TWI392843B - Heat processing furnace and vertical-type heat processing appartus - Google Patents
Heat processing furnace and vertical-type heat processing appartus Download PDFInfo
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- TWI392843B TWI392843B TW097109508A TW97109508A TWI392843B TW I392843 B TWI392843 B TW I392843B TW 097109508 A TW097109508 A TW 097109508A TW 97109508 A TW97109508 A TW 97109508A TW I392843 B TWI392843 B TW I392843B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B23/00—Heating arrangements
- F26B23/04—Heating arrangements using electric heating
- F26B23/06—Heating arrangements using electric heating resistance heating
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0025—Especially adapted for treating semiconductor wafers
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Description
本發明係關於一種熱處理爐及一種包含該熱處理爐之直立式熱處理裝置。本申請案係基於並主張2007年3月20日提出申請的先前日本專利申請案第2007-72477號及2008年2月5日提出申請的日本專利申請案第2008-25113號之優先權益，該等申請案之全部內容以引用方式併入本文中。 The present invention relates to a heat treatment furnace and an upright heat treatment apparatus including the same. The present application is based on and claims the priority of Japanese Patent Application No. 2007-72477, filed on March 20, 2007, and Japanese Patent Application No. 2008-25113, filed on Feb. 5, 2008. The entire contents of the application are incorporated herein by reference.
在製造一半導體器件時，使用各種熱處理裝置來使一半導體晶圓(其係一待處理物件)經受若干製程，例如，氧化製程、擴散製程及CVD(化學氣相沈積)製程。一普通熱處理裝置包含一熱處理爐，其由以下裝置構成：一處理容器(反應管)，其能夠容納半導體晶圓並對該等半導體晶圓進行熱處理；及一加熱器(加熱器件)，其經設置以覆蓋該處理容器之一圓周以用於對該處理容器中之晶圓進行加熱。該加熱器具有一圓筒形熱絕緣構件及一加熱電阻器，其藉由一支撐構件設置在該熱絕緣構件之內圓周表面上。 In the fabrication of a semiconductor device, various heat treatment devices are used to subject a semiconductor wafer (which is an object to be processed) to a number of processes, such as an oxidation process, a diffusion process, and a CVD (Chemical Vapor Deposition) process. A conventional heat treatment apparatus comprises a heat treatment furnace comprising: a processing vessel (reaction tube) capable of accommodating and heat-treating the semiconductor wafer; and a heater (heating device) A circumference is provided to cover one of the processing containers for heating the wafer in the processing container. The heater has a cylindrical heat insulating member and a heating resistor which is disposed on an inner circumferential surface of the heat insulating member by a supporting member.
在一能夠執行分批製程之熱處理裝置中，例如，存在一用作加熱電阻器的沿該圓筒形熱絕緣構件之內壁表面佈置之螺旋形加熱元件(亦稱作"加熱導線"及"加熱電阻器")。加熱元件可將該爐內部加熱至高溫，例如，約800℃至1000℃。可將藉由將熱絕緣材料(例如，陶瓷纖維)燒製成一圓筒形狀而形成之構件用作熱絕緣構件。熱絕緣構件可減少以輻射熱及傳導熱形式損失之熱量以增強加熱效率。 例如，可將一陶瓷構件用作支撐構件。該陶瓷支撐構件可以預定間距支撐加熱元件，同時允許加熱元件之熱膨脹及熱收縮。 In a heat treatment apparatus capable of performing a batch process, for example, there is a spiral heating element (also referred to as a "heating wire" and a "heating wire" disposed along an inner wall surface of the cylindrical heat insulating member serving as a heating resistor. Heating resistor "). The heating element can heat the interior of the furnace to a high temperature, for example, from about 800 °C to 1000 °C. A member formed by firing a heat insulating material (for example, ceramic fiber) into a cylindrical shape can be used as the heat insulating member. The thermally insulating member reduces heat lost in the form of radiant heat and conductive heat to enhance heating efficiency. For example, a ceramic member can be used as the support member. The ceramic support member can support the heating element at a predetermined spacing while allowing thermal expansion and thermal contraction of the heating element.
在上述熱爐中，為使加熱元件可熱膨脹及熱收縮，以螺旋方式形成之加熱元件經支撐以便在加熱元件與熱絕緣構件之間界定一間隙。然而，因加熱元件係在高溫下使用，因此該加熱元件遭受潛變應變且其長度會隨時間而緩慢增加。另外，該加熱元件在加熱操作期間中會熱膨脹。另一方面，存在一藉由將空氣吹入加熱元件以降低溫度而快速冷卻該加熱元件之裝置。由於溫度反覆地升高及下降，該加熱元件可能發生變形。變形可在變形的加熱元件之毗鄰部分之間產生短路，而此可招致斷開。 In the above furnace, in order to thermally expand and thermally contract the heating element, the spirally formed heating element is supported to define a gap between the heating element and the thermally insulating member. However, since the heating element is used at high temperatures, the heating element suffers from creep strain and its length slowly increases with time. Additionally, the heating element thermally expands during the heating operation. On the other hand, there is a means for rapidly cooling the heating element by blowing air into the heating element to lower the temperature. The heating element may be deformed due to the temperature rising and falling repeatedly. The deformation can create a short circuit between adjacent portions of the deformed heating element, which can result in disconnection.
特別是在一直立式熱處理爐中，加熱元件因溫度升高及下降所致之反覆熱膨脹及熱收縮而在支撐構件中移動，且加熱元件因地心引力而略向下移動。然後，移動量累積於加熱元件之一最低圈處。即，由於加熱元件移動之累積，故最低圈之捲繞直徑增加。當增加之捲繞直徑之加熱元件抵達熱絕緣構件之內表面且不可能再向外側膨脹時，加熱元件則會在向上及向下方向上變形。因此，在加熱元件的一部分與毗鄰於該部分的另一部分之間存在發生短路之可能性，從而導致某一斷開。 In particular, in a vertical heat treatment furnace, the heating element moves in the support member due to the thermal expansion and thermal contraction caused by the increase and decrease in temperature, and the heating element moves slightly downward due to gravity. Then, the amount of movement is accumulated at the lowest circle of one of the heating elements. That is, the winding diameter of the lowest circle increases due to the accumulation of the movement of the heating element. When the heating element of the increased winding diameter reaches the inner surface of the heat insulating member and is no longer expandable outward, the heating element is deformed in the upward and downward directions. Thus, there is a possibility of a short circuit between a portion of the heating element and another portion adjacent to the portion, resulting in some disconnection.
為解決此等問題，已提出如下結構。即，為防止在長形加熱元件之一側發生因潛變及熱性膨脹或類似情形所致之此一累積，藉由銲接將一桿樣形狀之固定構件附接至加熱 元件之一外側部分，且該固定構件之末端經隱埋而固定於一熱絕緣構件中，以使該固定構件在該爐之徑向方向上向外伸出(見專利文獻1)。 To solve these problems, the following structure has been proposed. That is, in order to prevent such accumulation due to creeping and thermal expansion or the like on one side of the elongated heating element, a rod-shaped fixing member is attached to the heating by welding. One of the outer portions of the member, and the end of the fixing member is fixed in a heat insulating member by being buried so that the fixing member projects outward in the radial direction of the furnace (see Patent Document 1).
[專利文獻1]JP10-233277A [Patent Document 1] JP10-233277A
[專利文獻2]JP2005-197074A [Patent Document 2] JP2005-197074A
然而，在其中固定構件僅藉由銲接連接至加熱元件之外側部分之上述結構中，所連接部分曝露於高溫。另外，可考量當加熱電阻器熱膨脹或熱收縮時，應力往往會集中於所連接部分上，此引起加熱元件之耐久性劣化(壽命減小)。此外，由於固定構件具有一棒樣形狀，因此固定構件可較易地自熱絕緣構件脫落，藉此固定構件難以保證充足之固持力。 However, in the above structure in which the fixing member is connected only to the outer side portion of the heating element by welding, the joined portion is exposed to a high temperature. In addition, it is considered that when the heating resistor is thermally expanded or thermally contracted, stress tends to concentrate on the connected portion, which causes deterioration in durability of the heating element (life reduction). Further, since the fixing member has a rod-like shape, the fixing member can be easily detached from the heat insulating member, whereby the fixing member is difficult to secure a sufficient holding force.
此外，當需要快速增加或降低一晶圓之溫度時，在快速溫度增加操作期間必須向一加熱元件施加大功率。然而，一習用普通加熱元件不可能耐受大負載，且可易於被斷開。出於此緣由，實際上不可能施加此一大功率，且因此快速溫度增加/降低操作受到限制。儘管使用一耐斷開之加熱元件可克服該困難，但此因此一加熱元件昂貴而招致成本增加。 In addition, when it is desired to rapidly increase or decrease the temperature of a wafer, a large amount of power must be applied to a heating element during a rapid temperature increase operation. However, a conventional heating element is not likely to withstand a large load and can be easily disconnected. For this reason, it is practically impossible to apply this large power, and thus the rapid temperature increase/decrease operation is limited. Although this difficulty can be overcome by the use of a break-resistant heating element, this is therefore an expensive heating element and incurs an increase in cost.
