TW200632263A - Ice slurry manufacturing apparatus and substrate processing apparatus - Google Patents

Ice slurry manufacturing apparatus and substrate processing apparatus

Info

Publication number
TW200632263A
TW200632263A TW094139730A TW94139730A TW200632263A TW 200632263 A TW200632263 A TW 200632263A TW 094139730 A TW094139730 A TW 094139730A TW 94139730 A TW94139730 A TW 94139730A TW 200632263 A TW200632263 A TW 200632263A
Authority
TW
Taiwan
Prior art keywords
ice slurry
substrate processing
outlet
slurry manufacturing
processing apparatus
Prior art date
Application number
TW094139730A
Other languages
Chinese (zh)
Other versions
TWI270642B (en
Inventor
Satoshi Yamamoto
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200632263A publication Critical patent/TW200632263A/en
Application granted granted Critical
Publication of TWI270642B publication Critical patent/TWI270642B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

This invention provides an apparatus to fabricate ice slurry from supercooled fluid without the demurral of contamination and re-melt of ice particles. The apparatus comprises a main body 10, a fluid inlet 18 and a gas outlet 24 at the bottom, an outlet of ice slurry 28 on the top. Gas from outlet 24 is mixed with supercooled fluid from inlet 18 in the main body 10 to relieve supercooled fluid from supercooled status. Ice slurry is resulted inside the main body 10 and flow out through the outlet 28.
TW094139730A 2005-01-28 2005-11-11 Ice slurry manufacturing apparatus and substrate processing apparatus TWI270642B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005020801A JP4476826B2 (en) 2005-01-28 2005-01-28 Ice slurry manufacturing apparatus and substrate processing apparatus

Publications (2)

Publication Number Publication Date
TW200632263A true TW200632263A (en) 2006-09-16
TWI270642B TWI270642B (en) 2007-01-11

Family

ID=36844362

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094139730A TWI270642B (en) 2005-01-28 2005-11-11 Ice slurry manufacturing apparatus and substrate processing apparatus

Country Status (4)

Country Link
JP (1) JP4476826B2 (en)
KR (1) KR100736508B1 (en)
CN (1) CN100400984C (en)
TW (1) TWI270642B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102092470A (en) * 2010-12-15 2011-06-15 浙江海洋学院 Binary ice cold accumulation ship
CN102072605B (en) * 2010-12-15 2012-11-21 浙江海洋学院 Jet binary ice generator
CN103187340B (en) * 2011-12-28 2016-08-03 斯克林集团公司 Substrate board treatment and substrate processing method using same
JP5692167B2 (en) * 2012-06-05 2015-04-01 株式会社デンソー Method and apparatus for cleaning and removing contaminants from workpieces
CN106152340A (en) * 2015-04-28 2016-11-23 深圳市绿旭节能有限公司 Closed type supercooling release device
KR101886112B1 (en) * 2017-11-17 2018-08-07 주식회사 대일 Sea water sherbet ice manufacturing apparatus having a function of preventing and removing scraper sticking using refrigerator load reduction by way of load sensing

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3569351B2 (en) * 1995-06-15 2004-09-22 独立行政法人産業技術総合研究所 Method for producing low-temperature fine particles and equipment used therefor
JPH1116978A (en) * 1997-06-19 1999-01-22 Dainippon Screen Mfg Co Ltd Substrate treatment equipment
US6220935B1 (en) * 1997-08-11 2001-04-24 Sprout Co., Ltd. Apparatus and method for cleaning substrate
JP2003033733A (en) * 2001-07-23 2003-02-04 Taiyo Toyo Sanso Co Ltd Substrate cleaning system
JP4330830B2 (en) * 2001-09-28 2009-09-16 高砂熱学工業株式会社 Ice making equipment
US7384484B2 (en) * 2002-11-18 2008-06-10 Dainippon Screen Mfg. Co., Ltd. Substrate processing method, substrate processing apparatus and substrate processing system

Also Published As

Publication number Publication date
KR100736508B1 (en) 2007-07-06
CN100400984C (en) 2008-07-09
TWI270642B (en) 2007-01-11
JP4476826B2 (en) 2010-06-09
JP2006205065A (en) 2006-08-10
CN1811307A (en) 2006-08-02
KR20060087393A (en) 2006-08-02

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees