TWI270642B - Ice slurry manufacturing apparatus and substrate processing apparatus - Google Patents
Ice slurry manufacturing apparatus and substrate processing apparatus Download PDFInfo
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- TWI270642B TWI270642B TW094139730A TW94139730A TWI270642B TW I270642 B TWI270642 B TW I270642B TW 094139730 A TW094139730 A TW 094139730A TW 94139730 A TW94139730 A TW 94139730A TW I270642 B TWI270642 B TW I270642B
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- liquid
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- ice particles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
1270642 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種冰漿製造裝置及基板處理裝置，該冰 漿製造裝置係製造含有冰微粒之處理液，該處理液用於半 導體晶圓、液晶顯示裝置（LCD)用玻璃基 (聊用玻璃基板、印刷基板、㈣基板、電子== 等基板之洗淨處理等；該基板處理裝置係使用由該冰聚製 造裳置所製造之含有冰微粒之處理液，進行基板之洗淨等 處理。 【先前技術】 例如於LCD、PDP等平板顯示器（FpD)之製造裝置中之基 板洗淨，係按以下一連聿半 運串之步驟進行：使用準分子雷射之 UV照射清除有機物污毕 、 戍Ή木使用滾刷之擦洗洗淨清除i μιη 以上之污染物質-> 使用罟姑、也、公 、 換洗淨清除藥液洗淨後之藥液— 使用2流體洗淨之精密洗淨〜使用最終水洗之s工洗淨。 另外’近年-種洗淨方法取代滾刷洗淨，例如曰本專利第 3380021號公報中所接宏廿 W所k案並貫施之方法， 微粒分散於液體中形成要+ ^ 门表禋冰 果路狀懸濁液狀態之冰漿，從噴嘴 向基板之表面噴射冰难 、 …、 7使冰微粒碰撞基板來洗淨基板。 口上所述，由過冷卻水 表仏用於基板洗淨處理之冰喂 時，作為解除過冷卻水之、、人" /水水 教η # # 义♦部狀態之方法，先前係採用 激勵孟屬片，使其如蜂鳴 1人"t )裔为又振動來接觸過冷卻水，或佶 過冷部水碰撞金屬或塑 [發明所欲解決之問題] 105956.doc 1270642 先鈉之使振動之金屬片接觸過冷卻水，或 碰撞金屬之平板，以解除過冷卻水之過冷卻狀態 純水中生成冰微粒之方法，金屬離子會混入純水中，製造 出犯入金屬離子之冰裝。使用這種冰聚洗淨基板時，會產 生金屬污染基板之不良。另彳，使過冷卻水碰撞塑膠之平 板’以解除過冷卻水之過冷卻狀態之方法，樹脂成分會混 入純水中亦令人擔憂°此外，使過冷卻水碰撞金屬或塑膠[Technical Field] The present invention relates to an ice slurry manufacturing apparatus and a substrate processing apparatus which are used for manufacturing a processing liquid containing ice particles, which is used for a semiconductor wafer, A liquid crystal display device (LCD) is made of a glass substrate (a glass substrate, a printed substrate, a (4) substrate, a substrate such as an electron==, and the like; and the substrate processing apparatus uses ice containing the ice-making apparatus. The processing liquid of the fine particles is subjected to a treatment such as washing of the substrate. [Prior Art] For example, in the manufacturing apparatus of a flat panel display (FpD) such as an LCD or a PDP, the substrate is washed by the following steps: UV irradiation of excimer laser to remove organic matter, cleaning and cleaning of eucalyptus using a roller brush to remove pollutants above i μιη-> The liquid medicine - the precision washing with 2 fluid washing ~ Washing with the final water washing. In addition, 'the recent years - the washing method replaces the roller brush washing, for example, the patent No. 3380021 In the report, the Acer W case is applied in a manner that the particles are dispersed in the liquid to form an ice slurry that is in the state of the door surface, and the ice is sprayed from the nozzle to the surface of the substrate. ..., 7 causes the ice particles to collide with the substrate to clean the substrate. When the ice is used for the substrate cleaning treatment by the supercooled water surface, as described in the mouth, as the cooling water, the person "/水水教η##义♦ The state of the state, the previous method used to encourage Mengzi tablets, such as buzzing one person "t) for vibrating to contact the cooling water, or smashing the cold water to collide with metal or plastic [invention office Problem to be solved] 105956.doc 1270642 First, the vibrating metal piece is exposed to the cooling water or colliding with the metal plate to release the supercooled water in the supercooled state to form ice particles in the pure water, and the metal ions will be mixed. In pure water, ice is made into metal ions. When such a ice is used to clean the substrate, the metal contamination of the substrate is caused. In addition, the method of causing the supercooled water to collide with the plastic flat plate to release the supercooled state of the supercooled water, the resin component may be mixed into the pure water is also worrying. In addition, the supercooled water collides with the metal or the plastic.
^平板之方法，存在冰漿於平板上擴散時從平板吸收熱 里，所生成之冰微粒溶解之問題點。 本發明係鑒於以上情況所完成者，其目的在於提供一種 冰漿製造裝置及基板處理裝置，該冰漿製造裝置係於由過 冷部液體製造含有冰微粒之處理液時，無污染物質混入之 顧慮，，亦無所生成之冰微粒溶解I，該基板處理t置係使 用由該冰漿製造裝置所製造之含有冰微粒之處理液，能夠 適當進行基板之洗淨等處理者。 【發明内容】 與請求項1相關之發明，係一種製造含有冰微粒之處理 液之冰漿製造裝置，其特徵在於包含：本體部，其下部具 有液體導人π及氣體噴出口，上部具有含有冰微粒之處理 液之流出口；過冷卻液體供給機構，其通過連通於該本體 部之液體導入口之液體供給管，向本體部内供給過冷卻液 體；及氣體供給機構，其通過連通於上述本體部之氣體噴 出口之氣體供給管，向本體部内供給過冷卻解除用氣體， 從上述氣體喷出口向通過上述液體導入口而導入上述本體 105956.doc !27〇642 部内之過冷卻液體中喷出過冷卻解除用氣體，以 部液體之過冷卻狀態，使所生成 、7 太❸“ 1珉之3有冰微粒之處理液從 本體邻内通過上述流出口流出。 與請求項2相關之發明係如請求们之冰聚製造裝置，盆 中上述本體部包含：直管，其下端面由底壁部所堵塞二 :控從：端部向上端部逐漸減小之方式形成；液體導入管 心其貫穿該直管之底壁部插通於直管内部，前端口成為The method of flat plate has a problem that the generated ice particles are dissolved in the heat absorbed from the flat plate when the ice slurry spreads on the flat plate. The present invention has been made in view of the above circumstances, and an object thereof is to provide an ice slurry manufacturing apparatus and a substrate processing apparatus which are capable of mixing non-polluting substances when a treatment liquid containing ice particles is produced from a supercooled liquid. In the case of the substrate, the processing of the substrate is carried out by using a treatment liquid containing ice particles produced by the ice slurry manufacturing apparatus, and the substrate can be appropriately washed or the like. SUMMARY OF THE INVENTION The invention relating to claim 1 is an ice slurry manufacturing apparatus for producing a treatment liquid containing ice particles, comprising: a body portion having a liquid guide π and a gas discharge port at a lower portion thereof, and an upper portion having a a flow outlet for treating the ice particles; a supercooling liquid supply mechanism that supplies a supercooling liquid into the body portion through a liquid supply pipe that communicates with the liquid introduction port of the body portion; and a gas supply mechanism that communicates with the body The gas supply pipe of the gas discharge port of the unit supplies the supercooling release gas into the main body, and is discharged from the gas discharge port into the supercooled liquid introduced into the main body 105956.doc.27〇642 through the liquid introduction port. The supercooling-releasing gas is caused to flow out through the above-mentioned outflow port from the main body in the vicinity of the main body in the supercooled state of the liquid portion. For example, in the ice gathering manufacturing device of the request, the body portion of the basin includes: a straight pipe whose lower end surface is blocked by the bottom wall portion: The portion is formed to gradually decrease toward the upper end portion; the liquid introduction tube is inserted through the bottom wall portion of the straight tube into the inside of the straight tube, and the front port becomes
