TWI283907B - Stage apparatus and exposing device - Google Patents

Stage apparatus and exposing device Download PDF

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Publication number
TWI283907B
TWI283907B TW092113292A TW92113292A TWI283907B TW I283907 B TWI283907 B TW I283907B TW 092113292 A TW092113292 A TW 092113292A TW 92113292 A TW92113292 A TW 92113292A TW I283907 B TWI283907 B TW I283907B
Authority
TW
Taiwan
Prior art keywords
stage
driven
movable
substrate
movable member
Prior art date
Application number
TW092113292A
Other languages
English (en)
Chinese (zh)
Other versions
TW200308048A (en
Inventor
Yasuo Aoki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200308048A publication Critical patent/TW200308048A/zh
Application granted granted Critical
Publication of TWI283907B publication Critical patent/TWI283907B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
TW092113292A 2002-06-10 2003-05-16 Stage apparatus and exposing device TWI283907B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002168454A JP4360064B2 (ja) 2002-06-10 2002-06-10 ステージ装置および露光装置

Publications (2)

Publication Number Publication Date
TW200308048A TW200308048A (en) 2003-12-16
TWI283907B true TWI283907B (en) 2007-07-11

Family

ID=29996436

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092113292A TWI283907B (en) 2002-06-10 2003-05-16 Stage apparatus and exposing device

Country Status (4)

Country Link
JP (1) JP4360064B2 (ja)
KR (1) KR101010043B1 (ja)
CN (1) CN1469193B (ja)
TW (1) TWI283907B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI476065B (zh) * 2012-11-01 2015-03-11 Univ Southern Taiwan Sci & Tec 共平面平台機構

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR100568207B1 (ko) 2004-02-13 2006-04-05 삼성전자주식회사 이송장치
US7456527B2 (en) * 2004-03-04 2008-11-25 Asml Netherlands B.V. Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method
KR101043925B1 (ko) * 2009-04-24 2011-06-29 한국기계연구원 3축 스테이지장치
WO2010131485A1 (ja) * 2009-05-15 2010-11-18 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法
US20110141448A1 (en) * 2009-11-27 2011-06-16 Nikon Corporation Substrate carrier device, substrate carrying method, substrate supporting member, substrate holding device, exposure apparatus, exposure method and device manufacturing method
KR101050455B1 (ko) * 2009-12-18 2011-07-19 이춘무 정밀 승강장치
CN102803109B (zh) * 2010-02-12 2015-04-22 株式会社尼康 用于带状片材基板的搬送装置及处理装置
CN102194731B (zh) * 2010-03-12 2013-03-27 北京北方微电子基地设备工艺研究中心有限责任公司 一种位置校准***及等离子体处理装置
US8988655B2 (en) * 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
JP5677025B2 (ja) * 2010-10-22 2015-02-25 株式会社トプコン 載置ステージ
KR101234602B1 (ko) 2011-05-12 2013-02-22 한국교통대학교산학협력단 레이저 산란 기반 시편 검사 장치
CN103115591B (zh) * 2013-01-18 2015-08-05 中国民航科学技术研究院 一种用于检测货运x射线安全检查设备的测试装置
JP6655925B2 (ja) 2015-09-24 2020-03-04 東京エレクトロン株式会社 ステージ装置及びプローブ装置
TWI722376B (zh) * 2018-01-30 2021-03-21 日商新川股份有限公司 致動器以及打線接合裝置
CN110161805B (zh) * 2018-02-26 2021-05-18 山东蓝彩天下教育科技有限公司 印刷用曝光机的预涂感光版曝光装置
CN111060294B (zh) * 2019-12-31 2022-04-12 茂莱（南京）仪器有限公司 一种荧光显微物镜综合测试平台
CN116190294B (zh) * 2023-04-24 2023-07-25 上海果纳半导体技术有限公司 一种天车示教方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JP2000111677A (ja) * 1998-10-07 2000-04-21 Canon Inc 位置決めステージ装置、カラーフィルタ製造装置および液晶用アライナ
JP2001143988A (ja) * 1999-11-10 2001-05-25 Canon Inc 移動案内装置および該装置を用いた露光装置
JP2001297960A (ja) * 2000-04-11 2001-10-26 Nikon Corp ステージ装置および露光装置
JP2002110523A (ja) * 2000-09-29 2002-04-12 Sumitomo Heavy Ind Ltd 露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI476065B (zh) * 2012-11-01 2015-03-11 Univ Southern Taiwan Sci & Tec 共平面平台機構

Also Published As

Publication number Publication date
JP4360064B2 (ja) 2009-11-11
TW200308048A (en) 2003-12-16
CN1469193A (zh) 2004-01-21
CN1469193B (zh) 2011-06-01
JP2004014915A (ja) 2004-01-15
KR20030095327A (ko) 2003-12-18
KR101010043B1 (ko) 2011-01-21

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