同時，為藉由減小施加至加熱元件之負載而延長加熱元件之壽命(以改良耐久性)，增加加熱元件之表面積(元件表面積)相對於所供應功率之比率係有效的。此乃因當加熱元件表面積增加時，加熱元件之表面溫度降低，以由此減小加熱元件之負載。由於所謂螺旋式加熱元件可高效地佈 置於一所需空間中，因此可使用此一設計來減少負載。然而，如圖14中所示，例如，使用一螺旋式加熱元件的加熱器或熱處理爐傳統上採用一其中將一加熱元件18隱埋於一熱絕緣構件16中以便將加熱元件18固定在其中之結構。因此，一欲在一反應器核心中加熱之物件係經由熱絕緣構件16來加熱，使得該物件之溫度難以快速增加。該物件之溫度亦難以快速降低，此乃因除熱絕緣構件16所致之熱容量增加效應之外，加熱元件18還經由熱絕緣構件16來冷卻。此外，由於不存在允許加熱元件18膨脹之間隙，因此當加熱元件18膨脹時其自身會承受應力。因此，該加熱元件之耐久性可能不充足。 At the same time, in order to extend the life of the heating element (to improve durability) by reducing the load applied to the heating element, it is effective to increase the ratio of the surface area (element surface area) of the heating element to the supplied power. This is because as the surface area of the heating element increases, the surface temperature of the heating element decreases, thereby reducing the load on the heating element. Due to the so-called spiral heating element, it can be efficiently laid Placed in a desired space, so you can use this design to reduce the load. However, as shown in Fig. 14, for example, a heater or heat treatment furnace using a spiral heating element is conventionally employed in which a heating element 18 is buried in a heat insulating member 16 to fix the heating element 18 therein. The structure. Therefore, an article to be heated in a reactor core is heated via the heat insulating member 16, so that the temperature of the article is difficult to rapidly increase. The temperature of the article is also difficult to rapidly decrease due to the heat capacity increasing effect of the heat insulating member 16, and the heating element 18 is also cooled via the heat insulating member 16. Moreover, since there is no gap that allows the heating element 18 to expand, the heating element 18 itself is subject to stress when it is inflated. Therefore, the durability of the heating element may be insufficient.
已知一加熱元件係藉由將一帶狀加熱電阻構件形成為一波形而製造的(專利文獻2)。類似於螺旋式加熱元件，儘管此類型加熱元件可具有一增加之表面積，但就其在一圓筒形絕緣構件中安裝方面而言卻有相同之缺點。 It is known that a heating element is manufactured by forming a strip-shaped heating resistor member into a wave shape (Patent Document 2). Similar to a spiral heating element, although this type of heating element can have an increased surface area, it has the same disadvantages in terms of its mounting in a cylindrical insulating member.
已在上述情形下製作出本發明。本發明之目標係提供能夠快速增加及降低溫度的一種熱處理爐及一種直立式熱處理裝置，同時達成耐久性改良及成本減小。 The present invention has been made under the above circumstances. SUMMARY OF THE INVENTION An object of the present invention is to provide a heat treatment furnace and a vertical heat treatment apparatus capable of rapidly increasing and lowering temperatures while achieving durability improvement and cost reduction.
本發明係一種熱處理爐，其包括：一處理容器，其用於容納一待處理物件及對該待處理物件執行一熱製程；及一圓筒形加熱器，其圍繞該處理容器之外圓周設置以用於加熱該待處理物件；其中該加熱器包含一圓筒形熱絕緣構件，及沿該熱絕緣構件之一內圓周表面佈置之加熱電阻 器，該等加熱電阻器之每一者皆由一被彎曲成一具有波峰部分及波谷部分之波形之帶狀構件而形成，且銷構件以其間相距合適間隔佈置於該熱絕緣構件中，該等銷構件固持該加熱電阻器以使該加熱電阻器可在該加熱器之一徑向方向上移動。 The present invention is a heat treatment furnace comprising: a processing container for accommodating a workpiece to be processed and performing a thermal process on the object to be processed; and a cylindrical heater disposed around the outer circumference of the processing container For heating the object to be processed; wherein the heater comprises a cylindrical heat insulating member, and a heating resistor disposed along an inner circumferential surface of one of the heat insulating members Each of the heating resistors is formed by a strip-shaped member bent into a waveform having a peak portion and a trough portion, and the pin members are disposed in the heat insulating member at appropriate intervals therebetween, and the like. The pin member holds the heating resistor such that the heating resistor is movable in a radial direction of one of the heaters.
本發明係該熱處理爐，其中該等銷構件之每一者形成為一具有一對用於支撐該加熱電阻器之波谷部分之支腳部分之U形，該等個別支腳部分自內側通過該熱絕緣構件至外側通過該熱絕緣構件，且該等個別支腳部分彎曲於該外側上以鎖定於該熱絕緣構件之一外圓周表面上。 The present invention is the heat treatment furnace, wherein each of the pin members is formed in a U shape having a pair of leg portions for supporting a valley portion of the heating resistor, the individual leg portions passing through the inner side The heat insulating member passes through the heat insulating member to the outside, and the individual leg portions are bent on the outer side to be locked to the outer circumferential surface of one of the heat insulating members.
本發明係該熱處理爐，其中複數個圓周連續凹槽區段以其間相距合適間隔垂直地形成於該熱絕緣構件之內圓周表面中，且該等加熱電阻器之整體或一部分收容於該等凹槽區段中。 The present invention is the heat treatment furnace, wherein a plurality of circumferential continuous groove segments are vertically formed in an inner circumferential surface of the heat insulating member at an appropriate interval therebetween, and the whole or a part of the heating resistors are received in the concave portions In the slot section.
本發明係該熱處理爐，其中複數個強制式冷卻空氣吹風孔以其間相距合適間隔而以圓周方式形成於該熱絕緣構件中以在該等垂直毗鄰之加熱電阻器之間的一位置處自內側至外側地通過該熱絕緣構件。 The present invention is the heat treatment furnace, wherein a plurality of forced cooling air blowing holes are circumferentially formed in the heat insulating member at a proper interval therebetween to be at a position between the vertically adjacent heating resistors from the inner side The heat insulating member is passed to the outside.
本發明係該熱處理爐，其中該熱絕緣構件被分割成一右半部分及一左半部分，在該等部分之間具有縱向延伸分割表面，該等加熱電阻器之每一者亦被分割成對應於該熱絕緣構件之一右半部分及一左半部分，一個加熱電阻器與垂直毗鄰於其之另一加熱電阻器藉由連接板而在端部相互連接，且該等連接板皆設置在該熱絕緣構件之分割表面部分 上。 The present invention is the heat treatment furnace, wherein the heat insulating member is divided into a right half portion and a left half portion, and a longitudinally extending dividing surface is provided between the portions, and each of the heating resistors is also divided into corresponding portions. In a right half and a left half of the heat insulating member, a heating resistor and another heating resistor vertically adjacent to each other are connected to each other at the ends by a connecting plate, and the connecting plates are disposed at Split surface portion of the heat insulating member on.
本發明係該熱處理爐，其中該等連接板之每一者係藉助一由銷形成之固定構件而固定於該分割表面部分上。 The present invention is the heat treatment furnace, wherein each of the connecting plates is fixed to the divided surface portion by a fixing member formed of a pin.
本發明係該熱處理爐，其中該等連接板之每一者具有一欲鎖定於該熱絕緣構件之一外圓周表面上之鎖定部分。 The present invention is the heat treatment furnace, wherein each of the connecting plates has a locking portion to be locked to an outer circumferential surface of one of the heat insulating members.
本發明係該熱處理爐，其中該等連接板之每一者具有一被押入該熱絕緣構件中而固定於其中之固定件。 The present invention is the heat treatment furnace wherein each of the connecting plates has a fixing member that is inserted into the heat insulating member and fixed therein.
本發明係該熱處理爐，其中該等連接板之每一者具有一固持該加熱電阻器之波峰部分之防落下銷。 The present invention is the heat treatment furnace, wherein each of the connection plates has a drop prevention pin that holds a peak portion of the heating resistor.
本發明係該熱處理表面，其中該熱絕緣構件具有一支撐該加熱電阻器之波峰部分之一下部以防止其落下之防落下板。 The present invention is the heat-treated surface, wherein the heat insulating member has an anti-drop plate that supports a lower portion of one of the crest portions of the heating resistor to prevent it from falling.
本發明係一直立式熱處理裝置，其包括：一熱處理爐，其包含：一長形處理容器，其用於容納一待處理物件及對該待處理物件執行一熱製程，其中打開該處理容器之一下端以界定一爐開口；及一圓筒形加熱器，其圍繞該處理容器之一外圓周設置以用於加熱該待處理物件；蓋構件，其用於閉合該爐開口；一固持件，其置於該蓋構件上，該固持件以疊層狀方式固持複數個待處理物件；及一提升機構，其可提升及降下該蓋構件以打開及閉合該蓋構件，且將該固持件裝載至該處理容器及自該處理容器卸載該固持件；其中該加熱器包含一圓筒形熱絕緣構件及沿該熱絕緣構件之一內圓周表面佈置之加熱電阻器，該等加熱電阻器之每一者皆係由一被彎曲成一具有波峰部分及波谷部分之 波形之帶狀構件所形成，且銷構件以其間相距合適間隔佈置於該熱絕緣構件中，該等銷構件固持該加熱電阻器以使該加熱電阻器可在該加熱器之一徑向方向上移動。 The present invention is a vertical heat treatment apparatus comprising: a heat treatment furnace comprising: an elongated processing container for accommodating an object to be processed and performing a thermal process on the object to be processed, wherein the processing container is opened a lower end to define a furnace opening; and a cylindrical heater disposed around an outer circumference of one of the processing containers for heating the object to be treated; a cover member for closing the furnace opening; a holding member Laying on the cover member, the holding member holds a plurality of objects to be processed in a stacked manner; and a lifting mechanism for lifting and lowering the cover member to open and close the cover member, and loading the holder to Disposing the holder from the processing container; wherein the heater comprises a cylindrical heat insulating member and a heating resistor disposed along an inner circumferential surface of one of the heat insulating members, each of the heating resistors All of them are bent into a portion having a peak portion and a trough portion. a wave-shaped strip member is formed, and the pin members are disposed in the heat insulating member at appropriate intervals therebetween, the pin members holding the heating resistor such that the heating resistor is radially in a direction of the heater mobile.
本發明係該直立式熱處理裝置，其中將該等銷構件之每一者形成為一具有一對用於支撐該加熱電阻器之波谷部分)之支腳部分之U形，該等個別支腳部分係由內側至外側地通過該熱絕緣構件，且該等個別支腳部分彎曲於該外側上以鎖定於該熱絕緣構件之一外圓周表面上。 The present invention is the vertical heat treatment apparatus, wherein each of the pin members is formed into a U shape having a pair of leg portions for supporting a valley portion of the heating resistor, and the individual leg portions The heat insulating member is passed from the inside to the outside, and the individual leg portions are bent on the outer side to be locked to the outer circumferential surface of one of the heat insulating members.
本發明係該直立式熱處理裝置，其中複數個圓周連續凹槽區段係以其間相距合適間隔而垂直形成於該熱絕緣構件之該內圓周表面中，且該等加熱電阻器之整體或一部分係被收容於該等凹槽區段中。 The present invention is the vertical heat treatment apparatus, wherein a plurality of circumferential continuous groove sections are vertically formed in the inner circumferential surface of the heat insulating member at an appropriate interval therebetween, and the whole or a part of the heating resistors It is housed in the groove sections.
本發明係該直立式熱處理裝置，其中複數個強制式冷卻空氣吹風孔係以其間相距合適間隔而以圓周方式形成於該熱絕緣構件中以在該等垂直毗鄰之加熱電阻器間之一位置處自內側至外側地通過該熱絕緣構件。 The present invention is the vertical heat treatment apparatus, wherein a plurality of forced cooling air blowing holes are circumferentially formed in the heat insulating member at a proper interval therebetween to be at a position between the vertically adjacent heating resistors The heat insulating member is passed from the inside to the outside.
本發明係該直立式熱處理裝置，其中該熱絕緣構件被分割成一右半部分及一左半部分，在該等部分之間具有縱向延伸分割表面，該等加熱電阻器之每一者亦分割成對應於該熱絕緣構件之一右半部分及一左半部分，一個加熱電阻器與垂直毗鄰於其之另一加熱電阻器係藉由連接板而在端部相互連接，且該等連接板係設置於該熱絕緣構件之該分割表面部分上。 The present invention is the vertical heat treatment apparatus, wherein the heat insulating member is divided into a right half portion and a left half portion, and a longitudinally extending divided surface is provided between the portions, and each of the heating resistors is also divided into Corresponding to one of the right half portion and the left half of the heat insulating member, a heating resistor and another heating resistor vertically adjacent thereto are connected to each other at the ends by the connecting plate, and the connecting plates are connected And disposed on the divided surface portion of the thermal insulation member.
本發明係該直立式熱處理裝置，其中該等連接板之每一 者係藉助一由銷形成之固定構件而固定於該分割表面部分上。 The present invention is the vertical heat treatment device, wherein each of the connecting plates The member is fixed to the divided surface portion by means of a fixing member formed of a pin.
本發明係該直立式熱處理裝置，其中該等連接板之每一者具有一欲鎖定於該熱絕緣構件之一外圓周表面上之鎖定部分。 The present invention is the vertical heat treatment apparatus, wherein each of the connecting plates has a locking portion to be locked to an outer circumferential surface of one of the heat insulating members.
本發明係該直立式熱處理裝置，其中該等連接板之每一者具有一被押入該熱絕緣構件中而固定於其中之固定件。 The present invention is the vertical heat treatment apparatus, wherein each of the connecting plates has a fixing member that is inserted into the heat insulating member and fixed therein.
本發明係該直立式熱處理裝置，其中該等連接板之每一者具有一固持該加熱電阻器之波峰部分之防落下銷。 The present invention is the vertical heat treatment apparatus, wherein each of the connecting plates has a drop preventing pin that holds a peak portion of the heating resistor.
本發明係該直立式熱處理裝置，其中該熱絕緣構件具有一支撐該加熱電阻器之波峰部分之一下部以防止其落下之防落下板。 The present invention is the vertical heat treatment apparatus, wherein the heat insulating member has a falling prevention plate that supports a lower portion of a peak portion of the heating resistor to prevent it from falling.
根據本發明，該加熱電阻器(其係藉由使一帶狀加熱電阻器形成一波形的方式製造而成)係以一曝露方式沿該熱絕緣構件之內圓周表面設置。因此，可快速地增加及降低溫度，且可達成耐久性改良及成本減小。 According to the present invention, the heating resistor (which is manufactured by forming a strip-shaped heating resistor in a wave shape) is disposed along the inner circumferential surface of the heat insulating member in an exposed manner. Therefore, the temperature can be rapidly increased and decreased, and durability improvement and cost reduction can be achieved.
將參照附圖詳細闡釋實施本發明之最佳模式。圖l係一示意性顯示本發明之一直立式熱處理裝置之實施例之縱向剖視圖。圖2係一圖1中之一部分A之放大剖視圖。圖3係一部分A之放大縱視圖。圖4係一加熱元件之平面圖。圖5係一加熱元件之側視圖。 The best mode for carrying out the invention will be explained in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a longitudinal cross-sectional view schematically showing an embodiment of an upright vertical heat treatment apparatus of the present invention. Figure 2 is an enlarged cross-sectional view of a portion A of Figure 1. Figure 3 is an enlarged longitudinal view of a portion A. Figure 4 is a plan view of a heating element. Figure 5 is a side view of a heating element.
圖1顯示一直立式熱處理裝置1，其係一類半導體製造裝置。熱處理裝置1包含一直立式熱處理爐2，其可同時容納 若干待處理物件(例如，半導體晶圓w)且可對該等待處理物件執行一熱製程，例如，一氧化製程、一擴散製程及一經減小壓力之CVD製程。熱處理爐2包含：一處理容器3(亦被稱為"反應管")，其用於容納晶圓w及對晶圓w執行一熱製程；及一圓筒形加熱器5(加熱器件)，其圍繞處理容器3之一外圓周設置以用於加熱晶圓w。 Fig. 1 shows a vertical heat treatment apparatus 1 which is a type of semiconductor manufacturing apparatus. The heat treatment apparatus 1 comprises an upright vertical heat treatment furnace 2, which can accommodate at the same time A plurality of objects to be processed (eg, semiconductor wafers w) and a thermal process can be performed on the object to be processed, for example, an oxidation process, a diffusion process, and a reduced pressure CVD process. The heat treatment furnace 2 comprises: a processing vessel 3 (also referred to as a "reaction tube") for accommodating the wafer w and performing a thermal process on the wafer w; and a cylindrical heater 5 (heating device), The outer circumference of one of the processing containers 3 is disposed for heating the wafer w.
熱處理裝置1亦包含一基板6，基板6上安裝有加熱器5。基板6具有一開口7，處理容器3穿過該開口自下向上***。開口7配備有一熱絕緣構件(未示出)，其堵塞基板6與處理容器3之間的一間隙。 The heat treatment apparatus 1 also includes a substrate 6 on which the heater 5 is mounted. The substrate 6 has an opening 7 through which the processing container 3 is inserted from the bottom to the top. The opening 7 is provided with a heat insulating member (not shown) which blocks a gap between the substrate 6 and the processing container 3.
處理容器3由石英製成且具有長形圓筒形狀。處理容器3之一上端閉合，而打開處理容器3之一下端以界定一爐開口3a。環繞處理容器3之打開端形成一向外凸緣3b。基板6藉由一凸緣壓緊構件(未示出)來支撐凸緣3b。在所圖解說明之處理容器3之一下部中配備有：一引入埠(入口)8，其用於將一製程氣體及/或惰性氣體引入至處理容器3中；及一排放埠(出口，未示出)，其用於排放處理容器3中之氣體。一氣體供應源連接至引入埠8。連接至該排放埠的係一具有真空幫浦之排氣系統，該真空幫浦能夠控制處理容器3中之壓力而減小至(例如)10 Torr至10-8 Torr。 The processing container 3 is made of quartz and has an elongated cylindrical shape. One of the upper ends of the processing container 3 is closed, and one of the lower ends of the processing container 3 is opened to define a furnace opening 3a. An open end 3b is formed around the open end of the processing container 3. The substrate 6 supports the flange 3b by a flange pressing member (not shown). Provided in a lower portion of the illustrated processing vessel 3 is: an introduction port (inlet) 8 for introducing a process gas and/or an inert gas into the process vessel 3; and a discharge port (outlet, not Shown) for discharging the gas in the treatment vessel 3. A gas supply is connected to the introduction port 8. Connected to the discharge port is an exhaust system having a vacuum pump capable of controlling the pressure in the process vessel 3 to be reduced to, for example, 10 Torr to 10 -8 Torr.
在處理容器3下方，設置有一用於閉合處理容器3之下端開口(爐開口)3a之蓋構件10。蓋構件10可藉由一提升機構10A來垂直移動。蓋構件10之一上部上設置有用於爐開口之熱保持組件(例如，一熱保持管11)。熱保持管11之一上 部上設置有一作為一固持件之石英船12，其能夠以晶圓之間之預定垂直間隔來固持若干(例如，約100至150個)直徑例如為300 mm之晶圓w。蓋構件10與一旋轉機構13相連接，旋轉機構13使船12以其軸為中心旋轉。船12係藉由蓋構件10之向下移動而自處理容器3卸載至一下裝載區15。在置換晶圓w後，藉由蓋構件10之向上移動而將船12裝載至處理容器3中。 Below the processing container 3, a cover member 10 for closing the opening (furnace opening) 3a of the lower end of the processing container 3 is provided. The cover member 10 can be vertically moved by a lifting mechanism 10A. A heat retaining assembly (e.g., a heat retaining tube 11) for the furnace opening is disposed on an upper portion of the cover member 10. One of the heat retaining tubes 11 A quartz vessel 12 is provided as a holder for holding a plurality (e.g., about 100 to 150) of wafers w having a diameter of, for example, 300 mm at a predetermined vertical interval between the wafers. The cover member 10 is coupled to a rotating mechanism 13 that rotates the boat 12 about its axis. The boat 12 is unloaded from the processing vessel 3 to the lower loading zone 15 by the downward movement of the cover member 10. After the wafer w is replaced, the boat 12 is loaded into the processing vessel 3 by the upward movement of the cover member 10.
如圖2至5中所示，加熱器5包含：一圓筒形熱絕緣構件16；複數個凹槽樣棚架區段17，其以一疊層狀方式軸向(在圖式中為垂直)形成於熱絕緣構件16之一內圓周表面上；及加熱元件(加熱導線、加熱電阻器)18，其沿個別棚架區段17設置。該熱絕緣構件係由含有例如氧化矽、氧化鋁或矽酸鋁之無機纖維製成。鑒於加熱元件之安裝及加熱器之裝配，較佳之情形係將熱絕緣構件分割成一右半部分及一左半部分，該等部分之間具有縱向延伸分割表面16a。 As shown in Figures 2 to 5, the heater 5 comprises: a cylindrical heat insulating member 16; a plurality of groove-like scaffolding sections 17 which are axially arranged in a stack (vertical in the drawing) It is formed on an inner circumferential surface of one of the heat insulating members 16; and a heating element (heating wire, heating resistor) 18 which is disposed along the individual scaffolding section 17. The heat insulating member is made of an inorganic fiber containing, for example, cerium oxide, aluminum oxide or aluminum silicate. In view of the mounting of the heating element and the assembly of the heater, it is preferred to divide the thermally insulating member into a right half and a left half, with longitudinally extending dividing surfaces 16a therebetween.
加熱元件18係由一經形成(彎曲)而具有一波形之帶狀構件18A製成。波紋(波形)式加熱元件18係由含有例如鐵(Fe)、鉻(Cr)及鋁(Al)之合金(所謂康達材料)製成。加熱元件18厚度約為1 mm至2 mm，其寬度約為14 mm至18 mm。波形之幅值約為11 mm至15 mm，且其間距p約為28至32 mm。加熱元件18之波形之頂角θ約為90度。頂點部分(亦稱作"伸出部分"或"波峰部分")18a經受一R彎曲製程。此允許加熱元件18在熱絕緣構件16之棚架區段17上進行某一圓 周移動，且增強彎曲部分之強度。 The heating element 18 is made of a strip-like member 18A having a wave shape formed (bent). The corrugated (waveform) heating element 18 is made of an alloy containing iron (Fe), chromium (Cr), and aluminum (Al) (so-called Coanda material). The heating element 18 has a thickness of about 1 mm to 2 mm and a width of about 14 mm to 18 mm. The amplitude of the waveform is approximately 11 mm to 15 mm and the pitch p is approximately 28 to 32 mm. The apex angle θ of the waveform of the heating element 18 is about 90 degrees. The apex portion (also referred to as "extension portion" or "crest portion") 18a is subjected to an R bending process. This allows the heating element 18 to perform a circle on the scaffolding section 17 of the thermally insulating member 16. The circumference moves and the strength of the curved portion is enhanced.
銷構件以其間相距合適間隔佈置於熱絕緣構件16中。銷構件20固持加熱元件18以使加熱元件18可徑向移動，而同時防止加熱元件18自棚架區段17掉落或脫離。在圓筒形熱絕緣構件16之一內圓周表面中具有複數個凹槽區段21，該等凹槽區段以其間相距預定軸向間距形成為與熱絕緣構件16同心，以便於在上凹槽區段21與毗鄰於該上凹槽區段之下凹槽區段21之間形成圓周連續環形棚架區段17。在凹槽區段21中之加熱元件18之上方及下方形成有空隙，且在凹槽區段21之後壁21a與加熱元件18之間形成有另一空隙。此等空隙足以允許加熱元件18之熱膨脹、熱收縮及徑向移動。另外，由於此等空隙，在強制空氣冷卻操作期間所供應之冷卻空氣可到達並通過加熱元件18之後側，藉此可有效地冷卻加熱元件18。 The pin members are disposed in the heat insulating member 16 at appropriate intervals therebetween. The pin member 20 holds the heating element 18 to allow the heating element 18 to move radially while preventing the heating element 18 from falling or disengaging from the scaffolding section 17. In the inner circumferential surface of one of the cylindrical heat insulating members 16, there are a plurality of groove segments 21 formed at a predetermined axial distance therebetween so as to be concentric with the heat insulating member 16 so as to be concave The groove section 21 forms a circumferential continuous annular shelving section 17 between the groove section 21 adjacent to the upper groove section. A gap is formed above and below the heating element 18 in the groove section 21, and another gap is formed between the wall 21a and the heating element 18 after the groove section 21. These voids are sufficient to allow thermal expansion, thermal contraction, and radial movement of the heating element 18. Additionally, due to such voids, the cooling air supplied during the forced air cooling operation can reach and pass through the rear side of the heating element 18, whereby the heating element 18 can be effectively cooled.
銷構件20包含：一近端部分20a，其用於將波谷部分18b支撐於加熱元件18之一內圓周表面之側上；及一對支腳部分20b，其自內側到外側通過熱絕緣材料16。銷構件20經形成而在側視圖中具有一大致U形。該對支腳部分20b之端部分20c在相反方向上彎曲以便鎖定於熱絕緣構件16之一外圓周表面上。銷構件20較佳由與加熱元件18材料相同之材料製成。如圖3中所示，較佳之情形係加熱元件18容納於每一凹槽區段21中，以使加熱元件18之徑向外側半部分收容於凹槽區段21中，而其徑向內側半部分曝露在凹槽區段21之外側。 The pin member 20 includes a proximal end portion 20a for supporting the trough portion 18b on the side of the inner circumferential surface of one of the heating elements 18, and a pair of leg portions 20b that pass the thermal insulating material 16 from the inside to the outside. . The pin member 20 is formed to have a generally U-shape in a side view. The end portions 20c of the pair of leg portions 20b are bent in opposite directions to be locked to the outer circumferential surface of one of the heat insulating members 16. The pin member 20 is preferably made of the same material as the heating element 18. As shown in Fig. 3, it is preferred that the heating element 18 is received in each of the groove sections 21 such that the radially outer half of the heating element 18 is received in the groove section 21 while radially inward thereof. The half portion is exposed on the outer side of the groove section 21.
如圖2及3中所示，不同於一以連續方式螺旋且垂直延伸之習用加熱元件，設置於作為一台階之每一棚架區段17上之加熱元件18端接於每一台階處。因此，可防止加熱元件18因其自身重量向下移動而堆積起來。此外，如圖5中所示，加熱元件18結合(連接)於毗鄰之上方台階與下方台階之間，且在該等台階中每隔複數個台階(圖式中為7個台階)串聯連接。此外，對於包含該複數個台階之每一群組，欲連接至電極之端接板22連接至最低台階之一開始端18e及最高台階之一死端18r。因此，加熱器5在熱處理爐2中被垂直分割成複數個區域，藉此可獨立地控制每一區域之溫度。 As shown in Figures 2 and 3, unlike a conventional heating element that spirals and extends vertically in a continuous manner, a heating element 18 disposed on each of the scaffolding sections 17 as a step terminates at each step. Therefore, it is possible to prevent the heating element 18 from accumulating due to its own weight moving downward. Further, as shown in FIG. 5, the heating element 18 is coupled (connected) between the adjacent upper step and the lower step, and is connected in series every plurality of steps (7 steps in the drawing) in the steps. Further, for each group including the plurality of steps, the termination plate 22 to be connected to the electrode is connected to one of the lowest step start end 18e and one of the highest step dead end 18r. Therefore, the heater 5 is vertically divided into a plurality of regions in the heat treatment furnace 2, whereby the temperature of each region can be independently controlled.
