CN106661343B - 着色组合物及其应用、以及色素多聚体的制造方法 - Google Patents

着色组合物及其应用、以及色素多聚体的制造方法 Download PDF

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Publication number
CN106661343B
CN106661343B CN201580037421.4A CN201580037421A CN106661343B CN 106661343 B CN106661343 B CN 106661343B CN 201580037421 A CN201580037421 A CN 201580037421A CN 106661343 B CN106661343 B CN 106661343B
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pigment
general formula
group
compound
coloured composition
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CN106661343A (zh
Inventor
原彰宏
伊藤纯一
原田昌之
出井宏明
鲛岛贤
金子祐士
尾田和也
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Fujifilm Corp
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Fujifilm Corp
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/28—Pyronines ; Xanthon, thioxanthon, selenoxanthan, telluroxanthon dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN201580037421.4A 2014-08-29 2015-07-23 着色组合物及其应用、以及色素多聚体的制造方法 Active CN106661343B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014-176383 2014-08-29
JP2014176383 2014-08-29
PCT/JP2015/070896 WO2016031442A1 (ja) 2014-08-29 2015-07-23 着色組成物、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、画像表示装置および色素多量体の製造方法

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CN106661343A CN106661343A (zh) 2017-05-10
CN106661343B true CN106661343B (zh) 2019-07-30

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JP (1) JP6279745B2 (ja)
KR (2) KR102027797B1 (ja)
CN (1) CN106661343B (ja)
TW (1) TWI695037B (ja)
WO (1) WO2016031442A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
JP6921208B2 (ja) * 2017-08-31 2021-08-18 富士フイルム株式会社 硬化性組成物、硬化物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置
KR102599290B1 (ko) * 2018-03-23 2023-11-07 도레이 카부시키가이샤 감광성 수지 조성물, 경화막, 색변환 기판, 화상 표시 장치, 및 경화막의 제조 방법
CN112739726B (zh) * 2018-09-26 2023-09-19 富士胶片株式会社 着色组合物、固化膜的形成方法、滤色器的制造方法及显示装置的制造方法
KR102325836B1 (ko) 2018-11-06 2021-11-11 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
JP7203627B2 (ja) * 2019-02-08 2023-01-13 住友化学株式会社 着色硬化性樹脂組成物

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CN101265368A (zh) * 2007-03-15 2008-09-17 富士胶片株式会社 颜料分散组合物、光固化性组合物、滤色片及其制造方法
EP1975211A1 (en) * 2007-03-30 2008-10-01 FUJIFILM Corporation Ink composition and image recording method and image recorded matter using same
JP2008280484A (ja) * 2007-05-14 2008-11-20 Fujifilm Corp 微小な顔料粒子の製造方法、および顔料分散組成物
JP2009007542A (ja) * 2007-05-31 2009-01-15 Fujifilm Corp インク組成物、該インク組成物を用いた画像記録方法、及び該インク組成物を用いた印刷物
CN101405310A (zh) * 2006-03-17 2009-04-08 富士胶片株式会社 高分子化合物和其制造方法、颜料分散剂、颜料分散组合物、光固化性组合物、滤色器和其制造方法
JP2009215453A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp インクジェット用インク組成物、並びに、それを用いたインクジェット記録方法及び印刷物
JP2010018739A (ja) * 2008-07-11 2010-01-28 Fujifilm Corp 顔料分散物、及び、それを用いたインク組成物
CN102236255A (zh) * 2010-04-20 2011-11-09 富士胶片株式会社 着色感光性树脂组合物、图案形成方法、滤色器及其制造方法、及显示装置
JP2012162677A (ja) * 2011-02-08 2012-08-30 Fujifilm Corp 着色組成物、着色感放射線性組成物、色素多量体の製造方法、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置
CN102803399A (zh) * 2010-03-31 2012-11-28 富士胶片株式会社 着色组成物、喷墨用墨水、彩色滤镜及其制造方法以及固态影像传感器与显示设备
CN103025831A (zh) * 2010-07-23 2013-04-03 富士胶片株式会社 染料化合物、二吡咯亚甲基金属错合物的制造方法、染料多聚体的制造方法、经取代的吡咯化合物、彩色固化组成物、彩色滤光片、彩色滤光片的制造方法、固态影像传感器及液晶显示元件

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JP2008222843A (ja) * 2007-03-12 2008-09-25 Fujifilm Corp 高分子化合物及びその製造方法、水系用顔料分散剤、水系顔料分散組成物、並びに水性インク
JP2012158740A (ja) * 2010-07-23 2012-08-23 Fujifilm Corp 色素化合物、ジピロメテン金属錯体化合物の製造方法、色素多量体の製造方法、および置換ピロール化合物

Patent Citations (11)

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Publication number Priority date Publication date Assignee Title
CN101405310A (zh) * 2006-03-17 2009-04-08 富士胶片株式会社 高分子化合物和其制造方法、颜料分散剂、颜料分散组合物、光固化性组合物、滤色器和其制造方法
CN101265368A (zh) * 2007-03-15 2008-09-17 富士胶片株式会社 颜料分散组合物、光固化性组合物、滤色片及其制造方法
EP1975211A1 (en) * 2007-03-30 2008-10-01 FUJIFILM Corporation Ink composition and image recording method and image recorded matter using same
JP2008280484A (ja) * 2007-05-14 2008-11-20 Fujifilm Corp 微小な顔料粒子の製造方法、および顔料分散組成物
JP2009007542A (ja) * 2007-05-31 2009-01-15 Fujifilm Corp インク組成物、該インク組成物を用いた画像記録方法、及び該インク組成物を用いた印刷物
JP2009215453A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp インクジェット用インク組成物、並びに、それを用いたインクジェット記録方法及び印刷物
JP2010018739A (ja) * 2008-07-11 2010-01-28 Fujifilm Corp 顔料分散物、及び、それを用いたインク組成物
CN102803399A (zh) * 2010-03-31 2012-11-28 富士胶片株式会社 着色组成物、喷墨用墨水、彩色滤镜及其制造方法以及固态影像传感器与显示设备
CN102236255A (zh) * 2010-04-20 2011-11-09 富士胶片株式会社 着色感光性树脂组合物、图案形成方法、滤色器及其制造方法、及显示装置
CN103025831A (zh) * 2010-07-23 2013-04-03 富士胶片株式会社 染料化合物、二吡咯亚甲基金属错合物的制造方法、染料多聚体的制造方法、经取代的吡咯化合物、彩色固化组成物、彩色滤光片、彩色滤光片的制造方法、固态影像传感器及液晶显示元件
JP2012162677A (ja) * 2011-02-08 2012-08-30 Fujifilm Corp 着色組成物、着色感放射線性組成物、色素多量体の製造方法、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置

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Publication number Publication date
JPWO2016031442A1 (ja) 2017-08-03
KR20190035929A (ko) 2019-04-03
TWI695037B (zh) 2020-06-01
TW201607995A (zh) 2016-03-01
KR102027797B1 (ko) 2019-10-02
KR20170016954A (ko) 2017-02-14
JP6279745B2 (ja) 2018-02-14
CN106661343A (zh) 2017-05-10
WO2016031442A1 (ja) 2016-03-03

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