TWI696641B - 樹脂、感光性樹脂組成物、樹脂硬化膜及圖像顯示裝置 - Google Patents

樹脂、感光性樹脂組成物、樹脂硬化膜及圖像顯示裝置 Download PDF

Info

Publication number
TWI696641B
TWI696641B TW107134890A TW107134890A TWI696641B TW I696641 B TWI696641 B TW I696641B TW 107134890 A TW107134890 A TW 107134890A TW 107134890 A TW107134890 A TW 107134890A TW I696641 B TWI696641 B TW I696641B
Authority
TW
Taiwan
Prior art keywords
group
acid
compound
resin
epoxy
Prior art date
Application number
TW107134890A
Other languages
English (en)
Chinese (zh)
Other versions
TW201927847A (zh
Inventor
柳正義
木下健宏
川口恭章
原司
倉本拓樹
青木優介
永井英理
Original Assignee
日商昭和電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商昭和電工股份有限公司 filed Critical 日商昭和電工股份有限公司
Publication of TW201927847A publication Critical patent/TW201927847A/zh
Application granted granted Critical
Publication of TWI696641B publication Critical patent/TWI696641B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/02—Acids; Metal salts or ammonium salts thereof, e.g. maleic acid or itaconic acid
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02—Polycondensates containing more than one epoxy group per molecule
    • C08G59/12—Polycondensates containing more than one epoxy group per molecule of polycarboxylic acids with epihalohydrins or precursors thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW107134890A 2017-10-10 2018-10-03 樹脂、感光性樹脂組成物、樹脂硬化膜及圖像顯示裝置 TWI696641B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-197128 2017-10-10
JP2017197128 2017-10-10

Publications (2)

Publication Number Publication Date
TW201927847A TW201927847A (zh) 2019-07-16
TWI696641B true TWI696641B (zh) 2020-06-21

Family

ID=66100566

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107134890A TWI696641B (zh) 2017-10-10 2018-10-03 樹脂、感光性樹脂組成物、樹脂硬化膜及圖像顯示裝置

Country Status (5)

Country Link
JP (1) JP7342705B2 (ko)
KR (1) KR102344248B1 (ko)
CN (1) CN111032720B (ko)
TW (1) TWI696641B (ko)
WO (1) WO2019073806A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102227606B1 (ko) * 2018-04-06 2021-03-12 주식회사 엘지화학 카도계 바인더 수지, 이를 포함하는 감광성 수지 조성물, 블랙 매트릭스, 컬러필터 및 디스플레이 장치
TW202204521A (zh) * 2020-07-29 2022-02-01 日商富士軟片股份有限公司 樹脂組成物、膜、濾光器、固體攝像元件及圖像顯示裝置
CN114773914A (zh) * 2022-05-18 2022-07-22 苏州世名科技股份有限公司 一种颜料分散液及其制备方法和应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1461318A (zh) * 2000-09-20 2003-12-10 太阳油墨制造株式会社 含有羧基的感光性树脂、含该树脂的可碱显影的光固化性·热固化性组合物及其固化物
JP2011144230A (ja) * 2010-01-13 2011-07-28 Japan U-Pica Co Ltd 多官能エポキシ（メタ）アクリレート化合物及び該化合物を含有する感光性熱硬化性樹脂組成物並びにその硬化物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000169553A (ja) * 1998-12-09 2000-06-20 Kyoeisha Chem Co Ltd 高耐熱性樹脂組成物
JP4131600B2 (ja) * 1999-08-09 2008-08-13 日本化薬株式会社 樹脂組成物及びその硬化物
JP2001091728A (ja) * 1999-09-27 2001-04-06 Toray Ind Inc カラーフィルター及び液晶表示装置
JP4269480B2 (ja) 2000-04-19 2009-05-27 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP4533591B2 (ja) * 2003-03-11 2010-09-01 太陽インキ製造株式会社 活性エネルギー線硬化性樹脂及びそれを用いる組成物及び硬化物
TWI349677B (en) * 2004-03-30 2011-10-01 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same
JP5690490B2 (ja) 2010-02-18 2015-03-25 東京応化工業株式会社 感光性組成物
JP2013134263A (ja) 2011-12-22 2013-07-08 Tokyo Ohka Kogyo Co Ltd ブラックカラムスペーサ用感光性樹脂組成物、ブラックカラムスペーサ、表示装置、及びブラックカラムスペーサの形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1461318A (zh) * 2000-09-20 2003-12-10 太阳油墨制造株式会社 含有羧基的感光性树脂、含该树脂的可碱显影的光固化性·热固化性组合物及其固化物
JP2011144230A (ja) * 2010-01-13 2011-07-28 Japan U-Pica Co Ltd 多官能エポキシ（メタ）アクリレート化合物及び該化合物を含有する感光性熱硬化性樹脂組成物並びにその硬化物

