TW200719101A - Laser beam exposure apparatus and method therefor - Google Patents
Laser beam exposure apparatus and method thereforInfo
- Publication number
- TW200719101A TW200719101A TW095137692A TW95137692A TW200719101A TW 200719101 A TW200719101 A TW 200719101A TW 095137692 A TW095137692 A TW 095137692A TW 95137692 A TW95137692 A TW 95137692A TW 200719101 A TW200719101 A TW 200719101A
- Authority
- TW
- Taiwan
- Prior art keywords
- laser beam
- optical path
- exposure apparatus
- substrate
- beam exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
- G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005321256 | 2005-11-04 | ||
JP2006246266A JP4533874B2 (ja) | 2005-11-04 | 2006-09-12 | レーザビーム露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200719101A true TW200719101A (en) | 2007-05-16 |
TWI324283B TWI324283B (ja) | 2010-05-01 |
Family
ID=38209773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095137692A TW200719101A (en) | 2005-11-04 | 2006-10-13 | Laser beam exposure apparatus and method therefor |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4533874B2 (ja) |
KR (1) | KR100931712B1 (ja) |
TW (1) | TW200719101A (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101048785B1 (ko) * | 2008-09-25 | 2011-07-15 | 에이티엘(주) | 디지털 노광 장치 |
KR102225208B1 (ko) * | 2019-05-13 | 2021-03-09 | 디아이티 주식회사 | 반도체 표면처리 시스템 및 방법 |
JP2024042874A (ja) * | 2022-09-16 | 2024-03-29 | 株式会社Screenホールディングス | 露光方法および露光装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3915851B2 (ja) | 1996-12-27 | 2007-05-16 | オムロン株式会社 | レーザビームを用いてマーキングするための方法、並びに、表示パネルの製造工程においてガラス基板に識別情報をマーキングするための方法 |
JP2000294501A (ja) * | 1999-04-09 | 2000-10-20 | Nikon Corp | 周辺露光装置及び方法 |
JP2000294500A (ja) * | 1999-04-09 | 2000-10-20 | Nikon Corp | 周辺露光装置及び方法 |
JP3091460B1 (ja) * | 1999-12-10 | 2000-09-25 | 東レエンジニアリング株式会社 | 露光装置 |
JP4342663B2 (ja) * | 1999-12-20 | 2009-10-14 | 株式会社オーク製作所 | 周辺露光装置 |
JP2001201862A (ja) * | 2000-01-19 | 2001-07-27 | Nikon Corp | 周辺露光装置 |
JP3321733B2 (ja) * | 2000-09-20 | 2002-09-09 | 東レエンジニアリング株式会社 | 露光装置 |
JP2002365811A (ja) * | 2001-06-08 | 2002-12-18 | Mitsubishi Corp | フォトレジスト塗布基板の露光方法及び装置 |
JP3547418B2 (ja) * | 2001-10-25 | 2004-07-28 | 三菱商事株式会社 | レーザビームによる液晶パネルのマーキング方法及び装置 |
CN1288502C (zh) * | 2001-10-25 | 2006-12-06 | 东丽工程株式会社 | 利用激光束的识别码的打印装置 |
KR20060053045A (ko) * | 2004-11-13 | 2006-05-19 | 삼성전자주식회사 | 갈바노미터 스캐너를 이용한 레이저 마킹 장치 및 방법 |
JP4664102B2 (ja) * | 2005-03-18 | 2011-04-06 | 東レエンジニアリング株式会社 | 露光装置及び露光方法 |
-
2006
- 2006-09-12 JP JP2006246266A patent/JP4533874B2/ja not_active Expired - Fee Related
- 2006-10-13 TW TW095137692A patent/TW200719101A/zh not_active IP Right Cessation
- 2006-11-02 KR KR1020060108024A patent/KR100931712B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP4533874B2 (ja) | 2010-09-01 |
KR20070048613A (ko) | 2007-05-09 |
KR100931712B1 (ko) | 2009-12-14 |
JP2007148359A (ja) | 2007-06-14 |
TWI324283B (ja) | 2010-05-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DK1657072T3 (da) | Fremgangsmåde til tilvejebringelse af et billede ved hjælp af laser | |
EP1909366A4 (en) | LIGHT IRRADIATION DEVICE AND WELDING METHOD | |
MX2009004286A (es) | Dispositivo para cirugia de ojo con laser optico. | |
WO2007127257A3 (en) | Dynamic optical surgical system utilizing a fixed relationship between target tissue visualization and beam delivery | |
TW200622335A (en) | Optical system for spatially controlling light polarization and method for manufacturing the same | |
TW200643648A (en) | Exposure apparatus and exposure method | |
TW200617616A (en) | Lithographic apparatus and device manufacturing method | |
ATE547234T1 (de) | Optische formungsvorrichtung und optisches formungsverfahren | |
DE60138052D1 (de) | Optisches System mit elektronischer Punktgrössensteuerung und Fokussierungskontrolle | |
EP1834796A3 (en) | Image processing method and image processing apparatus | |
ATE132785T1 (de) | Zielbereichprofilierung von optischen oberflächen durch ecimer laser lichtabschmelzung | |
WO2007081913A3 (en) | Surface plasmon enhanced radiation methods and apparatus | |
TW200500822A (en) | Lithographic apparatus and device manufacturing method | |
IL182197A0 (en) | Laser plasma euv light source, target member, production method for target member, target supplying method, and euv exposure system | |
BR0309112A (pt) | Aparelho, sistema e método para gerar e controlar armadilhas ópticas para manipular pequenas partìculas | |
TW200633229A (en) | Laser apparatus and manufacturing method of thin film transistor using the same | |
EP1681675A3 (en) | Mastering apparatus, mastering method and optical recording medium | |
TW200611079A (en) | Lithographic apparatus, control system and device manufacturing method | |
TW200604757A (en) | Exposure method and device | |
TW200627087A (en) | Methods and systems for lithographic beam generation | |
TW200719101A (en) | Laser beam exposure apparatus and method therefor | |
WO2008125173A3 (de) | Vorrichtung und verfahren zur materialbearbeitung mittels laserstrahlung | |
ATE411872T1 (de) | Laserbearbeitungsvorrichtung | |
DE50114071D1 (de) | Vorrichtung zur beschriftung von gegenständen mittels laserstrahlen | |
TW200710603A (en) | Exposure apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |