TWI564431B - Serial plating system - Google Patents
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- TWI564431B TWI564431B TW101134938A TW101134938A TWI564431B TW I564431 B TWI564431 B TW I564431B TW 101134938 A TW101134938 A TW 101134938A TW 101134938 A TW101134938 A TW 101134938A TW I564431 B TWI564431 B TW I564431B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
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Description
本發明，係有關對於在電鍍槽內而被作連續搬送之工件進行供電並對工件作電鍍的連續電鍍裝置。 The present invention relates to a continuous plating apparatus for supplying power to a workpiece which is continuously conveyed in a plating tank and plating the workpiece.
在由本案申請人所致之專利文獻1中，係揭示著使用有共通陽極電極和分割陰極軌道之電流控制方法。此方法，係如同專利文獻1之圖1中所示一般，例如使5個單元，經由相對應之5個分割陰極軌道(陰極中繼構件)，來對於在電鍍槽單元內被作連續搬送之最大5個的工件，而以成為一定之電流密度(A/dm2)的方式而作供電。5個電源單元，在工件全面為與共通陽極電極相對向之全部浸漬狀態下，係藉由設定電流值而進行定電流控制。進而，最上游之電源單元，係根據被搬入至電鍍槽內之部分浸漬狀態的工件和共通陽極電極所相對向之電解面積，來對於電流進行漸增控制。最下游之電源單元，係根據被從電鍍槽單元內而搬出之部分浸漬狀態的工件和共通陽極電極所相對向之電解面積，來對於電流進行漸減控制。 In Patent Document 1 by the applicant of the present application, a current control method using a common anode electrode and a divided cathode track is disclosed. This method is generally as shown in FIG. 1 of Patent Document 1, for example, five units are continuously transported in the plating tank unit via the corresponding five divided cathode tracks (cathode relay members). A maximum of five workpieces are supplied with power at a constant current density (A/dm 2 ). The five power supply units perform constant current control by setting the current value when the workpiece is fully immersed in the entire direction opposite to the common anode electrode. Further, the most upstream power supply unit controls the current gradually according to the relative electrolysis area of the workpiece and the common anode electrode which are carried in the partially immersed state in the plating tank. The most downstream power supply unit controls the current gradually according to the relative electrolysis area of the workpiece and the common anode electrode which are partially immersed in the plating tank unit.
如此這般，係能夠對於每一工件，而以所設定之電流值來進行連續電鍍，並能夠以與所設定之電流密度相對應的膜厚，來在各工件處形成均一且高品質之電鍍皮膜。 In this way, continuous plating can be performed for each workpiece with the set current value, and a uniform and high-quality plating can be formed at each workpiece at a film thickness corresponding to the set current density. Membrane.
[先前技術文獻] [Previous Technical Literature]
[專利文獻] [Patent Literature]
[專利文獻1]日本特開2009-132999號公報 [Patent Document 1] JP-A-2009-132999
在專利文獻1中，係有必要與電鍍槽並列地而配置分割陰極軌道，連續電鍍槽裝置之橫寬幅係增大。起因於此，裝置之設置面積係增大。 In Patent Document 1, it is necessary to arrange a divided cathode track in parallel with the plating tank, and the width of the continuous plating tank device is increased. As a result, the installation area of the device is increased.
在專利文獻1中，係將以批次單位而搬送之全部的工件作為對象，在部分浸漬狀態下，係有必要對於電流值進行漸增或漸減控制，控制係變得複雜化。 In Patent Document 1, it is necessary to control all of the workpieces that are transported in batch units, and in the partially immersed state, it is necessary to gradually increase or decrease the current value, and the control system is complicated.
又，若是將在電鍍槽內而成為全部浸漬狀態之工件的數量設為N，則在電鍍槽內之上游側以及下游側處而成為部分浸漬狀態的情況之工件數，係成為(N+1)。故而，分割陰極軌道和電源單元之數量，係分別成為需要(N+1)個。 In addition, when the number of the workpieces in the immersion state in the plating tank is N, the number of workpieces in the partially immersed state on the upstream side and the downstream side in the plating tank is (N+1). ). Therefore, the number of divided cathode tracks and power supply units is required to be (N+1), respectively.
本發明之數個形態，係能夠提供一種：不需要使用複數之分割陰極軌道，便能夠以與設定電流值相對應之膜厚來在各工件上形成電鍍皮膜之連續電鍍裝置。 In some aspects of the present invention, it is possible to provide a continuous plating apparatus in which an electroplated film can be formed on each workpiece by using a plurality of divided cathode tracks without using a film thickness corresponding to a set current value.
本發明之其他數個形態，係能夠更進而提供使電源數作了減少的連續電鍍裝置。 According to still another aspect of the present invention, it is possible to further provide a continuous plating apparatus which reduces the number of power sources.
本發明之另外其他形態，係能夠提供一種：僅需要對於批次單位之最初和最後的工件而進行電流值之漸增或漸減控制即可，而並不需要進行將以批次單位所搬送之全部的工件作為對象的電流值之漸增或漸減控制之連續電鍍裝置。 According to still another aspect of the present invention, it is possible to provide only an incremental or decreasing control of the current value for the first and last workpieces of the batch unit, and it is not necessary to perform the transfer in batch units. The entire workpiece is used as a continuous plating device for increasing or decreasing the current value of the object.
本發明之另外其他形態，係能夠提供一種：就算是工件之尺寸有所變更，也並不需要對於陽極電極作變更，且亦不需要電流值之漸增或漸減控制的連續電鍍裝置。 According to still another aspect of the present invention, it is possible to provide a continuous plating apparatus which does not require a change in the anode electrode even if the size of the workpiece is changed, and which does not require an increase or decrease in the current value.