上述液體之導人口，並與上述過冷卻液體供給機構之液體 供給管相連接；隔牆部，其與上述❹部設置間隔而配 設，以便分隔上述直管之㈣，在與上述底^部之間形成 氣體導入室’且形成有成為上述氣體噴出口之多數貫通细 ^ ;及氣體導入管部，其連通於上述氣體導人室，與上述 氣體供給機構之氣體供給管相連接，且上述直管之上端口 成為上述流出口。 與請求項3相關之發明係如請求項2之冰漿製造裝置，其 中上述直管保持為垂直姿勢。 與請求項4相關之發明係如請求項3之冰漿製造裝置，其 中過冷卻解除用氣體為二氧化碳，製造二氧化碳溶解並含 有冰微粒之處理液。 與請求項5相關之發明，係一種利用含有冰微粒之處理 液來處理基板之基板處理裝置，其特徵在於包含··如請求 項1至4中任一項之冰漿製造裝置；支撐基板之基板支撐機 構；及處理液供給機構，其向由該基板支撐機構所支摟之 基板之主面供給由上述冰漿製造裝置所製造之含有冰微粒 105956.doc 1270642 之處理液。 與請求項6相關之發明係如請求項5之基板處理裝置，其 中上述基板支撐機構係支撐基板並向水平方向搬送之基板 搬送機構，由上述處理液供給機構向由上述基板搬送^構 所搬送之基板之主面供給含有冰微粒之處理液，此外尚包 含於基板之主面上攪拌含有冰微粒之處理液之攪拌構件。 與請求項7相關之發明係如請求項6之基板處理裝置，其 中上述基板搬送機構於與基板之搬送方向正交之方向，一 邊使基板傾斜地支樓一邊向水平方向搬送。 與請求項8相關之發明係如請求項5之基板處理裝置，其 中上述處理液供給機構包含喷嘴，其向由上述基板支撐機 構所支撐之基板主面，以高壓喷出含有冰微粒之處理液。 與請求項9相關之發明係如請求項5之基板處理裝置，其 中基板之處理係洗淨處理。 【實施方式】 [發明之效果] 與請求項1相關之發明之冰漿製造裝置，係由過冷卻液 體供給機構通過下部之液體導入口向本體部内供給過冷卻 液體，由氣體供給機構所供給之過冷卻解除用氣體從本體 部下部之氣體喷出口向導入至本體部内之過冷卻液體中喷 出。並且，過冷卻液體與過冷卻解除用氣體之氣泡從本體 部下部向上部之流出口上昇，在此過程中利用氣泡來解除 過冷卻液體之過冷卻狀態，形成很多冰核而生成冰微粒。 所生成之含有冰微粒之處理液從本體部内通過上部之流出 105956.doc 1270642 抓出如此，利用過冷卻解除用氣體 卻液體之過A饰处&』、、 風也不解除過冷 ^ ^ » 也，成為氣泡之過冷卻解除用氣體溶解 於處理液中，並從本體部内通過上部之流出口排出。 由^\’使用與請求項1相關之發明之冰«造裝置，在 由h部液體製造含有冰微粒 物質混入之顧慮，㈣所生成…夜之過私中，無万染 …、斤生成之冰W粒溶解之情形。 與請求項2相關之發明將生 冰水製&哀置，係過冷卻液體 通過貝牙直官之底壁部插 憎X s丄心 門口丨之液體導入管部而 ¥ 至本體部内，過冷卻解除用气轉、g 示用乳體通過氧體導入管部及 底壁部與隔牆部間形成之氧 ii ^ ^ ^ - 虱體¥入至，從隔牆部之多數貫 通、、、田孔向直管内之過冷卻 ra A 從餸T噴出。並且，因為過冷卻 液體與過冷卻解除用氣體 玖"…α 起通過直管内之細長流 路從下部向上部之流出口 上歼 所以在直至到達直營上 部之流出口之期間，能夠 違直The liquid guiding population is connected to the liquid supply pipe of the supercooling liquid supply mechanism; the partition wall portion is disposed at an interval from the crotch portion to partition the straight pipe (four), and the bottom portion a gas introduction chamber is formed therebetween, and a plurality of through-holes that are the gas discharge ports are formed, and a gas introduction pipe portion that communicates with the gas introduction chamber and is connected to the gas supply pipe of the gas supply mechanism. The upper port of the straight pipe becomes the above-mentioned outflow port. The invention relating to claim 3 is the ice slurry manufacturing apparatus of claim 2, wherein the straight tube is maintained in a vertical posture. The invention according to claim 3 is the ice slurry manufacturing apparatus of claim 3, wherein the supercooling release gas is carbon dioxide, and a treatment liquid in which carbon dioxide is dissolved and contains ice particles is produced. The invention relating to claim 5 is a substrate processing apparatus for processing a substrate by using a treatment liquid containing ice particles, characterized by comprising the ice slurry manufacturing apparatus according to any one of claims 1 to 4; The substrate supporting mechanism and the processing liquid supply mechanism supply the processing liquid containing the ice particles 105956.doc 1270642 manufactured by the ice slurry manufacturing apparatus to the main surface of the substrate supported by the substrate supporting mechanism. The substrate processing apparatus according to claim 5, wherein the substrate supporting mechanism is a substrate transfer mechanism that supports the substrate and is transported in a horizontal direction, and is transported by the processing liquid supply mechanism to the substrate transfer mechanism. The main surface of the substrate is supplied with a treatment liquid containing ice particles, and a stirring member for agitating the treatment liquid containing ice particles on the main surface of the substrate. The invention of claim 7 is the substrate processing apparatus according to claim 6, wherein the substrate transfer mechanism is transported in a horizontal direction while the substrate is tilted in a direction orthogonal to the transport direction of the substrate. The invention relates to the substrate processing apparatus of claim 5, wherein the processing liquid supply mechanism includes a nozzle that ejects a treatment liquid containing ice particles at a high pressure to a main surface of the substrate supported by the substrate supporting mechanism. . The invention relating to claim 9 is the substrate processing apparatus of claim 5, wherein the processing of the substrate is a cleaning process. [Embodiment] The ice slurry manufacturing apparatus according to the invention of claim 1 is characterized in that the supercooled liquid supply means supplies the supercooled liquid into the main body through the lower liquid introduction port, and is supplied by the gas supply means. The supercooling release gas is ejected from the gas discharge port at the lower portion of the main body portion to the supercooled liquid introduced into the main body portion. Further, the bubbles of the supercooling liquid and the supercooling releasing gas rise from the lower portion of the main body to the upper portion, and in the process, the supercooled state of the supercooled liquid is released by the bubbles, and a large number of ice nuclei are formed to generate ice particles. The generated treatment liquid containing ice particles is taken out from the main body through the upper portion 105956.doc 1270642, and the gas is removed by the supercooling, but the liquid is over the A decoration and the air is not released too cold ^ ^ » In addition, the gas for cooling and releasing the bubbles is dissolved in the treatment liquid, and is discharged from the inside of the main body through the upper outlet. The use of the ice-making device of the invention relating to claim 1 by ^\', the fear of mixing with the substance containing ice particles produced by the liquid of h, (4) the generation of ... the night of the private, no 10,000 dyes... The case where ice W particles dissolve. The invention relating to the claim 2 will be used to make the ice water system & the cooling liquid is passed through the bottom wall portion of the shell of the teeth, and the liquid is introduced into the tube portion of the X s heart gate, and is discharged into the body portion. The cooling release gas is transferred, and the oxygen is introduced into the oxygen-introducing tube portion and the oxygen ii ^ ^ ^ - body formed between the bottom wall portion and the partition wall portion, and is penetrated from the partition wall portion, The field hole is sprayed from the 餸T to the supercooling ra A in the straight pipe. In addition, since the supercooled liquid and the supercooling release gas 玖"...α pass through the elongated flow path in the straight pipe from the lower portion to the upper outlet, so it can be straightened until reaching the upper outlet of the direct operation.
