1283907 11415pifl 九、發明說明： 【發明所屬之技術領域】 二於一 Γ載台裝置’使保持基板的載台本 ======= 【先前技術】 r中習示器(統稱為平面顯哪 土反璃基板)上形成電晶體或二極體，多 力此曝光裝置是把塗佈有感光劑的基板載置 於載口衣置的支#上’把描較光罩上的微細電路圖幸， 透過投影透鏡等的光學系’轉寫絲板上。在基板上y 電路圖案多層重疊以形成配線回路，因此，#在曝光裝置 中’把例如g2層以後的圖案像轉寫至基板時，對於已形 成的電路圖案，此些欲曝光的圖案需正確地重合。 / 在第15圖的例示中，繪示液晶顯示器製造用曝光裝置 中的平板載台（基板載台裝置）的概略結構。在定盤91上之 -X側邊緣，固定導引部92是沿Y方向設置。更在定盤 91的表面上，依X方向延伸的導樑％是呈與第i滑架 (carnage)94相結合的狀態被設置著。此些導樑93及滑架 94是由線性馬達100、101之驅動而沿著定盤％及固定導 引部92在γ方向移動自如。 在導樑93上設有由線性馬達99驅動而以該導樑93 1283907 Π415ριΠ 及疋盤91為導引部於X方向移動自如的第2滑架95。定 盤91、固定導引部92、導樑93及滑架94、95之間，是透 過維持非接觸狀態的氣體軸承(gas bearing)96而分別組裝 的。 在第2滑架95的上部設有:可上下(Z軸）方向微動的平 台（platetable)97及可繞Z軸回轉微小角度的平板支架98。 在平板支架98上，未圖示的基板(玻璃基板)是由真空吸著 而被矯正固定在平板支架98的上面。此些滑架94、95， 平f 97、平板支架98構成平板載台9〇。在基板的上方配 置著成像光學系，在成像光學系的上方配置著光罩支架及 =罩更，在光罩上方配置著照明光學系及作為光源的燈 二未圖不）。此些構件是由設置在定盤91上的圓柱所支 符著。 ，上述結構中u用燈管和照明光學的曝光光之照 曝^^~於光罩上的微細電路圖案，透過成像光學系 此時，因為是僅限於透過成像光㈣可對光 域像㈣光區域，所以，光罩及基板是相對 二tri罩支架及平板載台90的X方向或γ方 =目田私動，進行連續的掃瞒曝光。 以下的 =題在上述的f知载台裝置及曝光裝置中，存在著 為固技術的載台裝置中，當娜方向 ㈣的主 包含㈣或平板支 J及線性馬達99移動，所以，掃瞄 1283907 11415pifl 100、110的控制性便愈 方向之移動重量愈大，則線性馬達 惡化。 載口上，接續著用以供給各種資 給構件之電議、空壓管、冷卻管等，然而原上= 载= 多動，此些資源供給構件會因定常的或衝擊的抗力 而因ί振動等的外擾，因而造成控制性低下的原因之一。 Ί雖考量把從動於主載台的從動載台設在掃目苗方向 (Υ轴方向）或正交掃晦方向(X車由方向)上而鄰接載台，以中 繼傳运連接至主載纟之此些資源供給構件H益論配 置於其中任—方向，都要位於定盤91上，所以錢的面積 會變大H要求定盤精度的地$(支持面）變多，成本 會增加，因而會產生裝置大型化的問題。 更，當主載台在與從動載台的從動方向相異之方向移 動時，此些資源供給構件在動時會相互摩擦而發塵，異物 便會附著在基板上，因而有產生基板曝光處理之不良品之 虞。在此，雖考量以蓋子覆於上述資源供給構件，以抑制 發塵，但在蓋子的移動方向上，伴隨著蓋子移動而產生的 振動便成為控制系的外擾，因而造成高速高精度定位的障 礙0 另一方面，在上述的載台裝置中，把基板設置在平板 支架98上，雖然，可使該平板支架98在基板表面（水平面) 内回轉微小角度以進行對位，然而，因額外需要使大型的 平板支架98回轉的複雜的機構，精密的定位費時，且需有 防止定位後偏移的對策，也要擔心平板支架98的平面度惡 l2839〇7 ll4l5pifl 化 载台:要3:大胞=連續對基板曝光的裝置中，因為 不得不時的重量或裝置尺寸的限制而 ^而擔心會延長現場組裝的時間。 甲 【發明内容】 置及暖^ ^考里到上述問題點而做成，提供—種載台裝 制性 的發 還可達穿2 ’不損及線性馬達等的驅動裝置之控制拇， 塵。I置輕巧化，並可抑制由資源供給構件所產生 置，不需目較提供一種載台裝置及曝光裝 支架平面ΐίϊ構，不會產生基板位置的偏移或是平板 本發可高精度、短時間地定位基板。更， 大型化的^供—種載台裝置及曝光裝置，不用分解 可_現‘二S維持精度的裝態下進行輸送，且也 第丨二=目二本發明是採用第1實施例之第1圖〜 載台震置35，具備:導引構件4及驅動裝置 n 1牛4是導引保持著基板P的載台本體7、10、 向Y上移動自如，並使之在基座1上往第2 第;方。驅動裂置孔是驅動載台本體7、10、11往 。且，連接著驅動裝置ΥΕ之至少一部分27, 導弓丨構件4和第2方向的從動載台25，是配設在 1283907 ll415pifl ‘引構件4和基座1之間。 裝置因ΥΓ=她的載台裝置中，從動載台25具備驅動 的至少—部分27 ’所以’可使載台本體7、1〇、 么在本發明中，把從動載 i μ在導引構件4和基座1之間，所以不需把基座1 :面擴大(變廣），在基座上需要求精度的地林多，且可 r if置的大型化。更，當把資源供給構件17中繼傳送給 ^載台25的場合，即使資源供給構件彼此間摩擦而發 『也不易因導引構件4或蓋構件85、86的存在而使異物 附者於基板P上。 又本發明的曝光裝置31，是把保持於光罩載台MST 上的光罩Μ圖案，曝光至被保持在基板載台3 基板ρ，是用以作為光罩載台體和基板載台35;= 一方的載台。 因此，在本發明的曝光裝置中，可把光罩Μ及感光基 板Ρ高精度地進行位置控制及速度控制，因而可提高圖案 的轉寫精度，且可實現裝置的低價化及小型化。更，在本 ♦明中’因為在感光基板Ρ上附著異物的可能性降低，所 以可抑制不良品的發生。 為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂，下文特舉較佳實施例，並配合所附圖式，作詳細說 明如下。 【實施方式】 1283907 11415pifl 以下，參照第1圖至第14圖以說明本發明載 及曝光裝置的實施例。在此，本發明的載台裝置，係^ 如掃瞄方式把光罩圖案曝光至作為感光基板(基板)之 為角形的玻璃基板的掃瞄型曝光裝置為例以說明之。且，° 此曝光裝置是適用於使保持玻璃基板的載台裝置移動的美 板載台。在此些圖案中，和習知例之第15圖相同的構成二 件使用相同的符號，在此便省略其說明。 第1圖緣示本發明的曝光裝置31的概略結構圖。此* 光裝置31具備··照明光學系32、保持著光罩（光栅)Μ而移 動的光罩載台33、投影光學系PL、保持投影光學系？乙之 本體圓柱34、保持玻璃基板(基板、感光基板)ρ而移動之 基板載台裝置(載台裝置)35。 照明光學系32,例如像日本專利早期公開之特開平 9-320956號公報所揭露的那樣，是由光源單元、快門、2 次光源形成光學系、分光器、集光透鏡系、光罩遮光部 (reticle blind)及成像透鏡系（皆未圖示)所構成。被保持在光 罩載台裝置33上的光罩μ上的矩形(或圓弧形)的照明區 φ 域是由照明光IL均一地照明。 。本體圓柱34是由第1圓柱37及第2圓柱38構成。第 1圓柱37是透過作為設置地板FD上面所載置的裝置基準 之基座平板BP上面的複數個(在此為*個，即第1圖僅繪 ^前面側的2個〉防振台n而被保持著。第2圓柱％丄 Λ第1圓柱37上。此防振台12是利用橡膠等的彈性材作 為阻尼材料之被動型者。又，若無設基座平板Βρ，而在本 11 1283907 iHlSpifl 體圓柱34直接設在設置地板FD上亦可。 第1圓柱37具有：由4個防振台12略呈水平地支持著 而構成基板載台裝置35之平面視圖略呈矩形的鑄鐵夢的 底床(基座）1、在此底床1上面之4隅沿鉛直方向分別配設 的4根腳部40，及由相互連結此4根腳部40的上端部同 日寸構成第1圓柱37的頂板部之鏡筒定盤41。在此鏡定般 41的中央部上，形成有平面視圖呈圓形的開口部41a，2 將投影光學系PL從上方***此開口部41a。在此投影光學 系PL9上，在其高度方向的中央或下方的位置上設有凸緣 FL，透過該凸緣FL，投影光學系PL是由鏡筒定盤41從 下方支持著。 < 第2圓柱38具備在鏡筒定盤41上面圍繞投影光學系 PL而立設的4根腳部及相互連結此4根腳部42之上端部 的頂板部，亦即具備構成光罩載台33的基座43。在基座 43的中央部上，形成有構成照明光IL之通路的開口 43&。 且’基座43的全體或是一部分(相當於開口 43a的部分)是 由透光性材料形成亦可。 對於如此構成的本體圓柱3 4之由設置地板F D而來的 振動，是利用防振台12而被阻絕至微量G極(G為重力加 速度）。 作為投影光學系PL，使其光軸AX方向為Z軸方向， 在此是使用以構成兩側遠心的光學配置之方式，由沿光軸 AX方向依所定間隔配置的複數個透鏡元件而形成的折射 光學糸。此投影光學系PL具有所定的投影倍率，例如為 12 1283907 H415pifl 等倍。因此，利用由照明光學32而來的照明光IL照明光 罩Μ的照明區域時，通過此光罩M的照明光是透過投影 光學系PL，把光罩Μ上的照明區域部分的圖案之等倍正 立像’曝光至表面塗佈光阻的玻璃基板ρ上的前述照明區 域共軛的曝光區域。 光罩載台裝置33具備:前述基座43、在基座43上方 被非接觸地支持著的光罩載台MST、把光罩載台MST沿 掃瞄方向（相對移動方向）之χ軸方向（第丨方向）驅動所定 衝程，且在與X軸方向呈直交的γ軸方向（第2方向）微少 驅動的驅動系統44、承受伴隨著此光罩驅動系統44之驅 動光罩載台MST所產生之反作用力的反力遮斷用框45、 46。且，作為承受伴隨著此光罩載台MST的驅動所產生 之反作用力的機構，也可以用除了反力遮斷用框以外的其 他發聲圈馬達(voice-coil motor)。 如第2圖的斜視所示，光罩載台MST在中央部上有 具矩开> 開口的矩形狀，亦即是由矩形框狀的板狀構件所構 成，在此光罩載台MST的上面，設有3個真空夾頭(vacuum chuck)47a〜47c。利用此些真空夾頭47a〜47c，光罩Μ是被 吸者保持在光罩載台上。 在基座43上面，一對X導引部48Α、48Β是以一定 間隔在掃瞄方向之X軸方向延伸設置。此些X導引部 48Α、48Β的上方配置著光罩載台MST，該光罩載台MST 是利用設於其底部的複數個氣墊（空氣軸承)48，非接觸地 被支持在X導部48Α、48Β上。又，利用轉動導引部等， 13 1283907 11415pifl 以接觸狀態使光罩載台MST被支持在X導引部上。 在光罩載台MST的Y軸方向的兩側面上，一對可動 件60A、60B是朝γ軸方向突設著。設於+γ的可動件6〇B 疋包夾著在光罩載台MST的+Υ側端部的X軸方向中央部 所形成的切口 62的兩侧而分離配置著。然後，對應於此此 可動件60Α、60Β，在X導引部48Α、48Β的γ軸方向兩 外側處，構成可動件6QA、60Β及作為線性馬達的X馬達 61Α ·· 61Β，且以分別挾持可動件6〇Α、6〇Β的方式，把朝 光罩載台MST開口而呈匸字狀的固定件63Α、63Β沿χ 軸方向延伸設置。可動件60Α、60Β和光罩載台]VIST —同 利用由固定件63、63B之間電磁相互作用而生的洛羅茲 (Lorentz)力而被驅動往χ軸方向。 作為X馬達61A、61B，在此可使用公知的動圈 (moving-coil)型的線性馬達。且，作為一對的χ馬達，使 用動磁(m〇ving-magnet)型的線性馬達也沒關係。χ馬達 61A、61B是由主控制裝置(未圖示)控制。 在可動件60A、60B上，分別埋設著複數個與固定件 63A、63B對向的間隙感測器（未圖示）。各間隙感測器，是 把可動件60A和固定件63A之間的間隙量(gap量）以及可 動件60B和固定件63B之間的間隙量以非接觸的方式檢 出，例如可使用具有光學式2mm之作動範圍的反射型感 測器。 在固定件63A在X軸方向的兩端側，基座43是透過 一對位置調整裝置65A、65B(但在第2圖中65B未圖示） 14 1283907 11415pifl 被支持在反力遮斷用框45的先端。此反力遮斷用框45是 與構成基座43之一部分的本體圓柱34呈振動上相互獨立 者。同樣地，固定件63B在X軸方向的兩端側，是透過一 對位置調整裝置65A、65B被支持在反力遮斷用框46的先 端。此反力遮斷用框46是與本體圓柱34呈振動上相互獨 立者。作為位置調整裝置65A、65B，例如可使用壓力元 件，利用此壓力元件的驅動，可控制相對於可動件的固定 件的姿勢。反力遮斷用框45、46的基端，是透過在第1 圖所示的鏡筒定盤41、底床1及基座平板BP上分別形成 的開口部，而固定至地面FD。且反力遮斷用框45、46的 基端也可以設在鏡筒定盤41、底床丨及基座平板Bp的 側。 在光罩載台MST的切口 62的内部空間中，設有位於 ^導5丨部48B上且僅具掃瞄方向自由度的空氣滑板(也 =der)66。然後，在此空氣滑板66上設置γ馬達的固定件 67。作為此Y馬達，例如可使用音圈馬 關用電磁相互作用而產生的洛羅兹力，將設於 载台MST側之未圖示的可動件往掃瞄方向的γ軸方 °驅動，並把光罩載台MST往Y軸方向驅動。 達以^此空讀板66上，設有構毅氣滑板鶴用線性馬 馬達區動固疋件63B及空氣滑板66的可動件68。上述Y 往不論光罩載台MST位於何處皆需把光罩載台MST 達方向軸，所關絲圖示的_相1檢出Υ馬 如為空氣滑板66或固定件67)和光罩載台MST的距 15 1283907 11415pifl 離’以驅板驅動用線性馬達，藉此，以一直追縱 光罩載台MST的驅動。因此，把光罩載台MST往γ方向 驅動時的反力’是透過可動件68、固定件63B而被傳達至 反力遮斷用框46，更傳達至設置地板FD。 另方面 對二角棱鏡69A、69B被固定在光罩載 台MST之-X側的側面上，X干涉儀7〇對向於此些三角稜 鏡69A、69B被固定在基座43上面的_χ方向端部。此χ Τ* /V義70 μ卩示上是包含一對雙程干涉儀，對三角棱鏡 69Α、69Β投射干涉光束，再分別接受其反射光，以利用 所定的分解能’例如為〇·5〜lnm的分解能，計測三角稜鏡 69Α、69Β的X軸方向的位置。 且’包含未圖示的偏光分光器、1/4波長板等的光學 單元71是被固定在光罩載台MST上面的-Υ側的端部上。 對向於此光學單元71，在基座43上面的_γ方向端部上， 固定鏡72是沿χ軸方向被延伸設置。然後，利用包含光 予單元71、未圖示的光源單元及接收器等的γ干涉儀，透 ，固定鏡72，依所定的分解能，如為〇 5〜lmn程度的分解 能，計測光罩載台MST(及光罩M)的γ軸方向的位置。 第3圖繪示基板載台裝置35之全體結構斜視圖。 於X方向延伸的X軸導引部2a、2b是在Y方向間隔 77開而平行鋪設在底床1的上面，X滑架3a、3b是跨此些 各X軸導引部2a、2b的兩側部及上部而個別移動自如地 °又置著。在χ滑架3a、3b的上部，沿γ方向延伸，jl以 連結兩滑架3a、3b的橋狀方式，懸架樑導引部（導引構件)4 16 12839〇7 ll4lspifl 著。如第4圖所示，在X滑架3a、3b和X導 弓I部2a ’ °在X滑架3a、3b和X導 稱為襬動轴承的側面Γ'，配置數個空氣軸承6(以下 X滑板3a /請挪111§。空氣轴承5、6是被固定在 的4= t’對x導引部 所導弓j而在 及導引部4,是被X導引部2a、2b +在x方向移動自如的結構。且，X滑_ 3a、％ ；:方的空氣轴承省略的話也沒關係。 北 所示，在的上部，载置著Y滑架7。如第5圖 數個(在第和¥樑導々引部4的上面之間’配置著複 在Υ滑年7/“ 4個）空氣軸*8(以下稱為基座軸承）。 (在第二;部4的兩側面之間，配置著複丄 氣車由承8、9是被固轴承9(以下稱為側轴承）。這些空 在γ樑導引部4上：日上，=浮動(非接觸)支持 而在丫方方向軸疋被^料部4所引導 所支持著n1G是被複數個支持機構(未圖示） 平板支架η ::二上加;^:呆持著破璃基板P的 成本發明之載台本體及平板支架11是構 回到第3圖，在γ襟導引部4的兩 X線性馬達xu的可動件(第2可動件)丨’ j = -是沿著在X方向延伸設置的固定件 17 1283907 11415pifl 移動。此固定件1如、1仆和光罩載台河8丁之固定件63八、 63B同樣地，是透過位置調整裝置（第2位置調整裝置)被 支持在由壓力元件等所構成的反力遮斷用框46上。並設有 未圖示的間隙感測為（第2檢出裝置），以檢測可動件ι3&、 13b及固定件14a、14b之間的z方向間隙量。根據第2檢 出裝置檢測結果，把第2位置鋪裝置分別驅動往z方 向，藉此，可調整固定件14a、14b和可動件丨如、nb的 相對位置關係。 在底床1的下方，基座框21是透過複數個高度調整機 構20(茶照第4圖）設置在基座平板Bp上。在基座框2ι的 上複數個支柱（支持部)22是沿著z方向立設著。支柱 22是設成相對於底床！非接觸地貫通底床i上所形成的貫 通孔（第2貫通孔)la，並從底床1突出上端的狀態。於X 方向K申的從動導引框(f〇11〇wer f膽^阳是在Y方 向間隔分平行地配設在支柱22的上端。亦即，從動導 引框23是被設成相對於底床}為振動分離的狀態。 5 X方向延伸的從動導引部(follower guide)24a也是 動m從動導框23的上面。在各從 ，滑板24b是被配置成X方向以外的蒋 被限制的狀態。作 導引ί ΐ轉動接觸的線性動作導引部（即所謂的LM AU 或者是空氣軸承等的非接觸導引部等。 間，幻25是位於底床1及γ襟導引部4之 破W在滑板24b上。如第6圖所示，從動台25為平 12839071283907 11415pifl Nine, the invention description: [Technical field of the invention] Two-in-one stage device "make the substrate of the holding substrate ======= [Prior Art] r in the display device (collectively called the plane display A crystal or a diode is formed on the earth-reversing substrate. The exposure device is to place the substrate coated with the sensitizer on the support of the carrier. The fine circuit diagram on the photomask is fortunate. , through the optical system of the projection lens, etc. 