(1)本發明之其中一種形態，係有關於一種連續電鍍裝置，其特徵為，具備有：電鍍槽，係收容電鍍液，並對沿著搬送路徑而被作連續搬送之複數的工件同時進行電鍍；和共通陰極電極，係經由將前述複數之工件分別作保持的複數之搬送治具，而與前述複數之工件作電性連接；和複數之分割陽極電極，係在前述電鍍槽內而被與前述搬送路徑作對向配置；和複數之電源，係被與前述複數之分割陽極電極的各1個和前述共通陰極電極作連接，並對於被供給至前述複數之分割陽極電極處的電流分別獨立地作控制。 (1) One aspect of the present invention relates to a continuous plating apparatus characterized by comprising: a plating tank for accommodating a plating solution, and simultaneously performing a plurality of workpieces continuously transported along a transport path And a common cathode electrode electrically connected to the plurality of workpieces by a plurality of transporting jigs for holding the plurality of workpieces separately; and the plurality of divided anode electrodes are in the plating tank And the plurality of power sources are connected to each of the plurality of divided anode electrodes and the common cathode electrode, and are independent of currents supplied to the plurality of divided anode electrodes. Ground control.
若依據本發明之其中一種形態，則由於係與先前技術相異地而對於陽極電極作了分割，因此，被與工件作連接之分割陰極軌道係成為不必要，只要將工件經由搬送治具來與共通陰極電極作連接即可。故而，係能夠將連續電鍍裝置之橫寬幅縮窄。又，被與共通陰極電極作連接之複數的工件，由於相鄰之工件彼此係具有些許之空隙地而被作連續搬送，因此，不論是當1枚之工件與分割陽極電極相對向時、或者是2枚之工件與分割陽極電極相對向時，與1個的分割陽極電極相對向之工件的總電解面積均為略相 等。故而，在連續搬送中，係只要對於分割陽極電極進行定電流控制即可。 According to one aspect of the present invention, since the anode electrode is divided differently from the prior art, the divided cathode track system connected to the workpiece is unnecessary, and the workpiece is transported by the jig. A common cathode electrode can be connected. Therefore, it is possible to narrow the width of the continuous plating apparatus. Further, the plurality of workpieces connected to the common cathode electrode are continuously conveyed because the adjacent workpieces have a slight gap therebetween, and therefore, when one workpiece is opposed to the divided anode electrode, or When two workpieces are opposed to the divided anode electrode, the total electrolytic area of the workpiece opposite to the one divided anode electrode is slightly opposite. Wait. Therefore, in the continuous transfer, it is only necessary to perform constant current control on the divided anode electrodes.
(2)在本發明之其中一種形態中，係可設為下述之構成：亦即是，前述複數之分割陽極電極的各個，係包含有：與前述複數之工件的各別之第1面相對向之第1電極、和與前述複數之工件的各別之第2面相對向之第2電極。如此一來，係能夠對於工件之兩面進行電鍍。 (2) In one aspect of the invention, the configuration may be such that each of the plurality of divided anode electrodes includes a first surface of each of the plurality of workpieces The first electrode facing the first electrode and the second electrode facing the second surface of the plurality of workpieces. In this way, it is possible to perform electroplating on both sides of the workpiece.
(3)在本發明之其中一種形態中，係可設為下述之構成：亦即是，前述複數之電源的各個，係包含有：對前述第1電極通電之第1電源、和對前述第2電極通電之第2電源，前述第1電源以及前述第2電源，係分別相互獨立地而設定電流值。 (3) In one aspect of the present invention, the power supply of the plurality of power sources includes: a first power source that energizes the first electrode; The second power source that is energized by the second electrode sets the current value independently of the first power source and the second power source.
如此一來，當在工件之兩面處而電鍍對象面積為相異的情況時，係能夠在工件之兩面處而設定相異之電流值。 In this way, when the areas of the plating objects are different on both sides of the workpiece, the different current values can be set at both sides of the workpiece.
(4)在本發明之其中一種形態中，係可設為下述之構成：亦即是，當將前述工件之沿著前述搬送方向的長度設為L1，並將前述複數之陽極電極的各別之沿著前述搬送方向的長度設為L2時，係實質性滿足L1=L2。 (4) In one aspect of the present invention, the length of the workpiece along the transport direction is set to L1, and each of the plurality of anode electrodes is formed. When the length in the transport direction is set to L2, it is substantially satisfied that L1 = L2.
若是將在電鍍槽內而成為全部浸漬狀態之工件的數量設為N，則就算是當在電鍍槽內之上游側和下游側處而成為部分浸漬狀態的情況時被配置在電鍍槽內之工件總數成為(N+1)，分割陽極電極以及電源之數量亦分別只需要N個即可，相較於如同專利文獻1一般之需要(N+1)個電源者，係能夠將高價之電源的數量減少。亦即是，藉由實質 性滿足L1=L2，係能夠將電源之必要個數設為最小限度。 If the number of workpieces in the immersion state in the plating tank is N, the workpiece is placed in the plating tank even when it is partially immersed at the upstream side and the downstream side in the plating tank. The total number is (N+1), and the number of divided anode electrodes and the power source is only required to be N, respectively. Compared with the need of (N+1) power sources as in Patent Document 1, it is possible to supply a high-priced power source. amount reduced. That is, by substance Sex satisfies L1 = L2, and the number of necessary power supplies can be minimized.
(5)在本發明之其中一種形態中，係可設為下述之構成：亦即是，在前述電鍍槽中，係以批次(lot)單位來供給前述複數之工件，當同一批次之最初的工件與前述複數之分割陽極電極的各1個相對向時，係根據前述複數之分割陽極電極的各1個和前述最初之工件所相對向之電解面積，來對於前述複數之分割陽極電極的各1個，而使前述複數之電源中的相對應之各1個將電流值作漸增控制，當同一批次之最後的工件與前述複數之分割陽極電極的各1個相對向時，係根據前述複數之分割陽極電極的各1個和前述最後之工件所相對向之電解面積，來對於前述複數之分割陽極電極的各1個，而使前述複數之電源中的相對應之各1個將電流值作漸減控制。 (5) In one aspect of the invention, the configuration may be such that, in the plating tank, the plurality of workpieces are supplied in units of lot, when the same batch When the first workpiece is opposed to each of the plurality of divided anode electrodes, the plurality of divided anodes are formed according to the relative electrolysis area of each of the plurality of divided anode electrodes and the first workpiece. One of the electrodes, and one of the plurality of power sources is controlled to gradually increase the current value, and when the last workpiece of the same batch is opposed to each of the plurality of divided anode electrodes And corresponding to each of the plurality of divided anode electrodes, according to each of the plurality of divided anode electrodes and the opposing electrode of the last plurality of anode electrodes; One will control the current value gradually.
亦即是，係僅需要對於批次單位之最初和最後的工件而進行電流值之漸增或漸減控制即可，而成為並不需要進行將以批次單位所搬送之全部的工件作為對象的電流值之漸增或漸減控制。 In other words, it is only necessary to perform the gradual increase or decrease control of the current value for the first and last workpieces of the batch unit, and it is not necessary to perform all the workpieces transferred in the batch unit. The increasing or decreasing control of the current value.
(6)在本發明之其中一種形態中，係可設為下述之構成：亦即是，當將前述工件之沿著前述搬送方向的長度設為L1，並將前述複數之分割陽極電極的各別之沿著前述搬送方向的長度設為L2，且將n設為2以上(亦包含該值)之整數時，係滿足L2<L1/n。 (6) In one aspect of the present invention, the configuration may be such that the length of the workpiece along the transport direction is L1, and the plurality of divided anode electrodes are When the length of each of the transport directions is L2, and when n is an integer of 2 or more (including the value), L2 < L1/n is satisfied.
如此一來，由於係成為並不需要使分割陽極電極之長度與工件尺寸相配合，因此就算是工件尺寸有所變更，也 不需要對於分割陽極電極進行交換。 In this way, since the length of the divided anode electrode does not need to match the size of the workpiece, even if the workpiece size is changed, There is no need to exchange the divided anode electrodes.
(7)在本發明之其中一種形態中，係可設為下述之構成：亦即是，在前述電鍍槽中，係以批次單位來供給前述複數之工件，前述複數之電源的各個，係從前述批次單位之最初起直到最後為止，而對於前述複數之分割陽極電極的各個進行定電流控制。 (7) In one aspect of the present invention, the plating chamber may be configured to supply the plurality of workpieces in a batch unit, each of the plurality of power sources. The constant current control is performed for each of the plurality of divided anode electrodes from the beginning of the batch unit until the end.
當工件之長度L1和陽極電極之長度L2，為滿足L2<L1/n的情況時，由於各個的陽極電極所擔負之電解面積係變窄，因此，就算是當批次單位之最初或最後之工件通過的情況時，亦成為並不需要將電流值作漸增或漸減。 When the length L1 of the workpiece and the length L2 of the anode electrode satisfy the case of L2 < L1/n, since the electrolytic area of each anode electrode is narrowed, even if it is the first or last of the batch unit When the workpiece passes, it also does not need to increase or decrease the current value.
(8)在本發明之其中一種形態中，係可設為下述之構成：亦即是，前述電鍍槽，係在與前述複數之工件的各1個相對向之位置處，沿著前述搬送方向而設置有朝向前述工件噴射前述電鍍液的複數之噴嘴，前述複數之分割陽極電極中之至少各1個的分割陽極電極，係被配置在前述複數之噴嘴中的相鄰之各2個噴嘴之間。 (8) In one aspect of the present invention, the plating tank may be configured to move along the one of the plurality of workpieces at a position opposite to each of the plurality of workpieces. A plurality of nozzles for ejecting the plating solution toward the workpiece are provided in the direction, and at least one of the plurality of divided anode electrodes is disposed in each of the plurality of adjacent nozzles between.
當工件之長度L1和分割陽極電極之長度L2，為滿足L2<L1/n的情況時，分割陽極電極之長度L2，係能夠成為較2個噴嘴間之距離更短。故而，係能夠將複數之分割陽極電極中的至少各1個的分割陽極電極，配置在複數之噴嘴中的相鄰之各2個的噴嘴之間。藉由此，分割陽極電極和工件之間的距離係變短，中介存在於分割陽極電極和工件之間的電鍍液之電性阻抗係變小，而能夠將從分割陽極電極所供給至工件處之電流密度提高並使高速電鍍成為可 能。 When the length L1 of the workpiece and the length L2 of the divided anode electrode satisfy the case of L2 < L1/n, the length L2 of the divided anode electrode can be made shorter than the distance between the two nozzles. Therefore, at least one of the plurality of divided anode electrodes can be disposed between the adjacent two nozzles of the plurality of nozzles. Thereby, the distance between the divided anode electrode and the workpiece is shortened, and the electrical impedance of the plating solution existing between the divided anode electrode and the workpiece becomes small, and can be supplied from the divided anode electrode to the workpiece. Increased current density and high-speed plating can.
(9)在本發明之其中一種形態中，前述複數之分割陽極電極的各個，係能夠將橫剖面之輪廓設為圓。 (9) In one aspect of the invention, each of the plurality of divided anode electrodes can have a contour of a cross section as a circle.
若是將分割陽極電極設為在平面視之時成矩形，則從工件的被處理面起直到分割陽極電極為止的距離，係成為一定，在此一定距離之狹窄範圍內所噴出之電鍍液係會集中，並變得沒有能夠離開的空間。若是將分割陽極電極之橫剖面的輪廓設為圓，則越從分割陽極電極之中心線而遠離，工件W之被處理面和分割陽極電極之間的距離係越擴大，藉由此，係能夠確保電鍍液之離開空間。 If the divided anode electrode is formed in a rectangular shape in a plan view, the distance from the surface to be processed of the workpiece to the division of the anode electrode is constant, and the plating solution sprayed in a narrow range of a certain distance will be Concentrate and become unable to leave space. When the profile of the cross section of the divided anode electrode is a circle, the distance from the center line of the divided anode electrode is further increased, and the distance between the processed surface of the workpiece W and the divided anode electrode is increased. Make sure the plating solution leaves the space.