能，彳放地利用軋泡來解除過冷卻狀 L ’生成衆多冰微叙。s L }}ϋβ > θ # π ，因為過冷卻解除用氣體從隔 另回口Ρ之夕數貝通細孔向過 M Mi 夜體中噴出，所以形成很多 、、、田泡，其W表面積增大，另 ^ ^ 卜所形成之氣泡快速向直管上 部之流出口上浮，不會滯留 “ m U於直官之下部而氣泡間緊貼在 一起4。因此，形成承夕a ,， 夕之冰核，生成衆多更小之冰微 粒。另外，因為直管以從 、 4向上、部内徑逐漸減小之 方式形成，所以所生成之含有 3 ’冰被粒之處理液於直管内良 好地流動而從上部之流出 田口机出，另外因為直管之上端口 之内徑變小，於該流出口 ^ ^ 、 連通連接有配管，所以含有冰 被粒之處理液從流出口漭屮 现出而流入配管内’不會發生滯留 105956.doc 1270642 專情況。 因此，該冰漿之製造裝置能夠製造包含有更多、更微小 之冰微粒之處理液，並將含有該冰微粒之處理液順暢地送 出至配管内。 與請求項3相關之發明之冰漿製造裝置最適合取得與請 求項2相關之發明之上述作用效果。 與請求項4相關之發明之冰漿製造裝置，係製造二氧化 _ 奴/合解並含有冰微粒之處理液。此處，二氧化碳溶解之處 理液中所含之冰微粒較用通常之方法解除過冷卻液體之過 冷卻狀態而生成之冰微粒軟。因此，將二氧化碳溶解並含 有冰微粒之處理液使用於例如基板之洗淨處理等，加壓含 有冰微粒之處理液，使其從噴嘴喷出時，即使根據基板之 表面上之位置，冰微粒碰撞基板之表面時之能量有稍微的 不均，也能夠防止由例如液晶用圖案用金屬膜、例如鋁 (Al)+鉬（Mo)等物理上柔軟的金屬材料所形成之覆膜局部 鲁受損。另外，由於二氧化碳溶解之處理液中所含之冰微粒 較軟，故例如向基板之主面供給冰漿，並用刷子洗淨基板 之主面時，可以進一步加大滾刷之旋轉速度或平面刷之搖 動速度，能夠進一步提高洗淨性能。此外，因為含有冰微 粒之處理液中溶解有二氧化碳，所以處理液之電阻率值較 純水小。因此，二氧化碳溶解並含有冰微粒之處理液流過 配管向喷嘴等輸送時，不易產生靜電，例如向基板之表面 供給時，沒有因靜電而破壞基板上微細圖案或元件 105956.doc -10- 1270642 因此，使用與請求項4相關之發明之冰漿製造裝置，例 如於基板之洗淨處理等，可製造不給與基板上所形成之金 屬膜等覆膜損傷，另外能夠進一步提高洗淨性能，再者亦 不會因靜電而破壞基板上之微細圖案或元件之含有冰微粒 之處理液。Can, use the rolling to release the supercooled L ’ to generate a lot of ice micro-narration. s L }}ϋβ > θ # π , because the supercooling release gas is ejected from the outer pass of the other pass to the M Mi night body, so a lot of, and, The surface area is increased, and the bubble formed by the other is rapidly floated to the outlet of the upper part of the straight pipe, and does not stay "m U in the lower part of the straight body and the bubbles are closely attached together. 4 Therefore, the formation of Cheng Xia a, The ice core of the eve produces a large number of smaller ice particles. In addition, since the straight tube is formed in a manner that gradually decreases from the upper side to the inner diameter of the portion 4, the resulting treatment liquid containing 3' ice is well in the straight tube. The flow of the ground flows out from the upper part of the field, and because the inner diameter of the upper port of the straight pipe becomes smaller, the pipe is connected to the outlet port, and the treatment liquid containing the ice granules is discharged from the outflow port. When it flows out into the piping, there is no stagnation 105956.doc 1270642. Therefore, the manufacturing apparatus of the ice slurry can produce a treatment liquid containing more and smaller ice particles, and the treatment liquid containing the ice particles Send it out smoothly into the piping. The ice slurry manufacturing apparatus according to the invention of claim 3 is most suitable for obtaining the above-described effects of the invention relating to claim 2. The ice slurry manufacturing apparatus of the invention related to claim 4 is for producing a oxidized _ slave/combination solution and containing The treatment liquid for ice particles. Here, the ice particles contained in the treatment liquid for dissolving carbon dioxide are softer than the ice particles generated by the conventional method of releasing the supercooled state of the supercooled liquid. Therefore, carbon dioxide is dissolved and contains ice particles. The treatment liquid is used, for example, for washing treatment of a substrate, and when the treatment liquid containing ice particles is pressurized and ejected from the nozzle, the energy of the ice particles collides with the surface of the substrate slightly depending on the position on the surface of the substrate. In addition, it is also possible to prevent a coating film formed of, for example, a metal film for liquid crystal pattern, for example, a physically soft metal material such as aluminum (Al) + molybdenum (Mo), from being partially damaged. The ice particles contained in the film are relatively soft. Therefore, for example, when the ice slurry is supplied to the main surface of the substrate and the main surface of the substrate is washed with a brush, the rotation speed of the roller brush can be further increased. The washing speed of the flat or flat brush can further improve the washing performance. Further, since the carbon dioxide is dissolved in the treatment liquid containing the ice particles, the resistivity of the treatment liquid is smaller than that of the pure water. Therefore, the carbon dioxide dissolves and contains ice particles. When the processing liquid flows through the pipe to the nozzle or the like, static electricity is less likely to be generated. For example, when the surface is supplied to the surface of the substrate, the fine pattern or the element on the substrate is not destroyed by static electricity. 105956.doc -10- 1270642 Therefore, the use of the item 4 is used. In the ice slurry manufacturing apparatus of the present invention, for example, the substrate can be cleaned without causing damage to a film such as a metal film formed on the substrate, and the cleaning performance can be further improved, and the device can be prevented from being destroyed by static electricity. A fine pattern or a component on the substrate containing a treatment liquid of ice particles.
與請求項5相關之發明之基板處理裝置，係由處理液供 給機構向基板之主面供給由冰漿製造裝置所製造之含有冰 微粒之處理液，藉此例如在基板之洗淨處理中，存在於基 板表面凹料處之微粒等污染㈣被冰微粒私出，污染物 質與處理液-起從基板之主面上流出而被除去。該情況 下利用由與明求項4相關之發明之冰漿製造裝置所製造 之含有冰微粒之處理液時，二氧化碳溶解之處理液中所含 之冰微粒較用通常之方法解除過冷卻液體之過冷卻狀態而 生成之冰微粒軟，因此例如加壓含有冰微粒之處理液使其 從喷嘴喷出時，即使根據基板表面上之位置，冰微粒碰撞 基板之表面時之能量有稍微的不均，也能㈣止由例如液 晶圖案用之金屬膜、例如A1+M。等柔軟金屬材料所形成 之覆膜局部受損。另外，由於二氧化碳溶解之處理液中所 含之冰微粒較軟’故例如向基板之主面供給冰聚並用刷子 洗淨基板之主面時’能夠進一步加大滾刷之旋轉速度或平 面刷之搖動速度，可以進-步提高洗淨性能。此外，因為 含有冰微粒之處理液中溶解右-每„ t ^ ^ T，合解有一虱化碳，所以處理液之電 阻率值較純水小’因此向基板之主面供給之含有冰微粒之 處理液流過配管内向喷嘴輸送時不易產生靜電，向基板之 105956.doc 1270642 表面i、、、’s時，沒有因靜電而破壞基板上之微細圖案或元件 之顧慮。 Μ 因此，將與請求項5相關之發明之基板處理裝置使用於 例如基板之洗淨處理時，能夠良好地除去存在於基板表面 凹部等處之微粒等污染物質。並且1用由與請求項_ 關之發明之冰漿製造裝置所製造之含有冰微粒之處理液 時’不會給與基板上所形成之金屬膜等覆膜損傷，另外能In the substrate processing apparatus according to the invention of claim 5, the processing liquid supply means supplies the processing liquid containing ice particles produced by the ice slurry manufacturing apparatus to the main surface of the substrate, whereby, for example, in the cleaning process of the substrate, The particles present in the concave portion of the substrate surface are contaminated (4) by the ice particles, and the pollutants and the treatment liquid are discharged from the main surface of the substrate to be removed. In this case, when the treatment liquid containing ice particles produced by the ice slurry manufacturing apparatus of the invention related to the invention is used, the ice particles contained in the treatment liquid in which the carbon dioxide is dissolved are released from the supercooled liquid by a usual method. Since the ice particles generated in the supercooled state are soft, for example, when the treatment liquid containing the ice particles is pressurized and ejected from the nozzle, the energy of the ice particles collides with the surface of the substrate slightly unevenly depending on the position on the surface of the substrate. It is also possible to (iv) a metal film such as a liquid crystal pattern, for example, A1+M. The film formed by the soft metal material is partially damaged. In addition, since the ice particles contained in the treatment liquid in which carbon dioxide is dissolved are relatively soft, for example, when ice is supplied to the main surface of the substrate and the main surface of the substrate is washed with a brush, the rotation speed of the roller brush or the flat brush can be further increased. The shaking speed can be used to improve the washing performance. In addition, since the treatment liquid containing ice particles dissolves right-per tw ^ ^ T and dissolves a carbonized carbon, the resistivity of the treatment liquid is smaller than that of pure water, so the ice particles are supplied to the main surface of the substrate. When the processing liquid flows through the pipe to the nozzle, it is less likely to generate static electricity. When the surface of the substrate 105956.doc 1270642 is i, , or 's, there is no concern that the fine pattern or component on the substrate is destroyed by static electricity. In the substrate processing apparatus according to the invention of claim 5, for example, when the substrate is subjected to the cleaning treatment, it is possible to satisfactorily remove contaminants such as particles existing in the concave portion of the substrate surface, and the ice of the invention of the invention. When the treatment liquid containing ice particles produced by the pulp production apparatus does not damage the coating film such as the metal film formed on the substrate,
夠進一步提高洗淨性能，再者也不會因靜電而破壞基板上 之微細圖案或元件。 與請求項6相關之發明之基板處理裝置，係由處理液供 給機構向由基板搬送機構向水平方向搬送之基板主面供結 含有冰微粒之處理液’藉由攪拌構件於基板之主面上攪神 含有冰微粒之處理液，例如於基板之洗淨處理，存在於基 板表面凹部等處之微粒等污染物質被冰微粒^，污染: 質與處理液一起從基板之主面上流出而被除去。如此，因 為藉由於基板之主面上攪拌含有冰微粒之處理液來從基板 上除去污染物質，所以沒有必要利用處理液供給機構來加 昼含有冰微粒之處理液，使其向基板之主面喷出。 因此’利用與請求項6相關之發明之基板處理裝置，能 夠進行均勾之基板處理，不會產生處理不均， 給與基板上所形成之金屬膜等覆膜損傷。 Β 與請求項7相關之發明之基板處理I置，係因為基 送機構支撐為傾斜姿勢搬送，所以由處理液供給機 構U至基板主面之含有冰微粒之處理液—邊沿基板之傾 105956.doc -12- 1270642 斜^下’-邊利用攪拌構件在基板之 之低位置側之端緣自Μ出。 撥拌，從基板 與請求項8相關之發明之基板 微粒之處理液怂晻妙一 係猎由合有冰 板之洗淨處理，存在 、4例如於基 質被冰微教才/部等處之微粒等污染物 除去。"、 與處理液—起從基板之主面上流出而被 與請求項9相關之發明之基板處理裝置 表面凹部等處之料軔笙、…九t Π子隹於基板 基板被淨化 4〜物質從基板之主面上被除去， 下面’參照Β式對本發明之最佳實施方式進行說明。 圖1至圖3表示本發明之實施方式之一例，圖⑽顯 聚製造裝置本體部之縱向切斷狀態之立體圖。圖2係 體部之縱向切斷狀態之局部放大之立體圖。圖3係該切 部之外觀立體圖。 本冰聚製造裝置係-種製造二氧化碳溶解並含有冰微粒 之處理液(以下稱作「冰漿」）之裝置，其本體部1〇形成為 細長圓管狀。即，本體部10包含以内徑從下端部向上端邙 逐漸減小之方式形成之直管12，直管12之下端面，由底壁 部14所堵塞。直管12配設於縱向，最好保持為垂直姿勢: 於該直管12之底壁部14上，以貫穿底壁部14之方式固定有 液體導入管部16，液體導入管部16之前端口插通至直管u 之内部成為液體導入口 18。另外，如圖2所示，於直管a 之裏面设置與底壁部14微小的間隔而形設隔牆部， η 田隔 105956.doc -13 - 1270642 牆部20來分隔直管12之内部’與底壁部i4 t22。於隔牆部2G上形成有成為氣體喷出⑼之 U田孔。纟且’如圖3所示’於底壁部“上配， 二 入：部26,氣體導入管部26連通於氣體導入室η。另夕導 直管12之上端開口’該上端口成為冰漿之流出口以。外The cleaning performance can be further improved, and the fine patterns or components on the substrate are not destroyed by static electricity. In the substrate processing apparatus according to the invention of claim 6, the processing liquid supply means supplies the processing liquid containing the ice particles to the main surface of the substrate conveyed horizontally by the substrate transfer mechanism by the stirring member on the main surface of the substrate. The treatment liquid containing ice particles, for example, is washed on the substrate, and the contaminant such as particles present in the concave portion of the surface of the substrate is contaminated with ice particles. The substance is discharged from the main surface of the substrate together with the treatment liquid. Remove. In this manner, since the contaminated material is removed from the substrate by stirring the treatment liquid containing the ice particles on the main surface of the substrate, it is not necessary to use the treatment liquid supply mechanism to apply the treatment liquid containing the ice particles to the main surface of the substrate. ejection. Therefore, the substrate processing apparatus according to the invention of claim 6 can perform the substrate processing of the uniform hook, and the processing of the metal film formed on the substrate can be damaged without causing uneven processing.基板 The substrate processing I of the invention related to claim 7 is based on the fact that the base feeding mechanism supports the tilting posture, so that the processing liquid supply mechanism U reaches the processing liquid containing the ice particles on the main surface of the substrate - the edge of the substrate is 105956. Doc -12- 1270642 The lower edge of the substrate is pulled out by the agitating member at the lower edge side of the substrate. The mixing process of the substrate particles of the invention related to the substrate of claim 8 is performed by a washing treatment with an ice plate, and the presence of 4, for example, the substrate is immersed in ice. Contaminants such as particles are removed. ", with the processing liquid - from the main surface of the substrate, the surface of the substrate processing device of the invention related to claim 9 is recessed, etc., ... 