JP2008263170A - Heat treatment furnace and vertical heat treatment equipment - Google Patents

Heat treatment furnace and vertical heat treatment equipment Download PDF

Info

Publication number
JP2008263170A
JP2008263170A JP2008025113A JP2008025113A JP2008263170A JP 2008263170 A JP2008263170 A JP 2008263170A JP 2008025113 A JP2008025113 A JP 2008025113A JP 2008025113 A JP2008025113 A JP 2008025113A JP 2008263170 A JP2008263170 A JP 2008263170A
Authority
JP
Japan
Prior art keywords
insulating material
heat insulating
heat treatment
heat
peripheral surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008025113A
Other languages
Japanese (ja)
Other versions
JP5248874B2 (en
Inventor
Takashi Ichikawa
貴 市川
Makoto Kobayashi
誠 小林
Kenichi Yamaga
健一 山賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2008025113A priority Critical patent/JP5248874B2/en
Priority to TW097109508A priority patent/TWI392843B/en
Priority to US12/076,531 priority patent/US8023806B2/en
Priority to KR1020080025153A priority patent/KR101117016B1/en
Priority to CN2008101003779A priority patent/CN101312123B/en
Publication of JP2008263170A publication Critical patent/JP2008263170A/en
Application granted granted Critical
Publication of JP5248874B2 publication Critical patent/JP5248874B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B23/00Heating arrangements
    • F26B23/04Heating arrangements using electric heating
    • F26B23/06Heating arrangements using electric heating resistance heating
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Especially adapted for treating semiconductor wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Furnace Details (AREA)
  • Chemical Vapour Deposition (AREA)
  • Resistance Heating (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To allow a rapid rise and fall of temperatures, and to increase durability. <P>SOLUTION: A heat treat furnace 2 comprises: a treatment container 3 for containing a body w to be treated for heat treatment; and a cylindrical heater 5 that is provided to cover the circumference of the treatment container 3 to heat the body w to be treated. The heater 5 comprises a cylindrical heat insulator 16, and a heating resistor 18 that is disposed along an inner peripheral surface of the heat insulator 16. The heating resistor 18 is composed of a corrugated belt-shaped material that. On the heating resistor 16, pin members 20 are disposed that hold the heating resistor 18 in a manner that allows the heating resistor 18 to move in the direction of the diameter of the heater at an appropriate interval. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、熱処理炉及び該熱処理炉を備えた縦型熱処理装置に関する。   The present invention relates to a heat treatment furnace and a vertical heat treatment apparatus including the heat treatment furnace.

半導体装置の製造においては、被処理体である半導体ウエハに酸化、拡散、CVD(Chemical Vapor Deposition)などの処理を施すために、各種の熱処理装置が用いられている。そして、その一般的な熱処理装置は、半導体ウエハを収容して熱処理するための処理容器(反応管)と、この処理容器の周囲を覆うように設けられ処理容器内のウエハを加熱するヒータ(加熱装置)とから主に構成される熱処理炉を備えている。上記ヒータは、円筒状の断熱材と、この断熱材の内周面に支持体を介して設けられた発熱抵抗体とから主に構成されている。   In the manufacture of semiconductor devices, various heat treatment apparatuses are used to perform processes such as oxidation, diffusion, and CVD (Chemical Vapor Deposition) on a semiconductor wafer that is an object to be processed. The general heat treatment apparatus includes a processing container (reaction tube) for housing and heat-treating a semiconductor wafer, and a heater (heating) provided to cover the periphery of the processing container and heating the wafer in the processing container. A heat treatment furnace mainly composed of an apparatus. The heater is mainly composed of a cylindrical heat insulating material and a heating resistor provided on the inner peripheral surface of the heat insulating material via a support.

上記発熱抵抗体としては、例えばバッチ処理が可能な熱処理装置の場合でいうと、円筒状の断熱材の内壁面に沿って配置される螺旋状のヒータエレメント(ヒータ線、発熱抵抗体ともいう)が用いられ、炉内を例えば800〜1000℃程度に高温に加熱することができる。また、上記断熱材としては、例えばセラミックファイバ等からなる断熱材料を円筒状に焼成してなるものが用いられ、輻射熱および伝導熱として奪われる熱量を減少させて効率のよい加熱を助長することができる。上記支持体としては、例えばセラミック製のものが用いられ、上記ヒータエレメントを熱膨張および熱収縮可能に所定のピッチで支持するようになっている。   As the heat generating resistor, for example, in the case of a heat treatment apparatus capable of batch processing, a spiral heater element (also referred to as a heater wire or a heat generating resistor) disposed along the inner wall surface of a cylindrical heat insulating material. Can be used, and the inside of the furnace can be heated to a high temperature of, for example, about 800 to 1000 ° C. In addition, as the heat insulating material, for example, a heat insulating material made of a ceramic fiber or the like is fired into a cylindrical shape, and the amount of heat taken as radiant heat and conduction heat is reduced to promote efficient heating. it can. As the support, for example, ceramic is used, and the heater element is supported at a predetermined pitch so as to be capable of thermal expansion and contraction.

ところで、上記熱処理炉においては、上記ヒータエレメントが螺旋状に形成されていると共に熱膨張および熱収縮可能なように断熱材との間にクリアランスをとって支持されている。しかし、ヒータエレメントは高温下で使用されることによりクリープ歪を生じ、その線長は時間とともに徐々に伸びて行く。また、加熱時においても、ヒータエレメントは熱膨張を起こす。さらに、降温時には、ヒータエレメントに空気を吹付けて急速冷却を行うタイプのものもある。このように昇降温を繰り返すことによりヒータエレメントが変形し、隣接するヒータエレメントとショートして断線が発生する場合がある。   By the way, in the heat treatment furnace, the heater element is formed in a spiral shape and supported with a clearance from the heat insulating material so as to be capable of thermal expansion and contraction. However, when the heater element is used at a high temperature, creep distortion occurs, and its line length gradually increases with time. Also, the heater element undergoes thermal expansion during heating. Furthermore, there is a type that performs rapid cooling by blowing air to the heater element when the temperature is lowered. In this way, the heater element is deformed by repeatedly raising and lowering the temperature, and a short circuit may occur with an adjacent heater element to cause disconnection.

特に、縦型の熱処理炉の場合、昇降温による熱膨張と熱収縮の繰り返しによりヒータエレメントが支持体内で移動する際に重力により僅かずつヒータエレメントが下方に移動し、最下ターンに移動分が蓄積していき、ヒータエレメントの移動の蓄積により巻き径が大きくなり、断熱材の内周面まで達して外側に膨張できなくなったヒータエレメントが上下に変形し、隣接するヒータエレメントとショートすると断線が発生する。   In particular, in the case of a vertical heat treatment furnace, when the heater element moves in the support body due to repeated thermal expansion and contraction due to temperature rise and fall, the heater element moves gradually by gravity and the amount of movement is at the bottom turn. As the heater element accumulates, the winding diameter increases due to the accumulation of movement of the heater element, the heater element that reaches the inner peripheral surface of the heat insulating material and cannot expand outward is deformed up and down, and disconnection occurs when it is short-circuited with the adjacent heater element appear.

なお、このような問題を解消するためにヒータエレメントのクリープや熱膨張等による伸びの一端側への累積を防止するために、ヒータエレメントの外側部に炉の半径方向外方に突出した軸状等の固定部材を溶接で取付け、この固定部材の先端を断熱材中に埋め込んで固定するようにしたものも提案されている(特許文献1参照)。   In addition, in order to eliminate such problems, in order to prevent the heater element from accumulating at one end side due to creep or thermal expansion, an axial shape projecting radially outward of the furnace is formed on the outer side of the heater element. A fixing member such as the above-mentioned fixing member is welded, and the tip of the fixing member is embedded and fixed in a heat insulating material (see Patent Document 1).

特開平10−233277号公報JP-A-10-233277 特開2005−197074号公報Japanese Patent Laid-Open No. 2005-197074

しかしながら、前述のように単にヒータエレメントの外側部に固定部材を溶接で接合しただけのものでは、接合部が高温に晒されるだけでなく、発熱抵抗体の熱膨張収縮に伴い接合部に応力が集中し易く、耐久性の低下(短寿命化)を招くことが考えられると共に、固定部材が棒軸状であると、断熱材から抜け易く十分な保持力を確保することが難しい。   However, in the case where the fixing member is simply joined to the outer portion of the heater element by welding as described above, the joint is not only exposed to a high temperature, but stress is also applied to the joint due to the thermal expansion and contraction of the heating resistor. It is easy to concentrate and it is considered that the durability is lowered (short life), and if the fixing member is in the shape of a rod shaft, it is easy to come off from the heat insulating material and it is difficult to secure a sufficient holding force.

ウエハの急速昇降温処理をしたい場合、急速昇温時にヒータエレメントに大きなパワーを掛ける必要があるが、今までの一般的なヒータエレメントでは負荷が大きすぎて断線し易いため、大きなパワーを掛けることができず、急速昇降温処理に限界があった。なお、この問題を解消するには断線しにくい高価なヒータエレメントを用いる必要があり、コストの増大を招く問題がある。   If you want to heat and cool the wafer rapidly, it is necessary to apply a large amount of power to the heater element when the temperature is rapidly increased. However, a conventional heater element is too heavy and easily breaks, so apply a large amount of power. There was a limit to the rapid heating and cooling process. In order to solve this problem, it is necessary to use an expensive heater element that is difficult to be disconnected, and there is a problem that the cost is increased.