以下，針對本發明之合適的實施形態作詳細說明。另外，以下所說明之本實施形態，係並非為對於在申請專利範圍中所記載之本發明的內容作不適當之限定者，在本實施形態中所說明之構成的全部，係並非一定是作為本發明之解決手段所必要者。 Hereinafter, suitable embodiments of the present invention will be described in detail. In addition, the present embodiment described below is not intended to be unduly limited to the content of the present invention described in the claims, and all of the configurations described in the present embodiment are not necessarily It is necessary for the solution of the present invention.
連續電鍍裝置，係如圖1中所示一般，具備有至少1個的電鍍槽10。較理想，係可將複數之電鍍槽單元10-1~10-3，沿著工件50之搬送方向A來作連結。 The continuous plating apparatus is generally provided with at least one plating tank 10 as shown in FIG. Preferably, the plurality of plating tank units 10-1 to 10-3 are connected along the conveying direction A of the workpiece 50.
電鍍槽單元10，係如圖2中所示一般而收容電鍍液11，並對於沿著圖1中所示之搬送方向A所連續搬送而來 之複數的工件W同時進行電鍍。 The plating tank unit 10 accommodates the plating solution 11 as shown in FIG. 2 and is continuously conveyed in the conveying direction A shown in FIG. The plurality of workpieces W are simultaneously plated.
如圖2中所示一般，在電鍍槽10之上方，係被設置有經由將1枚之工件W作保持的搬送治具20而與工件W作電性連接之共通陰極電極30。另外，共通陰極電極30，係可配置在從電鍍槽10之上方而偏移的側方處。 As shown in FIG. 2, generally, a common cathode electrode 30 electrically connected to the workpiece W via a transport jig 20 for holding one workpiece W is provided above the plating tank 10. Further, the common cathode electrode 30 can be disposed on the side shifted from above the plating tank 10.
在電鍍槽10內，係具備有與工件W之搬送路徑相對向地作配置之分割陽極電極40(40-1~40-4)。分割陽極電極40(40-1~40-4)，係可具備有被配置在搬送路徑之其中一側方的第1電極40A(40A-1~40A-4)、和被配置在另外一側方的第2電極40B(40B-1~40B-4)。在僅對於工件W之單面進行電鍍的情況時，係只要僅在搬送方向之其中一側方處配置分割陽極電極40(40-1~40-4)即可。 In the plating tank 10, a divided anode electrode 40 (40-1 to 40-4) disposed to face the transport path of the workpiece W is provided. The divided anode electrode 40 (40-1 to 40-4) may be provided with the first electrode 40A (40A-1 to 40A-4) disposed on one side of the transport path, and disposed on the other side. The second electrode 40B (40B-1 to 40B-4). In the case where plating is performed only on one side of the workpiece W, the divided anode electrodes 40 (40-1 to 40-4) may be disposed only on one of the conveyance directions.
又，係設置有被與分割陽極電極40(40-1~40-4)之各1個以及共通陰極電極30作連接，並對於被供給至分割陽極電極40(40-1~40-4)處之電流分別獨立地作控制的複數之電源50(50-1~50-4)。將被與第1電極40A(40A-1~40A-4)作連接之電源，稱作第1電源50A(50A-1~50A-4)，並將被與第2電極40B(40B-1~40B-4)作連接之電源，稱作第2電源50B(50B-1~50B-4)。第1電源50A(50A-1~50A-4)和第2電源50B(50B-1~50B-4)的各個，係能夠相互獨立地對於電流值作設定。 Further, it is provided to be connected to each of the divided anode electrodes 40 (40-1 to 40-4) and the common cathode electrode 30, and is supplied to the divided anode electrode 40 (40-1 to 40-4). The current is independently controlled as a plurality of power sources 50 (50-1~50-4). The power source to be connected to the first electrode 40A (40A-1 to 40A-4) is referred to as a first power source 50A (50A-1 to 50A-4), and is connected to the second electrode 40B (40B-1~). 40B-4) A power source for connection is referred to as a second power source 50B (50B-1 to 50B-4). Each of the first power source 50A (50A-1 to 50A-4) and the second power source 50B (50B-1 to 50B-4) can be set independently of each other.
在本實施形態中，由於係與先前技術相異地而對於陽極電極作了分割，因此，被與工件W作連接之分割陰極軌道係成為不必要，只要將工件W經由搬送治具20來與 共通陰極電極30作連接即可。故而，係能夠將連續電鍍裝置之橫寬幅縮窄。 In the present embodiment, since the anode electrode is divided differently from the prior art, the divided cathode track system connected to the workpiece W is unnecessary, and the workpiece W is transported by the jig 20 The common cathode electrode 30 can be connected. Therefore, it is possible to narrow the width of the continuous plating apparatus.
於此，被與共通陰極電極30作連接之複數的工件W，係如圖3(A)、(B)中所示一般，將相鄰之工件W彼此具備有些微之空隙G地來作連續搬送。其理由係在於：若是將空隙G增大，則電場會集中在工件W之搬送方向A上的兩端側處，並產生使工件W之兩端側的電鍍厚度變厚之被稱作所謂的狗骨狀之不均一的電鍍之故。空隙G，係為不會產生電場集中之程度的空隙。 Here, the plurality of workpieces W connected to the common cathode electrode 30 are continuous as shown in FIGS. 3(A) and (B), and the adjacent workpieces W are provided with a slight gap G therebetween. Transfer. The reason for this is that if the gap G is increased, the electric field is concentrated on both end sides in the transport direction A of the workpiece W, and the thickness of the plating on both ends of the workpiece W is increased. Dog bones are unevenly plated. The gap G is a gap that does not cause an electric field concentration.
