TWI710792B - 投影光學系統、曝光裝置及物品之製造方法 - Google Patents
投影光學系統、曝光裝置及物品之製造方法 Download PDFInfo
- Publication number
- TWI710792B TWI710792B TW107143822A TW107143822A TWI710792B TW I710792 B TWI710792 B TW I710792B TW 107143822 A TW107143822 A TW 107143822A TW 107143822 A TW107143822 A TW 107143822A TW I710792 B TWI710792 B TW I710792B
- Authority
- TW
- Taiwan
- Prior art keywords
- optical system
- lens
- projection optical
- mirror
- magnification
- Prior art date
Links
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B15/00—Optical objectives with means for varying the magnification
- G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0626—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018-012947 | 2018-01-29 | ||
JP2018012947A JP7005364B2 (ja) | 2018-01-29 | 2018-01-29 | 投影光学系、露光装置、物品の製造方法及び調整方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201932906A TW201932906A (zh) | 2019-08-16 |
TWI710792B true TWI710792B (zh) | 2020-11-21 |
Family
ID=67443757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107143822A TWI710792B (zh) | 2018-01-29 | 2018-12-06 | 投影光學系統、曝光裝置及物品之製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7005364B2 (ko) |
KR (1) | KR102372650B1 (ko) |
CN (1) | CN110095946B (ko) |
TW (1) | TWI710792B (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112859543B (zh) * | 2021-02-02 | 2021-12-14 | 北京理工大学 | 一种折反式深紫外光刻物镜***设计方法 |
WO2023081041A1 (en) * | 2021-11-02 | 2023-05-11 | Corning Incorporated | Magnification adjustable projection system using movable lens plates |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201118419A (en) * | 2009-10-06 | 2011-06-01 | Canon Kk | projection optical system, exposure apparatus and device fabrication method |
US9229205B2 (en) * | 2011-08-24 | 2016-01-05 | Canon Kabushiki Kaisha | Projection optical system, exposure apparatus, and method of manufacturing device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6411426B1 (en) | 2000-04-25 | 2002-06-25 | Asml, Us, Inc. | Apparatus, system, and method for active compensation of aberrations in an optical system |
JP3381257B2 (ja) | 2001-05-31 | 2003-02-24 | 株式会社ニコン | 投影露光方法 |
JP5118407B2 (ja) | 2007-07-31 | 2013-01-16 | キヤノン株式会社 | 光学系、露光装置及びデバイス製造方法 |
JP2011039172A (ja) * | 2009-08-07 | 2011-02-24 | Canon Inc | 露光装置およびデバイス製造方法 |
JP5595015B2 (ja) * | 2009-11-16 | 2014-09-24 | キヤノン株式会社 | 投影光学系、露光装置およびデバイス製造方法 |
US20120293861A1 (en) | 2011-05-18 | 2012-11-22 | Elbit Systems Of America, Llc | System and Method for Correcting Astigmatism Caused by an Aircraft Canopy |
JP6410406B2 (ja) | 2012-11-16 | 2018-10-24 | キヤノン株式会社 | 投影光学系、露光装置および物品の製造方法 |
JP6748482B2 (ja) * | 2016-05-25 | 2020-09-02 | キヤノン株式会社 | 露光装置、および、物品の製造方法 |
-
2018
- 2018-01-29 JP JP2018012947A patent/JP7005364B2/ja active Active
- 2018-12-06 TW TW107143822A patent/TWI710792B/zh active
-
2019
- 2019-01-21 KR KR1020190007383A patent/KR102372650B1/ko active IP Right Grant
- 2019-01-24 CN CN201910065482.1A patent/CN110095946B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201118419A (en) * | 2009-10-06 | 2011-06-01 | Canon Kk | projection optical system, exposure apparatus and device fabrication method |
US9229205B2 (en) * | 2011-08-24 | 2016-01-05 | Canon Kabushiki Kaisha | Projection optical system, exposure apparatus, and method of manufacturing device |
Also Published As
Publication number | Publication date |
---|---|
CN110095946B (zh) | 2022-03-25 |
KR102372650B1 (ko) | 2022-03-10 |
TW201932906A (zh) | 2019-08-16 |
JP7005364B2 (ja) | 2022-01-21 |
CN110095946A (zh) | 2019-08-06 |
KR20190092275A (ko) | 2019-08-07 |
JP2019132907A (ja) | 2019-08-08 |
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