一方、ヒータエレメントの負荷を低減させ、長寿命化(耐久性の向上)を図るには、投入パワーに対してのヒータエレメント表面積(エレメント表面積)の割合を増やすことが効果的である。ヒータエレメント表面積を増やすと、ヒータ表面温度が低下してヒータエレメントの負荷が低減されるからである。いわゆるスパイルタイプ(螺旋型)のヒータエレメントにあっては、所定の空間に効率的にエレメントを配置できるため、負荷低減のデザインとして用いられている。しかしながら、このスパイラルタイプのヒータエレメントを用いたヒータないし熱処理炉においては、例えば図14に示すように、ヒータエレメント18を固定するために断熱材16の中にヒータエレメント18を埋め込んだ構造になっているため、炉心の加熱対象物に対して断熱材16を介しての加熱となり、急速に昇温させることが困難である。降温の際にも断熱材16を介してのヒータエレメント18の冷却となり、また断熱材16の熱容量増もあり、急速降温も難しい。更に、ヒータエレメント18の膨張分のクリアランスが確保されていないため、ヒータエレメント自体が膨張時にストレスを受けてしまい、耐久性の低下を招いている。   On the other hand, increasing the ratio of the heater element surface area (element surface area) to the input power is effective for reducing the load on the heater element and extending the life (improvement of durability). This is because when the heater element surface area is increased, the heater surface temperature is lowered and the load on the heater element is reduced. A so-called spill type (spiral type) heater element is used as a load reduction design because the element can be efficiently arranged in a predetermined space. However, in a heater or heat treatment furnace using this spiral heater element, as shown in FIG. 14, for example, the heater element 18 is embedded in the heat insulating material 16 in order to fix the heater element 18. Therefore, the object to be heated in the core is heated through the heat insulating material 16, and it is difficult to rapidly raise the temperature. Even when the temperature is lowered, the heater element 18 is cooled via the heat insulating material 16, and the heat capacity of the heat insulating material 16 is increased. Furthermore, since the clearance for the expansion of the heater element 18 is not ensured, the heater element itself is subjected to stress during expansion, leading to a decrease in durability.

また、ヒータエレメントとしては、帯状の発熱抵抗部材を波形に成形してなるものが知られており(特許文献2)、これもスパイラルタイプのものと同様に表面積を増やすことが可能であるが、円筒状の断熱材内に設置する構造において同様の問題を有している。   Moreover, as a heater element, what formed the strip | belt-shaped heating resistance member in the waveform is known (patent document 2), and this can also increase a surface area similarly to the spiral type, The structure installed in the cylindrical heat insulating material has the same problem.

本発明は、上記事情を考慮してなされたものであり、急速昇降温が可能で且つ耐久性の向上及びコストの低減が図れる熱処理炉及び縦型熱処理装置を提供することを目的とする。   The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a heat treatment furnace and a vertical heat treatment apparatus that can rapidly increase and decrease the temperature, improve the durability, and reduce the cost.

上記目的を達成するために、本発明のうち、第1の発明は、被処理体を収容して熱処理するための処理容器と、該処理容器の周囲を覆うように設けられ被処理体を加熱する円筒状のヒータとを備えた熱処理炉において、上記ヒータは、円筒状の断熱材と、該断熱材の内周面に沿って配置された発熱抵抗体とを具備し、上記発熱抵抗体は帯状のものを波形に曲げ加工してなり、上記断熱材には上記発熱抵抗体を適宜間隔でヒータの径方向に移動可能に保持するピン部材を配設したことを特徴とする。   In order to achieve the above object, among the present inventions, the first invention includes a processing container for containing a target object for heat treatment, and heating the target object provided so as to cover the periphery of the processing container. In the heat treatment furnace including a cylindrical heater, the heater includes a cylindrical heat insulating material and a heat generating resistor disposed along an inner peripheral surface of the heat insulating material, A band-shaped member is bent into a corrugated shape, and the heat insulating material is provided with a pin member for holding the heating resistor movably in the radial direction of the heater at appropriate intervals.

第2の発明は、下部が炉口として開放され被処理体を収容して熱処理するための縦長の処理容器の周囲に上記被処理体を加熱する円筒状のヒータを設けてなる熱処理炉と、上記炉口を閉塞する蓋体と、該蓋体上に被処理体を多段に保持する保持具を載置し、該蓋体を昇降させて蓋体の開閉と上記処理容器内への保持具の搬入搬出を行う昇降機構と備えた縦型熱処理装置において、上記ヒータは、円筒状の断熱材と、該断熱材の内周面に配置された発熱抵抗体とを具備し、上記発熱抵抗体は帯状のものを波形に曲げ加工してなり、上記断熱材には上記発熱抵抗体を適宜間隔でヒータの径方向に移動可能に保持するピン部材を配設したことを特徴とする。   A second invention is a heat treatment furnace in which a lower part is opened as a furnace port and a cylindrical heater for heating the object to be processed is provided around a vertically long processing container for accommodating and heat-treating the object to be processed. A lid that closes the furnace port and a holder that holds the object to be processed in multiple stages are placed on the lid, and the lid is moved up and down to open and close the lid and the holder in the processing container In the vertical heat treatment apparatus equipped with an elevating mechanism for carrying in and out of the heater, the heater includes a cylindrical heat insulating material and a heat generating resistor disposed on an inner peripheral surface of the heat insulating material, and the heat generating resistor. Is formed by bending a belt-like member into a corrugated shape, and the heat insulating material is provided with a pin member for holding the heating resistor movably in the radial direction of the heater at appropriate intervals.

上記ピン部材は、発熱抵抗体の内面が谷形になった部分を支持すべくコ字状に形成され、その両脚部が断熱材を内側から外側に貫通し、外側で折り曲げられて断熱材の外周面に係止されていることが好ましい。   The pin member is formed in a U shape so as to support the valley portion of the inner surface of the heating resistor, and both legs penetrate the heat insulating material from the inside to the outside and are bent on the outside to be It is preferable to be locked to the outer peripheral surface.

上記断熱材の内周面には上記発熱抵抗体の全部または一部を収容する周方向に連続した溝部が上下方向に適宜間隔で複数形成されていることが好ましい。   It is preferable that a plurality of circumferentially continuous grooves that accommodate all or part of the heating resistor are formed on the inner peripheral surface of the heat insulating material at appropriate intervals in the vertical direction.

上記断熱材には、上下に隣接する発熱抵抗体の間において内外に貫通する強制空冷用空気吹出し孔が周方向に適宜間隔で複数形成されているが好ましい。   In the heat insulating material, it is preferable that a plurality of forced air-cooling air blowing holes penetrating inward and outward between heating resistors adjacent vertically are formed at appropriate intervals in the circumferential direction.

上記断熱材は縦に二分割されており、上記発熱抵抗体も断熱材に対応して分割されていると共に、その上下に隣接する発熱抵抗体を直列に接続すべく端部同士が接続板を介して接続され、該接続板が上記断熱材の分割面部に配置されていることが好ましい。   The heat insulating material is vertically divided into two, and the heating resistor is also divided corresponding to the heat insulating material, and the end portions are connected to each other in order to connect the heating resistors adjacent to the upper and lower sides in series. It is preferable that the connection plate is disposed on the divided surface portion of the heat insulating material.

上記接続板が上記断熱材の分割面部にピン等の固定部材で固定されていることが好ましい。   It is preferable that the connection plate is fixed to a split surface portion of the heat insulating material with a fixing member such as a pin.

上記接続板には上記断熱材の外周面に掛止される掛止部が設けられていることが好ましい。   It is preferable that the connection plate is provided with a latching portion that is latched on the outer peripheral surface of the heat insulating material.

上記接続板には上記断熱材の中に入り込んで固定される固定片が形成されていることが好ましい。   It is preferable that a fixing piece is formed on the connection plate so as to enter and be fixed in the heat insulating material.

上記断熱材には、断熱材の内周面より波形に凹凸となった上記発熱抵抗体の適宜箇所の凸部を下方に倒れないように保持するための倒れ防止ピンが設けられていることが好ましい。   The heat insulating material may be provided with a fall prevention pin for holding the convex portion at an appropriate location of the heating resistor, which is corrugated from the inner peripheral surface of the heat insulating material, so as not to fall down. preferable.

上記断熱材には、断熱材の内周面より波形に凹凸となった上記発熱抵抗体の適宜箇所の凸部の下部を下方に倒れないように支持するための倒れ防止板が設けられていることが好ましい。   The heat insulating material is provided with a fall prevention plate for supporting the lower part of the convex portion at an appropriate location of the heating resistor, which is corrugated from the inner peripheral surface of the heat insulating material, so as not to fall downward. It is preferable.

本発明によれば、帯状のものを波形に加工した発熱抵抗体を断熱材の内周面に沿って露出した状態で設置しているため、急速昇降温が可能であると共に耐久性の向上及びコストの低減が図れる。   According to the present invention, since the heating resistor processed into a corrugated strip is installed in a state exposed along the inner peripheral surface of the heat insulating material, rapid heating and cooling are possible and durability is improved and Cost can be reduced.

以下に、本発明を実施するための最良の形態について、添付図面を基に詳述する。図1は本発明の実施の形態である縦型熱処理装置を概略的に示す縦断面図、図2は図1のA部拡大横断面図、図3はA部拡大縦断面図、図4はヒータエレメントの平面図、図5はヒータエレメントの側面図である。   The best mode for carrying out the present invention will be described below in detail with reference to the accompanying drawings. 1 is a longitudinal sectional view schematically showing a vertical heat treatment apparatus according to an embodiment of the present invention, FIG. 2 is an enlarged cross-sectional view of part A of FIG. 1, FIG. 3 is an enlarged longitudinal sectional view of part A, and FIG. FIG. 5 is a side view of the heater element.