於此情況，當圖3(A)所示之分割陽極電極40A-2僅與1枚之工件相對向時、和當圖3(B)中所示一般之分割陽極電極40A-2為與2枚之工件W相對向時，與分割陽極電極40A-2相對向之工件W的總電解面積係成為略相等。故而，當複數之工件W隔著空隙G而被作連續搬送的期間中，係只要藉由設定電流值(A/dm2)來對於分割陽極電極40進行定電流控制即可。也就是說，係能夠將通過電鍍槽10之複數的工件W，視為1枚之相連續的工件，在全部之分割陽極電極40的各個處，就算是工件W有所移動，電解面積亦不會有實質性的變化之故。 In this case, when the divided anode electrode 40A-2 shown in FIG. 3(A) is opposed to only one workpiece, and the general divided anode electrode 40A-2 shown in FIG. 3(B) is 2 When the workpiece W is opposed to each other, the total electrolytic area of the workpiece W facing the divided anode electrode 40A-2 is slightly equal. Therefore, in a period in which the plurality of workpieces W are continuously transported via the gap G, the constant current control may be performed on the divided anode electrode 40 by setting the current value (A/dm 2 ). In other words, it is possible to treat a plurality of workpieces W passing through the plating tank 10 as one continuous workpiece, and even if the workpiece W is moved at all of the divided anode electrodes 40, the electrolytic area is not There will be substantial changes.
關於此點，在專利文獻1之技術中，係將以批次單位而搬送之全部的工件作為對象，對於部分浸漬狀態之工件W，係有必要對於電流值進行漸增或漸減控制，控制係變得複雜化。此係因為，在專利文獻1中，橫跨2個電鍍槽10之工件W，係與搬出側之電鍍槽的分割陰極軌道以及 搬入側之電鍍槽的分割陰極軌道相接觸。故而，在被作搬出之側的電鍍槽中，係有必要對電流值進行漸減控制，而在被作搬入之側的電鍍槽10處，則係有必要對電流值進行漸增控制之故。關於此點，在本實施形態中，由於橫跨2個電鍍槽10之工件W的陰極係為共通，因此係並不需要進行此種複雜的控制。 In this regard, in the technique of Patent Document 1, all of the workpieces conveyed in batch units are targeted, and it is necessary to gradually increase or decrease the current value for the workpiece W in the partially immersed state. Become complicated. In this case, in Patent Document 1, the workpiece W that straddles the two plating tanks 10 is the divided cathode track of the plating tank on the carry-out side and The divided cathode tracks of the plating tank on the loading side are in contact. Therefore, in the plating tank on the side to be carried out, it is necessary to gradually reduce the current value, and it is necessary to gradually increase the current value at the plating tank 10 on the side to be carried. In this regard, in the present embodiment, since the cathodes of the workpieces W spanning the two plating tanks 10 are common, it is not necessary to perform such complicated control.
在本實施形態中，如圖3(A)中所示一般，當將工件W之沿著搬送方向A的長度設為L1，並將複數之分割陽極電極40的各別之沿著搬送方向A的長度設為L2時，係可實質性滿足L1=L2。 In the present embodiment, as shown in FIG. 3(A), the length of the workpiece W along the transport direction A is generally set to L1, and the respective divided anode electrodes 40 are arranged along the transport direction A. When the length is set to L2, it is substantially satisfied that L1 = L2.
如圖4中所示一般，將在電鍍槽10內成為全部浸漬狀態之工件的數量設為N(在圖4中，N=4)。如圖1中所示一般，當在電鍍槽10內之上游側以及下游側處而成為部分浸漬狀態的情況時，被配置在電鍍槽10內之工件總數，係為(N+1)(在圖1中，係為N+1=5)。如同由圖1以及圖4而可明顯得知一般，電鍍槽10內之分割陽極電極40(40A或40B)以及電源50(50A或50B)的數量，係分別只要為N個(在圖1以及圖4中，係為N=4)即可，相較於如同專利文獻1一般之需要(N+1)個電源者，係能夠將高價之電源50的數量減少。亦即是，藉由實質性滿足L1=L2，係能夠將電源50之必要個數設為最小限度。 As shown in Fig. 4, the number of workpieces which are all immersed in the plating bath 10 is set to N (N = 4 in Fig. 4). As shown in FIG. 1, generally, in the case of being partially immersed at the upstream side and the downstream side in the plating tank 10, the total number of workpieces disposed in the plating tank 10 is (N+1) (in In Fig. 1, it is N+1=5). As is apparent from FIG. 1 and FIG. 4, generally, the number of divided anode electrodes 40 (40A or 40B) and power source 50 (50A or 50B) in the plating tank 10 is N (in FIG. 1 and In FIG. 4, it is sufficient that N=4), and the number of high-priced power sources 50 can be reduced as compared with the case where (N+1) power sources are required as in Patent Document 1. That is, by substantially satisfying L1 = L2, it is possible to minimize the number of necessary power sources 50.
在本實施形態中，於電鍍槽10中，係以批次單位而供給複數之工件W1~WN。如圖5(A)中所示一般，當同一批次之最初的工件W1與分割陽極電極40A-1~40A-4之各 1個相對向時，在工件W1之下游處，係並不存在有電鍍對象之其他的工件。或者是，亦可在工件W1之下游處，設置有上述之空隙G地，來設置用以避免對於工件端部之電場集中的假工件。於此情況，係基於分割陽極電極40A和最初之工件W1所相對向之電解面積(圖5(A)之L3×工件高度)，來對於分割陽極電極40A-1~40A-4的各1個，而藉由電源50A-1~50A-4之相對應的各1個來對電流值作漸增控制(參考圖5(B))。如此這般，係能夠將工件W1之電流密度設為一定。 In the present embodiment, in plating tank 10, a batch system is supplied in units of a plurality of workpieces W 1 ~ W N. As shown in (A) is generally in FIG. 5, when the same batch of the first workpiece W 1 and each of a split anode 40A-1 ~ 40A-4 to the opposite, downstream of the workpiece W 1, and based There are no other workpieces with plating objects. Alternatively, also in the downstream of the workpiece W 1, is provided with the above-mentioned gap G, the workpiece is set to avoid false end portion of the workpiece to the electric field concentration. In this case, it is based on initially dividing the anode electrodes 40A and the workpiece by W 1 relative to the electrolysis area (FIG. 5 (A) of the workpiece L3 × height) to 1 for each of the divided anode 40A-1 ~ 40A-4 is The current value is gradually increased by the corresponding one of the power sources 50A-1 to 50A-4 (refer to FIG. 5(B)). In this way, the current density of the workpiece W 1 can be made constant.
