TW202143302A - 基板處理裝置及基板處理方法 - Google Patents
基板處理裝置及基板處理方法 Download PDFInfo
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- TW202143302A TW202143302A TW110107442A TW110107442A TW202143302A TW 202143302 A TW202143302 A TW 202143302A TW 110107442 A TW110107442 A TW 110107442A TW 110107442 A TW110107442 A TW 110107442A TW 202143302 A TW202143302 A TW 202143302A
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- 238000012545 processing Methods 0.000 title claims abstract description 178
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- 238000009616 inductively coupled plasma Methods 0.000 description 3
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- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
- H01J2237/3341—Reactive etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020045381A JP7437985B2 (ja) | 2020-03-16 | 2020-03-16 | 基板処理装置および基板処理方法 |
JP2020-045381 | 2020-03-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202143302A true TW202143302A (zh) | 2021-11-16 |
Family
ID=77691423
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110107442A TW202143302A (zh) | 2020-03-16 | 2021-03-03 | 基板處理裝置及基板處理方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7437985B2 (ko) |
KR (1) | KR102519769B1 (ko) |
CN (1) | CN113410161A (ko) |
TW (1) | TW202143302A (ko) |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5173336A (en) * | 1991-01-22 | 1992-12-22 | Santa Barbara Research Center | Metal organic chemical vapor deposition (MOCVD) reactor with recirculation suppressing flow guide |
JP3665672B2 (ja) * | 1995-11-01 | 2005-06-29 | 東京エレクトロン株式会社 | 成膜装置及び成膜方法 |
US6257168B1 (en) * | 1999-06-30 | 2001-07-10 | Lam Research Corporation | Elevated stationary uniformity ring design |
KR20020024620A (ko) * | 2000-09-26 | 2002-04-01 | 윤종용 | 반도체 제조를 위한 식각 장치 |
JP4025030B2 (ja) * | 2001-04-17 | 2007-12-19 | 東京エレクトロン株式会社 | 基板の処理装置及び搬送アーム |
JP3724436B2 (ja) | 2002-02-15 | 2005-12-07 | セイコーエプソン株式会社 | 整流ウォール及びドライエッチング装置並びに該装置を用いた電気光学装置の製造方法 |
JP4439853B2 (ja) | 2003-07-08 | 2010-03-24 | 東京エレクトロン株式会社 | プラズマ処理装置、フォーカスリング及びプラズマ処理方法 |
CN100576438C (zh) * | 2006-11-15 | 2009-12-30 | 应用材料股份有限公司 | 增强磁控制等离子体径向分布的约束挡板和流动均衡器 |
JP2009054720A (ja) * | 2007-08-24 | 2009-03-12 | Tokyo Electron Ltd | 処理装置 |
JP5256866B2 (ja) * | 2008-02-05 | 2013-08-07 | 東京エレクトロン株式会社 | 処理装置 |
JP5113016B2 (ja) * | 2008-04-07 | 2013-01-09 | 東京エレクトロン株式会社 | 基板処理装置 |
JP5120089B2 (ja) * | 2008-06-17 | 2013-01-16 | 東京エレクトロン株式会社 | 処理装置 |
JP5141520B2 (ja) * | 2008-12-02 | 2013-02-13 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP2013149635A (ja) * | 2010-05-11 | 2013-08-01 | Sharp Corp | ドライエッチング装置 |
JP2013149634A (ja) | 2010-05-11 | 2013-08-01 | Sharp Corp | ドライエッチング装置 |
JP2012222235A (ja) | 2011-04-12 | 2012-11-12 | Hitachi High-Technologies Corp | プラズマ処理装置 |
JP2013243184A (ja) | 2012-05-18 | 2013-12-05 | Sharp Corp | ドライエッチング装置 |
JP6305825B2 (ja) * | 2014-05-12 | 2018-04-04 | 東京エレクトロン株式会社 | プラズマ処理装置およびそれに用いる排気構造 |
JP6861570B2 (ja) * | 2017-04-27 | 2021-04-21 | 東京エレクトロン株式会社 | 基板処理装置 |
CN109037019B (zh) * | 2018-07-03 | 2020-04-28 | 深圳市华星光电半导体显示技术有限公司 | 干蚀刻设备 |
CN209708946U (zh) * | 2018-12-07 | 2019-11-29 | 北京北方华创微电子装备有限公司 | 用于反应腔室的整流件及反应腔室 |
-
2020
- 2020-03-16 JP JP2020045381A patent/JP7437985B2/ja active Active
-
2021
- 2021-03-03 TW TW110107442A patent/TW202143302A/zh unknown
- 2021-03-04 KR KR1020210028941A patent/KR102519769B1/ko active IP Right Grant
- 2021-03-08 CN CN202110250009.8A patent/CN113410161A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20210116259A (ko) | 2021-09-27 |
CN113410161A (zh) | 2021-09-17 |
JP7437985B2 (ja) | 2024-02-26 |
KR102519769B1 (ko) | 2023-04-10 |
JP2021150319A (ja) | 2021-09-27 |
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