図1において、1は半導体製造装置の一つである縦型の熱処理装置であり、この熱処理装置1は、被処理体例えば半導体ウエハwを一度に多数枚収容して酸化、拡散、減圧CVD等の熱処理を施すことができる縦型の熱処理炉2を備えている。この熱処理炉2は、ウエハwを収容して熱処理するための処理容器(反応管ともいう)3と、該処理容器3の周囲を覆うように設けられウエハwを加熱する円筒状のヒータ(加熱装置)5とを備えている。   In FIG. 1, reference numeral 1 denotes a vertical heat treatment apparatus which is one of semiconductor manufacturing apparatuses. This heat treatment apparatus 1 accommodates a large number of objects to be processed, for example, semiconductor wafers w at one time, and performs oxidation, diffusion, reduced pressure CVD, etc. A vertical heat treatment furnace 2 capable of performing the above heat treatment is provided. The heat treatment furnace 2 includes a processing vessel (also referred to as a reaction tube) 3 for accommodating and heat-treating the wafer w, and a cylindrical heater (heating) that is provided so as to cover the periphery of the processing vessel 3 and heats the wafer w. Device) 5.

上記熱処理装置1は、ヒータ5を設置するためのベースプレート6を備えている。このベースプレート6には処理容器3を下方から上方に挿入するための開口部7が形成されており、この開口部7にはベースプレート6と処理容器3との間の隙間を覆うように図示しない断熱材が設けられている。   The heat treatment apparatus 1 includes a base plate 6 for installing the heater 5. The base plate 6 is formed with an opening 7 for inserting the processing container 3 from below to above, and the opening 7 has a heat insulation (not shown) so as to cover the gap between the base plate 6 and the processing container 3. Material is provided.

上記処理容器3は、石英製で、上端が閉塞され、下端が炉口3aとして開口された縦長の円筒状に形成されている。処理容器3の開口端には外向きのフランジ3bが形成され、該フランジ3bが図示しないフランジ押えを介して上記ベースプレート6に支持されている。図示例の処理容器3は、下側部に処理ガスや不活性ガス等を処理容器3内に導入する導入ポート(導入口)8及び処理容器3内のガスを排気するための図示しない排気ポート(排気口)が設けられている。導入ポート8にはガス供給源が接続され、排気ポートには例えば10〜10−8Torr程度に減圧制御が可能な真空ポンプを備えた排気系が接続されている。 The processing vessel 3 is made of quartz, and is formed in a vertically long cylindrical shape with the upper end closed and the lower end opened as a furnace port 3a. An outward flange 3b is formed at the open end of the processing container 3, and the flange 3b is supported by the base plate 6 via a flange presser (not shown). The processing container 3 in the illustrated example has an introduction port (introduction port) 8 for introducing a processing gas, an inert gas or the like into the processing container 3 on the lower side, and an exhaust port (not shown) for exhausting the gas in the processing container 3. (Exhaust port) is provided. The introduction port 8 is connected to a gas supply source, and the exhaust port is connected to an exhaust system including a vacuum pump capable of controlling pressure reduction to about 10 to 10 −8 Torr.

処理容器3の下方には、処理容器3の下端開口部(炉口)3aを閉塞する上下方向に開閉可能な蓋体10が図示しない昇降機構により昇降移動可能に設けられている。この蓋体10の上部には、炉口の保温手段である例えば保温筒11が載置され、該保温筒11の上部には例えば直径が300mmのウエハwを多数枚例えば100〜150枚程度上下方向に所定の間隔で搭載する保持具である石英製のボート12が載置されている。蓋体10には、ボート12をその軸心回りに回転する回転機構13が設けられている。ボート12は、蓋体10の下降移動により処理容器3内から下方のローディングエリア15内に搬出(アンロード)され、ウエハwの移替え後、蓋体10の上昇移動により処理容器3内に搬入(ロード)される。   Below the processing container 3, a lid 10 that can be opened and closed in a vertical direction that closes a lower end opening (furnace port) 3 a of the processing container 3 is provided so as to be movable up and down by a lifting mechanism (not shown). On the top of the lid body 10, for example, a heat retaining cylinder 11 as a heat retaining means for the furnace opening is placed. On the heat retaining cylinder 11, for example, a large number of wafers w having a diameter of 300 mm, for example, about 100 to 150 wafers are vertically moved. A quartz boat 12 which is a holder mounted at a predetermined interval in the direction is placed. The lid 10 is provided with a rotation mechanism 13 that rotates the boat 12 about its axis. The boat 12 is unloaded from the processing container 3 into the lower loading area 15 by the downward movement of the lid body 10, and is loaded into the processing container 3 by the upward movement of the lid body 10 after the wafer w is transferred. (Loaded).

上記ヒータ5は、図2〜図5にも示すように、円筒状の断熱材16と、該断熱材16の内周面に軸方向(図示例では上下方向)に多段に形成された溝状の棚部17と、各棚部17に沿って配置されたヒータエレメント(ヒータ線、発熱抵抗体)18とを具備している。断熱材は、例えばシリカ、アルミナあるいは珪酸アルミナを含む無機質繊維からなっている。断熱材は、縦に二分割されていることがヒータエレメントの組付上及びヒータの組立上好ましい。   As shown in FIGS. 2 to 5, the heater 5 has a cylindrical heat insulating material 16 and a groove shape formed in multiple stages in the axial direction (vertical direction in the illustrated example) on the inner peripheral surface of the heat insulating material 16. Shelf parts 17 and heater elements (heater wires, heating resistors) 18 arranged along the respective shelf parts 17. The heat insulating material is made of an inorganic fiber containing, for example, silica, alumina, or silicate alumina. It is preferable that the heat insulating material is vertically divided into two parts for assembling the heater element and assembling the heater.

ヒータエレメント18は、帯状の発熱抵抗体を波形に成形(折り曲げ加工)して成る。このコルゲートタイプ(波形)のヒータエレメント18は、例えば鉄(Fe)、クロム(Cr)およびアルミニウム(Al)の合金(いわゆるカンタル材)からなっている。このヒータエレメント18は、例えば肉厚が1〜2mm程度、幅が14〜18mm程度、波形部分の振幅が11〜15mm程度、波形部分のピッチpが28〜32mm程度とされている。また、ヒータエレメント18の波形部分の頂角θは90度程度とされ、各頂点部(凸部または山部ともいう)18aはR曲げ加工が施されていることが断熱材16の棚部17上におけるヒータエレメント18の周方向のある程度の移動を許容し得ると共に屈曲部の強度の向上が図れる点で好ましい。   The heater element 18 is formed by forming (bending) a band-shaped heating resistor into a waveform. The corrugated type (corrugated) heater element 18 is made of, for example, an alloy of iron (Fe), chromium (Cr), and aluminum (Al) (so-called Kanthal material). For example, the heater element 18 has a thickness of about 1 to 2 mm, a width of about 14 to 18 mm, an amplitude of the waveform portion of about 11 to 15 mm, and a pitch p of the waveform portion of about 28 to 32 mm. Further, the apex angle θ of the corrugated portion of the heater element 18 is about 90 degrees, and each apex portion (also referred to as a convex portion or a mountain portion) 18 a is subjected to R bending processing, so that the shelf portion 17 of the heat insulating material 16. It is preferable in that the heater element 18 can be allowed to move to some extent in the circumferential direction and the strength of the bent portion can be improved.

上記断熱材16には上記ヒータエレメント18を適宜間隔で径方向に移動可能に且つ棚部17から脱落ないし脱出しないように保持するピン部材20が配設されている。上記円筒状の断熱材16の内周面にはこれと同心の環状の溝部21が軸方向に所定ピッチで多段に形成され、隣り合う上部の溝部21と下部の溝部21との間に周方向に連続した環状の上記棚部17が形成されている。上記溝部21におけるヒータエレメント18の上部と下部、及び溝部21の奥壁21aとヒータエレメント18との間にはヒータエレメント18の熱膨張収縮及び径方向の移動を許容し得る十分な隙間が設けられており、またこれらの隙間により強制空冷時の冷却空気がヒータエレメント18の背面に回り込み、ヒータエレメント18を効果的に冷却できるようになっている。   The heat insulating material 16 is provided with a pin member 20 that holds the heater element 18 in a radial direction at appropriate intervals and holds the heater element 18 so as not to drop off or escape from the shelf portion 17. On the inner peripheral surface of the cylindrical heat insulating material 16, concentric annular grooves 21 are formed in multiple stages at a predetermined pitch in the axial direction, and between the adjacent upper grooves 21 and lower grooves 21 in the circumferential direction. An annular shelf 17 that is continuous to each other is formed. Sufficient gaps that allow thermal expansion / contraction and radial movement of the heater element 18 are provided between the upper and lower portions of the heater element 18 in the groove 21 and between the inner wall 21a of the groove 21 and the heater element 18. In addition, due to these gaps, the cooling air during forced air cooling flows around the back surface of the heater element 18 so that the heater element 18 can be cooled effectively.

上記ピン部材20は、ヒータエレメント18の内周面の谷部18bを基部20aで支持すべく側面コ字状に形成され、その両脚部20bが断熱材16を内側から外側に貫通し、該両脚部20bの端部20cが互いに離反する方向に折り曲げられて断熱材16の外周面に係止されていることが好ましい。ピン部材20はヒータエレメント18と同材質であることが好ましい。また、ヒータエレメント18は、図3に示すように径方向の外側略半分が溝部21内に収容されており、径方向の内側略半分が溝部21外に露出していることが好ましい。   The pin member 20 is formed in a side U shape so that the valley portion 18b of the inner peripheral surface of the heater element 18 is supported by the base portion 20a, and both the leg portions 20b penetrate the heat insulating material 16 from the inside to the outside. It is preferable that the end portion 20c of the portion 20b is bent in a direction away from each other and locked to the outer peripheral surface of the heat insulating material 16. The pin member 20 is preferably made of the same material as the heater element 18. Further, as shown in FIG. 3, the heater element 18 is preferably accommodated in the radially outer half in the groove portion 21, and the radially inner half is exposed outside the groove portion 21.