同樣的，如圖6(A)中所示一般，當同一批次之最後的工件WN與分割陽極電極40A-1~40A-4之各1個相對向時，在工件WN之上游處，係並不存在有電鍍對象之其他的工件。或者是，亦可在工件WN之上游處，設置有上述之空隙G地，來設置用以避免對於工件端部之電場集中的假工件。於此情況，係基於分割陽極電極40A和最後之工件WN所相對向之電解面積(圖6(A)之L4×工件高度)，來對於分割陽極電極40A-1~40A-4的各1個，而藉由電源50A-1~50A-4之相對應的各1個來對電流值作漸增控制(參考圖6(B))。如此這般，係能夠將工件WN之電流密度設為一定。 Similarly, as shown in FIG. 6(A), when the last workpiece W N of the same batch is opposed to each of the divided anode electrodes 40A-1 to 40A-4, upstream of the workpiece W N There are no other workpieces with plating objects. Alternatively, a gap G may be provided upstream of the workpiece W N to provide a dummy workpiece for avoiding electric field concentration on the workpiece end. In this case, based on the electrolysis area (L4 × workpiece height of FIG. 6(A)) in which the divided anode electrode 40A and the last workpiece W N are opposed, each of the divided anode electrodes 40A-1 to 40A-4 is divided. The current value is gradually increased by the corresponding one of the power sources 50A-1 to 50A-4 (refer to FIG. 6(B)). In this way, the current density of the workpiece W N can be made constant.
亦即是，係僅需要對於批次單位之最初和最後的工件W1、WN而進行電流值之漸增或漸減控制即可，而成為並不需要進行如同專利文獻1一般之將以批次單位所搬送之全部的工件作為對象的電流值之漸增或漸減控制。 That is, it is only necessary to perform the gradual increase or decrease control of the current value for the first and last workpieces W 1 and W N of the batch unit, and it is not necessary to perform the batch as in the patent document 1 All the workpieces transferred by the sub-unit are controlled as the increasing or decreasing control of the current value of the object.
第2實施形態，當將工件W之沿著搬送方向A的長度設為L1，並將分割陽極電極40的各別之沿著搬送方向A的長度設為L2，且將n設為2以上(亦包含該值)之整數時，係滿足L2<L1/n。 In the second embodiment, the length of the workpiece W along the transport direction A is L1, and the length of each of the divided anode electrodes 40 along the transport direction A is L2, and n is set to 2 or more ( When an integer of this value is also included, it satisfies L2 < L1/n.
圖7(A)~圖7(C)，係對於在具備有各別之長度為L2的分割陽極電極40、1、40-2、40-3、40-4、…的電鍍槽10中，而將具有相異之長度L1A、L1B、L1C之工件WA、WB、WC作了搬送的狀態作展示。在圖7(A)中，係為n=3，而L2<L1A/3係成立，在圖7(B)中，係為n=4，而L2<L1B/4係成立，在圖7(C)中，係為n=2，而L2<L1C/2係成立。 7(A) to 7(C), in the plating tank 10 provided with the divided anode electrodes 40, 1, 40-2, 40-3, 40-4, ... having respective lengths L2, On the other hand, the workpieces W A , W B , and W C having different lengths L1A, L1B, and L1C are transported. In Fig. 7(A), it is n=3, and L2<L1A/3 is established. In Fig. 7(B), it is n=4, and L2<L1B/4 is established, in Fig. 7 ( In C), it is n=2, and L2<L1C/2 is established.
如此這般，由於係成為並不需要使分割陽極電極40之長度與工件尺寸相配合，因此就算是工件尺寸有所變更，也不需要對於分割陽極電極40進行交換。 In this manner, since it is not necessary to match the length of the divided anode electrode 40 to the workpiece size, even if the workpiece size is changed, it is not necessary to exchange the divided anode electrode 40.
在本實施形態中，係可設為下述之構成：亦即是，在電鍍槽10中，係以批次單位來供給工件W，複數之電源50的各個，係從批次單位之最初起直到最後為止，而對於複數之分割陽極電極40的各個進行定電流控制。 In the present embodiment, it is possible to provide a configuration in which the workpiece W is supplied in a batch unit in the plating tank 10, and each of the plurality of power sources 50 is from the beginning of the batch unit. Until the end, constant current control is performed for each of the plurality of divided anode electrodes 40.
當工件之長度L1(L1A、L1B、L1C)和陽極電極40之長度L2，為滿足L2<L1/n的情況時，與各個的陽極電極40所擔當之n成正比地，電解面積係變窄。故而，就算是在圖5(A)或圖6(A)中所示一般之批次單位的最初或最後 之工件W通過的情況時，只要分割陽極電極40之與工件W成為非對向的面積為窄而能夠忽略，則係成為不需要如同圖5(B)或圖6(B)一般地將電流值作漸增或漸減。另外，工件WA、WB、WC之長度L1A、L1B、L1C，係並不被限定於成為被作周期性配列之分割陽極電極的一周期之整數倍者，而可適用各種之長度。 When the lengths L1 (L1A, L1B, L1C) of the workpiece and the length L2 of the anode electrode 40 satisfy the case of L2 < L1/n, the electrolytic area is narrowed in proportion to the n of the respective anode electrodes 40. . Therefore, even if the first or last workpiece W of the general batch unit shown in Fig. 5(A) or Fig. 6(A) passes, the division of the anode electrode 40 with the workpiece W becomes non-aligned. If the area is narrow and can be ignored, it is not necessary to gradually increase or decrease the current value as in Fig. 5(B) or Fig. 6(B). Further, the lengths L1A, L1B, and L1C of the workpieces W A , W B , and W C are not limited to being an integral multiple of one cycle of the divided anode electrodes which are periodically arranged, and various lengths can be applied.
在工件和電極(陽極板)之間，係有著被設置有對於工件噴出電鍍液之噴嘴的情況。此噴嘴，係在日本特開2000-178784號公報(圖1、圖3)、日本特開2006-214006號公報(圖1)或是日本特開昭58-6998號公報(圖4)等中有所記載。 Between the workpiece and the electrode (anode plate), there is a case where a nozzle for ejecting a plating solution to the workpiece is provided. This nozzle is disclosed in Japanese Laid-Open Patent Publication No. 2000-178784 (Fig. 1, Fig. 3), Japanese Patent Laid-Open No. Hei. No. 2006-214006 (Fig. 1), or Japanese Patent Laid-Open Publication No. SHO 58-6998 (Fig. 4). There are records.
於先前技術中，係如圖8中所示一般，在工件W和陽極板200之間，係至少需要噴嘴100之直徑以上的空間。在日本特開昭58-6998號公報中，係揭示有：工件W和陽極板200間之距離S1，係為100mm以上(亦包含該值)。 In the prior art, as shown generally in Figure 8, between the workpiece W and the anode plate 200, at least the space above the diameter of the nozzle 100 is required. Japanese Patent Publication No. Sho 58-6998 discloses that the distance S1 between the workpiece W and the anode plate 200 is 100 mm or more (this value is also included).
在本實施形態中，係如圖9一般，可設為下述之構成：亦即是，電鍍槽10，係在與複數之工件W的各1個相對向之位置處，沿著搬送方向A而設置有朝向工件W噴射電鍍液的複數之噴嘴100，複數之分割陽極電極40中之至少各1個的分割陽極電極40，係被配置在複數之噴嘴100中的相鄰之各2個噴嘴100之間。藉由此，在相鄰之 各2個的噴嘴100之間，係成為能夠進入有分割陽極電極40之至少一部分。 In the present embodiment, as shown in FIG. 9, the plating tank 10 may be disposed at a position facing each of the plurality of workpieces W along the transport direction A. Further, a plurality of nozzles 100 for ejecting a plating solution toward the workpiece W are provided, and at least one of the plurality of divided anode electrodes 40 is disposed in each of two adjacent nozzles of the plurality of nozzles 100. Between 100. By this, in the adjacent At least a part of the divided anode electrodes 40 is allowed to enter between the two nozzles 100.
當工件W之長度L1和分割陽極電極40之長度L2，為滿足L2<L1/n的情況時，分割陽極電極40之長度L2，係能夠成為較2個噴嘴100間之距離L5更短。故而，係能夠將複數之分割陽極電極40中的至少各1個的分割陽極電極，配置在複數之噴嘴中的相鄰之各2個的噴嘴100之間。藉由此，分割陽極電極40和工件W之間的距離S2係變短，中介存在於分割陽極電極40和工件W之間的電鍍液之電性阻抗係變小，而能夠將從分割陽極電極40所供給至工件W處之電流密度提高並使高速電鍍成為可能。 When the length L1 of the workpiece W and the length L2 of the divided anode electrode 40 satisfy L2 < L1/n, the length L2 of the divided anode electrode 40 can be made shorter than the distance L5 between the two nozzles 100. Therefore, at least one of the plurality of divided anode electrodes 40 can be disposed between the adjacent two nozzles 100 among the plurality of nozzles. Thereby, the distance S2 between the divided anode electrode 40 and the workpiece W becomes shorter, and the electrical impedance of the plating solution which is interposed between the divided anode electrode 40 and the workpiece W becomes smaller, and the anode electrode can be divided from the anode electrode. The current density supplied to the workpiece W by 40 is increased and high-speed plating is possible.
特別是，複數之分割陽極電極40之各個，係可如圖10中所示一般，將橫剖面之輪廓設為圓。若是將分割陽極電極設為在平面視之時成矩形，則從工件的被處理面起直到分割陽極電極40為止的距離，係成為一定，在此一定距離之狹窄範圍內所噴出之電鍍液11係會集中，並變得沒有能夠離開的空間。若是將分割陽極電極40之橫剖面的輪廓設為圓，則越從分割陽極電極40之中心線B而遠離，工件W之被處理面和分割陽極電極40之間的距離係越擴大，藉由此，係能夠確保電鍍液11之離開空間。 In particular, each of the plurality of divided anode electrodes 40 can be generally rounded as shown in FIG. When the divided anode electrode is formed in a rectangular shape in plan view, the distance from the surface to be processed of the workpiece to the division of the anode electrode 40 is constant, and the plating solution 11 is ejected in a narrow range of a certain distance. The system will concentrate and become free of space to leave. When the outline of the cross section of the divided anode electrode 40 is a circle, the distance from the center line B of the divided anode electrode 40 is further increased, and the distance between the processed surface of the workpiece W and the divided anode electrode 40 is expanded. Thus, it is possible to ensure the leaving space of the plating solution 11.
藉由確保有電鍍液11之離開空間，係能夠使工件1恆常與新鮮的電鍍液作接觸。又，若是在工件W和噴嘴100以及陽極電極40之間的區域中而電鍍液之流動不足， 則電鍍液係不會涵蓋至在高速噴流之周圍所產生的負壓區域處，在特別柔軟之工件W的情況時，係會觀察到工件W被吸附於噴嘴100側處的現象。因此，從防止工件W被吸附在負壓區域側處的現象之觀點而言，確保從噴嘴100所噴出之電鍍液的離開空間一事亦為重要。 By ensuring the exit space of the plating solution 11, the workpiece 1 can be brought into constant contact with the fresh plating solution. Further, if the flow of the plating solution is insufficient in the region between the workpiece W and the nozzle 100 and the anode electrode 40, The plating solution does not cover the negative pressure region generated around the high-speed jet, and in the case of the particularly soft workpiece W, the phenomenon that the workpiece W is adsorbed to the nozzle 100 side is observed. Therefore, from the viewpoint of preventing the phenomenon that the workpiece W is adsorbed on the side of the negative pressure region, it is also important to secure the leaving space of the plating liquid discharged from the nozzle 100.
