TWI695037B - 著色組成物、彩色濾光器、圖案形成方法、彩色濾光器的製造方法、固態攝影元件、影像顯示裝置以及色素多聚體的製造方法 - Google Patents

著色組成物、彩色濾光器、圖案形成方法、彩色濾光器的製造方法、固態攝影元件、影像顯示裝置以及色素多聚體的製造方法 Download PDF

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Publication number
TWI695037B
TWI695037B TW104125154A TW104125154A TWI695037B TW I695037 B TWI695037 B TW I695037B TW 104125154 A TW104125154 A TW 104125154A TW 104125154 A TW104125154 A TW 104125154A TW I695037 B TWI695037 B TW I695037B
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TW
Taiwan
Prior art keywords
group
pigment
general formula
compound
coloring composition
Prior art date
Application number
TW104125154A
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English (en)
Chinese (zh)
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TW201607995A (zh
Inventor
原彰宏
伊藤純一
原田昌之
出井宏明
鮫島賢
金子祐士
尾田和也
Original Assignee
日商富士軟片股份有限公司
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Publication of TW201607995A publication Critical patent/TW201607995A/zh
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/28—Pyronines ; Xanthon, thioxanthon, selenoxanthan, telluroxanthon dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW104125154A 2014-08-29 2015-08-04 著色組成物、彩色濾光器、圖案形成方法、彩色濾光器的製造方法、固態攝影元件、影像顯示裝置以及色素多聚體的製造方法 TWI695037B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-176383 2014-08-29
JP2014176383 2014-08-29

Publications (2)

Publication Number Publication Date
TW201607995A TW201607995A (zh) 2016-03-01
TWI695037B true TWI695037B (zh) 2020-06-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW104125154A TWI695037B (zh) 2014-08-29 2015-08-04 著色組成物、彩色濾光器、圖案形成方法、彩色濾光器的製造方法、固態攝影元件、影像顯示裝置以及色素多聚體的製造方法

Country Status (5)

Country Link
JP (1) JP6279745B2 (ja)
KR (2) KR102027797B1 (ja)
CN (1) CN106661343B (ja)
TW (1) TWI695037B (ja)
WO (1) WO2016031442A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
JP6921208B2 (ja) * 2017-08-31 2021-08-18 富士フイルム株式会社 硬化性組成物、硬化物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置
KR102599290B1 (ko) * 2018-03-23 2023-11-07 도레이 카부시키가이샤 감광성 수지 조성물, 경화막, 색변환 기판, 화상 표시 장치, 및 경화막의 제조 방법
CN112739726B (zh) * 2018-09-26 2023-09-19 富士胶片株式会社 着色组合物、固化膜的形成方法、滤色器的制造方法及显示装置的制造方法
KR102325836B1 (ko) 2018-11-06 2021-11-11 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
JP7203627B2 (ja) * 2019-02-08 2023-01-13 住友化学株式会社 着色硬化性樹脂組成物

Citations (2)

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TW200848473A (en) * 2007-03-15 2008-12-16 Fujifilm Corp Pigment dispersant composition, photocurable composition, and color filter and method for manufacturing the same
TW201213304A (en) * 2010-07-23 2012-04-01 Fujifilm Corp Dye compound, method of producing dipyrromethene metal complex compound, method of producing dye multimer, substituted pyrrole compound, colored curable composition, color filter, method of producing color filter

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JP5171005B2 (ja) * 2006-03-17 2013-03-27 富士フイルム株式会社 高分子化合物およびその製造方法、並びに顔料分散剤
JP2008222843A (ja) * 2007-03-12 2008-09-25 Fujifilm Corp 高分子化合物及びその製造方法、水系用顔料分散剤、水系顔料分散組成物、並びに水性インク
JP5243072B2 (ja) * 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
JP2008280484A (ja) * 2007-05-14 2008-11-20 Fujifilm Corp 微小な顔料粒子の製造方法、および顔料分散組成物
JP5171218B2 (ja) * 2007-05-31 2013-03-27 富士フイルム株式会社 インク組成物、該インク組成物を用いた画像記録方法、及び該インク組成物を用いた印刷物
JP2009215453A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp インクジェット用インク組成物、並びに、それを用いたインクジェット記録方法及び印刷物
JP2010018739A (ja) * 2008-07-11 2010-01-28 Fujifilm Corp 顔料分散物、及び、それを用いたインク組成物
JP5791874B2 (ja) * 2010-03-31 2015-10-07 富士フイルム株式会社 着色組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置
JP5484173B2 (ja) * 2010-04-20 2014-05-07 富士フイルム株式会社 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置
JP2012158740A (ja) * 2010-07-23 2012-08-23 Fujifilm Corp 色素化合物、ジピロメテン金属錯体化合物の製造方法、色素多量体の製造方法、および置換ピロール化合物
JP5623934B2 (ja) * 2011-02-08 2014-11-12 富士フイルム株式会社 着色組成物、着色感放射線性組成物、色素多量体の製造方法、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200848473A (en) * 2007-03-15 2008-12-16 Fujifilm Corp Pigment dispersant composition, photocurable composition, and color filter and method for manufacturing the same
TW201213304A (en) * 2010-07-23 2012-04-01 Fujifilm Corp Dye compound, method of producing dipyrromethene metal complex compound, method of producing dye multimer, substituted pyrrole compound, colored curable composition, color filter, method of producing color filter

Also Published As

Publication number Publication date
JPWO2016031442A1 (ja) 2017-08-03
KR20190035929A (ko) 2019-04-03
TW201607995A (zh) 2016-03-01
KR102027797B1 (ko) 2019-10-02
KR20170016954A (ko) 2017-02-14
JP6279745B2 (ja) 2018-02-14
CN106661343A (zh) 2017-05-10
WO2016031442A1 (ja) 2016-03-03
CN106661343B (zh) 2019-07-30

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