上記ヒータエレメント18は、従来のヒータエレメントのように上下方向に螺旋状に連続しているのではなく、図2ないし図3に示すように各段の棚部17上に配置され、各段で終結している。このため、ヒータエレメント18が自重で下方に移動して蓄積(集積)するようなことはない。また、ヒータエレメント18は、図5に示すように隣り合う上段と下段との間で渡し込まれ(接続され)、複数段(図示例では7段)ごとに直列に接続されていると共に複数段ごとの各グループの最下段の始端18eと最上段の終端18rとに電極接続用の端子板22がそれぞれ接続されている。これにより、ヒータ5は熱処理炉2内を上下方向に複数のゾーンに分けて温度制御ができるように構成されている。   The heater element 18 is not spirally continuous in the vertical direction as in the conventional heater element, but is disposed on the shelf 17 of each stage as shown in FIGS. It is over. For this reason, the heater element 18 does not move downward and accumulate (accumulate) under its own weight. Further, as shown in FIG. 5, the heater element 18 is passed (connected) between adjacent upper and lower stages, and is connected in series for each of a plurality of stages (seven stages in the illustrated example) and a plurality of stages. An electrode connection terminal plate 22 is connected to the lowermost start end 18e and uppermost end 18r of each group. Accordingly, the heater 5 is configured to be able to control the temperature by dividing the inside of the heat treatment furnace 2 into a plurality of zones in the vertical direction.

ヒータエレメント18は、断熱材16の棚部17ないし溝部21に沿って環状に配置されていても良いが、二分割された断熱材16に対応して図4に示すように半割り状(円弧状)に形成されることが組付上好ましい。ヒータエレメント18の接続(結線)パターンとしては、例えば図4ないし図5に示すものが考えられる。この接続パターンにおいては、各段のヒータエレメント18の両端18、18f、18g…18rが径方向外方に突出するように折り曲げられており、一段目(最下段)始端(右端)18eと、最上段の終端(左端)18rに端子板22、22がそれぞれ接合されている。そして、上下に隣接する発熱抵抗体18を直列に接続すべく端部同士例えば一段目の終端18fと二段目の始端18gとが接続板23を介して接続され、二段目の終端18hと三段目の始端18iとが接続板23を介して接続されるという具合に順に接続されている。   The heater element 18 may be annularly arranged along the shelf 17 or the groove 21 of the heat insulating material 16, but as shown in FIG. It is preferable for assembly to be formed in an arc shape. As the connection (connection) pattern of the heater element 18, for example, the patterns shown in FIGS. In this connection pattern, both ends 18, 18 f, 18 g... 18 r of the heater elements 18 at each stage are bent so as to protrude outward in the radial direction, and the first stage (lowermost stage) starting end (right end) 18 e, Terminal plates 22 and 22 are joined to the upper end (left end) 18r, respectively. Then, the end portions 18f of the first stage and the start end 18g of the second stage are connected via the connection plate 23 to connect the heating resistors 18 adjacent to each other in series, and the second stage end 18h The third stage start end 18i is connected in order such that it is connected via the connection plate 23.

ヒータエレメントの端部と接続板23は溶接で接合されている。上記端子板22は断熱材16を径方向に貫通するように設けられている。上記接続板23は、ヒータエレメント18の端部との溶接部が高温に晒されるのを防止するために断熱材16中に埋設されていることが好ましい。なお、ヒータエレメント18の接続パターンとしては上記以外のものも適用可能である。上記端子板22及び接続板23はヒータエレメント18と同じ材質からなり、溶断防止と放熱量の抑制の観点から所要断面積の板状に形成されていることが好ましい。   The end of the heater element and the connection plate 23 are joined by welding. The terminal plate 22 is provided so as to penetrate the heat insulating material 16 in the radial direction. The connecting plate 23 is preferably embedded in the heat insulating material 16 in order to prevent the welded portion with the end of the heater element 18 from being exposed to a high temperature. A connection pattern other than the above can be applied as the connection pattern of the heater element 18. The terminal plate 22 and the connection plate 23 are preferably made of the same material as the heater element 18 and are formed in a plate shape having a required cross-sectional area from the viewpoint of preventing fusing and suppressing the amount of heat radiation.

断熱材16の形状を保持すると共に断熱材16を補強するために、図1に示すように、断熱材16の外周面は金属製例えばステンレス製の外皮(アウターシェル)28で覆われている。また、ヒータ外部への熱影響を抑制するために、外皮28の外周面は水冷ジャケット30で覆われている。断熱材16の頂部にはこれを覆う上部断熱材31が設けられ、この上部断熱材31の上部には外皮28の頂部(上端部)を覆うステンレス製の天板32が設けられている。   In order to maintain the shape of the heat insulating material 16 and reinforce the heat insulating material 16, the outer peripheral surface of the heat insulating material 16 is covered with a metal outer skin (outer shell) 28, for example, as shown in FIG. Further, the outer peripheral surface of the outer skin 28 is covered with a water-cooling jacket 30 in order to suppress the thermal influence on the outside of the heater. An upper heat insulating material 31 that covers the top of the heat insulating material 16 is provided, and a stainless steel top plate 32 that covers the top (upper end) of the outer skin 28 is provided on the upper heat insulating material 31.

熱処理後にウエハを急速降温させて処理の迅速化ないしスループットの向上を図るために、ヒータ5にはヒータ5と処理容器3との間の空間33内の雰囲気を外部に排出する排熱系35と、上記空間33内に常温(20〜30℃)の空気を導入して強制的に冷却する強制空冷手段36とが設けられている。上記排熱系35は、例えばヒータ5の上部に設けられた排気口37と、該排気口37と図示しない工場排気系とを結ぶ図示しない排熱管とから主に構成されている。排熱管には図示しない排気ブロワ及び熱交換器が設けられている。   In order to rapidly cool the wafer after the heat treatment to improve the processing speed or improve the throughput, the heater 5 includes an exhaust heat system 35 that exhausts the atmosphere in the space 33 between the heater 5 and the processing container 3 to the outside. A forced air cooling means 36 for forcibly cooling the space 33 by introducing air at normal temperature (20 to 30 ° C.) is provided. The exhaust heat system 35 is mainly composed of, for example, an exhaust port 37 provided in the upper portion of the heater 5 and an unshown exhaust heat pipe connecting the exhaust port 37 and a factory exhaust system (not shown). The exhaust heat pipe is provided with an exhaust blower and a heat exchanger (not shown).

上記強制空冷手段36は、上記断熱材16と外皮28の間に高さ方向に複数形成された環状流路38と、各環状流路38から断熱材16の中心斜め方向へ空気を吹き出して上記空間33の周方向に旋回流を生じさせるべく断熱材16に設けられた強制空冷用空気吹出し孔40とを有している。上記環状流路38は、断熱材16の外周面に帯状又は環状の断熱材41を貼り付けるか、或いは断熱材16の外周面を環状に削ることにより形成されている。上記空気吹出し孔40は、図6(a)、(b)に示すように断熱材16における上下に隣接するヒータエレメント18の間である棚部17にこれを径方向の内外に貫通するように形成されていることが好ましい。このように空気吹出し孔40を棚部17に設けることにより、ヒータエレメントに邪魔されることなく空気を上記空間33に噴出することができる。   The forced air cooling means 36 includes a plurality of annular flow paths 38 formed in the height direction between the heat insulating material 16 and the outer skin 28, and air is blown out from each of the annular flow paths 38 toward the center oblique direction of the heat insulating material 16. A forced air-cooling air blowing hole 40 provided in the heat insulating material 16 is provided to generate a swirling flow in the circumferential direction of the space 33. The annular flow path 38 is formed by attaching a belt-like or annular heat insulating material 41 to the outer peripheral surface of the heat insulating material 16 or by cutting the outer peripheral surface of the heat insulating material 16 into an annular shape. As shown in FIGS. 6 (a) and 6 (b), the air blowing hole 40 penetrates the shelf 17 between the heater elements 18 adjacent to each other in the heat insulating material 16 inward and outward in the radial direction. Preferably it is formed. By providing the air blowing hole 40 in the shelf portion 17 in this way, air can be ejected into the space 33 without being disturbed by the heater element.

上記外皮28の外周面には、各環状流路38に冷却流体を分配供給するための共通の1本の図示しない供給ダクトが高さ方向に沿って設けられ、外皮28には供給ダクト内と各環状流路38とを連通する連通口が形成されている。供給ダクトにはクリーンルーム内の空気を冷却流体として吸引し、圧送供給する図示しない冷却流体供給源(例えば送風機)が開閉バルブを介して接続されている。   A common supply duct (not shown) for distributing and supplying the cooling fluid to each annular flow path 38 is provided on the outer peripheral surface of the outer skin 28 along the height direction. A communication port that communicates with each annular flow path 38 is formed. A cooling fluid supply source (for example, a blower) (not shown) that sucks air in the clean room as a cooling fluid and supplies it by pressure is connected to the supply duct via an open / close valve.