以上，雖係針對數個的實施形態而作了說明，但是，只要是當業者，則應可容易地理解到，在不實質脫離本發明之新穎事項以及效果的範圍內，係可進行多種之變形。故而，此種變形例，係全部被包含於本發明之範圍中。例如，在說明書或圖面中，至少被一次地與更加廣義或同義之相異用語一同作了記載的用語，不論是在說明書或圖面之何一場所處，均能夠置換為該相異之用語。 The above description has been made for a number of embodiments, but as long as it is a person skilled in the art, it can be easily understood that various types can be implemented without departing from the novel matters and effects of the present invention. Deformation. Therefore, such modifications are all included in the scope of the present invention. For example, in the specification or the drawing, the term recorded together with the more general or synonymous dissimilar term at least once, can be replaced by the difference in any place in the specification or the drawing. term.
10‧‧‧電鍍槽 10‧‧‧ plating bath
11‧‧‧電鍍液 11‧‧‧ plating solution
20‧‧‧搬送治具 20‧‧‧Transfer fixture
30‧‧‧共通陰極電極 30‧‧‧Common cathode electrode
40、40-1~40-4、40A-1~40A-4、40B-1~40B-4‧‧‧分割陽極電極 40, 40-1~40-4, 40A-1~40A-4, 40B-1~40B-4‧‧‧Divided anode electrode
50、50-1~50-4、50A-1~50A-4、50B-1~50B-4‧‧‧電源 50, 50-1~50-4, 50A-1~50A-4, 50B-1~50B-4‧‧‧ power supply
100‧‧‧噴嘴 100‧‧‧ nozzle
A‧‧‧搬送方向 A‧‧‧Transfer direction
L1‧‧‧工件之長度 L1‧‧‧The length of the workpiece
L2‧‧‧分割陽極電極之長度 L2‧‧‧Divided anode electrode length
W‧‧‧工件 W‧‧‧Workpiece
[圖1]本發明之第1實施形態的連續電鍍裝置之概略平面圖。 Fig. 1 is a schematic plan view showing a continuous plating apparatus according to a first embodiment of the present invention.
[圖2]連續電鍍裝置之概略剖面圖。 Fig. 2 is a schematic cross-sectional view of a continuous plating apparatus.
[圖3]圖3(A)、(B)，係為針對相對於1個分割陽極電極，而不論是僅使1枚之工件相對向，或者是使2枚以上(亦包含該值)的工件相對向，電解面積均為實質性相等一事作說明的圖。 [Fig. 3] Figs. 3(A) and 3(B) show that, for one divided anode electrode, only one workpiece is opposed to each other, or two or more (including the value) are included. A diagram in which the workpieces are opposed to each other and the electrolysis areas are substantially equal.
[圖4]針對相對於1個分割陽極電極而僅使1枚之工件相對向的搬送狀態作展示之圖。 [Fig. 4] A view showing a state in which only one workpiece is opposed to each other with respect to one divided anode electrode.
[圖5]圖5(A)、(B)，係為用以說明當批次之最初的工 件被搬入時的電流值之漸增控制作說明之圖。 [Fig. 5] Figs. 5(A) and (B) are used to illustrate the initial work of the batch. The increasing control of the current value when the piece is moved in is illustrated.
[圖6]圖6(A)、(B)，係為用以說明當批次之最後的工件被搬出時的電流值之漸減控制作說明之圖。 6(A) and 6(B) are diagrams for explaining the control of the decreasing value of the current value when the last workpiece of the batch is carried out.
[圖7]圖7(A)~圖7(C)，係為用以說明本發明之第2實施形態的說明圖。 [Fig. 7] Fig. 7 (A) to Fig. 7 (C) are explanatory views for explaining a second embodiment of the present invention.
[圖8]對於在工件和陽極板之間具備有噴嘴之先前技術作展示之圖。 [Fig. 8] A view showing a prior art in which a nozzle is provided between a workpiece and an anode plate.
[圖9]用以說明本發明之第3實施形態的說明圖。 Fig. 9 is an explanatory view for explaining a third embodiment of the present invention.
[圖10]對於將分割陽極電極之橫剖面設為圓的例子作展示之圖。 Fig. 10 is a view showing an example in which a cross section of a divided anode electrode is a circle.
10‧‧‧電鍍槽 10‧‧‧ plating bath
10-1~10-3‧‧‧電鍍槽單元 10-1~10-3‧‧‧ plating bath unit
30‧‧‧共通陰極電極 30‧‧‧Common cathode electrode
40、40-1~40-4、40A-1~40A-4、40B-1~40B-4‧‧‧分割陽極電極 40, 40-1~40-4, 40A-1~40A-4, 40B-1~40B-4‧‧‧Divided anode electrode
50、50-1~50-4、50A-1~50A-4、50B-1~50B-4‧‧‧電源 50, 50-1~50-4, 50A-1~50A-4, 50B-1~50B-4‧‧‧ power supply
A‧‧‧搬送方向 A‧‧‧Transfer direction
W‧‧‧工件 W‧‧‧Workpiece
Claims (9)
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| JP2011214301A JP5795514B2 (en) | 2011-09-29 | 2011-09-29 | Continuous plating equipment |
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| TW201333262A TW201333262A (en) | 2013-08-16 |
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| JP (1) | JP5795514B2 (en) |
| KR (1) | KR101475396B1 (en) |
| CN (1) | CN103031588B (en) |
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| DE102012018393A1 (en) | 2013-04-04 |
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| KR20130035201A (en) | 2013-04-08 |
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