TW200712187A - Polishing composition and polishing method - Google Patents

Polishing composition and polishing method

Info

Publication number
TW200712187A
TW200712187A TW095132024A TW95132024A TW200712187A TW 200712187 A TW200712187 A TW 200712187A TW 095132024 A TW095132024 A TW 095132024A TW 95132024 A TW95132024 A TW 95132024A TW 200712187 A TW200712187 A TW 200712187A
Authority
TW
Taiwan
Prior art keywords
polishing
integer
represent
general formula
polyether polyol
Prior art date
Application number
TW095132024A
Other languages
English (en)
Inventor
Eiichi Yamada
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005252639A external-priority patent/JP2007063441A/ja
Priority claimed from JP2005252640A external-priority patent/JP2007063442A/ja
Priority claimed from JP2005252638A external-priority patent/JP2007063440A/ja
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of TW200712187A publication Critical patent/TW200712187A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/06—Other polishing compositions
    • C09G1/14—Other polishing compositions based on non-waxy substances
    • C09G1/16—Other polishing compositions based on non-waxy substances on natural or synthetic resins
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/2805—Compounds having only one group containing active hydrogen
    • C08G18/2815—Monohydroxy compounds
    • C08G18/283—Compounds containing ether groups, e.g. oxyalkylated monohydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4833—Polyethers containing oxyethylene units
    • C08G18/4837—Polyethers containing oxyethylene units and other oxyalkylene units
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/205—Compounds containing groups, e.g. carbamates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW095132024A 2005-08-31 2006-08-30 Polishing composition and polishing method TW200712187A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005252639A JP2007063441A (ja) 2005-08-31 2005-08-31 研磨用組成物
JP2005252640A JP2007063442A (ja) 2005-08-31 2005-08-31 研磨用組成物
JP2005252638A JP2007063440A (ja) 2005-08-31 2005-08-31 研磨用組成物及び研磨方法

Publications (1)

Publication Number Publication Date
TW200712187A true TW200712187A (en) 2007-04-01

Family

ID=37499628

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095132024A TW200712187A (en) 2005-08-31 2006-08-30 Polishing composition and polishing method

Country Status (4)

Country Link
US (1) US7655057B2 (zh)
EP (1) EP1760099B1 (zh)
KR (1) KR101267971B1 (zh)
TW (1) TW200712187A (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103805069B (zh) * 2014-01-27 2016-03-02 欧普康视科技股份有限公司 一种角膜接触镜抛光液及其制备方法
JP6708994B2 (ja) 2017-03-27 2020-06-10 日立化成株式会社 スラリ及び研磨方法
WO2018179061A1 (ja) 2017-03-27 2018-10-04 日立化成株式会社 研磨液、研磨液セット及び研磨方法
WO2020021680A1 (ja) 2018-07-26 2020-01-30 日立化成株式会社 スラリ及び研磨方法
KR102576637B1 (ko) 2018-03-22 2023-09-07 가부시끼가이샤 레조낙 연마액, 연마액 세트 및 연마 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5489389A (en) 1977-12-27 1979-07-16 Fujimi Kenmazai Kougiyou Kk Composition for polishing of moldings in synthetic resin
EP0325232B1 (en) 1988-01-19 1996-09-11 Fujimi Incorporated Polishing composition
JPH0214280A (ja) 1988-07-01 1990-01-18 Showa Denko Kk プラスチック研磨用組成物
JP3582017B2 (ja) 1993-06-25 2004-10-27 株式会社フジミインコーポレーテッド 研磨用組成物およびプラスチック研磨用組成物
JP4163788B2 (ja) * 1998-06-25 2008-10-08 スピードファム株式会社 研磨用組成物及び研磨加工方法
JP4095833B2 (ja) * 2002-05-30 2008-06-04 株式会社フジミインコーポレーテッド 研磨用組成物
JP4219722B2 (ja) 2003-03-31 2009-02-04 株式会社フジミインコーポレーテッド 研磨用組成物
JP4202183B2 (ja) * 2003-05-09 2008-12-24 株式会社フジミインコーポレーテッド 研磨用組成物

Also Published As

Publication number Publication date
KR101267971B1 (ko) 2013-05-27
US7655057B2 (en) 2010-02-02
EP1760099A3 (en) 2010-12-15
EP1760099A2 (en) 2007-03-07
EP1760099B1 (en) 2012-12-26
KR20070026152A (ko) 2007-03-08
US20070044385A1 (en) 2007-03-01

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