TW201024453A - VHF assembly - Google Patents

VHF assembly Download PDF

Info

Publication number
TW201024453A
TW201024453A TW98137045A TW98137045A TW201024453A TW 201024453 A TW201024453 A TW 201024453A TW 98137045 A TW98137045 A TW 98137045A TW 98137045 A TW98137045 A TW 98137045A TW 201024453 A TW201024453 A TW 201024453A
Authority
TW
Taiwan
Prior art keywords
electrode
plasma
frequency
terminal
component
Prior art date
Application number
TW98137045A
Other languages
English (en)
Chinese (zh)
Inventor
Michael Geisler
Thomas Merz
Rudolf Beckmann
Original Assignee
Leybold Optics Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Optics Gmbh filed Critical Leybold Optics Gmbh
Publication of TW201024453A publication Critical patent/TW201024453A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32036—AC powered
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
TW98137045A 2008-10-29 2009-10-29 VHF assembly TW201024453A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008053703 2008-10-29
DE102008054144 2008-10-31
DE102009014414A DE102009014414A1 (de) 2008-10-29 2009-03-26 VHF-Elektrodenanordnung, Vorrichtung und Verfahren

Publications (1)

Publication Number Publication Date
TW201024453A true TW201024453A (en) 2010-07-01

Family

ID=42096556

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98137045A TW201024453A (en) 2008-10-29 2009-10-29 VHF assembly

Country Status (5)

Country Link
EP (1) EP2347427A2 (ja)
JP (1) JP2012507126A (ja)
DE (1) DE102009014414A1 (ja)
TW (1) TW201024453A (ja)
WO (1) WO2010049158A2 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11126775B2 (en) * 2019-04-12 2021-09-21 Taiwan Semiconductor Manufacturing Company, Ltd. IC layout, method, device, and system
DE102020109326A1 (de) * 2019-04-12 2020-10-15 Taiwan Semiconductor Manufacturing Co. Ltd. Ic-vorrichtung, verfahren, layout und system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3253122B2 (ja) * 1992-04-01 2002-02-04 キヤノン株式会社 プラズマ処理装置及びプラズマ処理方法並びにそれを用いた半導体デバイスの製造方法
DE4421103A1 (de) * 1994-06-16 1995-12-21 Siemens Solar Gmbh Verfahren und Vorrichtung zur plasmagestützten Abscheidung dünner Schichten
JP2002105643A (ja) * 2000-10-04 2002-04-10 Mitsubishi Heavy Ind Ltd プラズマｃｖｄ装置用電極接続具
JP3872741B2 (ja) 2002-10-01 2007-01-24 三菱重工業株式会社 プラズマ化学蒸着装置
JP4413084B2 (ja) 2003-07-30 2010-02-10 シャープ株式会社 プラズマプロセス装置及びそのクリーニング方法
JP3590955B2 (ja) * 2004-05-26 2004-11-17 村田 正義 平衡伝送回路と、該平衡伝送回路により構成されたプラズマ表面処理装置およびプラズマ表面処理方法
JP4625397B2 (ja) * 2005-10-18 2011-02-02 三菱重工業株式会社 放電電極、薄膜製造装置及び太陽電池の製造方法
JP2008047938A (ja) 2007-10-17 2008-02-28 Masayoshi Murata 高周波プラズマｃｖｄ装置と高周波プラズマｃｖｄ法及び半導体薄膜製造法。

Also Published As

Publication number Publication date
WO2010049158A3 (de) 2010-07-01
WO2010049158A2 (de) 2010-05-06
DE102009014414A1 (de) 2010-05-12
JP2012507126A (ja) 2012-03-22
EP2347427A2 (de) 2011-07-27

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