儘管加熱元件18可沿熱絕緣構件16之棚架區段17或凹槽區段21環形地定位，但如圖4中所示，為易於組裝加熱元件18，較佳係將加熱元件18形成一等分形狀(半圓形狀)以對應於沿分割表面16a分割成兩半之熱絕緣構件16。舉例而言，圖4及5顯示加熱元件18之可能連接(導線連接)圖案。在此連接圖案中，加熱元件18在個別台階處之相對端18e、18f、18g...及18r係彎曲成沿徑向向外伸出，且端接板22及22分別接合至第一台階(最低台階)之開始端(右端)18e及最高台階之死端(左端)18r。另外，為串聯連接彼此垂直毗鄰之加熱電阻器18，毗鄰加熱電阻器18之端係藉由連接板23而依序相互連接。即，第一台階之死端18f與第二台階之開始端18g係藉由連接板23相互連接，且第二台階之死端18h與第三台階之開始端18i係藉由另一連接板 23相互連接。連接板23係定位於熱絕緣構件16之分割表面16a上。 Although the heating element 18 can be annularly positioned along the scaffolding section 17 or the groove section 21 of the thermal insulation member 16, as shown in Figure 4, to facilitate assembly of the heating element 18, the heating element 18 is preferably formed into a The aliquot shape (semicircular shape) corresponds to the heat insulating member 16 divided into two halves along the divided surface 16a. For example, Figures 4 and 5 show possible connection (wire connection) patterns of the heating elements 18. In this connection pattern, the heating elements 18 are bent at opposite ends 18e, 18f, 18g, ... and 18r at respective steps to project radially outward, and the termination plates 22 and 22 are joined to the first step, respectively. The start end (right end) 18e of the (lowest step) and the dead end (left end) 18r of the highest step. Further, in order to connect the heating resistors 18 adjacent to each other in series, the ends adjacent to the heating resistors 18 are sequentially connected to each other by the connecting plate 23. That is, the dead end 18f of the first step and the beginning end 18g of the second step are connected to each other by the connecting plate 23, and the dead end 18h of the second step and the starting end 18i of the third step are connected by another connecting plate. 23 are connected to each other. The connecting plate 23 is positioned on the divided surface 16a of the heat insulating member 16.
加熱元件18之端與連接板23係藉由銲接而相互連接。端接板22經定位係沿徑向通過絕緣構件16。為防止連接板23與加熱元件18之端間的一銲接部分經受高溫，較佳係將連接板23隱埋於熱絕緣構件16中。除上述連接圖案外，亦可存在加熱元件18之其他連接圖案。鑒於防止端接板22與連接板23融合及限制自其熱釋放，端接板22及連接板23較佳係由與加熱元件18材料相同之材料製成，且使端接板22及連接板23形成以具有一帶有預定截面積之板樣形狀。 The ends of the heating element 18 and the connecting plate 23 are connected to each other by soldering. The termination plate 22 passes through the insulating member 16 in a radial direction via the positioning mechanism. In order to prevent a welded portion between the connecting plate 23 and the end of the heating element 18 from being subjected to a high temperature, it is preferable to bury the connecting plate 23 in the heat insulating member 16. In addition to the connection patterns described above, other connection patterns of the heating elements 18 may also be present. In view of preventing the termination plate 22 from merging with the connection plate 23 and limiting the heat release therefrom, the termination plate 22 and the connection plate 23 are preferably made of the same material as the heating element 18, and the termination plate 22 and the connection plate are made. 23 is formed to have a plate-like shape with a predetermined cross-sectional area.
為維持熱絕緣構件16之形狀及加固熱絕緣構件16，如圖1中所示，熱絕緣構件16之一外圓周表面較佳覆蓋有一由金屬(例如，不銹鋼)製成之外殼28。此外，外殼28之一外圓周表面覆蓋有一水冷卻套30以防止熱自加熱器5洩漏至外側。熱絕緣構件16之頂部覆蓋有一上熱絕緣構件31，且一覆蓋外殼28之頂部(上端部)之不銹鋼頂板32係設置於上熱絕緣構件31之上部上。 To maintain the shape of the heat insulating member 16 and to reinforce the heat insulating member 16, as shown in FIG. 1, the outer circumferential surface of one of the heat insulating members 16 is preferably covered with a casing 28 made of metal (for example, stainless steel). Further, the outer circumferential surface of one of the outer casings 28 is covered with a water cooling jacket 30 to prevent heat from leaking from the heater 5 to the outside. The top of the thermal insulation member 16 is covered with an upper thermal insulation member 31, and a stainless steel top plate 32 covering the top (upper end portion) of the outer casing 28 is disposed on the upper portion of the upper thermal insulation member 31.
為在一熱製程之後使晶圓之溫度快速下降以加速製程或改善通量，加熱器5配備有：一熱排放系統35，其係用於向外排放空氣於加熱器5與處理容器3間之空間33中；及一強制空氣冷卻單元36，其係藉由將一常溫(20℃至30℃)之空氣引入空間33中而強制冷卻處理容器3。熱排放系統35主要由以下各物所構成：出口37，其形成於加熱器5之一上部中；及一熱排放管(未示出)，其用於連接出口37及一 工廠空氣排放系統(未示出)。該熱排放管具有一空氣排放鼓風機及一換熱器(未示出)。 In order to rapidly lower the temperature of the wafer after a thermal process to speed up the process or improve the flux, the heater 5 is equipped with: a heat discharge system 35 for discharging air between the heater 5 and the processing container 3 And a forced air cooling unit 36 for forcibly cooling the processing container 3 by introducing a normal temperature (20 ° C to 30 ° C) air into the space 33. The heat discharge system 35 is mainly composed of an outlet 37 formed in an upper portion of the heater 5, and a heat discharge pipe (not shown) for connecting the outlet 37 and a Factory air discharge system (not shown). The heat discharge pipe has an air discharge blower and a heat exchanger (not shown).
強制空氣冷卻單元36具有：複數個環形路徑38，其在一高度方向上形成於熱絕緣構件16與外殼28之間；及複數個強制式冷卻空氣吹風孔40，其形成於熱絕緣構件16中，空氣經由該等孔在一相對於熱絕緣構件16中心呈傾斜方向上自個別環形路徑38吹入空間33中以在空間33中沿其一圓周方向產生漩渦。環形路徑38各可藉由將一帶狀或環形熱絕緣構件41附接至熱絕緣構件16之外圓周表面，或藉由將熱絕緣構件16之外圓周表面切割成環形形成。如圖6(a)及6(b)中所示，空氣吹風孔40較佳係形成於熱絕緣構件16中，以自內側至外側地徑向通過設置於垂直毗鄰加熱元件18間之棚架區段17。由於空氣吹風孔40係形成於棚架區段17中，因此可將空氣吹入空間33中而不會對加熱元件18形成干擾。 The forced air cooling unit 36 has a plurality of annular paths 38 formed between the heat insulating member 16 and the outer casing 28 in a height direction, and a plurality of forced cooling air blowing holes 40 formed in the heat insulating member 16 The air is blown into the space 33 from the individual annular paths 38 in an oblique direction with respect to the center of the heat insulating member 16 via the holes to generate a vortex in a circumferential direction in the space 33. The annular paths 38 may each be formed by attaching a strip or annular heat insulating member 41 to the outer circumferential surface of the heat insulating member 16, or by cutting the outer circumferential surface of the heat insulating member 16 into a ring shape. As shown in FIGS. 6(a) and 6(b), the air blowing holes 40 are preferably formed in the heat insulating member 16 to radially pass through the scaffolding disposed between the vertically adjacent heating elements 18 from the inside to the outside. Section 17. Since the air blowing holes 40 are formed in the scaffolding section 17, air can be blown into the space 33 without interfering with the heating element 18.
一單個共用供應管道(未示出，其用於將一冷卻流體分配至個別環形路徑38中)沿外殼28之一高度方向佈置於其外圓周表面上。外殼28具有使該供應管道與個別環形路徑38連通之連通孔。一冷卻流體供應源(例如，通風機，未示出)藉由一開關閥連接至供應管道，該供應源將空氣作為一冷卻流體吸入一清潔室並壓力喂送該冷卻流體。 A single common supply conduit (not shown for dispensing a cooling fluid into the individual annular paths 38) is disposed on its outer circumferential surface along one of the heights of the outer casing 28. The outer casing 28 has a communication hole that allows the supply duct to communicate with the individual annular path 38. A cooling fluid supply (e.g., a ventilator, not shown) is coupled to the supply conduit by a switching valve that draws air as a cooling fluid into a clean room and pressure feeds the cooling fluid.
如上所構造之熱處理爐2或直立式熱處理裝置1包含：處理容器3，其用於容納晶圓w及對晶圓w執行一熱製程；及圓筒形加熱器5，其圍繞處理容器3之圓周設置以用於加熱 晶圓w。加熱器5具有：圓筒形熱絕緣構件16；凹槽樣棚架區段17，其以疊層狀方式軸向形成於熱絕緣構件16之內圓周表面上及加熱元件18，其沿個別棚架區段17設置。藉由將一帶狀加熱元件形成為一波紋形狀來製造加熱元件18。銷構件20以其間相距合適間隔佈置於熱絕緣構件16中，銷構件20固持加熱元件18以使加熱元件18可在加熱器5之徑向方向上移動，同時防止加熱元件18自棚架區段17上掉落。因此，可將波紋式加熱元件18以一曝露方式設置於棚架區段17之每一者上，該等棚架區段形成於熱絕緣構件16之內圓周表面上。因此，可快速增加及降低處理容器3中之溫度，以及可達成耐久性改良及成本減小。在使用波紋式加熱元件18之情形下，可有效增加元件表面積之比率。因此，可相對減小加熱元件上之一負載(其係由加熱器表面之溫度減小所致)，以由此抑制加熱元件之破損。因此，可給加熱元件18施加大功率以快速增加溫度。此外，由於可抑制斷開，因此可獲得耐久性改良，亦即，獲得一較長之使用壽命。此外，可使用價格便宜的康達導線來形成加熱元件18，且因此可達成成本減小。 The heat treatment furnace 2 or the vertical heat treatment apparatus 1 configured as above includes: a processing container 3 for accommodating the wafer w and performing a thermal process on the wafer w; and a cylindrical heater 5 surrounding the processing container 3 Circumferential setting for heating Wafer w. The heater 5 has a cylindrical heat insulating member 16 and a groove-like scaffolding section 17 which is axially formed in a laminated manner on the inner circumferential surface of the heat insulating member 16 and the heating element 18, which is along the individual shed. The shelf section 17 is provided. The heating element 18 is fabricated by forming a strip of heating element into a corrugated shape. The pin members 20 are disposed in the thermal insulation member 16 at appropriate intervals therebetween, the pin member 20 holding the heating element 18 to move the heating element 18 in the radial direction of the heater 5 while preventing the heating element 18 from the scaffolding section Dropped on the 17th. Accordingly, the corrugated heating elements 18 can be disposed on each of the scaffolding sections 17 in an exposed manner, the scaffolding sections being formed on the inner circumferential surface of the thermally insulating member 16. Therefore, the temperature in the processing container 3 can be rapidly increased and decreased, and durability improvement and cost reduction can be achieved. In the case where the corrugated heating element 18 is used, the ratio of the surface area of the element can be effectively increased. Therefore, one of the loads on the heating element, which is caused by a decrease in the temperature of the heater surface, can be relatively reduced to thereby suppress breakage of the heating element. Therefore, high power can be applied to the heating element 18 to rapidly increase the temperature. Further, since the disconnection can be suppressed, durability improvement can be obtained, that is, a long service life can be obtained. In addition, the inexpensive heating of the Coanda wire can be used to form the heating element 18, and thus a cost reduction can be achieved.
在熱絕緣構件16中形成強制式冷卻空氣吹風孔40以自內側至外側地通過設置於垂直毗鄰之加熱元件18之間的棚架區段17。因此，可輕易地自其吹入空氣而不會對加熱元件18形成干擾。熱絕緣構件16沿縱向延伸分割表面16a分割成兩部分，且加熱元件18之每一者亦對應於熱絕緣構件來分割。因此，可容易地將加熱元件與熱絕緣構件組裝在一 起，亦即，可改良其裝配。 A forced cooling air blow hole 40 is formed in the heat insulating member 16 to pass through the scaffolding section 17 disposed between the vertically adjacent heating elements 18 from the inside to the outside. Therefore, air can be easily blown from it without interfering with the heating element 18. The thermally insulating member 16 is divided into two portions along the longitudinally extending dividing surface 16a, and each of the heating elements 18 is also divided corresponding to the thermally insulating member. Therefore, the heating element and the heat insulating member can be easily assembled in one That is, the assembly can be improved.
圖7係一顯示用於在加熱電阻器之端上將連接板固定至熱絕緣構件之結構之實例之視圖。圖7(a)係該結構之主要部分放大透視圖，且圖7(b)係該固定狀態之剖視圖。為抑制或防止連接板23(加熱元件18在此彎曲(U形回轉))之變形，藉助一例如銷之固定構件45(圖解說明為一U形銷))，將連接板23固定至熱絕緣構件16之端(分割表面)16a上。另外，連接板23配備有一鎖定部分46以鎖定於熱絕緣構件16之外圓周表面上。 Fig. 7 is a view showing an example of a structure for fixing a connecting plate to a heat insulating member on the end of a heating resistor. Fig. 7 (a) is an enlarged perspective view of a main portion of the structure, and Fig. 7 (b) is a cross-sectional view of the fixed state. In order to suppress or prevent deformation of the connecting plate 23 (where the heating element 18 is bent (U-turn)), the connecting plate 23 is fixed to the thermal insulation by means of a fixing member 45 (illustrated as a U-shaped pin) such as a pin. The end of the member 16 (divided surface) 16a. Further, the connecting plate 23 is provided with a locking portion 46 to be locked to the outer circumferential surface of the heat insulating member 16.
圖8(a)及8(b)係顯示用於在加熱電阻器之端上將連接板固定至熱絕緣構件之結構之另一實例之剖視圖。連接板23係藉助固定構件45而固定至熱絕緣構件16之端上。另外，一輔助熱絕緣構件47經設置以覆蓋連接板23。輔助熱絕緣構件47設置於熱絕緣構件16之端(分割表面)之間的一空間中，或者填充至該空間中。除銷以外，固定構件45還可係一管、一圓形棒或一方形棒等。 8(a) and 8(b) are cross-sectional views showing another example of a structure for fixing a connecting plate to a heat insulating member on the end of a heating resistor. The connecting plate 23 is fixed to the end of the heat insulating member 16 by means of a fixing member 45. In addition, an auxiliary heat insulating member 47 is provided to cover the connecting plate 23. The auxiliary heat insulating member 47 is provided in a space between the ends (divided surfaces) of the heat insulating member 16 or filled into the space. In addition to the pin, the fixing member 45 may be a tube, a round bar or a square bar or the like.
圖9(a)及9(b)係顯示用於在加熱電阻器之端上將連接板固定至熱絕緣構件之結構之再一實例之剖視圖。連接板23具有一固定件48，該固定件被押入熱絕緣構件16或輔助熱絕緣構件47中以固定在其中。例如，固定件48係藉由將連接板23之末端彎曲成一直角而形成。輔助熱絕緣構件47設置於熱絕緣構件16之端上以覆蓋連接板23。固定件48可押入至輔助熱絕緣構件47中(見圖9(a))。然而，將固定件48押入至熱絕緣構件16中更佳(見圖9(b))。 9(a) and 9(b) are cross-sectional views showing still another example of a structure for fixing a connecting plate to a heat insulating member on the end of a heating resistor. The connecting plate 23 has a fixing member 48 which is pushed into the heat insulating member 16 or the auxiliary heat insulating member 47 to be fixed therein. For example, the fixing member 48 is formed by bending the end of the connecting plate 23 into a right angle. An auxiliary heat insulating member 47 is provided on the end of the heat insulating member 16 to cover the connecting plate 23. The fixing member 48 can be pushed into the auxiliary heat insulating member 47 (see Fig. 9(a)). However, it is preferable to press the fixing member 48 into the heat insulating member 16 (see Fig. 9(b)).
圖10係一顯示一用於藉由一防落下銷固持加熱電阻器之伸出部分之結構之視圖。圖10(a)係該結構之局部透視圖，且圖10(b)係該防落下銷之示意性透視圖。熱絕緣構件16配備有一防落下銷49，其將加熱元件18帶有波紋的合適伸出部分18a固持在熱絕緣構件16之內圓周表面內側以防止其落下。防落下銷49係藉由彎曲一導線桿(例如，鋼桿)而形成。將一個導線桿彎取成兩個部分，且將經彎曲之導線桿進一步彎曲成一U形以提供U形部分。放大一末端彎曲部分以形成一環形或一大致三角形之放大部分49a。加熱元件18之伸出部分18a收容於防落下銷49之U形部分49b之內側中，而下放大部分49a定位於熱絕緣構件16附近，例如，定位在凹槽區段21或棚架區段17上方。防落下銷49之上相對端部分49c及49c穿透熱絕緣構件16以自其外圓周表面伸出。藉由在左右方向上彎曲相對端部分49c及49c以形成鎖定部分，可將防落下銷49鎖定在熱絕緣構件16之外圓周表面上。 Fig. 10 is a view showing a structure for holding a projecting portion of a heating resistor by an anti-drop pin. Figure 10 (a) is a partial perspective view of the structure, and Figure 10 (b) is a schematic perspective view of the drop prevention pin. The heat insulating member 16 is provided with a fall prevention pin 49 which holds a suitable projecting portion 18a having a corrugation of the heating member 18 inside the inner circumferential surface of the heat insulating member 16 to prevent it from falling. The drop prevention pin 49 is formed by bending a wire rod (for example, a steel rod). A wire rod is bent into two portions, and the bent wire rod is further bent into a U shape to provide a U-shaped portion. The end bent portion is enlarged to form an annular portion or a substantially triangular enlarged portion 49a. The projecting portion 18a of the heating element 18 is received in the inner side of the U-shaped portion 49b of the drop prevention pin 49, and the lower enlarged portion 49a is positioned adjacent to the heat insulating member 16, for example, in the groove section 21 or the scaffolding section. 17 above. The opposite end portions 49c and 49c above the fall prevention pin 49 penetrate the heat insulating member 16 to protrude from the outer circumferential surface thereof. The falling prevention pin 49 can be locked on the outer circumferential surface of the heat insulating member 16 by bending the opposite end portions 49c and 49c in the left-right direction to form the locking portion.
藉由以上附接方式，防落下銷49係以其間相距合適間隔而在熱絕緣構件16之加熱元件18之圓周方向上設置，且在熱絕緣構件16軸向方向上在其半部分上設置成複數個(例如，三個)列。由於防落下銷49，可防止加熱元件18之落下及/或下垂，藉此可減小熱絕緣構件16之凹槽區段21之深度或其棚架區段(遮簷)17之伸出量。此外，可消除凹槽區段21及棚架區段17。 By the above attachment means, the fall prevention pins 49 are disposed in the circumferential direction of the heating element 18 of the heat insulating member 16 at appropriate intervals therebetween, and are disposed on the half portions thereof in the axial direction of the heat insulating member 16 A plurality of (for example, three) columns. Due to the fall prevention pin 49, the falling and/or sagging of the heating element 18 can be prevented, whereby the depth of the groove section 21 of the heat insulating member 16 or the amount of protrusion of the scaffolding section (concealer) 17 can be reduced. . Furthermore, the groove section 21 and the scaffolding section 17 can be eliminated.
圖11一顯示防落下銷之另一實例之透視圖。防落下銷49 可藉由以下方式形成：將一個導線桿彎曲成U形(見圖11(a))或將一個導線桿彎曲成兩個部分且再將經彎曲導線桿彎曲成一U形(見圖11(b))。相對端部分49c及49c經彎曲以形成鎖定部分。 Fig. 11 is a perspective view showing another example of the drop prevention pin. Fall prevention pin 49 It can be formed by bending a wire rod into a U shape (see Figure 11 (a)) or bending a wire rod into two parts and then bending the bent wire rod into a U shape (see Figure 11 (b). )). The opposite end portions 49c and 49c are bent to form a locking portion.
圖12係一顯示一用於藉由一防落下板固持加熱電阻器之伸出部分之結構之視圖。圖12(a)係該結構之局部透視圖，且圖12(b)係防落下板之示意性透視圖。熱絕緣構件16配備有一防落下板50，其將加熱元件18帶有波紋的合適伸出部分18a之下部支撐於熱絕緣構件16之內圓周表面內側以防止其落下。較佳地，防落下板50由陶瓷矩形板製成，且一尖頭部分50a(其可被擠推到熱絕緣構件中以固定在其中)形成於防落下板50的一個縱向端上。由於防落下板水平地支撐加熱構件18之伸出部分18a之下部，因此可防止加熱元件18之翻轉及/或下垂。因此，相似於上述實施例，可消除凹槽區段21及棚架區段17。 Fig. 12 is a view showing a structure for holding a projecting portion of a heating resistor by an anti-dropping plate. Figure 12 (a) is a partial perspective view of the structure, and Figure 12 (b) is a schematic perspective view of the fall prevention plate. The heat insulating member 16 is provided with a fall prevention plate 50 which supports the lower portion of the suitable projecting portion 18a with the corrugated heating member 18 inside the inner circumferential surface of the heat insulating member 16 to prevent it from falling. Preferably, the fall prevention plate 50 is made of a ceramic rectangular plate, and a tip portion 50a (which can be pushed into the heat insulating member to be fixed therein) is formed on one longitudinal end of the fall prevention plate 50. Since the fall prevention plate horizontally supports the lower portion of the protruding portion 18a of the heating member 18, the flipping and/or sagging of the heating member 18 can be prevented. Therefore, similar to the above embodiment, the groove section 21 and the scaffolding section 17 can be eliminated.
圖13係一顯示該熱絕緣構件另一實例之透視圖。由於熱膨脹及熱收縮所致之內部應力，存在加熱器5之熱絕緣構件16之內圓周表面遭受某些破裂之可能性。如圖13中所示，為避免此破裂，較佳之情形係在內圓周表面中軸向形成一狹縫42。此外，為順利地組裝加熱器，較佳在個別棚架區段17之下表面處垂直分割熱絕緣構件16。即，熱絕緣構件16較佳由複數個經垂直分割之塊16a構成。此結構便於加熱元件18在個別棚架區段17上之設置。也就是說，首先將一加熱元件18設置在第一分割塊16a之棚架區段17 上，然後在其上鋪設第二分割塊16a，並將一加熱元件18設置在第二分割塊16a之棚架區段17上，以此類推。因此，可獲得裝配改良。在此情況下，較佳之情形係在彼此垂直毗鄰的分割塊16a之相對表面中沿圓周形成一凹陷43a及一伸出部分43b(此二者可相互嚙合以進行定位)。 Figure 13 is a perspective view showing another example of the heat insulating member. Due to internal stress caused by thermal expansion and heat shrinkage, there is a possibility that the inner circumferential surface of the heat insulating member 16 of the heater 5 is subjected to some cracking. As shown in Fig. 13, in order to avoid this crack, it is preferable to form a slit 42 in the axial direction in the inner circumferential surface. Further, in order to smoothly assemble the heater, it is preferable to vertically divide the heat insulating member 16 at the lower surface of the individual scaffolding section 17. That is, the heat insulating member 16 is preferably composed of a plurality of vertically divided blocks 16a. This configuration facilitates the placement of the heating element 18 on the individual scaffolding section 17. That is, a heating element 18 is first placed in the scaffolding section 17 of the first dividing block 16a. Upper, then a second divided piece 16a is laid thereon, and a heating element 18 is placed on the scaffolding section 17 of the second divided piece 16a, and so on. Therefore, assembly improvement can be obtained. In this case, it is preferable to form a recess 43a and a projecting portion 43b circumferentially in the opposite surfaces of the divided blocks 16a which are vertically adjacent to each other (the two can be engaged with each other for positioning).
已參照圖式詳細闡述了本發明之實施例。然而，本發明並不限於上述相應實施例，且可在不背離本發明之範圍之情形下做各種修改及改變。例如，連接至處理容器之下端者可係一由抗熱金屬(例如，不銹鋼)製成之圓筒形歧管，其具有一入口管部分及一出口管部分。另外，該處理容器可係一雙管結構。 Embodiments of the present invention have been described in detail with reference to the drawings. However, the present invention is not limited to the above-described respective embodiments, and various modifications and changes can be made without departing from the scope of the invention. For example, the lower end of the processing vessel may be a cylindrical manifold made of a heat resistant metal (e.g., stainless steel) having an inlet tube portion and an outlet tube portion. Additionally, the processing vessel can be a double tube structure.