9 t Π 隹 隹 on the substrate substrate is purified 4~ The substance is removed from the main surface of the substrate, and the preferred embodiment of the present invention will be described below with reference to the formula. Fig. 1 to Fig. 3 show an embodiment of the present invention, and Fig. 10 shows a perspective view showing a longitudinal cut state of the main body of the manufacturing apparatus. Fig. 2 is a partially enlarged perspective view showing the longitudinal cut state of the body. Fig. 3 is a perspective view showing the appearance of the cut portion. The ice flocculation apparatus is a device for producing a treatment liquid (hereinafter referred to as "ice slurry") in which carbon dioxide is dissolved and contains ice particles, and the main body portion 1 is formed into an elongated circular tube shape. That is, the body portion 10 includes a straight tube 12 formed such that its inner diameter gradually decreases from the lower end portion to the upper end portion, and the lower end surface of the straight tube 12 is blocked by the bottom wall portion 14. The straight pipe 12 is disposed in the longitudinal direction, and is preferably maintained in a vertical posture. The liquid introduction pipe portion 16 and the liquid introduction pipe portion 16 are fixed to the bottom wall portion 14 of the straight pipe 12 so as to penetrate the bottom wall portion 14. The inside of the straight pipe u is inserted into the liquid introduction port 18. Further, as shown in Fig. 2, a partition wall portion is formed in a space slightly apart from the bottom wall portion 14 in the inside of the straight pipe a, and the wall portion 20 partitions the inside of the straight pipe 12 from the wall portion 20956.doc -13 - 1270642 'With the bottom wall i4 t22. An U-hole which is a gas discharge (9) is formed in the partition wall portion 2G. Further, 'as shown in Fig. 3' is disposed on the bottom wall portion, the second inlet portion 26, and the gas introduction tube portion 26 communicates with the gas introduction chamber η. On the other hand, the upper end of the straight tube 12 is open, and the upper port becomes ice. Slurry flow outlet
於本體部1〇之液體導入管部16上，如圖4顯示冰激製造 、置之方塊結構圖，連接有過冷卻水供給用之液體供給管 3"〇。另外’於氣體導人管部26上連接流路連接於氣瓶等二 乳化碳供給源之氣體供給管32。液體供給管3q流路連接於 熱父換器34,通過熱交換器34之内部流路，與流路連接於 純水供給源之純水供給管36連通。另外，於熱交換器^上 並設有冷卻機（冷卻裝置）38,於熱交換器34之内部通路與 冷部機38之間，不凍液(冷媒)通過循環用配管4〇、42而被 循被。並且’通過純水供給管36供給之純水由冷卻機繼 由熱交換器34冷卻至冰點以下之溫度，成為過冷卻水該 過冷卻水通過液體供給管3 〇供給至本體部丨〇之液體導入管 部16。另外，於冰漿製造裝置之本體部1〇之流出口以連接 有冰漿輸液用之配管44，通過該配管44，向下述基板洗淨 裝置46供給冰漿。 具有如圖1至3所示結構之冰漿製造裝置之本體部丨〇，通 過液體導入管部16、液體導入口 18向直管12内導入過冷卻、 水’另外通過氣體導入管部26向氣體導入室22内導入二氧 化碳，從氣體導入室22内通過隔牆部2〇之多數氣體喷出口 24’向直管12内之過冷卻水中喷出二氧化碳。並且，過冷 105956.doc -14- ^270642 :水與二氧化碳之氣泡從直管i2之下部 上昇。兮夯 上#之流出口 28 5亥軋泡上幵過程中，由氣泡引起之 水，由該振動來解除> 、動a與過冷卻 上昇…ί! 冷卻狀態，另外在氣泡 $ ，利用由氣泡崩開所產生之能量來解除 水之過冷卻狀態。藉此 謂除過冷部 因為過冷卻水坐/成冰微粒。此時， 流路，從下^；· 起通過直管12内之細長 直：12 :向小口徑之流出口28上昇，所以在直至到達 直& 12之流出口 28之期間，能夠有效地 冷卻狀態’生成衆多之冰微粒。另外：=:In the liquid introduction pipe portion 16 of the main body portion 1 as shown in Fig. 4, a block diagram of the ice generation and the block structure is shown, and a liquid supply pipe 3" for supplying the supercooled water is connected. Further, the gas supply pipe portion 26 is connected to a gas supply pipe 32 to which a flow path is connected to a secondary emulsified carbon supply source such as a gas cylinder. The liquid supply pipe 3q is connected to the hot parent exchanger 34, and communicates with the pure water supply pipe 36 whose flow path is connected to the pure water supply source through the internal flow path of the heat exchanger 34. Further, a cooler (cooling device) 38 is provided on the heat exchanger, and between the internal passage of the heat exchanger 34 and the cold unit 38, the antifreeze (refrigerant) is passed through the piping 4, 42 for circulation. Be. Further, the pure water supplied through the pure water supply pipe 36 is cooled by the cooler from the heat exchanger 34 to a temperature lower than the freezing point, and becomes supercooled water. The supercooled water is supplied to the liquid of the main body portion through the liquid supply pipe 3 The tube portion 16 is introduced. In addition, a pipe 44 for slurry infusion is connected to the outlet of the main body 1 of the ice-making apparatus, and the slurry 44 is supplied to the substrate cleaning apparatus 46 to supply the ice slurry. The main body portion of the ice slurry manufacturing apparatus having the structure shown in FIGS. 1 to 3 is introduced into the straight pipe 12 through the liquid introduction pipe portion 16 and the liquid introduction port 18, and the water is additionally passed through the gas introduction pipe portion 26. Carbon dioxide is introduced into the gas introduction chamber 22, and carbon dioxide is discharged from the gas introduction chamber 22 through the plurality of gas discharge ports 24' of the partition wall portion 2 to the supercooled water in the straight tube 12. Also, too cold 105956.doc -14- ^270642 : The bubbles of water and carbon dioxide rise from the lower part of the straight tube i2.兮夯上#流流出口28 5 亥 轧 泡 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 The energy generated by the collapse of the bubble releases the supercooled state of the water. This means that the cold part is removed because of the cooling water sitting/icing particles. At this time, the flow path passes from the lower portion; through the straight straight tube 12: 12: rises to the small-diameter flow outlet 28, so that it can be effectively continued until the flow outlet 28 of the straight & The cooling state 'generates a large number of ice particles. Also:=:
::部:之多數貫通細孔所形成之氣體喷出二SC 水中贺出，所以形成衆多細泡’ 1她 /、、、，心表面積增大，且所形 成之氣泡快速向上部之流出口 2 丄/于 不會滯留於直管！ 2 之下部而氣泡間緊貼在一起箅。 妨^入 &寺因此，可形成更多之冰 核，製造含有更多更微小冰微粒之冰漿。 另外，直管12因為以從下端部向上端部内握逐漸減小之 方式形成，所以生成之合古、士他^ ^ _ 有冰彳政粒之冰漿於直管1 2内良好 地流動。此外’因為直管12之流出口28之内握變小，於該 流出口28上連接有轉輸液用配f44,所幻㈣從直管^ 内通過流出口 28流出，流入配營4 、 ^ 机入配& 44内，不會發生滯留等情 況。另外’因為二氧化碳噴至低溫之過冷卻水中，所以二 氧化碳之溶解量增多’能夠得到較多之二氧化碳溶解之冰 裝。該二氧化碳榕解之冰漿中所含之冰微粒較用通常之方 法解除過冷卻水之過冷卻狀態而生成之冰微粒軟。另外， 由於冰蒙中溶解有二氡化碳，冰漿之電阻率值較小。 105956.doc -15· 1270642 ，再者上述實施方式中，就使二氧化碳喷入過冷卻水中 I化冰聚之裝置進行了說明，但亦可以使二氧化碳以外之 氣體，例如氮氣等惰性氣體或空氣等喷人純水以外之過冷 卻液體中，解除過冷卻液體之過冷卻狀態來製造冰漿。另7 外二本體部之形狀’亦可不是上述實施方式中所示之細長 圓管狀，而是例如圓筒狀等。::Part: Most of the gas formed through the pores is ejected from the two SC waters, so a large number of fine bubbles are formed, and the surface area of the heart is increased, and the bubble formed is quickly discharged to the upper part. 2 丄 / will not stay in the straight tube! 2 The lower part and the bubbles are close together. Therefore, the & Temple can form more ice cores and make ice slurries containing more tiny ice particles. Further, since the straight pipe 12 is formed in such a manner that the inner grip is gradually reduced from the lower end portion to the upper end portion, the ice slurry generated by the Kochi, Shita ^ ^ _ ice granules flows well in the straight pipe 12 . In addition, because the inner grip of the straight pipe 12 is smaller, the transfer port 28 is connected with a transfer fluid f44, and the magic (4) flows out from the straight pipe through the outflow port 28, and flows into the camp 4, ^ In the machine and in 44, there will be no detention. In addition, since carbon dioxide is sprayed into the supercooled water at a low temperature, the amount of dissolved carbon dioxide is increased, and it is possible to obtain a large amount of carbon dioxide dissolved ice. The ice particles contained in the carbon dioxide-decomposed ice slurry are softer than the ice particles generated by the conventional method of releasing the supercooled state of the supercooled water. In addition, since the dilute carbon is dissolved in the ice, the resistivity of the ice is small. 105956.doc -15· 1270642. In the above embodiment, the apparatus for injecting carbon dioxide into the subcooled water to form an ice flotation has been described. However, a gas other than carbon dioxide, such as an inert gas such as nitrogen or air, may be used. In the supercooled liquid other than the pure water, the supercooled liquid is released from the supercooled state to produce the ice slurry. The shape of the other two outer body portions 'may not be the elongated tubular shape shown in the above embodiment, but may be, for example, a cylindrical shape or the like.
其次，圖5至圖7表示使用由上述冰漿製造裝置所製造之 冰漿進行基板之處理’本例為基板洗淨之基板洗淨裝置^ 之結構之一例，圖5係顯示基板洗淨裝置46之要部之概略 立體圖，圖6係其前視圖，圖7係其側視圖。 該基板洗淨裝置46’其構成包含：輥式輸送機，其係包 3相互平订並設之複數搬送滾輪輥48，且將基板w支撐為 傾斜姿勢’於與其傾斜方向正交之方向上，向水平方向搬 送基板W(圖5及圖7中省略圖示）；噴嘴5〇,其向由該報式 輸送機所搬送之基板貨之主面上，供給二氧化碳溶解之冰 漿；及平面刷52，其於基板|之主面上攪拌冰漿。喷嘴5〇 具有與基板W之與其搬送方向正交之寬度方向《尺寸大致 同等長度，於基板W之正上方位置配設成與基板搬送方向 交叉且沿著基板W之傾斜。喷嘴50之下端面，於其縱方向 上形設有狹縫狀流出π，冰漿在幾乎未被加壓狀態下，從 該狹缝狀流出口流出。該噴嘴5〇上連接有配管Μ，以便與 形成於其内部之流路連it。噴嘴5G通過該配管㈣路連接 置於基板搬送方向之前 於上述冰漿製造裝置之本體部1〇。 平面刷5 2裝設於較噴嘴5 〇設置位 105956.doc -16- 1270642 方側且噴嘴50之附近，其下面平面狀地植設有馬海毛、尼 龍等刷毛54。該平面刷52具有與基板W之寬度方向之尺寸 大致同等長度，於基板貿之正上方位置配設成與基板搬送 方向父又且沿著基板W之傾斜。另外，雖然省略了圖示， 但平面刷52以刷毛54之前端接觸或接近基板w之主面之方 式為支撐移動機構所支撐，藉由該支撐移動機構遍及基板 〜之全寬沿長度方向往復移動。 φ 於具有上述結構之基板洗淨裝置46，其中從冰漿製造裝 置之本體部10通過配管44輸送給喷嘴5〇之冰漿不被特別加 壓，而從噴嘴50之狹縫狀流出口流出，供給由輥式输送機 、傾斜文勢向水平方向搬送之基板W之主面。向基板W之 主面上供給之冰漿一邊沿基板w之傾斜流下，一邊於基板 w之主面上被朝與基板搬送方向交叉之方向往復移動之平 面刷52所攪拌，從基板w之低位置側之端、緣自然流出。此 時，冰漿於基板W之主面上被平面刷52所攪拌，藉此存在 籲於基板W之表面凹部等處之微粒等污染物質被冰漿中之冰 微粒=出，污染物質與冰漿及其融解水一起從基板w之主 面上•出而破除去。另夕卜，因為冰漿中溶解有二氧化碳， 所以冰漿中之冰微粒較軟，因此能夠進-步加大平面刷52 ^搖動速，（取代平面刷52，利用滾刷時為旋轉速度），可 以進步提高利用平面刷52之洗淨性能。此外，因為冰聚 I:解有二氧化碳，所以冰漿之電阻率值較小。因此，冰 H過配管44内向噴嘴5()輸送時不易產生靜電，冰裝向基 板w之主面供給時，沒有因靜電而破壞基板w上之微細圖 105956.doc 1270642 案或元件之顧慮。並且，由於冰聚為低溫，故二氧化碳可 維持在液體中長期溶存之狀熊。 再者，於該基板洗淨裝置46，如上所述不加壓冰衆而從 喷嘴50向基板W之主面供給，但亦可以加壓冰衆而從喷嘴 50向基板W之主面噴出。由於冰激中溶解有二氧化碳，故 冰浆中之冰微粒較軟，沒有因向基板〜之主面上喷出之冰 漿中之冰微粒而例如液晶圖案用金屬膜，例如由Al+Mo 鲁等軟金屬材料所形成之覆膜局部受損之顧慮。 上述實施方式中，噴嘴5G配設成與基板搬送方向交叉且 沿著基板W之傾斜，但其亦可沿著基板搬送方向配設於傾 斜基板之高位置側之端緣部之正上方位置。另外，上述實 施方式巾，-ϋ支撐基板㈣傾斜姿勢向水平方向搬送， -邊從喷嘴50向基板|之主面供給冰漿，利用平面刷如 基板W之主面上攪拌冰製，但當基板w之尺寸沒有那麼大 時，亦可以-邊支擇基板％為纟平姿勢向纟平方向搬送， # -邊從喷嘴50向基板W之主面供給冰漿，用平面刷52授掉 冰漿，之後使基板W傾斜，進行水洗處理。此外，在上述 實施方式中，係利用平面刷52在基板…之主面上攪拌冰 漿’但亦可取代平面刷52，利用滾刷等。 圖8表示利用由上述冰漿製造裝置所製造之冰漿，進行 基板洗淨之基板洗淨裝置之其他結構例，係顯示基板旋= -式洗淨裝置（旋轉擦洗機）之要部結構之概略前視圖。該基 一板旋轉式洗淨裝置56具有保持基板w為水平姿勢之旋轉失 頭58。旋轉夾頭58由旋轉支軸60所在垂直軸周圍旋轉自2 105956.doc -18- 1270642 地支#，由連結於旋轉支軸60上之馬達（未圖示）所在垂直 轴周圍旋轉。雖然省略圖示，但在由旋轉夾頭58所保持之 基板W之周圍，以圍繞著基板W之方式配設有用於收集從 基板W上向周圍飛散之冰漿之杯子。另外，在由旋轉夾頭 58所保持之基板w之上方配設有向基板…之表面噴出二氧 化碳溶解之冰漿之喷出喷嘴62。喷出喷嘴62上連接有冰漿Next, FIG. 5 to FIG. 7 show an example of the structure of the substrate cleaning apparatus using the ice slurry manufactured by the above-described ice slurry manufacturing apparatus, and the substrate cleaning apparatus which is the substrate cleaning method, and FIG. 5 shows the substrate cleaning apparatus. A schematic perspective view of the main part of Fig. 46, Fig. 6 is a front view thereof, and Fig. 7 is a side view thereof. The substrate cleaning device 46' is configured to include a roller conveyor that is affixed to each other and that is provided with a plurality of conveying roller rollers 48, and supports the substrate w in an inclined posture in a direction orthogonal to the oblique direction thereof. The substrate W is conveyed in the horizontal direction (not shown in FIGS. 5 and 7); the nozzle 5 is supplied with carbon dioxide dissolved in the main surface of the substrate conveyed by the newspaper conveyor; and a plane A brush 52 is used to stir the ice slurry on the main surface of the substrate. The nozzle 5 has a width direction which is substantially the same as the width direction of the substrate W, and is disposed at a position immediately above the substrate W so as to intersect the substrate transport direction and to be inclined along the substrate W. The lower end surface of the nozzle 50 is formed with a slit-like flow π in the longitudinal direction thereof, and the ice slurry flows out from the slit-like flow outlet in an almost unpressurized state. A pipe Μ is connected to the nozzle 5 to connect it to a flow path formed inside the nozzle. The nozzle 5G is connected to the main body portion of the ice making apparatus before being placed in the substrate conveying direction by the pipe (four). The flat brush 5 2 is installed on the square side of the nozzle 5 〇 setting position 105956.doc -16-1268042 and in the vicinity of the nozzle 50, and the bristles 54 such as mohair and nylon are planarly placed on the lower surface. The flat brush 52 has substantially the same length as the dimension of the substrate W in the width direction, and is disposed at a position directly above the substrate trade so as to be inclined with respect to the substrate transfer direction and along the substrate W. In addition, although the illustration is omitted, the planar brush 52 is supported by the support moving mechanism such that the front end of the bristles 54 contacts or approaches the main surface of the substrate w, and the support moving mechanism reciprocates along the length direction of the full width of the substrate 〜 mobile. φ is the substrate cleaning apparatus 46 having the above configuration, wherein the ice slurry which is supplied from the main body portion 10 of the ice slurry manufacturing apparatus to the nozzle 5 through the pipe 44 is not particularly pressurized, but flows out from the slit-like outlet of the nozzle 50. The main surface of the substrate W conveyed by the roller conveyor and the inclined body in the horizontal direction is supplied. The ice slurry supplied to the main surface of the substrate W is slanted along the substrate w, and is agitated by the planar brush 52 that reciprocates in the direction intersecting the substrate transport direction on the main surface of the substrate w, and is low from the substrate w. The end of the position side and the edge naturally flow out. At this time, the ice slurry is agitated by the flat brush 52 on the main surface of the substrate W, whereby there is a particulate matter such as particles on the surface concave portion of the substrate W, and the ice particles in the ice slurry are discharged, and the pollutants and the ice are present. The slurry and its melted water are removed together from the main surface of the substrate w. In addition, since carbon dioxide is dissolved in the ice slurry, the ice particles in the ice slurry are soft, so that the plane brush 52 can be further increased in speed (instead of the flat brush 52, the rotation speed when using the roller brush) The cleaning performance of the flat brush 52 can be improved. In addition, since the ice gathers I: carbon dioxide is dissolved, the resistivity of the ice slurry is small. Therefore, when the ice H-over pipe 44 is conveyed to the nozzle 5 (), static electricity is less likely to be generated, and when the ice is supplied to the main surface of the substrate w, there is no concern that the micro-pattern 105956.doc 1270642 or the component on the substrate w is broken by static electricity. Moreover, since ice accumulates at a low temperature, carbon dioxide can maintain a long-term dissolved bear in a liquid. Further, the substrate cleaning device 46 is supplied from the nozzle 50 to the main surface of the substrate W without pressing the ice, as described above, but may be pressed from the nozzle 50 to the main surface of the substrate W by pressing the ice. Since the carbon dioxide is dissolved in the ice shock, the ice particles in the ice slurry are soft, and there is no ice particle in the ice slurry sprayed onto the main surface of the substrate, for example, a metal film for a liquid crystal pattern, for example, by Al+Mo Lu The concern that the film formed by the soft metal material is partially damaged. In the above-described embodiment, the nozzle 5G is disposed so as to be inclined along the substrate W and inclined along the substrate W. However, the nozzle 5G may be disposed directly above the edge portion of the high position side of the tilting substrate along the substrate transport direction. Further, in the above-described embodiment, the cymbal support substrate (four) is conveyed in the horizontal direction in an inclined posture, and the ice slurry is supplied from the nozzle 50 to the main surface of the substrate|seat, and the flat surface is used to stir the ice on the main surface of the substrate W, but when When the size of the substrate w is not so large, the substrate can be transported in the flat direction in the direction of the flattening, and the ice cream can be supplied from the nozzle 50 to the main surface of the substrate W, and the ice can be imparted by the flat brush 52. After the slurry, the substrate W is tilted and subjected to a water washing treatment. Further, in the above embodiment, the flat blade 52 is used to stir the slurry on the main surface of the substrate. However, instead of the flat brush 52, a roller brush or the like may be used. Fig. 8 is a view showing another configuration example of a substrate cleaning apparatus for cleaning a substrate by using the ice slurry manufactured by the above-described ice slurry manufacturing apparatus, and showing the structure of the main part of the substrate spinning apparatus (rotary scrubbing machine). Rough front view. The base-plate rotary cleaning device 56 has a rotation loss 58 that holds the substrate w in a horizontal posture. The rotary chuck 58 is rotated from the vertical axis of the rotary fulcrum 60 from 2 105956.doc -18 - 1270642, and is rotated about the vertical axis of the motor (not shown) coupled to the rotary fulcrum 60. Although not shown in the drawings, a cup for collecting the ice slurry scattered from the substrate W to the periphery is disposed around the substrate W around the substrate W held by the rotary chuck 58. Further, above the substrate w held by the rotary chuck 58, a discharge nozzle 62 for discharging the ice slurry dissolved in carbon dioxide to the surface of the substrate is disposed. The spray nozzle 62 is connected with ice slurry
輸液用之配管44，喷出喷嘴62通過該配管44流路連接於上 述冰漿製造裝置之本體部10。 於團8所示之裝置 羊L "1G恢洛解之冰漿被加！，彳疋嘴 出喷嘴62向由旋轉μ 58所保持並旋轉之基板w表面嘴 出藉此，存在於基板W表面凹部等處之微粒等污染物質 被冰微粒扒出’與冰漿一起從基板W之表面上流出而被除 去，。此時，因為從噴出噴嘴62向基板w之表面喷出之冰裝 中办解有一氧化奴’所以冰漿中之冰微粒比用通常之方法 解除過冷部水之過冷卻狀態而生成之冰微粒較軟。因此， 即使基板之表面上，從噴出喷嘴62噴出之冰聚中之冰微粒 碰撞基板胃之表面時之能量有稿微的不均，也能夠防止於 土板W之表面上形成之圖案狀金屬膜等局部受損。另外， 由於該冰漀中溶解有二氧化碳，故電阻率值較小。因此， 冰聚流過配管44内輸送仏喰山 别k、、Ό，出贺嘴62之過程中不易產生靜 電’能夠防止從噴出噴嘴62向基板w之主面供給冰漿時， 因靜電而破壞基板w之微細圖案或元件。 再者，上述各實施方十士 ,,, 式中’對洗淨基板之基板洗淨裝置 進行了說明，但本發明也能夠適用於進行洗淨以外之基板 105956.doc 1270642 處理之基板處理裝置 【圖式簡單說明】 圖1表示本發明實施方式之一例，係顯示冰 之本體部縱向切斷狀態之立體圖。圖3係兮本^造裝置 立體圖。 Μ本體部之外觀 圖2係圖1所示之冰漿製造 局部放大之立體圖。 本體錢向切斷狀態之 圖3係圖1所示之冰漿製造 m ^ — 置之本體邛之外觀立體圖。 圖4係圖1所示之冰漿製 方塊結構圖。 圖5係表示利用由圖i至圖4 夕啼將^ 所不之冰漿製造裝置所製造 之冰水進行基板洗淨之裝置 翁之一例之圖，係顯示基板 洗淨破置要部之概略立體圖。 圖6係圖5所示之基板洗淨裝置之要部前視圖。 圖7係圖5所示之基板洗淨裝置之要部側視圖。 J8表示利用由圖1至圖4所示之冰裝製造裝置所製造之 2進行基板之洗淨之裝置之其他結構例，係顯示基板旋 轉式洗淨裝置之要部結構之概略前視圖。 【主要元件符號說明】 10 冰漿製造裝置之本體部 12 直管 14 底壁部 16 液體導入管部 18 液體導入口 20 隔牆部 105956.doc -20. 1270642The pipe for infusion 44 and the discharge nozzle 62 are connected to the main body portion 10 of the above-described ice slurry manufacturing apparatus through the pipe 44. The device shown in the group 8 sheep L " 1G recovery Luozhi ice slurry is added! The nozzle-out nozzle 62 is discharged to the surface of the substrate w held by the rotation μ 58 and rotated, and the contaminant such as particles present in the concave portion or the like on the surface of the substrate W is ejected by the ice particles' together with the ice slurry from the substrate. The surface of W is discharged and removed. At this time, since the ice is discharged from the discharge nozzle 62 to the surface of the substrate w, the ice particles in the ice slurry are cooled by the conventional method of releasing the supercooled state of the cold water. The particles are soft. Therefore, even if the ice particles in the ice collected from the ejection nozzle 62 collide with the surface of the substrate stomach on the surface of the substrate, the energy of the sheet is uneven, and the pattern metal formed on the surface of the soil sheet W can be prevented. The membrane is partially damaged. In addition, since carbon dioxide is dissolved in the hail, the resistivity value is small. Therefore, the ice gathers through the pipe 44 to transport the 仏喰山别k, Ό, and the static electricity is not generated during the process of the mouthpiece 62. It can prevent the static electricity from being destroyed when the ice slurry is supplied from the discharge nozzle 62 to the main surface of the substrate w. A fine pattern or element of the substrate w. Further, in the above-described embodiments, the substrate cleaning apparatus for cleaning the substrate has been described. However, the present invention is also applicable to a substrate processing apparatus which performs processing of the substrate 105956.doc 1270642 other than the cleaning. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an embodiment of the present invention, showing a longitudinally cut state of a body portion of ice. Fig. 3 is a perspective view of the apparatus.外观 Appearance of the body portion Fig. 2 is a partially enlarged perspective view showing the manufacture of the ice slurry shown in Fig. 1. Fig. 3 is a perspective view showing the appearance of the body of the ice slurry shown in Fig. 1. Fig. 4 is a block diagram showing the structure of the ice slurry shown in Fig. 1. Fig. 5 is a view showing an example of a device for cleaning a substrate by using ice water produced by the ice slurry manufacturing apparatus of the present invention, which is a schematic view of the substrate cleaning and breaking portion. Stereo picture. Figure 6 is a front elevational view of the main part of the substrate cleaning apparatus shown in Figure 5. Fig. 7 is a side elevational view of the main part of the substrate cleaning apparatus shown in Fig. 5. J8 shows another configuration example of the apparatus for cleaning the substrate by the apparatus manufactured by the ice-making apparatus shown in Figs. 1 to 4, and is a schematic front view showing the configuration of the main part of the substrate rotary cleaning apparatus. [Description of main component symbols] 10 Main body of the ice-making apparatus 12 Straight pipe 14 Bottom wall section 16 Liquid introduction pipe section 18 Liquid introduction port 20 Partition wall section 105956.doc -20. 1270642
22 氣體導入室 24 氣體喷出口 26 氣體導入管部 28 冰漿之流出口 30 過冷卻水供給用液體供給管 32 氣體供給管 34 熱交換器 36 純水供給管 38 冷卻機 40, 42 循環用配管 44 冰聚輸液用配管 46 基板洗淨裝置 48 輸送滾輪輕 50 喷嘴 52 平面刷 56 基板旋轉式洗淨裝置 58 旋轉夾頭 60 旋轉支軸 62 喷出喷嘴 W 基板 105956.doc -21 -22 gas introduction chamber 24 gas discharge port 26 gas introduction pipe portion 28 ice slurry outlet port 30 subcooling water supply liquid supply pipe 32 gas supply pipe 34 heat exchanger 36 pure water supply pipe 38 cooling machine 40, 42 circulation piping 44 Ice-fusion infusion pipe 46 Substrate cleaning device 48 Transport roller light 50 Nozzle 52 Flat brush 56 Substrate rotary cleaning device 58 Rotating chuck 60 Rotary support shaft 62 Spray nozzle W Substrate 105956.doc -21 -
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005020801A JP4476826B2 (en) | 2005-01-28 | 2005-01-28 | Ice slurry manufacturing apparatus and substrate processing apparatus |
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| Publication Number | Publication Date |
|---|---|
| TW200632263A TW200632263A (en) | 2006-09-16 |
| TWI270642B true TWI270642B (en) | 2007-01-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW094139730A TWI270642B (en) | 2005-01-28 | 2005-11-11 | Ice slurry manufacturing apparatus and substrate processing apparatus |
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| JP (1) | JP4476826B2 (en) |
| KR (1) | KR100736508B1 (en) |
| CN (1) | CN100400984C (en) |
| TW (1) | TWI270642B (en) |
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| CN102072605B (en) * | 2010-12-15 | 2012-11-21 | 浙江海洋学院 | Jet binary ice generator |
| CN102092470A (en) * | 2010-12-15 | 2011-06-15 | 浙江海洋学院 | Binary ice cold accumulation ship |
| CN103187340B (en) * | 2011-12-28 | 2016-08-03 | 斯克林集团公司 | Substrate board treatment and substrate processing method using same |
| JP5692167B2 (en) * | 2012-06-05 | 2015-04-01 | 株式会社デンソー | Method and apparatus for cleaning and removing contaminants from workpieces |
| CN106152340A (en) * | 2015-04-28 | 2016-11-23 | 深圳市绿旭节能有限公司 | Closed type supercooling release device |
| KR101886112B1 (en) * | 2017-11-17 | 2018-08-07 | 주식회사 대일 | Sea water sherbet ice manufacturing apparatus having a function of preventing and removing scraper sticking using refrigerator load reduction by way of load sensing |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP3569351B2 (en) * | 1995-06-15 | 2004-09-22 | 独立行政法人産業技術総合研究所 | Method for producing low-temperature fine particles and equipment used therefor |
| JPH1116978A (en) * | 1997-06-19 | 1999-01-22 | Dainippon Screen Mfg Co Ltd | Substrate treatment equipment |
| US6220935B1 (en) * | 1997-08-11 | 2001-04-24 | Sprout Co., Ltd. | Apparatus and method for cleaning substrate |
| JP2003033733A (en) * | 2001-07-23 | 2003-02-04 | Taiyo Toyo Sanso Co Ltd | Substrate cleaning system |
| JP4330830B2 (en) * | 2001-09-28 | 2009-09-16 | 高砂熱学工業株式会社 | Ice making equipment |
| US7384484B2 (en) * | 2002-11-18 | 2008-06-10 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing method, substrate processing apparatus and substrate processing system |
-
2005
- 2005-01-28 JP JP2005020801A patent/JP4476826B2/en not_active Expired - Fee Related
- 2005-11-11 TW TW094139730A patent/TWI270642B/en not_active IP Right Cessation
- 2005-11-23 CN CNB2005101248823A patent/CN100400984C/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| TW200632263A (en) | 2006-09-16 |
| JP4476826B2 (en) | 2010-06-09 |
| KR20060087393A (en) | 2006-08-02 |
| JP2006205065A (en) | 2006-08-10 |
| CN100400984C (en) | 2008-07-09 |
| KR100736508B1 (en) | 2007-07-06 |
| CN1811307A (en) | 2006-08-02 |
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