluble resin (B)

在本發明的一個實施例中，鹼溶性樹脂(B)可允許使用自發光型光敏樹脂組合物所製造的彩色濾光片未曝光的部分能夠被鹼溶解，進而能夠將其去除，並且具有保留已曝光部分的功能。此外，當自發光型光敏樹脂組合物包含鹼溶性樹脂時，量 子點可以均勻地分散在組合物中。且在製程期間，鹼溶性樹脂可以藉由保護量子點，而具有維持亮度的作用。 In one embodiment of the present invention, the alkali-soluble resin (B) can allow the unexposed part of the color filter manufactured by using the self-illuminating photosensitive resin composition to be dissolved by alkali, and then it can be removed, and has a retention The function of the exposed part. In addition, when the self-luminous photosensitive resin composition contains an alkali-soluble resin, the amount Subdots can be evenly dispersed in the composition. And during the process, the alkali-soluble resin can maintain the brightness by protecting the quantum dots.

鹼溶性樹脂，可以選擇使用酸價(acid value)介於10KOH毫克/克(mg/g)至200KOH mg/g的樹脂。其中「酸價」是指中和1克聚合物所需氫氧化鉀(KOH)之用量(毫克)的檢測值，其中需考慮其溶解度。當鹼溶性樹脂的酸價低於上述範圍時，可能較難確保充分的顯影速度。而當鹼溶性樹脂的酸價超過上述範圍時，可能會出現以下問題：由於對基板的附著力降低，較容易發生圖案短路(short circuit)的狀況，並且整個組合物的儲存穩定也會性降低，進而造成粘度增加。 Alkali-soluble resins can be selected to use resins with an acid value between 10KOH mg/g (mg/g) and 200KOH mg/g. Wherein, "acid value" refers to the detection value of the amount (mg) of potassium hydroxide (KOH) required to neutralize 1 gram of polymer, and its solubility needs to be considered. When the acid value of the alkali-soluble resin is lower than the above range, it may be difficult to secure a sufficient developing speed. And when the acid value of the alkali-soluble resin exceeds the above-mentioned range, the following problems may occur: due to the reduced adhesion to the substrate, the pattern short circuit (short circuit) is more likely to occur, and the storage stability of the entire composition will also be permanently reduced. , resulting in an increase in viscosity.

另外，對於鹼溶性樹脂而言，為了提高將其作成彩色濾光片之後的表面硬度，可以考慮分子量和分子量分佈(Mw/Mn)的限制。藉由聚合、購買而被使用的鹼溶性樹脂較佳可以具有介於3,000至30,000之間的重均分子量(weight average molecular weight)，較佳的重均分子量則係介於5,000至20,000之間；以及具有介於1.5至6.0之間的分子量分佈，較佳的分子量分佈係介於1.8至4.0之間。具有分子量和分子量分佈在上述範圍內的鹼溶性樹脂，可以使彩色濾光片具有較佳的硬度，並使彩色濾光片未曝光的部分，在顯影液中有較高的溶解度以及較高的殘留膜厚度(residual film thickness)，藉以提高解析度(resolution)。 In addition, in order to increase the surface hardness of the alkali-soluble resin after it is made into a color filter, restrictions on molecular weight and molecular weight distribution (Mw/Mn) can be considered. The alkali-soluble resin used by polymerization and purchase preferably has a weight average molecular weight between 3,000 and 30,000, preferably between 5,000 and 20,000; and have a molecular weight distribution between 1.5 and 6.0, preferably between 1.8 and 4.0. The alkali-soluble resin with molecular weight and molecular weight distribution in the above range can make the color filter have better hardness, and make the unexposed part of the color filter have higher solubility and higher Residual film thickness (residual film thickness), in order to improve resolution (resolution).

鹼溶性樹脂可以是含有羧基的不飽和單體(carboxyl group-containing unsaturated monomers)的聚合物，也可以是含有羧基的不飽和單體以及具有可與其(含有羧基的不飽和單體)共聚之不飽和鍵(unsaturated bond)的單體二者的共聚物，或上述的任意組合。 The alkali-soluble resin can be a polymer of carboxyl group-containing unsaturated monomers (carboxyl group-containing unsaturated monomers), or it can be a carboxyl-containing unsaturated monomer and can be copolymerized with it (carboxyl group-containing unsaturated monomers). Copolymers of both monomers with unsaturated bonds, or any combination of the above.

含有羧基的不飽和單體可以是不飽和一元羧酸(unsaturated monocarboxylic acid)、不飽和二元羧酸(unsaturated dicarboxylic acid)、不飽和三元羧酸(unsaturated tricarboxylic acid)等。具體而言，不飽和一元羧酸可以包括：例如丙烯酸(acrylic acid)、甲基丙烯酸(methacrylic acid)、巴豆酸(crotonic acid)、α-氯丙烯酸(α-chloro-acrylic acid)、肉桂酸(cinnamic acid)等。不飽和二元羧酸可以包括：例如馬來酸(maleic acid)、延胡索酸(fumaric acid)、衣康酸(itaconic acid)、檸康酸(citraconic acid)、中康酸(mesaconic acid)等。不飽和二元羧酸可以是酸酐(acid anhydride)，具體可以包括馬來酸酐(maleic anhydride)、衣康酸酐(itaconic anhydride)、檸康酸酐(citraconic anhydride)等。此外，不飽和二元羧酸可以是(2-(甲基)丙烯酰氧基烷基)酯(mono(2-(meth)acryloyloxyalkyl)ester)類單體。例如，可以包括琥珀酸單(2-丙烯酰氧乙基)(succinic acid mono(2-acryloyloxyethyl))、琥珀酸單(2-甲基丙烯酰氧乙基)(succinic acid mono(2-methacryloyloxyethyl))、鄰苯二甲 酸單(2-丙烯酰氧乙基)(phthalic acid mono(2-acryloyloxyethyl))、鄰苯二甲酸單(2-甲基丙烯酰氧乙基)(phthalic acid mono(2-methacryloyloxyethyl))等。不飽和二元羧酸可以是其兩端具有二羧基聚合物的單(甲基)丙烯酸酯(mono(meth)acrylate)。例如，其可以包括ω-羧基聚己酸內酯單丙烯酸酯(ω-carboxypolycaprolactone monoacrylate)、ω-羧基聚己酸內酯單甲基丙烯酸酯(ω-carboxypolycaprolactone monomethacrylate)等。這些含有羧基的不飽和單體可以單獨使用1種，也可以組合2種以上來使用。 The carboxyl group-containing unsaturated monomer may be unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, or the like. Specifically, the unsaturated monocarboxylic acid may include, for example, acrylic acid, methacrylic acid, crotonic acid, α -chloro-acrylic acid, cinnamic acid ( cinnamic acid) etc. The unsaturated dicarboxylic acid may include, for example, maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid, and the like. The unsaturated dicarboxylic acid may be an acid anhydride, and may specifically include maleic anhydride, itaconic anhydride, citraconic anhydride, and the like. In addition, the unsaturated dicarboxylic acid may be a (2-(meth)acryloyloxyalkyl)ester (mono(2-(meth)acryloyloxyalkyl)ester) type monomer. For example, succinic acid mono(2-acryloyloxyethyl) can be included, succinic acid mono(2-methacryloyloxyethyl) (succinic acid mono(2-methacryloyloxyethyl) ), phthalic acid mono(2-acryloyloxyethyl) (phthalic acid mono(2-acryloyloxyethyl)), phthalic acid mono(2-methacryloyloxyethyl) (phthalic acid mono(2- methacryloyloxyethyl)) etc. The unsaturated dicarboxylic acid may be mono(meth)acrylate having a dicarboxy polymer at both ends thereof. For example, it may include ω -carboxypolycaprolactone monoacrylate, ω -carboxypolycaprolactone monomethacrylate, and the like. These carboxyl group-containing unsaturated monomers may be used alone or in combination of two or more.

此外，可與含羧基不飽和單體共聚的單體，可選自於由芳香族乙烯基化合物(aromatic vinyl compound)、不飽和羧酸酯化合物(unsaturated carboxylic acid ester compound)、不飽和羧酸氨基烷基酯化合物(unsaturated carboxylic acid aminoalkyl ester compound)、不飽和羧酸縮水甘油酯化合物(unsaturated carboxylic acid glycidyl ester compound)、羧酸乙烯酯化合物(carboxylic acid vinyl ester compound)、不飽和醚化合物(unsaturated ether compound)、乙烯基氰化化合物(vinyl cyanide compound)、不飽和酰胺化合物(unsaturated amide compound)、不飽和酰亞胺化合物(unsaturated imide compound)、脂肪族共軛二烯化合物(aliphatic conjugated diene compound)、分子鏈末端具有單丙烯酰基(monoacryloyl group) 或單甲基丙烯酰基(monomethacryloyl group)的大分子單體、大塊單體(bulk monomer)所組成之一族群及其任意組合。 In addition, monomers that can be copolymerized with carboxyl-containing unsaturated monomers can be selected from aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid amino Unsaturated carboxylic acid aminoalkyl ester compound, unsaturated carboxylic acid glycidyl ester compound, carboxylic acid vinyl ester compound, unsaturated ether compound compound), vinyl cyanide compound, unsaturated amide compound, unsaturated imide compound, aliphatic conjugated diene compound, The end of the molecular chain has a monoacryloyl group (monoacryloyl group) Or monomethacryloyl (monomethacryloyl group) macromonomer, a group of bulk monomer (bulk monomer) and any combination thereof.

更具體地說，與含羧基不飽和單體共聚的單體可包括芳族乙烯基化合物，例如：苯乙烯(styrene)、α-甲基苯乙烯(α-methylstyrene)、鄰乙烯基甲苯(o-vinyltoluene)、間乙烯基甲苯(m-vinyltoluene)、對乙烯基甲苯(p-vinyltoluene)、對氯苯乙烯(p-chlorostyrene)、鄰甲氧基苯乙烯(o-methoxystyrene)、間甲氧基苯乙烯(m-methoxystyrene)、對甲氧基苯乙烯(p-methoxystyrene)、鄰乙烯基芐基甲基醚(o-vinylbenzyl methyl ether)、間乙烯基芐基甲基醚(m-vinylbenzyl methyl ether)、對乙烯基芐基甲基醚(p-vinylbenzyl methyl ether)、鄰乙烯基芐基縮水甘油醚(o-vinylbenzyl glycidyl ether)、間乙烯基芐基縮水甘油醚(m-vinylbenzyl glycidyl ether)、對乙烯基芐基縮水甘油醚(p-vinylbenzyl glycidyl ether)、茚(indene)等；不飽和羧酸酯化合物，例如：丙烯酸甲酯(methyl acrylate)、甲基丙烯酸甲酯(methyl methacrylate)、丙烯酸乙酯(ethyl acrylate)、甲基丙烯酸乙酯(ethyl methacrylate)、丙烯酸正丙酯(n-propyl acrylate)、甲基丙烯酸正丙酯(n-propyl methacrylate)、丙烯酸異丙酯(i-propyl acrylate)、甲基丙烯酸異丙酯(i-propyl methacrylate)、丙烯酸正丁酯(n-butyl acrylate)、甲基丙烯酸正丁酯(n-butyl methacrylate)、丙烯酸異丁酯(i-butyl acrylate)、甲基丙烯酸異丁酯(i-butyl methacrylate)、丙烯酸仲丁酯(sec-butyl acrylate)、甲基丙烯酸仲丁酯(sec-butyl methacrylate)、丙烯酸叔丁酯(t-butyl acrylate)、甲基丙烯酸叔丁酯(t-butyl methacrylate)、丙烯酸2-羥乙酯(2-hydroxyethyl acrylate)、甲基丙烯酸2-羥乙酯(2-hydroxyethyl methacrylate)、丙烯酸2-羥丙酯(2-hydroxypropyl acrylate)、甲基丙烯酸2-羥丙酯(2-hydroxypropyl methacrylate)、丙烯酸3-羥丙酯(3-hydroxypropyl acrylate)、甲基丙烯酸3-羥丙酯(3-hydroxypropyl methacrylate)、丙烯酸2-羥丁酯(2-hydroxybutyl acrylate)、甲基丙烯酸2-羥丁酯(2-hydroxybutyl methacrylate)、丙烯酸3-羥丁酯(3-hydroxybutyl acrylate)、甲基丙烯酸3-羥丁酯(3-hydroxybutyl methacrylate)、丙烯酸4-羥丁酯(4-hydroxybutyl acrylate)、甲基丙烯酸4-羥丁酯(4-hydroxybutyl methacrylate)、丙烯酸烯丙酯(allyl acrylate)、甲基丙烯酸烯丙酯(allyl methacrylate)、丙烯酸芐酯(benzyl acrylate)、甲基丙烯酸芐酯(benzyl methacrylate)、環己基丙烯酸酯(cyclohexyl acrylate)、甲基丙烯酸環己酯(cyclohexyl methacrylate)、丙烯酸苯酯(phenyl acrylate)、甲基丙烯酸苯酯(phenyl methacrylate)、丙烯酸2-甲氧基乙酯(2-methoxyethyl acrylate)、甲基丙烯酸2-甲氧基乙酯(2-methoxyethyl methacrylate)、丙烯酸2-苯氧基乙酯 (2-phenoxyethyl acrylate)、甲基丙烯酸2-苯氧基乙酯(2-phenoxyethyl methacrylate)、甲氧基二甘醇丙烯酸酯(methoxy diethylene glycol acrylate)、甲氧基二甘醇甲基丙烯酸酯(methoxy diethylene glycol methacrylate)、甲氧基三甘醇丙烯酸酯(methoxy triethylene glycol acrylate)、甲氧基三甘醇甲基丙烯酸酯(methoxy triethylene glycol methacrylate)、甲氧基丙二醇丙烯酸酯(methoxy propylene glycol acrylate)、甲氧基丙二醇甲基丙烯酸酯(methoxy propylene glycol methacrylate)、甲氧基二丙二醇丙烯酸酯(methoxy dipropylene glycol acrylate)、甲氧基二丙二醇甲基丙烯酸酯(methoxy dipropylene glycol methacrylate)、丙烯酸異冰片酯(isobornyl acrylate)、甲基丙烯酸異冰片酯(isobornyl methacrylate)、丙烯酸二環戊二烯酯(dicyclopentadienyl acrylate)、甲基丙烯酸二環戊二烯酯(dicyclopentadienyl methacrylate)、(甲基)丙烯酸金剛烷酯(adamantyl(meth)acrylate)、(甲基)丙烯酸降冰片酯(norbornyl(meth)acrylate)、丙烯酸2-羥基-3-苯氧基丙酯(2-hydroxy-3-phenoxypropyl acrylate)、甲基丙烯酸2-羥基-3-苯氧基丙酯(2-hydroxy-3-phenoxypropyl methacrylate)、單丙烯酸甘油酯(glycerol monoacrylate)、單甲基丙烯酸甘油酯(glycerol monomethacrylate)等；不飽和羧酸氨基烷基酯化合物，例如：丙烯酸2-氨基乙酯(2-aminoethyl acrylate)、甲基丙烯酸2-氨基乙酯(2-aminoethyl methacrylate)、丙烯酸2-二甲基 氨基乙酯(2-dimethylaminoethyl acrylate)、甲基丙烯酸2-二甲基氨基乙酯(2-dimethylaminoethyl methacrylate)、丙烯酸2-氨基丙酯(2-aminopropyl acrylate)、甲基丙烯酸2-氨基丙酯(2-aminopropyl methacrylate)、丙烯酸2-二甲基氨基丙酯(2-dimethylaminopropyl acrylate)、甲基丙烯酸2-二甲基氨基丙酯(2-dimethylaminopropyl methacrylate)、丙烯酸3-氨基丙酯(3-aminopropyl acrylate)、甲基丙烯酸3-氨基丙酯(3-aminopropyl methacrylate)、丙烯酸3-二甲基氨基丙酯(3-dimethylaminopropyl acrylate)、甲基丙烯酸3-二甲基氨基丙酯(3-dimethylaminopropyl methacrylate)等。不飽和羧酸縮水甘油酯化合物，例如：丙烯酸縮水甘油酯(glycidyl acrylate)、甲基丙烯酸縮水甘油酯(glycidyl methacrylate)等；羧酸乙烯基酯化合物，例如：乙酸乙烯酯(vinyl acetate)、丙酸乙烯酯(vinyl propionate)、丁酸乙烯酯(vinyl butyrate)、苯甲酸乙烯酯(vinyl benzoate)等；不飽和醚化合物，例如：乙烯基甲基醚(vinyl methyl ether)、乙烯基乙基醚(vinyl ethyl ether)、烯丙基縮水甘油醚(allyl glycidyl ether)等。乙烯基氰化合物，例如：丙烯腈(acrylonitrile)、甲基丙烯腈(methacrylonitrile)、α-氯丙烯腈(α-chloroacrylonitrile)、亞乙烯基氰(vinylidene cyanide)等；不飽和酰胺化合物，例如：丙烯酰胺(acrylamide)、甲基丙烯酰胺(methacrylamide)、α-氯丙烯酰胺(α-chloroacrylamide)、N-2-羥乙基丙烯酰胺(N-2-hydroxyethyl acrylamide)、N-2-羥 乙基甲基丙烯酰胺(N-2-hydroxyethyl methacrylamide)等；不飽和酰亞胺化合物，例如：馬來酰亞胺(maleimide)、芐基馬來酰亞胺(benzyl maleimide)，N-苯基馬來酰亞胺(N-phenyl maleimide)、N-環己基馬來酰亞胺(N-cyclohexyl maleimide)等。脂肪族共軛二烯化合物，例如：1,3-丁二烯(1,3-butadiene)、異戊二烯(isoprene)、氯丁二烯(chloroprene)等。在聚合物的分子鏈末端具有單丙烯酰基或單甲基丙烯酰基的大分子單體，例如：聚苯乙烯(polystyrene)、聚丙烯酸甲酯(polymethyl acrylate)、聚甲基丙烯酸甲酯(polymethyl methacrylate)、聚丙烯酸正丁酯(poly-n-butyl acrylate)、聚甲基丙烯酸正丁酯(poly-n-butyl methacrylate)、聚矽氧烷(polysiloxane)、等；以及能夠降低非介電常數的大塊單體，例如：具有降冰片基骨架(norbornyl backbone)的單體、具有金剛烷骨架(adamantane backbone)的單體、具有松香骨架的單體(rosin backbone)等。 More specifically, monomers copolymerized with carboxyl-containing unsaturated monomers may include aromatic vinyl compounds such as styrene (styrene), α -methylstyrene (α-methylstyrene), o-vinyltoluene (o -vinyltoluene), m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxy Styrene (m-methoxystyrene), p-methoxystyrene (p-methoxystyrene), o-vinylbenzyl methyl ether (o-vinylbenzyl methyl ether), m-vinylbenzyl methyl ether (m-vinylbenzyl methyl ether ), p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, indene, etc.; unsaturated carboxylic acid ester compounds, such as: methyl acrylate, methyl methacrylate, acrylic acid Ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate ), isopropyl methacrylate (i-propyl methacrylate), n-butyl acrylate (n-butyl acrylate), n-butyl methacrylate (n-butyl methacrylate), isobutyl acrylate (i-butyl acrylate), I-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, methyl tert-butyl methacrylate (t-butyl methacrylate), 2-hydroxyethyl acrylate (2-hydroxyethyl acrylate), 2-hydroxyethyl methacrylate ( 2-hydroxyethyl methacrylate), 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, methacrylic acid 3-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate acrylate), 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl acrylate (allyl acrylate), allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate ( cyclohexyl methacrylate), phenyl acrylate (phenyl methacrylate), 2-methoxyethyl acrylate (2-methoxyethyl acrylate), 2-methoxyethyl methacrylate (2- methoxyethyl methacrylate), 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxy diethylene glycol acrylate , methoxy diethylene glycol methacrylate, methoxy triethylene glycol acrylate, methoxy triethylene glycol methacrylate, Methoxypropylene glycol acrylate (methoxy p ropylene glycol acrylate), methoxypropylene glycol methacrylate, methoxydipropylene glycol acrylate, methoxydipropylene glycol methacrylate, Isobornyl acrylate, isobornyl methacrylate, dicyclopentadienyl acrylate, dicyclopentadienyl methacrylate, (meth) Adamantyl(meth)acrylate, norbornyl(meth)acrylate, 2-hydroxy-3-phenoxypropyl acrylate , 2-hydroxy-3-phenoxypropyl methacrylate (2-hydroxy-3-phenoxypropyl methacrylate), glycerol monoacrylate, glycerol monomethacrylate, etc.; unsaturated carboxy Acid amino alkyl ester compounds, such as: 2-aminoethyl acrylate (2-aminoethyl acrylate), 2-aminoethyl methacrylate (2-aminoethyl methacrylate), 2-dimethylaminoethyl acrylate (2-dimethylaminoethyl acrylate), 2-dimethylaminoethyl methacrylate (2-dimethylaminoethyl methacrylate), 2-aminopropyl acrylate (2-aminopropyl acrylate), 2-aminopropyl methacrylate (2-aminopropyl methacrylate), acrylic acid 2-dimethylaminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-methacrylic acid -aminopropyl ester (3-aminopropyl methac rylate), 3-dimethylaminopropyl acrylate (3-dimethylaminopropyl acrylate), 3-dimethylaminopropyl methacrylate (3-dimethylaminopropyl methacrylate), etc. Unsaturated carboxylic acid glycidyl ester compounds, such as: glycidyl acrylate (glycidyl acrylate), glycidyl methacrylate (glycidyl methacrylate), etc.; carboxylic acid vinyl ester compounds, such as: vinyl acetate (vinyl acetate), acrylic acid Vinyl propionate, vinyl butyrate, vinyl benzoate, etc.; unsaturated ether compounds, such as vinyl methyl ether, vinyl ethyl ether (vinyl ethyl ether), allyl glycidyl ether (allyl glycidyl ether), etc. Vinyl cyanide compounds, such as acrylonitrile, methacrylonitrile, α -chloroacrylonitrile, vinylidene cyanide, etc.; unsaturated amide compounds, such as acrylic Acrylamide, methacrylamide, α -chloroacrylamide, N-2-hydroxyethyl acrylamide, N-2-hydroxyethyl acrylamide N-2-hydroxyethyl methacrylamide, etc.; unsaturated imide compounds, such as: maleimide (maleimide), benzyl maleimide (benzyl maleimide), N-phenylmaleimide N-phenyl maleimide, N-cyclohexyl maleimide, etc. Aliphatic conjugated diene compounds, for example: 1,3-butadiene (1,3-butadiene), isoprene (isoprene), chloroprene (chloroprene) and the like. Macromonomers with monoacryloyl or monomethacryloyl groups at the end of the molecular chain of the polymer, such as polystyrene, polymethyl acrylate, polymethyl methacrylate ), poly-n-butyl acrylate, poly-n-butyl methacrylate, polysiloxane, etc.; and those that can reduce the dielectric constant Bulk monomers, for example: monomers with a norbornyl backbone, monomers with an adamantane backbone, monomers with a rosin backbone, etc.

相對於自發光型光敏樹脂組合物固體成分總重量的100重量百分比，鹼溶性樹脂的含量，可以介於5重量百分比至80重量百分比之間，較佳是介於10重量百分比至70重量百分比之間，更佳是介於15重量百分比至60重量百分比之間。當鹼溶性樹脂的含量包含在上述範圍內時，由於其在顯影液中具有足夠的溶解性，因此有利於圖案的形成。並且在顯影期間可以抑制被曝光部分的像素部分的膜厚減少，進而改善非像素部分的滑動性(slipping-out property)。當鹼溶性樹脂的含量小於上述範圍時， 非像素部分可能會輕微滑出。當鹼溶性樹脂的含量超過上述範圍時，在顯影溶液中的溶解度可能會稍微減少，因此圖案的形成可能有點困難。 Relative to 100% by weight of the total weight of the solid content of the self-luminous photosensitive resin composition, the content of the alkali-soluble resin can be between 5% by weight and 80% by weight, preferably between 10% by weight and 70% by weight Between, more preferably between 15% by weight to 60% by weight. When the content of the alkali-soluble resin is included in the above-mentioned range, since it has sufficient solubility in the developer, it is favorable for pattern formation. And the decrease in film thickness of the pixel portion of the exposed portion can be suppressed during development, thereby improving the slipping-out property of the non-pixel portion. When the content of alkali-soluble resin is less than the above range, Non-pixel parts may slide out slightly. When the content of the alkali-soluble resin exceeds the above-mentioned range, the solubility in a developing solution may be slightly reduced, so pattern formation may be somewhat difficult.

可光聚合化合物(C) Photopolymerizable compound (C)

在本發明的一個實施例中，可光聚合化合物(C)是能夠在後述的照光和光聚合反應起始劑的作用下聚合的化合物，其可以是單官能基單體、雙官能基單體或其他多官能單體等。 In one embodiment of the present invention, the photopolymerizable compound (C) is a compound that can be polymerized under the action of light and photopolymerization initiators described later, and it can be a monofunctional monomer, a bifunctional monomer or Other multifunctional monomers, etc.

單官能基單體的種類並沒有特別限制，可以包括，例如：壬基苯基卡必醇丙烯酸酯(nonylphenylcarbitol acrylate)、丙烯酸2-羥基-3-苯氧基丙酯(2-hydroxy-3-phenoxypropyl acrylate)、丙烯酸2-乙基己基卡必醇酯(2-ethylhexylcarbitol acrylate)、丙烯酸2-羥基乙酯(2-hydroxyethyl acrylate)、N-乙烯基吡咯烷酮(N-vinylpyrrolidone)等。 The type of monofunctional monomer is not particularly limited, and may include, for example: nonylphenylcarbitol acrylate (nonylphenylcarbitol acrylate), acrylate 2-hydroxyl-3-phenoxypropyl (2-hydroxy-3- phenoxypropyl acrylate), 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, N-vinylpyrrolidone, etc.

雙官能基單體的種類並沒有特別限定，可以包括，例如：1,6-己二醇二(甲基)丙烯酸酯(1,6-hexanediol di(meth)acrylate)、乙二醇二(甲基)丙烯酸酯(ethylene glycol di(meth)acrylate)、新戊二醇二(甲基)丙烯酸酯(neopentyl glycol di(meth)acrylate)、三乙二醇二(甲基)丙烯酸酯(triethylene glycol di(meth)acrylate)、雙酚A(bisphenol A)的雙(丙烯酰氧基乙基)醚(bis(acryloyloxyethyl)ether)、二(甲 基)丙烯酸3-甲基戊二醇酯(3-methylpentanediol di(meth)acrylate)等。 The type of bifunctional monomer is not particularly limited, and may include, for example: 1,6-hexanediol di(meth)acrylate (1,6-hexanediol di(meth)acrylate), ethylene glycol di(meth)acrylate Base) acrylate (ethylene glycol di(meth)acrylate), neopentyl glycol di(meth)acrylate (neopentyl glycol di(meth)acrylate), triethylene glycol di(meth)acrylate (triethylene glycol di (meth)acrylate), bis(acryloyloxyethyl)ether of bisphenol A (bisphenol A), bis(acryloyloxyethyl)ether Base) 3-methylpentanediol di(meth)acrylate, etc.

其他多官能單體的種類並沒有特別限定，可以包括，例如：三羥甲基丙烷三(甲基)丙烯酸酯(trimethylolpropane tri(meth)acrylate)、乙氧基化三羥甲基丙烷三(甲基)丙烯酸酯(ethoxylated trimethylolpropane tri(meth)acrylate)、丙氧基化三羥甲基丙烷三(甲基)丙烯酸酯(propoxylated trimethylolpropane tri(meth)acrylate)、季戊四醇三(甲基)丙烯酸酯(pentaerythritol tri(meth)acrylate)、季戊四醇四(甲基)丙烯酸酯(pentaerythritol tetra(meth)acrylate)、二季戊四醇三(甲基)丙烯酸酯(dipentaerythriol tri(meth)acrylate)、二季戊四醇五(甲基)丙烯酸酯(dipentaerythriol penta(meth)acrylate)、乙氧基化二季戊四醇六(甲基)丙烯酸酯(ethoxylated dipentaerythritol hexa(meth)acrylate)、丙氧基化二季戊四醇六(甲基)丙烯酸酯(propoxylated dipentaerythritol hexa(meth)acrylate)、二季戊四醇六(甲基)丙烯酸酯(dipentaerythriol hexa(meth)acrylate)等。其中，較佳是選用雙官能基或更多官能基的單體。 The types of other polyfunctional monomers are not particularly limited, and may include, for example: trimethylolpropane tri(meth)acrylate (trimethylolpropane tri(meth)acrylate), ethoxylated trimethylolpropane tri(meth)acrylate ethoxylated trimethylolpropane tri(meth)acrylate, propoxylated trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate tri(meth)acrylate), pentaerythritol tetra(meth)acrylate, dipentaerythriol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate ester (dipentaerythriol penta(meth)acrylate), ethoxylated dipentaerythritol hexa(meth)acrylate, propoxylated dipentaerythritol hexa(meth)acrylate, propoxylated dipentaerythritol hexa(meth)acrylate (meth)acrylate), dipentaerythriol hexa(meth)acrylate (dipentaerythriol hexa(meth)acrylate), etc. Among them, it is preferable to select monomers with bifunctional or more functional groups.

相對於自發光型光敏樹脂組合物固體成分的總重量100重量百分比，可光聚合化合物的含量可以介於5重量百分比至70重量百分比之間，較佳是介於10重量百分比至60重量百分比之間，更佳是介於15重量百分比至50重量百分比之間。當可光聚 合化合物的含量包含在上述範圍內時，對像素部分的強度或光滑度而言，是具有益處的。當可光聚合化合物的含量小於上述範圍時，像素部分的強度可能會稍微降低。當可光聚合化合物的含量超過上述範圍時，像素部分的光滑度可能會降低。因此，較佳是包含上述含量範圍內的可光聚合化合物。 With respect to 100% by weight of the total weight of the solid content of the self-luminous photosensitive resin composition, the content of the photopolymerizable compound can be between 5% by weight and 70% by weight, preferably between 10% by weight and 60% by weight. Between, more preferably between 15% by weight to 50% by weight. when photopolymerizable When the content of the compound compound is included in the above range, it is beneficial to the strength or smoothness of the pixel portion. When the content of the photopolymerizable compound is less than the above range, the strength of the pixel portion may slightly decrease. When the content of the photopolymerizable compound exceeds the above range, the smoothness of the pixel portion may decrease. Therefore, it is preferable to include the photopolymerizable compound within the above content range.

光聚合反應起始劑(D) Photopolymerization Initiator (D)

在本發明的一個實施例中，光聚合反應起始劑(D)只要能夠使可光聚合化合物聚合即可，其種類並沒有特別限制。 In one embodiment of the present invention, the photopolymerization initiator (D) is not particularly limited as long as it can polymerize the photopolymerizable compound.

光聚合反應起始劑(D)，考慮到其聚合特性、起始效率、吸收波長、有效性和成本等因素，較佳係使用選自於苯乙酮系化合物(acetophenone-based compound)、二苯甲酮系化合物(benzophenone-based compound)、三嗪系化合物(triazine-based compound)、二咪唑系化合物(biimidazole-based compound)、肟基化合物(oxime-based compound)和噻噸酮基化合物(thioxanthone-based compound)所組成之一族群中的至少一者。 The photopolymerization initiator (D), considering factors such as its polymerization characteristics, initial efficiency, absorption wavelength, effectiveness and cost, is preferably selected from acetophenone-based compound (acetophenone-based compound), two Benzophenone-based compound, triazine-based compound, biimidazole-based compound, oxime-based compound and thioxanthone-based compound ( At least one member of a group consisting of thioxanthone-based compound).

苯乙酮系化合物的具體實施例包括：二乙氧基苯乙酮(diethoxyacetophenone)、2-羥基-2-甲基-1-苯基丙-1-酮(2-hydroxy-2-methyl-1-phenylpropan-1-one)、芐基二甲基縮酮(benzyl dimethyl ketal)、2-羥基-1-[4-(2-羥基乙氧基)苯基]-2-甲基丙-1-酮)(2-hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan -1-one)、1-羥基環己基苯基甲酮(1-hydroxycyclohexylphenylketone)、2-甲基-1-(4-甲硫基苯基)-2-嗎啉代丙-1-酮(2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one)、2-芐基-2-二甲基氨基-1-(4-嗎啉代苯基)丁-1-酮(2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one)、2-羥基-2-甲基-1-[4-(1-甲基乙烯基)苯基]丙-1-酮(2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1-one)、2-(4-甲基芐基)-2-(二甲基氨基)-1-(4-嗎啉代苯基)丁烷-1-酮(2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one)等。 Specific examples of acetophenone compounds include: diethoxyacetophenone (diethoxyacetophenone), 2-hydroxyl-2-methyl-1-phenylpropan-1-ketone (2-hydroxy-2-methyl-1 -phenylpropan-1-one), benzyl dimethyl ketal (benzyl dimethyl ketal), 2-hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1- Ketone) (2-hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan -1-one), 1-hydroxycyclohexylphenylketone (1-hydroxycyclohexylphenylketone), 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one (2 -methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one (2 -benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one), 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1- Ketone (2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1-one), 2-(4-methylbenzyl)-2-(dimethylamino)-1 -(4-morpholinophenyl)butan-1-one (2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one) and the like.

二苯甲酮系化合物的具體實施例包括：二苯甲酮(benzophenone)、鄰苯甲酰基苯甲酸甲酯(methylo-benzoylbenzoate)、4-苯基二苯甲酮(4-phenylbenzophenone)、4-苯甲酰基-4'-甲基二苯基硫醚(4-benzoyl-4'-methyldiphenylsulfide)、3,3'，4,4'-四(叔丁基過氧羰基)二苯甲酮(3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone)、2,4,6-三甲基二苯甲酮(2,4,6-trimethylbenzophenone)等。 Specific examples of benzophenone-based compounds include: benzophenone (benzophenone), methyl o-benzoylbenzoate (methylo-benzoylbenzoate), 4-phenylbenzophenone (4-phenylbenzophenone), 4- Benzoyl-4'-methyldiphenylsulfide (4-benzoyl-4'-methyldiphenylsulfide), 3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone (3 ,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone), 2,4,6-trimethylbenzophenone (2,4,6-trimethylbenzophenone), etc.

三嗪系化合物的具體例子包括：2,4-雙(三氯甲基)-6-(4-甲氧基苯基)-1,3,5-三嗪 (2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine)、2,4-雙(三氯甲基)-6-(4-甲氧基萘基)-1,3,5-三嗪(2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine)、2,4-雙(三氯甲基)-6-胡椒基-1,3,5-三嗪(2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine)、2,4-雙(三氯甲基)-6-(4-甲氧基苯乙烯基)-1,3,5-三嗪(2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine)、2,4-二(三氯甲基)-6-[2-(5-甲基呋喃-2-基)乙烯基]-1,3,5-三嗪(2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2-yl)ethenyl]-1,3,5-triazine)、2,4-雙(三氯甲基)-6-[2-(呋喃-2-乙烯基]-1,3,5-三嗪(2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine)、2,4-雙(三氯甲基)-6-[2-(4-二乙基氨基-2-甲基苯基)乙烯基]-1,3,5-三嗪(2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)ethenyl]-1,3,5-triazine)、2,4-雙(三氯甲基)-6-[2-(3,4-二甲氧基苯基)乙烯基]-1,3,5-三嗪(2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine)、等。 Specific examples of triazine compounds include: 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine (2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl) -1,3,5-triazine (2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine), 2,4-bis(trichloromethyl)-6- Piperonyl-1,3,5-triazine (2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-(4 -Methoxystyryl)-1,3,5-triazine (2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine), 2,4-bis( Trichloromethyl)-6-[2-(5-methylfuran-2-yl)vinyl]-1,3,5-triazine (2,4-bis(trichloromethyl)-6-[2-( 5-methylfuran-2-yl)ethenyl]-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-[2-(furan-2-vinyl]-1,3, 5-triazine (2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine), 2,4-bis(trichloromethyl)- 6-[2-(4-Diethylamino-2-methylphenyl)vinyl]-1,3,5-triazine (2,4-bis(trichloromethyl)-6-[2-(4- diethylamino-2-methylphenyl)ethenyl]-1,3,5-triazine), 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl] -1,3,5-triazine (2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine), etc.

二咪唑系化合物的具體實施例包括：2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑 (2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole)、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑(2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole)、2,2'-雙(2-氯苯基)-4,4',5,5'-四(烷氧基苯基)聯咪唑(2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole)、2,2'-雙(2-氯苯基)-4,4',5,5'四(三烷氧基苯基)聯咪唑(2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxyphenyl)biimidazole)、2,2-雙(2,6-二氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑(2,2-bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole)、二咪唑化合物，其中4,4',5,5'位置的苯基(phenyl group)被烷氧羰基(carboalkoxy group)取代，等。其中，較佳是使用2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑和2,2-雙(2,6-二氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑。 Specific examples of diimidazole compounds include: 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole), 2,2'-bis(2,3-dichlorophenyl)-4,4',5, 5'-tetraphenylbiimidazole (2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole), 2,2'-bis(2-chlorophenyl)- 4,4',5,5'-tetra(alkoxyphenyl)biimidazole (2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole), 2,2'-bis(2-chlorophenyl)-4,4',5,5'tetrakis(trialkoxyphenyl)biimidazole (2,2'-bis(2-chlorophenyl)-4,4 ',5,5'-tetra(trialkoxyphenyl)biimidazole), 2,2-bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-bis Imidazole (2,2-bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole), diimidazole compound, where the 4,4',5,5' position The phenyl group (phenyl group) is replaced by alkoxycarbonyl (carboalkoxy group), etc. Among them, it is preferable to use 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorobenzene base)-4,4',5,5'-tetraphenylbiimidazole and 2,2-bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1 ,2'-biimidazole.

肟基化合物的具體實施例包括：鄰乙氧羰基-α-氧亞氨基-1-苯基丙-1-酮(o-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one)等。市售產品通常包括Irgacure OXE 01和OXE 02(以上為商品名稱，其係由BASF公司所生產的產品)。 Specific examples of the oxime-based compound include o-ethoxycarbonyl- α -oxyimino-1-phenylpropan-1-one (o-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one) and the like. Commercially available products generally include Irgacure OXE 01 and OXE 02 (the above are trade names, which are products produced by BASF Corporation).

噻噸酮基化合物的具體實施例包括：2-異丙基噻噸酮(2-isopropylthioxanthone)、2,4-二乙基噻噸酮 (2,4-diethylthioxanthone)、2,4-二氯噻噸酮(2,4-dichlorothioxanthone)、1-氯-4-丙氧基噻噸酮(1-chloro-4-propoxythioxanthone)等。 Specific examples of thioxanthone-based compounds include: 2-isopropylthioxanthone (2-isopropylthioxanthone), 2,4-diethylthioxanthone (2,4-diethylthioxanthone), 2,4-dichlorothioxanthone (2,4-dichlorothioxanthone), 1-chloro-4-propoxythioxanthone (1-chloro-4-propoxythioxanthone), etc.

相對於自發光型光敏樹脂組合物固體成分總量的100重量百分比，光聚合反應起始劑的含量係介於0.1重量百分比至20重量百分比之間，較佳係介於0.5重量百分比至15重量百分比之間，更佳係介於1重量百分比至10重量百分比之間。當光聚合反應起始劑的含量包含在上述範圍內時，對於製程是有益的，因為自發光型光敏樹脂組合物高度敏化，且曝光時間可以縮短，因此產率可以提高，並且可以保持較高的解析度。另外一個優點是，使用本發明所提供的自發光型光敏樹脂組合物所形成的像素部分，其強度和表面的平滑度會變得更好。 Relative to 100% by weight of the total solid content of the self-luminous photosensitive resin composition, the content of the photopolymerization initiator is between 0.1% by weight and 20% by weight, preferably between 0.5% by weight and 15% by weight Percentage, more preferably between 1% by weight and 10% by weight. When the content of the photopolymerization initiator is included in the above range, it is beneficial to the process, because the self-luminous photosensitive resin composition is highly sensitized, and the exposure time can be shortened, so the yield can be improved and can be kept relatively low. high resolution. Another advantage is that the strength and surface smoothness of the pixel part formed by using the self-illuminating photosensitive resin composition provided by the present invention will become better.

光聚合反應起始劑可以進一步包含光聚合反應起始輔助劑(photopolymerization initiation adjuvant)，以提高本發明的自發光型光敏樹脂組合物的靈敏度。當含有光聚合反應起始輔助劑時，具有可進一步提升光聚合反應起始劑的靈敏度，並提高生產率的優點。 The photopolymerization initiator may further include a photopolymerization initiation adjuvant to improve the sensitivity of the self-luminous photosensitive resin composition of the present invention. When the photopolymerization reaction initiation auxiliary agent is contained, the sensitivity of the photopolymerization reaction initiation agent can be further improved and the productivity can be improved.

光聚合反應起始輔助劑較佳，例如可以是選自於胺化合物(amine compound)、羧酸化合物(carboxylic acid compound)和具有硫醇基(thiol group)的有機硫化合物(organic sulfur compound)所組成之一族群中的至少一種，但並不限於此。 The photopolymerization initiation auxiliary agent is preferred, for example, it can be selected from amine compound (amine compound), carboxylic acid compound (carboxylic acid compound) and organic sulfur compound (organic sulfur compound) with thiol group (thiol group). Consists of at least one of a group, but not limited to.

胺化合物的具體實施例包括：脂族胺化合物(aliphatic amine compound)，例如：三乙醇胺(triethanolamine)、甲基二乙醇胺(methyldiethanolamine)，三異丙醇胺(triisopropanolamine)等；芳香胺化合物，例如：4-二甲基氨基苯甲酸甲酯(methyl 4-dimethylaminobenzoate)、4-二甲基氨基苯甲酸乙酯(ethyl 4-dimethylaminobenzoate)、4-二甲基氨基苯甲酸異戊酯(isoamyl 4-dimethylaminobenzoate)、4-二甲基氨基苯甲酸2-乙基己酯(2-ethylhexyl 4-dimethylaminobenzoate)、苯甲酸2-二甲基氨基乙酯(2-dimethylaminoethyl benzoate)、N,N-二甲基對甲苯胺(N,N-dimethylparatoluidine)、4,4'-雙(二甲基氨基)二苯甲酮(通稱：米氏酮(Michler's ketone))、4,4'-雙(二乙基氨基)二苯甲酮(4,4'-bis(diethylamino)benzophenone)等。較佳係選擇使用芳香族胺化合物。 Specific examples of amine compounds include: aliphatic amine compounds, such as: triethanolamine (triethanolamine), methyldiethanolamine (methyldiethanolamine), triisopropanolamine (triisopropanolamine), etc.; aromatic amine compounds, such as: Methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate ), 2-ethylhexyl 4-dimethylaminobenzoate (2-ethylhexyl 4-dimethylaminobenzoate), 2-dimethylaminoethyl benzoate (2-dimethylaminoethyl benzoate), N,N-dimethyl p- Toluidine (N,N-dimethylparatoluidine), 4,4'-bis(dimethylamino)benzophenone (common name: Michler's ketone), 4,4'-bis(diethylamino) Benzophenone (4,4' - bis(diethylamino)benzophenone), etc. Preferably, aromatic amine compounds are used.

羧酸化合物較佳為芳族異質乙酸(aromaticheteroacetic acid)，其具體實例包括：苯基硫代乙酸(phenylthioacetic acid)、甲基苯基硫代乙酸(methylphenylthioacetic acid)、乙基苯基硫代乙酸(ethylphenylthioacetic acid)、甲基乙基苯基硫代乙酸(methylethylphenylthioacetic acid)、二甲基苯基硫代乙酸(dimethylphenylthioacetic acid)、甲氧基苯基硫代乙酸(methoxyphenylthioacetic acid)、二甲氧基苯基硫代乙酸 (dimethoxyphenylthioacetic acid)、氯代苯基硫代乙酸(chlorophenylthioacetic acid)、二氯代苯基硫代乙酸(dichlorophenylthioacetic acid)、N-苯基甘氨酸(N-phenylglycine)、苯氧基乙酸(phenoxyacetic acid)、萘基硫代乙酸(naphthylthioacetic acid)、N-萘基甘氨酸(N-naphthylglycine)、萘氧基乙酸(naphthoxy acetic acid)等。 The carboxylic acid compound is preferably aromatic heterogeneous acetic acid (aromaticheteroacetic acid), and its specific examples include: phenylthioacetic acid (phenylthioacetic acid), methylphenylthioacetic acid (methylphenylthioacetic acid), ethylphenylthioacetic acid ( ethylphenylthioacetic acid), methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenyl Thioacetic acid (dimethoxyphenylthioacetic acid), chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, Naphthylthioacetic acid, N-naphthylglycine, naphthoxy acetic acid, etc.

具有硫醇基的有機硫化合物的具體實施例，包括：2-巰基苯並噻唑(2-mercaptobenzothiazole)、1,4-雙(3-巰基丁酰氧基)丁烷(1,4-bis(3-mercaptobutyryloxy)butane)、1,3,5-三(3-巰基丁氧基乙基)-1,3,5-三嗪-2,4,6(1H,3H,5H)三酮(1,3,5-tris(3-mercaptobutyloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trion)、三羥甲基丙烷三(3-巰基丙酸酯)(trimethylolpropane tris(3-mercaptopropionate))、季戊四醇四(3-巰基丁酸酯)(pentaerythritol tetrakis(3-mercaptobutyrate))，季戊四醇四(3-巰基丙酸酯)(pentaerythritol tetrakis(3-mercaptopropionate))、二季戊四醇六(3-巰基丙酸酯)(dipentaerythritol hexakis(3-mercaptopropionate))、四甘醇雙(3-巰基丙酸酯)(tetraethylene glycol bis(3-mercaptopropionate))等。 Specific examples of organosulfur compounds with thiol groups include: 2-mercaptobenzothiazole (2-mercaptobenzothiazole), 1,4-bis(3-mercaptobutyryloxy)butane (1,4-bis( 3-mercaptobutyryloxy)butane), 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)trione (1 ,3,5-tris(3-mercaptobutyloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trion), trimethylolpropane tris(3-mercaptopropionate) (trimethylolpropane tris(3-mercaptopropionate)), pentaerythritol tetrakis(3-mercaptobutyrate)), pentaerythritol tetrakis(3-mercaptopropionate)), dipentaerythritol hexakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate) and the like.

光聚合反應起始輔助劑可以在不損害本發明所期望的效果範圍內適當添加。 The photopolymerization reaction start adjuvant can be added suitably within the range which does not impair the desired effect of this invention.

溶劑(E) Solvent (E)

在本發明的一個實施例中，自發光型光敏樹脂組合物可以進一步包含額外溶劑。 In one embodiment of the present invention, the self-luminous photosensitive resin composition may further include an additional solvent.

這種額外溶劑並沒有特別限制，其可以包括本領域常用的有機溶劑，且可以與本發明的量子點分散材料中所包含的溶劑相同或不同。 This additional solvent is not particularly limited, and it may include organic solvents commonly used in the art, and may be the same as or different from the solvent contained in the quantum dot dispersion material of the present invention.

額外溶劑的具體實施例包括：亞烷基二醇烷基醚(alkylene glycol alkyl ethers)，例如：乙二醇單甲醚(ethylene glycol monomethyl ether)、乙二醇單***(ethylene glycol monoethyl ether)、乙二醇單丙醚(ethylene glycol monopropyl ether)、乙二醇單丁醚(ethylene glycol monobutyl ether)、丙二醇單甲醚(propylene glycol monomethyl ether)、丙二醇甲***(propylene glycol methyl ethyl ether)等；二甘醇二烷基醚(diethylene glycol dialkyl ethers)，例如：二甘醇二甲醚(diethylene glycol dimethyl ether)、二甘醇二***(diethylene glycol diethyl ether)、二甘醇二丙醚(diethylene glycol dipropyl ether)、二甘醇二丁醚(diethylene glycol dibutyl ether)等；亞烷基二醇烷基醚乙酸酯(alkylene glycol alkylether acetates)，例如：甲基溶纖劑乙酸酯(methyl cellosolve acetate)、乙基溶纖劑乙酸酯(ethyl cellosolve acetate)、丙二醇單甲基醚乙酸酯(propylene glycol monomethylether acetate)、丙二醇單乙基醚乙酸酯(propylene glycol monoethylether acetate)、丙二醇單丙基醚乙酸酯(propylene glycol monopropylether acetate)等；乙酸烷氧基烷基酯 (alkoxyalkyl acetates)，例如：乙酸甲氧基丁酯(methoxybutyl acetate)、乙酸甲氧基戊酯(methoxypentyl acetate)等；芳香烴，例如：苯(benzene)、甲苯(toluene)、二甲苯(xylene)、均三甲苯(mesitylene)等；酮，例如：甲基乙基酮(methyl ethyl ketone)、丙酮(acetone)、甲基戊基酮(methyl amyl ketone)、甲基異丁基酮(methyl isobutyl ketone)、環己酮(cyclohexanone)等；醇，例如：乙醇(ethanol)、丙醇(propanol)、丁醇(butanol)、己醇(hexanol)、環己醇(cyclohexanol)、乙二醇(ethylene glycol)、甘油(glycerin)等；酯，例如：3-乙氧基丙酸乙酯(ethyl 3-ethoxypropionate)、3-甲氧基丙酸甲酯(methyl 3-methoxypropionate)等；環酯(cyclic esters)，例如：γ-丁內酯(γ-butyrolactone)等。 Specific examples of additional solvents include: alkylene glycol alkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, Ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol methyl ethyl ether, etc.; Diethylene glycol dialkyl ethers, such as: diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether ether), diethylene glycol dibutyl ether, etc.; alkylene glycol alkylether acetates, such as methyl cellosolve acetate , ethyl cellosolve acetate, propylene glycol monomethylether acetate, propylene glycol monoethylether acetate, propylene glycol monopropyl ether Acetate (propylene glycol monopropylether acetate), etc.; alkoxyalkyl acetates, such as: methoxybutyl acetate, methoxypentyl acetate, etc.; aromatic hydrocarbons , such as: benzene (benzene), toluene (toluene), xylene (xylene), mesitylene (mesitylene), etc.; ketones, such as: methyl ethyl ketone (methyl ethyl ketone), acetone (acetone), methylpentyl base ketone ( methyl amyl ketone), methyl isobutyl ketone, cyclohexanone, etc.; alcohols, such as ethanol, propanol, butanol, hexanol ), cyclohexanol, ethylene glycol, glycerin, etc.; esters, such as ethyl 3-ethoxypropionate, 3-methoxypropionate Methyl 3-methoxypropionate, etc.; cyclic esters, such as γ -butyrolactone, etc.

考慮到塗佈性能和乾燥性能，額外溶劑較佳可以為沸點介於100℃至200℃之間的有機溶劑。更佳可以使用亞烷基二醇烷基醚乙酸酯、酮、酯，例如：3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯等。再更佳，可使用：丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯等。這些額外溶劑可以單獨使用，或者兩種或更多種組合使用。 In consideration of coating performance and drying performance, the additional solvent may preferably be an organic solvent having a boiling point between 100°C and 200°C. More preferably, alkylene glycol alkyl ether acetates, ketones, and esters can be used, such as ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, and the like. Even more preferably, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, and the like can be used. These additional solvents may be used alone or in combination of two or more.

相對於自發光型光敏樹脂組合物的總重量的100重量百分比，包含在本發明的自發光型光敏樹脂組合物中的溶劑總含量(包括量子點分散材料中的溶劑和額外溶劑)，可以介於20重量百分比至90重量百分比之間，較佳介於25重量百分比至85重量百分比之間，更佳介於30重量百分比至80重量百分比之間。當溶劑總含量包含在上述範圍內，對製程是有利的，因為當採用輥塗 機(roll coater)、旋塗機(spin coater)、狹縫旋塗機(slit and spin coater)、狹縫塗佈機(slit coater)，又稱為模塗機(die coater)、噴墨印表機(ink jet)等塗佈裝置進行塗佈時，其塗佈特性(coating property)變得更好。當溶劑總含量小於上述範圍時，由於塗佈特性會稍微降低，而進行上述塗佈方法可能會有點困難。當溶劑總含量超過上述範圍時，藉由自發光型光敏樹脂組合物所形成的彩色濾光片的效能可能會劣化。 With respect to 100% by weight of the total weight of the self-luminous photosensitive resin composition, the total solvent content (including the solvent in the quantum dot dispersion material and the additional solvent) contained in the self-luminous photosensitive resin composition of the present invention can be Between 20% by weight and 90% by weight, preferably between 25% by weight and 85% by weight, more preferably between 30% by weight and 80% by weight. When the total solvent content is included in the above range, it is beneficial to the process, because when using roller coating Roll coater, spin coater, slit and spin coater, slit coater, also known as die coater, inkjet printing When coating is performed by a coating device such as an ink jet, the coating property becomes better. When the total solvent content is less than the above range, it may be somewhat difficult to perform the above-mentioned coating method because coating characteristics may be slightly lowered. When the total solvent content exceeds the above range, the performance of the color filter formed by the self-luminous photosensitive resin composition may be deteriorated.

添加劑(F) Additive (F)

本發明所提供的自發光型光敏樹脂組合物，可以進一步包含添加劑，例如增粘劑和表面活性劑，以促進塗佈性或黏著性。 The self-illuminating photosensitive resin composition provided by the present invention may further contain additives, such as tackifiers and surfactants, to improve coating or adhesion.

可以添加助粘劑以增加與基材的黏著性，較佳可以包括具有選自於由羧基、甲基丙烯酰基、異氰酸酯基、環氧基和環氧基及其任意組合組成的一族群中的至少一個反應性取代基的矽烷偶聯劑(silane coupling agent)，但不以此為限。例如，此矽烷偶聯劑可以包括：三甲氧基甲矽烷基苯甲酸(trimethoxysilyl benzoic acid)、γ-甲基丙烯酰氧基丙基三甲氧基矽烷(γ-methacryloxypropyltrimethoxysilane)、乙烯基三乙酰氧基矽烷(vinyltriacetoxysilane)、乙烯基三甲氧基矽烷(vinyltrimethoxysilane)、γ-異氰酸酯丙基三乙氧基矽烷(γ-isocyanatepropyltriethoxysilane)、γ-環氧丙氧基丙基三甲氧基矽烷(γ-glycidoxypropyltrimethoxysilane)、β-(3,4-環氧環己基)乙基三甲氧基矽烷(β-(3,4-epoxycyclohexyl) ethyltrimethoxysilane)等。這些助粘劑可以單獨使用或以兩種以上的組合使用。 Adhesion promoters can be added to increase the adhesion with the base material, preferably can include a compound having a compound selected from the group consisting of carboxyl, methacryloyl, isocyanate, epoxy and epoxy and any combination thereof. A silane coupling agent with at least one reactive substituent, but not limited thereto. For example, the silane coupling agent may include: trimethoxysilyl benzoic acid (trimethoxysilyl benzoic acid), γ -methacryloxypropyltrimethoxysilane (γ-methacryloxypropyltrimethoxysilane), vinyltriacetoxy Vinyltriacetoxysilane, vinyltrimethoxysilane, γ -isocyanatepropyltrimethoxysilane, γ -glycidoxypropyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane (β-(3,4-epoxycyclohexyl) ethyltrimethoxysilane), etc. These adhesion promoters may be used alone or in combination of two or more.

當本發明所提供的自發光型光敏樹脂組合物含有表面活性劑(surfactant)時，其具有可以提高塗佈特性的優點。表面活性劑，可以使用例如BM-1000、BM-1100(以上為BM Chemie公司所製造的商品名稱)；Fluorad FC-135/FC-170C/FC-430等氟系表面活性劑(以上為商品名，由SUMITOMO 3M股份有限公司製造)；SH-28PA/-190/SZ-6032(以上為商品名，是Toray Silicone公司的產品)等，但不以此為限。 When the self-illuminating photosensitive resin composition provided by the present invention contains a surfactant, it has the advantage of improving coating characteristics. Surfactant, can use for example BM-1000, BM-1100 (above is the trade name that BM Chemie company makes); , manufactured by SUMITOMO 3M Co., Ltd.); SH-28PA/-190/SZ-6032 (the above are trade names, products of Toray Silicone Co., Ltd.), etc., but not limited thereto.

另外，本發明所提供的自發光型光敏樹脂組合物，在不損害本發明的效果範圍內，還可以包含有抗氧化劑(antioxidant)、紫外線吸收劑(ultraviolet absorber)、防凝集劑(anti-agglomeration)等添加劑。本領域中具有通常知識者，可以在不損害本發明的期望效果範圍內，適當地添加和使用添加劑。例如，相對於自發光型光敏樹脂組合物總重量的100重量百分比，添加劑的用量相可以介於0.05重量百分比至10重量百分比之間，較佳是介於0.1重量百分比至10重量百分比之間，更佳是介於0.1重量百分比至5重量百分比之間，但不以此為限。 In addition, the self-luminous photosensitive resin composition provided by the present invention may also contain antioxidants, ultraviolet absorbers, anti-agglomeration agents within the scope of not damaging the effects of the present invention. ) and other additives. Those skilled in the art can appropriately add and use additives within the range not impairing the desired effect of the present invention. For example, relative to 100% by weight of the total weight of the self-luminous photosensitive resin composition, the amount of the additive can be between 0.05% by weight and 10% by weight, preferably between 0.1% by weight and 10% by weight, More preferably, it is between 0.1% by weight and 5% by weight, but not limited thereto.

本發明的一個實施例，是有關於使用上述自發光型光敏樹脂組合物所形成的彩色濾光片。 An embodiment of the present invention relates to a color filter formed by using the above-mentioned self-illuminating photosensitive resin composition.

由於本發明所提供的彩色濾光片，包括含有本發明的量子點分散材料的自發光型光敏樹脂組合物的固化產物，所以具有以下優點：量子點均勻分散，由此表現出優異的發光特性。 Since the color filter provided by the present invention includes the cured product of the self-illuminating photosensitive resin composition containing the quantum dot dispersion material of the present invention, it has the following advantages: the quantum dots are uniformly dispersed, thus exhibiting excellent luminous properties .

此彩色濾光片包括基材和形成在基材上方的圖案層。 The color filter includes a base material and a pattern layer formed on the base material.

基材可以是彩色濾光片本身的基材，或者可以是顯示元件上彩色濾光片所在位置的一部分，在此不特別加以限制。基材可以是玻璃、矽、氧化矽(SiOx)或聚合物基材。聚合物基材可以是聚醚碸(polyethersulfone，PES)或聚碳酸酯(polycarbonate，PC)等。 The base material may be the base material of the color filter itself, or may be a part where the color filter is located on the display element, which is not particularly limited here. The substrate can be glass, silicon, silicon oxide (SiOx), or a polymer substrate. The polymer substrate may be polyethersulfone (PES) or polycarbonate (polycarbonate, PC) or the like.

圖案層是包含本發明的自發光型光敏樹脂組合物的材質層，且可以是藉由塗佈自發光型光敏樹脂組合物，然後以預設模式進行曝光、顯影和加熱固化自發光型光敏樹脂組合物所形成的材質層。圖案層可以藉由實施本領域所習知的方法形成。 The pattern layer is a material layer comprising the self-luminous photosensitive resin composition of the present invention, and can be formed by coating the self-luminous photosensitive resin composition, and then exposing, developing and heating the self-luminous photosensitive resin in a preset mode The material layer that the composition forms. The pattern layer can be formed by implementing methods known in the art.

包括如上所述的基材和圖案層的彩色濾光片可以進一步包括形成在各個圖案之間的分隔物或黑色矩陣，但是並不以此為限。 The color filter including the base material and the pattern layer as described above may further include a spacer or a black matrix formed between respective patterns, but is not limited thereto.

此外，彩色濾光片可以進一步包括形成在彩色濾光片圖案層上方的保護膜。 In addition, the color filter may further include a protective film formed over the color filter pattern layer.

彩色濾光片可以包括選自於由紅色圖案層、綠色圖案層和藍色圖案層所組成的一族群中的至少一個。具體來說，彩色濾光片可以包括選自於由包含紅色量子點的紅色圖案層、包含綠色量子點的綠色圖案層和包含藍色量子點的藍色圖案層所組成的一族群中的至少一個。在光照射下，紅色圖案層、綠色圖案層和藍色圖案層分別發出紅光、綠光和藍光。在這種情況下，光源所發出的色光並沒有特別限制，但考慮到較佳的顏色再現性，可以使用發出藍光的光源。 The color filter may include at least one selected from a group consisting of a red pattern layer, a green pattern layer, and a blue pattern layer. Specifically, the color filter may include at least one. Under light irradiation, the red patterned layer, the green patterned layer and the blue patterned layer emit red light, green light and blue light respectively. In this case, the color light emitted by the light source is not particularly limited, but in consideration of better color reproducibility, a light source emitting blue light may be used.

彩色濾光片的圖案層可以僅包括紅色圖案層、綠色圖案層和藍色圖案層中的兩種顏色，但是並不以此為限。然而，當彩色濾光片僅包括兩種顏色的圖案層時，圖案層可以進一步包括一個不含量子點顆粒的透明圖案層。 The pattern layer of the color filter may only include two colors of the red pattern layer, the green pattern layer and the blue pattern layer, but it is not limited thereto. However, when the color filter only includes pattern layers of two colors, the pattern layer may further include a transparent pattern layer not containing quantum dot particles.

當彩色濾光片僅包括兩種顏色的圖案層時，可以使用可發出與這兩種顏色不同波長的其他顏色光源。例如，當彩色濾光片包括紅色圖案層和綠色圖案層時，可以使用發出藍色光的光源。在這種情況下，紅色量子點會發出紅光，而綠色量子點會發出綠光，透明圖案層則可以呈現藍色，如同穿過透明圖案層的藍色光線。 When the color filter includes only patterned layers of two colors, other color light sources that emit wavelengths different from the two colors may be used. For example, when the color filter includes a red pattern layer and a green pattern layer, a light source emitting blue light may be used. In this case, the red quantum dots emit red light, while the green quantum dots emit green light, and the transparent patterned layer can appear blue, like blue light passing through the transparent patterned layer.

本發明的一個實施例是有關於一種具有上述彩色濾光片的影像顯示元件。 An embodiment of the present invention relates to an image display element having the above-mentioned color filter.

本發明的彩色濾光片不僅適用於典型的液晶顯示元件，也適用於各種影像顯示元件，例如電致發光顯示元件、電漿顯示元件、場發射顯示元件等。 The color filter of the present invention is not only suitable for typical liquid crystal display elements, but also suitable for various image display elements, such as electroluminescence display elements, plasma display elements, field emission display elements and the like.

由於本發明的影像顯示元件具有使用包含量子點分散材料的自發光型光敏樹脂組合物的固化產物所製成的彩色濾光片，因此具有提供優異發光性能的效果。 Since the image display element of the present invention has a color filter made using a cured product of a self-luminous photosensitive resin composition containing a quantum dot dispersion material, it has the effect of providing excellent luminous performance.

在下文中，將通過實施例、比較例和實驗例更詳細地描述本發明。然而，這些實施例、比較例和實驗例的提出，僅是為了說明的目的，對於本領域技術人員來說，本發明的範圍並不受這些實施例的限制。 Hereinafter, the present invention will be described in more detail through Examples, Comparative Examples and Experimental Examples. However, these Examples, Comparative Examples, and Experimental Examples are presented for illustrative purposes only, and for those skilled in the art, the scope of the present invention is not limited by these Examples.

合成實施例1：磷化銦/硫化鋅(InP/ZnS)核-殼型量子點粒子的合成 Synthesis Example 1: Synthesis of indium phosphide/zinc sulfide (InP/ZnS) core-shell quantum dot particles <磷化銦核心量子點的製備> <Preparation of indium phosphide core quantum dots>

在反應器中加入0.4毫摩爾(mmol)(0.058克(g))的乙酸銦(indium acetate)、0.6毫摩爾(0.15克)的棕櫚酸(palmitic acid)和20毫升(mL)的1-十八碳烯(1-octadecene)，並在真空下加熱至120℃，1小時後，將反應器中的氣氛轉化為氮氣。再將混合物加熱至280℃後，迅速注入0.2毫摩爾(58微升(μl))三(三甲基甲矽烷基)膦(tris(trimethylsilyl)phosphine，TMS3P)和1.0毫升三辛基膦(trioctylphosphine)的混合溶液並反應20分鐘。將丙酮加入到反應溶液中，並迅速冷卻至室溫，再離心所得到的沉澱物分散到甲苯中。由此獲得的磷化銦半導體奈米結晶具有560奈米至590奈米的最大吸收波長。 Add 0.4 millimoles (mmol) (0.058 grams (g)) of indium acetate (indium acetate), 0.6 millimoles (0.15 grams) of palmitic acid (palmitic acid) and 20 milliliters (mL) of 1-deca octadecene (1-octadecene) and heated to 120° C. under vacuum. After 1 hour, the atmosphere in the reactor was changed to nitrogen. After the mixture was heated to 280°C, 0.2 mmol (58 microliters (μl)) of tris (trimethylsilyl) phosphine (TMS 3 P) and 1.0 ml of trioctyl phosphine were injected rapidly. (trioctylphosphine) mixed solution and reacted for 20 minutes. Acetone was added to the reaction solution, and rapidly cooled to room temperature, and the precipitate obtained by centrifugation was dispersed in toluene. The indium phosphide semiconductor nanocrystal thus obtained has a maximum absorption wavelength of 560 nm to 590 nm.

<磷化銦/硫化鋅核-殼量子點的製備> <Preparation of InP/ZnS Core-Shell Quantum Dots>

在反應器中加入2.4毫摩爾(0.448克)的乙酸鋅(zinc acetate)、4.8毫摩爾的油酸(oleic acid)和20毫升的三辛胺(trioctylamine)，並在真空下加熱至120℃，1小時後，將反應器中的氣氛轉化為氮氣，並將反應器溫度升高至280℃。加入2毫升先前合成的磷化銦核心溶液，然後加入4.8毫摩爾含硫的三辛基膦中(sulfur in trioctylphosphine，S/TOP)，並使最終混合物反應2小時。將乙醇加入到反應溶液中，並迅速冷卻至室溫，將藉由離 心所獲得的沉澱物在減壓下過濾，然後在減壓下乾燥以獲得磷化銦/硫化鋅核-殼量子點。 Add 2.4 millimoles (0.448 grams) of zinc acetate, 4.8 millimoles of oleic acid and 20 milliliters of trioctylamine (trioctylamine) in the reactor, and heat to 120 ° C under vacuum, After 1 hour, the atmosphere in the reactor was changed to nitrogen, and the reactor temperature was raised to 280°C. 2 ml of previously synthesized indium phosphide core solution was added, followed by 4.8 mmol of sulfur in trioctylphosphine (S/TOP), and the final mixture was allowed to react for 2 hours. Ethanol was added to the reaction solution, and rapidly cooled to room temperature, the The obtained precipitate was filtered under reduced pressure and then dried under reduced pressure to obtain indium phosphide/zinc sulfide core-shell quantum dots.

製備實施例1至14：量子點分散材料的製備 Preparation Examples 1 to 14: Preparation of Quantum Dot Dispersion Materials

藉由混合如下表1中所示的各個組成分來製備量子點分散材料(單位：重量百分比(wt%))。 The quantum dot dispersion material (unit: weight percent (wt %)) was prepared by mixing the respective components shown in Table 1 below.

Figure 107103484-A0305-02-0050-5
Figure 107103484-A0305-02-0050-5
Figure 107103484-A0305-02-0051-6
Figure 107103484-A0305-02-0051-6

A-1：合成例1中所得到的磷化銦/硫化鋅核-殼量子點 A-1: Indium phosphide/zinc sulfide core-shell quantum dots obtained in Synthesis Example 1

B-1：苯基-乙酸乙酯(20℃時的介電常數(ε)：5.11) B-1: Phenyl-ethyl acetate (dielectric constant (ε) at 20°C: 5.11)

B-2：3-苯基-丙酸乙酯(20℃時的介電常數(ε)：4.28) B-2: Ethyl 3-phenyl-propionate (dielectric constant (ε) at 20°C: 4.28)

B-3：環己基-乙酸乙酯(20℃時的介電常數(ε)：3.82) B-3: Cyclohexyl-ethyl acetate (dielectric constant (ε) at 20°C: 3.82)

B-4：環己基-乙酸烯丙基酯(20℃時的介電常數(ε)：3.16) B-4: Cyclohexyl-allyl acetate (dielectric constant (ε) at 20°C: 3.16)

B-5：丙酸苯乙酯(20℃時的介電常數(ε)：4.98) B-5: Phenylethyl propionate (dielectric constant (ε) at 20°C: 4.98)

B-6：乙酸環己基甲酯(20℃時的介電常數(ε)：4.06) B-6: Cyclohexylmethyl acetate (dielectric constant (ε) at 20°C: 4.06)

B-7：丁-3-烯酸環己基甲酯(20℃時的介電常數(ε)：3.48) B-7: But-3-enoic acid cyclohexylmethyl ester (dielectric constant (ε) at 20°C: 3.48)

B-8：丙二醇單甲醚(PGME)(20℃時的介電常數(ε)：12.3) B-8: Propylene glycol monomethyl ether (PGME) (dielectric constant (ε) at 20°C: 12.3)

C-1：DISPER BYK-111(由BYK Chemie公司製造，磷酸酯類分散劑) C-1: DISPER BYK-111 (manufactured by BYK Chemie, phosphate ester dispersant)

C-2：DISPER BYK-103(由BYK Chemie公司製造，磷酸酯類分散劑) C-2: DISPER BYK-103 (manufactured by BYK Chemie, phosphate ester dispersant)

C-3：DISPER BYK-161(由BYK Chemie公司製造，氨基甲酸酯系分散劑) C-3: DISPER BYK-161 (manufactured by BYK Chemie, urethane-based dispersant)

C-4：DISPER BYK-2001(由BYK Chemie公司製造，丙烯酸分散劑) C-4: DISPER BYK-2001 (manufactured by BYK Chemie, acrylic dispersant)

合成例2：鹼溶性樹脂的合成 Synthesis Example 2: Synthesis of Alkali-Soluble Resin

將120重量份的丙二醇單甲醚乙酸酯(propylene glycol monomethyl ether acetate)、80重量份的丙二醇單甲醚、2重量份的偶氮二異丁腈(azobisbutyronitrile，AIBN)、5.0重量份的丙烯酸、55.0重量份的4-甲基苯乙烯(4-methylstyrene)、20重量份的甲基丙烯酸芐酯、20重量份的甲基丙烯酸甲酯和3重量份的正十二烷基硫醇(n-dodecyl mercaptan)加入到裝有攪拌器、溫度計、回流冷凝器、滴管分注器(dropping lot)和氮氣輸入口的燒瓶中，然後用氮氣來置換燒瓶中的氣氛。然後，邊攪拌邊將反應溫度升至80℃，使混合物反應8小時。由此合成的鹼溶性樹脂的固體含量的酸價為17.4KOH毫克/克，通過GPC測得的重均分子量(Mw)約為17,370。 120 parts by weight of propylene glycol monomethyl ether acetate (propylene glycol monomethyl ether acetate), 80 parts by weight of propylene glycol monomethyl ether, 2 parts by weight of azobisisobutyronitrile (azobisbutyronitrile, AIBN), 5.0 parts by weight of acrylic acid , 55.0 parts by weight of 4-methylstyrene (4-methylstyrene), 20 parts by weight of benzyl methacrylate, 20 parts by weight of methyl methacrylate and 3 parts by weight of n-dodecyl mercaptan (n -dodecyl mercaptan) was added to a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping lot and a nitrogen inlet, and then the atmosphere in the flask was replaced with nitrogen. Then, the reaction temperature was raised to 80° C. with stirring, and the mixture was reacted for 8 hours. The solid content of the alkali-soluble resin thus synthesized had an acid value of 17.4 KOH mg/g, and a weight average molecular weight (Mw) measured by GPC was about 17,370.

實施例1至11和比較例1至3：自發射型光敏樹脂組合物的製備 Examples 1 to 11 and Comparative Examples 1 to 3: Preparation of self-emissive photosensitive resin composition

自發光型光敏樹脂組合物，係藉由混合如下表2所示的各種組成分所製備而成(單位：重量百分比)。 The self-illuminating photosensitive resin composition is prepared by mixing various components shown in Table 2 below (unit: weight percent).

Figure 107103484-A0305-02-0053-7
Figure 107103484-A0305-02-0053-7
Figure 107103484-A0305-02-0054-8
Figure 107103484-A0305-02-0054-8

A：由各製備例中所得到的量子點分散材料 A: Quantum dot dispersion materials obtained in each preparation example

B：合成例2中所得到的鹼可溶性樹脂 B: Alkali-soluble resin obtained in Synthesis Example 2

C：二季戊四醇六丙烯酸酯(Dipentaerythritol hexaacrylate)(KAYARAD DPHA；由NIPPON KAYAKU股份有限公司所製造) C: Dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by NIPPON KAYAKU Co., Ltd.)

D：Irgacure-907(由BASF公司所製造) D: Irgacure-907 (manufactured by BASF)

E：丙二醇單甲醚乙酸酯 E: Propylene glycol monomethyl ether acetate

實驗例1： Experimental example 1:

(1)分散材料的粒徑測量 (1) Particle size measurement of dispersed materials

使用ELSZ-2000ZS(由Otsuka Electronics股份有限公司所製造)來測量製備例中所製備的量子點分散材料以及在實施例和比較例中所製備的自發光型光敏樹脂組合物的粒徑尺寸。量測結果如表3所示。通常，量子點粒子聚集時，分散材料的粒徑會變大，進而發生發光特性降低的問題。 ELSZ-2000ZS (manufactured by Otsuka Electronics Co., Ltd.) was used to measure the particle size of the quantum dot dispersed materials prepared in Preparation Examples and the self-luminous photosensitive resin compositions prepared in Examples and Comparative Examples. The measurement results are shown in Table 3. Generally, when the quantum dot particles are aggregated, the particle size of the dispersion material becomes large, which leads to a problem that the emission characteristics are lowered.

(2)發光強度的測量 (2) Measurement of luminous intensity

使用實施例和比較例中所製備的自發光型光敏樹脂組合物來製備如下所述的彩色濾光片。並藉由以下述方法來測量其發光強度，量測結果顯示於表3之中。 Color filters described below were prepared using the self-illuminating photosensitive resin compositions prepared in Examples and Comparative Examples. And by measuring its luminous intensity with the following method, the measurement results are shown in Table 3.

<彩色濾光片的製作> <Production of color filters>

採用旋塗法，將各種發光型感光性樹脂組合物塗佈到玻璃基板上，然後放置在加熱板上，並在100℃的溫度下持續加熱3分鐘，以形成薄膜。隨後，將具有寬×長為20毫米(mm)×20毫米，線/隙寬度介於1微米(μm)至100微米之間的正方形透光圖案的測試光罩，放置在薄膜上，使薄膜與測試光罩距離為100微米，並且照射紫外線。 Various light-emitting photosensitive resin compositions were coated on a glass substrate by a spin coating method, then placed on a heating plate, and heated at a temperature of 100° C. for 3 minutes to form a thin film. Subsequently, a test mask with a square light-transmitting pattern with a width × length of 20 millimeters (mm) × 20 millimeters and a line/space width between 1 micrometer (μm) and 100 micrometers was placed on the film, so that the film The distance from the test mask is 100 microns, and ultraviolet rays are irradiated.

在本實施例中，係使用超高壓汞燈(商品名：USH-250D，由Ushio Denki KK公司所製造)在大氣條件下以200毫焦耳/平方公分(mJ/cm2)的曝光量(365奈米)照射紫外光，並未使用特殊光學濾光片。將被紫外線照射的薄膜浸入pH值為10.5的氫氧化鉀顯影水溶液中80秒，使其顯影。再使用蒸餾水清洗塗覆有薄膜的玻璃基板，然後藉由吹入氮氣來加以乾燥，並在150℃的加熱爐中加熱10分鐘以製備彩色濾光片的圖案。由上述方法所製備的自發光型彩色濾光片圖案的膜厚度為3.0微米(μm)。 In this embodiment, an ultra-high pressure mercury lamp (trade name: USH-250D, manufactured by Ushio Denki KK) was used under atmospheric conditions at an exposure amount of 200 millijoules/cm2 (mJ/cm 2 ) (365 Nano) irradiated with ultraviolet light without using special optical filters. The film irradiated with ultraviolet rays was immersed in an aqueous developing solution of potassium hydroxide having a pH of 10.5 for 80 seconds to be developed. The film-coated glass substrate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating furnace at 150° C. for 10 minutes to prepare a color filter pattern. The film thickness of the self-luminous color filter pattern prepared by the above method was 3.0 micrometers (μm).

<發光強度的測量> <Measurement of Luminous Intensity>

使用光譜儀(由Ocean Optics公司所製造)來測量彩色濾光片在波長範圍為550奈米的發光強度。其中，彩色濾光片 之中具有自發光的像素。量測結果可以看出，隨著測量的發光強度的增加，更能顯示出優異的發光性能。 A spectrometer (manufactured by Ocean Optics) was used to measure the luminous intensity of the color filter in the wavelength range of 550 nm. Among them, the color filter There are self-illuminating pixels in it. It can be seen from the measurement results that, with the increase of the measured luminous intensity, the excellent luminous performance can be displayed.

Figure 107103484-A0305-02-0056-9
Figure 107103484-A0305-02-0056-9

如表3所示，可以看出：包含有本發明所提供之特定溶劑和自發光型光敏樹脂組合物的製備例1-11中的量子點分散材料，其粒徑尺寸遠小於製作例12-14以及比較例1-3的自發光型光敏樹脂組合物中量子點分散材料的粒徑尺寸。另外，也可以看出：當與使用比較例1至3所提供的自發光型光敏樹脂所製備而成的彩色濾光片相比時，使用本發明的實施例1-11所提供的自發光 型光敏樹脂組合物所製備而成的彩色濾光片，可以顯示出更高的發光強度。 As shown in Table 3, it can be seen that the particle size of the quantum dot dispersion material in Preparation Examples 1-11 containing the specific solvent provided by the present invention and the self-luminous photosensitive resin composition is much smaller than that of Preparation Example 12- 14 and the particle size of the quantum dot dispersion material in the self-luminous photosensitive resin composition of Comparative Examples 1-3. In addition, it can also be seen that when compared with the color filters prepared using the self-luminous photosensitive resins provided in Comparative Examples 1 to 3, the self-luminous photosensitive resins provided in Examples 1-11 of the present invention The color filter prepared from the type photosensitive resin composition can show higher luminous intensity.

雖然本發明已以較佳實施例揭露如上，然其並非用以限定本發明，任何該技術領域中具有通常知識者，在不脫離本發明之精神和範圍內，當可作些許之更動與潤飾。 Although the present invention has been disclosed above with a preferred embodiment, it is not intended to limit the present invention. Anyone with ordinary knowledge in this technical field may make some changes and modifications without departing from the spirit and scope of the present invention. .

因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Therefore, the scope of protection of the present invention should be defined by the scope of the appended patent application.

Claims (8)

一種量子點分散材料，包括一量子點和一溶劑，其中該溶劑包含一化合物，該化合物由化學式1所表示：
Figure 107103484-A0305-02-0058-10
 該A是被選自於由複數種C1-C10烷基(alkyl group)和鹵素(halogen)所組成之一群取代基中的至少一個所取代或未被取代的一C3-C10環烷基或一C5-C10芳香基；該L是一C1-C6亞烷基(alkylene group)或不存在；以及該R為一C1-C10烷基或一C2-C10烯基(alkenyl group)。 A quantum dot dispersion material, including a quantum dot and a solvent, wherein the solvent contains a compound, the compound is represented by chemical formula 1:
Figure 107103484-A0305-02-0058-10
 The A is a C3-C10 cycloalkyl group or a C3-C10 cycloalkyl group substituted or unsubstituted by at least one of a group of substituents selected from a plurality of C1-C10 alkyl groups and halogens. C5-C10 aryl; the L is a C1-C6 alkylene group or absent; and the R is a C1-C10 alkyl or a C2-C10 alkenyl group. 如申請專利範圍第1項所述之量子點分散材料，其中：該A是被鹵素所取代或未被取代的一環戊基(cyclopentyl)、一環己基(cyclohexyl)、苯基(phenyl)或一環戊二烯基(cyclopentadienyl)；該L是一C1-C6亞烷基；以及該R是一C1-C10烷基或一C2-C10烯基。 Quantum dot dispersion material as described in item 1 of the scope of the patent application, wherein: the A is a cyclopentyl (cyclopentyl), a cyclohexyl (cyclohexyl), a phenyl (phenyl) or a cyclopentyl substituted or unsubstituted by a halogen Dienyl (cyclopentadienyl); the L is a C1-C6 alkylene; and the R is a C1-C10 alkyl or a C2-C10 alkenyl. 如申請專利範圍第1項所述之量子點分散材料，其中該化學式1所表示的該化合物是選自於下述複數個化合物所組成之一族群中的至少一種：苯基-乙酸乙酯(phenyl-acetic acid ethyl ester)、3-苯基-丙酸甲酯(3-phenyl-propionic acid methyl ester)、3-苯基-丙酸乙酯(3-phenyl-propionic acid ethyl ester)、4-苯基-丁酸乙酯(4-phenyl-butyric acid ethyl ester)、5-苯基-戊酸乙酯、(5-phenyl-pentanoic acid ethyl ester)、6-苯基-己酸乙酯(6-phenyl-hexanoic acid ethyl ester)、4-苯基-丁酸丙酯(4-phenyl-butyric acid propyl ester)、4-(4-氯-苯基)-丁酸乙酯(4-(4-chloro-phenyl)-butyric acid ethyl ester)、4-(3,4-二氯-苯基)-丁酸乙酯(4-(3,4-dichloro-phenyl)-butyric acid ethyl ester)、3-環戊-1,3-二烯基-丙酸甲酯(3-cyclopenta-1,3-dienyl-propionic acid methyl ester)、4-環戊-1,3-二烯基-丁酸乙酯(4-cyclopenta-1,3-dienyl-butyric acid ethyl ester)、5-環戊-1,3-二烯基-戊酸乙酯(5-cyclopenta-1,3-dienyl-pentanoic acid ethyl ester)、6-環戊-1,3-二烯基-己酸乙酯(6-cyclopenta-1,3-dienyl-hexanoic acid ethyl ester)、4-環戊-1,3-二烯基-丁酸丙酯(4-cyclopenta-1,3-dienyl-butyric acid propyl ester)、3-環戊基-丙酸甲酯(3-cyclopentyl-propionic acid methyl ester)、4-環戊基丁酸乙酯(4-cyclopentyl-butyric acid ethyl ester)、5-環戊基戊酸乙酯(5-cyclopentyl-pentanoic acid ethyl ester)、 6-環戊基-己酸乙酯(6-cyclopentyl-hexanoic acid ethyl ester)、4-環戊基丁酸丙酯(4-cyclopentyl-butyric acid propyl ester)、環己基-乙酸乙酯(cyclohexyl-acetic acid ethyl ester)、3-環己基-丙酸甲酯(3-cyclohexyl-propionic acid methyl ester)、4-環己基丁酸乙酯(4-cyclohexyl-butyric acid ethyl ester)、5-環己基-戊酸乙酯(5-cyclohexyl-pentanoic acid ethyl ester)、6-環己基-己酸乙酯(6-cyclohexyl-hexanoic acid ethyl ester)、4-環己基-丁酸丙酯(4-cyclohexyl-butyric acid propyl ester)以及環己基-乙酸烯丙基酯(cyclohexyl-acetic acid allyl ester)。 The quantum dot dispersion material as described in item 1 of the patent scope of the application, wherein the compound represented by the chemical formula 1 is at least one selected from a group consisting of the following plural compounds: phenyl-ethyl acetate ( phenyl-acetic acid ethyl ester), 3-phenyl-propionic acid methyl ester, 3-phenyl-propionic acid ethyl ester, 4- Phenyl-butyric acid ethyl ester (4-phenyl-butyric acid ethyl ester), 5-phenyl-pentanoic acid ethyl ester, (5-phenyl-pentanoic acid ethyl ester), 6-phenyl-hexanoic acid ethyl ester (6 -phenyl-hexanoic acid ethyl ester), 4-phenyl-butyric acid propyl ester (4-phenyl-butyric acid propyl ester), 4-(4-chloro-phenyl)-butyric acid ethyl ester (4-(4- chloro-phenyl)-butyric acid ethyl ester), 4-(3,4-dichloro-phenyl)-butyric acid ethyl ester (4-(3,4-dichloro-phenyl)-butyric acid ethyl ester), 3- Cyclopenta-1,3-dienyl-propionic acid methyl ester (3-cyclopenta-1,3-dienyl-propionic acid methyl ester), 4-cyclopenta-1,3-dienyl-propionic acid methyl ester ( 4-cyclopenta-1,3-dienyl-butyric acid ethyl ester), 5-cyclopenta-1,3-dienyl-pentanoic acid ethyl ester (5-cyclopenta-1,3-dienyl-pentanoic acid ethyl ester), 6-cyclopenta-1,3-dienyl-hexanoic acid ethyl ester (6-cyclopenta-1,3-dienyl-hexanoic acid ethyl ester), 4-cyclopenta-1,3-dienyl-butyric acid propane ester (4-cyclopenta-1,3-dienyl-butyric acid propyl ester), 3-cyclopentyl-propionic acid methyl ester (3-cyclopentyl-propionic acid methyl ester), 4-cyclopentyl-butyric acid ethyl ester (4 -cyclopentyl-butyric acid ethyl ester), 5-cyclopentyl-pentanoic acid ethyl ester (5-cyclopentyl-pentanoic ac id ethyl ester), 6-cyclopentyl-hexanoic acid ethyl ester (6-cyclopentyl-hexanoic acid ethyl ester), 4-cyclopentyl-butyric acid propyl ester (4-cyclopentyl-butyric acid propyl ester), cyclohexyl-acetic acid ethyl ester (cyclohexyl- acetic acid ethyl ester), 3-cyclohexyl-propionic acid methyl ester (3-cyclohexyl-propionic acid methyl ester), 4-cyclohexyl-butyric acid ethyl ester (4-cyclohexyl-butyric acid ethyl ester), 5-cyclohexyl- Ethyl valerate (5-cyclohexyl-pentanoic acid ethyl ester), 6-cyclohexyl-hexanoic acid ethyl ester (6-cyclohexyl-hexanoic acid ethyl ester), 4-cyclohexyl-butyric acid propyl ester (4-cyclohexyl-butyric acid propyl ester) and cyclohexyl-acetic acid allyl ester (cyclohexyl-acetic acid allyl ester). 如申請專利範圍第1項所述之量子點分散材料，其中該溶劑在20℃下具有小於12.0的一介電常數。 The quantum dot dispersion material as described in claim 1, wherein the solvent has a dielectric constant less than 12.0 at 20°C. 如申請專利範圍第1項所述之量子點分散材料，更包括一分散劑。 The quantum dot dispersion material as described in item 1 of the scope of the patent application further includes a dispersant. 一種自發光型光敏樹脂組合物，包括如申請專利範圍第1項至第5項其中之一者所述的該量子點分散材料、一鹼溶性樹脂(alkali-soluble resin)、一可光聚合化合物(photopolymerizable compound)以及一光聚合反應起始劑(photopolymerization initiator)。 A self-illuminating photosensitive resin composition, including the quantum dot dispersion material as described in one of the first to fifth items of the scope of application, an alkali-soluble resin (alkali-soluble resin), a photopolymerizable compound (photopolymerizable compound) and a photopolymerization initiator (photopolymerization initiator). 一種彩色濾光片，係使用如申請專利範圍第6項所述的該自發光型光敏樹脂組合物所形成。 A color filter is formed by using the self-illuminating photosensitive resin composition described in item 6 of the patent application. 一種影像顯示元件，包括如申請專利範圍第7項所述的該彩色濾光片。 An image display element, including the color filter described in item 7 of the patent application.
TW107103484A 2017-02-03 2018-01-31 Quantum dot dispersion, self-emission type photosensitive resin composition, color filter and image display device TWI786085B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
??10-2017-0015542 2017-02-03
KR10-2017-0015542 2017-02-03
KR1020170015542A KR102554285B1 (en) 2017-02-03 2017-02-03 Quantum Dot Dispersion, Self Emission Type Photosensitive Resin Composition, Color Filter and Display Device

Publications (2)

Publication Number Publication Date
TW201840823A TW201840823A (en) 2018-11-16
TWI786085B true TWI786085B (en) 2022-12-11

Family

ID=63040876

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107103484A TWI786085B (en) 2017-02-03 2018-01-31 Quantum dot dispersion, self-emission type photosensitive resin composition, color filter and image display device

Country Status (5)

Country Link
JP (1) JP7072579B2 (en)
KR (1) KR102554285B1 (en)
CN (1) CN110300791B (en)
TW (1) TWI786085B (en)
WO (1) WO2018143628A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102153965B1 (en) * 2019-02-28 2020-09-09 동우 화인켐 주식회사 Light Conversion Ink Composition, Color Filter and Display Device
JP2020166131A (en) * 2019-03-29 2020-10-08 山陽色素株式会社 Quantum dot dispersion and composition for coating film formation including quantum dot dispersion
EP3763801B1 (en) 2019-07-12 2022-05-04 Samsung Display Co., Ltd. Quantum dot-containing material, method of preparing the same, and optical member and appapratus including the quantum dot-containing material
KR102609622B1 (en) * 2019-10-14 2023-12-01 삼성에스디아이 주식회사 Quantum dot, curable composition comprising the same, cured layer using the composition and color filter including the cured layer
WO2022153443A1 (en) * 2021-01-14 2022-07-21 シャープ株式会社 Method for manufacturing quantum dot dispersion, quantum dot dispersion, and light-emitting device
JP2023152726A (en) * 2022-03-31 2023-10-17 住友化学株式会社 Composition, membrane and display device
JP2023152725A (en) * 2022-03-31 2023-10-17 住友化学株式会社 Composition, membrane and display device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008111985A (en) * 2006-10-30 2008-05-15 Sekisui Chem Co Ltd Spacer particle dispersion liquid and liquid crystal display device
JP2010009995A (en) * 2008-06-27 2010-01-14 Seiko Epson Corp Discharge liquid, discharge liquid set, thin film pattern forming method, thin film, light emitting element, image display device, and electronic equipment
JP2014077046A (en) * 2012-10-10 2014-05-01 Konica Minolta Inc Ink composition for forming light-emitting layer, method for preparing light-emitting device and electroluminescence device
TW201626104A (en) * 2014-11-21 2016-07-16 東友精細化工有限公司 Self-emission type photosensitive resin composition, color filter and image display device

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0915859A (en) * 1995-06-30 1997-01-17 Hitachi Chem Co Ltd Colored image forming photoensitive solution, manufacture of color filter using it, and color filter
KR100678285B1 (en) 2005-01-20 2007-02-02 삼성전자주식회사 Quantum Dot Phosphor for Light Emitting Diode and Method of Preparing Thereof
JP4959411B2 (en) 2007-04-27 2012-06-20 富士フイルム株式会社 Colored photopolymerizable composition, color filter using the same, and method for producing color filter
KR101193175B1 (en) * 2011-11-15 2012-10-19 삼성전자주식회사 Metal oxide paste composition and preparaton method of a semiconductor electrode using the same
US10358569B2 (en) 2013-03-15 2019-07-23 South Dakota Board Of Regents Systems and methods for printing patterns using near infrared upconverting inks
JP6171923B2 (en) 2013-12-24 2017-08-02 Jsr株式会社 Curable resin composition, cured film, light emitting element, wavelength conversion film, and method for forming light emitting layer
CN103728837B (en) * 2013-12-30 2016-08-31 京东方科技集团股份有限公司 Photosensitve resin composition and the method preparing quantum dot pattern with Photosensitve resin composition
KR102174819B1 (en) * 2014-06-25 2020-11-06 엘지디스플레이 주식회사 Display device
KR20170094166A (en) * 2014-12-15 2017-08-17 제이에스알 가부시끼가이샤 Organic el element, curable resin composition, method for forming wavelength conversion unit, and organic el device
KR101756522B1 (en) * 2015-03-16 2017-07-10 엘지전자 주식회사 Method for mamufactuing quantum dot-resin complex, quantum dot-resin complex, light conversion film, backlight unit and display device comprising the same
KR101878421B1 (en) * 2015-07-07 2018-07-13 동우 화인켐 주식회사 Quantum dot dispersion, self emission type photosensitive resin composition comprising the same, color filter and image display device manufactured using the same
CN105062218A (en) * 2015-08-21 2015-11-18 Tcl集团股份有限公司 Quantum dot printing ink for ink-jet printing and preparation method thereof
CN105907179A (en) * 2016-04-26 2016-08-31 Tcl集团股份有限公司 Quantum dot printing oil and preparation method thereof
KR102028968B1 (en) 2016-10-20 2019-10-07 동우 화인켐 주식회사 Quantum dot dispersion, self emission type photosensitive resin composition comprising the same, color filter and image display device produced using the same
KR102028969B1 (en) 2016-11-15 2019-10-07 동우 화인켐 주식회사 Quantum dot dispersion, self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
JP6856367B2 (en) 2016-11-30 2021-04-07 東京応化工業株式会社 A method for forming a photosensitive composition, a cured film, a light emitting layer for a light emitting display element, a light emitting display element, and a light emitting layer.
JP7152854B2 (en) * 2016-12-28 2022-10-13 東京応化工業株式会社 Silicon-containing resin composition, silicon-containing resin film, silica film, light-emitting display element panel, and light-emitting display device
CN106654068B (en) 2017-01-20 2018-10-02 京东方科技集团股份有限公司 A kind of production method and related device of organic electroluminescence device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008111985A (en) * 2006-10-30 2008-05-15 Sekisui Chem Co Ltd Spacer particle dispersion liquid and liquid crystal display device
JP2010009995A (en) * 2008-06-27 2010-01-14 Seiko Epson Corp Discharge liquid, discharge liquid set, thin film pattern forming method, thin film, light emitting element, image display device, and electronic equipment
JP2014077046A (en) * 2012-10-10 2014-05-01 Konica Minolta Inc Ink composition for forming light-emitting layer, method for preparing light-emitting device and electroluminescence device
TW201626104A (en) * 2014-11-21 2016-07-16 東友精細化工有限公司 Self-emission type photosensitive resin composition, color filter and image display device

Also Published As

Publication number Publication date
CN110300791A (en) 2019-10-01
KR102554285B1 (en) 2023-07-10
JP2020506428A (en) 2020-02-27
TW201840823A (en) 2018-11-16
JP7072579B2 (en) 2022-05-20
WO2018143628A1 (en) 2018-08-09
KR20180090554A (en) 2018-08-13
CN110300791B (en) 2023-03-31

Similar Documents

Publication Publication Date Title
TWI786085B (en) Quantum dot dispersion, self-emission type photosensitive resin composition, color filter and image display device
TWI753119B (en) Quantum dot having organic ligand and use thereof
KR102418601B1 (en) Self emission type photosensitive resin composition, color filter using thereof and image display device having the same
KR101878421B1 (en) Quantum dot dispersion, self emission type photosensitive resin composition comprising the same, color filter and image display device manufactured using the same
TWI688599B (en) Self-emission type photosensitive resin composition, color filter manufactured therefrom and image display device provided with the color filter
KR102092165B1 (en) Photosensitive resin composition
KR101996102B1 (en) Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
TWI652332B (en) Self-luminous photosensitive resin composition, and color filter and image display device using the same
KR20160028276A (en) Photosensitive resin composition
TWI770083B (en) Self-emissive photosensitive resin composition, color filter and image display device prepared using the same
KR102413603B1 (en) Color filter comprising dichroic mirror and image display device having the same
CN106569389B (en) Self-luminous photosensitive resin composition, color filter and display device including the same
TWI680352B (en) Self emission type photosensitive resin composition, and color filter comprising thereof and display device comprising of the same
KR20160103792A (en) Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
CN110291431B (en) Color filter and image display device
CN107880871B (en) Quantum dot dispersion, self-luminous photosensitive resin composition and use thereof
TWI789368B (en) Photosensitive resin composition, color filter and image display device
KR102521519B1 (en) Self emission type photosensitive resin composition, color filter and image display device produced using the same
TWI705297B (en) Self emission type photosensitive resin composition, color filter, and image display device produced using the same
TWI748961B (en) Self-light-emitting photosensitive resin composition, and color filter and display device comprising the same
KR20160107739A (en) Self emission type photosensitive resin composition, and color filter comprising thereof and display device comprising of the same
KR20170017544A (en) Self emission type photosensitive resin composition, color filter using thereof and image display device having the same