Also Published As

Publication number Publication date
CN111032720B (zh) 2022-06-28
JPWO2019073806A1 (ja) 2020-09-17
WO2019073806A1 (ja) 2019-04-18
TW201927847A (zh) 2019-07-16
KR102344248B1 (ko) 2021-12-27
CN111032720A (zh) 2020-04-17
JP7342705B2 (ja) 2023-09-12
KR20200032133A (ko) 2020-03-25

Similar Documents

Publication Publication Date Title
TWI418933B (zh) 著色感光性樹脂組合物、利用其所製造之彩色濾光片及液晶顯示裝置
JP7029267B2 (ja) 感光性樹脂組成物及び樹脂膜付き基板の製造方法
TWI696641B (zh) 樹脂、感光性樹脂組成物、樹脂硬化膜及圖像顯示裝置
KR20090097120A (ko) 발액성 수지 조성물
KR20120021752A (ko) 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR102146622B1 (ko) 블랙 칼럼 스페이서 형성용 감광성 수지 조성물, 블랙 칼럼 스페이서 및 화상 표시 장치
JP2008156613A (ja) アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物、硬化物及びカラーフィルター
JP2014005466A (ja) アルカリ可溶性樹脂、それを含む感光性樹脂組成物およびそれを用いたカラーフィルタ
KR20140104768A (ko) 착색 감광성 수지 조성물
TWI794313B (zh) 彩色濾光片用感光性樹脂組成物、彩色濾光片、影像顯示元件及彩色濾光片之製造方法
JP2011093970A (ja) 感光性樹脂
KR102594321B1 (ko) 감광성 수지 조성물 및 화상 표시 장치
KR20140100755A (ko) 알칼리 가용성 수지 및 이를 포함하는 감광성 수지 조성물
JP7510449B2 (ja) 感光性樹脂組成物及び樹脂膜付き基板の製造方法
JP2011099034A (ja) ポリカルボン酸樹脂及びポリカルボン酸樹脂組成物
TW202020559A (zh) 感光性樹脂組成物、黑柱間隔器及圖像顯示裝置
JP2021031625A (ja) チオール樹脂およびチオール樹脂を含有する感光性樹脂組成物
TW202009242A (zh) 黑柱間隔器形成用感光性樹脂組成物、黑柱間隔器及圖像顯示裝置
JP2022062515A (ja) フェノール性水酸基含有樹脂、感光性樹脂組成物、樹脂硬化膜、及び画像表示装置
TW202340861A (zh) 感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜、附有硬化膜的基板及附有硬化膜的基板的製造方法
KR20140101042A (ko) 알칼리 가용성 수지 및 이를 포함하는 감광성 수지 조성물
KR20130048510A (ko) 착색 감광성 수지 조성물
KR20140034956A (ko) 알칼리 가용성 고분자 화합물 및 이의 제조방법
KR20140033705A (ko) 알칼리 가용성 수지 및 이를 포함하는 착색 감광성 수지 조성물
KR20140087819A (ko) 감광성 수지 조성물, 이를 이용하여 제조된 액정 표시 소자용 스페이서 및 이를 포함하는 액정 표시 소자