以上のように構成された熱処理炉2ないし縦型熱処理装置1によれば、ウエハwを収容して熱処理するための処理容器3と、該処理容器3の周囲を覆うように設けられウエハwを加熱する円筒状のヒータ5とを備え、上記ヒータ5は、円筒状の断熱材16と、該断熱材16の内周面に軸方向に多段に形成された溝状の棚部17と、各棚部17に沿って配置されたヒータエレメント18とを具備し、上記ヒータエレメント18は帯状のものを波形に成形してなり、上記断熱材16には上記ヒータエレメント18を適宜間隔でヒータ5の径方向に移動可能に且つ棚部17から脱落しないように保持するピン部材20を配設しているため、断熱材16の内周面の各段の棚部17にコルゲートタイプのヒータエレメント5を露出した状態で設置することができ、急速昇降温が可能であると共に耐久性の向上及びコストの低減が図れる。コルゲートタイプのヒータエレメント18を用いることにより、エレメント表面積の割合を効果的に増やしてヒータ表面温度の低下によるヒータエレメントの負荷の低減が図れ、破断を抑制することができるため、ヒータエレメント18に大パワーを投入して急速昇温させることできる。また、断線が抑制されるため、耐久性の向上・長寿命化が図れると共に、ヒータエレメント18として安価なカンタル材を用いることが可能となり、コストの低減が図れる。   According to the heat treatment furnace 2 or the vertical heat treatment apparatus 1 configured as described above, the processing vessel 3 for accommodating and heat-treating the wafer w, and the wafer w provided so as to cover the periphery of the processing vessel 3 are provided. A cylindrical heater 5 for heating, and the heater 5 includes a cylindrical heat insulating material 16, groove-shaped shelf portions 17 formed in multiple stages in the axial direction on the inner peripheral surface of the heat insulating material 16, and A heater element 18 arranged along the shelf 17, the heater element 18 is formed in a band shape in a wave shape, and the heater element 18 is arranged on the heat insulating material 16 at an appropriate interval. Since the pin member 20 that is movable in the radial direction and is held so as not to fall off the shelf portion 17 is disposed, the corrugated heater element 5 is attached to the shelf portion 17 of each step on the inner peripheral surface of the heat insulating material 16. Install in an exposed state. It can be, can be improved and cost reduction of the durability as well as a possible rapid heating and cooling. By using the corrugated heater element 18, the ratio of the element surface area can be effectively increased, the load on the heater element can be reduced due to the lowering of the heater surface temperature, and the breakage can be suppressed. The temperature can be raised rapidly by turning on the power. In addition, since disconnection is suppressed, durability can be improved and the life can be extended, and an inexpensive Kanthal material can be used as the heater element 18 to reduce the cost.

上記断熱材16における上下に隣接するヒータエレメント18の間である棚部17には、該棚部17を内外に貫通する強制空冷用空気吹出し孔40が形成されているため、ヒータエレメントに邪魔されることなく空気を容易に吹き出すことができる。上記断熱材16は、縦に二分割されており、上記ヒータエレメント18も断熱材に対応して分割されているため、ヒータエレメントを断熱材に容易に組付けることができ、組立性の向上が図れる。   A forced air-cooling air blowing hole 40 penetrating the shelf 17 into and out of the shelf 17 between the heater elements 18 vertically adjacent to each other in the heat insulating material 16 is formed. Air can be blown out easily without any problems. The heat insulating material 16 is vertically divided into two, and the heater element 18 is also divided corresponding to the heat insulating material. Therefore, the heater element can be easily assembled to the heat insulating material, and the assembling property is improved. I can plan.

図7は発熱抵抗体の端部の接続板を断熱材に固定する構造の一例を示す図で、(a)は要部拡大斜視図、(b)は固定状態の断面図である。ヒータエレメント18の折り返し部分(Uターン部)である上記接続板23の変形を抑制ないし防止するために、接続板23が上記断熱材16の端部(分割面部)にピン等の固定部材(図示例ではコ字状のピン)45で固定されていると共に、上記接続板23には上記断熱材16の外周面に掛止される掛止部46が設けられている。   FIGS. 7A and 7B are diagrams showing an example of a structure for fixing the connecting plate at the end of the heating resistor to the heat insulating material. FIG. 7A is an enlarged perspective view of a main part, and FIG. In order to suppress or prevent the deformation of the connection plate 23 which is a folded portion (U-turn portion) of the heater element 18, the connection plate 23 is fixed to an end portion (divided surface portion) of the heat insulating material 16 such as a pin (see FIG. In the illustrated example, the connection plate 23 is fixed with a U-shaped pin) 45, and the connection plate 23 is provided with a latch portion 46 that is latched on the outer peripheral surface of the heat insulating material 16.

図8は発熱抵抗体の端部の接続板を断熱材に固定する構造の他の例を示す断面図である。断熱材16の端部には接続板23が固定部材45で固定されると共に、その接続板23を覆うように補助断熱材47が設けられている。補助断熱材47は、断熱材16の端部(分割面部)間に介在ないし充填される。固定部材45としては、ピン以外にパイプ、丸棒、角棒等であってもよい。   FIG. 8 is a cross-sectional view showing another example of a structure for fixing the connecting plate at the end of the heating resistor to the heat insulating material. At the end of the heat insulating material 16, the connection plate 23 is fixed by a fixing member 45, and an auxiliary heat insulating material 47 is provided so as to cover the connection plate 23. The auxiliary heat insulating material 47 is interposed or filled between the end portions (divided surface portions) of the heat insulating material 16. The fixing member 45 may be a pipe, a round bar, a square bar or the like in addition to the pin.

図9は発熱抵抗体の端部の接続板を断熱材に固定する構造の他の例を示す断面図である。接続板23には断熱材16又は補助断熱材47の中に入り込んで固定される固定片48が形成されている。この固定片48は、例えば接続板23の先端部を直角に折り曲げることにより形成されている。断熱材16の端部には接続板23を覆うように補助断熱材47が設けられている。固定片48は断熱材16側に入り込んでいる方が好ましいが(図9(b)参照)、補助断熱材47側に入り込んでいてもよい(図9(a)参照)。   FIG. 9 is a cross-sectional view showing another example of a structure for fixing the connecting plate at the end of the heating resistor to the heat insulating material. The connecting plate 23 is formed with a fixing piece 48 that enters and is fixed in the heat insulating material 16 or the auxiliary heat insulating material 47. The fixing piece 48 is formed, for example, by bending the tip of the connection plate 23 at a right angle. An auxiliary heat insulating material 47 is provided at the end of the heat insulating material 16 so as to cover the connection plate 23. The fixing piece 48 preferably enters the heat insulating material 16 side (see FIG. 9B), but may enter the auxiliary heat insulating material 47 side (see FIG. 9A).

図10は発熱抵抗体の凸部を倒れ防止ピンで保持する構造を示す図で、(a)は部分的斜視図、(b)は倒れ防止ピンの概略的斜視図である。断熱材16には、断熱材16の内周面より波形に凹凸となったヒータエレメント18の適宜箇所の凸部18aを下方に倒れないように保持するための倒れ防止ピン49が設けられている。この倒れ防止ピン49は、鋼線等の線材を折り曲げ加工することにより形成されている。一本の線材を二つに折り曲げ、これを更にコ字状に折り曲げ、先端の折り曲げ部を押し広げてループ状ないし略三角形の拡大部49aとしてある。この倒れ防止ピン49のコ字状部分49bの内側にヒータエレメント18の凸部18aを受け入れ、下の拡大部49aが断熱材16側近傍例えば溝部21又は棚部17の上部に位置される。倒れ防止ピン49の上の両端49c、49cは、断熱材16を貫通して外周面側に突出され、これら両端49c、49cを左右に折り曲げることにより掛止部として断熱材16の外周面に掛止される。   FIGS. 10A and 10B are diagrams showing a structure in which the convex portion of the heating resistor is held by a fall prevention pin, where FIG. 10A is a partial perspective view, and FIG. 10B is a schematic perspective view of the fall prevention pin. The heat insulating material 16 is provided with a fall prevention pin 49 for holding the convex portion 18a at an appropriate portion of the heater element 18 that is corrugated from the inner peripheral surface of the heat insulating material 16 so as not to fall down. . This fall prevention pin 49 is formed by bending a wire such as a steel wire. One wire is folded in two, further folded into a U shape, and the bent portion at the tip is pushed and widened to form a loop-like or substantially triangular enlarged portion 49a. The convex portion 18a of the heater element 18 is received inside the U-shaped portion 49b of the fall prevention pin 49, and the lower enlarged portion 49a is located in the vicinity of the heat insulating material 16 side, for example, the groove portion 21 or the upper portion of the shelf portion 17. Both ends 49c and 49c on the fall prevention pin 49 penetrate the heat insulating material 16 and protrude to the outer peripheral surface side, and the both ends 49c and 49c are bent to the left and right to be hooked on the outer peripheral surface of the heat insulating material 16. Stopped.

このような取付け方法により倒れ防止ピン49は、断熱材16のヒータエレメント18の周方向に適宜間隔で且つ断熱材16の軸方向に複数列例えば片方の断熱材に3列配置される。上記倒れ防止ピン49によれば、ヒータエレメント18の倒れや垂れ下がりを防止することができ、これにより断熱材16の溝部21の深さないし棚部(庇)17の突出量を減少することが可能となり、溝部21ないし棚部17をなくすことも可能となる。   By such an attachment method, the fall prevention pins 49 are arranged in a plurality of rows, for example, three rows in one heat insulating material at appropriate intervals in the circumferential direction of the heater element 18 of the heat insulating material 16 and in the axial direction of the heat insulating material 16. According to the fall prevention pin 49, the heater element 18 can be prevented from falling down or drooping, thereby reducing the depth of the groove portion 21 of the heat insulating material 16 and the protruding amount of the shelf portion (saddle) 17. Thus, the groove 21 or the shelf 17 can be eliminated.

図11は倒れ防止ピンの他の例を示す斜視図である。倒れ防止ピン49としては、一本の線材をコ字状に折り曲げたもの(図11(a)参照)、或いは一本の線材を二つに折り曲げ、これをコ字状に折り曲げたものであってもよい(図11(b)参照)。なお、両端49、49cは掛止部として折り曲げられる。   FIG. 11 is a perspective view showing another example of the fall prevention pin. As the fall prevention pin 49, one wire is bent in a U-shape (see FIG. 11A), or one wire is bent in two, and this is bent in a U-shape. (See FIG. 11B). Both ends 49 and 49c are bent as a hooking portion.

図12は発熱抵抗体の凸部を倒れ防止板で保持する構造を示す図で、(a)は部分的斜視図、(b)は倒れ防止板の概略的斜視図である。断熱材16には、断熱材16の内周面より波形に凹凸となったヒータエレメント18の適宜箇所の凸部18aの下部を下方に倒れないように支持するための倒れ防止板50が設けられている。この倒れ防止板50は、例えばセラミック製の長方形の板からなり、その長手方向の一端にはこれを断熱材に突き刺して固定するための先鋭部50aが形成されていることが好ましい。この倒れ防止板50がヒータエレメント18の凸部18aの下部を水平に支持することにより、ヒータエレメント18の倒れや垂れ下がりを防止することができ、これにより上記実施形態と同様、溝部21ないし棚部17をなくすことも可能となる。   12A and 12B are diagrams showing a structure in which the convex portion of the heating resistor is held by the fall prevention plate. FIG. 12A is a partial perspective view, and FIG. 12B is a schematic perspective view of the fall prevention plate. The heat insulating material 16 is provided with a fall prevention plate 50 for supporting the lower portion of the convex portion 18a at an appropriate location of the heater element 18 that is corrugated from the inner peripheral surface of the heat insulating material 16 so as not to fall downward. ing. The fall prevention plate 50 is made of, for example, a ceramic rectangular plate, and it is preferable that a sharpened portion 50a for piercing and fixing the same to a heat insulating material is formed at one end in the longitudinal direction. The fall prevention plate 50 horizontally supports the lower portion of the convex portion 18a of the heater element 18 to prevent the heater element 18 from falling down or drooping. Thus, as in the above embodiment, the groove portion 21 or the shelf portion can be prevented. 17 can be eliminated.

図13は断熱材の他の例を示す斜視図である。ヒータ5の断熱材16としては、熱膨張収縮による内部応力により内周面に亀裂を生じる場合があるので、これを防止するために図12に示すように、内周面に軸方向に沿った切れ込み(スリット)42が形成されていることが好ましい。また、ヒータの組立性を考慮して、断熱材16は、各棚部17の下面位置で上下に分割されていることが好ましい。すなわち、断熱材16は上下方向に多段に分割された分割ブロック16aからなっており、一段目の分割ブロック16aの棚部17にヒータエレメントを設置したら、二段目の分割ブロック16aを積み上げて該二段目の分割ブロック16aの棚部17にヒータエレメント18を設置するという具合にヒータエレメント18を各段の棚部17に容易に設置することができ、組立性の向上が図れる。この場合、上下に隣接する分割ブロック16aには互いに係合する位置決め用の凹部43aと凸部43bが対向面に周方向に沿って形成されていることが好ましい。   FIG. 13 is a perspective view showing another example of a heat insulating material. As the heat insulating material 16 of the heater 5, cracks may occur in the inner peripheral surface due to internal stress due to thermal expansion and contraction. To prevent this, as shown in FIG. 12, the inner peripheral surface is aligned along the axial direction. A cut (slit) 42 is preferably formed. In consideration of the assembly of the heater, it is preferable that the heat insulating material 16 is vertically divided at the lower surface position of each shelf portion 17. That is, the heat insulating material 16 is composed of divided blocks 16a that are divided into multiple stages in the vertical direction. When the heater element is installed on the shelf 17 of the first divided block 16a, the second divided blocks 16a are stacked and the The heater elements 18 can be easily installed on the shelves 17 of each stage so that the heater elements 18 can be installed on the shelves 17 of the second-stage divided blocks 16a, and the assemblability can be improved. In this case, it is preferable that a positioning concave portion 43a and a convex portion 43b that are engaged with each other are formed on the opposing surfaces along the circumferential direction in the divided blocks 16a that are vertically adjacent to each other.

なお、本発明は、上記実施の形態に限定されるものではなく、本発明の要旨の範囲内で種々の設計変更が可能である。例えば、処理容器としては、導入管部及び排気管部を有する耐熱金属例えばステンレス鋼製の円筒状のマニホールドを下端部に接続してなるものであってもよく、また、二重管構造であってもよい。   In addition, this invention is not limited to the said embodiment, A various design change is possible within the range of the summary of this invention. For example, the processing container may be formed by connecting a cylindrical manifold made of a heat-resistant metal such as stainless steel having an introduction pipe part and an exhaust pipe part to the lower end part, and has a double pipe structure. May be.

本発明の実施の形態である縦型熱処理装置を概略的に示す縦断面図である。1 is a longitudinal sectional view schematically showing a vertical heat treatment apparatus according to an embodiment of the present invention. 図1のA部拡大横断面図である。It is the A section expanded horizontal sectional view of FIG. 図1のA部拡大縦断面図である。It is the A section enlarged vertical sectional view of FIG. ヒータエレメントの平面図である。It is a top view of a heater element. ヒータエレメントの側面図である。It is a side view of a heater element. 断熱材の一例を示す図で、(a)は平面図、(b)は(a)のB−B線断面図である。It is a figure which shows an example of a heat insulating material, (a) is a top view, (b) is the BB sectional drawing of (a). 発熱抵抗体の端部の接続板を断熱材に固定する構造の一例を示す図で、(a)は要部拡大斜視図、(b)は固定状態の断面図である。It is a figure which shows an example of the structure which fixes the connection plate of the edge part of a heating resistor to a heat insulating material, (a) is a principal part expansion perspective view, (b) is sectional drawing of a fixed state. 発熱抵抗体の端部の接続板を断熱材に固定する構造の他の例を示す断面図である。It is sectional drawing which shows the other example of the structure which fixes the connection board of the edge part of a heating resistor to a heat insulating material. 発熱抵抗体の端部の接続板を断熱材に固定する構造の他の例を示す断面図である。It is sectional drawing which shows the other example of the structure which fixes the connection board of the edge part of a heating resistor to a heat insulating material. 発熱抵抗体の凸部を倒れ防止ピンで保持する構造を示す図で、(a)は部分的斜視図、(b)は倒れ防止ピンの概略的斜視図である。It is a figure which shows the structure which hold | maintains the convex part of a heating resistor with a fall prevention pin, (a) is a partial perspective view, (b) is a schematic perspective view of a fall prevention pin. 倒れ防止ピンの他の例を示す斜視図である。It is a perspective view which shows the other example of a fall prevention pin. 発熱抵抗体の凸部を倒れ防止板で保持する構造を示す図で、(a)は部分的斜視図、(b)は倒れ防止板の概略的斜視図である。It is a figure which shows the structure which hold | maintains the convex part of a heating resistor with a fall prevention board, (a) is a partial perspective view, (b) is a schematic perspective view of a fall prevention board. 断熱材の他の例を示す部分的斜視図である。It is a fragmentary perspective view which shows the other example of a heat insulating material. 従来のヒータの一例を示す図で、(a)は断面図、(b)は内周面の図である。It is a figure which shows an example of the conventional heater, (a) is sectional drawing, (b) is a figure of an internal peripheral surface.

符号の説明Explanation of symbols

w 半導体ウエハ(被処理体)
1 縦型熱処理装置
2 熱処理炉
3 処理容器
3a 炉口
16 断熱材
17 棚部
18 ヒータエレメント(発熱抵抗体)
20 ピン部材
20b 脚部
23 接続板
40 強制空冷用空気吹出し孔
45 固定部材
46 掛止部
47 補助断熱材
48 固定片
49 倒れ防止ピン
50 倒れ防止板
w Semiconductor wafer (object to be processed)
DESCRIPTION OF SYMBOLS 1 Vertical heat processing apparatus 2 Heat processing furnace 3 Processing container 3a Furnace port 16 Heat insulating material 17 Shelf part 18 Heater element (heating resistor)
20 Pin member 20b Leg 23 Connection plate 40 Air blowout hole for forced air cooling 45 Fixing member 46 Latching part 47 Auxiliary heat insulating material 48 Fixing piece 49 Fall prevention pin 50 Fall prevention plate

Claims (20)

被処理体を収容して熱処理するための処理容器と、該処理容器の周囲を覆うように設けられ被処理体を加熱する円筒状のヒータとを備えた熱処理炉において、上記ヒータは、円筒状の断熱材と、該断熱材の内周面に沿って配置された発熱抵抗体とを具備し、上記発熱抵抗体は帯状のものを波形に曲げ加工してなり、上記断熱材には上記発熱抵抗体を適宜間隔でヒータの径方向に移動可能に保持するピン部材を配設したことを特徴とする熱処理炉。   In a heat treatment furnace provided with a processing container for storing and heat-treating an object to be processed, and a cylindrical heater provided to cover the periphery of the processing container and heating the object to be processed, the heater is cylindrical And a heat generating resistor disposed along the inner peripheral surface of the heat insulating material. The heat generating resistor is formed by bending a belt-like object into a corrugated shape. A heat treatment furnace comprising a pin member for holding a resistor so as to be movable in a radial direction of the heater at an appropriate interval. 上記ピン部材は、発熱抵抗体の内面が谷形になった部分を支持すべくコ字状に形成され、その両脚部が断熱材を内側から外側に貫通し、外側で折り曲げられて断熱材の外周面に係止されていることを特徴とする請求項1記載の熱処理炉。   The pin member is formed in a U shape so as to support the valley portion of the inner surface of the heating resistor, and both legs penetrate the heat insulating material from the inside to the outside and are bent on the outside to be The heat treatment furnace according to claim 1, wherein the heat treatment furnace is locked to the outer peripheral surface. 上記断熱材の内周面には上記発熱抵抗体の全部または一部を収容する周方向に連続した溝部が上下方向に適宜間隔で複数形成されていることを特徴とする請求項1記載の熱処理炉。   2. The heat treatment according to claim 1, wherein a plurality of circumferentially continuous grooves that accommodate all or part of the heating resistor are formed on the inner peripheral surface of the heat insulating material at appropriate intervals in the vertical direction. Furnace. 上記断熱材には、上下に隣接する発熱抵抗体の間において内外に貫通する強制空冷用空気吹出し孔が周方向に適宜間隔で複数形成されていることを特徴とする請求項1記載の熱処理炉。   2. The heat treatment furnace according to claim 1, wherein a plurality of forced air-cooling air blowing holes penetrating inward and outward are formed in the heat insulating material at appropriate intervals in the circumferential direction. . 上記断熱材は縦に二分割されており、上記発熱抵抗体も断熱材に対応して分割されていると共に、その上下に隣接する発熱抵抗体を直列に接続すべく端部同士が接続板を介して接続され、該接続板が上記断熱材の分割面部に配置されていることを特徴とする請求項1記載の熱処理炉。   The heat insulating material is vertically divided into two, and the heating resistor is also divided corresponding to the heat insulating material, and the end portions are connected to each other in order to connect the heating resistors adjacent to the upper and lower sides in series. The heat treatment furnace according to claim 1, wherein the connection plate is disposed on a divided surface portion of the heat insulating material. 上記接続板が上記断熱材の分割面部にピン等の固定部材で固定されていることを特徴とする請求項5記載の熱処理炉。   6. The heat treatment furnace according to claim 5, wherein the connection plate is fixed to a split surface portion of the heat insulating material by a fixing member such as a pin. 上記接続板には上記断熱材の外周面に掛止される掛止部が設けられていることを特徴とする請求項5記載の熱処理炉。   6. The heat treatment furnace according to claim 5, wherein the connecting plate is provided with a latching portion that is latched on an outer peripheral surface of the heat insulating material. 上記接続板には上記断熱材の中に入り込んで固定される固定片が形成されていることを特徴とする請求項5記載の熱処理炉。   6. The heat treatment furnace according to claim 5, wherein a fixing piece is formed on the connection plate so as to enter and be fixed in the heat insulating material. 上記断熱材には、断熱材の内周面より波形に凹凸となった上記発熱抵抗体の適宜箇所の凸部を下方に倒れないように保持するための倒れ防止ピンが設けられていることを特徴とする請求項1記載の熱処理炉。   The heat insulating material is provided with an anti-falling pin for holding the convex portion at an appropriate location of the heating resistor, which is corrugated from the inner peripheral surface of the heat insulating material, so as not to fall downward. The heat treatment furnace according to claim 1, wherein 上記断熱材には、断熱材の内周面より波形に凹凸となった上記発熱抵抗体の適宜箇所の凸部の下部を下方に倒れないように支持するための倒れ防止板が設けられていることを特徴とする請求項1記載の熱処理炉。   The heat insulating material is provided with a fall prevention plate for supporting the lower part of the convex portion at an appropriate location of the heating resistor, which is corrugated from the inner peripheral surface of the heat insulating material, so as not to fall downward. The heat treatment furnace according to claim 1. 下部が炉口として開放され被処理体を収容して熱処理するための縦長の処理容器の周囲に上記被処理体を加熱する円筒状のヒータを設けてなる熱処理炉と、上記炉口を閉塞する蓋体と、該蓋体上に被処理体を多段に保持する保持具を載置し、該蓋体を昇降させて蓋体の開閉と上記処理容器内への保持具の搬入搬出を行う昇降機構と備えた縦型熱処理装置において、上記ヒータは、円筒状の断熱材と、該断熱材の内周面に配置された発熱抵抗体とを具備し、上記発熱抵抗体は帯状のものを波形に曲げ加工してなり、上記断熱材には上記発熱抵抗体を適宜間隔でヒータの径方向に移動可能に保持するピン部材を配設したことを特徴とする縦型熱処理装置。   A heat treatment furnace provided with a cylindrical heater that heats the object to be processed around a vertically long processing container for opening and heat-treating the object to be processed by opening the lower part as a furnace port, and closing the furnace port A lid and a holder for holding the object to be processed in multiple stages are placed on the lid, and the lid is moved up and down to open and close the lid and to carry the holder into and out of the processing container. In the vertical heat treatment apparatus provided with the mechanism, the heater includes a cylindrical heat insulating material and a heat generating resistor disposed on the inner peripheral surface of the heat insulating material, and the heat generating resistor has a strip shape. A vertical heat treatment apparatus, wherein the heat insulating material is provided with a pin member that holds the heat generating resistor movably in the radial direction of the heater at an appropriate interval. 上記ピン部材は、発熱抵抗体の内面が谷形になった部分を支持すべくコ字状に形成され、その両脚部が断熱材を内側から外側に貫通し、外側で折り曲げられて断熱材の外周面に係止されていることを特徴とする請求項10記載の縦型熱処理装置。   The pin member is formed in a U shape so as to support the valley portion of the inner surface of the heating resistor, and both legs penetrate the heat insulating material from the inside to the outside and are bent on the outside to be The vertical heat treatment apparatus according to claim 10, wherein the vertical heat treatment apparatus is locked to an outer peripheral surface. 上記断熱材の内周面には上記発熱抵抗体の全部または一部を収容する周方向に連続した溝部が上下方向に適宜間隔で複数形成されていることを特徴とする請求項10記載の縦型熱処理装置。   11. The longitudinal section according to claim 10, wherein a plurality of circumferentially continuous grooves that accommodate all or part of the heating resistor are formed in the inner circumferential surface of the heat insulating material at appropriate intervals in the vertical direction. Mold heat treatment equipment. 上記断熱材には、上下に隣接する発熱抵抗体の間において内外に貫通する強制空冷用空気吹出し孔が周方向に適宜間隔で複数形成されていることを特徴とする請求項10記載の縦型熱処理装置。   11. The vertical type according to claim 10, wherein a plurality of forced air-cooling air blowing holes penetrating inward and outward are formed in the heat insulating material at appropriate intervals in the circumferential direction. Heat treatment equipment. 上記断熱材は縦に二分割されており、上記発熱抵抗体も断熱材に対応して分割されていると共に、その上下に隣接する発熱抵抗体を直列に接続すべく端部同士が接続板を介して接続され、該接続板が上記断熱材の分割面部に配置されていることを特徴とする請求項10記載の縦型熱処理装置。   The heat insulating material is vertically divided into two, and the heating resistor is also divided corresponding to the heat insulating material, and the end portions are connected to each other in order to connect the heating resistors adjacent to the upper and lower sides in series. The vertical heat treatment apparatus according to claim 10, wherein the connection plate is disposed on a divided surface portion of the heat insulating material. 上記接続板が上記断熱材の分割面部にピン等の固定部材で固定されていることを特徴とする請求項14記載の縦型熱処理装置。   15. The vertical heat treatment apparatus according to claim 14, wherein the connecting plate is fixed to a split surface portion of the heat insulating material by a fixing member such as a pin. 上記接続板には上記断熱材の外周面に掛止される掛止部が設けられていることを特徴とする請求項14記載の縦型熱処理装置。   The vertical heat treatment apparatus according to claim 14, wherein the connection plate is provided with a latching portion that is latched on an outer peripheral surface of the heat insulating material. 上記接続板には上記断熱材の中に入り込んで固定される固定片が形成されていることを特徴とする請求項14記載の縦型熱処理装置。   The vertical heat treatment apparatus according to claim 14, wherein the connection plate is formed with a fixing piece that enters and is fixed in the heat insulating material. 上記断熱材には、断熱材の内周面より波形に凹凸となった上記発熱抵抗体の適宜箇所の凸部を下方に倒れないように保持するための倒れ防止ピンが設けられていることを特徴とする請求項14記載の縦型熱処理装置。   The heat insulating material is provided with an anti-falling pin for holding the convex portion at an appropriate location of the heating resistor, which is corrugated from the inner peripheral surface of the heat insulating material, so as not to fall downward. The vertical heat treatment apparatus according to claim 14. 上記断熱材には、断熱材の内周面より波形に凹凸となった上記発熱抵抗体の適宜箇所の凸部の下部を下方に倒れないように支持するための倒れ防止板が設けられていることを特徴とする請求項14記載の縦型熱処理装置。   The heat insulating material is provided with a fall prevention plate for supporting the lower part of the convex portion at an appropriate location of the heating resistor, which is corrugated from the inner peripheral surface of the heat insulating material, so as not to fall downward. The vertical heat treatment apparatus according to claim 14.
JP2008025113A 2007-03-20 2008-02-05 Heat treatment furnace and vertical heat treatment equipment Active JP5248874B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2008025113A JP5248874B2 (en) 2007-03-20 2008-02-05 Heat treatment furnace and vertical heat treatment equipment
TW097109508A TWI392843B (en) 2007-03-20 2008-03-18 Heat processing furnace and vertical-type heat processing appartus
US12/076,531 US8023806B2 (en) 2007-03-20 2008-03-19 Heat processing furnace and vertical-type heat processing apparatus
KR1020080025153A KR101117016B1 (en) 2007-03-20 2008-03-19 Heat treatment furnace and vertical heat treatment apparatus
CN2008101003779A CN101312123B (en) 2007-03-20 2008-03-20 Heat processing furnace and vertical-type heat processing apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007072477 2007-03-20
JP2007072477 2007-03-20
JP2008025113A JP5248874B2 (en) 2007-03-20 2008-02-05 Heat treatment furnace and vertical heat treatment equipment