'transfer the silk plate. The y circuit patterns are stacked on the substrate to form a wiring loop. Therefore, when the pattern image after the g2 layer is transferred to the substrate in the exposure apparatus, the pattern to be exposed is correct for the formed circuit pattern. The ground overlaps. In the illustration of Fig. 15, a schematic configuration of a tablet stage (substrate stage device) in an exposure apparatus for manufacturing a liquid crystal display is shown. On the -X side edge of the fixed plate 91, the fixed guide portion 92 is disposed in the Y direction. Further, on the surface of the fixed plate 91, the guide beam % extending in the X direction is provided in a state of being combined with the i-th carriage 94. The guide beams 93 and the carriages 94 are driven by the linear motors 100 and 101 to move in the γ direction along the fixed plate % and the fixed guide portion 92. The guide beam 93 is provided with a second carriage 95 that is driven by a linear motor 99 and that is movable in the X direction with the guide beams 93 1283907 Π 415 ρ Π and the cymbal 91 as guide portions. The fixed disk 91, the fixed guide portion 92, the guide beam 93, and the carriages 94, 95 are assembled separately by maintaining a gas bearing 96 in a non-contact state. In the upper portion of the second carriage 95, a platetable 97 which is vertically movable in the vertical (Z-axis) direction and a plate holder 98 which is rotatable around the Z-axis by a slight angle are provided. On the plate holder 98, a substrate (glass substrate) not shown is fixed to the upper surface of the plate holder 98 by vacuum suction. The carriages 94, 95, the flat plate 97, and the plate holder 98 constitute a flat plate stage 9A. An imaging optical system is disposed above the substrate, and a mask holder and a mask are disposed above the imaging optical system, and an illumination optical system and a light source as a light source are disposed above the mask. These members are supported by a cylinder disposed on the platen 91. In the above structure, u exposes the fine circuit pattern on the reticle with the exposure light of the lamp and the illumination optics, and passes through the imaging optical system at this time, because it is limited to the image through the imaging light (4) (4) Since the light-receiving area and the substrate are in the X direction or the gamma side of the two-tray holder and the flat-plate stage 90, the field is privately moved, and continuous broom exposure is performed. In the above-mentioned "Finding Station" and the exposure apparatus, in the stage apparatus which is a solid technology, the main unit (4) of the Na direction (4) or the flat board J and the linear motor 99 are moved, so the scan is performed. 1283907 11415pifl 100, 110 The controllability of the moving direction is greater, the linear motor is deteriorated. On the carrier port, the power supply, air pressure pipe, cooling pipe, etc. for supplying various components are connected, but the original load = multi-action, and these resource supply members will vibrate due to the constant or impact resistance. The external disturbances, etc., cause one of the reasons for poor control.考Although the slave carrier that is driven from the main stage is placed in the direction of the sweeping eye (the direction of the x-axis) or the direction of the orthogonal broom (the direction of the X-vehicle) and adjoins the stage to relay the connection. The resource supply component H to the main load is disposed in the middle direction, and is located on the fixed plate 91, so the area of the money becomes larger. The land amount (support surface) that requires the accuracy of the plate is increased. The cost will increase, which will cause problems in the size of the device. Further, when the main stage moves in a direction different from the driven direction of the driven stage, the resource supply members rub against each other during the movement to generate dust, and the foreign matter adheres to the substrate, thereby generating the substrate. The defect of defective products after exposure processing. Here, although it is considered that the cover is applied to the resource supply member to suppress dust generation, the vibration generated by the movement of the cover in the moving direction of the cover becomes an external disturbance of the control system, thereby causing high-speed and high-precision positioning. Barrier 0 On the other hand, in the above-described stage device, the substrate is placed on the plate holder 98, although the plate holder 98 can be rotated by a slight angle in the surface (horizontal plane) of the substrate to be aligned, however, A complicated mechanism for rotating a large flat plate bracket 98 is required, precise positioning is time-consuming, and countermeasures against offset after positioning are required, and the flatness of the flat plate bracket 98 is also unfortunately l2839〇7 ll4l5pifl loading stage: 3: Large cells = devices that are continuously exposed to the substrate, and there is a fear that the time for on-site assembly will be prolonged because of the weight of the time or the size of the device. A. [Summary of the Invention] The problem of the above-mentioned problem is made by providing a warm-up test, and it is possible to provide a controllable hair-receiving control that can be worn by a driving device that does not damage a linear motor or the like. I is light-weighted and can be suppressed from being generated by the resource supply member. It is not necessary to provide a stage device and an exposure mounting bracket, which does not cause offset of the substrate position or the plate can be highly accurate. Position the substrate for a short time. Further, the large-sized-type seeding device and the exposure device can be transported without being decomposed, and the second embodiment can be transported, and the second invention is the first embodiment. Fig. 1 - The stage mount 35 includes a guide member 4 and a driving device n 1 . The cow 4 is a stage body 7 and 10 that guides and holds the substrate P, and moves freely to the Y, and is placed on the base. 1 to the 2nd; party. Driving the split holes is to drive the stage bodies 7, 10, 11 to. Further, at least a part 27 of the driving device 连接 is connected, and the guide bow member 4 and the driven stage 25 in the second direction are disposed between 1283907 ll415pifl 'the lead member 4 and the susceptor 1. In the case of the device = her carrier device, the driven stage 25 is provided with at least a portion of the drive 27' so that the stage body 7, 1 can be used, and in the present invention, the driven carrier is in the guide Since the lead member 4 and the susceptor 1 are disposed between each other, the pedestal 1 surface is not required to be enlarged (widened), and a large number of forests requiring precision on the pedestal are required, and the size can be increased. Further, when the resource supply member 17 is relayed to the loading table 25, even if the resource supply members are rubbed against each other, it is difficult to attach the foreign matter to the foreign body due to the presence of the guiding member 4 or the cover members 85 and 86. On the substrate P. Further, the exposure apparatus 31 of the present invention exposes the mask pattern held on the mask stage MST to the substrate y which is held by the substrate stage 3, and serves as a mask stage and a substrate stage 35. ;= One stage of the stage. Therefore, in the exposure apparatus of the present invention, since the photomask and the photosensitive substrate can be positionally controlled and speed controlled with high precision, the pattern transfer accuracy can be improved, and the apparatus can be reduced in cost and size. Further, in the present invention, since the possibility of adhering foreign matter to the photosensitive substrate is reduced, it is possible to suppress the occurrence of defective products. The above and other objects, features and advantages of the present invention will become more <RTIgt; [Embodiment] 1283907 11415pifl Hereinafter, an embodiment of the carrying and exposure apparatus of the present invention will be described with reference to Figs. 1 to 14 . Here, the stage device of the present invention is described as an example of a scanning type exposure apparatus which exposes a mask pattern to a glass substrate which is an angular shape of a photosensitive substrate (substrate) by a scanning method. Further, the exposure apparatus is a sheet stage suitable for moving the stage device holding the glass substrate. In the above-mentioned patterns, the same components as those in the fifteenth diagram of the conventional example are denoted by the same reference numerals, and the description thereof will be omitted. Fig. 1 is a schematic block diagram showing an exposure apparatus 31 of the present invention. The optical device 31 includes an illumination optical system 32, a mask stage 33 that moves while holding a mask (grating), a projection optical system PL, and a projection optical system. A main body cylinder 34, a substrate stage device (stage device) 35 that moves while holding a glass substrate (substrate, photosensitive substrate) ρ. For example, the light source unit, the shutter, and the secondary light source form an optical system, a spectroscope, a collecting lens system, and a mask shading portion, as disclosed in Japanese Laid-Open Patent Publication No. Hei 9-320956. (reticle blind) and imaging