1‧‧‧直立式熱處理裝置 1‧‧‧Vertical heat treatment unit
2‧‧‧直立式熱處理爐 2‧‧‧Vertical heat treatment furnace
3‧‧‧處理容器 3‧‧‧Processing container
3a‧‧‧爐開口 3a‧‧‧ furnace opening
3b‧‧‧向外凸緣 3b‧‧‧ outward flange
5‧‧‧圓筒形加熱器 5‧‧‧Cylinder heater
6‧‧‧基板 6‧‧‧Substrate
7‧‧‧基板開口 7‧‧‧Substrate opening
8‧‧‧引入埠 8‧‧‧Introduction
10‧‧‧蓋構件 10‧‧‧Caps
10A‧‧‧提升機構 10A‧‧‧ Lifting Agency
11‧‧‧熱保持管 11‧‧‧Hot holding tube
12‧‧‧石英船 12‧‧‧Quartz ship
13‧‧‧旋轉機構 13‧‧‧Rotating mechanism
15‧‧‧下裝載區 15‧‧‧Unloading area
16‧‧‧圓筒形熱絕緣構件 16‧‧‧Cylindrical thermal insulation components
16a‧‧‧分割表面 16a‧‧‧Split surface
17‧‧‧凹槽樣棚架區段 17‧‧‧ Groove-like scaffolding section
18‧‧‧加熱元件 18‧‧‧ heating element
18A‧‧‧帶狀構件 18A‧‧‧Band members
18a‧‧‧頂點部分 18a‧‧‧Vertex
18b‧‧‧波谷部分 18b‧‧‧ trough part
18e,f,g...r‧‧‧端 18e,f,g...r‧‧‧
20‧‧‧銷構件 20‧‧‧ pin components
20a‧‧‧近端部分 20a‧‧‧ proximal part
20b‧‧‧支腳部分 20b‧‧‧foot part
20c‧‧‧端部 20c‧‧‧End
21‧‧‧凹槽區段 21‧‧‧ Groove section
21a‧‧‧後壁 21a‧‧‧Back wall
22‧‧‧端接板 22‧‧‧Terminal board
23‧‧‧連接板 23‧‧‧Connecting board
28‧‧‧外殼 28‧‧‧Shell
30‧‧‧水冷卻套 30‧‧‧Water Cooling Set
31‧‧‧上熱絕緣構件 31‧‧‧Upper thermal insulation components
32‧‧‧不銹鋼頂板 32‧‧‧Stainless steel top plate
33‧‧‧空間 33‧‧‧ Space
35‧‧‧熱排放系統 35‧‧‧Hot Discharge System
36‧‧‧強制空氣冷卻單元 36‧‧‧Mand air cooling unit
37‧‧‧出口 37‧‧‧Export
38‧‧‧環形路徑 38‧‧‧Circular path
40‧‧‧強制式冷卻空氣吹風孔 40‧‧‧Forced cooling air blow hole
41‧‧‧帶狀或環形熱絕緣構件 41‧‧‧Strip or annular thermal insulation
42‧‧‧狹縫 42‧‧‧slit
43a‧‧‧凹陷 43a‧‧‧ dent
43b‧‧‧伸出部分 43b‧‧‧Extension
45‧‧‧固定構件 45‧‧‧Fixed components
46‧‧‧鎖定部分 46‧‧‧Locked section
47‧‧‧輔助熱絕緣構件 47‧‧‧Auxiliary thermal insulation components
48‧‧‧固定件 48‧‧‧Fixed parts
49‧‧‧防落下銷 49‧‧‧Protected down
49a‧‧‧放大部分 49a‧‧‧Magnification
49b‧‧‧U形部分 49b‧‧‧U-shaped part
49c‧‧‧相對端部分 49c‧‧‧ opposite end
50‧‧‧防落下板 50‧‧‧Anti-falling board
50a‧‧‧尖頭部分 50a‧‧‧ pointed part
圖1係一縱向剖視圖，其示意性顯示本發明之一直立式熱處理裝置之一實施例；圖2係圖1中一部分A之一放大剖視圖；圖3係圖1中之部分A之一放大縱向剖視圖；圖4係一加熱元件之平面圖；圖5係加熱元件之一側視圖；圖6(a)係一顯示一熱絕緣構件之實例之平面圖，且圖6(b)係一沿圖6(a)中之線B-B截取之剖視圖；；圖7(a)係一主要部分放大透視圖，其顯示一用於在一加熱電阻器之一端上將一連接板固定至一熱絕緣構件上之結構之實例，且圖7(b)係該固定狀態之剖視圖；圖8(a)，(b)係一剖視圖，其顯示用於在加熱電阻器之端 上將連接板固定至熱絕緣構件之結構之另一實例；圖9(a)及9(b)係剖視圖，其各自顯示用於在加熱電阻器之端上將連接板固定至熱絕緣構件之結構之再一實例；圖10(a)係一局部透視圖，其顯示一用於藉由一防落下銷固持加熱電阻器之伸出部分之結構，且圖10(b)係防落下銷之一示意性透視圖；圖11(a)及11(b)係透視圖，其各自顯示防落下銷之另一實例；圖12(a)係一局部透視圖，其顯示一用於藉由一防落下板固持加熱電阻器之伸出部分之結構，且圖12(b)係防落下板之一示意性透視圖；圖13係一顯示熱絕緣構件之另一實例之局部透視圖；及圖14(a)係一顯示一習用加熱器一實例之剖視圖，且圖14(b)係加熱器之內圓周表面之一視圖。 Figure 1 is a longitudinal cross-sectional view schematically showing an embodiment of the vertical heat treatment apparatus of the present invention; Figure 2 is an enlarged cross-sectional view of a portion A of Figure 1; Figure 3 is an enlarged longitudinal view of a portion A of Figure 1. Figure 4 is a plan view of a heating element; Figure 5 is a side view of a heating element; Figure 6 (a) is a plan view showing an example of a thermal insulating member, and Figure 6 (b) is a side view of Figure 6 ( a) a cross-sectional view of the line BB taken; FIG. 7(a) is a principal partially enlarged perspective view showing a structure for fixing a connecting plate to a heat insulating member on one end of a heating resistor An example of this, and Figure 7 (b) is a cross-sectional view of the fixed state; Figure 8 (a), (b) is a cross-sectional view showing the end of the heating resistor Another example of the structure of the upper connecting plate to the heat insulating member; FIGS. 9(a) and 9(b) are cross-sectional views each showing the fixing of the connecting plate to the heat insulating member on the end of the heating resistor. Still another example of the structure; FIG. 10(a) is a partial perspective view showing a structure for holding the protruding portion of the heating resistor by an anti-drop pin, and FIG. 10(b) is a fall prevention pin A schematic perspective view; FIGS. 11(a) and 11(b) are perspective views each showing another example of a drop prevention pin; FIG. 12(a) is a partial perspective view showing one for one by one The anti-dropping plate holds the structure of the protruding portion of the heating resistor, and FIG. 12(b) is a schematic perspective view of one of the anti-dropping plates; FIG. 13 is a partial perspective view showing another example of the thermal insulating member; 14(a) is a cross-sectional view showing an example of a conventional heater, and Fig. 14(b) is a view showing an inner circumferential surface of the heater.
1‧‧‧直立式熱處理裝置 1‧‧‧Vertical heat treatment unit
2‧‧‧直立式熱處理爐 2‧‧‧Vertical heat treatment furnace
3‧‧‧處理容器 3‧‧‧Processing container
3a‧‧‧爐開口 3a‧‧‧ furnace opening
3b‧‧‧向外凸緣 3b‧‧‧ outward flange
5‧‧‧圓筒形加熱器 5‧‧‧Cylinder heater
6‧‧‧基板 6‧‧‧Substrate
7‧‧‧基板開口 7‧‧‧Substrate opening
8‧‧‧引入埠 8‧‧‧Introduction
10‧‧‧蓋構件 10‧‧‧Caps
10A‧‧‧提升機構 10A‧‧‧ Lifting Agency
11‧‧‧熱保持管 11‧‧‧Hot holding tube
12‧‧‧石英船 12‧‧‧Quartz ship
13‧‧‧旋轉機構 13‧‧‧Rotating mechanism
15‧‧‧下裝載區 15‧‧‧Unloading area
16‧‧‧圓筒形熱絕緣構件 16‧‧‧Cylindrical thermal insulation components
17‧‧‧凹槽樣棚架區段 17‧‧‧ Groove-like scaffolding section
18‧‧‧加熱元件 18‧‧‧ heating element
28‧‧‧外殼 28‧‧‧Shell
30‧‧‧水冷卻套 30‧‧‧Water Cooling Set
31‧‧‧上熱絕緣構件 31‧‧‧Upper thermal insulation components
32‧‧‧不銹鋼頂板 32‧‧‧Stainless steel top plate
33‧‧‧空間 33‧‧‧ Space
35‧‧‧熱排放系統 35‧‧‧Hot Discharge System
36‧‧‧強制空氣冷卻單元 36‧‧‧Mand air cooling unit
37‧‧‧出口 37‧‧‧Export
38‧‧‧環形路徑 38‧‧‧Circular path
40‧‧‧強制式冷卻空氣吹風孔 40‧‧‧Forced cooling air blow hole
41‧‧‧帶狀或環形熱絕緣構件 41‧‧‧Strip or annular thermal insulation
Claims (20)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007072477 | 2007-03-20 | ||
| JP2008025113A JP5248874B2 (en) | 2007-03-20 | 2008-02-05 | Heat treatment furnace and vertical heat treatment equipment |
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| Publication Number | Publication Date |
|---|---|
| TW200914783A TW200914783A (en) | 2009-04-01 |
| TWI392843B true TWI392843B (en) | 2013-04-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097109508A TWI392843B (en) | 2007-03-20 | 2008-03-18 | Heat processing furnace and vertical-type heat processing appartus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5248874B2 (en) |
| KR (1) | KR101117016B1 (en) |
| CN (1) | CN101312123B (en) |
| TW (1) | TWI392843B (en) |
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| KR101096602B1 (en) * | 2009-07-21 | 2011-12-20 | 가부시키가이샤 히다치 고쿠사이 덴키 | Heating device, substrate processing apparatus, and method of manufacturing semiconductor device |
| JP5544121B2 (en) | 2009-07-21 | 2014-07-09 | 株式会社日立国際電気 | Heating apparatus, substrate processing apparatus, and semiconductor device manufacturing method |
| US9064912B2 (en) | 2009-07-21 | 2015-06-23 | Hitachi Kokusai Electric, Inc. | Heating device, substrate processing apparatus, and method of manufacturing semiconductor device |
| JP5529646B2 (en) * | 2010-06-25 | 2014-06-25 | 株式会社日立国際電気 | Heating apparatus, substrate processing apparatus, substrate processing method, and semiconductor device manufacturing method |
| DE202010001370U1 (en) * | 2010-01-25 | 2010-05-06 | Türk & Hillinger GmbH | Electric heater |
| JP5686467B2 (en) * | 2010-10-15 | 2015-03-18 | 株式会社日立国際電気 | Substrate processing apparatus and semiconductor device manufacturing method |
| JP5868619B2 (en) * | 2011-06-21 | 2016-02-24 | ニチアス株式会社 | Heat treatment furnace and heat treatment apparatus |
| JP5743746B2 (en) * | 2011-06-27 | 2015-07-01 | 東京エレクトロン株式会社 | Heat treatment furnace and heat treatment apparatus |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN101312123A (en) | 2008-11-26 |
| KR20080085744A (en) | 2008-09-24 |
| TW200914783A (en) | 2009-04-01 |
| JP2008263170A (en) | 2008-10-30 |
| KR101117016B1 (en) | 2012-03-15 |
| JP5248874B2 (en) | 2013-07-31 |
| CN101312123B (en) | 2012-06-20 |
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