Publications (2)

Publication Number Publication Date
JP2008263170A true JP2008263170A (en) 2008-10-30
JP5248874B2 JP5248874B2 (en) 2013-07-31

Family

ID=39985401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008025113A Active JP5248874B2 (en) 2007-03-20 2008-02-05 Heat treatment furnace and vertical heat treatment equipment

Country Status (4)

Country Link
JP (1) JP5248874B2 (en)
KR (1) KR101117016B1 (en)
CN (1) CN101312123B (en)
TW (1) TWI392843B (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101087164B1 (en) 2009-07-21 2011-11-25 가부시키가이샤 히다치 고쿠사이 덴키 Heating device, substrate processing apparatus, and method of manufacturing semiconductor device
JP2012009702A (en) * 2010-06-25 2012-01-12 Hitachi Kokusai Electric Inc Heating device and manufacturing method of semiconductor device
JP2012089557A (en) * 2010-10-15 2012-05-10 Hitachi Kokusai Electric Inc Substrate processing equipment and method for manufacturing semiconductor device
CN102709213A (en) * 2009-07-21 2012-10-03 株式会社日立国际电气 Heating device, substrate processing apparatus, and method of manufacturing semiconductor device
JP2013004904A (en) * 2011-06-21 2013-01-07 Nichias Corp Heat treatment furnace and heat treatment apparatus
JP2013030676A (en) * 2011-07-29 2013-02-07 Tokyo Electron Ltd Thermal treatment apparatus
JP2013038128A (en) * 2011-08-04 2013-02-21 Tokyo Electron Ltd Heat treatment apparatus
JP2014158023A (en) * 2014-02-05 2014-08-28 Hitachi Kokusai Electric Inc Heating device, substrate processing apparatus, and method of manufacturing semiconductor device
US8957352B2 (en) 2011-06-27 2015-02-17 Tokyo Electron Limited Heat treatment furnace and heat treatment apparatus
US9064912B2 (en) 2009-07-21 2015-06-23 Hitachi Kokusai Electric, Inc. Heating device, substrate processing apparatus, and method of manufacturing semiconductor device

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202010001370U1 (en) * 2010-01-25 2010-05-06 Türk & Hillinger GmbH Electric heater
KR101677560B1 (en) * 2014-03-18 2016-11-18 주식회사 유진테크 Apparatus for processing substrate with heater adjusting process space temperature according to height
KR20170071171A (en) * 2015-12-15 2017-06-23 주식회사 대유위니아 electric rice cooker
KR102234898B1 (en) * 2015-12-16 2021-04-01 주식회사 위니아딤채 electric rice cooker
KR102231034B1 (en) * 2015-12-17 2021-03-23 주식회사 위니아딤채 Electric rice cooker
CN110087354B (en) * 2018-01-26 2022-05-03 鸿成国际科技股份有限公司 Heater supporting device
JP7122856B2 (en) * 2018-05-02 2022-08-22 東京エレクトロン株式会社 Heat treatment equipment
CN112414107B (en) * 2020-11-04 2023-01-17 北京北方华创微电子装备有限公司 Vertical heat treatment equipment and furnace body loading and unloading method and transfer device thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63199414A (en) * 1987-02-14 1988-08-17 Dainippon Screen Mfg Co Ltd Heat treatment equipment for substrate
JPH07135179A (en) * 1993-11-10 1995-05-23 Tokyo Electron Ltd Manufacture of heat-treating furnace and heat-treating furnace
JPH07253276A (en) * 1994-03-16 1995-10-03 Tokyo Electron Ltd Heat treating furnace, and manufacture thereof
JPH0864546A (en) * 1993-11-10 1996-03-08 Tokyo Electron Ltd Heat treatment furnace and manufacture thereof
JP2001513871A (en) * 1996-10-30 2001-09-04 カンタル・アーベー Electric furnace assembly
JP2005093746A (en) * 2003-09-18 2005-04-07 Sanko:Kk Heat treatment furnace

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4849608A (en) * 1987-02-14 1989-07-18 Dainippon Screen Mfg. Co., Ltd. Apparatus for heat-treating wafers
JPH10233277A (en) * 1997-02-18 1998-09-02 Tokyo Electron Ltd Heat treatment device
KR100569646B1 (en) * 2000-09-29 2006-04-11 동경 엘렉트론 주식회사 Heat-treating apparatus and heat-treating method
JP3421660B2 (en) * 2001-05-09 2003-06-30 東京エレクトロン株式会社 Heat treatment apparatus and method
JP2003272804A (en) * 2002-03-15 2003-09-26 Hitachi Kokusai Electric Inc Heat treatment device
AU2002238956A1 (en) * 2002-03-19 2003-09-29 Koyo Thermo Systems Co., Ltd. Electric heater for thermal treatment furnace
JP2005197074A (en) * 2004-01-07 2005-07-21 Ngk Insulators Ltd Resistance heating element and heater

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63199414A (en) * 1987-02-14 1988-08-17 Dainippon Screen Mfg Co Ltd Heat treatment equipment for substrate
JPH07135179A (en) * 1993-11-10 1995-05-23 Tokyo Electron Ltd Manufacture of heat-treating furnace and heat-treating furnace
JPH0864546A (en) * 1993-11-10 1996-03-08 Tokyo Electron Ltd Heat treatment furnace and manufacture thereof
JPH07253276A (en) * 1994-03-16 1995-10-03 Tokyo Electron Ltd Heat treating furnace, and manufacture thereof
JP2001513871A (en) * 1996-10-30 2001-09-04 カンタル・アーベー Electric furnace assembly
JP2005093746A (en) * 2003-09-18 2005-04-07 Sanko:Kk Heat treatment furnace

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9064912B2 (en) 2009-07-21 2015-06-23 Hitachi Kokusai Electric, Inc. Heating device, substrate processing apparatus, and method of manufacturing semiconductor device
KR101087163B1 (en) 2009-07-21 2011-11-25 가부시키가이샤 히다치 고쿠사이 덴키 Heating device, substrate processing apparatus, and method of manufacturing semiconductor device
CN102709213A (en) * 2009-07-21 2012-10-03 株式会社日立国际电气 Heating device, substrate processing apparatus, and method of manufacturing semiconductor device
US9449849B2 (en) 2009-07-21 2016-09-20 Hitachi Kokusai Electric Inc. Method of manufacturing semiconductor device using meander-shaped heating element
KR101087164B1 (en) 2009-07-21 2011-11-25 가부시키가이샤 히다치 고쿠사이 덴키 Heating device, substrate processing apparatus, and method of manufacturing semiconductor device
JP2012009702A (en) * 2010-06-25 2012-01-12 Hitachi Kokusai Electric Inc Heating device and manufacturing method of semiconductor device
JP2012089557A (en) * 2010-10-15 2012-05-10 Hitachi Kokusai Electric Inc Substrate processing equipment and method for manufacturing semiconductor device
JP2013004904A (en) * 2011-06-21 2013-01-07 Nichias Corp Heat treatment furnace and heat treatment apparatus
US9466515B2 (en) 2011-06-21 2016-10-11 Nichias Corporation Heat treatment furnace and heat treatment apparatus
KR101569557B1 (en) * 2011-06-21 2015-11-16 도쿄엘렉트론가부시키가이샤 Heat treatment furnace and heat treatment apparatus
US8957352B2 (en) 2011-06-27 2015-02-17 Tokyo Electron Limited Heat treatment furnace and heat treatment apparatus
JP2013030676A (en) * 2011-07-29 2013-02-07 Tokyo Electron Ltd Thermal treatment apparatus
US9105672B2 (en) 2011-08-04 2015-08-11 Tokyo Electron Limited Heat treatment apparatus
JP2013038128A (en) * 2011-08-04 2013-02-21 Tokyo Electron Ltd Heat treatment apparatus
JP2014158023A (en) * 2014-02-05 2014-08-28 Hitachi Kokusai Electric Inc Heating device, substrate processing apparatus, and method of manufacturing semiconductor device

Also Published As

Publication number Publication date
CN101312123A (en) 2008-11-26
TWI392843B (en) 2013-04-11
KR20080085744A (en) 2008-09-24
TW200914783A (en) 2009-04-01
KR101117016B1 (en) 2012-03-15
JP5248874B2 (en) 2013-07-31
CN101312123B (en) 2012-06-20

Similar Documents

Publication Publication Date Title
JP5248874B2 (en) Heat treatment furnace and vertical heat treatment equipment
JP4331768B2 (en) Heat treatment furnace and vertical heat treatment equipment
JP5096182B2 (en) Heat treatment furnace
US8023806B2 (en) Heat processing furnace and vertical-type heat processing apparatus
KR101360069B1 (en) Vertical heat treatment apparatus and method for cooling the apparatus
JP5248826B2 (en) Heat treatment furnace and manufacturing method thereof
JP5868619B2 (en) Heat treatment furnace and heat treatment apparatus
JP4445519B2 (en) Heat treatment furnace and manufacturing method thereof
KR101368206B1 (en) Vertical heat treatment apparatus and, assembly of pressure detection system and temperature sensor
US8158911B2 (en) Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending member
JP2006100755A (en) Substrate processing equipment and electric heater for substrate processing equipment, and substrate processing equipment equipped with this
JP5770042B2 (en) Heat treatment equipment
JP5497860B2 (en) Heat treatment furnace and support for heat treatment furnace
KR101904456B1 (en) Power cooling water device for tube buried furnace regarding the development of the high temperature furnace firing the electric power semiconductor
JP2013030676A (en) Thermal treatment apparatus

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20100914

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100914

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121225

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130206

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130409

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130411

R150 Certificate of patent or registration of utility model

Ref document number: 5248874

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160419

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250