TWI263648B - Organic polymer for anti-reflective coating layer and preparation thereof - Google Patents
Organic polymer for anti-reflective coating layer and preparation thereofInfo
- Publication number
- TWI263648B TWI263648B TW089127533A TW89127533A TWI263648B TW I263648 B TWI263648 B TW I263648B TW 089127533 A TW089127533 A TW 089127533A TW 89127533 A TW89127533 A TW 89127533A TW I263648 B TWI263648 B TW I263648B
- Authority
- TW
- Taiwan
- Prior art keywords
- present
- polymer
- arc
- same
- light
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/017—Esters of hydroxy compounds having the esterified hydroxy group bound to a carbon atom of a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
- C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
- C07C69/54—Acrylic acid esters; Methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
- C07C2603/24—Anthracenes; Hydrogenated anthracenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1818—C13or longer chain (meth)acrylate, e.g. stearyl (meth)acrylate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990065675A KR100549574B1 (ko) | 1999-12-30 | 1999-12-30 | 유기 반사 방지막용 중합체 및 그의 제조방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWI263648B true TWI263648B (en) | 2006-10-11 |
Family
ID=19632858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW089127533A TWI263648B (en) | 1999-12-30 | 2000-12-21 | Organic polymer for anti-reflective coating layer and preparation thereof |
Country Status (7)
Country | Link |
---|---|
US (2) | US20010043992A1 (zh) |
JP (1) | JP4463417B2 (zh) |
KR (1) | KR100549574B1 (zh) |
CN (1) | CN1266237C (zh) |
FR (2) | FR2803293B1 (zh) |
GB (1) | GB2358018A (zh) |
TW (1) | TWI263648B (zh) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4840554B2 (ja) * | 2001-09-13 | 2011-12-21 | 日産化学工業株式会社 | 反射防止膜の表面エネルギーの調整方法 |
KR20030059970A (ko) * | 2002-01-04 | 2003-07-12 | 주식회사 몰커스 | 패턴 무너짐 현상을 극복하기 위한 유기 난반사 방지막조성물 및 이를 이용한 패턴 형성방법 |
US7070914B2 (en) * | 2002-01-09 | 2006-07-04 | Az Electronic Materials Usa Corp. | Process for producing an image using a first minimum bottom antireflective coating composition |
US7265431B2 (en) * | 2002-05-17 | 2007-09-04 | Intel Corporation | Imageable bottom anti-reflective coating for high resolution lithography |
KR100832247B1 (ko) * | 2002-11-27 | 2008-05-28 | 주식회사 동진쎄미켐 | 유기 난반사 방지막 조성물 및 이를 이용한 패턴 형성방법 |
JP3759526B2 (ja) | 2003-10-30 | 2006-03-29 | 丸善石油化学株式会社 | 半導体リソグラフィー用共重合体の製造方法 |
TWI380354B (en) * | 2004-01-29 | 2012-12-21 | Rohm & Haas Elect Mat | T-gate formation |
JP2007197344A (ja) * | 2006-01-25 | 2007-08-09 | Toagosei Co Ltd | (メタ)アクリレートの洗浄方法および製造方法 |
US7666575B2 (en) * | 2006-10-18 | 2010-02-23 | Az Electronic Materials Usa Corp | Antireflective coating compositions |
JP5588095B2 (ja) | 2006-12-06 | 2014-09-10 | 丸善石油化学株式会社 | 半導体リソグラフィー用共重合体とその製造方法 |
US8030419B2 (en) * | 2006-12-22 | 2011-10-04 | Maruzen Petrochemical Co., Ltd. | Process for producing polymer for semiconductor lithography |
WO2008080201A1 (en) * | 2007-01-05 | 2008-07-10 | Francisco Mathieu | Copolymer of methyl methacrylate and anthracenyl methacrylate |
JP5282385B2 (ja) * | 2007-09-18 | 2013-09-04 | 川崎化成工業株式会社 | ラジカル重合性組成物 |
JP5591465B2 (ja) * | 2008-10-30 | 2014-09-17 | 丸善石油化学株式会社 | 濃度が均一な半導体リソグラフィー用共重合体溶液の製造方法 |
KR101111647B1 (ko) * | 2009-08-27 | 2012-02-14 | 영창케미칼 주식회사 | 반도체 패턴 형성을 위한 i-선용 네가티브형 포토레지스트 조성물 |
JP5652616B2 (ja) * | 2011-04-16 | 2015-01-14 | 川崎化成工業株式会社 | 10−ヒドロキシ−1,2,3,4−テトラヒドロ−1,4−メタノアントラセン−9−イル−(メタ)アクリレート化合物、その製造法及びその重合物。 |
JP5582424B2 (ja) * | 2012-07-04 | 2014-09-03 | 川崎化成工業株式会社 | ラジカル重合性組成物の重合方法及びその重合物 |
JP7377848B2 (ja) | 2020-12-31 | 2023-11-10 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシー | フォトレジスト組成物及びパターン形成方法 |
CN117210138B (zh) * | 2023-10-10 | 2024-04-19 | 广东光固新材料有限公司 | 一种可重复使用的丙烯酸酯胶粘剂 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3000862A (en) * | 1958-01-13 | 1961-09-19 | Du Pont | Polymethacrolein derivatives |
US3449272A (en) * | 1961-09-29 | 1969-06-10 | Ppg Industries Inc | Thermosetting composition containing an acetalized polymer and a polyol |
DE3100077A1 (de) | 1981-01-03 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters |
US4507405A (en) | 1982-06-17 | 1985-03-26 | The Coca-Cola Company | Synthetic articles having a cork-like appearance |
US4822718A (en) | 1982-09-30 | 1989-04-18 | Brewer Science, Inc. | Light absorbing coating |
US5674648A (en) | 1984-08-06 | 1997-10-07 | Brewer Science, Inc. | Anti-reflective coating |
PH23983A (en) | 1986-12-23 | 1990-02-09 | Biopolymers Ltd | Biostatic and biocidal composition |
JP2740837B2 (ja) | 1987-01-30 | 1998-04-15 | コニカ株式会社 | 多色転写画像形成方法 |
US5229229A (en) * | 1990-04-27 | 1993-07-20 | Tosoh Corporation | Pellicle having reflection-preventing function |
US5412041A (en) * | 1994-07-11 | 1995-05-02 | Rohm And Haas Company | Method for forming (meth)acrolein-containing polymers |
US5525457A (en) | 1994-12-09 | 1996-06-11 | Japan Synthetic Rubber Co., Ltd. | Reflection preventing film and process for forming resist pattern using the same |
DE19500386A1 (de) * | 1995-01-09 | 1996-07-11 | Degussa | Verfahren zur Herstellung von seitenständige Aldehydgruppen tragenden Copolymeren |
US5886102A (en) | 1996-06-11 | 1999-03-23 | Shipley Company, L.L.C. | Antireflective coating compositions |
TW406215B (en) | 1996-08-07 | 2000-09-21 | Fuji Photo Film Co Ltd | Composition for anti-reflective coating material in lithographic process, and process for forming resist pattern |
US7147983B1 (en) | 1996-10-07 | 2006-12-12 | Shipley Company, L.L.C. | Dyed photoresists and methods and articles of manufacture comprising same |
US5939236A (en) | 1997-02-07 | 1999-08-17 | Shipley Company, L.L.C. | Antireflective coating compositions comprising photoacid generators |
US6190839B1 (en) | 1998-01-15 | 2001-02-20 | Shipley Company, L.L.C. | High conformality antireflective coating compositions |
TW457403B (en) * | 1998-07-03 | 2001-10-01 | Clariant Int Ltd | Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom |
KR100465864B1 (ko) * | 1999-03-15 | 2005-01-24 | 주식회사 하이닉스반도체 | 유기 난반사방지 중합체 및 그의 제조방법 |
KR100395904B1 (ko) * | 1999-04-23 | 2003-08-27 | 주식회사 하이닉스반도체 | 유기 반사방지 중합체 및 그의 제조방법 |
KR100359862B1 (ko) * | 1999-12-23 | 2002-11-09 | 주식회사 하이닉스반도체 | 난반사 방지막용 중합체와 그 제조방법 |
-
1999
- 1999-12-30 KR KR1019990065675A patent/KR100549574B1/ko not_active IP Right Cessation
-
2000
- 2000-12-21 TW TW089127533A patent/TWI263648B/zh not_active IP Right Cessation
- 2000-12-22 GB GB0031422A patent/GB2358018A/en not_active Withdrawn
- 2000-12-27 US US09/750,232 patent/US20010043992A1/en not_active Abandoned
- 2000-12-28 JP JP2000401089A patent/JP4463417B2/ja not_active Expired - Fee Related
- 2000-12-29 CN CNB001369660A patent/CN1266237C/zh not_active Expired - Lifetime
- 2000-12-29 FR FR0017336A patent/FR2803293B1/fr not_active Expired - Fee Related
-
2001
- 2001-05-04 FR FR0106012A patent/FR2808023B1/fr not_active Expired - Fee Related
-
2002
- 2002-11-12 US US10/293,022 patent/US6780953B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2001226324A (ja) | 2001-08-21 |
KR20010065739A (ko) | 2001-07-11 |
FR2803293A1 (fr) | 2001-07-06 |
CN1301797A (zh) | 2001-07-04 |
FR2803293B1 (fr) | 2003-04-04 |
FR2808023B1 (fr) | 2005-06-03 |
US6780953B2 (en) | 2004-08-24 |
FR2808023A1 (fr) | 2001-10-26 |
US20030118736A1 (en) | 2003-06-26 |
US20010043992A1 (en) | 2001-11-22 |
KR100549574B1 (ko) | 2006-02-08 |
GB0031422D0 (en) | 2001-02-07 |
JP4463417B2 (ja) | 2010-05-19 |
CN1266237C (zh) | 2006-07-26 |
GB2358018A (en) | 2001-07-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |