KR102027797B1 - 착색 조성물, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 색소 다량체의 제조 방법 - Google Patents

착색 조성물, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 색소 다량체의 제조 방법 Download PDF

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KR102027797B1
KR102027797B1 KR1020197008353A KR20197008353A KR102027797B1 KR 102027797 B1 KR102027797 B1 KR 102027797B1 KR 1020197008353 A KR1020197008353 A KR 1020197008353A KR 20197008353 A KR20197008353 A KR 20197008353A KR 102027797 B1 KR102027797 B1 KR 102027797B1
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South Korea
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group
pigment
dye
preferable
coloring composition
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KR1020197008353A
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English (en)
Korean (ko)
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KR20190035929A (ko
Inventor
아키히로 하라
준이치 이토
마사유키 하라다
히로아키 이데이
스구루 사메지마
유시 카네코
카즈야 오오타
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후지필름 가부시키가이샤
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Publication of KR20190035929A publication Critical patent/KR20190035929A/ko
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/28—Pyronines ; Xanthon, thioxanthon, selenoxanthan, telluroxanthon dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020197008353A 2014-08-29 2015-07-23 착색 조성물, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 색소 다량체의 제조 방법 KR102027797B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-176383 2014-08-29
JP2014176383 2014-08-29
PCT/JP2015/070896 WO2016031442A1 (ja) 2014-08-29 2015-07-23 着色組成物、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、画像表示装置および色素多量体の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020177000656A Division KR20170016954A (ko) 2014-08-29 2015-07-23 착색 조성물, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 색소 다량체의 제조 방법

Publications (2)

Publication Number Publication Date
KR20190035929A KR20190035929A (ko) 2019-04-03
KR102027797B1 true KR102027797B1 (ko) 2019-10-02

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KR1020197008353A KR102027797B1 (ko) 2014-08-29 2015-07-23 착색 조성물, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 색소 다량체의 제조 방법
KR1020177000656A KR20170016954A (ko) 2014-08-29 2015-07-23 착색 조성물, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 색소 다량체의 제조 방법

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KR1020177000656A KR20170016954A (ko) 2014-08-29 2015-07-23 착색 조성물, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 색소 다량체의 제조 방법

Country Status (5)

Country Link
JP (1) JP6279745B2 (ja)
KR (2) KR102027797B1 (ja)
CN (1) CN106661343B (ja)
TW (1) TWI695037B (ja)
WO (1) WO2016031442A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
JP6921208B2 (ja) * 2017-08-31 2021-08-18 富士フイルム株式会社 硬化性組成物、硬化物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置
KR102599290B1 (ko) * 2018-03-23 2023-11-07 도레이 카부시키가이샤 감광성 수지 조성물, 경화막, 색변환 기판, 화상 표시 장치, 및 경화막의 제조 방법
CN112739726B (zh) * 2018-09-26 2023-09-19 富士胶片株式会社 着色组合物、固化膜的形成方法、滤色器的制造方法及显示装置的制造方法
KR102325836B1 (ko) 2018-11-06 2021-11-11 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
JP7203627B2 (ja) * 2019-02-08 2023-01-13 住友化学株式会社 着色硬化性樹脂組成物

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JP2010018739A (ja) 2008-07-11 2010-01-28 Fujifilm Corp 顔料分散物、及び、それを用いたインク組成物
JP2011213925A (ja) 2010-03-31 2011-10-27 Fujifilm Corp 着色組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置
JP2012158740A (ja) 2010-07-23 2012-08-23 Fujifilm Corp 色素化合物、ジピロメテン金属錯体化合物の製造方法、色素多量体の製造方法、および置換ピロール化合物
JP2012162677A (ja) * 2011-02-08 2012-08-30 Fujifilm Corp 着色組成物、着色感放射線性組成物、色素多量体の製造方法、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置

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JP5171005B2 (ja) * 2006-03-17 2013-03-27 富士フイルム株式会社 高分子化合物およびその製造方法、並びに顔料分散剤
JP2008222843A (ja) * 2007-03-12 2008-09-25 Fujifilm Corp 高分子化合物及びその製造方法、水系用顔料分散剤、水系顔料分散組成物、並びに水性インク
JP5553957B2 (ja) * 2007-03-15 2014-07-23 富士フイルム株式会社 顔料分散組成物、光硬化性組成物、並びに、カラーフィルタ及びその製造方法
JP5243072B2 (ja) * 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
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JP5171218B2 (ja) * 2007-05-31 2013-03-27 富士フイルム株式会社 インク組成物、該インク組成物を用いた画像記録方法、及び該インク組成物を用いた印刷物
JP2009215453A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp インクジェット用インク組成物、並びに、それを用いたインクジェット記録方法及び印刷物
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TWI526429B (zh) * 2010-07-23 2016-03-21 富士軟片股份有限公司 染料化合物、二吡咯亞甲基金屬錯合物的製造方法、染料多聚體的製造方法、經取代的吡咯化合物、彩色固化組成物、彩色濾光片、彩色濾光片的製造方法、固態影像感測器及液晶顯示元件

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Publication number Priority date Publication date Assignee Title
JP2010018739A (ja) 2008-07-11 2010-01-28 Fujifilm Corp 顔料分散物、及び、それを用いたインク組成物
JP2011213925A (ja) 2010-03-31 2011-10-27 Fujifilm Corp 着色組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置
JP2012158740A (ja) 2010-07-23 2012-08-23 Fujifilm Corp 色素化合物、ジピロメテン金属錯体化合物の製造方法、色素多量体の製造方法、および置換ピロール化合物
JP2012162677A (ja) * 2011-02-08 2012-08-30 Fujifilm Corp 着色組成物、着色感放射線性組成物、色素多量体の製造方法、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置

Also Published As

Publication number Publication date
JPWO2016031442A1 (ja) 2017-08-03
KR20190035929A (ko) 2019-04-03
TWI695037B (zh) 2020-06-01
TW201607995A (zh) 2016-03-01
KR20170016954A (ko) 2017-02-14
JP6279745B2 (ja) 2018-02-14
CN106661343A (zh) 2017-05-10
WO2016031442A1 (ja) 2016-03-03
CN106661343B (zh) 2019-07-30

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