lens system (all not shown). The rectangular (or circular arc) illumination area φ field held by the mask μ on the mask stage device 33 is uniformly illuminated by the illumination light IL. . The body cylinder 34 is composed of a first cylinder 37 and a second cylinder 38. The first cylinder 37 is a plurality of the upper surface of the base plate BP that serves as a reference for mounting the upper surface of the floor FD (here, *, that is, only two of the front sides of the first drawing) The second cylinder is the first cylinder 37. The anti-vibration table 12 is a passive type using an elastic material such as rubber as a damping material, and if the base plate is not provided, 11 1283907 The iHlSpifl body cylinder 34 may be directly disposed on the floor FD. The first cylinder 37 has a slightly rectangular plan view of the substrate stage device 35 which is slightly horizontally supported by the four vibration isolating stages 12. The bed (base) of the dream 1, the four leg portions 40 disposed in the vertical direction on the upper surface of the bottom bed 1, and the upper end portions of the four leg portions 40 connected to each other are the same as the first one. The barrel holder 41 of the top plate portion of the cylinder 37. The central portion of the mirror 41 is formed with an opening 41a having a circular shape in plan view, and the projection optical system PL is inserted into the opening portion 41a from above. The projection optical system PL9 is provided with a flange FL at a position in the center or below in the height direction, and transmits the flange The flange FL and the projection optical system PL are supported by the lens holder 41 from below. <The second cylinder 38 includes four leg portions that are erected on the upper surface of the lens holder 41 around the projection optical system PL, and are connected to each other. The top plate portion of the upper end portion of the four leg portions 42 is provided with a susceptor 43 constituting the mask stage 33. At the center portion of the susceptor 43, an opening 43& which constitutes a passage for the illumination light IL is formed. The whole or a part of the susceptor 43 (corresponding to the portion of the opening 43a) may be formed of a light transmissive material. The vibration of the main body cylinder 34 thus formed by the floor FD is utilized by the vibration isolating table 12 It is blocked to a trace G pole (G is the gravitational acceleration). As the projection optical system PL, the optical axis AX direction is the Z-axis direction, which is used to form the optical configuration on both sides of the telecentricity, along the optical axis. A refractive optical 形成 formed by a plurality of lens elements arranged at a predetermined interval in the AX direction. The projection optical system PL has a predetermined projection magnification, for example, 12 1283907 H415pifl or the like. Therefore, the illumination light IL by the illumination optics 32 is utilized. Illumination area of illumination mask At this time, the illumination light passing through the mask M is transmitted through the projection optical system PL, and the equal-right image of the pattern of the illumination region portion on the mask is exposed to the illumination region on the glass substrate ρ on which the photoresist is applied. Conjugate exposure area. The mask stage device 33 includes the susceptor 43 and a mask holder MST that is non-contactly supported above the susceptor 43, and the reticle stage MST is moved in the scanning direction (relative movement) The drive shaft 44 that drives the predetermined stroke in the x-axis direction (the second direction) and that is slightly driven in the γ-axis direction (the second direction) orthogonal to the X-axis direction is subjected to the drive of the reticle drive system 44. The reaction force blocking frames 45, 46 of the reaction force generated by the mask stage MST. Further, as a mechanism for receiving the reaction force generated by the driving of the mask holder MST, other voice-coil motors other than the reaction force blocking frame may be used. As shown in the squint of Fig. 2, the mask stage MST has a rectangular shape with a rectangular opening at the center portion, that is, a rectangular frame-shaped plate member, in which the mask holder MST is used. Above, there are three vacuum chucks 47a to 47c. With these vacuum chucks 47a to 47c, the mask Μ is held by the absorbing person on the reticle stage. On the susceptor 43, a pair of X guide portions 48A, 48B are extended at a constant interval in the X-axis direction of the scanning direction. A mask holder MST is disposed above the X guide portions 48A and 48B, and the mask holder MST is non-contactly supported by the X guide portion by a plurality of air cushions (air bearings) 48 provided at the bottom thereof. 48Α, 48Β. Further, with the rotation guide or the like, 13 1283907 11415pifl causes the mask stage MST to be supported on the X guide portion in a contact state. On both side faces of the mask stage MST in the Y-axis direction, a pair of movable members 60A and 60B project in the γ-axis direction. The movable member 6〇B provided at +γ is disposed apart from each other on both sides of the slit 62 formed at the center portion of the yoke side end portion of the mask stage MST in the X-axis direction. Then, corresponding to the movable members 60A, 60A, the movable members 6QA, 60A and the X motor 61Α·· 61Β which are linear motors are formed at the outer sides in the γ-axis direction of the X guide portions 48A and 48B, and are respectively held by the movable members 60A and 60Β. In the manner of the movable members 6〇Α and 6〇Β, the fixing members 63Α and 63Β which are opened in the U-shaped shape toward the mask holder MST are extended in the z-axis direction. The movable members 60A, 60A and the reticle stage VIST are driven to the x-axis direction by the Lorentz force generated by the electromagnetic interaction between the fixing members 63, 63B. As the X motors 61A and 61B, a known moving-coil type linear motor can be used here. Further, as a pair of xenon motors, it is also possible to use a linear motor of the m〇ving-magnet type. The χ motors 61A and 61B are controlled by a main control unit (not shown). A plurality of gap sensors (not shown) opposed to the fixing members 63A and 63B are embedded in the movable members 60A and 60B, respectively. Each of the gap sensors detects the amount of gap (gap amount) between the movable member 60A and the fixing member 63A and the amount of the gap between the movable member 60B and the fixing member 63B in a non-contact manner, for example, optical can be used. Reflective sensor with a range of 2mm actuation. The susceptor 43 is transmitted through the pair of position adjusting devices 65A and 65B (but not shown in FIG. 2B in the second drawing) 14 1283907 11415pifl is supported by the reaction force blocking frame in the both ends of the fixing member 63A in the X-axis direction. The apex of 45. This reaction force blocking frame 45 is vibration-independent with the body cylinder 34 constituting one of the bases 43. Similarly, the both ends of the fixing member 63B in the X-axis direction are supported by the pair of position adjusting devices 65A and 65B at the leading end of the reaction force blocking frame 46. This reaction force blocking frame 46 is vibratingly independent of the body cylinder 34. As the position adjusting means 65A, 65B, for example, a pressure element can be used, and the driving of the pressure member can control the posture of the fixing member with respect to the movable member. The base ends of the reaction blocking frames 45 and 46 are fixed to the floor FD through the openings formed in the lens holder 41, the bed 1 and the base plate BP shown in Fig. 1 respectively. Further, the base ends of the reaction force blocking frames 45, 46 may be provided on the side of the lens barrel 41, the bottom bed, and the base plate Bp. In the inner space of the slit 62 of the mask stage MST, an air slide (also = der) 66 located on the guide portion 48B and having only the degree of freedom in the scanning direction is provided. Then, a fixing member 67 of the γ motor is disposed on the air slide 66. As the Y motor, for example, the Loroz force generated by the electromagnetic interaction of the voice coil is used, and the movable member (not shown) provided on the stage MST side is driven to the γ-axis of the scanning direction, and The reticle stage MST is driven in the Y-axis direction. On the empty reading plate 66, there is provided a movable member 68 for the linear horse motor area dynamic clamping member 63B and the air sliding plate 66. The above Y needs to take the reticle stage MST to the direction axis regardless of the position of the mask stage MST, and the _ phase 1 of the closed wire is detected as the air slide 66 or the fixing member 67) and the hood The distance of the MST is 15 1283907 11415pifl away from the linear motor driven by the drive plate, thereby keeping track of the drive of the reticle stage MST. Therefore, the reaction force ' when the mask stage MST is driven in the γ direction is transmitted to the reaction force blocking frame 46 through the movable member 68 and the fixing member 63B, and is transmitted to the floor FD. On the other hand, the double prisms 69A, 69B are fixed to the side on the -X side of the mask stage MST, and the X interferometer 7 is opposed to the above-mentioned triangular jaws 69A, 69B which are fixed on the base 43. χ direction end. The χ / / / / 义 70 μ 卩 包含 是 是 卩 / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / The decomposition energy of lnm is measured in the X-axis direction of the triangle 稜鏡69Α, 69Β. Further, the optical unit 71 including a polarization beam splitter (not shown), a quarter-wave plate, and the like is fixed to the end portion on the -Υ side of the upper surface of the mask stage MST. Opposite to the optical unit 71, the fixed mirror 72 is extended in the z-axis direction at the end in the _γ direction on the upper surface of the susceptor 43. Then, the gamma interferometer including the light source unit 71, a light source unit (not shown), a receiver, and the like is used to pass through the fixed mirror 72, and the reticle stage is measured according to a predetermined decomposition energy, such as a decomposition energy of about 5 to 1 nm. The position of the MST (and the mask M) in the γ-axis direction. FIG. 3 is a perspective view showing the entire structure of the substrate stage device 35. The X-axis guides 2a, 2b extending in the X direction are laid in parallel in the Y direction and are laid on the top surface of the bed 1 in parallel, and the X carriages 3a, 3b are spanned over the X-axis guides 2a, 2b. The two sides and the upper part are separately moved freely. In the upper portion of the cymbal carriages 3a, 3b, extending in the gamma direction, j1 is bridge-likely connecting the two carriages 3a, 3b, and the suspension beam guiding portion (guide member) 4 16 12839 〇 7 ll4lspifl. As shown in Fig. 4, in the X carriages 3a, 3b and the X guide bow portion 2a'°, the X carriages 3a, 3b and X are referred to as the side faces 摆动' of the oscillating bearing, and a plurality of air bearings 6 are arranged ( The following X slides 3a / please move 111 §. The air bearings 5, 6 are fixed at 4 = t' to the x guides and the guides 4 are X guides 2a, 2b + It is free to move in the x direction. It is also possible to omit the X-slide _ 3a, % ;: square air bearing. As shown in the north, the Y carriage 7 is placed on the upper part. (Between the upper and the upper side of the beam guiding guide 4), the air shaft 7/"four" air shafts *8 (hereinafter referred to as pedestal bearings) are disposed. (In the second; Between the two sides, the re-combustion vehicle is provided with bearings 8 and 9 which are solid bearings 9 (hereinafter referred to as side bearings). These are on the γ beam guide 4: day, = floating (non-contact) support In the direction of the axis, the axis is supported by the material portion 4, and n1G is a plurality of support mechanisms (not shown). The plate holder η :: two plus; ^: the cost of holding the glass substrate P The stage body and the plate holder 11 are constructed back to Fig. 3, in the γ guide The movable member (second movable member) 丨' j = - of the two X linear motors xu of the lead portion 4 is moved along the fixing member 17 1283907 11415pifl extending in the X direction. The fixing member 1 such as a servant and a photo mask Similarly, the fixing members 63 and 63B of the Taihe 8 are supported by a reaction force blocking frame 46 composed of a pressure element or the like through a position adjusting device (second position adjusting device). The gap sense is shown as (second detecting means) to detect the z-direction gap amount between the movable members ι3 & 13b and the fixing members 14a and 14b. According to the second detecting device detection result, the second position is laid. The device is driven to the z direction, respectively, whereby the relative positional relationship between the fixing members 14a, 14b and the movable members such as nb can be adjusted. Below the bottom bed 1, the base frame 21 is transmitted through a plurality of height adjusting mechanisms 20 (tea According to Fig. 4), it is provided on the base plate Bp. A plurality of pillars (support portions) 22 are erected in the z direction on the base frame 2i. The pillars 22 are arranged to be non-contact with respect to the bed. a state in which the through hole (second through hole) la formed in the bottom bed i is passed and the upper end is protruded from the bottom bed 1 The driven guide frame (in the X direction) is disposed at the upper end of the strut 22 in parallel in the Y direction. That is, the driven guide frame 23 is set. The state is separated from the bottom bed by vibration. 5 The follower guide 24a extending in the X direction is also the upper surface of the moving m follower frame 23. In each slave, the slider 24b is arranged in the X direction. A state in which the outside of Chiang is restricted. Guided by a linear motion guide that rotates in contact (so-called LM AU or a non-contact guide such as an air bearing). Meanwhile, the phantom 25 is located on the bottom plate 1 and the γ 襟 guiding portion 4 on the slide plate 24b. As shown in Figure 6, the follower 25 is flat 1283907
Il4l5pifl '見圖王矩形狀，在其χ側兩端緣上，分別設有朝γ方向 ，伸的Υ線性馬達軸承26。在各γ線性馬達軸承26上， $裝著構成Υ線性馬達(驅動裝置)YL的固定件27。在各 、線/生馬達軸承26的雨端部上，分別設有從動X線性馬 2驅動裝置)XL2的可動件（第3可動件)28。可動件 未疋沿著上述被延伸設置於X方向的固定件14a、14b(14a 圖示）而移動。亦即，此可動件28和固定件14a、14b之 ^的間隙量是由上述第2檢出裝置檢測。然後，根據第2 ; 裝置的檢出結果，以分別驅動第2位置調整裝置朝z 向，藉此，可調整固定件14a、14b和可動件28的相對 位置關係。 上，=，在從動台25的X方向中央附近，在γ方向兩端 圖’ ^別設有從動載台保持機構(連結裝置）15(參照第4 ^彳欠動載台保持機構15是由：先端呈球狀的主軸15a、 l5a主^\15&往Y方向移動的直線導引部15b、驅動主轴 接=空氣轴承15c等構成。在x滑架3a、3b上，形成有 動，主軸15a(的球狀部)之圓錐軸承16。利用汽缸的驅 從勒^主軸1%與圓錐軸承接合/解除接合，藉此，便可把 2二:於x滑架3a、3b及γ樑導引部4 -體化地 曰 第7圖所示’女裝於Y滑架7上Il4l5pifl 'The figure is rectangular in shape, and on both sides of the crotch side, there are respectively Υ linear motor bearings 26 extending in the γ direction. On each of the γ linear motor bearings 26, a fixing member 27 constituting a linear motor (driving device) YL is mounted. A movable member (third movable member) 28 of the driven X linear horse 2 drive device XL2 is provided at each of the rain end portions of the wire/raw motor bearings 26. The movable member is moved along the above-described fixing members 14a and 14b (shown as 14a) extending in the X direction. That is, the amount of the gap between the movable member 28 and the fixing members 14a and 14b is detected by the second detecting means. Then, based on the detection result of the second device, the second position adjusting device is driven in the z direction, whereby the relative positional relationship between the fixing members 14a and 14b and the movable member 28 can be adjusted. Up, =, in the vicinity of the center of the driven table 25 in the X direction, the driven stage holding mechanism (coupling device) 15 is provided at both ends in the γ direction (refer to the fourth ^ 彳 undertray holding mechanism 15) It is composed of a main shaft 15a having a spheroidal shape, a linear guide portion 15b moving in the Y direction, a drive spindle connection = an air bearing 15c, and the like, and a movement is formed on the x carriages 3a and 3b. The tapered bearing 16 of the main shaft 15a (the spherical portion) is engaged/disengaged from the tapered bearing by 1% of the drive shaft of the cylinder, whereby the two carriages can be placed on the x carriages 3a, 3b and γ. Beam guide 4 - bodyized mantle shown in Figure 7 'Women on Y carriage 7
：51 32 ^ Z 地支接^的轴周圍（/〇著破璃基板P的保持面)被回轉自如 哥考’並從Y滑架7的兩側與Y樑導引部4對向而押 19 1283907 11415pifl:51 32 ^ Z Around the shaft of the ground support ^ (holding the holding surface of the glass substrate P) is rotated freely from the "Keco" and from the two sides of the Y carriage 7 opposite to the Y beam guide 4 1283907 11415pifl
下工氣輛承9，拉lL 性及負荷容量。二此二可獲得空氣轴承9所需的適切的剛 本發明的保持褒置:工氣轴承9 ’是利用微調螺絲5!構成 有使Y滑架往γ 且’在Y滑架7的寬方向兩側上，設 53，可動件53 ^驅動的[線性馬$几的可動件53、 互作用又所二用=定件27、27的電磁相 方向，所以，於此^可動件53是各獅立地被驅動往X 隙量(_量)是Γ未^件27和可動件之間的X方向之間 不達所定值以下。日Θ τ的間隙感心監控’以控制間隙量 ”之間的ζ方向H外設有檢出固定件27和可動件 以，在固定件2 7和Y 的間隙感測器(檢出裝置）。所 ”的兩端附近，組裂著墨力=幸=之間’位於固定件 圖示），根據檢出裳置的於件寻所構成的位置調裝置(未 往Z方向，藉此，可^果’分別驅動位置調整裝置 置關係。 ^固定件27與可動件53的相對位 更’如第8圖所示，•災 的下方，分別在可動件53的附二7配上’，Υ樑導引部4 置控制用的2個線性馬達54。 者可動件53的位 端緣上，沿Υ方向設有移動’2板支架11的+χ側 往被射照的Υ方向離開的計ζ 7圖，雷射干涉儀 57反射的反射光，藉此，可 ’是接受被移動鏡 Ρ)的X方向之位置及Ζ —圍的^^架U(即玻璃基板 另方面在由，月木7、平台10及平板支架11所構 20 1283907 11415pifl 成的主載σ (載口本體)上’電氣繞、線或空壓 給構件)17(參照第4圖）是被連接著，用^ 自载。衣置外。卩供給各種資源，此些麟類17是如第* 圖及第、9圖〜11圖所示，是作為基座框2i與從動台25的 中繼傳送而連接到主載台。 洋如後述’底床1上开彡成古彡i 7七人I 2 1上烙成有在Z方向貫通的貫通孔 入底床1下方的境線类員17是透過貫通孔ib，由從 動台25所中繼傳送。如第9圖所示，一組綠性導引部^ 是與從動台25之移動用導引部24a略平行(χ方向）地被 固定在從動台25的下面側。在線性導引部81上，滑板82 是在導引方向(X S向上被移動自如地安裝著。且，在此典 板82上，捲掛防塵薄板(蓋構件)85的動滑輪83，及捲: 規線類17之回轉自如的複數個滾輪84a是被支持而安妒至 滚輪保持板84b上。織，纟覽_ 17是拖繞著基座 的上方’貫通貫通孔lb’並捲掛於配置成半圓形的滾輪叫 上之後，折返而被導入從動台25的端部89。 ^防塵薄板85，一端是固定在從動導引框23,另端是固 定在動滑輪83，為兩端固定的薄板。且，太、^ 而疋 « 牡β板82上， 另外的防塵薄板(蓋構件)8ό的一端是被固定在與防塵 85相反側。防塵薄板86的捲取部87是被固定在從動導引 框23等上。 置 使第 當使玻璃基板Ρ往X方向(掃瞄方向）移動時， 21 1283907 11415pifl 圖所示的x線性馬達XL1及從動χ線 以此方式，X滑架3a、3b是呈被χ # ^達XL2作動。 引的狀態，Y樑導引部4是和主裁台—5 # 2a、2b所導 且，在滑板24b是被從動導引部2仆=往X方向移動。 台25是在Y樑導引部4與底床之間 的狀怨下，從動 此時，連接於Y滑架7上的可 方向移動。 台25之’件27的χ方向之間隙 及連接於從動 檢測結果被監控而被維持在一定值。*疋由間隙感測器的 動台25保持所定的相對位置關係口此’^主载台與從 動時，因為在主载台與從動台25之門二下而往X方向移 也不會變形，不會產生摩擰或 1所配設㈣線類Π 的外擾。 ’ 口而不會引起振動等 17，是如第;::u25 :基座：21之間所配設的纜線類 \ S4b 以便不會產生—直的 、攸動口 25 -同移動，所 保持板84b在χ方向t及抗力。又，I線類17是由滚輪 84b的移動量是從動° ，方’所以’滚輪保持板 上欲形成的貫通孔“大:二量的1/2。因此’底床1 動時，可從動滑輪83 δ 夂小。且，在從動台25移 板幻的位置的長H拉出防塵薄板％ ’以對應於滑 的場合，由此^塵而所以，即使在缓線類17發塵 孔lb，因而可抑制從動=覆蓋住貫通 而在上述γ摔ί7主載台上的發塵。 樑導弓1部4及從動台25往X方向移動時， 22 1283907 H415pifl 從動載台保持機構15的主轴15a是相對X滑架3a、3b的 圓錐轴承16解除接合，然而，X線性馬達XL1及從動X 線性馬達XL2的初始(initial)動作時等，藉由使主軸15a接 合至圓錐軸承16，可將Y樑導引部4及從動台25機械地 一體化以連結。在此場合，即使是在線性馬達XL1、XL2 的動作穩定前的狀態，也可把固定件27和可動件53的相 對位置關係保持為一定。 万面，當使玻璃基板P往Y方向（非掃瞄方向）移 ，時，便使Y線性馬達YL·作動。此時，讓可動件53跟 著線性編碼器54往同方向(在第7圖中為-Y方向），在同時 間』僅驅動同距離，藉此，γ滑架7 (即主滑架）是往γ方 向並進運動，主載台（玻璃基板P)便可步進移動。且，讓2 個可動件53跟著線性編碼ϋ 54，如第12 U所示往逆方 向在同日守間點僅驅動同距離的話，便可相對於γ樑導引 m滑架7在ζ軸周圍微回轉，而對正於玻璃基板ρ 的θ回轉(Θζ方向）。 5干如设述，在 休守W邵4的兩惻面對向配置的回轉 如的空氣轴承9，利用2個可動件53相互往 °私動，即使是Υ滑架7對γ樑導 合:可在維持空氣軸承表面正對於Υ樑導“二= 的同時’相互往反方向移動。此時， 之微調螺絲51的球體，是以對向 點為回轉中心而回轉移動。 ^9彼此的中間 ，的空氣嶋氣《的。厚果Γ)會; 23 12839〇7 U4l5pifl '骨架7之微小回轉。 第13圖繪不當Y滑架7在Z軸周圍回轉時之線性馬 與空氣軸承9之間的作用力之配合關係。相互呈反 4 ^作用的2個推力F與對向的空氣轴承9自γ樑導引部 的力R為動量一致的狀態，從回轉中心〇到可動件 ,、、的距離為L，從空氣軸承9承受反力尺的位置到回轉中 、0的距離為a，則從 F X L - R X a= 0的關係變成 F = R X a / L …⑴。 值夕在此處，R雖然是依存於空氣軸承9的剛性，但剛性 白夕為500Ν/μπι以下。在此處，以2jmraci作為γ滑架7 ^回轉角度，此時的空氣軸承9的間隙變化為1μη1，空氣 承9的剛性為500Ν/μηι，距離[為5〇〇mm，距離&為 ’線性馬達yl的推力ρ則從⑴式， 變為 F = 500 X 〇.7 /500 = 〇.7 N。 ^也就是說，即使考慮到各接觸部的摩擦力，也可以非 吊小的力使Y滑架7回轉。 μ /二工氣軸承9的钱間隙為G時，因為無法使γ /月木回至以上的程度，滑架7的回轉量會报微小。直 他的原因是’線性馬達YL的可動件53和固定件^之^ 編碼器的比率(s，與底床的間隙職 γ /月木7回轉的限制。作為檢測θ回轉的回轉 可以是在平板核U上所設的未_之接觸式或非^ 式的基板端面計職置，也相是設置於主載台外部的接 24 1283907 11415pifl 觸式或非接觸式的基板端面計測裝置。當使用主载台外部 的計測裝置的場合時，在玻璃基板p欲載置平板支架η 之前，把玻璃基板ρ的傾斜資訊輸出至未圖示的驅動控制 裝置。驅動控制裝置，是利用可動件53與線性編碼器Μ 的計測值補正玻璃基板Ρ之回轉誤差的方式，預先使Υ严 架7回轉。 ⑺ 此時，當需使Υ滑架7大回轉的場合，接受主載台之 定位用計測手段的雷射干涉儀之計測光束56的移動鏡7 W 會太過傾斜而不入射至未圖示的干涉儀，則成為有錯誤 (error)的場合(參照第12圖）。即使是在像這樣的場合中， 由上述的2個線性編碼器54計測γ滑架7的回轉量，平 板支架11會在玻璃基板ρ自未圖示的基板搬送裝置安裝 後，使Y滑架7回到正常的位置，並使雷射干涉儀回復， 所以，不需高精度對位的複雜機構，可迅速地對位，且無 損於平板支架11的平面度。 … 接著，說明曝光裝置31的曝光動作。 ¥開始曝光處理時，利用未圖示的掃目苗用控制器，使 保持光罩M的光罩載台MST，及保持玻璃基板ρ的基板 載台裝置35的主載台對照明光IL同樣朝向X軸方向，並 以同速度同步移動。以此方式，照明光正所照明的光罩M 之圖案則逐次被曝光在玻璃基板ρ上。此時，從動台25 雖然也是和主載台同步移動，但是，因為是透過支持從動 台25的支柱22及Y樑導引部4，被配置成與支持主載台 的底床1呈振動分離的狀況，所以，可避免伴隨著從動台 25 1283907 11415pifl 25移動之振動被傳達至主載台上。 且，利用此同步移動，對防振台12施以偏荷重而使沈 入量不一定，藉此，光罩載台MST之基座43及基板載台 裝置35的底床1會傾斜，光罩載台MS丁之χ馬達61八二 61B、基板載台裝置35之X線性馬達XL1及γ線性馬達 YL的固定件和可動件會相對地傾斜。因此，在此些固定 件和可動件之間的間隙量會變動，並根據各線性馬達所設 的間隙感測器的檢測結果而驅動位置調整裝置，藉此，以 調整各線性馬達的固定件的姿勢。以此方式，各^定件和 可動件的相對角度會變成零，並可把此些固定件和 之間的間隙量維持在所定值。 動件 且，伴隨著光罩載台MST往X方向及γ方向移動的 反力，是透過固定件63A、63B而被傳達至反力遮斷用框 46，於是在光罩載台MST上，因反力而產生的外擾便不 會作用。同樣地，伴隨著基板載台35的主載台往X^方向 移動的反力，是透過固定件14a、14b被傳達至反力遮斷用 框46,在主載台上，因反力而產生的外擾便不會作用。且， 伴隨著主載台往Y方向移動的反力，雖然是透過固定件W 被傳達至從動台25，但如已說明過的那樣，因為是被配置 成和支柱22及底床1為振動分離的狀況，由反力產生 擾便不會作用至主載台上。 如以上所述，在本實施例中，因為從動台25是支持γ 線性馬達YL的固定件27而移動，所以，線性馬達 驅動主載台及Y樑導引部4Χ往X方向時可減輕移動重 26 1283907 11415pifl 里’並可防止馬達的控制性低下。因此，可改善被保持在 主載台上的玻璃基板P的位置控制性及速度控制性，也可 期待轉寫於玻璃基板P上的圖案之轉寫精度的改善。 、且，在本實施例中，因為是把此從動台25配置在γ 樑導引部與底床1之間，所以不需把底床丨做成大平面， 且可使底床1要求高精度部分變少，同時可避免裝置的大 型化。更，當由纜線類中繼傳送從動台25的場合，利用γ 樑導引部4的存在，即使因纜線17的摩擦而發塵，主載台 上的玻璃基板Ρ上也不易附著異物，因而可抑制曝光處理 之不良品的發生。特別是，在本發明的實施例中，即使從 動台25往X方向移動，因為纜線類17所貫通的貫通孔比 可由防塵薄板85、86及從動台25覆蓋，因而可確實抑制 異物往玻璃基板P附著上去。 、 且，在本實施例中，因為支柱22和底床1為振動分離， 伴隨著主載台或從動台25、防塵蓋85、86的移動之外擾 便不會對主載台有不良的影響，且，又因為纜線類17為非 接觸地貫通底床1，便可防止因纜線類17的變形對主載台 所造成的恆常及衝擊的抗力。除此之外，在本實施例中， 從動台25等的從動侧的重量不會掛在底床1上，在X車由 導引部2a、2b上不會產生變形，結果是，可提昇關於主载 台之控制迴圈的增益，因而可實現應答性高的高精度定位 及位置追縱性。 又’在本實施例中，因為使主載台在Z軸周圍為可回 轉’所以可容易地執行對於玻璃基板ρ的對位。且，在本 27 1283907 H415pifl 為吏可動件53、53才目互呈反方向驅動而使主 ，力轉’不需額外的複雜的機構，可迅速且無損於平拓 支架11之平面度地定位玻璃基板p(對位）。、、千板 m因此，在本實施例中，雖從動台25與底床1為機械的 ^動的）分離，但卻是在底床丨下方所設置的基座框21= 連…，在調整基座框21的位置之後，把基座框21從底床 1垂I目而可在維持底床1與基座框21之相對位置關係 的狀恶下，支持底床1的下部而輸送，不需分解基板載台 裝置，可縮短現場組裝的時間。 又，在上述實施例中，為了維持固定件與可動件的相 對位置關係，雖然是做成根據間隙感測器的檢測結果而調 整固定件之位置的結構，然而並不限定於此，也可以調整 可動件的位置、或者是調整固定件及可動件雙方的位置亦 可。 而且，在上述實施例中，本發明的載台裝置雖適用於 基板載台裝置，然而也可適用於僅只光罩載台，或是基板 載台裝置及光罩載台雙方。更，在上述實施例的形態中， 本發明的載台裝置雖是做成適用於曝光裝置31的結構，然 而並不限定於此，亦可適用於除了曝光裝置31以外的轉寫 光罩描繪裝置、光罩圖案的位置座標測定裝置等的精密測 定機器。 且，作為本實施例的基板，不僅可使用液晶顯示器用 的玻螭基板P，半導體元件用的半導體晶圓、薄膜磁頭用 的陶瓷晶片，或是曝光裝置中所用的光罩或是光栅原版(合 28 1283907 "4l5pifl 成石英、矽晶圓）等皆適用。 作為曝光裝置31，除了與光罩Μ及玻璃基板P同步 移動而將光罩Μ的圖案掃瞄曝光的逐步掃瞄方式的掃瞄 型曝光裝置(掃瞄步進器;USP5,473,410)以外，與光罩Μ及 玻璃基板Ρ呈靜止狀態而使光罩Μ的圖案曝光，使玻璃基 板順次步進移動的步進重覆方式的投影曝光裝置（步進器） 也適用。 作為曝光裝置31的種類，並不限於液晶顯示器製造用 的曝光裝置，把半導體元件圖案曝光至晶圓半導體的半導 體元件製造用曝光裝置，或是為了製造薄膜磁頭，攝像元 件(CCD)或是光柵等而用的曝光裝置等也可廣泛地適用。 且，作马曝光用照明光的光源，不僅可使用由超高壓 水銀燈產生的射線(g線(436nm)、h線(4〇4 7nm)、I線 (365nm))、KrF準分子雷射（248nm)、ArF準分子雷射 雷射（157nm)，也可以用x線或是電子線等的 電荷粒子線。例如，使用電子線的場合之電子搶，可使用 熱電子放射型的硼化鑭（LaB6)，鈕(Ta)。更，在使用電子 線的場合，可採利用光罩Μ的結構，亦可不用光罩M而 直接把圖案㊉成在玻璃基板上的結構。亦可以使用YAG 雷射或是半導體雷射等的高頻波。 系比^影光學PL的倍率，稼是等倍系，縮小.或是放大 遠i外線二1 為投影光學系pl，當使用準分子雷射等的 、土蜘从\，作為硝材，是使用透過石英或螢石等的 退备、卜線的材料，當使用F2雷射或X線的場合，反 29 1283907 11415pifl 射系或折射系的光學系（光栅R也是利用反射型者），及使 用電T線的場合中，作為光學系，亦可使用電子透鏡及由 偏向為所構成的電子光學系。而，不用投影光學系PL，使 光罩Μ與玻璃基板p密接，而曝光光罩M之圖案的近距 曝光裝置亦適用。 當在基板載台裝置35或光罩載台MST上使用線性馬 達(參照USP5,623,853或是USI>5,528，118)的場合，利用空 氣軸承的空氣浮上型及利用洛羅茲力或反作用力的磁氣浮 f型=兩者中任一者皆可用。且，各載台35、MST即使 疋沿著導引部而移動的型式亦可，未設導引部而為無導引 部的型式亦可。 各載台，作為MST驅動機構，使配置二維磁石的磁 石（永久)與配置二維線圈的電機單元對向，使用由電磁力 驅動各載台35，及驅動MST的平面馬達亦可。在此場合， 把磁石單元及電機單元中任一方連接至載台35、MST，除 了磁石單元及電機單元以外，也可設在載台35、MS的移 動面側(基座）。 如上述說明那樣，本發明實施例的曝光裝置31，可將 包含本專利申請範圍所列舉的各構成元件之各子系統，保 持所定的機械精度、電氣精度、光學精度，而組裝製造。 為確保此些各種精度，在此組裝的前後，要進行:為達成各 種光學系之光學精度的調整、為達成各種機械系之機械精 度的調整，及為達成各種電氣系之電氣精度的調整。從各 種子系統組裝到曝光裝置的工程中，包含各種子系統相互 !2839〇7 ll4lSpifl 的，械的連接、電氣回路的配線連接、氣壓回路的配管連 ，等。在將此些子系統組裝至曝光裝置之前，各子系統當 然需進行各自的組裝工程。在各種子系統組裝到曝光裝^ 的工程終了之後，再進行總合調整，以確保曝光裝置全體 的各種精度。且，曝光裝置的製造，較佳的是在溫度及清 /爭度管理的無塵室進行。 液晶顯示器裝置或半導體元件等的裝置，是如第Μ 圖所示，經由下列步驟而製造:進行液晶顯示裝置等的機能 /性能設計的步驟201、製造依據此設計步驟的光罩（光柵· 勺乂！^ 202、由石英製作玻璃基板p，或是由石夕材料製作 晶圓的步驟203、利用前述實施例的掃瞄型曝光裝置31， 將光栅R的圖案曝光至玻璃基板P(或是晶圓）上的步驟 =4、液晶顯示裝置等的組裝步驟(若為晶圓的場合，則包 含切割工程、打線工程、封裝工程)2〇5、檢查步驟2〇6等。 由以上的說明，在本發明中，可不損及線性馬達等的 驅動裝置的控制性，且可達裝置的輕巧化，又可抑制由資 源供給構件產生的發塵。而且，本發明不需複雜的機構，、 不會產生基板的位置偏移或是支架平面度惡化，可高精 度、紐時間地進行基板的定位。更，在本發明中，不需分 解載台裝置，可在維持精度的狀態下進行輸送，同時^ 達縮短現場組裝時間的效果。 雖然本發明已以較佳實施例揭露如上，然其並非用以 限J本發明，任何熟習此技藝者，在不脫離本發明之精神 和範圍内，當可作些許之更動與潤飾，因此本發明之保護 · 31 1283907 11415pifl 範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 第1圖繪示本發明的一實施例之曝光裝置的概略構成 圖。 第2圖繪示構成同一曝光裝置的光罩載台的外觀斜視 圖。 第3圖繪示本發明之基板載台裝置的全體結構的斜視 圖。 第4圖繪示第3圖的側面圖。 第5圖繪示第3圖的簡略化示圖。 第6圖僅繪示與從動台6有關的結構之外觀斜示圖。 第7圖繪示主載台部的概略結構圖。 第8圖繪示第7圖的側面圖。 第9圖繪示中繼傳送纜線類的從動台之局部詳細圖。 第10圖繪示中繼傳送纜線類的從動台之局部詳細圖。 第11圖繪示中繼傳送纜線類的從動台之局部詳細圖。 第12圖繪示在第7圖中使Y滑架回轉後之圖。 第13圖緣示Y滑架回轉的時候，線性馬達與空氣軸 承之動作相配合的關係圖。 第14圖繪示液晶顯示裝置的製造工程之一例示的流 程圖。 第15圖繪示習知的基板載台裝置之一例示的外觀斜 視圖。 【主要元件符號說明】 32 1283907 11415pifl Μ :光罩（光栅） P :玻璃基板 XL1 : X線性馬達， XL2 :從動X線性馬達(第2驅動裝置) YL : Y線性馬達(驅動裝置） I :底床(基座） la :貫通孔（第2貫通孔） lb :貫通孔 2a、2b : X軸導引部 3a、3b ·· X 滑架 4 : Y樑導引部（導引構件） 5、6 :空氣軸承 7 : Y滑架(載台本體） 9 :空氣軸承(保持裝置） 10 :平台（載台本體） II :平板支架（載台本體） 12 :防振台 13a、13b :可動件（第2可動件） 14a、14b :固定件（第2固定件） 15 :從動載台保持機構(連結裝置） 17 :纜線類（資源供給構件） 21 :基座框 22 :支柱(支持部） 23 :從動導引框 33 1283907 11415pifl 24a :從動導引部 25 :從動台（從動載台） 26 : Y線性馬達軸承， 27 :固定件 28 :可動件（第3可動件） 31 :曝光裝置 35 :基板載台裝置(載台裝置) 51 :微調螺絲 53 :可動件 85、86 :防塵薄板（蓋構件） 34Under the work of the vehicle bearing 9, pull lL and load capacity. The second one can obtain the suitable retaining device of the present invention required for the air bearing 9: the working air bearing 9' is formed by using the fine adjustment screw 5! to make the Y carriage γ and 'in the width direction of the Y carriage 7 On both sides, 53, the movable member 53 ^ is driven by the [linear horse $ a few movable members 53 , the interaction is used again = the electromagnetic phase direction of the fixed members 27, 27, so the ^ movable member 53 is The amount of the lion's ground that is driven to the X-gap (the amount) is less than the predetermined value between the X-direction between the member 27 and the movable member. The gap sensing center of the day Θ τ is provided with a detecting fixture 27 and a movable member, and a gap sensor (detecting device) at the fixing member 27 and Y, in the ζ direction H between the control gap amount. Near the two ends, the group splits the ink force = fortunately = between the 'fixed parts diagrams', according to the location of the position detection device (not in the Z direction, which can be ^ The result is that the position adjustment device is driven separately. ^The relative position of the fixing member 27 and the movable member 53 is 'as shown in Fig. 8, and the lower side of the disaster is respectively attached to the second and seventh of the movable member 53. The guide unit 4 is provided with two linear motors 54 for control. The position of the movable end member 53 is provided in the Υ direction, and the χ side of the '2 plate holder 11 is moved away from the Υ direction of the illuminated Υ. 7, the reflected light reflected by the laser interferometer 57, whereby the position of the X direction of the moving mirror Ζ can be received and the U 架 U U (ie, the glass substrate is otherwise, Moonwood 7. The platform 10 and the plate bracket 11 are constructed as 20 1283907 11415pifl. The main load σ (the carrier body) is on the 'electric winding, line or air pressure to the member'. 17 (refer to the 4th ) Is connected with the self-contained ^. Clothing outside. In order to supply various resources, the linings 17 are connected to the main stage as relay transmissions of the pedestal frame 2i and the driven table 25 as shown in Fig. 1 and Fig. 9 to Fig. 11. As will be described later, the bottom line 1 is opened on the bottom of the bed, and the seven-person I 2 1 is wound into a through-hole that penetrates the bottom of the bed 1 in the Z direction. The station 25 relays the transmission. As shown in Fig. 9, a set of green guiding portions ^ are fixed to the lower surface side of the driven table 25 in a direction substantially parallel to the moving guide portion 24a of the driven table 25. On the linear guide portion 81, the slide plate 82 is movably mounted in the guide direction (XS upwards), and on this plate 82, the movable pulley 83 for winding the dustproof sheet (cover member) 85, and the roll: A plurality of rollers 84a of the gauge line 17 are supported and mounted on the roller holding plate 84b. The weave, the _ 17 is dragged around the base to pass through the through hole lb' and is hung in the configuration. After the semi-circular wheel is called, it is folded back and introduced into the end portion 89 of the driven table 25. The dust-proof sheet 85 has one end fixed to the driven guide frame 23 and the other end fixed to the movable pulley 83 at both ends. A fixed thin plate is provided, and one end of the other dustproof thin plate (cover member) 8 is fixed on the opposite side of the dustproof 85. The winding portion 87 of the dustproof sheet 86 is fixed. On the driven guide frame 23, etc., when the glass substrate is moved to the X direction (scanning direction), the x linear motor XL1 and the driven twist line shown in Fig. 21 1283907 11415pifl are in this manner, X The carriages 3a, 3b are actuated by the χ#^达 XL2. The state of the lead, the Y-beam guide 4 is the main cutting table - 5 # 2a, 2b Further, the slide plate 24b is moved by the driven guide portion 2 to the X direction. The table 25 is a slap between the Y beam guide portion 4 and the bottom bed, and is driven at this time, connected to the Y slide. The direction of movement of the frame 7 is the same. The gap between the 27 direction of the piece 27 of the table 25 and the connection detection result are monitored and maintained at a constant value. * The relative position of the turret 25 of the gap sensor is maintained. When the main position and the slave are in the positional position, since the main stage and the driven table 25 are moved in the X direction, they will not be deformed, and there will be no friction or one (four) line. The external disturbance of the class '. 'The mouth does not cause vibration, etc. 17, is like the first;::u25: pedestal: the cable type provided between 21\S4b so as not to produce - straight, swaying 25 - the same movement, the holding plate 84b is in the χ direction t and the resistance. In addition, the I line type 17 is that the movement amount of the roller 84b is driven, and the square hole is required to form a through hole "large": 1/2 of the two quantities. Therefore, when the bed 1 is moved, the driven pulley 83 δ is small. Moreover, the length H of the position where the follower table 25 is moved to the phantom pulls out the dust thin plate %' to correspond to the slip. In this case, even if the dust is blown in the slow-winding type 17, it is possible to suppress the dusting of the main gantry on the gamma-grating main gantry. When the follower table 25 moves in the X direction, 22 1283907 H415pifl the main shaft 15a of the driven stage holding mechanism 15 is disengaged from the tapered bearing 16 of the X carriages 3a, 3b, however, the X linear motor XL1 and the driven X linear When the main shaft 15a is joined to the tapered bearing 16 during the initial operation of the motor XL2, the Y-beam guide portion 4 and the driven table 25 can be mechanically integrated and coupled. In this case, even in the state before the operation of the linear motors XL1, XL2 is stabilized, the relative positional relationship between the stator 27 and the movable member 53 can be kept constant. When the glass substrate P is moved in the Y direction (non-scanning direction), the Y linear motor YL· is actuated. At this time, the movable member 53 is caused to follow the linear encoder 54 in the same direction (the -Y direction in Fig. 7), and at the same time, only the same distance is driven, whereby the gamma carriage 7 (i.e., the main carriage) is Moving in the γ direction, the main stage (glass substrate P) can be moved step by step. Moreover, the two movable members 53 are followed by the linear code ϋ 54, as shown in the 12th U, and the same distance is driven in the opposite direction in the opposite direction, so that the m carriage 7 can be guided around the yoke axis with respect to the γ beam. The micro-turn is reversed to the θ rotation (Θζ direction) of the glass substrate ρ. (5) As described in the description, the air bearing 9 of the slewing, such as the two squats facing the W Shao 4, is moved by the two movable members 53 to each other, even if the yoke 7 is connected to the γ beam. : It can move in the opposite direction while maintaining the air bearing surface for the "two = at the same time". At this time, the sphere of the fine adjustment screw 51 is rotated by the opposite point as the center of rotation. ^9 In the middle, the air 嶋 "". Thick fruit Γ) will; 23 12839 〇 7 U4l5pifl 'small slewing of the skeleton 7. Figure 13 depicts the linear horse and air bearing 9 when the Y carriage 7 is rotated around the Z axis The relationship between the two forces F. The two thrusts F that are opposite to each other and the force R of the opposing air bearing 9 from the γ beam guide are in a state in which the momentum is the same, from the center of rotation to the movable member, The distance is L. From the position where the air bearing 9 receives the reaction force gauge to the rotation, and the distance of 0 is a, the relationship from FXL - RX a = 0 becomes F = RX a / L ... (1). At the same time, R depends on the rigidity of the air bearing 9, but the rigid white eve is 500 Ν/μπι or less. Here, 2jmraci is used. The carriage 7 ^ rotation angle, the gap change of the air bearing 9 at this time is 1μη1, the rigidity of the air bearing 9 is 500Ν/μηι, the distance [is 5〇〇mm, the distance & is the linear motor yl thrust ρ (1), change to F = 500 X 〇.7 /500 = 〇.7 N. ^In other words, even if the frictional force of each contact portion is taken into consideration, the Y carriage 7 can be rotated without a small lifting force. When the money gap of the second working bearing 9 is G, since the γ / moon wood cannot be returned to the above level, the amount of rotation of the carriage 7 is reported to be small. The reason for the straightness is that the movable member 53 of the linear motor YL and The ratio of the fixture ^^ encoder (s, the clearance of the bottom bed γ / moon wood 7 rotation limit. As the rotation of the detection θ rotation can be the contact or non-contact on the plate core U ^ The type of substrate end face gauge is also the connection of 24 1283907 11415pifl contact or non-contact substrate end face measuring device installed outside the main stage. When using the measuring device outside the main stage, in the glass Before the substrate p is to be placed on the plate holder η, the tilt information of the glass substrate ρ is output to a drive (not shown) In the drive control device, the rotation error of the glass substrate 补 is corrected by the measurement values of the movable member 53 and the linear encoder ,, and the squat rack 7 is rotated in advance. (7) At this time, when the yoke 7 is required to be large In the case of the rotation, the moving mirror 7 W of the measuring beam 56 of the laser interferometer that receives the positioning measuring means of the main stage is too inclined to enter the interferometer (not shown), and it becomes an error. In this case (see Fig. 12), even in such a case, the amount of rotation of the gamma carriage 7 is measured by the two linear encoders 54 described above, and the plate holder 11 is transported from the substrate (not shown) on the glass substrate ρ. After the device is installed, the Y carriage 7 is returned to the normal position and the laser interferometer is returned. Therefore, the complicated mechanism of high-precision alignment is not required, and the position can be quickly aligned without degrading the flatness of the flat plate bracket 11. . Next, the exposure operation of the exposure device 31 will be described. When the exposure processing is started, the mask holder MST holding the mask M and the main stage of the substrate stage device 35 holding the glass substrate ρ are oriented in the same manner as the illumination light IL by the controller for the eye-catching force (not shown). X-axis direction and move synchronously at the same speed. In this way, the pattern of the mask M that the illumination light is illuminating is successively exposed on the glass substrate ρ. At this time, the follower stage 25 is also moved in synchronization with the main stage. However, since it is transmitted through the support post 22 and the Y-beam guide portion 4 of the driven table 25, it is disposed so as to be in contact with the bottom bed 1 supporting the main stage. Since the vibration is separated, the vibration accompanying the movement of the follower 25 1283907 11415pifl 25 can be prevented from being transmitted to the main stage. Further, by this synchronous movement, the anti-vibration table 12 is biased so that the amount of sinking is not constant, whereby the base 43 of the mask stage MST and the bed 1 of the substrate stage device 35 are inclined, and the light is tilted. The holder of the cover stage MS Dingzhi motor 61 8 21B, the X linear motor XL1 of the substrate stage device 35, and the movable member of the γ linear motor YL are relatively inclined. Therefore, the amount of the gap between the fixing member and the movable member is varied, and the position adjusting device is driven according to the detection result of the gap sensor provided by each linear motor, thereby adjusting the fixing members of the respective linear motors. Pose. In this way, the relative angles of the respective members and the movable member become zero, and the amount of the gap between the fixing members and the gap can be maintained at a predetermined value. In response to the moving member, the reaction force of the mask stage MST moving in the X direction and the γ direction is transmitted to the reaction force blocking frame 46 through the fixing members 63A and 63B, so that the mask stage MST is placed on the mask stage MST. External disturbances caused by reaction forces will not work. Similarly, the reaction force accompanying the movement of the main stage of the substrate stage 35 in the X^ direction is transmitted to the reaction force blocking frame 46 through the fixing members 14a and 14b, and the reaction force is caused on the main stage. The resulting external disturbance will not work. Further, the reaction force accompanying the movement of the main stage in the Y direction is transmitted to the driven table 25 through the fixing member W, but as described above, it is arranged such that the support 22 and the bottom bed 1 are In the case of vibration separation, the disturbance caused by the reaction force does not act on the main stage. As described above, in the present embodiment, since the driven table 25 is moved by the fixing member 27 that supports the γ linear motor YL, the linear motor drives the main stage and the Y beam guiding portion 4 to be reduced in the X direction. The movement weight is 26 1283907 11415pifl 'and can prevent the controllability of the motor from being low. Therefore, the positional controllability and the speed controllability of the glass substrate P held on the main stage can be improved, and the transfer accuracy of the pattern transferred to the glass substrate P can be expected to be improved. Moreover, in the present embodiment, since the driven table 25 is disposed between the γ beam guiding portion and the bottom bed 1, it is not necessary to make the bottom bed 大 a large flat surface, and the bottom bed 1 can be required. The high-precision part is reduced, and the size of the device can be prevented. Further, when the driven table 25 is relayed by the cable type, even if the dust is generated by the friction of the cable 17 by the presence of the γ beam guiding portion 4, the glass substrate on the main stage is less likely to adhere. The foreign matter can suppress the occurrence of defective products by exposure treatment. In particular, in the embodiment of the present invention, even if the driven table 25 is moved in the X direction, since the through holes penetrating through the cable 17 are covered by the dustproof sheets 85 and 86 and the driven table 25, the foreign matter can be surely suppressed. Adhered to the glass substrate P. Further, in the present embodiment, since the support post 22 and the bottom bed 1 are separated by vibration, the disturbance does not cause damage to the main stage due to the movement of the main stage or the follower stage 25 and the dustproof cover 85, 86. Further, since the cable type 17 penetrates the bottom bed 1 in a non-contact manner, it is possible to prevent the constant and impact resistance to the main stage due to the deformation of the cable type 17. In addition, in the present embodiment, the weight of the driven side of the driven table 25 or the like is not hung on the bottom bed 1, and the X-car is not deformed by the guiding portions 2a, 2b. As a result, The gain of the control loop of the main stage can be improved, so that high-accuracy positioning and position tracking with high responsiveness can be achieved. Further, in the present embodiment, the alignment of the glass substrate ρ can be easily performed because the main stage is made reversible around the Z axis. Moreover, in the present invention, the current movable member 53 and 53 are driven in opposite directions to each other, so that the main force and the force turn 'without an additional complicated mechanism, and the flatness of the flat bracket 11 can be quickly and without damage. Glass substrate p (alignment). Therefore, in the present embodiment, although the driven table 25 and the bottom bed 1 are mechanically separated, the base frame 21 is disposed under the bottom bed ,, After adjusting the position of the base frame 21, the base frame 21 is lowered from the bottom bed 1 to support the lower portion of the bottom bed 1 while maintaining the relative positional relationship between the bottom bed 1 and the base frame 21. Conveying, without disassembling the substrate stage device, can shorten the time of on-site assembly. Further, in the above-described embodiment, in order to maintain the relative positional relationship between the fixing member and the movable member, the position of the fixing member is adjusted according to the detection result of the gap sensor. However, the present invention is not limited thereto. The position of the movable member or the position of both the fixed member and the movable member may be adjusted. Further, in the above embodiment, the stage device of the present invention is applied to the substrate stage device, but may be applied to only the mask stage, or both the substrate stage device and the mask stage. Further, in the embodiment of the above embodiment, the stage device of the present invention is configured to be applied to the exposure device 31. However, the present invention is not limited thereto, and may be applied to a transfer mask other than the exposure device 31. A precision measuring device such as a device or a position coordinate measuring device for a mask pattern. Further, as the substrate of the present embodiment, not only a glass substrate P for a liquid crystal display, a semiconductor wafer for a semiconductor element, a ceramic wafer for a thin film magnetic head, or a photomask or a grating original used in an exposure apparatus can be used ( 28 1283907 " 4l5pifl quartz, silicon wafers, etc. are applicable. As the exposure device 31, in addition to the scanning type exposure device (scan stepper; USP 5, 473, 410) of the step-by-step scanning method in which the pattern of the mask is scanned in synchronization with the mask Μ and the glass substrate P, A step-and-repeat type projection exposure apparatus (stepper) that exposes the pattern of the mask 静止 in a stationary state with the mask Μ and the glass substrate , and sequentially moves the glass substrate is also applicable. The type of the exposure device 31 is not limited to an exposure device for manufacturing a liquid crystal display, or an exposure device for exposing a semiconductor element pattern to a semiconductor device for wafer semiconductor manufacturing, or for manufacturing a thin film magnetic head, an imaging element (CCD) or a grating. An exposure apparatus or the like for use in the same can be widely applied. Further, as a light source for illumination light for horse exposure, not only radiation generated by an ultrahigh pressure mercury lamp (g line (436 nm), h line (4〇47 nm), I line (365 nm)), KrF excimer laser ( 248 nm), ArF excimer laser (157 nm), or charged particle lines such as x-rays or electron lines. For example, in the case of electron grabbing using an electron beam, a thermal electron radiation type lanthanum boride (LaB6) or a button (Ta) can be used. Further, in the case of using an electronic wire, it is possible to adopt a structure in which a photomask is used, or a structure in which the pattern is directly formed on a glass substrate without using the mask M. High-frequency waves such as YAG lasers or semiconductor lasers can also be used. The ratio is the ratio of the optical PL, the crop is equal to the double, narrowed or enlarged. The outer line 2 is the projection optics pl. When using excimer lasers, etc., the soil is used as the nitrate material. Through the retreat of quartz or fluorite, etc., when using F2 laser or X-ray, the optical system of the projection system or the refractive system (the grating R is also a reflection type), and the use of the anti-29 1283907 11415pifl In the case of an electric T-line, an electron lens and an electro-optical system composed of a deflection may be used as the optical system. Further, a close exposure device in which the mask Μ is adhered to the glass substrate p without the projection optical system PL and the pattern of the exposure mask M is applied is also applicable. When a linear motor (see USP 5,623,853 or USI> 5,528,118) is used on the substrate stage device 35 or the mask stage MST, the air bearing type of the air bearing and the Loroz force or the reaction force are utilized. Magnetic air float f type = either of them is available. Further, each of the stages 35 and MST may be of a type that does not have a guide portion, and may be a type that does not have a guide portion, even if it is moved along the guide portion. Each of the stages serves as an MST drive mechanism, and the magnet (permanent) in which the two-dimensional magnet is placed is opposed to the motor unit in which the two-dimensional coil is disposed, and the stage motor 35 that drives the stages 35 by electromagnetic force and drives the MST may be used. In this case, one of the magnet unit and the motor unit is connected to the stage 35 and the MST, and may be provided on the moving surface side (base) of the stage 35 and the MS in addition to the magnet unit and the motor unit. As described above, the exposure apparatus 31 according to the embodiment of the present invention can assemble and manufacture the respective subsystems including the respective constituent elements exemplified in the scope of the present application by maintaining the predetermined mechanical precision, electrical precision, and optical precision. In order to ensure these various precisions, adjustments are made before and after the assembly to achieve optical precision adjustment of various optical systems, adjustment of mechanical precision of various mechanical systems, and adjustment of electrical precision of various electrical systems. From the assembly of each seed system to the exposure device, the various subsystems are connected to each other, the connection of the device, the wiring of the electrical circuit, the connection of the pneumatic circuit, and the like. Prior to assembly of these subsystems to the exposure apparatus, the various subsystems would of course undergo their own assembly work. After the assembly of the various subsystems to the exposure apparatus is completed, the total adjustment is performed to ensure various precisions of the entire exposure apparatus. Further, the manufacture of the exposure apparatus is preferably carried out in a clean room in which temperature and degree of competition are managed. A device such as a liquid crystal display device or a semiconductor device is manufactured as shown in the following figure, and is manufactured by the following steps: a step 201 of performing a functional/performance design of a liquid crystal display device or the like, and a photomask (grating/spoon) according to the design step. 202!^ 202, the glass substrate p is made of quartz, or the step 203 of fabricating the wafer from the stone material, and the pattern of the grating R is exposed to the glass substrate P by using the scanning type exposure device 31 of the foregoing embodiment (or Step on the wafer = 4, assembly steps of the liquid crystal display device (in the case of a wafer, including a cutting process, a wire bonding process, and a packaging process) 2〇5, an inspection step 2〇6, etc. In the present invention, the controllability of the driving device such as a linear motor can be not impaired, and the lightening of the device can be achieved, and the dust generated by the resource supply member can be suppressed. Moreover, the present invention does not require a complicated mechanism, The positional deviation of the substrate or the flatness of the bracket is not deteriorated, and the positioning of the substrate can be performed with high precision and time. Further, in the present invention, the stage can be disassembled and the accuracy can be maintained. In the state of being conveyed, and at the same time, the effect of shortening the on-site assembly time is achieved. Although the present invention has been disclosed in the preferred embodiments as above, it is not intended to limit the invention, and anyone skilled in the art can be without departing from the spirit of the invention. In the scope of the present invention, the scope of the invention is defined by the scope of the appended claims. [FIG. 1 illustrates the invention. Fig. 2 is a perspective view showing the appearance of a mask stage constituting the same exposure apparatus. Fig. 3 is a perspective view showing the overall configuration of the substrate stage apparatus of the present invention. 4 is a side view of Fig. 3. Fig. 5 is a simplified view of Fig. 3. Fig. 6 is a perspective view showing only the structure of the structure associated with the driven table 6. A schematic view showing a main stage portion. Fig. 8 is a side view showing a seventh stage. Fig. 9 is a partial detailed view showing a relay stage of a relay transmission cable. Fig. 10 is a view showing a relay transmission. Partial detailed view of the follower of the cable type. Figure 11 A partial detailed view of the follower transmission type of the relay transmission cable is shown. Fig. 12 is a view showing the Y carriage rotated in Fig. 7. Fig. 13 shows the linear motor when the Y carriage is rotated. Fig. 14 is a flow chart showing an example of a manufacturing process of a liquid crystal display device. Fig. 15 is a perspective view showing an appearance of a conventional substrate stage device. Main component symbol description] 32 1283907 11415pifl Μ : Photomask (grating) P : Glass substrate XL1 : X linear motor, XL2 : Slave X linear motor (2nd drive unit) YL : Y linear motor (drive unit) I : Bottom Bed (base) la: through hole (second through hole) lb: through hole 2a, 2b: X-axis guide portion 3a, 3b ·· X carriage 4: Y-beam guide (guide member) 5. 6 : Air bearing 7 : Y carriage (stage body) 9 : Air bearing (holding device) 10 : Platform (stage body) II : Plate bracket (stage body) 12 : Anti-vibration table 13a, 13b : Movable parts (Second movable member) 14a, 14b: Fixing member (second fixing member) 15 : Follower stage holding mechanism (coupling device) 17 : Line type (resource supply member) 21 : Base frame 22 : Pillar (support portion) 23 : Follower guide frame 33 1283907 11415pifl 24a : Follower guide 25 : Follower (driven carriage) 26 : Y Linear motor bearing, 27: Fixing member 28: Movable member (3rd movable member) 31: Exposure device 35: Substrate stage device (stage device) 51: Fine adjustment screw 53: Movable member 85, 86: Dust-proof sheet (cover member) ) 34